CA2514527A1 - Method for reducing degradation of reactive compounds during transport - Google Patents
Method for reducing degradation of reactive compounds during transport Download PDFInfo
- Publication number
- CA2514527A1 CA2514527A1 CA002514527A CA2514527A CA2514527A1 CA 2514527 A1 CA2514527 A1 CA 2514527A1 CA 002514527 A CA002514527 A CA 002514527A CA 2514527 A CA2514527 A CA 2514527A CA 2514527 A1 CA2514527 A1 CA 2514527A1
- Authority
- CA
- Canada
- Prior art keywords
- reactive compound
- transport
- location
- minimizing
- reactive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 150000001875 compounds Chemical class 0.000 title claims abstract description 91
- 238000000034 method Methods 0.000 title claims abstract description 40
- 230000015556 catabolic process Effects 0.000 title claims abstract description 25
- 238000006731 degradation reaction Methods 0.000 title claims abstract description 25
- 229910052751 metal Inorganic materials 0.000 claims description 28
- 239000002184 metal Substances 0.000 claims description 28
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 claims description 23
- 239000007789 gas Substances 0.000 claims description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 14
- 238000004458 analytical method Methods 0.000 claims description 14
- GFADZIUESKAXAK-UHFFFAOYSA-N tetrafluorohydrazine Chemical compound FN(F)N(F)F GFADZIUESKAXAK-UHFFFAOYSA-N 0.000 claims description 12
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 10
- 239000011737 fluorine Substances 0.000 claims description 7
- 229910052731 fluorine Inorganic materials 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 claims description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- 239000011651 chromium Substances 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 5
- 229910000619 316 stainless steel Inorganic materials 0.000 claims description 4
- 239000001307 helium Substances 0.000 claims description 4
- 229910052734 helium Inorganic materials 0.000 claims description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 4
- 229910015900 BF3 Inorganic materials 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- DUQAODNTUBJRGF-ONEGZZNKSA-N dinitrogen difluoride Chemical compound F\N=N\F DUQAODNTUBJRGF-ONEGZZNKSA-N 0.000 claims description 3
- OMRRUNXAWXNVFW-UHFFFAOYSA-N fluoridochlorine Chemical compound ClF OMRRUNXAWXNVFW-UHFFFAOYSA-N 0.000 claims description 3
- UJMWVICAENGCRF-UHFFFAOYSA-N oxygen difluoride Chemical compound FOF UJMWVICAENGCRF-UHFFFAOYSA-N 0.000 claims description 3
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 claims description 3
- JOHWNGGYGAVMGU-UHFFFAOYSA-N trifluorochlorine Chemical compound FCl(F)F JOHWNGGYGAVMGU-UHFFFAOYSA-N 0.000 claims description 3
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 claims description 3
- 229910000975 Carbon steel Inorganic materials 0.000 claims description 2
- 229910000792 Monel Inorganic materials 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910000833 kovar Inorganic materials 0.000 claims description 2
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 2
- MOFOBJHOKRNACT-UHFFFAOYSA-N nickel silver Chemical compound [Ni].[Ag] MOFOBJHOKRNACT-UHFFFAOYSA-N 0.000 claims description 2
- 239000010956 nickel silver Substances 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 239000011135 tin Substances 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 2
- 239000008246 gaseous mixture Substances 0.000 claims 1
- 229910000856 hastalloy Inorganic materials 0.000 claims 1
- 229910001026 inconel Inorganic materials 0.000 claims 1
- 239000012535 impurity Substances 0.000 description 24
- 239000000047 product Substances 0.000 description 19
