ATE63179T1 - Festes polymerisches substrat fuer optische scheiben und optische scheiben, hergestellt aus diesem substrat. - Google Patents
Festes polymerisches substrat fuer optische scheiben und optische scheiben, hergestellt aus diesem substrat.Info
- Publication number
- ATE63179T1 ATE63179T1 AT87420255T AT87420255T ATE63179T1 AT E63179 T1 ATE63179 T1 AT E63179T1 AT 87420255 T AT87420255 T AT 87420255T AT 87420255 T AT87420255 T AT 87420255T AT E63179 T1 ATE63179 T1 AT E63179T1
- Authority
- AT
- Austria
- Prior art keywords
- substrate
- optical discs
- solid polymeric
- hand
- thermotropic
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
- G11B7/2533—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates comprising resins
- G11B7/2535—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates comprising resins polyesters, e.g. PET, PETG or PEN
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/32—Component parts, details or accessories; Auxiliary operations
- B29C43/36—Moulds for making articles of definite length, i.e. discrete articles
- B29C43/361—Moulds for making articles of definite length, i.e. discrete articles with pressing members independently movable of the parts for opening or closing the mould, e.g. movable pistons
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/2403—Layers; Shape, structure or physical properties thereof
- G11B7/24035—Recording layers
- G11B7/24038—Multiple laminated recording layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/2403—Layers; Shape, structure or physical properties thereof
- G11B7/24047—Substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
- B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
- B29C2043/023—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves
- B29C2043/025—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves forming a microstructure, i.e. fine patterning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
- B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31786—Of polyester [e.g., alkyd, etc.]
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Injection Moulding Of Plastics Or The Like (AREA)
- Laminated Bodies (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Polyesters Or Polycarbonates (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Holo Graphy (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8613715A FR2604553A1 (fr) | 1986-09-29 | 1986-09-29 | Substrat polymere rigide pour disque optique et les disques optiques obtenus a partir dudit substrat |
EP87420255A EP0266279B1 (de) | 1986-09-29 | 1987-09-24 | Festes polymerisches Substrat für optische Scheiben und optische Scheiben, hergestellt aus diesem Substrat |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE63179T1 true ATE63179T1 (de) | 1991-05-15 |
Family
ID=9339463
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT87420255T ATE63179T1 (de) | 1986-09-29 | 1987-09-24 | Festes polymerisches substrat fuer optische scheiben und optische scheiben, hergestellt aus diesem substrat. |
Country Status (13)
Country | Link |
---|---|
US (1) | US4959252A (de) |
EP (1) | EP0266279B1 (de) |
JP (1) | JPS63118243A (de) |
KR (1) | KR930005787B1 (de) |
CN (1) | CN1008846B (de) |
AT (1) | ATE63179T1 (de) |
BR (1) | BR8704985A (de) |
DE (1) | DE3769752D1 (de) |
DK (1) | DK509887A (de) |
ES (1) | ES2022435B3 (de) |
FR (1) | FR2604553A1 (de) |
GR (1) | GR3002347T3 (de) |
PT (1) | PT85804B (de) |
Families Citing this family (90)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USRE37719E1 (en) * | 1986-11-14 | 2002-05-28 | Toshinori Sugiyama | Optical data recording system and method of production of recording medium |
US5219708A (en) * | 1989-05-02 | 1993-06-15 | Tdk Corporation | Optical disk |
