KR960042232A - 내식성 감광성 내식막 스트립퍼 조성물 - Google Patents

내식성 감광성 내식막 스트립퍼 조성물 Download PDF

Info

Publication number
KR960042232A
KR960042232A KR1019960014754A KR19960014754A KR960042232A KR 960042232 A KR960042232 A KR 960042232A KR 1019960014754 A KR1019960014754 A KR 1019960014754A KR 19960014754 A KR19960014754 A KR 19960014754A KR 960042232 A KR960042232 A KR 960042232A
Authority
KR
South Korea
Prior art keywords
stripper composition
group
pyrrolidone
ethanol
alkanolamine
Prior art date
Application number
KR1019960014754A
Other languages
English (en)
Inventor
겐지 혼다
마우 다이시
Original Assignee
폴 와인스타인
오씨지 마이크로일렉트로닉 머티리얼즈, 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 폴 와인스타인, 오씨지 마이크로일렉트로닉 머티리얼즈, 인코포레이티드 filed Critical 폴 와인스타인
Publication of KR960042232A publication Critical patent/KR960042232A/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5009—Organic solvents containing phosphorus, sulfur or silicon, e.g. dimethylsulfoxide
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3218—Alkanolamines or alkanolimines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3227—Ethers thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/34—Organic compounds containing sulfur

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Detergent Compositions (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

쌍극자 모멘트가 3.5 이상인 유기 극성 용매(a) 20 내지 70중량%, 선택된 아민 화합물(b) 70 내지 20중량% 및 (2-벤조티아졸릴티오)숙신산(c) 0.1 내지 10중량%를 함유하는 내식성 감광성 내식막 조성물이 기재되어 있다.

Description

내식성 감광성 내식막 스트립퍼 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (7)

  1. 쌍극자 모멘트가 3.5 이상인 유기 극성 용매(a) 약 20 내지 약 70중량%, 일반식(I)의 알칸올아민 화합물로 이루어진 그룹으로부터 선택된 아민 화합물(b) 약 70 내지 약 20중량% 및 (2-벤조티아졸릴티오)숙신산(c) 약 0.1 내지 약 10중량%(여기서, 모든 백분율은 스트립퍼 조성물의 중량을 기준으로 한다)를 포함하는 감광성 내식막 스트립퍼 조성물.
    상기 식에서, n 및 m은 각각 독립적으로 0 내지 5의 정수이고, X는 수소, 알킬 또는 알콕시 그룹이며, Y는 -O- 또는 -NH-이고, Z는 수소, -OH- 또는 -NH2이다.
  2. 제1항에 있어서, 용매(a)가 사이클릭 아미드인 스트립퍼 조성물.
  3. 제2항에 있어서, 사이클릭 아미드가 N-알킬-2-피롤리돈, N-하이드록시알킬-2-피롤리돈 및 1,3-디알킬-2-이미다졸리디논으로 이루어진 그룹으로부터 선택되는 스트립퍼 조성물.
  4. 제1항에 있어서, 알칸올아민이 모노에탄올아민, 2-(2-아미노에톡시)에탄올, 2-(2-아미노에틸아미노)에탄올, 디에탄올아민 및 트리에탄올아민으로 이루어진 그룹으로부터 선택되는 스트립퍼 조성물.
  5. 제2항에 있어서, 알칸올아민이 모노에탄올아민, 2-(2-아미노에톡시)에탄올, 디에탄올아민 및 트리에탄올아민으로 이루어진 그룹으로부터 선택되는 스트립퍼 조성물.
  6. 제3항에 있어서, 알칸올아민이 모노에탄올아민, 2-(2-아미노에톡시)에탄올, 디에탄올아민 및 트리에탄올아민으로 이루어진 그룹으로부터 선택되는 스트립퍼 조성물.
  7. 제3항에 있어서, N-알킬-2-피롤리돈이 N-메틸-2-피롤리돈인 스트립퍼 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960014754A 1995-05-08 1996-05-07 내식성 감광성 내식막 스트립퍼 조성물 KR960042232A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/436,548 1995-05-08
US08/436,548 US5545353A (en) 1995-05-08 1995-05-08 Non-corrosive photoresist stripper composition

Publications (1)

Publication Number Publication Date
KR960042232A true KR960042232A (ko) 1996-12-21

Family

ID=23732849

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960014754A KR960042232A (ko) 1995-05-08 1996-05-07 내식성 감광성 내식막 스트립퍼 조성물

Country Status (4)

