BR112014018080A8 - Método de fabricação de um transdutor microusinado capacitivo, e, transdutor microusinado capacitivo - Google Patents
Método de fabricação de um transdutor microusinado capacitivo, e, transdutor microusinado capacitivoInfo
- Publication number
- BR112014018080A8 BR112014018080A8 BR112014018080A BR112014018080A BR112014018080A8 BR 112014018080 A8 BR112014018080 A8 BR 112014018080A8 BR 112014018080 A BR112014018080 A BR 112014018080A BR 112014018080 A BR112014018080 A BR 112014018080A BR 112014018080 A8 BR112014018080 A8 BR 112014018080A8
- Authority
- BR
- Brazil
- Prior art keywords
- transducer
- capacitive
- manufacturing
- micromachining
- dielectric film
- Prior art date
Links
- 238000005459 micromachining Methods 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title abstract 3
- 238000000151 deposition Methods 0.000 abstract 3
- 238000000034 method Methods 0.000 abstract 2
- 238000000231 atomic layer deposition Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
- B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
- B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
- B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
- B06B1/0292—Electrostatic transducers, e.g. electret-type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
- B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
- B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
- B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
- B06B1/06—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0064—Constitution or structural means for improving or controlling the physical properties of a device
- B81B3/0086—Electrical characteristics, e.g. reducing driving voltage, improving resistance to peak voltage
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0018—Structures acting upon the moving or flexible element for transforming energy into mechanical movement or vice versa, i.e. actuators, sensors, generators
- B81B3/0027—Structures for transforming mechanical energy, e.g. potential energy of a spring into translation, sound into translation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/00523—Etching material
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R31/00—Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/50—Piezoelectric or electrostrictive devices having a stacked or multilayer structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0271—Resonators; ultrasonic resonators
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R19/00—Electrostatic transducers
- H04R19/005—Electrostatic transducers using semiconductor materials
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R31/00—Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor
- H04R31/003—Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor for diaphragms or their outer suspension
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Acoustics & Sound (AREA)
- Signal Processing (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Transducers For Ultrasonic Waves (AREA)
- Electrostatic, Electromagnetic, Magneto- Strictive, And Variable-Resistance Transducers (AREA)
- Measuring Fluid Pressure (AREA)
- Ultra Sonic Daignosis Equipment (AREA)
- Pressure Sensors (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261591308P | 2012-01-27 | 2012-01-27 | |
| PCT/IB2013/050572 WO2013111063A1 (en) | 2012-01-27 | 2013-01-23 | Capacitive micro-machined transducer and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| BR112014018080A2 BR112014018080A2 (enExample) | 2017-06-20 |
| BR112014018080A8 true BR112014018080A8 (pt) | 2017-07-11 |
Family
ID=47884432
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR112014018080A BR112014018080A8 (pt) | 2012-01-27 | 2013-01-23 | Método de fabricação de um transdutor microusinado capacitivo, e, transdutor microusinado capacitivo |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9828236B2 (enExample) |
| EP (1) | EP2806983B1 (enExample) |
| JP (1) | JP6190387B2 (enExample) |
| CN (1) | CN104066520A (enExample) |
| BR (1) | BR112014018080A8 (enExample) |
| MX (1) | MX2014008852A (enExample) |
| RU (1) | RU2627062C2 (enExample) |
| WO (1) | WO2013111063A1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5578810B2 (ja) * | 2009-06-19 | 2014-08-27 | キヤノン株式会社 | 静電容量型の電気機械変換装置 |
| EP3049194B1 (en) * | 2013-09-24 | 2022-06-29 | Koninklijke Philips N.V. | Cmut device manufacturing method, cmut device and apparatus |
| CN105722609B (zh) * | 2013-11-18 | 2018-03-06 | 皇家飞利浦有限公司 | 超声换能器组件 |
| KR20160006494A (ko) * | 2014-07-09 | 2016-01-19 | 삼성전자주식회사 | 와이어 본딩을 이용한 정전용량 미세가공 초음파 변환기 프로브 |
