KR101658254B1 - 경질 크롬 층의 갈바니 침착 방법 - Google Patents

경질 크롬 층의 갈바니 침착 방법 Download PDF

Info

Publication number
KR101658254B1
KR101658254B1 KR1020117011605A KR20117011605A KR101658254B1 KR 101658254 B1 KR101658254 B1 KR 101658254B1 KR 1020117011605 A KR1020117011605 A KR 1020117011605A KR 20117011605 A KR20117011605 A KR 20117011605A KR 101658254 B1 KR101658254 B1 KR 101658254B1
Authority
KR
South Korea
Prior art keywords
layer
chromium
substrate surface
deposited
hard
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020117011605A
Other languages
English (en)
Korean (ko)
Other versions
KR20110075028A (ko
Inventor
헬무트 호스트헴케
Original Assignee
엔쏜 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=40427109&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR101658254(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 엔쏜 인코포레이티드 filed Critical 엔쏜 인코포레이티드
Publication of KR20110075028A publication Critical patent/KR20110075028A/ko
Application granted granted Critical
Publication of KR101658254B1 publication Critical patent/KR101658254B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/04—Removal of gases or vapours ; Gas or pressure control
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/003—Electroplating using gases, e.g. pressure influence
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/625—Discontinuous layers, e.g. microcracked layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/10—Bearings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
KR1020117011605A 2008-10-22 2009-10-22 경질 크롬 층의 갈바니 침착 방법 Active KR101658254B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08018462.5A EP2180088B2 (de) 2008-10-22 2008-10-22 Verfahren zur galvanischen Abscheidung von Hartchromschichten
EP08018462.5 2008-10-22
PCT/US2009/061683 WO2010048404A1 (en) 2008-10-22 2009-10-22 Method for galvanic deposition of hard chrome layers

Publications (2)

Publication Number Publication Date
KR20110075028A KR20110075028A (ko) 2011-07-05
KR101658254B1 true KR101658254B1 (ko) 2016-09-20

Family

ID=40427109

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020117011605A Active KR101658254B1 (ko) 2008-10-22 2009-10-22 경질 크롬 층의 갈바니 침착 방법

Country Status (9)

Country Link
US (1) US20110198226A1 (enExample)
EP (1) EP2180088B2 (enExample)
JP (1) JP5739341B2 (enExample)
KR (1) KR101658254B1 (enExample)
CN (1) CN102257184B (enExample)
BR (1) BRPI0920600B1 (enExample)
ES (1) ES2363566T5 (enExample)
PL (1) PL2180088T5 (enExample)
WO (1) WO2010048404A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2845928B1 (en) * 2013-09-05 2019-11-06 MacDermid Enthone Inc. Aqueous electrolyte composition having a reduced airborne emission
CA2970332C (en) * 2014-12-19 2019-03-12 Weber-Hydraulik Gmbh Method for optically inscribing and/or marking round stock
DE102020105003A1 (de) * 2020-02-26 2021-08-26 Federal-Mogul Burscheid Gmbh Kolbenring mit Hartchromschicht und verbessertem Einlaufverhalten
US11566679B2 (en) * 2020-11-03 2023-01-31 DRiV Automotive Inc. Bumper cap for damper
CN114703516A (zh) * 2021-12-14 2022-07-05 西安昆仑工业（集团）有限责任公司 一种火炮身管快速镀铬工艺方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1551340A (en) 1975-05-07 1979-08-30 Kursi F J Method of electroplating
US20010054557A1 (en) 1997-06-09 2001-12-27 E. Jennings Taylor Electroplating of metals using pulsed reverse current for control of hydrogen evolution

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE494578A (enExample) 1949-03-18
FR2462490A1 (fr) * 1979-08-03 1981-02-13 Centre Techn Ind Mecanique Dispositif de revetement electrolytique
US4261086A (en) 1979-09-04 1981-04-14 Ford Motor Company Method for manufacturing variable capacitance pressure transducers
JPS62263991A (ja) * 1986-05-07 1987-11-16 Adachi Shin Sangyo Kk 鍍金物製造法
JPH02217429A (ja) * 1989-02-17 1990-08-30 Fujitsu Ltd メッキ方法および装置
US5277785A (en) 1992-07-16 1994-01-11 Anglen Erik S Van Method and apparatus for depositing hard chrome coatings by brush plating
JP3918142B2 (ja) † 1998-11-06 2007-05-23 株式会社日立製作所 クロムめっき部品、クロムめっき方法およびクロムめっき部品の製造方法
USRE40386E1 (en) * 1998-11-06 2008-06-17 Hitachi Ltd. Chrome plated parts and chrome plating method
JP2002047595A (ja) * 2000-07-31 2002-02-15 Tokico Ltd クロムめっき方法およびクロムめっき装置
JP3423702B2 (ja) * 2000-08-29 2003-07-07 創輝株式会社 金属めっき方法
SG130126A1 (en) * 2005-08-08 2007-03-20 Nanofilm Technologies Int Metal coatings

