CA1061225A - Method of diffusing impurities in semiconductor bodies - Google Patents

Method of diffusing impurities in semiconductor bodies

Info

Publication number
CA1061225A
CA1061225A CA235,393A CA235393A CA1061225A CA 1061225 A CA1061225 A CA 1061225A CA 235393 A CA235393 A CA 235393A CA 1061225 A CA1061225 A CA 1061225A
Authority
CA
Canada
Prior art keywords
space
source
temperature
diffusion
passage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA235,393A
Other languages
English (en)
French (fr)
Other versions
CA235393S (en
Inventor
Robert Thevenon
Norbert Sirot
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of CA1061225A publication Critical patent/CA1061225A/en
Expired legal-status Critical Current

Links

Classifications

    • H10P95/00—
    • H10P32/12—
    • H10P32/171—

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
CA235,393A 1974-09-16 1975-09-11 Method of diffusing impurities in semiconductor bodies Expired CA1061225A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7431243A FR2284982A1 (fr) 1974-09-16 1974-09-16 Procede de diffusion d'impuretes dans des corps semiconducteurs

Publications (1)

Publication Number Publication Date
CA1061225A true CA1061225A (en) 1979-08-28

Family

ID=9143118

Family Applications (1)

Application Number Title Priority Date Filing Date
CA235,393A Expired CA1061225A (en) 1974-09-16 1975-09-11 Method of diffusing impurities in semiconductor bodies

Country Status (5)

Country Link
JP (1) JPS5238388B2 (enExample)
CA (1) CA1061225A (enExample)
DE (1) DE2540053C2 (enExample)
FR (1) FR2284982A1 (enExample)
GB (1) GB1515318A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5742008Y2 (enExample) * 1976-10-08 1982-09-16
FR2409791A1 (fr) * 1977-11-25 1979-06-22 Silicium Semiconducteur Ssc Appareils de dopage par diffusion de tranches semi-conductrices
FR2479278A1 (fr) * 1980-03-26 1981-10-02 Loic Henry Procede de diffusion d'impuretes dans un semiconducteur et dispositif pour la mise en oeuvre de ce procede
JPS60236471A (ja) * 1984-05-10 1985-11-25 新光電気工業株式会社 気密ガラス端子
JP2662318B2 (ja) * 1991-03-13 1997-10-08 株式会社日立製作所 半導体基体への不純物の拡散方法
WO2023121228A1 (ko) * 2021-12-20 2023-06-29 주식회사 에이치피에스피 웨이퍼의 박막에 대한 탄소 도핑 방법
CN114855261B (zh) * 2022-03-21 2025-01-24 西北工业大学 一种基于水平梯度凝固法生长化合物半导体单晶的气相掺杂方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2178751B1 (enExample) * 1972-04-05 1974-10-18 Radiotechnique Compelec

Also Published As

Publication number Publication date
DE2540053A1 (de) 1976-03-25
GB1515318A (en) 1978-06-21
FR2284982A1 (fr) 1976-04-09
JPS5238388B2 (enExample) 1977-09-28
FR2284982B1 (enExample) 1979-02-16
JPS5164371A (enExample) 1976-06-03
DE2540053C2 (de) 1983-12-01

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