ATE449419T1 - Regulierbarer, hochtemperatur-halter für plasma- cvd einer hohen dichte - Google Patents

Regulierbarer, hochtemperatur-halter für plasma- cvd einer hohen dichte

Info

Publication number
ATE449419T1
ATE449419T1 AT97943648T AT97943648T ATE449419T1 AT E449419 T1 ATE449419 T1 AT E449419T1 AT 97943648 T AT97943648 T AT 97943648T AT 97943648 T AT97943648 T AT 97943648T AT E449419 T1 ATE449419 T1 AT E449419T1
Authority
AT
Austria
Prior art keywords
chuck
adjustable
plasma cvd
density plasma
electrostatic chuck
Prior art date
Application number
AT97943648T
Other languages
English (en)
Inventor
Brian Mcmillin
Michael Barnes
Butch Berney
Huong Nguyen
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Application granted granted Critical
Publication of ATE449419T1 publication Critical patent/ATE449419T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T279/00—Chucks or sockets
    • Y10T279/23—Chucks or sockets with magnetic or electrostatic means

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
AT97943648T 1996-09-30 1997-09-30 Regulierbarer, hochtemperatur-halter für plasma- cvd einer hohen dichte ATE449419T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/724,005 US5835334A (en) 1996-09-30 1996-09-30 Variable high temperature chuck for high density plasma chemical vapor deposition
PCT/US1997/017576 WO1998014999A1 (en) 1996-09-30 1997-09-30 Variable high temperature chuck for high density plasma chemical vapor deposition

Publications (1)

Publication Number Publication Date
ATE449419T1 true ATE449419T1 (de) 2009-12-15

Family

ID=24908563

Family Applications (1)

Application Number Title Priority Date Filing Date
AT97943648T ATE449419T1 (de) 1996-09-30 1997-09-30 Regulierbarer, hochtemperatur-halter für plasma- cvd einer hohen dichte

Country Status (8)

Country Link
US (1) US5835334A (de)
EP (1) EP0938747B1 (de)
JP (1) JP4149002B2 (de)
KR (1) KR100372281B1 (de)
AT (1) ATE449419T1 (de)
AU (1) AU4507297A (de)
DE (1) DE69739660D1 (de)
WO (1) WO1998014999A1 (de)

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US5835334A (en) 1998-11-10
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JP2001502116A (ja) 2001-02-13
WO1998014999A1 (en) 1998-04-09
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KR100372281B1 (ko) 2003-02-19

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