JP2006522226A - 輸送中の反応性化合物の劣化を低減する方法 - Google Patents

輸送中の反応性化合物の劣化を低減する方法 Download PDF

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Publication number
JP2006522226A
JP2006522226A JP2006509300A JP2006509300A JP2006522226A JP 2006522226 A JP2006522226 A JP 2006522226A JP 2006509300 A JP2006509300 A JP 2006509300A JP 2006509300 A JP2006509300 A JP 2006509300A JP 2006522226 A JP2006522226 A JP 2006522226A
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JP
Japan
Prior art keywords
reactive compound
transport
location
reactive
minimizing
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006509300A
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English (en)
Japanese (ja)
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JP2006522226A5 (https=
Inventor
ダニエル ブランクス ジェレミー
ノット マーリカルジュナ ラオ ヴェリユア
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2006522226A publication Critical patent/JP2006522226A/ja
Publication of JP2006522226A5 publication Critical patent/JP2006522226A5/ja
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/16—Polishing

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2006509300A 2003-03-25 2004-03-25 輸送中の反応性化合物の劣化を低減する方法 Pending JP2006522226A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/396,795 US20040188272A1 (en) 2003-03-25 2003-03-25 Method for reducing degradation of reactive compounds during transport
PCT/US2004/009186 WO2004088004A1 (en) 2003-03-25 2004-03-25 Method for reducing degradation of reactive compounds during transport

Publications (2)

Publication Number Publication Date
JP2006522226A true JP2006522226A (ja) 2006-09-28
JP2006522226A5 JP2006522226A5 (https=) 2007-06-14

Family

ID=32988852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006509300A Pending JP2006522226A (ja) 2003-03-25 2004-03-25 輸送中の反応性化合物の劣化を低減する方法

Country Status (10)

Country Link
US (1) US20040188272A1 (https=)
EP (1) EP1606437A1 (https=)
JP (1) JP2006522226A (https=)
KR (1) KR20050114680A (https=)
CN (1) CN1761774A (https=)
CA (1) CA2514527A1 (https=)
RU (1) RU2005132824A (https=)
TW (1) TW200500166A (https=)
WO (1) WO2004088004A1 (https=)
ZA (1) ZA200505303B (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101983417B (zh) * 2008-03-31 2013-04-24 日本瑞翁株式会社 等离子体蚀刻方法
US8590705B2 (en) * 2010-06-11 2013-11-26 Air Products And Chemicals, Inc. Cylinder surface treated container for monochlorosilane
CN104388938A (zh) * 2014-11-05 2015-03-04 辽宁石油化工大学 一种铝合金焊丝的电化学抛光液及电化学抛光方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3010138U (ja) * 1994-10-13 1995-04-25 有限会社字多精密工業 ステンレス製ボンベ
JPH07197158A (ja) * 1993-12-28 1995-08-01 Mitsubishi Materials Corp Ｎｉ基合金とそれを用いた半導体製造装置用部材及び液晶製造装置用部材
JPH0885548A (ja) * 1994-09-20 1996-04-02 Iwatani Internatl Corp オゾンガス貯蔵容器
JP2000070705A (ja) * 1998-08-28 2000-03-07 Iwatani Internatl Corp フッ素含有ガスの供給ラインでの腐食生成物低減方法

Family Cites Families (15)

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Publication number Priority date Publication date Assignee Title
FR2138539B1 (https=) * 1971-05-27 1973-05-25 Alsthom
US3998180A (en) * 1975-04-07 1976-12-21 Union Carbide Corporation Vapor deposition apparatus including fluid transfer means
DE3614290A1 (de) * 1986-04-26 1987-10-29 Messer Griesheim Gmbh Druckgasbehaelter aus einer austenitischen stahllegierung
DE3617092A1 (de) * 1986-05-21 1987-11-26 Poligrat Gmbh Innenoberflaeche einer gasflasche und verfahren zu deren herstellung
JPH01261208A (ja) * 1988-04-11 1989-10-18 Mitsui Toatsu Chem Inc 三弗化窒素ガスの精製方法
US5009963A (en) * 1988-07-20 1991-04-23 Tadahiro Ohmi Metal material with film passivated by fluorination and apparatus composed of the metal material
EP0437110B1 (en) * 1990-01-08 2001-07-11 Lsi Logic Corporation Structure for filtering process gases for use with a chemical vapour deposition chamber
US5085745A (en) * 1990-11-07 1992-02-04 Liquid Carbonic Corporation Method for treating carbon steel cylinder
JPH0666400A (ja) * 1992-08-21 1994-03-08 Mitsui Toatsu Chem Inc フルオロシランガスの充填容器
US6557593B2 (en) * 1993-04-28 2003-05-06 Advanced Technology Materials, Inc. Refillable ampule and method re same
GB9724168D0 (en) * 1997-11-14 1998-01-14 Air Prod & Chem Gas control device and method of supplying gas
US6514346B1 (en) * 1998-03-25 2003-02-04 Neuco, Inc. Method and apparatus for inserting and propelling a coating device into and through live gas pipeline
US6343476B1 (en) * 1998-04-28 2002-02-05 Advanced Technology Materials, Inc. Gas storage and dispensing system comprising regulator interiorly disposed in fluid containment vessel and adjustable in situ therein
US6374860B2 (en) * 1998-10-16 2002-04-23 Daniel Industries, Inc. Integrated valve design for gas chromatograph
US6523615B2 (en) * 2000-03-31 2003-02-25 John Gandy Corporation Electropolishing method for oil field tubular goods and drill pipe

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07197158A (ja) * 1993-12-28 1995-08-01 Mitsubishi Materials Corp Ｎｉ基合金とそれを用いた半導体製造装置用部材及び液晶製造装置用部材
JPH0885548A (ja) * 1994-09-20 1996-04-02 Iwatani Internatl Corp オゾンガス貯蔵容器
JP3010138U (ja) * 1994-10-13 1995-04-25 有限会社字多精密工業 ステンレス製ボンベ
JP2000070705A (ja) * 1998-08-28 2000-03-07 Iwatani Internatl Corp フッ素含有ガスの供給ラインでの腐食生成物低減方法

Also Published As

Publication number Publication date
ZA200505303B (en) 2006-09-27
US20040188272A1 (en) 2004-09-30
EP1606437A1 (en) 2005-12-21
WO2004088004A1 (en) 2004-10-14
TW200500166A (en) 2005-01-01
CN1761774A (zh) 2006-04-19
KR20050114680A (ko) 2005-12-06
RU2005132824A (ru) 2006-02-20
CA2514527A1 (en) 2004-10-14

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