CA1100216A - Mode control of heterojunction injection lasers and method of fabrication - Google Patents

Mode control of heterojunction injection lasers and method of fabrication

Info

Publication number
CA1100216A
CA1100216A CA314,962A CA314962A CA1100216A CA 1100216 A CA1100216 A CA 1100216A CA 314962 A CA314962 A CA 314962A CA 1100216 A CA1100216 A CA 1100216A
Authority
CA
Canada
Prior art keywords
mesa
layers
layer
laser
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA314,962A
Other languages
English (en)
French (fr)
Inventor
William Streifer
Donald R. Scifres
Robert D. Burnham
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xerox Corp
Original Assignee
Xerox Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xerox Corp filed Critical Xerox Corp
Application granted granted Critical
Publication of CA1100216A publication Critical patent/CA1100216A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1028—Coupling to elements in the cavity, e.g. coupling to waveguides adjacent the active region, e.g. forward coupled [DFC] structures
    • H01S5/1032—Coupling to elements comprising an optical axis that is not aligned with the optical axis of the active region
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/822—Materials of the light-emitting regions
    • H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/065—Mode locking; Mode suppression; Mode selection ; Self pulsating
    • H01S5/0651—Mode control
    • H01S5/0653—Mode suppression, e.g. specific multimode
    • H01S5/0654—Single longitudinal mode emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1021—Coupled cavities
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/223—Buried stripe structure
    • H01S5/2232—Buried stripe structure with inner confining structure between the active layer and the lower electrode
    • H01S5/2234—Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface
    • H01S5/2235—Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface with a protrusion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
    • H01S5/4031—Edge-emitting structures

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
CA314,962A 1978-01-13 1978-10-30 Mode control of heterojunction injection lasers and method of fabrication Expired CA1100216A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US869,190 1978-01-13
US05/869,190 US4185256A (en) 1978-01-13 1978-01-13 Mode control of heterojunction injection lasers and method of fabrication

Publications (1)

Publication Number Publication Date
CA1100216A true CA1100216A (en) 1981-04-28

Family

ID=25353090

Family Applications (1)

Application Number Title Priority Date Filing Date
CA314,962A Expired CA1100216A (en) 1978-01-13 1978-10-30 Mode control of heterojunction injection lasers and method of fabrication

Country Status (4)