- 238000004519 manufacturing process Methods 0.000 description 17
- 239000004065 semiconductor Substances 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 7
- 238000013461 design Methods 0.000 description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 239000000356 contaminant Substances 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- -1 moisture Chemical class 0.000 description 2
- 210000002381 plasma Anatomy 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910004014 SiF4 Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000037361 pathway Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
- Sampling And Sample Adjustment (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/396,795 US20040188272A1 (en) | 2003-03-25 | 2003-03-25 | Method for reducing degradation of reactive compounds during transport |
| US10/396,795 | 2003-03-25 | ||
| PCT/US2004/009186 WO2004088004A1 (en) | 2003-03-25 | 2004-03-25 | Method for reducing degradation of reactive compounds during transport |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2514527A1 true CA2514527A1 (en) | 2004-10-14 |
Family
ID=32988852
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002514527A Abandoned CA2514527A1 (en) | 2003-03-25 | 2004-03-25 | Method for reducing degradation of reactive compounds during transport |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US20040188272A1 (https=) |
| EP (1) | EP1606437A1 (https=) |
| JP (1) | JP2006522226A (https=) |
| KR (1) | KR20050114680A (https=) |
| CN (1) | CN1761774A (https=) |
| CA (1) | CA2514527A1 (https=) |
| RU (1) | RU2005132824A (https=) |
| TW (1) | TW200500166A (https=) |
| WO (1) | WO2004088004A1 (https=) |
| ZA (1) | ZA200505303B (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101983417B (zh) * | 2008-03-31 | 2013-04-24 | 日本瑞翁株式会社 | 等离子体蚀刻方法 |
| US8590705B2 (en) * | 2010-06-11 | 2013-11-26 | Air Products And Chemicals, Inc. | Cylinder surface treated container for monochlorosilane |
| CN104388938A (zh) * | 2014-11-05 | 2015-03-04 | 辽宁石油化工大学 | 一种铝合金焊丝的电化学抛光液及电化学抛光方法 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2138539B1 (https=) * | 1971-05-27 | 1973-05-25 | Alsthom | |
| US3998180A (en) * | 1975-04-07 | 1976-12-21 | Union Carbide Corporation | Vapor deposition apparatus including fluid transfer means |
| DE3614290A1 (de) * | 1986-04-26 | 1987-10-29 | Messer Griesheim Gmbh | Druckgasbehaelter aus einer austenitischen stahllegierung |
| DE3617092A1 (de) * | 1986-05-21 | 1987-11-26 | Poligrat Gmbh | Innenoberflaeche einer gasflasche und verfahren zu deren herstellung |
| JPH01261208A (ja) * | 1988-04-11 | 1989-10-18 | Mitsui Toatsu Chem Inc | 三弗化窒素ガスの精製方法 |
| US5009963A (en) * | 1988-07-20 | 1991-04-23 | Tadahiro Ohmi | Metal material with film passivated by fluorination and apparatus composed of the metal material |
| EP0437110B1 (en) * | 1990-01-08 | 2001-07-11 | Lsi Logic Corporation | Structure for filtering process gases for use with a chemical vapour deposition chamber |
| US5085745A (en) * | 1990-11-07 | 1992-02-04 | Liquid Carbonic Corporation | Method for treating carbon steel cylinder |
| JPH0666400A (ja) * | 1992-08-21 | 1994-03-08 | Mitsui Toatsu Chem Inc | フルオロシランガスの充填容器 |
| US6557593B2 (en) * | 1993-04-28 | 2003-05-06 | Advanced Technology Materials, Inc. | Refillable ampule and method re same |
| JPH07197158A (ja) * | 1993-12-28 | 1995-08-01 | Mitsubishi Materials Corp | Ｎｉ基合金とそれを用いた半導体製造装置用部材及び液晶製造装置用部材 |
| JP2893081B2 (ja) * | 1994-09-20 | 1999-05-17 | 岩谷産業株式会社 | オゾンガス貯蔵容器 |
| JP3010138U (ja) * | 1994-10-13 | 1995-04-25 | 有限会社字多精密工業 | ステンレス製ボンベ |
| GB9724168D0 (en) * | 1997-11-14 | 1998-01-14 | Air Prod & Chem | Gas control device and method of supplying gas |
