AU2002223125A1 - Method and device for transfer, method and device for exposure, and method of manufacturing device - Google Patents

Method and device for transfer, method and device for exposure, and method of manufacturing device

Info

Publication number
AU2002223125A1
AU2002223125A1 AU2002223125A AU2312502A AU2002223125A1 AU 2002223125 A1 AU2002223125 A1 AU 2002223125A1 AU 2002223125 A AU2002223125 A AU 2002223125A AU 2312502 A AU2312502 A AU 2312502A AU 2002223125 A1 AU2002223125 A1 AU 2002223125A1
Authority
AU
Australia
Prior art keywords
exposure
transfer
manufacturing
manufacturing device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002223125A
Other languages
English (en)
Inventor
Soichi Owa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2002223125A1 publication Critical patent/AU2002223125A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
AU2002223125A 2000-11-15 2001-11-15 Method and device for transfer, method and device for exposure, and method of manufacturing device Abandoned AU2002223125A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-347993 2000-11-15
JP2000347993 2000-11-15
PCT/JP2001/009973 WO2002041375A1 (fr) 2000-11-15 2001-11-15 Procedes et dispositfs de transfert et d'exposition et procede servant a fabriquer un composant

Publications (1)

Publication Number Publication Date
AU2002223125A1 true AU2002223125A1 (en) 2002-05-27

Family

ID=18821642

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002223125A Abandoned AU2002223125A1 (en) 2000-11-15 2001-11-15 Method and device for transfer, method and device for exposure, and method of manufacturing device

Country Status (3)

Country Link
JP (1) JPWO2002041375A1 (ja)
AU (1) AU2002223125A1 (ja)
WO (1) WO2002041375A1 (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7405416B2 (en) * 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
JP4623715B2 (ja) * 2004-05-13 2011-02-02 東京エレクトロン株式会社 基板搬送機構及び該基板搬送機構を備える基板搬送装置
US7522263B2 (en) * 2005-12-27 2009-04-21 Asml Netherlands B.V. Lithographic apparatus and method
KR101174777B1 (ko) 2005-12-27 2012-08-20 엘지디스플레이 주식회사 패턴형성방법 및 그를 이용한 액정표시소자 제조방법
WO2011016254A1 (ja) * 2009-08-07 2011-02-10 株式会社ニコン 移動体装置、露光装置及び露光方法、並びにデバイス製造方法
JP5533227B2 (ja) * 2010-05-13 2014-06-25 凸版印刷株式会社 露光装置
JPWO2012081234A1 (ja) 2010-12-14 2014-05-22 株式会社ニコン 露光方法及び露光装置、並びにデバイス製造方法
KR102141138B1 (ko) * 2012-03-14 2020-08-05 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치
KR102534203B1 (ko) * 2017-02-24 2023-05-19 도쿄엘렉트론가부시키가이샤 기판 처리 시스템
KR102134161B1 (ko) * 2018-08-23 2020-07-21 세메스 주식회사 기판 처리 장치 및 방법
KR102242026B1 (ko) * 2020-06-29 2021-04-19 피엠씨글로벌 주식회사 내부공간에 질소가스가 주입되는 포토마스크 케이스

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05109874A (ja) * 1991-10-18 1993-04-30 Fujitsu Ltd 液中搬送装置及び回収装置
JPH05114540A (ja) * 1991-10-23 1993-05-07 Fujitsu Ltd レチクル搬送装置
JPH08316284A (ja) * 1995-05-15 1996-11-29 Sony Corp フォトマスクの搬送装置
JP2000049081A (ja) * 1998-07-31 2000-02-18 Nikon Corp 荷電粒子線投影露光装置

Also Published As

Publication number Publication date
JPWO2002041375A1 (ja) 2004-03-25
WO2002041375A1 (fr) 2002-05-23

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