US5340698A (en) * | 1989-05-02 | 1994-08-23 | Tdk Corporation | Optical disk |
JPH0354742A (ja) * | 1989-07-21 | 1991-03-08 | Japan Synthetic Rubber Co Ltd | 光ディスク、その製造方法および読み取り方法 |
US5275903A (en) * | 1992-05-07 | 1994-01-04 | Xerox Corporation | Modified thermotropic liquid crystalline compositions |
JP3872829B2 (ja) * | 1995-08-30 | 2007-01-24 | 株式会社東芝 | 着色薄膜パターンの製造方法 |
US6355198B1 (en) * | 1996-03-15 | 2002-03-12 | President And Fellows Of Harvard College | Method of forming articles including waveguides via capillary micromolding and microtransfer molding |
US6334960B1 (en) | 1999-03-11 | 2002-01-01 | Board Of Regents, The University Of Texas System | Step and flash imprint lithography |
US6873087B1 (en) | 1999-10-29 | 2005-03-29 | Board Of Regents, The University Of Texas System | High precision orientation alignment and gap control stages for imprint lithography processes |
US7432634B2 (en) | 2000-10-27 | 2008-10-07 | Board Of Regents, University Of Texas System | Remote center compliant flexure device |
EP2264522A3 (de) * | 2000-07-16 | 2011-12-14 | The Board of Regents of The University of Texas System | Verfahren zur Bildung einer Struktur auf einem Substrat |
EP1303793B1 (de) | 2000-07-17 | 2015-01-28 | Board Of Regents, The University Of Texas System | Verfahren und gerät zur automatischen zufuhr von flüssigen materialien in der imprint-lithogrpahie |
US6954275B2 (en) | 2000-08-01 | 2005-10-11 | Boards Of Regents, The University Of Texas System | Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography |
EP1390975A2 (de) | 2000-08-21 | 2004-02-25 | The Board Of Regents, The University Of Texas System | Translationstufe auf basis von biegung |
US7198747B2 (en) * | 2000-09-18 | 2007-04-03 | President And Fellows Of Harvard College | Fabrication of ceramic microstructures |
EP1352295B1 (de) | 2000-10-12 | 2015-12-23 | Board of Regents, The University of Texas System | Schablone für die mikro- und nanodrucklithographie für zimmertemperatur und niedrigen druck |
DE60111951T2 (de) * | 2000-10-17 | 2006-06-01 | E.I. Du Pont De Nemours And Co., Wilmington | Feinstrukturierte formteile aus flüssigkristallpolymeren |
US6964793B2 (en) | 2002-05-16 | 2005-11-15 | Board Of Regents, The University Of Texas System | Method for fabricating nanoscale patterns in light curable compositions using an electric field |
US20050064344A1 (en) * | 2003-09-18 | 2005-03-24 | University Of Texas System Board Of Regents | Imprint lithography templates having alignment marks |
US20080160129A1 (en) * | 2006-05-11 | 2008-07-03 | Molecular Imprints, Inc. | Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template |
US7179079B2 (en) | 2002-07-08 | 2007-02-20 | Molecular Imprints, Inc. | Conforming template for patterning liquids disposed on substrates |
US6932934B2 (en) * | 2002-07-11 | 2005-08-23 | Molecular Imprints, Inc. | Formation of discontinuous films during an imprint lithography process |
US7077992B2 (en) | 2002-07-11 | 2006-07-18 | Molecular Imprints, Inc. | Step and repeat imprint lithography processes |
US7442336B2 (en) * | 2003-08-21 | 2008-10-28 | Molecular Imprints, Inc. | Capillary imprinting technique |
US6916584B2 (en) | 2002-08-01 | 2005-07-12 | Molecular Imprints, Inc. | Alignment methods for imprint lithography |
US7071088B2 (en) | 2002-08-23 | 2006-07-04 | Molecular Imprints, Inc. | Method for fabricating bulbous-shaped vias |
US6936194B2 (en) * | 2002-09-05 | 2005-08-30 | Molecular Imprints, Inc. | Functional patterning material for imprint lithography processes |
US8349241B2 (en) | 2002-10-04 | 2013-01-08 | Molecular Imprints, Inc. | Method to arrange features on a substrate to replicate features having minimal dimensional variability |