Country Link
US (1) US5545353A (ko)
EP (1) EP0742493A1 (ko)
JP (1) JPH08305037A (ko)
KR (1) KR960042232A (ko)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6492311B2 (en) * 1990-11-05 2002-12-10 Ekc Technology, Inc. Ethyenediaminetetraacetic acid or its ammonium salt semiconductor process residue removal composition and process
US5648324A (en) * 1996-01-23 1997-07-15 Ocg Microelectronic Materials, Inc. Photoresist stripping composition
US5780406A (en) * 1996-09-06 1998-07-14 Honda; Kenji Non-corrosive cleaning composition for removing plasma etching residues
WO1998022568A1 (en) * 1996-11-22 1998-05-28 Advanced Chemical Systems International, Inc. Stripping formulation including catechol, hydroxylamine, non-alkanolamine, water for post plasma ashed wafer cleaning
US5798323A (en) * 1997-05-05 1998-08-25 Olin Microelectronic Chemicals, Inc. Non-corrosive stripping and cleaning composition
US6268323B1 (en) 1997-05-05 2001-07-31 Arch Specialty Chemicals, Inc. Non-corrosive stripping and cleaning composition
US6440647B1 (en) 1998-02-26 2002-08-27 Alpha Metals, Inc. Resist stripping process
US6368421B1 (en) 1998-07-10 2002-04-09 Clariant Finance (Bvi) Limited Composition for stripping photoresist and organic materials from substrate surfaces
CA2349318C (en) 1998-11-23 2010-08-24 Ecolab Inc. Non-corrosive peroxy carboxylic acid-based sterilant composition
TW546553B (en) * 1998-12-25 2003-08-11 Tokyo Ohka Kogyo Co Ltd Photoresist stripping liquid composition and a method of stripping photoresists using the same
KR100390986B1 (ko) * 1998-12-31 2003-07-12 주식회사 하이닉스반도체 산 확산 방지용 다산소 함유 화합물 및 이를 함유하는포토레지스트 조성물
US7521405B2 (en) * 2002-08-12 2009-04-21 Air Products And Chemicals, Inc. Process solutions containing surfactants
US6361712B1 (en) * 1999-10-15 2002-03-26 Arch Specialty Chemicals, Inc. Composition for selective etching of oxides over metals
US6413923B2 (en) 1999-11-15 2002-07-02 Arch Specialty Chemicals, Inc. Non-corrosive cleaning composition for removing plasma etching residues
JP2005514661A (ja) * 2002-01-11 2005-05-19 クラリアント インターナショナル リミテッド ポジ型またはネガ型フォトレジスト用の洗浄剤組成物
JP4405767B2 (ja) * 2003-08-28 2010-01-27 ソニー株式会社 銀及び／又は銀合金を含む基板のフォトレジスト剥離液組成物、それを用いたパターンの製造方法ならびにそれを含む表示装置
JP4440689B2 (ja) * 2004-03-31 2010-03-24 東友ファインケム株式会社 レジスト剥離剤組成物
KR101088568B1 (ko) * 2005-04-19 2011-12-05 아반토르 퍼포먼스 머티리얼스, 인크. 갈바닉 부식을 억제하는 비수성 포토레지스트 스트립퍼
US7767637B2 (en) * 2007-05-16 2010-08-03 Babcock & Wilcox Technical Services Y-12, Llc Solvent for urethane adhesives and coatings and method of use
TW201013338A (en) * 2008-08-04 2010-04-01 Advanced Tech Materials Environmentally friendly polymer stripping compositions
US9868867B1 (en) 2012-11-26 2018-01-16 Russell Scott Manley Solvents and uses thereof
US9401336B2 (en) 2014-11-04 2016-07-26 International Business Machines Corporation Dual layer stack for contact formation
TWI690780B (zh) 2014-12-30 2020-04-11 美商富士軟片電子材料美國股份有限公司 用於自半導體基板去除光阻之剝離組成物

