BRPI0513097A - processo e aparelho para a purificação de tetracloreto de silìcio ou tetracloreto de germánio contendo compostos de hidrogênio - Google Patents
processo e aparelho para a purificação de tetracloreto de silìcio ou tetracloreto de germánio contendo compostos de hidrogênioInfo
- Publication number
- BRPI0513097A BRPI0513097A BRPI0513097-2A BRPI0513097A BRPI0513097A BR PI0513097 A BRPI0513097 A BR PI0513097A BR PI0513097 A BRPI0513097 A BR PI0513097A BR PI0513097 A BRPI0513097 A BR PI0513097A
- Authority
- BR
- Brazil
- Prior art keywords
- tetrachloride
- silicon
- unit
- germanium
- germanium tetrachloride
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/10778—Purification
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G17/00—Compounds of germanium
- C01G17/04—Halides of germanium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00851—Additional features
- B01J2219/00853—Employing electrode arrangements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00925—Irradiation
- B01J2219/0093—Electric or magnetic energy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
- B01J2219/0809—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes employing two or more electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
- B01J2219/0815—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes involving stationary electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
- B01J2219/0824—Details relating to the shape of the electrodes
- B01J2219/0826—Details relating to the shape of the electrodes essentially linear
- B01J2219/083—Details relating to the shape of the electrodes essentially linear cylindrical
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
- B01J2219/0837—Details relating to the material of the electrodes
- B01J2219/0841—Metal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0845—Details relating to the type of discharge
- B01J2219/0847—Glow discharge
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0845—Details relating to the type of discharge
- B01J2219/0849—Corona pulse discharge
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0894—Processes carried out in the presence of a plasma
- B01J2219/0896—Cold plasma
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Silicon Compounds (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004037675A DE102004037675A1 (de) | 2004-08-04 | 2004-08-04 | Verfahren und Vorrichtung zur Reinigung von Wasserstoffverbindungen enthaltendem Siliciumtetrachlorid oder Germaniumtetrachlorid |
PCT/EP2005/052691 WO2006013129A1 (en) | 2004-08-04 | 2005-06-10 | Process and apparatus for purifying silicon tetrachloride or germanium tetrachloride containing hydrogen compounds |
Publications (2)
Publication Number | Publication Date |
---|---|
BRPI0513097A true BRPI0513097A (pt) | 2008-04-29 |
BRPI0513097B1 BRPI0513097B1 (pt) | 2016-01-19 |
Family
ID=34969451
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI0513097A BRPI0513097B1 (pt) | 2004-08-04 | 2005-06-10 | processo para tratamento de tetracloreto de silício ou tetracloreto de germânio contaminado com pelo menos um composto que contenha hidrogênio. |
Country Status (10)
Country | Link |
---|---|
US (1) | US8002954B2 (pt) |
EP (1) | EP1786731B1 (pt) |
JP (1) | JP5114198B2 (pt) |
KR (1) | KR101172927B1 (pt) |
CN (1) | CN100393618C (pt) |