US20040065252A1 (en) * | 2002-10-04 | 2004-04-08 | Sreenivasan Sidlgata V. | Method of forming a layer on a substrate to facilitate fabrication of metrology standards |
US6929762B2 (en) | 2002-11-13 | 2005-08-16 | Molecular Imprints, Inc. | Method of reducing pattern distortions during imprint lithography processes |
US6871558B2 (en) | 2002-12-12 | 2005-03-29 | Molecular Imprints, Inc. | Method for determining characteristics of substrate employing fluid geometries |
US7452574B2 (en) | 2003-02-27 | 2008-11-18 | Molecular Imprints, Inc. | Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer |
US7186656B2 (en) * | 2004-05-21 | 2007-03-06 | Molecular Imprints, Inc. | Method of forming a recessed structure employing a reverse tone process |
US7179396B2 (en) | 2003-03-25 | 2007-02-20 | Molecular Imprints, Inc. | Positive tone bi-layer imprint lithography method |
US7122079B2 (en) | 2004-02-27 | 2006-10-17 | Molecular Imprints, Inc. | Composition for an etching mask comprising a silicon-containing material |
US7323417B2 (en) * | 2004-09-21 | 2008-01-29 | Molecular Imprints, Inc. | Method of forming a recessed structure employing a reverse tone process |
US7396475B2 (en) | 2003-04-25 | 2008-07-08 | Molecular Imprints, Inc. | Method of forming stepped structures employing imprint lithography |
US7307118B2 (en) | 2004-11-24 | 2007-12-11 | Molecular Imprints, Inc. | Composition to reduce adhesion between a conformable region and a mold |
US7157036B2 (en) | 2003-06-17 | 2007-01-02 | Molecular Imprints, Inc | Method to reduce adhesion between a conformable region and a pattern of a mold |
US7136150B2 (en) | 2003-09-25 | 2006-11-14 | Molecular Imprints, Inc. | Imprint lithography template having opaque alignment marks |
US20050098534A1 (en) * | 2003-11-12 | 2005-05-12 | Molecular Imprints, Inc. | Formation of conductive templates employing indium tin oxide |
US20050156353A1 (en) * | 2004-01-15 | 2005-07-21 | Watts Michael P. | Method to improve the flow rate of imprinting material |
US8076386B2 (en) | 2004-02-23 | 2011-12-13 | Molecular Imprints, Inc. | Materials for imprint lithography |
US7906180B2 (en) * | 2004-02-27 | 2011-03-15 | Molecular Imprints, Inc. | Composition for an etching mask comprising a silicon-containing material |
US7140861B2 (en) * | 2004-04-27 | 2006-11-28 | Molecular Imprints, Inc. | Compliant hard template for UV imprinting |
US20050253307A1 (en) * | 2004-05-11 | 2005-11-17 | Molecualr Imprints, Inc. | Method of patterning a conductive layer on a substrate |
EP1768846B1 (de) * | 2004-06-03 | 2010-08-11 | Molecular Imprints, Inc. | Fluidausgabe und tropfenausgabe nach bedarf für die herstellung im nanobereich |
US20070228593A1 (en) * | 2006-04-03 | 2007-10-04 | Molecular Imprints, Inc. | Residual Layer Thickness Measurement and Correction |
US7785526B2 (en) * | 2004-07-20 | 2010-08-31 | Molecular Imprints, Inc. | Imprint alignment method, system, and template |
US20060017876A1 (en) * | 2004-07-23 | 2006-01-26 | Molecular Imprints, Inc. | Displays and method for fabricating displays |
US7105452B2 (en) * | 2004-08-13 | 2006-09-12 | Molecular Imprints, Inc. | Method of planarizing a semiconductor substrate with an etching chemistry |
US7309225B2 (en) * | 2004-08-13 | 2007-12-18 | Molecular Imprints, Inc. | Moat system for an imprint lithography template |
US7939131B2 (en) | 2004-08-16 | 2011-05-10 | Molecular Imprints, Inc. | Method to provide a layer with uniform etch characteristics |
US7041604B2 (en) * | 2004-09-21 | 2006-05-09 | Molecular Imprints, Inc. | Method of patterning surfaces while providing greater control of recess anisotropy |
US7252777B2 (en) * | 2004-09-21 | 2007-08-07 | Molecular Imprints, Inc. | Method of forming an in-situ recessed structure |
