BR112015029937A8 - membro de fornecimento de potência e máquina de plaqueamento de alta velocidade dotada do mesmo - Google Patents
membro de fornecimento de potência e máquina de plaqueamento de alta velocidade dotada do mesmo Download PDFInfo
- Publication number
- BR112015029937A8 BR112015029937A8 BR112015029937A BR112015029937A BR112015029937A8 BR 112015029937 A8 BR112015029937 A8 BR 112015029937A8 BR 112015029937 A BR112015029937 A BR 112015029937A BR 112015029937 A BR112015029937 A BR 112015029937A BR 112015029937 A8 BR112015029937 A8 BR 112015029937A8
- Authority
- BR
- Brazil
- Prior art keywords
- power supply
- supply member
- article
- high speed
- same
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/007—Current directing devices
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/005—Contacting devices
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/10—Agitating of electrolytes; Moving of racks
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
resumo patente de invenção: "membro de fornecimento de potência e máquina de plaqueamento de alta velocidade dotada do mesmo". trata-se de fornecer um membro de fornecimento de potência com capacidade de desejavelmente realizar plaqueamento por um longo período de tempo. um segundo membro de fornecimento de potência (30) é posto em contato com um artigo (1) para ser plaqueado para aplicar tensão negativa ao artigo (1). o artigo (1) é disposto em um estado de modo que um espaço em que uma solução de plaqueamento flui seja definido entre um ânodo (10) e o artigo (1). o segundo membro de fornecimento de potência (30) inclui um membro central (31) produzido a partir de cobre e um membro de cobertura (32) produzido a partir de titânio e que cobre pelo menos uma parte de uma periferia do membro central (31). a parte é umedecida com a solução de plaqueamento.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013125556A JP6189656B2 (ja) | 2013-06-14 | 2013-06-14 | 給電部材及びそれを備えた高速めっき装置 |
PCT/JP2014/065050 WO2014199908A1 (ja) | 2013-06-14 | 2014-06-06 | 給電部材及びそれを備えた高速めっき装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
BR112015029937A2 BR112015029937A2 (pt) | 2017-07-25 |
BR112015029937A8 true BR112015029937A8 (pt) | 2019-12-31 |
Family
ID=52022204
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112015029937A BR112015029937A8 (pt) | 2013-06-14 | 2014-06-06 | membro de fornecimento de potência e máquina de plaqueamento de alta velocidade dotada do mesmo |
Country Status (8)
Country | Link |
---|---|
US (1) | US10006143B2 (pt) |
EP (1) | EP3009536A4 (pt) |
JP (1) | JP6189656B2 (pt) |
CN (1) | CN105308222B (pt) |
BR (1) | BR112015029937A8 (pt) |
MX (1) | MX2015016099A (pt) |
TW (1) | TWI646224B (pt) |
WO (1) | WO2014199908A1 (pt) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6193005B2 (ja) | 2013-06-14 | 2017-09-06 | Kyb株式会社 | 保持装置及びそれを備えた高速めっき装置 |
JP7101229B2 (ja) * | 2019-12-10 | 2022-07-14 | エスケー ネクシリス カンパニー リミテッド | メッキ設備用陰極アセンブリ |