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56115368A (en) * 1980-02-15 1981-09-10 San Ei Chem Ind Ltd Releasing agent of photosensitive polymer
GB8313322D0 (en) * 1983-05-14 1983-06-22 Ciba Geigy Ag Heterocyclic-(cyclo)aliphatic carboxylic acids
DE3501675A1 (de) * 1985-01-19 1986-07-24 Merck Patent Gmbh, 6100 Darmstadt Mittel und verfahren zur entfernung von fotoresist- und stripperresten von halbleitersubstraten
US4617251A (en) * 1985-04-11 1986-10-14 Olin Hunt Specialty Products, Inc. Stripping composition and method of using the same
JPH0721638B2 (ja) * 1986-07-18 1995-03-08 東京応化工業株式会社 基板の処理方法
US4770713A (en) * 1986-12-10 1988-09-13 Advanced Chemical Technologies, Inc. Stripping compositions containing an alkylamide and an alkanolamine and use thereof
JPS63208043A (ja) * 1987-02-25 1988-08-29 Kanto Kagaku Kk ポジ型フオトレジスト用水溶性剥離液
JP2553872B2 (ja) * 1987-07-21 1996-11-13 東京応化工業株式会社 ホトレジスト用剥離液
US4824763A (en) * 1987-07-30 1989-04-25 Ekc Technology, Inc. Triamine positive photoresist stripping composition and prebaking process
JPH0769618B2 (ja) * 1987-09-25 1995-07-31 旭化成工業株式会社 フオトレジスト用剥離剤
JP2631849B2 (ja) * 1987-09-30 1997-07-16 ナガセ電子化学 株式会社 剥離剤組成物
DE3828513A1 (de) * 1988-08-23 1990-03-01 Merck Patent Gmbh Abloesemittel fuer fotoresists
US5304252A (en) * 1989-04-06 1994-04-19 Oliver Sales Company Method of removing a permanent photoimagable film from a printed circuit board
JP2527268B2 (ja) * 1990-09-17 1996-08-21 東京応化工業株式会社 レジスト用剥離剤組成物
US5279771A (en) * 1990-11-05 1994-01-18 Ekc Technology, Inc. Stripping compositions comprising hydroxylamine and alkanolamine
JP3160344B2 (ja) * 1991-01-25 2001-04-25 アシュランド インコーポレーテッド 有機ストリッピング組成物
CA2062027C (en) * 1991-03-04 1998-05-19 William Aldrich Liquid control system for diagnostic cartridges used in analytical instruments
JPH04350660A (ja) * 1991-05-28 1992-12-04 Texas Instr Japan Ltd 半導体装置製造用ポジ型フォトレジスト用剥離液および半導体装置の製造方法
US5260357A (en) * 1992-04-30 1993-11-09 The Dexter Corporation Corrosion resistant waterbone adhesive primers
US5308745A (en) * 1992-11-06 1994-05-03 J. T. Baker Inc. Alkaline-containing photoresist stripping compositions producing reduced metal corrosion with cross-linked or hardened resist resins
US5433773A (en) * 1994-06-02 1995-07-18 Fremont Industries, Inc. Method and composition for treatment of phosphate coated metal surfaces

Also Published As

Publication number Publication date
US5545353A (en) 1996-08-13
EP0742493A1 (en) 1996-11-13
JPH08305037A (ja) 1996-11-22

Similar Documents

Publication Publication Date Title
KR960042232A (ko) 내식성 감광성 내식막 스트립퍼 조성물
KR950033702A (ko) 비부식 감광성 내식막 스트립핑 조성물
BR9203543A (pt) Composto,processo para sua preparacao e sua aplicacao
KR910010239A (ko) 방사선 감응성 수지 조성물
DE59010806D1 (de) Pyrazoline zum schutz von kulturpflanzen gegenüber herbiziden
TW349986B (en) Aqueous stripping compositions containing a hydroxylamine and an alkanolamine and use thereof
NO20026253D0 (no) Organiske forbindelser
KR920004338A (ko) 치환된 발린아미드 유도체
KR870001142A (ko) 페닐 에테르의 제법
YU11997A (sh) Laktamski derivati i njihove farmaceutske kompozicije
EP1443363A3 (en) Compounds for photoresist and resin composition for photoresist
ATE1947T1 (de) 2-(2-alkoxyethyl)-2'-hydroxy-6,7-benzomorphane, deren saeureadditionssalze, diese enthaltende arzneimittel und verfahren zu deren herstellung.
ATE156818T1 (de) Polyfluoralkylthiopoly(ethylimidazolium)- verbindungen, verfahren zu ihrer herstellung und ihre verwendung als biozide mittel
KR970028826A (ko) 신규 술포늄염 및 화학 증폭 포지형 레지스트 재료
DK1333721T3 (da) Herbicidpræparat
SE8700113L (sv) Pesticid o/w-emulsion
KR970027071A (ko) 피롤릴벤즈이미다졸유도체
KR910002774A (ko) 2-아미노펜탄 산 화합물 및 면역 억제제로 그들을 사용하는 방법
KR927003488A (ko) 술폰화제 및 술폰화법
DK400781A (da) Fremgangsmaade til fremstilling af 2-(1,4-benzodioxan-2-ylalkyl) imidazoler
KR970702254A (ko) 에테르화합물, 그의 용도 및 그의 제조에 유용한 중간체(ether compound, use thereof, and intermediate for producing the compound)
MY117828A (en) Antireflective coating material for photoresists.
KR920005847A (ko) 수중 오염방지 조성물
NO20041671L (no) Anthelmintic composition
KR870000298A (ko) 심장혈관의 병 치료용 1,4-디하이드로피리딘 유도체의 제법

Legal Events

Date Code Title Description
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid