JP5739341B2 - 基板表面に硬質クロム層を沈着する方法及び該硬質クロム層を表面に有してなる基板 - Google Patents

基板表面に硬質クロム層を沈着する方法及び該硬質クロム層を表面に有してなる基板 Download PDF

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Publication number
JP5739341B2
JP5739341B2 JP2011533333A JP2011533333A JP5739341B2 JP 5739341 B2 JP5739341 B2 JP 5739341B2 JP 2011533333 A JP2011533333 A JP 2011533333A JP 2011533333 A JP2011533333 A JP 2011533333A JP 5739341 B2 JP5739341 B2 JP 5739341B2
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layer
substrate surface
hard
chromium
electrolyte
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Japanese (ja)
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JP2012506496A5 (enExample
JP2012506496A (ja
Inventor
ホルストヘムケ，ヘルムート
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エンソン インコーポレイテッド
エンソン インコーポレイテッド
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/04—Removal of gases or vapours ; Gas or pressure control
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/003—Electroplating using gases, e.g. pressure influence
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/625—Discontinuous layers, e.g. microcracked layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/10—Bearings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
JP2011533333A 2008-10-22 2009-10-22 基板表面に硬質クロム層を沈着する方法及び該硬質クロム層を表面に有してなる基板 Active JP5739341B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08018462.5A EP2180088B2 (de) 2008-10-22 2008-10-22 Verfahren zur galvanischen Abscheidung von Hartchromschichten
EP08018462.5 2008-10-22
PCT/US2009/061683 WO2010048404A1 (en) 2008-10-22 2009-10-22 Method for galvanic deposition of hard chrome layers

Publications (3)

Publication Number Publication Date
JP2012506496A JP2012506496A (ja) 2012-03-15
JP2012506496A5 JP2012506496A5 (enExample) 2012-12-06
JP5739341B2 true JP5739341B2 (ja) 2015-06-24

Family

ID=40427109

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011533333A Active JP5739341B2 (ja) 2008-10-22 2009-10-22 基板表面に硬質クロム層を沈着する方法及び該硬質クロム層を表面に有してなる基板

Country Status (9)

Country Link
US (1) US20110198226A1 (enExample)
EP (1) EP2180088B2 (enExample)
JP (1) JP5739341B2 (enExample)
KR (1) KR101658254B1 (enExample)
CN (1) CN102257184B (enExample)
BR (1) BRPI0920600B1 (enExample)
ES (1) ES2363566T5 (enExample)
PL (1) PL2180088T5 (enExample)
WO (1) WO2010048404A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2845928B1 (en) * 2013-09-05 2019-11-06 MacDermid Enthone Inc. Aqueous electrolyte composition having a reduced airborne emission
US10557209B2 (en) * 2014-12-19 2020-02-11 Weber-Hydraulik Gmbh Method for optically inscribing and/or marking round stock
DE102020105003A1 (de) * 2020-02-26 2021-08-26 Federal-Mogul Burscheid Gmbh Kolbenring mit Hartchromschicht und verbessertem Einlaufverhalten
US11566679B2 (en) * 2020-11-03 2023-01-31 DRiV Automotive Inc. Bumper cap for damper
CN114703516A (zh) * 2021-12-14 2022-07-05 西安昆仑工业（集团）有限责任公司 一种火炮身管快速镀铬工艺方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE494578A (enExample) 1949-03-18
FI53841C (fi) 1975-05-07 1978-08-10 Teuvo Tapio Korpi Elektrolytisk ytbelaeggningsanordning
FR2462490A1 (fr) * 1979-08-03 1981-02-13 Centre Techn Ind Mecanique Dispositif de revetement electrolytique
US4261086A (en) 1979-09-04 1981-04-14 Ford Motor Company Method for manufacturing variable capacitance pressure transducers
JPS62263991A (ja) * 1986-05-07 1987-11-16 Adachi Shin Sangyo Kk 鍍金物製造法
JPH02217429A (ja) * 1989-02-17 1990-08-30 Fujitsu Ltd メッキ方法および装置
US5277785A (en) 1992-07-16 1994-01-11 Anglen Erik S Van Method and apparatus for depositing hard chrome coatings by brush plating
US20010054557A1 (en) 1997-06-09 2001-12-27 E. Jennings Taylor Electroplating of metals using pulsed reverse current for control of hydrogen evolution
JP3918142B2 (ja) † 1998-11-06 2007-05-23 株式会社日立製作所 クロムめっき部品、クロムめっき方法およびクロムめっき部品の製造方法
USRE40386E1 (en) * 1998-11-06 2008-06-17 Hitachi Ltd. Chrome plated parts and chrome plating method
JP2002047595A (ja) * 2000-07-31 2002-02-15 Tokico Ltd クロムめっき方法およびクロムめっき装置
JP3423702B2 (ja) 2000-08-29 2003-07-07 創輝株式会社 金属めっき方法
JP2007077494A (ja) * 2005-08-08 2007-03-29 Nanofilm Technologies Internatl Pte Ltd 金属コーティング

Also Published As

Publication number Publication date
EP2180088B2 (de) 2019-06-12
PL2180088T3 (pl) 2011-09-30
EP2180088B1 (de) 2011-05-11
EP2180088A1 (de) 2010-04-28
PL2180088T5 (pl) 2020-11-16
CN102257184B (zh) 2014-01-15
BRPI0920600B1 (pt) 2019-05-28
WO2010048404A1 (en) 2010-04-29
KR101658254B1 (ko) 2016-09-20
BRPI0920600A2 (pt) 2015-12-22
CN102257184A (zh) 2011-11-23
KR20110075028A (ko) 2011-07-05
ES2363566T5 (es) 2020-04-16
US20110198226A1 (en) 2011-08-18
JP2012506496A (ja) 2012-03-15
ES2363566T3 (es) 2011-08-09

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