JP7394678B2 (ja) * | 2020-03-26 | 2023-12-08 | 日立Astemo株式会社 | ロッドの製造方法および陰極部材 |
JP7528508B2 (ja) * | 2020-04-08 | 2024-08-06 | オムロン株式会社 | 部分めっき装置 |
Family Cites Families (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3649477A (en) | 1968-05-14 | 1972-03-14 | Bart Mfg Co | Electroplating large cylindrical tanks |
US3960675A (en) * | 1975-04-17 | 1976-06-01 | Motter Printing Press Co. | Method for deplating and replating rotogravure cylinders |
JPS6046195B2 (ja) | 1979-04-13 | 1985-10-15 | ヤマハ発動機株式会社 | 高速メツキ装置 |
DE3011643A1 (de) * | 1980-03-26 | 1981-10-01 | Metallgesellschaft Ag, 6000 Frankfurt | Elektrolysezelle |
JPS57145999A (en) | 1981-03-03 | 1982-09-09 | Yamaha Motor Co Ltd | Plating device |
US4543172A (en) | 1981-03-03 | 1985-09-24 | Toshiyuki Suzuki | High speed plating apparatus |
JPS57158396A (en) * | 1981-03-24 | 1982-09-30 | Riken Corp | Simultaneous plating method for inside and outside circumference of ring |
CH666697A5 (de) * | 1985-12-16 | 1988-08-15 | Daetwyler Ag | Vorrichtung zur galvanischen behandlung von druckzylindern. |
JPS62164899A (ja) * | 1986-01-14 | 1987-07-21 | Tanaka Kikinzoku Kogyo Kk | 導電用複合ブスバ− |
EP0365767B1 (de) | 1988-09-01 | 1993-05-19 | Siemens Nixdorf Informationssysteme Aktiengesellschaft | Galvanisiereinrichtung für plattenförmige Werkstücke, insbesondere Leiterplatten |
DE3938160A1 (de) | 1989-11-16 | 1991-05-23 | Peroxid Chemie Gmbh | Elektrolysezelle zur herstellung von peroxo- und perhalogenatverbindungen |
US5458755A (en) | 1992-11-09 | 1995-10-17 | Canon Kabushiki Kaisha | Anodization apparatus with supporting device for substrate to be treated |
US5516415A (en) | 1993-11-16 | 1996-05-14 | Ontario Hydro | Process and apparatus for in situ electroforming a structural layer of metal bonded to an internal wall of a metal tube |
US5476578A (en) | 1994-01-10 | 1995-12-19 | Electroplating Technologies, Ltd. | Apparatus for electroplating |
JP3606932B2 (ja) * | 1994-12-30 | 2005-01-05 | 石福金属興業株式会社 | 電解用複合電極 |
JPH0931686A (ja) * | 1995-07-21 | 1997-02-04 | Toshiba Corp | 電気メッキ装置および電気メッキ方法 |
US6547936B1 (en) * | 1996-11-22 | 2003-04-15 | Chema Technology, Inc. | Electroplating apparatus having a non-dissolvable anode |
JP2000073197A (ja) | 1998-08-31 | 2000-03-07 | Dainippon Screen Mfg Co Ltd | 基板メッキ装置 |
IT1303889B1 (it) * | 1998-12-01 | 2001-03-01 | Giovanna Angelini | Procedimento ed apparecchiatura per la cromatura in continuo di barree relativa struttura di anodo |
EP1031647A3 (en) | 1999-02-19 | 2002-03-06 | Solid State Equipment Corporation | Apparatus and method for plating a wafer |
JP3409003B2 (ja) * | 1999-12-10 | 2003-05-19 | 新日本製鐵株式会社 | 電極及びそれを用いたSnメッキ装置 |
DE10102145B4 (de) | 2000-01-19 | 2008-04-03 | Suzuki Motor Corp., Hamamatsu | Galvanisiervorbehandlungsvorrichtung und Galvanisierbehandlungsvorrichtung |
US20020003092A1 (en) | 2000-06-16 | 2002-01-10 | Thomas Engert | Process for the production of refractory metal plates and expanded metal grids platinized on one side |
