CN1761774A - 减少输送过程中活性化合物的降解的方法 - Google Patents

减少输送过程中活性化合物的降解的方法 Download PDF

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Publication number
CN1761774A
CN1761774A CNA2004800077050A CN200480007705A CN1761774A CN 1761774 A CN1761774 A CN 1761774A CN A2004800077050 A CNA2004800077050 A CN A2004800077050A CN 200480007705 A CN200480007705 A CN 200480007705A CN 1761774 A CN1761774 A CN 1761774A
Authority
CN
China
Prior art keywords
active compound
minimizing
deliver
device used
during transport
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2004800077050A
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English (en)
Chinese (zh)
Inventor
J·D·布兰克斯
V·N·M·拉奥
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of CN1761774A publication Critical patent/CN1761774A/zh
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/16—Polishing

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
CNA2004800077050A 2003-03-25 2004-03-25 减少输送过程中活性化合物的降解的方法 Pending CN1761774A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/396,795 US20040188272A1 (en) 2003-03-25 2003-03-25 Method for reducing degradation of reactive compounds during transport
US10/396,795 2003-03-25

Publications (1)

Publication Number Publication Date
CN1761774A true CN1761774A (zh) 2006-04-19

Family

ID=32988852

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2004800077050A Pending CN1761774A (zh) 2003-03-25 2004-03-25 减少输送过程中活性化合物的降解的方法

Country Status (10)

Country Link
US (1) US20040188272A1 (https=)
EP (1) EP1606437A1 (https=)
JP (1) JP2006522226A (https=)
KR (1) KR20050114680A (https=)
CN (1) CN1761774A (https=)
CA (1) CA2514527A1 (https=)
RU (1) RU2005132824A (https=)
TW (1) TW200500166A (https=)
WO (1) WO2004088004A1 (https=)
ZA (1) ZA200505303B (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102410440A (zh) * 2010-06-11 2012-04-11 气体产品与化学公司 对于单氯硅烷的罐表面处理

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101983417B (zh) * 2008-03-31 2013-04-24 日本瑞翁株式会社 等离子体蚀刻方法
CN104388938A (zh) * 2014-11-05 2015-03-04 辽宁石油化工大学 一种铝合金焊丝的电化学抛光液及电化学抛光方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2138539B1 (https=) * 1971-05-27 1973-05-25 Alsthom
US3998180A (en) * 1975-04-07 1976-12-21 Union Carbide Corporation Vapor deposition apparatus including fluid transfer means
DE3614290A1 (de) * 1986-04-26 1987-10-29 Messer Griesheim Gmbh Druckgasbehaelter aus einer austenitischen stahllegierung
DE3617092A1 (de) * 1986-05-21 1987-11-26 Poligrat Gmbh Innenoberflaeche einer gasflasche und verfahren zu deren herstellung
JPH01261208A (ja) * 1988-04-11 1989-10-18 Mitsui Toatsu Chem Inc 三弗化窒素ガスの精製方法
US5009963A (en) * 1988-07-20 1991-04-23 Tadahiro Ohmi Metal material with film passivated by fluorination and apparatus composed of the metal material
EP0437110B1 (en) * 1990-01-08 2001-07-11 Lsi Logic Corporation Structure for filtering process gases for use with a chemical vapour deposition chamber
US5085745A (en) * 1990-11-07 1992-02-04 Liquid Carbonic Corporation Method for treating carbon steel cylinder
JPH0666400A (ja) * 1992-08-21 1994-03-08 Mitsui Toatsu Chem Inc フルオロシランガスの充填容器
US6557593B2 (en) * 1993-04-28 2003-05-06 Advanced Technology Materials, Inc. Refillable ampule and method re same
JPH07197158A (ja) * 1993-12-28 1995-08-01 Mitsubishi Materials Corp Ｎｉ基合金とそれを用いた半導体製造装置用部材及び液晶製造装置用部材
JP2893081B2 (ja) * 1994-09-20 1999-05-17 岩谷産業株式会社 オゾンガス貯蔵容器
JP3010138U (ja) * 1994-10-13 1995-04-25 有限会社字多精密工業 ステンレス製ボンベ
GB9724168D0 (en) * 1997-11-14 1998-01-14 Air Prod & Chem Gas control device and method of supplying gas
US6514346B1 (en) * 1998-03-25 2003-02-04 Neuco, Inc. Method and apparatus for inserting and propelling a coating device into and through live gas pipeline
US6343476B1 (en) * 1998-04-28 2002-02-05 Advanced Technology Materials, Inc. Gas storage and dispensing system comprising regulator interiorly disposed in fluid containment vessel and adjustable in situ therein
JP2000070705A (ja) * 1998-08-28 2000-03-07 Iwatani Internatl Corp フッ素含有ガスの供給ラインでの腐食生成物低減方法
US6374860B2 (en) * 1998-10-16 2002-04-23 Daniel Industries, Inc. Integrated valve design for gas chromatograph
US6523615B2 (en) * 2000-03-31 2003-02-25 John Gandy Corporation Electropolishing method for oil field tubular goods and drill pipe

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102410440A (zh) * 2010-06-11 2012-04-11 气体产品与化学公司 对于单氯硅烷的罐表面处理
CN102410440B (zh) * 2010-06-11 2014-09-03 气体产品与化学公司 具有内表面的容纳单氯硅烷的容器

Also Published As

Publication number Publication date
ZA200505303B (en) 2006-09-27
US20040188272A1 (en) 2004-09-30
EP1606437A1 (en) 2005-12-21
WO2004088004A1 (en) 2004-10-14
TW200500166A (en) 2005-01-01
KR20050114680A (ko) 2005-12-06
RU2005132824A (ru) 2006-02-20
JP2006522226A (ja) 2006-09-28
CA2514527A1 (en) 2004-10-14

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C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication