BR112015029937A8 - membro de fornecimento de potência e máquina de plaqueamento de alta velocidade dotada do mesmo - Google Patents

membro de fornecimento de potência e máquina de plaqueamento de alta velocidade dotada do mesmo Download PDF

Info

Publication number
BR112015029937A8
BR112015029937A8 BR112015029937A BR112015029937A BR112015029937A8 BR 112015029937 A8 BR112015029937 A8 BR 112015029937A8 BR 112015029937 A BR112015029937 A BR 112015029937A BR 112015029937 A BR112015029937 A BR 112015029937A BR 112015029937 A8 BR112015029937 A8 BR 112015029937A8
Authority
BR
Brazil
Prior art keywords
power supply
supply member
article
high speed
same
Prior art date
Application number
BR112015029937A
Other languages
English (en)
Other versions
BR112015029937A2 (pt
Inventor
Takamatsu Akira
Miyazaki Toshihisa
mochizuki Yoshitaka
Original Assignee
Kyb Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyb Corp filed Critical Kyb Corp
Publication of BR112015029937A2 publication Critical patent/BR112015029937A2/pt
Publication of BR112015029937A8 publication Critical patent/BR112015029937A8/pt

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/007Current directing devices
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/005Contacting devices
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06Suspending or supporting devices for articles to be coated
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10Electrodes, e.g. composition, counter electrode
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10Electrodes, e.g. composition, counter electrode
    • C25D17/12Shape or form
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/10Agitating of electrolytes; Moving of racks
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08Electroplating with moving electrolyte e.g. jet electroplating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

resumo patente de invenção: "membro de fornecimento de potência e máquina de plaqueamento de alta velocidade dotada do mesmo". trata-se de fornecer um membro de fornecimento de potência com capacidade de desejavelmente realizar plaqueamento por um longo período de tempo. um segundo membro de fornecimento de potência (30) é posto em contato com um artigo (1) para ser plaqueado para aplicar tensão negativa ao artigo (1). o artigo (1) é disposto em um estado de modo que um espaço em que uma solução de plaqueamento flui seja definido entre um ânodo (10) e o artigo (1). o segundo membro de fornecimento de potência (30) inclui um membro central (31) produzido a partir de cobre e um membro de cobertura (32) produzido a partir de titânio e que cobre pelo menos uma parte de uma periferia do membro central (31). a parte é umedecida com a solução de plaqueamento.
BR112015029937A 2013-06-14 2014-06-06 membro de fornecimento de potência e máquina de plaqueamento de alta velocidade dotada do mesmo BR112015029937A8 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013125556A JP6189656B2 (ja) 2013-06-14 2013-06-14 給電部材及びそれを備えた高速めっき装置
PCT/JP2014/065050 WO2014199908A1 (ja) 2013-06-14 2014-06-06 給電部材及びそれを備えた高速めっき装置

Publications (2)

Publication Number Publication Date
BR112015029937A2 BR112015029937A2 (pt) 2017-07-25
BR112015029937A8 true BR112015029937A8 (pt) 2019-12-31

Family

ID=52022204

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112015029937A BR112015029937A8 (pt) 2013-06-14 2014-06-06 membro de fornecimento de potência e máquina de plaqueamento de alta velocidade dotada do mesmo

Country Status (8)

Country Link
US (1) US10006143B2 (pt)
EP (1) EP3009536A4 (pt)
JP (1) JP6189656B2 (pt)
CN (1) CN105308222B (pt)
BR (1) BR112015029937A8 (pt)
MX (1) MX2015016099A (pt)
TW (1) TWI646224B (pt)
WO (1) WO2014199908A1 (pt)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6193005B2 (ja) 2013-06-14 2017-09-06 Kyb株式会社 保持装置及びそれを備えた高速めっき装置
JP7101229B2 (ja) * 2019-12-10 2022-07-14 エスケー ネクシリス カンパニー リミテッド メッキ設備用陰極アセンブリ
JP7394678B2 (ja) * 2020-03-26 2023-12-08 日立Astemo株式会社 ロッドの製造方法および陰極部材
JP7528508B2 (ja) * 2020-04-08 2024-08-06 オムロン株式会社 部分めっき装置

Family Cites Families (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3649477A (en) 1968-05-14 1972-03-14 Bart Mfg Co Electroplating large cylindrical tanks
US3960675A (en) * 1975-04-17 1976-06-01 Motter Printing Press Co. Method for deplating and replating rotogravure cylinders
JPS6046195B2 (ja) 1979-04-13 1985-10-15 ヤマハ発動機株式会社 高速メツキ装置
DE3011643A1 (de) * 1980-03-26 1981-10-01 Metallgesellschaft Ag, 6000 Frankfurt Elektrolysezelle
JPS57145999A (en) 1981-03-03 1982-09-09 Yamaha Motor Co Ltd Plating device
US4543172A (en) 1981-03-03 1985-09-24 Toshiyuki Suzuki High speed plating apparatus
JPS57158396A (en) * 1981-03-24 1982-09-30 Riken Corp Simultaneous plating method for inside and outside circumference of ring
CH666697A5 (de) * 1985-12-16 1988-08-15 Daetwyler Ag Vorrichtung zur galvanischen behandlung von druckzylindern.
JPS62164899A (ja) * 1986-01-14 1987-07-21 Tanaka Kikinzoku Kogyo Kk 導電用複合ブスバ−
EP0365767B1 (de) 1988-09-01 1993-05-19 Siemens Nixdorf Informationssysteme Aktiengesellschaft Galvanisiereinrichtung für plattenförmige Werkstücke, insbesondere Leiterplatten
DE3938160A1 (de) 1989-11-16 1991-05-23 Peroxid Chemie Gmbh Elektrolysezelle zur herstellung von peroxo- und perhalogenatverbindungen
US5458755A (en) 1992-11-09 1995-10-17 Canon Kabushiki Kaisha Anodization apparatus with supporting device for substrate to be treated
US5516415A (en) 1993-11-16 1996-05-14 Ontario Hydro Process and apparatus for in situ electroforming a structural layer of metal bonded to an internal wall of a metal tube
US5476578A (en) 1994-01-10 1995-12-19 Electroplating Technologies, Ltd. Apparatus for electroplating
JP3606932B2 (ja) * 1994-12-30 2005-01-05 石福金属興業株式会社 電解用複合電極
JPH0931686A (ja) * 1995-07-21 1997-02-04 Toshiba Corp 電気メッキ装置および電気メッキ方法
US6547936B1 (en) * 1996-11-22 2003-04-15 Chema Technology, Inc. Electroplating apparatus having a non-dissolvable anode
JP2000073197A (ja) 1998-08-31 2000-03-07 Dainippon Screen Mfg Co Ltd 基板メッキ装置
IT1303889B1 (it) * 1998-12-01 2001-03-01 Giovanna Angelini Procedimento ed apparecchiatura per la cromatura in continuo di barree relativa struttura di anodo
EP1031647A3 (en) 1999-02-19 2002-03-06 Solid State Equipment Corporation Apparatus and method for plating a wafer
JP3409003B2 (ja) * 1999-12-10 2003-05-19 新日本製鐵株式会社 電極及びそれを用いたSnメッキ装置
DE10102145B4 (de) 2000-01-19 2008-04-03 Suzuki Motor Corp., Hamamatsu Galvanisiervorbehandlungsvorrichtung und Galvanisierbehandlungsvorrichtung
US20020003092A1 (en) 2000-06-16 2002-01-10 Thomas Engert Process for the production of refractory metal plates and expanded metal grids platinized on one side
DE10029837B4 (de) 2000-06-16 2005-02-17 Degussa Galvanotechnik Gmbh Verfahren zur Herstellung von einseitig platinierten Platten und Streckmetallgittern aus Refraktärmetallen
US6547945B2 (en) * 2000-07-31 2003-04-15 United Technologies Corporation Method and apparatuses for electrochemically treating an article
JP3513657B2 (ja) 2001-03-05 2004-03-31 ダイソー株式会社 不溶性陽極
JP4595046B2 (ja) * 2001-03-27 2010-12-08 日本パーカライジング株式会社 りん酸塩皮膜処理装置及び化成皮膜処理装置
JP4038194B2 (ja) * 2004-03-03 2008-01-23 野▲崎▼工業株式会社 不溶性電極及びそれに使用される電極板並びにその使用方法
JP2006016651A (ja) 2004-06-30 2006-01-19 Shinko Electric Ind Co Ltd ウエハめっき用治具
JP2006131969A (ja) 2004-11-08 2006-05-25 Toshiba Ceramics Co Ltd 陽極化成方法及びその装置
ITMI20050373A1 (it) 2005-03-09 2006-09-10 Nora Elettrodi S P A Elettrodo cilindrico
JP4873695B2 (ja) 2006-04-14 2012-02-08 ダイソー株式会社 電着塗装用膜付き中空電極
CN201495306U (zh) 2009-04-10 2010-06-02 竞铭机械股份有限公司 电镀槽阴极导电铜板改进结构
CN201473614U (zh) 2009-04-29 2010-05-19 张国庆 生箔机阴极辊新型结构
IT1393960B1 (it) * 2009-05-05 2012-05-17 Plating Innovations S R L Finitura superficiale elettrolitica di barre in continuo.
JP5768995B2 (ja) 2010-03-26 2015-08-26 アイシン精機株式会社 部分表面処理装置
JP5467374B2 (ja) * 2011-08-25 2014-04-09 ユケン工業株式会社 軸体に電気めっきを形成するための装置、めっき皮膜を有する軸体の製造方法および軸体上に亜鉛系めっき皮膜を形成するためのめっき液
JP6189655B2 (ja) 2013-06-14 2017-08-30 Kyb株式会社 アノードの製造方法
JP6193005B2 (ja) 2013-06-14 2017-09-06 Kyb株式会社 保持装置及びそれを備えた高速めっき装置

