ES2363566T5 - Procedimiento para la deposición galvánica de capas de cromo duro - Google Patents
Procedimiento para la deposición galvánica de capas de cromo duro Download PDFInfo
- Publication number
- ES2363566T5 ES2363566T5 ES08018462T ES08018462T ES2363566T5 ES 2363566 T5 ES2363566 T5 ES 2363566T5 ES 08018462 T ES08018462 T ES 08018462T ES 08018462 T ES08018462 T ES 08018462T ES 2363566 T5 ES2363566 T5 ES 2363566T5
- Authority
- ES
- Spain
- Prior art keywords
- layer
- chromium
- deposition
- substrate
- electrolyte
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims description 81
- 229910052804 chromium Inorganic materials 0.000 title claims description 55
- 239000011651 chromium Substances 0.000 title claims description 55
- 230000008021 deposition Effects 0.000 title claims description 48
- 238000000034 method Methods 0.000 title claims description 21
- 239000000758 substrate Substances 0.000 claims description 42
- 239000003792 electrolyte Substances 0.000 claims description 40
- 230000007613 environmental effect Effects 0.000 claims description 2
- 230000007797 corrosion Effects 0.000 description 12
- 238000005260 corrosion Methods 0.000 description 12
- 229910052739 hydrogen Inorganic materials 0.000 description 9
- 239000001257 hydrogen Substances 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000003860 storage Methods 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000000994 depressogenic effect Effects 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- LEYNFUIKYCSXFM-UHFFFAOYSA-N platinum tantalum Chemical compound [Ta][Pt][Ta] LEYNFUIKYCSXFM-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 238000004801 process automation Methods 0.000 description 1
- 238000010517 secondary reaction Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/04—Removal of gases or vapours ; Gas or pressure control
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/003—Electroplating using gases, e.g. pressure influence
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/04—Electroplating with moving electrodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/625—Discontinuous layers, e.g. microcracked layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/10—Bearings
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP08018462.5A EP2180088B2 (de) | 2008-10-22 | 2008-10-22 | Verfahren zur galvanischen Abscheidung von Hartchromschichten |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| ES2363566T3 ES2363566T3 (es) | 2011-08-09 |
| ES2363566T5 true ES2363566T5 (es) | 2020-04-16 |
Family
ID=40427109
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES08018462T Active ES2363566T5 (es) | 2008-10-22 | 2008-10-22 | Procedimiento para la deposición galvánica de capas de cromo duro |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20110198226A1 (enExample) |
| EP (1) | EP2180088B2 (enExample) |
| JP (1) | JP5739341B2 (enExample) |
| KR (1) | KR101658254B1 (enExample) |
| CN (1) | CN102257184B (enExample) |
| BR (1) | BRPI0920600B1 (enExample) |
| ES (1) | ES2363566T5 (enExample) |
| PL (1) | PL2180088T5 (enExample) |
| WO (1) | WO2010048404A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2845928B1 (en) * | 2013-09-05 | 2019-11-06 | MacDermid Enthone Inc. | Aqueous electrolyte composition having a reduced airborne emission |
| CA2970332C (en) * | 2014-12-19 | 2019-03-12 | Weber-Hydraulik Gmbh | Method for optically inscribing and/or marking round stock |
| DE102020105003A1 (de) * | 2020-02-26 | 2021-08-26 | Federal-Mogul Burscheid Gmbh | Kolbenring mit Hartchromschicht und verbessertem Einlaufverhalten |
| US11566679B2 (en) * | 2020-11-03 | 2023-01-31 | DRiV Automotive Inc. | Bumper cap for damper |
| CN114703516A (zh) * | 2021-12-14 | 2022-07-05 | 西安昆仑工业（集团）有限责任公司 | 一种火炮身管快速镀铬工艺方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE494578A (enExample) | 1949-03-18 | |||
| FI53841C (fi) | 1975-05-07 | 1978-08-10 | Teuvo Tapio Korpi | Elektrolytisk ytbelaeggningsanordning |
| FR2462490A1 (fr) * | 1979-08-03 | 1981-02-13 | Centre Techn Ind Mecanique | Dispositif de revetement electrolytique |
| US4261086A (en) | 1979-09-04 | 1981-04-14 | Ford Motor Company | Method for manufacturing variable capacitance pressure transducers |
| JPS62263991A (ja) * | 1986-05-07 | 1987-11-16 | Adachi Shin Sangyo Kk | 鍍金物製造法 |
| JPH02217429A (ja) * | 1989-02-17 | 1990-08-30 | Fujitsu Ltd | メッキ方法および装置 |
| US5277785A (en) | 1992-07-16 | 1994-01-11 | Anglen Erik S Van | Method and apparatus for depositing hard chrome coatings by brush plating |
| US20010054557A1 (en) | 1997-06-09 | 2001-12-27 | E. Jennings Taylor | Electroplating of metals using pulsed reverse current for control of hydrogen evolution |
| JP3918142B2 (ja) † | 1998-11-06 | 2007-05-23 | 株式会社日立製作所 | クロムめっき部品、クロムめっき方法およびクロムめっき部品の製造方法 |
| USRE40386E1 (en) * | 1998-11-06 | 2008-06-17 | Hitachi Ltd. | Chrome plated parts and chrome plating method |
| JP2002047595A (ja) * | 2000-07-31 | 2002-02-15 | Tokico Ltd | クロムめっき方法およびクロムめっき装置 |
| JP3423702B2 (ja) * | 2000-08-29 | 2003-07-07 | 創輝株式会社 | 金属めっき方法 |
| SG130126A1 (en) * | 2005-08-08 | 2007-03-20 | Nanofilm Technologies Int | Metal coatings |
-
2008
- 2008-10-22 PL PL08018462T patent/PL2180088T5/pl unknown
- 2008-10-22 ES ES08018462T patent/ES2363566T5/es active Active
- 2008-10-22 EP EP08018462.5A patent/EP2180088B2/de active Active
-
2009
- 2009-10-22 JP JP2011533333A patent/JP5739341B2/ja active Active
- 2009-10-22 BR BRPI0920600-0A patent/BRPI0920600B1/pt active IP Right Grant
- 2009-10-22 KR KR1020117011605A patent/KR101658254B1/ko active Active
- 2009-10-22 WO PCT/US2009/061683 patent/WO2010048404A1/en not_active Ceased
- 2009-10-22 US US13/125,622 patent/US20110198226A1/en not_active Abandoned
- 2009-10-22 CN CN200980151479.6A patent/CN102257184B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR101658254B1 (ko) | 2016-09-20 |
| CN102257184A (zh) | 2011-11-23 |
| JP5739341B2 (ja) | 2015-06-24 |
| EP2180088A1 (de) | 2010-04-28 |
| BRPI0920600B1 (pt) | 2019-05-28 |
| ES2363566T3 (es) | 2011-08-09 |
| EP2180088B2 (de) | 2019-06-12 |
| PL2180088T5 (pl) | 2020-11-16 |
| EP2180088B1 (de) | 2011-05-11 |
| US20110198226A1 (en) | 2011-08-18 |
| PL2180088T3 (pl) | 2011-09-30 |
| WO2010048404A1 (en) | 2010-04-29 |
| CN102257184B (zh) | 2014-01-15 |
| BRPI0920600A2 (pt) | 2015-12-22 |
| KR20110075028A (ko) | 2011-07-05 |
| JP2012506496A (ja) | 2012-03-15 |
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