AU2001283989A1 - Surface-active photoinitiators - Google Patents

Surface-active photoinitiators

Info

Publication number
AU2001283989A1
AU2001283989A1 AU2001283989A AU8398901A AU2001283989A1 AU 2001283989 A1 AU2001283989 A1 AU 2001283989A1 AU 2001283989 A AU2001283989 A AU 2001283989A AU 8398901 A AU8398901 A AU 8398901A AU 2001283989 A1 AU2001283989 A1 AU 2001283989A1
Authority
AU
Australia
Prior art keywords
active photoinitiators
photoinitiators
active
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001283989A
Inventor
Gisele Baudin
Tunja Jung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of AU2001283989A1 publication Critical patent/AU2001283989A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0834—Compounds having one or more O-Si linkage
    • C07F7/0838—Compounds with one or more Si-O-Si sequences
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group
    • Y10S522/905—Benzophenone group
AU2001283989A 2000-08-14 2001-08-07 Surface-active photoinitiators Abandoned AU2001283989A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP00810721 2000-08-14
EP00810721 2000-08-14
PCT/EP2001/009122 WO2002014326A1 (en) 2000-08-14 2001-08-07 Surface-active photoinitiators

Publications (1)

Publication Number Publication Date
AU2001283989A1 true AU2001283989A1 (en) 2002-02-25

Family

ID=8174857

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001283989A Abandoned AU2001283989A1 (en) 2000-08-14 2001-08-07 Surface-active photoinitiators

Country Status (11)

Country Link
US (1) US6906113B2 (en)
EP (1) EP1309599A1 (en)
JP (1) JP2004506639A (en)
KR (1) KR20030022397A (en)
CN (1) CN1214035C (en)
AU (1) AU2001283989A1 (en)
BR (1) BR0113221A (en)
CA (1) CA2416325A1 (en)
MX (1) MXPA03001093A (en)
TW (1) TW557298B (en)
WO (1) WO2002014326A1 (en)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI244495B (en) * 2000-08-14 2005-12-01 Ciba Sc Holding Ag Process for producing coatings siloxane photoinitiators
CN1481392A (en) * 2000-12-13 2004-03-10 �������⻯ѧƷ�ع����޹�˾ Surface-active photoinitiators
EP1487881A2 (en) * 2002-02-04 2004-12-22 Ciba SC Holding AG Surface-active photoinitiators
US7105582B2 (en) * 2002-02-04 2006-09-12 Ciba Specialty Chemicals Corp. Surface-active siloxane photoinitiators
CA2483004A1 (en) * 2002-04-26 2003-11-06 Ciba Specialty Chemicals Holding Inc. Incorporable photoinitiator
JP4283004B2 (en) * 2003-02-04 2009-06-24 株式会社日立製作所 Disk control device and control method of disk control device
US20080021174A1 (en) * 2004-07-29 2008-01-24 Dainipoon Ink And Chemicals Inc. Radiation-Curable Resin Composition for Shape-Replication, Sheet for Shape-Replication, and Shape-Replicated Material
US7713628B2 (en) * 2005-05-31 2010-05-11 Chemque, Inc. Actinic radiation curable coating compositions
ITTV20050084A1 (en) 2005-06-15 2006-12-16 Asolo Spa FOOTWEAR WITH BREATHABLE SOLE.
EP1922052B1 (en) * 2005-08-08 2010-11-03 Angstrom Medica, Inc. Cement products and methods of making and using the same
KR20080114759A (en) * 2006-03-31 2008-12-31 코니카 미놀타 옵토 인코포레이티드 Film for display, polarizing plate and method for producing the same, and liquid crystal display
JP2010509445A (en) * 2006-11-10 2010-03-25 ザ リージェンツ オブ ザ ユニヴァーシティー オブ カリフォルニア Atmospheric pressure plasma induced graft polymerization
US7985826B2 (en) * 2006-12-22 2011-07-26 Reichhold, Inc. Molding resins using renewable resource component
US8815973B2 (en) * 2007-08-28 2014-08-26 Pioneer Surgical Technology, Inc. Cement products and methods of making and using the same
JP5881948B2 (en) * 2007-11-27 2016-03-09 スリーディー システムズ インコーポレーテッド Photocurable resin composition for producing a three-dimensional article having high transparency
JP2010209183A (en) 2009-03-09 2010-09-24 Fujifilm Corp Ink composition and ink-jet recording method
JP6010352B2 (en) * 2012-06-07 2016-10-19 株式会社オートネットワーク技術研究所 Curing sensitizer, photocuring material, cured product and wire harness material
CN103616799B (en) * 2013-11-07 2016-02-24 李厚民 A kind of photosensitive resin, preparation method and dissolving method solidifying rear Identification of Soluble Organic
BR112016029766A2 (en) 2014-06-23 2017-08-22 Carbon Inc methods of producing three-dimensional polyurethane objects from materials having multiple hardening mechanisms
CN107438513B (en) * 2015-02-05 2020-12-29 卡本有限公司 Additive manufacturing method by intermittent exposure
WO2017079502A1 (en) * 2015-11-05 2017-05-11 Carbon, Inc. Silicone dual cure resins for additive manufacturing
US10501572B2 (en) 2015-12-22 2019-12-10 Carbon, Inc. Cyclic ester dual cure resins for additive manufacturing
US10787583B2 (en) 2015-12-22 2020-09-29 Carbon, Inc. Method of forming a three-dimensional object comprised of a silicone polymer or co-polymer
JP7189015B2 (en) 2015-12-22 2022-12-13 カーボン，インコーポレイテッド A Dual Precursor Resin System for Additive Manufacturing Using Dual Cured Resins
US10343331B2 (en) 2015-12-22 2019-07-09 Carbon, Inc. Wash liquids for use in additive manufacturing with dual cure resins
US11458673B2 (en) 2017-06-21 2022-10-04 Carbon, Inc. Resin dispenser for additive manufacturing
CN109762397A (en) * 2019-01-21 2019-05-17 长沙新宇高分子科技有限公司 A kind of UV Photocurable composition containing amino ketone photoinitiator

