AU2001286666A1 - Method and device to reduce gate-induced drain leakage (gidl) current in thin gate oxide mosfets - Google Patents
Method and device to reduce gate-induced drain leakage (gidl) current in thin gate oxide mosfetsInfo
- Publication number
- AU2001286666A1 AU2001286666A1 AU2001286666A AU8666601A AU2001286666A1 AU 2001286666 A1 AU2001286666 A1 AU 2001286666A1 AU 2001286666 A AU2001286666 A AU 2001286666A AU 8666601 A AU8666601 A AU 8666601A AU 2001286666 A1 AU2001286666 A1 AU 2001286666A1
- Authority
- AU
- Australia
- Prior art keywords
- gidl
- current
- drain leakage
- induced drain
- gate oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
- H01L21/26513—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors of electrically active species
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26586—Bombardment with radiation with high-energy radiation producing ion implantation characterised by the angle between the ion beam and the crystal planes or the main crystal surface
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28158—Making the insulator
- H01L21/28167—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation
- H01L21/28176—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation with a treatment, e.g. annealing, after the formation of the definitive gate conductor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28158—Making the insulator
- H01L21/28167—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation
- H01L21/28185—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation with a treatment, e.g. annealing, after the formation of the gate insulator and before the formation of the definitive gate conductor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28158—Making the insulator
- H01L21/28167—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation
- H01L21/28194—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation by deposition, e.g. evaporation, ALD, CVD, sputtering, laser deposition
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/51—Insulating materials associated therewith
- H01L29/511—Insulating materials associated therewith with a compositional variation, e.g. multilayer structures
- H01L29/512—Insulating materials associated therewith with a compositional variation, e.g. multilayer structures the variation being parallel to the channel plane
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/51—Insulating materials associated therewith
- H01L29/518—Insulating materials associated therewith the insulating material containing nitrogen, e.g. nitride, oxynitride, nitrogen-doped material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66568—Lateral single gate silicon transistors
- H01L29/66659—Lateral single gate silicon transistors with asymmetry in the channel direction, e.g. lateral high-voltage MISFETs with drain offset region, extended drain MISFETs
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/648,044 | 2000-08-25 | ||
US09/648,044 US7247919B1 (en) | 2000-08-25 | 2000-08-25 | Method and device to reduce gate-induced drain leakage (GIDL) current in thin gate oxides MOSFETs |
PCT/US2001/026342 WO2002019431A2 (en) | 2000-08-25 | 2001-08-23 | Method and device to reduce gate-induced drain leakage (gidl) current in thin gate oxide mosfets |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001286666A1 true AU2001286666A1 (en) | 2002-03-13 |
Family
ID=24599198
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001286666A Abandoned AU2001286666A1 (en) | 2000-08-25 | 2001-08-23 | Method and device to reduce gate-induced drain leakage (gidl) current in thin gate oxide mosfets |
Country Status (7)
Country | Link |
---|---|
US (3) | US7247919B1 (ja) |
EP (1) | EP1312110A2 (ja) |
JP (1) | JP2004508717A (ja) |
KR (1) | KR100563398B1 (ja) |
AU (1) | AU2001286666A1 (ja) |
SG (1) | SG140464A1 (ja) |
WO (1) | WO2002019431A2 (ja) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4177192B2 (ja) * | 2003-08-05 | 2008-11-05 | 株式会社日立ハイテクノロジーズ | プラズマエッチング装置およびプラズマエッチング方法 |
US6797555B1 (en) * | 2003-09-10 | 2004-09-28 | National Semiconductor Corporation | Direct implantation of fluorine into the channel region of a PMOS device |
US7189292B2 (en) | 2003-10-31 | 2007-03-13 | International Business Machines Corporation | Self-encapsulated silver alloys for interconnects |
US7245548B2 (en) * | 2004-07-27 | 2007-07-17 | Micron Technology, Inc. | Techniques for reducing leakage current in memory devices |
US20060291114A1 (en) * | 2005-06-27 | 2006-12-28 | Teo Chee K | Electrostatic discharge protection circuit and method |
US8154088B1 (en) | 2006-09-29 | 2012-04-10 | Cypress Semiconductor Corporation | Semiconductor topography and method for reducing gate induced drain leakage (GIDL) in MOS transistors |
US20080286932A1 (en) * | 2007-05-17 | 2008-11-20 | Dongbu Hitek Co., Ltd. | Method of manufacturing semiconductor device |
US20090090975A1 (en) * | 2007-10-09 | 2009-04-09 | Chartered Semiconductor Manufacturing Ltd. | Integrated circuit system employing fluorine doping |
KR20120133652A (ko) * | 2011-05-31 | 2012-12-11 | 삼성전자주식회사 | 반도체 소자의 제조 방법 |
CN102420228B (zh) * | 2011-06-17 | 2015-01-07 | 上海华力微电子有限公司 | 抑制gidl效应的后栅极工艺半导体器件及其制备方法 |
