BR0113221A - Fotoiniciadores tensoativos - Google Patents
Fotoiniciadores tensoativosInfo
- Publication number
- BR0113221A BR0113221A BR0113221-0A BR0113221A BR0113221A BR 0113221 A BR0113221 A BR 0113221A BR 0113221 A BR0113221 A BR 0113221A BR 0113221 A BR0113221 A BR 0113221A
- Authority
- BR
- Brazil
- Prior art keywords
- radical
- alkyl
- unsubstituted
- substituted
- phenyl
- Prior art date
Links
- 239000004094 surface-active agent Substances 0.000 title 1
- 125000000217 alkyl group Chemical group 0.000 abstract 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 4
- -1 anthracyl Chemical group 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 125000003342 alkenyl group Chemical group 0.000 abstract 1
- 125000002947 alkylene group Chemical group 0.000 abstract 1
- 125000000304 alkynyl group Chemical group 0.000 abstract 1
- 125000003710 aryl alkyl group Chemical group 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 125000001624 naphthyl group Chemical group 0.000 abstract 1
- 125000004957 naphthylene group Chemical group 0.000 abstract 1
- 125000005561 phenanthryl group Chemical group 0.000 abstract 1
- 125000005562 phenanthrylene group Chemical group 0.000 abstract 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 abstract 1
- 125000001424 substituent group Chemical group 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
- C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
- C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
- Y10S522/905—Benzophenone group
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
Abstract
"FOTOINICIADORES TENSOATIVOS". Compostos da fórmula Ia, Ib e Ic R, R~ 1~, e R~ 2~ são um radical fenila, naftila, antracila, fenantrila ou um heterocíclico, esses radicais sendo não-substituídos ou substituídos por A-X-, A~ 1~-X~ 1~-, A~ 2~- X~ 2~-, C~ 1-~C~ 8~ alquila, fenila, OR~ 8~, SR~ 9~ e/ou NR~ 10~R~ 11~; contanto que haja pelo menos um substituinte A-X-, A~ 1~-X~ 1~-, ou A~ 2~-X~ 2~- no radical R ou em pelo menos um dos radicais R~ 1~, ou R~ 2~; R~ a~ e R~ b~ SãO, por exemplo, fenileno, naftileno, antracileno, fenantrileno ou um radical heterocíclico divalente, esses radicais sendo não-substituídos ou substituídos por A-X-, A~ 1~-X~ 1~-, A~ 2~- X~ 2~-, C~ 1~-C~ 8~ alquila, fenila, OR~ 8~, SR~ 9~ e/ou NR~ 10~R~ 11~; R~ 8~, R~ 9~, R~ 10~ e R~ 11~, são, por exemplo, hidrogênio; fenila não-substituída ou substituída ou C~ 1~-C ~12~ alquila; A, A~ 1~ e A~ 2~ são, por exemplo, um radical da fórmula ou A, A~ 1~ e A~ 2~ são um radical A~ 0~; A~ 0~ é, por exemplo, C~ 6~-C~ 30~ alquila, C~ 6~-C~ 30~ alquenila, C~ 6~-C~ 30~ alquinila, C~ 6~-C~ 30~ aralquila; A~ 3~ é um radical da fórmula III na qual n tem o valor 2; ou A~ 8~ é um radical A~ 4~; A~ 4~ é, por exemplo, C~ 6~-C~ 30~ alquileno, C~ 6~-C~ 30~ alquenileno, C~ 6~-C~ 30~ alquinileno, C~ 6~-C~ 30~ aralquileno; n é um número de 1 a 1000; m é um número de 0 a 100; p é um número de 0-10 000; G~ 1~, G~ 2~ R~ 15~ R~ 16~ R~ 17~ R~ 18~ R~ 19~ R~ 20~ R~ 21~, R~ 22~, R~ 23~ e R~ 24~ são, por exemplo, C~ 1~-C~ 18~ alquila; X, X~ 1~ e X~ 2~, se A, A~ 1~ e A~ 2~ forem um radical da fórmula III, são, por exemplo, C~ 1~-C~ 10~ alquileno; e X, X~ 1~ e X~ 2~, se A, A~ 1~ ou A~ 2~ tiverem a definição de A~ 0~, são uma ligação simples, -O-, -S- ou -NR~ 14~-; Y é, por exemplo, C~1~-C~ 20~ alquila não-substituída ou substituída; Y~ 1~ e Y~ 2~ são, por exemplo, C~ 1~-C~ 12~ alquileno não-substituído ou substituído; são adequados como fotoiniciadores que se acumulam na superfície dos revestimentos.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP00810721 | 2000-08-14 | ||
PCT/EP2001/009122 WO2002014326A1 (en) | 2000-08-14 | 2001-08-07 | Surface-active photoinitiators |
Publications (1)
Publication Number | Publication Date |