AT (1) | ATE440074T1 (pt) |
BR (1) | BRPI0513097B1 (pt) |
DE (2) | DE102004037675A1 (pt) |
DK (1) | DK1786731T3 (pt) |
WO (1) | WO2006013129A1 (pt) |
Families Citing this family (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004008442A1 (de) * | 2004-02-19 | 2005-09-15 | Degussa Ag | Siliciumverbindungen für die Erzeugung von SIO2-haltigen Isolierschichten auf Chips |
DE102005041137A1 (de) * | 2005-08-30 | 2007-03-01 | Degussa Ag | Reaktor, Anlage und großtechnisches Verfahren zur kontinuierlichen Herstellung von hochreinem Siliciumtetrachlorid oder hochreinem Germaniumtetrachlorid |
CN100484361C (zh) * | 2006-02-24 | 2009-04-29 | 清华大学 | 基于缩放通道结构的大气压放电冷等离子体发生器及阵列 |
DE102006034061A1 (de) * | 2006-07-20 | 2008-01-24 | REV Renewable Energy Ventures, Inc., Aloha | Polysilanverarbeitung und Verwendung |
DE102007007874A1 (de) | 2007-02-14 | 2008-08-21 | Evonik Degussa Gmbh | Verfahren zur Herstellung höherer Silane |
DE102007013219A1 (de) * | 2007-03-15 | 2008-09-18 | Rev Renewable Energy Ventures, Inc. | Plasmagestützte Synthese |
DE102007014107A1 (de) * | 2007-03-21 | 2008-09-25 | Evonik Degussa Gmbh | Aufarbeitung borhaltiger Chlorsilanströme |
DE102007048937A1 (de) * | 2007-10-12 | 2009-04-16 | Evonik Degussa Gmbh | Entfernung von polaren organischen Verbindungen und Fremdmetallen aus Organosilanen |
DE102007050199A1 (de) * | 2007-10-20 | 2009-04-23 | Evonik Degussa Gmbh | Entfernung von Fremdmetallen aus anorganischen Silanen |
DE102007050573A1 (de) * | 2007-10-23 | 2009-04-30 | Evonik Degussa Gmbh | Großgebinde zur Handhabung und für den Transport von hochreinen und ultra hochreinen Chemikalien |
DE102007059170A1 (de) * | 2007-12-06 | 2009-06-10 | Evonik Degussa Gmbh | Katalysator und Verfahren zur Dismutierung von Wasserstoff enthaltenden Halogensilanen |
DE102008004396A1 (de) * | 2008-01-14 | 2009-07-16 | Evonik Degussa Gmbh | Anlage und Verfahren zur Verminderung des Gehaltes von Elementen, wie Bor, in Halogensilanen |
CN101269835B (zh) * | 2008-05-07 | 2010-06-09 | 云南驰宏锌锗股份有限公司 | 一种将光纤用四氯化锗中盐酸分离出来的装置 |
DE102008001851A1 (de) * | 2008-05-19 | 2009-11-26 | Evonik Degussa Gmbh | Verfahren zur Phasenumwandlung von Stoffen |
DE102008002537A1 (de) * | 2008-06-19 | 2009-12-24 | Evonik Degussa Gmbh | Verfahren zur Entfernung von Bor enthaltenden Verunreinigungen aus Halogensilanen sowie Anlage zur Durchführung des Verfahrens |
DE102008054537A1 (de) * | 2008-12-11 | 2010-06-17 | Evonik Degussa Gmbh | Entfernung von Fremdmetallen aus Siliciumverbindungen durch Adsorption und/oder Filtration |
CN101934212A (zh) * | 2009-06-30 | 2011-01-05 | 新疆天业(集团)有限公司 | 一种气-固/气-气相等离子体管式反应器工艺及装置 |
DE102009027730A1 (de) | 2009-07-15 | 2011-01-27 | Evonik Degussa Gmbh | Verahren und Verwendung von aminofunktionellen Harzen zur Dismutierung von Halogensilanen und zur Entfernung von Fremdmetallen |
DE102009053804B3 (de) | 2009-11-18 | 2011-03-17 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Hydridosilanen |
DE102010002342A1 (de) | 2010-02-25 | 2011-08-25 | Evonik Degussa GmbH, 45128 | Verwendung der spezifischen Widerstandsmessung zur indirekten Bestimmung der Reinheit von Silanen und Germanen und ein entsprechendes Verfahren |
CN101891243B (zh) * | 2010-06-10 | 2012-01-11 | 南京中锗科技股份有限公司 | 一种提纯四氯化锗的萃取工艺方法 |
CN102557042A (zh) * | 2010-12-24 | 2012-07-11 | 北京有色金属研究总院 | 一种四氯化硅中三氯氢硅杂质的去除方法 |
DE102011003453A1 (de) * | 2011-02-01 | 2012-08-02 | Wacker Chemie Ag | Verfahren zur destillativen Reinigung von Chlorsilanen |
DE102011004058A1 (de) | 2011-02-14 | 2012-08-16 | Evonik Degussa Gmbh | Monochlorsilan, Verfahren und Vorrichtung zu dessen Herstellung |
DE102011078942A1 (de) * | 2011-07-11 | 2013-01-17 | Evonik Degussa Gmbh | Verfahren zur Herstellung höherer Silane mit verbesserter Ausbeute |
CN102328951B (zh) * | 2011-07-13 | 2014-08-06 | 云南驰宏锌锗股份有限公司 | 一种去除四氯化锗中含氢杂质的方法及装置 |
CN103387237A (zh) * | 2012-05-10 | 2013-11-13 | 深圳市格林美高新技术股份有限公司 | 一种光纤废料资源化的方法 |
CN102659967B (zh) * | 2012-06-02 | 2014-07-09 | 悦康药业集团安徽天然制药有限公司 | 聚丙烯酸树脂乳胶液反应装置 |
KR101250092B1 (ko) * | 2012-06-13 | 2013-04-03 | 오씨아이머티리얼즈 주식회사 | 게르만 가스 제조 장치 및 이를 이용한 모노 게르만 가스 제조 방법 |
DE102013207447A1 (de) | 2013-04-24 | 2014-10-30 | Evonik Degussa Gmbh | Verfahren und Vorrichtung zur Herstellung von Octachlortrisilan |
CN103754428B (zh) * | 2014-01-14 | 2015-08-19 | 武汉云晶飞光纤材料有限公司 | 一种光纤用四氯化锗的灌装方法 |
WO2015128738A2 (en) * | 2014-02-18 | 2015-09-03 | King Abdullah University Of Science And Technology | Systems and methods for producing electrical discharges in compositions |
CN104556054B (zh) * | 2015-01-19 | 2017-03-29 | 新疆大全新能源有限公司 | 三氯氢硅合成料中轻组分的回收利用方法和装置 |
EP3088359B1 (de) * | 2015-04-28 | 2018-09-12 | Evonik Degussa GmbH | Verfahren zur herstellung von octachlortrisilan und höherer polychlorsilane unter verwertung von hexachlordisilan |
CN106730964A (zh) * | 2015-11-25 | 2017-05-31 | 衡阳恒荣高纯半导体材料有限公司 | 一种生产高纯四氯化锗的蒸馏装置 |
CN106744685B (zh) * | 2016-11-21 | 2018-10-23 | 亚洲硅业(青海)有限公司 | 电子级多晶硅生产中循环氢气的深度净化方法 |
EP3385223A1 (de) * | 2017-04-05 | 2018-10-10 | Evonik Degussa GmbH | Verfahren zur abtrennung von brom, jod, brom und/oder jod enthaltenden verbindungen aus chlorsilanen |
CN107055552B (zh) * | 2017-06-27 | 2018-08-07 | 亚洲硅业(青海)有限公司 | 一种四氯化硅的净化方法及应用 |
EP3533519B1 (en) * | 2018-02-28 | 2020-09-30 | Paris Sciences et Lettres - Quartier Latin | Biphasic plasma microreactor and method of using the same |
CN108686597B (zh) * | 2018-05-16 | 2020-06-02 | 亚洲硅业(青海)股份有限公司 | 一种气体放电反应器、气体放电系统及三氯氢硅的制备方法 |
CN112546659B (zh) * | 2020-12-08 | 2022-02-15 | 云南临沧鑫圆锗业股份有限公司 | 一种四氟化锗的提纯装置及方法 |
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US4372834A (en) * | 1981-06-19 | 1983-02-08 | Bell Telephone Laboratories, Incorporated | Purification process for compounds useful in optical fiber manufacture |
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DE3711444A1 (de) * | 1987-04-04 | 1988-10-13 | Huels Troisdorf | Verfahren und vorrichtung zur herstellung von dichlorsilan |
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DE19821156B4 (de) * | 1998-05-12 | 2006-04-06 | Degussa Ag | Verfahren zur Minderung von Resthalogengehalten und Farbzahlverbesserung in Alkoxysilanen oder Alkoxysilan-basierenden Zusammensetzungen und die Verwendung von Aktivkohle dazu |
DE19847786A1 (de) | 1998-10-16 | 2000-04-20 | Degussa | Vorrichtung und Verfahren zum Befüllen und Entleeren eines mit brennbarem sowie aggressivem Gas beaufschlagten Behälters |
DE19849196A1 (de) * | 1998-10-26 | 2000-04-27 | Degussa | Verfahren zur Neutralisation und Minderung von Resthalogengehalten in Alkoxysilanen oder Alkoxysilan-basierenden Zusammensetzungen |
EP0999214B1 (de) * | 1998-11-06 | 2004-12-08 | Degussa AG | Verfahren zur Herstellung von chloridarmen oder chloridfreien Alkoxysilanen |