US8896035B2 (en) | 2012-10-22 | 2014-11-25 | International Business Machines Corporation | Field effect transistor having phase transition material incorporated into one or more components for reduced leakage current |
KR102065973B1 (ko) | 2013-07-12 | 2020-01-15 | 삼성전자 주식회사 | 반도체 장치 및 그 제조 방법 |
US10734511B2 (en) | 2016-03-31 | 2020-08-04 | Intel Corporation | High mobility asymmetric field effect transistors with a band-offset semiconductor drain spacer |
WO2018182570A1 (en) * | 2017-03-28 | 2018-10-04 | Intel IP Corporation | Assymetric transistor arrangements with smartly spaced drain regions |
CN112864223A (zh) | 2019-11-28 | 2021-05-28 | 联华电子股份有限公司 | 半导体晶体管及其制作方法 |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2652108B2 (ja) * | 1991-09-05 | 1997-09-10 | 三菱電機株式会社 | 電界効果トランジスタおよびその製造方法 |
JPH0653492A (ja) * | 1992-07-29 | 1994-02-25 | Kawasaki Steel Corp | 半導体装置及びその製造方法 |
US5382533A (en) * | 1993-06-18 | 1995-01-17 | Micron Semiconductor, Inc. | Method of manufacturing small geometry MOS field-effect transistors having improved barrier layer to hot electron injection |
US5372957A (en) | 1993-07-22 | 1994-12-13 | Taiwan Semiconductor Manufacturing Company | Multiple tilted angle ion implantation MOSFET method |
JP3297173B2 (ja) * | 1993-11-02 | 2002-07-02 | 三菱電機株式会社 | 半導体記憶装置およびその製造方法 |
KR0136932B1 (ko) | 1994-07-30 | 1998-04-24 | 문정환 | 반도체 소자 및 그의 제조방법 |
SG50741A1 (en) * | 1995-07-26 | 1998-07-20 | Chartered Semiconductor Mfg | Method for minimizing the hot carrier effect in m-mosfet devices |
US5719425A (en) | 1996-01-31 | 1998-02-17 | Micron Technology, Inc. | Multiple implant lightly doped drain (MILDD) field effect transistor |
JPH1079506A (ja) | 1996-02-07 | 1998-03-24 | Matsushita Electric Ind Co Ltd | 半導体装置およびその製造方法 |
US5672525A (en) | 1996-05-23 | 1997-09-30 | Chartered Semiconductor Manufacturing Pte Ltd. | Polysilicon gate reoxidation in a gas mixture of oxygen and nitrogen trifluoride gas by rapid thermal processing to improve hot carrier immunity |
US5804496A (en) | 1997-01-08 | 1998-09-08 | Advanced Micro Devices | Semiconductor device having reduced overlap capacitance and method of manufacture thereof |
US5840610A (en) * | 1997-01-16 | 1998-11-24 | Advanced Micro Devices, Inc. | Enhanced oxynitride gate dielectrics using NF3 gas |
US5998274A (en) | 1997-04-10 | 1999-12-07 | Micron Technology, Inc. | Method of forming a multiple implant lightly doped drain (MILDD) field effect transistor |
JPH1117174A (ja) | 1997-06-20 | 1999-01-22 | Sony Corp | Mis型トランジスタ素子のゲート電極及びその形成方法 |
US5920782A (en) | 1997-07-18 | 1999-07-06 | United Microelectronics Corp. | Method for improving hot carrier degradation |
KR100389899B1 (ko) | 1997-12-18 | 2003-07-04 | 미크론 테크놀로지,인코포레이티드 | 핫-캐리어 효과 제한 트랜지스터 게이트 형성 및 그 트랜지스터 |
US6030875A (en) | 1997-12-19 | 2000-02-29 | Advanced Micro Devices, Inc. | Method for making semiconductor device having nitrogen-rich active region-channel interface |
US6188101B1 (en) | 1998-01-14 | 2001-02-13 | Advanced Micro Devices, Inc. | Flash EPROM cell with reduced short channel effect and method for providing same |
US6238998B1 (en) | 1998-11-20 | 2001-05-29 | International Business Machines Corporation | Shallow trench isolation on a silicon substrate using nitrogen implant into the side wall |
JP3376305B2 (ja) | 1998-12-25 | 2003-02-10 | 株式会社東芝 | 半導体装置の製造方法 |
US6242334B1 (en) | 1999-03-23 | 2001-06-05 | United Microelectronics Corp. | Multi-step spacer formation of semiconductor devices |
US6297098B1 (en) | 1999-11-01 | 2001-10-02 | Taiwan Semiconductor Manufacturing Company | Tilt-angle ion implant to improve junction breakdown in flash memory application |
US6352912B1 (en) | 2000-03-30 | 2002-03-05 | International Business Machines Corporation | Reduction of reverse short channel effects by deep implantation of neutral dopants |
US6352885B1 (en) * | 2000-05-25 | 2002-03-05 | Advanced Micro Devices, Inc. | Transistor having a peripherally increased gate insulation thickness and a method of fabricating the same |
-
2000
- 2000-08-25 US US09/648,044 patent/US7247919B1/en not_active Expired - Lifetime
-
2001
- 2001-08-23 SG SG200501097-0A patent/SG140464A1/en unknown
- 2001-08-23 EP EP01966127A patent/EP1312110A2/en not_active Ceased
- 2001-08-23 AU AU2001286666A patent/AU2001286666A1/en not_active Abandoned
- 2001-08-23 JP JP2002524227A patent/JP2004508717A/ja active Pending
- 2001-08-23 KR KR1020037002699A patent/KR100563398B1/ko active IP Right Grant
- 2001-08-23 WO PCT/US2001/026342 patent/WO2002019431A2/en not_active Application Discontinuation
- 2001-12-27 US US10/034,778 patent/US6693012B2/en not_active Expired - Lifetime
-
2006
- 2006-07-31 US US11/496,288 patent/US20060263964A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP1312110A2 (en) | 2003-05-21 |
WO2002019431A3 (en) | 2002-10-17 |
US20060263964A1 (en) | 2006-11-23 |
WO2002019431A2 (en) | 2002-03-07 |
SG140464A1 (en) | 2008-03-28 |
US7247919B1 (en) | 2007-07-24 |
US20020050621A1 (en) | 2002-05-02 |
US6693012B2 (en) | 2004-02-17 |
KR20030043939A (ko) | 2003-06-02 |
KR100563398B1 (ko) | 2006-03-23 |
JP2004508717A (ja) | 2004-03-18 |
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