| US6514346B1 (en) * | 1998-03-25 | 2003-02-04 | Neuco, Inc. | Method and apparatus for inserting and propelling a coating device into and through live gas pipeline |
| US6343476B1 (en) * | 1998-04-28 | 2002-02-05 | Advanced Technology Materials, Inc. | Gas storage and dispensing system comprising regulator interiorly disposed in fluid containment vessel and adjustable in situ therein |
| JP2000070705A (ja) * | 1998-08-28 | 2000-03-07 | Iwatani Internatl Corp | フッ素含有ガスの供給ラインでの腐食生成物低減方法 |
| US6374860B2 (en) * | 1998-10-16 | 2002-04-23 | Daniel Industries, Inc. | Integrated valve design for gas chromatograph |
| US6523615B2 (en) * | 2000-03-31 | 2003-02-25 | John Gandy Corporation | Electropolishing method for oil field tubular goods and drill pipe |
-
2003
- 2003-03-25 US US10/396,795 patent/US20040188272A1/en not_active Abandoned
-
2004
- 2004-03-25 EP EP04758353A patent/EP1606437A1/en not_active Withdrawn
- 2004-03-25 CN CNA2004800077050A patent/CN1761774A/zh active Pending
- 2004-03-25 RU RU2005132824/02A patent/RU2005132824A/ru not_active Application Discontinuation
- 2004-03-25 ZA ZA200505303A patent/ZA200505303B/en unknown
- 2004-03-25 CA CA002514527A patent/CA2514527A1/en not_active Abandoned
- 2004-03-25 KR KR1020057017843A patent/KR20050114680A/ko not_active Withdrawn
- 2004-03-25 TW TW093108133A patent/TW200500166A/zh unknown
- 2004-03-25 WO PCT/US2004/009186 patent/WO2004088004A1/en not_active Ceased
- 2004-03-25 JP JP2006509300A patent/JP2006522226A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| ZA200505303B (en) | 2006-09-27 |
| US20040188272A1 (en) | 2004-09-30 |
| EP1606437A1 (en) | 2005-12-21 |
| WO2004088004A1 (en) | 2004-10-14 |
| TW200500166A (en) | 2005-01-01 |
| CN1761774A (zh) | 2006-04-19 |
| KR20050114680A (ko) | 2005-12-06 |
| RU2005132824A (ru) | 2006-02-20 |
| JP2006522226A (ja) | 2006-09-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5009963A (en) | Metal material with film passivated by fluorination and apparatus composed of the metal material | |
| JP2831488B2 (ja) | アルミニウム基材に耐蝕性保護被膜を形成する方法 | |
| KR100633872B1 (ko) | 고순도 불소 가스 중의 미량 불순물의 분석 방법 | |
| EP0428733B1 (en) | Device for forming tungsten film | |
| JP7303467B2 (ja) | 充填済み容器の製造方法 | |
| US5259935A (en) | Stainless steel surface passivation treatment | |
| EP0512782B1 (en) | Stainless steel surface passivation treatment | |
| US20040006249A1 (en) | Fluorination treatment apparatus, process for producing fluorination treated substance, and fluorination treated substance | |
| JPWO1992021786A1 (ja) | ステンレス鋼の不動態膜形成方法並びにステンレス鋼及び接流体部品 | |
| JP3045576B2 (ja) | ステンレス鋼の不動態膜形成方法及びステンレス鋼 | |
| US20040188272A1 (en) | Method for reducing degradation of reactive compounds during transport | |
| JP4744017B2 (ja) | 高純度フッ素ガス中の微量不純物の分析方法 | |
| JP2018107438A (ja) | 金属部材の表面処理方法及び半導体素子の製造方法 | |
| JP2867376B2 (ja) | フッ化不動態膜が形成された金属材料、その金属材料を用いたガス装置、並びに該フッ化不動態膜の形成方法 | |
| JPH03215656A (ja) | フッ化不働態膜が形成されたステンレス鋼、その製造方法並びにそのステンレスを用いた装置 | |
| KR102489717B1 (ko) | 저 내부식성 금속 기재를 이용한 고순도 불화수소를 저장하기 위한 용기 및 이의 제조방법 | |
| Godlewska-Żyłkiewicz | Hazards of errors in the palladium storage in determination by GFAAS | |
| KR950012809B1 (ko) | 불화부동태막이 형성된 금속재료 및 그 금속재료를 사용한 장치 | |
| JPH05311455A (ja) | 半導体製造装置用ステンレス鋼部材およびその表面処理方法 | |
| WO1998027005A1 (en) | Device and method for the storage, transportation and production of active fluorine | |
| WO2023282152A1 (ja) | モリブデンの一フッ化物から五フッ化物の除去方法及び半導体デバイスの製造方法 | |
| JP2006522226A5 (https=) | ||
| JP3084306B2 (ja) | フッ化不動態膜の形成方法 | |
| Hori et al. | Chemical Conditions of SiCNO Film Exposed to ClF3 Gas | |
| US20260077408A1 (en) | System and method for recycling of refractory metal powders |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FZDE | Discontinued |