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5555162A (en) * 1978-08-30 1980-04-22 Pfizer Pyrrolylketo acid and aminoacid and their derivatives*their manufacture and pharmacologic composition containing them
EP0128321A1 (en) 1983-06-08 1984-12-19 Stauffer Chemical Company Amine promotion of glyoxylate photoinitiators
US4477326A (en) * 1983-06-20 1984-10-16 Loctite Corporation Polyphotoinitiators and compositions thereof
US4536265A (en) * 1984-04-19 1985-08-20 Loctite Corporation Siloxane polyphotoinitiators of the substituted acetophenone type
EP0162572B1 (en) 1984-04-16 1989-01-25 Loctite Corporation Siloxane polyphotoinitiators of the substituted acetophenone type
US4507187A (en) * 1984-04-19 1985-03-26 Loctite Corporation Siloxane photoinitiators with aryoyl formate groups
JPH0825995B2 (en) * 1988-04-08 1996-03-13 小野薬品工業株式会社 Heterocyclic compound
NZ231939A (en) * 1988-12-28 1991-07-26 Takeda Chemical Industries Ltd Benzothiopyran derivatives and medicaments
US4987159A (en) * 1990-04-11 1991-01-22 Fratelli Lamberti S.P.A. Carbonyl derivatives of 1-phenylindan suitable for use as polymerization photoinitiators, their preparation and use
EP0486011A3 (en) * 1990-11-16 1992-07-15 Fujisawa Pharmaceutical Co., Ltd. Pharmaceutical composition against pneumocystis carinii
US5298652A (en) * 1992-12-08 1994-03-29 Hoffmann-La Roche Inc. N-substituted glycines, inhibitors of phospholipase A2
FR2727408A1 (en) * 1994-11-29 1996-05-31 Roussel Uclaf NOVEL OXIMES DERIVED FROM 7-ETHYNYL ALPHA- (OXO) 1-NAPHTHALENE ACETIC ACID, PROCESS FOR THEIR PREPARATION AND THEIR USE AS PESTICIDES
FR2750429B1 (en) 1996-06-27 1998-08-07 Essilor Int CROSS-LINKED SILICONE-BASED MATERIAL COMPRISING A FIXED PHOTO-INITIATOR, METHOD FOR PREPARING IT, HYDROPHILIC POLYMERIC PRODUCT OBTAINED FROM THIS MATERIAL AND METHOD FOR PREPARING IT, AND NEW PHOTO-INITIATORS
DK0956280T3 (en) * 1997-01-30 2003-02-24 Ciba Sc Holding Ag Non-volatile phenylglyoxylic esters
DK1109785T3 (en) * 1998-05-04 2003-04-22 Zentaris Ag Indole derivatives and their use in the treatment of malignant and other diseases caused by pathological cell proliferation
DE19913353A1 (en) * 1999-03-24 2000-09-28 Basf Ag Use of phenylglyoxalic acid esters as photoinitiators

Also Published As

Publication number Publication date
EP1309599A1 (en) 2003-05-14
KR20030022397A (en) 2003-03-15
MXPA03001093A (en) 2003-05-27
WO2002014326A1 (en) 2002-02-21
US20040014832A1 (en) 2004-01-22
JP2004506639A (en) 2004-03-04
BR0113221A (en) 2003-06-24
TW557298B (en) 2003-10-11
CN1447814A (en) 2003-10-08
CN1214035C (en) 2005-08-10
US6906113B2 (en) 2005-06-14
CA2416325A1 (en) 2002-02-21

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