CA2006175A1 - Methode pour l'obtention d'une couche de caoutchouc de silicone a motif - Google Patents
Methode pour l'obtention d'une couche de caoutchouc de silicone a motifInfo
- Publication number
- CA2006175A1 CA2006175A1 CA2006175A CA2006175A CA2006175A1 CA 2006175 A1 CA2006175 A1 CA 2006175A1 CA 2006175 A CA2006175 A CA 2006175A CA 2006175 A CA2006175 A CA 2006175A CA 2006175 A1 CA2006175 A1 CA 2006175A1
- Authority
- CA
- Canada
- Prior art keywords
- silicone rubber
- rubber layer
- polyimide film
- patterned
- forming patterned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002379 silicone rubber Polymers 0.000 title abstract 4
- 239000004945 silicone rubber Substances 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 3
- 229920001721 polyimide Polymers 0.000 abstract 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 238000001459 lithography Methods 0.000 abstract 1
- 238000001020 plasma etching Methods 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 238000004528 spin coating Methods 0.000 abstract 1
Classifications
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- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31144—Etching the insulating layers by chemical or physical means using masks
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/312—Organic layers, e.g. photoresist
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- H01L2224/056—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Drying Of Semiconductors (AREA)
- Wire Bonding (AREA)
- Formation Of Insulating Films (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63-324492 | 1988-12-21 | ||
JP63324492A JP2597396B2 (ja) | 1988-12-21 | 1988-12-21 | シリコーンゴム膜のパターン形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2006175A1 true CA2006175A1 (fr) | 1990-06-21 |
CA2006175C CA2006175C (fr) | 1993-06-15 |
Family
ID=18166410
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002006175A Expired - Fee Related CA2006175C (fr) | 1988-12-21 | 1989-12-20 | Methode pour l'obtention d'une couche de caoutchouc de silicone a motif |
Country Status (3)
Country | Link |
---|---|
US (1) | US4988403A (fr) |
JP (1) | JP2597396B2 (fr) |
CA (1) | CA2006175C (fr) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE59009067D1 (de) * | 1990-04-27 | 1995-06-14 | Siemens Ag | Verfahren zur Herstellung einer Öffnung in einem Halbleiterschichtaufbau und dessen Verwendung zur Herstellung von Kontaktlöchern. |
JPH04261049A (ja) * | 1991-01-31 | 1992-09-17 | Mitsubishi Electric Corp | 半導体装置およびその製造方法 |
US5450286A (en) * | 1992-12-04 | 1995-09-12 | Parlex Corporation | Printed circuit having a dielectric covercoat |
SE9502258D0 (sv) * | 1995-06-21 | 1995-06-21 | Pharmacia Biotech Ab | Method for the manufacture of a membrane-containing microstructure |
FR2750250B1 (fr) * | 1996-06-20 | 1998-08-21 | Solaic Sa | Procede de protection d'une galette de circuits integres, et galette de circuits integres obtenue |
US20040102022A1 (en) * | 2002-11-22 | 2004-05-27 | Tongbi Jiang | Methods of fabricating integrated circuitry |
JP5644192B2 (ja) * | 2010-06-09 | 2014-12-24 | 住友電気工業株式会社 | 積層樹脂膜の形成方法及び半導体デバイスの製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3833436A (en) * | 1972-09-05 | 1974-09-03 | Buckbee Mears Co | Etching of polyimide films |
US4119483A (en) * | 1974-07-30 | 1978-10-10 | U.S. Philips Corporation | Method of structuring thin layers |
US4218283A (en) * | 1974-08-23 | 1980-08-19 | Hitachi, Ltd. | Method for fabricating semiconductor device and etchant for polymer resin |
JPS57149734A (en) * | 1981-03-12 | 1982-09-16 | Anelva Corp | Plasma applying working device |
JPS6020919B2 (ja) * | 1981-09-18 | 1985-05-24 | 住友電気工業株式会社 | 印刷配線板の製造方法 |
JPS61175919A (ja) * | 1985-01-29 | 1986-08-07 | Sharp Corp | 薄膜磁気ヘツドの製造方法 |
JPS61190947A (ja) * | 1985-02-19 | 1986-08-25 | Toshiba Corp | 微細パタ−ンの形成方法 |
JPS61222179A (ja) * | 1985-03-27 | 1986-10-02 | Nec Corp | 半導体装置 |
-
1988
- 1988-12-21 JP JP63324492A patent/JP2597396B2/ja not_active Expired - Fee Related
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1989
- 1989-12-19 US US07/452,360 patent/US4988403A/en not_active Expired - Lifetime
- 1989-12-20 CA CA002006175A patent/CA2006175C/fr not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US4988403A (en) | 1991-01-29 |
JP2597396B2 (ja) | 1997-04-02 |
JPH02168619A (ja) | 1990-06-28 |
CA2006175C (fr) | 1993-06-15 |
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