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1551340A (en) 1975-05-07 1979-08-30 Kursi F J Method of electroplating
US20010054557A1 (en) 1997-06-09 2001-12-27 E. Jennings Taylor Electroplating of metals using pulsed reverse current for control of hydrogen evolution

Also Published As

Publication number Publication date
CN102257184A (zh) 2011-11-23
JP5739341B2 (ja) 2015-06-24
EP2180088A1 (de) 2010-04-28
BRPI0920600B1 (pt) 2019-05-28
ES2363566T3 (es) 2011-08-09
EP2180088B2 (de) 2019-06-12
PL2180088T5 (pl) 2020-11-16
EP2180088B1 (de) 2011-05-11
US20110198226A1 (en) 2011-08-18
PL2180088T3 (pl) 2011-09-30
WO2010048404A1 (en) 2010-04-29
ES2363566T5 (es) 2020-04-16
CN102257184B (zh) 2014-01-15
BRPI0920600A2 (pt) 2015-12-22
KR20110075028A (ko) 2011-07-05
JP2012506496A (ja) 2012-03-15

Similar Documents

Publication Publication Date Title
Zhao et al. Corrosion mechanism of NiCrBSi coatings deposited by HVOF
US20230151871A1 (en) Shock absorbers including surface coatings
KR101658254B1 (ko) 경질 크롬 층의 갈바니 침착 방법
JP5403816B2 (ja) Ｄｌｃ膜被覆部材およびその製造方法
TWI763777B (zh) 自具有降低之有機浴添加劑劣化的鹼性塗覆浴電流沉積鋅及鋅合金塗層的方法
AU737350B2 (en) Electro-plating process
Mazur et al. Analysis of chemical nickel-plating process
CN110453261B (zh) 一种基于电化学的材料表面改性方法与装置
CN209779038U (zh) 一种不锈钢基耐蚀耐磨涂层结构的生产系统
KR101981672B1 (ko) 부식방지 유압실린더의 제조방법
Jędrusik et al. Characterisation of oxide coatings produced on aluminum alloys by MAO and chemical methods
JP2002047595A (ja) クロムめっき方法およびクロムめっき装置
JP5205606B2 (ja) Ｄｌｃ膜被覆部材およびその製造方法
Trisnanto et al. Fabrication of superhydrophobic CuO coating on steel by electrodeposition modified with stearic acid
Hyie et al. Comparison of Different Surface Pre-Treatment on Mild Steel for Cobalt-Nickel-Iron Electroplating.
Koay et al. Comparison of different surface pre-treatment on mild steel for cobalt-nickel-iron electroplating/Koay Mei Hyie…[et al.]
CN107779807A (zh) 一种电弧喷涂防腐涂层的方法
KR20190034910A (ko) 마그네슘계 금속의 표면 처리 방법
Protsenko Electrochemical Corrosion Behavior and Protective Properties of Coatings Deposited from Deep Eutectic Solvents-Assisted Plating Baths
CN117661066A (zh) 一种铝材表面制作的加工方法
JP2015071808A (ja) 耐食性に優れたｄｌｃ膜被覆部材およびその製造方法
KR20030052921A (ko) 연속 용융알루미늄 도금에 사용되는 포트 롤
Morks et al. Microstructural, Corrosion Behavior and

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20110520

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20141022

Comment text: Request for Examination of Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20151128

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20160621

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20160909

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20160909

End annual number: 3

Start annual number: 1

PG1601 Publication of registration
FPAY Annual fee payment

Payment date: 20190829

Year of fee payment: 4

PR1001 Payment of annual fee

Payment date: 20190829

Start annual number: 4

End annual number: 4

PR1001 Payment of annual fee

Payment date: 20200901

Start annual number: 5

End annual number: 5

PR1001 Payment of annual fee

Payment date: 20210820

Start annual number: 6

End annual number: 6

PR1001 Payment of annual fee

Payment date: 20220822

Start annual number: 7

End annual number: 7

PR1001 Payment of annual fee

Payment date: 20230828

Start annual number: 8

End annual number: 8

PR1001 Payment of annual fee

Payment date: 20240826

Start annual number: 9

End annual number: 9