US7241395B2 (en) * | 2004-09-21 | 2007-07-10 | Molecular Imprints, Inc. | Reverse tone patterning on surfaces having planarity perturbations |
US7205244B2 (en) | 2004-09-21 | 2007-04-17 | Molecular Imprints | Patterning substrates employing multi-film layers defining etch-differential interfaces |
US7547504B2 (en) | 2004-09-21 | 2009-06-16 | Molecular Imprints, Inc. | Pattern reversal employing thick residual layers |
US20060062922A1 (en) | 2004-09-23 | 2006-03-23 | Molecular Imprints, Inc. | Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor |
US7244386B2 (en) * | 2004-09-27 | 2007-07-17 | Molecular Imprints, Inc. | Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom |
WO2006060757A2 (en) | 2004-12-01 | 2006-06-08 | Molecular Imprints, Inc. | Eliminating printability of sub-resolution defects in imprint lithography |
US7811505B2 (en) | 2004-12-07 | 2010-10-12 | Molecular Imprints, Inc. | Method for fast filling of templates for imprint lithography using on template dispense |
US20060177532A1 (en) * | 2005-02-04 | 2006-08-10 | Molecular Imprints, Inc. | Imprint lithography method to control extrusion of a liquid from a desired region on a substrate |
US20060177535A1 (en) * | 2005-02-04 | 2006-08-10 | Molecular Imprints, Inc. | Imprint lithography template to facilitate control of liquid movement |
US7636999B2 (en) | 2005-01-31 | 2009-12-29 | Molecular Imprints, Inc. | Method of retaining a substrate to a wafer chuck |
US7635263B2 (en) | 2005-01-31 | 2009-12-22 | Molecular Imprints, Inc. | Chucking system comprising an array of fluid chambers |
US20070228608A1 (en) * | 2006-04-03 | 2007-10-04 | Molecular Imprints, Inc. | Preserving Filled Features when Vacuum Wiping |
US20060266916A1 (en) * | 2005-05-25 | 2006-11-30 | Molecular Imprints, Inc. | Imprint lithography template having a coating to reflect and/or absorb actinic energy |
US7256131B2 (en) * | 2005-07-19 | 2007-08-14 | Molecular Imprints, Inc. | Method of controlling the critical dimension of structures formed on a substrate |
US7759407B2 (en) | 2005-07-22 | 2010-07-20 | Molecular Imprints, Inc. | Composition for adhering materials together |
US8808808B2 (en) | 2005-07-22 | 2014-08-19 | Molecular Imprints, Inc. | Method for imprint lithography utilizing an adhesion primer layer |
US8557351B2 (en) | 2005-07-22 | 2013-10-15 | Molecular Imprints, Inc. | Method for adhering materials together |
US7665981B2 (en) * | 2005-08-25 | 2010-02-23 | Molecular Imprints, Inc. | System to transfer a template transfer body between a motion stage and a docking plate |
US20070074635A1 (en) * | 2005-08-25 | 2007-04-05 | Molecular Imprints, Inc. | System to couple a body and a docking plate |
US20070064384A1 (en) * | 2005-08-25 | 2007-03-22 | Molecular Imprints, Inc. | Method to transfer a template transfer body between a motion stage and a docking plate |
US7316554B2 (en) | 2005-09-21 | 2008-01-08 | Molecular Imprints, Inc. | System to control an atmosphere between a body and a substrate |
US20070077763A1 (en) * | 2005-09-30 | 2007-04-05 | Molecular Imprints, Inc. | Deposition technique to planarize a multi-layer structure |
US7906058B2 (en) | 2005-12-01 | 2011-03-15 | Molecular Imprints, Inc. | Bifurcated contact printing technique |
US7803308B2 (en) | 2005-12-01 | 2010-09-28 | Molecular Imprints, Inc. | Technique for separating a mold from solidified imprinting material |
US7670530B2 (en) | 2006-01-20 | 2010-03-02 | Molecular Imprints, Inc. | Patterning substrates employing multiple chucks |
EP1957249B1 (de) | 2005-12-08 | 2014-11-12 | Canon Nanotechnologies, Inc. | Verfahren und system zur doppelseitigen musterbildung auf substraten |