---|---|
BR0113221A true BR0113221A (pt) | 2003-06-24 |
Family
ID=8174857
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR0113221-0A BR0113221A (pt) | 2000-08-14 | 2001-08-07 | Fotoiniciadores tensoativos |
Country Status (11)
Country | Link |
---|---|
US (1) | US6906113B2 (pt) |
EP (1) | EP1309599A1 (pt) |
JP (1) | JP2004506639A (pt) |
KR (1) | KR20030022397A (pt) |
CN (1) | CN1214035C (pt) |
AU (1) | AU2001283989A1 (pt) |
BR (1) | BR0113221A (pt) |
CA (1) | CA2416325A1 (pt) |
MX (1) | MXPA03001093A (pt) |
TW (1) | TW557298B (pt) |
WO (1) | WO2002014326A1 (pt) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI244495B (en) * | 2000-08-14 | 2005-12-01 | Ciba Sc Holding Ag | Process for producing coatings siloxane photoinitiators |
WO2002048204A1 (en) * | 2000-12-13 | 2002-06-20 | Ciba Specialty Chemicals Holding Inc. | Surface-active photoinitiators |
ATE402195T1 (de) * | 2002-02-04 | 2008-08-15 | Ciba Holding Inc | Oberflächenaktive siloxanphotoinitiatoren |
US20050119435A1 (en) * | 2002-02-04 | 2005-06-02 | Gisele Baudin | Surface-active photoinitiators |
US7588880B2 (en) * | 2002-04-26 | 2009-09-15 | Ciba Specialty Chemicals Corp. | Incorporable photoinitiator |
JP4283004B2 (ja) * | 2003-02-04 | 2009-06-24 | 株式会社日立製作所 | ディスク制御装置およびディスク制御装置の制御方法 |
CN1989161B (zh) * | 2004-07-29 | 2010-05-05 | 大日本油墨化学工业株式会社 | 成形用活性能量射线固化型树脂组合物、成形用片以及成形物 |
US7713628B2 (en) * | 2005-05-31 | 2010-05-11 | Chemque, Inc. | Actinic radiation curable coating compositions |
ITTV20050084A1 (it) | 2005-06-15 | 2006-12-16 | Asolo Spa | Calzatura con suola traspirante. |
US7947759B2 (en) * | 2005-08-08 | 2011-05-24 | Angstrom Medica | Cement products and methods of making and using the same |
EP2006716A4 (en) * | 2006-03-31 | 2011-03-30 | Konica Minolta Opto Inc | SCREEN FILM, POLARIZING PLATE AND METHOD FOR PRODUCING THE SAME, AND LIQUID CRYSTAL DISPLAY |
CA2668925A1 (en) * | 2006-11-10 | 2008-05-22 | The Regents Of The University Of California | Atmospheric pressure plasma-induced graft polymerization |
US7985826B2 (en) | 2006-12-22 | 2011-07-26 | Reichhold, Inc. | Molding resins using renewable resource component |
US8815973B2 (en) * | 2007-08-28 | 2014-08-26 | Pioneer Surgical Technology, Inc. | Cement products and methods of making and using the same |
US8377623B2 (en) * | 2007-11-27 | 2013-02-19 | 3D Systems, Inc. | Photocurable resin composition for producing three dimensional articles having high clarity |
JP2010209183A (ja) * | 2009-03-09 | 2010-09-24 | Fujifilm Corp | インク組成物及びインクジェット記録方法 |
JP6010352B2 (ja) * | 2012-06-07 | 2016-10-19 | 株式会社オートネットワーク技術研究所 | 硬化性増感剤、光硬化材料、硬化物及びワイヤーハーネス材料 |
CN103616799B (zh) * | 2013-11-07 | 2016-02-24 | 李厚民 | 一种固化后有机可溶的光敏树脂、制备方法及溶解方法 |
CN106687861B (zh) | 2014-06-23 | 2022-01-11 | 卡本有限公司 | 由具有多重硬化机制的材料制备三维物体的方法 |
EP3253559B1 (en) * | 2015-02-05 | 2020-12-09 | Carbon, Inc. | Method of additive manufacturing by intermittent exposure |
US11891485B2 (en) * | 2015-11-05 | 2024-02-06 | Carbon, Inc. | Silicone dual cure resins for additive manufacturing |
US10501572B2 (en) | 2015-12-22 | 2019-12-10 | Carbon, Inc. | Cyclic ester dual cure resins for additive manufacturing |
CN115195104B (zh) | 2015-12-22 | 2023-12-05 | 卡本有限公司 | 用于用双重固化树脂的增材制造的双重前体树脂系统 |
WO2017112751A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Blocked silicone dual cure resins for additive manufacturing |
US10343331B2 (en) | 2015-12-22 | 2019-07-09 | Carbon, Inc. | Wash liquids for use in additive manufacturing with dual cure resins |
WO2018237038A1 (en) | 2017-06-21 | 2018-12-27 | Carbon, Inc. | ADDITIVE MANUFACTURING METHOD |
CN109762397A (zh) * | 2019-01-21 | 2019-05-17 | 长沙新宇高分子科技有限公司 | 一种含氨基酮光引发剂的uv光固化组合物 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5555162A (en) * | 1978-08-30 | 1980-04-22 | Pfizer | Pyrrolylketo acid and aminoacid and their derivatives*their manufacture and pharmacologic composition containing them |
