MX2015016099A - Miembro de suministro de potencia, y dispositivo de platinado de alta velocidad provisto con el mismo. - Google Patents

Miembro de suministro de potencia, y dispositivo de platinado de alta velocidad provisto con el mismo.

Info

Publication number
MX2015016099A
MX2015016099A MX2015016099A MX2015016099A MX2015016099A MX 2015016099 A MX2015016099 A MX 2015016099A MX 2015016099 A MX2015016099 A MX 2015016099A MX 2015016099 A MX2015016099 A MX 2015016099A MX 2015016099 A MX2015016099 A MX 2015016099A
Authority
MX
Mexico
Prior art keywords
power
supply member
same
device provided
plating device
Prior art date
Application number
MX2015016099A
Other languages
English (en)
Inventor
mochizuki Yoshitaka
Miyazaki Toshihisa
Takamatsu Akira
Original Assignee
Kyb Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyb Corp filed Critical Kyb Corp
Publication of MX2015016099A publication Critical patent/MX2015016099A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/007—Current directing devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/005—Contacting devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06—Suspending or supporting devices for articles to be coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/10—Agitating of electrolytes; Moving of racks
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated

Abstract

Se provee un miembro de suministro de potencia de manera que es posible llevar a cabo favorablemente el platinado durante un largo tiempo. Un segundo miembro de suministro de potencia (30) se pone en contacto con un artículo (1) que será platinado, que se posiciona de manera que forma un espacio a través del cual fluye una solución de platinado entre el artículo y un ánodo (10), y aplica un voltaje negativo al mismo. El segundo miembro de suministro de potencia (30) comprende un miembro de núcleo de cobre (34), y un miembro de revestimiento de titanio (32) que está presente en la periferia del miembro de núcleo de cobre (31) y por lo menos cubre el área que se pone en contacto con el fluido de platinado.
MX2015016099A 2013-06-14 2014-06-06 Miembro de suministro de potencia, y dispositivo de platinado de alta velocidad provisto con el mismo. MX2015016099A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013125556A JP6189656B2 (ja) 2013-06-14 2013-06-14 給電部材及びそれを備えた高速めっき装置
PCT/JP2014/065050 WO2014199908A1 (ja) 2013-06-14 2014-06-06 給電部材及びそれを備えた高速めっき装置

Publications (1)

Publication Number Publication Date
MX2015016099A true MX2015016099A (es) 2017-08-24

Family

ID=52022204

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2015016099A MX2015016099A (es) 2013-06-14 2014-06-06 Miembro de suministro de potencia, y dispositivo de platinado de alta velocidad provisto con el mismo.

Country Status (8)

Country Link
US (1) US10006143B2 (es)
EP (1) EP3009536A4 (es)
JP (1) JP6189656B2 (es)
CN (1) CN105308222B (es)
BR (1) BR112015029937A8 (es)
MX (1) MX2015016099A (es)
TW (1) TWI646224B (es)
WO (1) WO2014199908A1 (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6193005B2 (ja) 2013-06-14 2017-09-06 Ｋｙｂ株式会社 保持装置及びそれを備えた高速めっき装置
JP7101229B2 (ja) * 2019-12-10 2022-07-14 エスケー ネクシリス カンパニー リミテッド メッキ設備用陰極アセンブリ
JP7394678B2 (ja) * 2020-03-26 2023-12-08 日立Astemo株式会社 ロッドの製造方法および陰極部材
JP2021165423A (ja) * 2020-04-08 2021-10-14 オムロン株式会社 部分めっき装置

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JP5768995B2 (ja) 2010-03-26 2015-08-26 アイシン精機株式会社 部分表面処理装置
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JP6189655B2 (ja) 2013-06-14 2017-08-30 Ｋｙｂ株式会社 アノードの製造方法
JP6193005B2 (ja) 2013-06-14 2017-09-06 Ｋｙｂ株式会社 保持装置及びそれを備えた高速めっき装置

Also Published As

Publication number Publication date
TW201510289A (zh) 2015-03-16
JP6189656B2 (ja) 2017-08-30
CN105308222B (zh) 2018-03-13
WO2014199908A1 (ja) 2014-12-18
EP3009536A4 (en) 2017-03-22
EP3009536A1 (en) 2016-04-20
TWI646224B (zh) 2019-01-01
US20160108540A1 (en) 2016-04-21
JP2015001006A (ja) 2015-01-05
BR112015029937A2 (pt) 2017-07-25
US10006143B2 (en) 2018-06-26
BR112015029937A8 (pt) 2019-12-31
CN105308222A (zh) 2016-02-03

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