DE10029837B4 (de) | 2000-06-16 | 2005-02-17 | Degussa Galvanotechnik Gmbh | Verfahren zur Herstellung von einseitig platinierten Platten und Streckmetallgittern aus Refraktärmetallen |
US6547945B2 (en) * | 2000-07-31 | 2003-04-15 | United Technologies Corporation | Method and apparatuses for electrochemically treating an article |
JP3513657B2 (ja) | 2001-03-05 | 2004-03-31 | ダイソー株式会社 | 不溶性陽極 |
JP4595046B2 (ja) * | 2001-03-27 | 2010-12-08 | 日本パーカライジング株式会社 | りん酸塩皮膜処理装置及び化成皮膜処理装置 |
JP4038194B2 (ja) * | 2004-03-03 | 2008-01-23 | 野▲崎▼工業株式会社 | 不溶性電極及びそれに使用される電極板並びにその使用方法 |
JP2006016651A (ja) | 2004-06-30 | 2006-01-19 | Shinko Electric Ind Co Ltd | ウエハめっき用治具 |
JP2006131969A (ja) | 2004-11-08 | 2006-05-25 | Toshiba Ceramics Co Ltd | 陽極化成方法及びその装置 |
ITMI20050373A1 (it) | 2005-03-09 | 2006-09-10 | Nora Elettrodi S P A | Elettrodo cilindrico |
JP4873695B2 (ja) | 2006-04-14 | 2012-02-08 | ダイソー株式会社 | 電着塗装用膜付き中空電極 |
CN201495306U (zh) | 2009-04-10 | 2010-06-02 | 竞铭机械股份有限公司 | 电镀槽阴极导电铜板改进结构 |
CN201473614U (zh) | 2009-04-29 | 2010-05-19 | 张国庆 | 生箔机阴极辊新型结构 |
IT1393960B1 (it) * | 2009-05-05 | 2012-05-17 | Plating Innovations S R L | Finitura superficiale elettrolitica di barre in continuo. |
JP5768995B2 (ja) | 2010-03-26 | 2015-08-26 | アイシン精機株式会社 | 部分表面処理装置 |
JP5467374B2 (ja) * | 2011-08-25 | 2014-04-09 | ユケン工業株式会社 | 軸体に電気めっきを形成するための装置、めっき皮膜を有する軸体の製造方法および軸体上に亜鉛系めっき皮膜を形成するためのめっき液 |
JP6189655B2 (ja) | 2013-06-14 | 2017-08-30 | Kyb株式会社 | アノードの製造方法 |
JP6193005B2 (ja) | 2013-06-14 | 2017-09-06 | Kyb株式会社 | 保持装置及びそれを備えた高速めっき装置 |
-
2013
- 2013-06-14 JP JP2013125556A patent/JP6189656B2/ja active Active
-
2014
- 2014-06-06 EP EP14810276.7A patent/EP3009536A4/en not_active Withdrawn
- 2014-06-06 WO PCT/JP2014/065050 patent/WO2014199908A1/ja active Application Filing
- 2014-06-06 US US14/897,186 patent/US10006143B2/en not_active Expired - Fee Related
- 2014-06-06 MX MX2015016099A patent/MX2015016099A/es unknown
- 2014-06-06 BR BR112015029937A patent/BR112015029937A8/pt not_active Application Discontinuation
- 2014-06-06 CN CN201480033950.2A patent/CN105308222B/zh active Active
- 2014-06-13 TW TW103120485A patent/TWI646224B/zh active
Also Published As
Publication number | Publication date |
---|---|
EP3009536A1 (en) | 2016-04-20 |
CN105308222A (zh) | 2016-02-03 |
TWI646224B (zh) | 2019-01-01 |
US10006143B2 (en) | 2018-06-26 |
CN105308222B (zh) | 2018-03-13 |
MX2015016099A (es) | 2017-08-24 |
TW201510289A (zh) | 2015-03-16 |
BR112015029937A2 (pt) | 2017-07-25 |
EP3009536A4 (en) | 2017-03-22 |
US20160108540A1 (en) | 2016-04-21 |
WO2014199908A1 (ja) | 2014-12-18 |
JP2015001006A (ja) | 2015-01-05 |
JP6189656B2 (ja) | 2017-08-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
B06U | Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette] | ||
B11B | Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements | ||
B350 | Update of information on the portal [chapter 15.35 patent gazette] |