EP0128321A1 (en) * | 1983-06-08 | 1984-12-19 | Stauffer Chemical Company | Amine promotion of glyoxylate photoinitiators |
US4477326A (en) | 1983-06-20 | 1984-10-16 | Loctite Corporation | Polyphotoinitiators and compositions thereof |
US4536265A (en) * | 1984-04-19 | 1985-08-20 | Loctite Corporation | Siloxane polyphotoinitiators of the substituted acetophenone type |
DE3567880D1 (en) | 1984-04-16 | 1989-03-02 | Loctite Corp | Siloxane polyphotoinitiators of the substituted acetophenone type |
US4507187A (en) | 1984-04-19 | 1985-03-26 | Loctite Corporation | Siloxane photoinitiators with aryoyl formate groups |
JPH0825995B2 (ja) * | 1988-04-08 | 1996-03-13 | 小野薬品工業株式会社 | 複素環化合物 |
DK656789A (da) * | 1988-12-28 | 1990-06-29 | Takeda Chemical Industries Ltd | Benzoheterocykliske forbindelser |
US4987159A (en) * | 1990-04-11 | 1991-01-22 | Fratelli Lamberti S.P.A. | Carbonyl derivatives of 1-phenylindan suitable for use as polymerization photoinitiators, their preparation and use |
EP0486011A3 (en) * | 1990-11-16 | 1992-07-15 | Fujisawa Pharmaceutical Co., Ltd. | Pharmaceutical composition against pneumocystis carinii |
US5298652A (en) * | 1992-12-08 | 1994-03-29 | Hoffmann-La Roche Inc. | N-substituted glycines, inhibitors of phospholipase A2 |
FR2727408A1 (fr) * | 1994-11-29 | 1996-05-31 | Roussel Uclaf | Nouvelles oximes derivees de l'acide 7-ethynyl alpha-(oxo) 1-naphtalene acetique, leur procede de preparation et leur utilisation comme pesticides |
FR2750429B1 (fr) * | 1996-06-27 | 1998-08-07 | Essilor Int | Materiau a base de silicone reticule comportant un photoamorceur fixe, son procede de preparation, produit polymerique hydrophile obtenu a partir de ce materiau et son procede de preparation, et nouveaux photoamorceurs |
DE69809029T2 (de) * | 1997-01-30 | 2003-06-05 | Ciba Speciality Chemicals Holding Inc., Basel | Nicht-flüchtige phenylglyoxalsäureester |
CZ20003960A3 (cs) * | 1998-05-04 | 2002-04-17 | Zentaris Ag | Deriváty indolu a jejich pouľití pro léčení maligních a jiných chorob vyvolaných patologickou proliferací buněk |
DE19913353A1 (de) * | 1999-03-24 | 2000-09-28 | Basf Ag | Verwendung von Phenylglyoxalsäureestern als Photoinitiatoren |
-
2001
- 2001-07-31 TW TW090118686A patent/TW557298B/zh not_active IP Right Cessation
- 2001-08-07 CN CNB018141609A patent/CN1214035C/zh not_active Expired - Fee Related
- 2001-08-07 BR BR0113221-0A patent/BR0113221A/pt not_active Application Discontinuation
- 2001-08-07 WO PCT/EP2001/009122 patent/WO2002014326A1/en active Application Filing
- 2001-08-07 JP JP2002519464A patent/JP2004506639A/ja active Pending
- 2001-08-07 MX MXPA03001093A patent/MXPA03001093A/es unknown
- 2001-08-07 EP EP01962915A patent/EP1309599A1/en not_active Withdrawn
- 2001-08-07 CA CA002416325A patent/CA2416325A1/en not_active Abandoned
- 2001-08-07 US US10/343,617 patent/US6906113B2/en not_active Expired - Fee Related
- 2001-08-07 KR KR10-2003-7002114A patent/KR20030022397A/ko not_active Application Discontinuation
- 2001-08-07 AU AU2001283989A patent/AU2001283989A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
WO2002014326A1 (en) | 2002-02-21 |
CN1214035C (zh) | 2005-08-10 |
TW557298B (en) | 2003-10-11 |
CA2416325A1 (en) | 2002-02-21 |
CN1447814A (zh) | 2003-10-08 |
EP1309599A1 (en) | 2003-05-14 |
JP2004506639A (ja) | 2004-03-04 |
US6906113B2 (en) | 2005-06-14 |
US20040014832A1 (en) | 2004-01-22 |
AU2001283989A1 (en) | 2002-02-25 |
KR20030022397A (ko) | 2003-03-15 |
MXPA03001093A (es) | 2003-05-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B11A | Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing | ||
B11Y | Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette] |