Country Link
US (1) US4185256A (enExample)
JP (3) JPS5846075B2 (enExample)
CA (1) CA1100216A (enExample)
NL (1) NL7900225A (enExample)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1127282A (en) * 1978-05-22 1982-07-06 Takashi Sugino Semiconductor laser and method of making the same
US4347486A (en) * 1979-10-12 1982-08-31 Rca Corporation Single filament semiconductor laser with large emitting area
US4347612A (en) * 1980-08-25 1982-08-31 Xerox Corporation Semiconductor injection laser for high speed modulation
JPS57115892A (en) * 1981-01-12 1982-07-19 Agency Of Ind Science & Technol Semiconductor laser element
NL8101409A (nl) * 1981-03-23 1982-10-18 Philips Nv Halfgeleiderlaser met tenminste twee stralingsbundels, en werkwijze ter vervaardiging daarvan.
JPS57170584A (en) * 1981-04-15 1982-10-20 Hitachi Ltd Semiconductor laser device
US4429395A (en) 1981-06-01 1984-01-31 Rca Corporation Semiconductor laser
JPS586191A (ja) * 1981-07-03 1983-01-13 Hitachi Ltd 半導体レ−ザ装置
JPS58132986A (ja) * 1982-02-03 1983-08-08 Hitachi Ltd 半導体レ−ザ装置
GB2129211B (en) * 1982-10-21 1987-01-14 Rca Corp Semiconductor laser and a method of making same
FR2535121B1 (fr) * 1982-10-25 1989-01-06 Rca Corp Laser a semi-conducteur et son procede de fabrication
JPS59181317A (ja) * 1983-03-31 1984-10-15 Sumitomo Electric Ind Ltd 光変調素子
NL8301331A (nl) * 1983-04-15 1984-11-01 Philips Nv Halfgeleiderinrichting voor het opwekken of versterken van electromagnetische straling en werkwijze ter vervaardiging daarvan.
JPS61102087A (ja) * 1984-10-25 1986-05-20 Sharp Corp 半導体レ−ザ装置
JPS61222188A (ja) * 1985-02-28 1986-10-02 Sharp Corp 半導体レ−ザアレイ素子
JPS6225485A (ja) * 1985-07-25 1987-02-03 Mitsubishi Electric Corp 半導体レ−ザ装置
JPS6235689A (ja) * 1985-08-09 1987-02-16 Sharp Corp 半導体レ−ザアレイ装置
JPS6297467U (enExample) * 1985-12-10 1987-06-22
US5087587A (en) * 1986-02-13 1992-02-11 Sharp Kabushiki Kaisha Epitaxial growth process for the production of a window semiconductor laser
JP2539406B2 (ja) * 1987-02-04 1996-10-02 株式会社日立製作所 固体光ピツクアツプ
JPH01199486A (ja) * 1988-07-15 1989-08-10 Hitachi Ltd 半導体レーザー素子
US4906837A (en) * 1988-09-26 1990-03-06 The Boeing Company Multi-channel waveguide optical sensor
DE59010811D1 (de) * 1989-09-01 1998-04-23 Siemens Ag Integriert optische Anordnung mit wenigstens einem auf einem Substrat aus Halbleitermaterial integrierten optischen Wellenleiter
FR2663435B1 (fr) * 1990-06-13 1992-09-11 Commissariat Energie Atomique Filtre optique spatial monomode integre et son procede de fabrication.
US5276699A (en) * 1992-11-05 1994-01-04 Eastman Kodak Company Depressed-index ridge waveguide laser diode containing a stabilizing region
US5307361A (en) * 1992-11-05 1994-04-26 Eastman Kodak Company Ridge waveguide laser diode with a depressed-index cladding layer
JPH09289352A (ja) * 1996-02-22 1997-11-04 Sharp Corp 半導体レーザ装置およびその製造方法
JP2009054636A (ja) * 2007-08-23 2009-03-12 Panasonic Corp 半導体レーザ装置の製造方法および半導体レーザバーの検査方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5411117B2 (enExample) * 1972-02-23 1979-05-11
US3993963A (en) * 1974-06-20 1976-11-23 Bell Telephone Laboratories, Incorporated Heterostructure devices, a light guiding layer having contiguous zones of different thickness and bandgap and method of making same
US3948583A (en) * 1974-12-09 1976-04-06 Bell Telephone Laboratories, Incorporated Isolation of passive devices and integration with active devices in optical waveguiding circuits
JPS5442592B2 (enExample) * 1975-02-18 1979-12-14
US3978426A (en) * 1975-03-11 1976-08-31 Bell Telephone Laboratories, Incorporated Heterostructure devices including tapered optical couplers
JPS5299792A (en) * 1976-02-18 1977-08-22 Agency Of Ind Science & Technol Production of semiconductor light emitting device
JPS52127085A (en) * 1976-04-16 1977-10-25 Hitachi Ltd Semiconductor laser
US4326176A (en) * 1976-04-16 1982-04-20 Hitachi, Ltd. Semiconductor laser device

Also Published As

Publication number Publication date
JPS5846075B2 (ja) 1983-10-14
JPS59988A (ja) 1984-01-06
US4185256A (en) 1980-01-22
JPS54101686A (en) 1979-08-10
JPS58222588A (ja) 1983-12-24
NL7900225A (nl) 1979-07-17
JPS6327879B2 (enExample) 1988-06-06

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Legal Events

Date Code Title Description
MKEX Expiry
MKEX Expiry

Effective date: 19980428