| US11766237B2 (en) | 2015-07-02 | 2023-09-26 | Philips Image Guided Therapy Corporation | Multi-mode capacitive micromachined ultrasound transducer and associated devices, systems, and methods for multiple different intravascular sensing capabilities |
| US11864947B2 (en) | 2016-12-22 | 2024-01-09 | Koninklijke Philips N.V. | Systems and methods of operation of capacitive radio frequency micro-electromechanical switches |
| KR20210005208A (ko) * | 2018-05-03 | 2021-01-13 | 버터플라이 네트워크, 인크. | Cmos 센서 상의 초음파 트랜스듀서를 위한 압력 포트 |
| CN112334867B (zh) | 2018-05-24 | 2025-11-11 | 纽约州立大学研究基金会 | 电容传感器 |
| CN109665488B (zh) * | 2018-12-29 | 2024-07-19 | 杭州士兰集成电路有限公司 | Mems器件及其制造方法 |
| US11766696B2 (en) | 2019-02-07 | 2023-09-26 | Bfly Operations, Inc. | Bi-layer metal electrode for micromachined ultrasonic transducer devices |
| US11684951B2 (en) | 2019-08-08 | 2023-06-27 | Bfly Operations, Inc. | Micromachined ultrasonic transducer devices having truncated circle shaped cavities |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007528153A (ja) * | 2004-02-06 | 2007-10-04 | ジョージア テック リサーチ コーポレイション | Ｃｍｕｔデバイス及び製造方法 |
| US7172947B2 (en) * | 2004-08-31 | 2007-02-06 | Micron Technology, Inc | High dielectric constant transition metal oxide materials |
| CA2607885A1 (en) * | 2005-05-18 | 2006-11-23 | Kolo Technologies, Inc. | Through-wafer interconnection |
| KR100648860B1 (ko) * | 2005-09-08 | 2006-11-24 | 주식회사 하이닉스반도체 | 유전막 및 그 형성방법과, 상기 유전막을 구비한 반도체메모리 소자 및 그 제조방법 |
| JP4724505B2 (ja) * | 2005-09-09 | 2011-07-13 | 株式会社日立製作所 | 超音波探触子およびその製造方法 |
| JP4961260B2 (ja) | 2007-05-16 | 2012-06-27 | 株式会社日立製作所 | 半導体装置 |
| US20080315331A1 (en) * | 2007-06-25 | 2008-12-25 | Robert Gideon Wodnicki | Ultrasound system with through via interconnect structure |
| EP2170531A2 (en) * | 2007-07-31 | 2010-04-07 | Koninklijke Philips Electronics N.V. | Cmuts with a high-k dielectric |
| WO2009026499A1 (en) * | 2007-08-23 | 2009-02-26 | Purdue Research Foundation | Intra-occular pressure sensor |
| WO2009122314A1 (en) * | 2008-03-31 | 2009-10-08 | Nxp B.V. | A sensor chip and a method of manufacturing the same |
| JP5305993B2 (ja) * | 2008-05-02 | 2013-10-02 | キヤノン株式会社 | 容量型機械電気変換素子の製造方法、及び容量型機械電気変換素子 |
| JP5628178B2 (ja) | 2008-09-16 | 2014-11-19 | コーニンクレッカ フィリップス エヌ ヴェ | 容量性マイクロマシン超音波トランスデューサ |
| FR2939003B1 (fr) | 2008-11-21 | 2011-02-25 | Commissariat Energie Atomique | Cellule cmut formee d'une membrane de nano-tubes ou de nano-fils ou de nano-poutres et dispositif d'imagerie acoustique ultra haute frequence comprenant une pluralite de telles cellules |
| CN102333485B (zh) * | 2009-02-27 | 2014-12-10 | 皇家飞利浦电子股份有限公司 | 具有机械塌陷保持的预塌陷cmut |
| JP2011054708A (ja) | 2009-09-01 | 2011-03-17 | Elpida Memory Inc | 絶縁膜およびその製造方法、半導体装置、ならびにデータ処理システム |
| US8617078B2 (en) * | 2010-03-12 | 2013-12-31 | Hitachi Medical Corporation | Ultrasonic transducer and ultrasonic diagnostic device using same |
| US8530322B2 (en) * | 2010-12-16 | 2013-09-10 | Intermolecular, Inc. | Method of forming stacked metal oxide layers |
| US20120228773A1 (en) * | 2011-03-08 | 2012-09-13 | International Business Machines Corporation | Large-grain, low-resistivity tungsten on a conductive compound |
| US8794075B2 (en) * | 2011-08-11 | 2014-08-05 | Nxp, B.V. | Multilayered NONON membrane in a MEMS sensor |
-
2013
- 2013-01-23 WO PCT/IB2013/050572 patent/WO2013111063A1/en not_active Ceased
- 2013-01-23 RU RU2014134901A patent/RU2627062C2/ru not_active IP Right Cessation
- 2013-01-23 JP JP2014553838A patent/JP6190387B2/ja active Active
- 2013-01-23 MX MX2014008852A patent/MX2014008852A/es unknown
- 2013-01-23 CN CN201380006571.XA patent/CN104066520A/zh active Pending
- 2013-01-23 US US14/370,110 patent/US9828236B2/en active Active
- 2013-01-23 EP EP13709546.9A patent/EP2806983B1/en active Active
- 2013-01-23 BR BR112014018080A patent/BR112014018080A8/pt not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP2015506641A (ja) | 2015-03-02 |
| WO2013111063A1 (en) | 2013-08-01 |
| MX2014008852A (es) | 2014-10-06 |
| EP2806983A1 (en) | 2014-12-03 |
| BR112014018080A2 (enExample) | 2017-06-20 |
| JP6190387B2 (ja) | 2017-08-30 |
| RU2014134901A (ru) | 2016-03-27 |
| US9828236B2 (en) | 2017-11-28 |
| RU2627062C2 (ru) | 2017-08-03 |
| EP2806983B1 (en) | 2020-04-01 |
| CN104066520A (zh) | 2014-09-24 |
| US20140332911A1 (en) | 2014-11-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
| B06U | Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette] | ||
| B08F | Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette] |
Free format text: REFERENTE A 7A ANUIDADE. |
|
| B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2550 DE 19-11-2019 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013. |