DE19918114C2 (de) * | 1999-04-22 | 2002-01-03 | Degussa | Verfahren und Vorrichtung zur Herstellung von Vinylchlorsilanen |
DE19918115C2 (de) * | 1999-04-22 | 2002-01-03 | Degussa | Verfahren zur Herstellung von Vinylchlorsilanen |
DE19963433A1 (de) * | 1999-12-28 | 2001-07-12 | Degussa | Verfahren zur Abscheidung von Chlorsilanen aus Gasströmen |
DE10116007A1 (de) * | 2001-03-30 | 2002-10-02 | Degussa | Vorrichtung und Verfahren zur Herstellung von im Wesentlichen halogenfreien Trialkoxysilanen |
DE10124549A1 (de) * | 2001-05-19 | 2002-11-28 | Degussa | Verfahren zur selektiven katalytischen Reduktion von Stickoxiden mit Ammoniak im mageren Abgas eines Verbrennungsprozesses |
DE10124548A1 (de) * | 2001-05-19 | 2002-11-28 | Degussa | Verfahren zur selektiven katalytischen Reduktion von Stickoxiden mit Ammoniak im mageren Abgas eines Verbrennungsprozesses |
US6858196B2 (en) * | 2001-07-19 | 2005-02-22 | Asm America, Inc. | Method and apparatus for chemical synthesis |
DE10330022A1 (de) * | 2003-07-03 | 2005-01-20 | Degussa Ag | Verfahren zur Herstellung von Iow-k dielektrischen Filmen |
DE102004008442A1 (de) * | 2004-02-19 | 2005-09-15 | Degussa Ag | Siliciumverbindungen für die Erzeugung von SIO2-haltigen Isolierschichten auf Chips |
DE102004025766A1 (de) * | 2004-05-26 | 2005-12-22 | Degussa Ag | Herstellung von Organosilanestern |
DE102006003464A1 (de) * | 2006-01-25 | 2007-07-26 | Degussa Gmbh | Verfahren zur Erzeugung einer Siliciumschicht auf einer Substratoberfläche durch Gasphasenabscheidung |
DE102007023759A1 (de) * | 2006-08-10 | 2008-02-14 | Evonik Degussa Gmbh | Anlage und Verfahren zur kontinuierlichen industriellen Herstellung von Fluoralkylchlorsilan |
DE102007059170A1 (de) * | 2007-12-06 | 2009-06-10 | Evonik Degussa Gmbh | Katalysator und Verfahren zur Dismutierung von Wasserstoff enthaltenden Halogensilanen |
-
2004
- 2004-08-04 DE DE102004037675A patent/DE102004037675A1/de not_active Withdrawn
-
2005
- 2005-06-10 KR KR1020077001609A patent/KR101172927B1/ko active IP Right Grant
- 2005-06-10 DK DK05749314T patent/DK1786731T3/da active
- 2005-06-10 EP EP05749314A patent/EP1786731B1/en active Active
- 2005-06-10 CN CNB2005800009293A patent/CN100393618C/zh active Active
- 2005-06-10 JP JP2007524307A patent/JP5114198B2/ja not_active Expired - Fee Related
- 2005-06-10 DE DE602005016125T patent/DE602005016125D1/de active Active
- 2005-06-10 AT AT05749314T patent/ATE440074T1/de active
- 2005-06-10 US US11/659,084 patent/US8002954B2/en active Active
- 2005-06-10 BR BRPI0513097A patent/BRPI0513097B1/pt not_active IP Right Cessation
- 2005-06-10 WO PCT/EP2005/052691 patent/WO2006013129A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
KR101172927B1 (ko) | 2012-08-10 |
US20090020413A1 (en) | 2009-01-22 |
CN1842491A (zh) | 2006-10-04 |
CN100393618C (zh) | 2008-06-11 |
DK1786731T3 (da) | 2009-11-30 |
ATE440074T1 (de) | 2009-09-15 |
US8002954B2 (en) | 2011-08-23 |
KR20070043977A (ko) | 2007-04-26 |
EP1786731B1 (en) | 2009-08-19 |
JP2008509065A (ja) | 2008-03-27 |
DE602005016125D1 (de) | 2009-10-01 |
BRPI0513097B1 (pt) | 2016-01-19 |
DE102004037675A1 (de) | 2006-03-16 |
JP5114198B2 (ja) | 2013-01-09 |
EP1786731A1 (en) | 2007-05-23 |
WO2006013129A1 (en) | 2006-02-09 |
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