US8142850B2 (en) | 2006-04-03 | 2012-03-27 | Molecular Imprints, Inc. | Patterning a plurality of fields on a substrate to compensate for differing evaporation times |
US8850980B2 (en) | 2006-04-03 | 2014-10-07 | Canon Nanotechnologies, Inc. | Tessellated patterns in imprint lithography |
JP5306989B2 (ja) | 2006-04-03 | 2013-10-02 | モレキュラー・インプリンツ・インコーポレーテッド | 複数のフィールド及びアライメント・マークを有する基板を同時にパターニングする方法 |
US7802978B2 (en) | 2006-04-03 | 2010-09-28 | Molecular Imprints, Inc. | Imprinting of partial fields at the edge of the wafer |
US8012395B2 (en) | 2006-04-18 | 2011-09-06 | Molecular Imprints, Inc. | Template having alignment marks formed of contrast material |
US7547398B2 (en) | 2006-04-18 | 2009-06-16 | Molecular Imprints, Inc. | Self-aligned process for fabricating imprint templates containing variously etched features |
US7854867B2 (en) | 2006-04-21 | 2010-12-21 | Molecular Imprints, Inc. | Method for detecting a particle in a nanoimprint lithography system |
EP2874182A1 (de) * | 2013-11-19 | 2015-05-20 | Gemalto SA | Verfahren zur Herstellung von elektronischen Vorrichtungen |
WO2017145881A1 (ja) * | 2016-02-22 | 2017-08-31 | シャープ株式会社 | 光学部材の製造方法、及び、光学部材 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2615605C2 (de) * | 1976-04-09 | 1978-06-01 | Polygram Gmbh, 2000 Hamburg | Scheibenförmiger Informationsträger und Verfahren zu seiner Herstellung |
JPS57152550A (en) * | 1981-03-17 | 1982-09-20 | Fujitsu Ltd | Structure of optical recording medium |
JPS58177396A (ja) * | 1982-04-13 | 1983-10-18 | Tdk Corp | 光記録媒体 |
JPS60155424A (ja) * | 1984-01-26 | 1985-08-15 | Daicel Chem Ind Ltd | 大径のポリカ−ボネ−ト製光デイスク基板およびその製造法 |
GB8410515D0 (en) * | 1984-04-25 | 1984-05-31 | Ici Plc | Laser-imageable assembly |
JPS6190343A (ja) * | 1984-10-09 | 1986-05-08 | Polyplastics Co | 光ディスク |
FR2576027B1 (fr) * | 1985-01-11 | 1987-02-06 | Rhone Poulenc Rech | Copolyesters aromatiques thermotropes |
US4680211A (en) * | 1985-07-25 | 1987-07-14 | The Dow Chemical Company | Recording disks |
NL8502448A (nl) * | 1985-09-06 | 1987-04-01 | Philips Nv | Optisch uitleesbare informatieschijf. |
-
1986
- 1986-09-29 FR FR8613715A patent/FR2604553A1/fr not_active Withdrawn
-
1987
- 1987-09-24 DE DE8787420255T patent/DE3769752D1/de not_active Expired - Fee Related
- 1987-09-24 EP EP87420255A patent/EP0266279B1/de not_active Expired - Lifetime
- 1987-09-24 ES ES87420255T patent/ES2022435B3/es not_active Expired - Lifetime
- 1987-09-24 AT AT87420255T patent/ATE63179T1/de active
- 1987-09-28 JP JP62241039A patent/JPS63118243A/ja active Pending
- 1987-09-28 CN CN87106610A patent/CN1008846B/zh not_active Expired
- 1987-09-28 PT PT85804A patent/PT85804B/pt not_active IP Right Cessation
- 1987-09-28 DK DK509887A patent/DK509887A/da not_active Application Discontinuation
- 1987-09-28 BR BR8704985A patent/BR8704985A/pt unknown
- 1987-09-29 KR KR1019870010860A patent/KR930005787B1/ko active IP Right Grant
-
1989
- 1989-10-10 US US07/418,966 patent/US4959252A/en not_active Expired - Fee Related
-
1991
- 1991-07-23 GR GR91401065T patent/GR3002347T3/el unknown
Also Published As
Publication number | Publication date |
---|---|
EP0266279B1 (de) | 1991-05-02 |
DK509887D0 (da) | 1987-09-28 |
GR3002347T3 (en) | 1992-12-30 |
US4959252A (en) | 1990-09-25 |
PT85804A (pt) | 1988-10-14 |
FR2604553A1 (fr) | 1988-04-01 |
BR8704985A (pt) | 1988-05-17 |
DE3769752D1 (de) | 1991-06-06 |
KR880004448A (ko) | 1988-06-07 |
CN87106610A (zh) | 1988-04-13 |
DK509887A (da) | 1988-03-30 |
EP0266279A1 (de) | 1988-05-04 |
CN1008846B (zh) | 1990-07-18 |
JPS63118243A (ja) | 1988-05-23 |
ES2022435B3 (es) | 1991-12-01 |
KR930005787B1 (ko) | 1993-06-24 |
PT85804B (pt) | 1993-08-31 |
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