Also Published As

Publication number Publication date
EP3009536A1 (en) 2016-04-20
CN105308222A (zh) 2016-02-03
TWI646224B (zh) 2019-01-01
US10006143B2 (en) 2018-06-26
CN105308222B (zh) 2018-03-13
MX2015016099A (es) 2017-08-24
TW201510289A (zh) 2015-03-16
BR112015029937A2 (pt) 2017-07-25
EP3009536A4 (en) 2017-03-22
US20160108540A1 (en) 2016-04-21
WO2014199908A1 (ja) 2014-12-18
JP2015001006A (ja) 2015-01-05
JP6189656B2 (ja) 2017-08-30

Similar Documents

Publication Publication Date Title
BR112015029937A8 (pt) membro de fornecimento de potência e máquina de plaqueamento de alta velocidade dotada do mesmo
SG11201807416YA (en) Substrate holder and plating apparatus
SG10201806376SA (en) Plating apparatus
BR112014012981A2 (pt) degradação eletrolítica controlada de ferramentas de fundo de poço
CA155960S (en) Combined computing device holder and dock
BR112014032897A2 (pt) métodos e aparelho para formar baterias impressas em dispositivos oftálmicos
TWD167921S (zh) 電鍍裝置用電氣接點
BR112014008627A2 (pt) cartucho para remoção de pelos com uma região de reentrância alongada
BR112018007174A2 (pt) instrumento para higiene bucal com saliências condutoras
BR112013029750A2 (pt) material ativo de eletrodo negativo para dispositivo elétrico
CA152710S (en) Electrical receptacle housing
BR112013029744A2 (pt) material ativo no eletrodo negativo para dispositivos elétricos
BR112013030035A2 (pt) material ativo para elétrodos negativos para dispositivo elétrico, elétrodo negativo para dispositivo elétrico e dispositivo elétrico
PH12016501005A1 (en) Anti-malodor oral care composition
BR112017001801A2 (pt) disposição para gerar um pulso de corrente zero para gerar uma passagem de corrente zero em um componente elétrico, e uso da disposição
BR112017007630A2 (pt) aparelho de galvanoplastia.
PL402029A1 (pl) Anoda, zwłaszcza do ogniw fotoelektrochemicznych, i zastosowanie materiału eutektycznego
BR112015030112A2 (pt) dispositivo de retenção e máquina de chapeamento de alta velocidade dotada do mesmo
BR112015030429A2 (pt) Anodo e máquina de chapeamento de alta velocidade provida com o mesmo
TWD174320S (zh) 電連接端子
MY179606A (en) Socket for electric component
TWD174324S (zh) 電連接端子
PE20160229A1 (es) Aleacion de zinc con firma electromagnetica unica y conductividad reducida
BR112015030249A2 (pt) eletrodo médico, e garra de membro para um dispositivo ecg
RU2010104263A (ru) Устройство для равноканального углового прессования металлов

Legal Events

Date Code Title Description
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06U Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette]
B11B Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements
B350 Update of information on the portal [chapter 15.35 patent gazette]