AU675125B2 - Method and apparatus for process control - Google Patents

Method and apparatus for process control Download PDF

Info

Publication number
AU675125B2
AU675125B2 AU63841/94A AU6384194A AU675125B2 AU 675125 B2 AU675125 B2 AU 675125B2 AU 63841/94 A AU63841/94 A AU 63841/94A AU 6384194 A AU6384194 A AU 6384194A AU 675125 B2 AU675125 B2 AU 675125B2
Authority
AU
Australia
Prior art keywords
master disk
optical master
light beam
developing fluid
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU63841/94A
Other languages
English (en)
Other versions
AU6384194A (en
Inventor
Jonathan Halliday
Gerald Alfred John Reynolds
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nimbus Communications International Ltd
Original Assignee
Nimbus Communications International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nimbus Communications International Ltd filed Critical Nimbus Communications International Ltd
Publication of AU6384194A publication Critical patent/AU6384194A/en
Application granted granted Critical
Publication of AU675125B2 publication Critical patent/AU675125B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • G03F7/3028—Imagewise removal using liquid means from a wafer supported on a rotating chuck characterised by means for on-wafer monitoring of the processing
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Length Measuring Devices By Optical Means (AREA)
AU63841/94A 1993-04-07 1994-04-05 Method and apparatus for process control Ceased AU675125B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB939307239A GB9307239D0 (en) 1993-04-07 1993-04-07 Method and apparatus for process control
GB9307239 1993-04-07
PCT/GB1994/000720 WO1994023343A1 (en) 1993-04-07 1994-04-05 Method and apparatus for process control

Publications (2)

Publication Number Publication Date
AU6384194A AU6384194A (en) 1994-10-24
AU675125B2 true AU675125B2 (en) 1997-01-23

Family

ID=10733474

Family Applications (1)

Application Number Title Priority Date Filing Date
AU63841/94A Ceased AU675125B2 (en) 1993-04-07 1994-04-05 Method and apparatus for process control

Country Status (17)

Country Link
EP (1) EP0695438A1 (fi)
JP (1) JPH08508602A (fi)
CN (1) CN1120866A (fi)
AU (1) AU675125B2 (fi)
BR (1) BR9406451A (fi)
CA (1) CA2159100A1 (fi)
CZ (1) CZ283292B6 (fi)
FI (1) FI954769A (fi)
GB (1) GB9307239D0 (fi)
HU (1) HUT73543A (fi)
IL (1) IL109238A (fi)
NO (1) NO953933L (fi)
NZ (1) NZ263235A (fi)
RU (1) RU2107893C1 (fi)
SG (1) SG44328A1 (fi)
TW (1) TW255966B (fi)
WO (1) WO1994023343A1 (fi)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8576686B2 (en) 2005-01-25 2013-11-05 Cinram Group, Inc. Apparatus for multilevel optical recording
US8472020B2 (en) 2005-02-15 2013-06-25 Cinram Group, Inc. Process for enhancing dye polymer recording yields by pre-scanning coated substrate for defects
US7535806B2 (en) 2005-07-07 2009-05-19 Cinram International Inc. Apparatus and method for detecting laser dropout
EP1965383A1 (en) * 2007-03-02 2008-09-03 Singulus Mastering B.V. Diffraction order measurement

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2108710A (en) * 1981-10-16 1983-05-18 Pioneer Electronic Corp System for developing a photo-resist material used as a recording medium
JPH04311837A (ja) * 1991-04-10 1992-11-04 Tdk Corp 光ディスク原盤の現像方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59121337A (ja) * 1982-12-24 1984-07-13 Fujitsu Ltd レジスト現像装置
EP0379281A3 (en) * 1989-01-19 1991-03-20 Cosmopolitan Textile Company Limited Web inspecting method and apparatus
JP2861073B2 (ja) * 1989-07-05 1999-02-24 ソニー株式会社 現像装置
US5124216A (en) * 1990-07-31 1992-06-23 At&T Bell Laboratories Method for monitoring photoresist latent images
JPH04141840A (ja) * 1990-10-01 1992-05-15 Matsushita Electric Ind Co Ltd フォトレジスト自動現像装置
US5357304A (en) * 1992-03-25 1994-10-18 Sony Corporation Image development apparatus and method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2108710A (en) * 1981-10-16 1983-05-18 Pioneer Electronic Corp System for developing a photo-resist material used as a recording medium
JPH04311837A (ja) * 1991-04-10 1992-11-04 Tdk Corp 光ディスク原盤の現像方法

Also Published As

Publication number Publication date
RU2107893C1 (ru) 1998-03-27
TW255966B (fi) 1995-09-01
FI954769A0 (fi) 1995-10-06
NO953933D0 (no) 1995-10-03
CZ283292B6 (cs) 1998-02-18
GB9307239D0 (en) 1993-06-02
BR9406451A (pt) 1996-01-02
FI954769A (fi) 1995-10-06
NZ263235A (en) 1996-07-26
JPH08508602A (ja) 1996-09-10
HUT73543A (en) 1996-08-28
WO1994023343A1 (en) 1994-10-13
CN1120866A (zh) 1996-04-17
CA2159100A1 (en) 1994-10-13
NO953933L (no) 1995-10-03
CZ257195A3 (en) 1996-09-11
HU9502729D0 (en) 1995-11-28
SG44328A1 (en) 1997-12-19
EP0695438A1 (en) 1996-02-07
IL109238A0 (en) 1994-07-31
AU6384194A (en) 1994-10-24
IL109238A (en) 1997-07-13

Similar Documents

Publication Publication Date Title
US4501480A (en) System for developing a photo-resist material used as a recording medium
JP2580390B2 (ja) 光ディスクマスターの作成装置
US4136940A (en) Resist development control system
AU675125B2 (en) Method and apparatus for process control
NO158519B (no) Fremgangsmaate for aa preparere et glass-substrat for bruk ved fremstilling av en original video-skive.
US4352564A (en) Missing order defect detection apparatus
EP0502533B1 (en) Apparatus for developing photoresist
US6025118A (en) Glassmastering photoresist read after write method and system
JPH04141840A (ja) フォトレジスト自動現像装置
US5357304A (en) Image development apparatus and method
US6348294B1 (en) Glassmastering photoresist read after write method and system
JPS6161341B2 (fi)
JP3382970B2 (ja) 光ディスク原盤の製造方法
CN101738876A (zh) 显影方法与显影设备
JPH0450663B2 (fi)
JP2861073B2 (ja) 現像装置
JP2008234797A (ja) 現像装置および現像方法
JPH0435819B2 (fi)
JPH0628719A (ja) 現像処理装置
JPS5814343A (ja) フオトレジスト湿式現像方法及び装置
JPH01195349A (ja) 光ディスク原盤及びスタンパの検査装置
JP2613578B2 (ja) 光ディスクの現像装置
JPH09145326A (ja) 光ディスク原盤の溝パラメータ測定方法・測定装置、製造方法、及び、現像方法・現像装置
JPH04305832A (ja) 光記録媒体の製造法
JPH0458517A (ja) 電子線露光装置