BRPI0920600B1 - Método para deposição galvânica de uma camada de cromo resistente sobre uma superfície de substrato - Google Patents
Método para deposição galvânica de uma camada de cromo resistente sobre uma superfície de substrato Download PDFInfo
- Publication number
- BRPI0920600B1 BRPI0920600B1 BRPI0920600-0A BRPI0920600A BRPI0920600B1 BR PI0920600 B1 BRPI0920600 B1 BR PI0920600B1 BR PI0920600 A BRPI0920600 A BR PI0920600A BR PI0920600 B1 BRPI0920600 B1 BR PI0920600B1
- Authority
- BR
- Brazil
- Prior art keywords
- layer
- deposition
- substrate
- electrolyte
- chromium
- Prior art date
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 88
- 239000000758 substrate Substances 0.000 title claims abstract description 56
- 230000008021 deposition Effects 0.000 title claims abstract description 46
- 229910052804 chromium Inorganic materials 0.000 title claims abstract description 42
- 239000011651 chromium Substances 0.000 title claims abstract description 42
- 238000000034 method Methods 0.000 title claims abstract description 24
- 239000003792 electrolyte Substances 0.000 claims abstract description 47
- 238000000151 deposition Methods 0.000 abstract description 45
- 239000010410 layer Substances 0.000 description 73
- 230000007797 corrosion Effects 0.000 description 14
- 238000005260 corrosion Methods 0.000 description 14
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000005137 deposition process Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000004801 process automation Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/04—Removal of gases or vapours ; Gas or pressure control
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/003—Electroplating using gases, e.g. pressure influence
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/04—Electroplating with moving electrodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/625—Discontinuous layers, e.g. microcracked layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/10—Bearings
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP08018462.5A EP2180088B2 (de) | 2008-10-22 | 2008-10-22 | Verfahren zur galvanischen Abscheidung von Hartchromschichten |
| EP08018462.5 | 2008-10-22 | ||
| PCT/US2009/061683 WO2010048404A1 (en) | 2008-10-22 | 2009-10-22 | Method for galvanic deposition of hard chrome layers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| BRPI0920600A2 BRPI0920600A2 (pt) | 2015-12-22 |
| BRPI0920600B1 true BRPI0920600B1 (pt) | 2019-05-28 |
Family
ID=40427109
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0920600-0A BRPI0920600B1 (pt) | 2008-10-22 | 2009-10-22 | Método para deposição galvânica de uma camada de cromo resistente sobre uma superfície de substrato |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20110198226A1 (enExample) |
| EP (1) | EP2180088B2 (enExample) |
| JP (1) | JP5739341B2 (enExample) |
| KR (1) | KR101658254B1 (enExample) |
| CN (1) | CN102257184B (enExample) |
| BR (1) | BRPI0920600B1 (enExample) |
| ES (1) | ES2363566T5 (enExample) |
| PL (1) | PL2180088T5 (enExample) |
| WO (1) | WO2010048404A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2845928B1 (en) * | 2013-09-05 | 2019-11-06 | MacDermid Enthone Inc. | Aqueous electrolyte composition having a reduced airborne emission |
| US10557209B2 (en) * | 2014-12-19 | 2020-02-11 | Weber-Hydraulik Gmbh | Method for optically inscribing and/or marking round stock |
| DE102020105003A1 (de) * | 2020-02-26 | 2021-08-26 | Federal-Mogul Burscheid Gmbh | Kolbenring mit Hartchromschicht und verbessertem Einlaufverhalten |
| US11566679B2 (en) * | 2020-11-03 | 2023-01-31 | DRiV Automotive Inc. | Bumper cap for damper |
| CN114703516A (zh) * | 2021-12-14 | 2022-07-05 | 西安昆仑工业（集团）有限责任公司 | 一种火炮身管快速镀铬工艺方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE494578A (enExample) | 1949-03-18 | |||
| FI53841C (fi) | 1975-05-07 | 1978-08-10 | Teuvo Tapio Korpi | Elektrolytisk ytbelaeggningsanordning |
| FR2462490A1 (fr) * | 1979-08-03 | 1981-02-13 | Centre Techn Ind Mecanique | Dispositif de revetement electrolytique |
| US4261086A (en) | 1979-09-04 | 1981-04-14 | Ford Motor Company | Method for manufacturing variable capacitance pressure transducers |
| JPS62263991A (ja) * | 1986-05-07 | 1987-11-16 | Adachi Shin Sangyo Kk | 鍍金物製造法 |
| JPH02217429A (ja) * | 1989-02-17 | 1990-08-30 | Fujitsu Ltd | メッキ方法および装置 |
| US5277785A (en) | 1992-07-16 | 1994-01-11 | Anglen Erik S Van | Method and apparatus for depositing hard chrome coatings by brush plating |
| US20010054557A1 (en) | 1997-06-09 | 2001-12-27 | E. Jennings Taylor | Electroplating of metals using pulsed reverse current for control of hydrogen evolution |
| JP3918142B2 (ja) † | 1998-11-06 | 2007-05-23 | 株式会社日立製作所 | クロムめっき部品、クロムめっき方法およびクロムめっき部品の製造方法 |
| USRE40386E1 (en) * | 1998-11-06 | 2008-06-17 | Hitachi Ltd. | Chrome plated parts and chrome plating method |
| JP2002047595A (ja) * | 2000-07-31 | 2002-02-15 | Tokico Ltd | クロムめっき方法およびクロムめっき装置 |
| JP3423702B2 (ja) | 2000-08-29 | 2003-07-07 | 創輝株式会社 | 金属めっき方法 |
| JP2007077494A (ja) * | 2005-08-08 | 2007-03-29 | Nanofilm Technologies Internatl Pte Ltd | 金属コーティング |
-
2008
- 2008-10-22 EP EP08018462.5A patent/EP2180088B2/de active Active
- 2008-10-22 PL PL08018462T patent/PL2180088T5/pl unknown
- 2008-10-22 ES ES08018462T patent/ES2363566T5/es active Active
-
2009
- 2009-10-22 WO PCT/US2009/061683 patent/WO2010048404A1/en not_active Ceased
- 2009-10-22 US US13/125,622 patent/US20110198226A1/en not_active Abandoned
- 2009-10-22 BR BRPI0920600-0A patent/BRPI0920600B1/pt active IP Right Grant
- 2009-10-22 JP JP2011533333A patent/JP5739341B2/ja active Active
- 2009-10-22 CN CN200980151479.6A patent/CN102257184B/zh active Active
- 2009-10-22 KR KR1020117011605A patent/KR101658254B1/ko active Active
Also Published As
| Publication number | Publication date |
|---|---|
| EP2180088B2 (de) | 2019-06-12 |
| PL2180088T3 (pl) | 2011-09-30 |
| EP2180088B1 (de) | 2011-05-11 |
| EP2180088A1 (de) | 2010-04-28 |
| PL2180088T5 (pl) | 2020-11-16 |
| CN102257184B (zh) | 2014-01-15 |
| WO2010048404A1 (en) | 2010-04-29 |
| JP5739341B2 (ja) | 2015-06-24 |
| KR101658254B1 (ko) | 2016-09-20 |
| BRPI0920600A2 (pt) | 2015-12-22 |
| CN102257184A (zh) | 2011-11-23 |
| KR20110075028A (ko) | 2011-07-05 |
| ES2363566T5 (es) | 2020-04-16 |
| US20110198226A1 (en) | 2011-08-18 |
| JP2012506496A (ja) | 2012-03-15 |
| ES2363566T3 (es) | 2011-08-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20240410073A1 (en) | Articles including surface coatings on external surfaces, internal surfaces or both | |
| CN102560591B (zh) | 一种微弧氧化电解液及微弧氧化方法 | |
| CN101042044B (zh) | 抽油杆或抽油管电镀铁镍/钨合金双层镀层及其表面处理工艺 | |
| US8337687B2 (en) | Structured chrome solid particle layer and method for the production thereof | |
| BRPI0920600B1 (pt) | Método para deposição galvânica de uma camada de cromo resistente sobre uma superfície de substrato | |
| CN103882492B (zh) | 金属基体化学镀前处理方法 | |
| CN102605402A (zh) | 铝合金制品表面耐磨增韧型复合陶瓷层的制备方法 | |
| CN107937961A (zh) | 微弧氧化结合脉冲电沉积封孔的铝合金表面处理方法及脉冲电沉积封孔装置 | |
| TW200923129A (en) | Method of coating metallic material | |
| CN104313667A (zh) | TC4钛合金表面制备ZrO2/Cu复合镀层的方法 | |
| BRPI0315192B1 (pt) | método para produzir uma camada estruturada de cromo duro. | |
| CN100441749C (zh) | 耐磨镍磷功能梯度镀层的制备方法 | |
| Jin et al. | Preparation of tubing inner surface reinforced layer by inert anode assisted jet electrodeposition | |
| CN104195606B (zh) | 一种厚层镍‑铁‑钨三元合金镀层及其制备方法 | |
| CN103045998B (zh) | 一种含有CrNiTiAlN五元涂层的制品的制备方法 | |
| CN210176975U (zh) | 一种镉钴合金及三价铬钝化的镀层结构 | |
| Low et al. | Multifunctional nanostructured metallic coatings by electrodeposition | |
| EP4634429A1 (en) | Valves including surface coatings | |
| CN101460664B (zh) | 次膦酸和/或膦酸在氧化还原法中的用途 | |
| CN109811385A (zh) | 铝及铝合金表面聚偏氟乙烯/氧化铝复合膜及其制备方法 | |
| KR20240064581A (ko) | 니켈 합금 전기 도금용 조성물 | |
| Liu et al. | One-Step Modulation of Pores to Enhance the Corrosion Resistance of Plasma Electrolytic Oxide Coatings | |
| CN118456727A (zh) | 一种微注塑成型复合模具嵌件的制备方法 | |
| EP4633904A1 (en) | Molds and dies including surface coatings | |
| Chang et al. | Multi-Layer Coating for Optical Mold of Strengthening by Electroplating Ni-W and Electroless Plating Ni-Mo-P by Nonisothermal Method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
| B06T | Formal requirements before examination [chapter 6.20 patent gazette] |
Free format text: O DEPOSITANTE DEVE RESPONDER A EXIGENCIA FORMULADA NESTE PARECER POR MEIO DO SERVICO DE CODIGO 206 EM ATE 60 (SESSENTA) DIAS, A PARTIR DA DATA DE PUBLICACAO NA RPI, SOB PENA DO ARQUIVAMENTO DO PEDIDO, DE ACORDO COM O ART. 34 DA LPI.PUBLIQUE-SE A EXIGENCIA (6.20). |
|
| B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
| B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 22/10/2009, OBSERVADAS AS CONDICOES LEGAIS. (CO) 20 (VINTE) ANOS CONTADOS A PARTIR DE 22/10/2009, OBSERVADAS AS CONDICOES LEGAIS |
|
| B25I | Requirement for requested change of headquarter |
Owner name: ENTHONE INC. (US) Free format text: A FIM DE ATENDER A ALTERACAO DE ENDERECO REQUERIDA ATRAVES DA PETICAO 870190056622 DE 18/06/2019, E NECESSARIO O RECOLHIMENTO DE UMA GUIA 248, ALEM DA GUIA 207 DE CUMPRIMENTO DE EXIGENCIA, PARA A EXECUCAO DO SERVICO, POIS FORAM SOLICITADOS DOIS SERVICOS, UMA ALTERACAO DENOME E UMA ALTERACAO DE ENDERECO, E APENAS UMA GUIA 248 FOI RECOLHIDA. |
|
| B25L | Entry of change of name and/or headquarter and transfer of application, patent and certificate of addition of invention: publication cancelled |
Owner name: ENTHONE INC. (US) Free format text: ANULADA A PUBLICACAO CODIGO 25.9 NA RPI NO 2543 DE 01/10/2019 POR TER SIDO INDEVIDA. |
|
| B25D | Requested change of name of applicant approved |
Owner name: MACDERMID ENTHONE INC. (US) |
|
| B25G | Requested change of headquarter approved |
Owner name: MACDERMID ENTHONE INC. (US) |