ATE446589T1 - Lösungsmittel-modifizierte harz-zusammensetzungen und verwendungsverfahren dafür - Google Patents

Lösungsmittel-modifizierte harz-zusammensetzungen und verwendungsverfahren dafür

Info

Publication number
ATE446589T1
ATE446589T1 AT04779798T AT04779798T ATE446589T1 AT E446589 T1 ATE446589 T1 AT E446589T1 AT 04779798 T AT04779798 T AT 04779798T AT 04779798 T AT04779798 T AT 04779798T AT E446589 T1 ATE446589 T1 AT E446589T1
Authority
AT
Austria
Prior art keywords
modified resin
solvent
methods
resin compositions
solvent modified
Prior art date
Application number
AT04779798T
Other languages
English (en)
Inventor
Slawomir Rubinsztajn
Sandeep Tonapi
David Gibson
John Campbell
Ananth Prabhakumar
Ryan Mills
Original Assignee
Momentive Performance Mat Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Momentive Performance Mat Inc filed Critical Momentive Performance Mat Inc
Priority claimed from PCT/US2004/024847 external-priority patent/WO2005024938A1/en
Application granted granted Critical
Publication of ATE446589T1 publication Critical patent/ATE446589T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00Use of pretreated ingredients
    • C08K9/04Ingredients treated with organic substances
    • C08K9/06Ingredients treated with organic substances with silicon-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • C09C1/3081Treatment with organo-silicon compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/563Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • H01L23/295Organic, e.g. plastic containing a filler
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/64Nanometer sized, i.e. from 1-100 nanometer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01019Potassium [K]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01078Platinum [Pt]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01087Francium [Fr]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/013Alloys
    • H01L2924/0132Binary Alloys
    • H01L2924/01322Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/102Material of the semiconductor or solid state bodies
    • H01L2924/1025Semiconducting materials
    • H01L2924/10251Elemental semiconductors, i.e. Group IV
    • H01L2924/10253Silicon [Si]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12044OLED

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Composite Materials (AREA)
  • Manufacturing & Machinery (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
AT04779798T 2003-09-03 2004-08-03 Lösungsmittel-modifizierte harz-zusammensetzungen und verwendungsverfahren dafür ATE446589T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/654,378 US20050049334A1 (en) 2003-09-03 2003-09-03 Solvent-modified resin system containing filler that has high Tg, transparency and good reliability in wafer level underfill applications
US10/737,943 US20050049352A1 (en) 2003-09-03 2003-12-16 Solvent-modified resin compositions and methods of use thereof
PCT/US2004/024847 WO2005024938A1 (en) 2003-09-03 2004-08-03 Solvent-modified resin compositions and methods of use thereof

Publications (1)

Publication Number Publication Date
ATE446589T1 true ATE446589T1 (de) 2009-11-15

Family

ID=34218078

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04779798T ATE446589T1 (de) 2003-09-03 2004-08-03 Lösungsmittel-modifizierte harz-zusammensetzungen und verwendungsverfahren dafür

Country Status (14)

Country Link
US (2) US20050049334A1 (de)
EP (1) EP1665376A1 (de)
JP (1) JP2007504321A (de)
KR (1) KR20060093707A (de)
CN (2) CN100490130C (de)
AT (1) ATE446589T1 (de)
AU (1) AU2004271534A1 (de)
BR (1) BRPI0413778A (de)
CA (1) CA2537828A1 (de)
DE (1) DE602004023734D1 (de)
MX (1) MXPA06002522A (de)
RU (1) RU2358353C2 (de)
WO (1) WO2005024939A1 (de)
ZA (2) ZA200602267B (de)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050266263A1 (en) * 2002-11-22 2005-12-01 General Electric Company Refractory solid, adhesive composition, and device, and associated method
US20060147719A1 (en) * 2002-11-22 2006-07-06 Slawomir Rubinsztajn Curable composition, underfill, and method
US7022410B2 (en) * 2003-12-16 2006-04-04 General Electric Company Combinations of resin compositions and methods of use thereof
US20040102529A1 (en) * 2002-11-22 2004-05-27 Campbell John Robert Functionalized colloidal silica, dispersions and methods made thereby
US20050170188A1 (en) * 2003-09-03 2005-08-04 General Electric Company Resin compositions and methods of use thereof
US7405246B2 (en) * 2005-04-05 2008-07-29 Momentive Performance Materials Inc. Cure system, adhesive system, electronic device
US7446136B2 (en) * 2005-04-05 2008-11-04 Momentive Performance Materials Inc. Method for producing cure system, adhesive system, and electronic device
US7339834B2 (en) 2005-06-03 2008-03-04 Sandisk Corporation Starting program voltage shift with cycling of non-volatile memory
DE102005040126A1 (de) * 2005-08-25 2007-03-01 Altana Electrical Insulation Gmbh Überzugsmasse
TWI305389B (en) * 2005-09-05 2009-01-11 Advanced Semiconductor Eng Matrix package substrate process
US7551482B2 (en) 2006-12-27 2009-06-23 Sandisk Corporation Method for programming with initial programming voltage based on trial
US7570520B2 (en) 2006-12-27 2009-08-04 Sandisk Corporation Non-volatile storage system with initial programming voltage based on trial
EP2166037A4 (de) * 2007-07-11 2012-07-25 Nissan Chemical Ind Ltd Epoxidharzformendes flüssigpräparat mit anorganischen partikeln
EP2145928B1 (de) * 2008-07-18 2017-09-13 Evonik Degussa GmbH Dispersion von hydrophobierten Siliciumdioxidpartikeln und Granulat hiervon
DE102008048874A1 (de) * 2008-09-25 2010-04-08 Siemens Aktiengesellschaft Beschichtungen für elektronische Schaltungen
WO2010043638A2 (en) * 2008-10-15 2010-04-22 Basf Se Curable epoxide formulation containing silica
JP5353629B2 (ja) * 2008-11-14 2013-11-27 信越化学工業株式会社 熱硬化性樹脂組成物
JP5638812B2 (ja) * 2010-02-01 2014-12-10 株式会社ダイセル 硬化性エポキシ樹脂組成物
MX2013000247A (es) * 2010-06-25 2013-10-01 Dow Global Technologies Llc Composiciones de resina epoxica curable y compuestos preparados a partir de las mismas.
US8070046B1 (en) * 2010-12-02 2011-12-06 Rohm And Haas Electronic Materials Llc Amine flux composition and method of soldering
US8070045B1 (en) * 2010-12-02 2011-12-06 Rohm And Haas Electronic Materials Llc Curable amine flux composition and method of soldering
JP5598343B2 (ja) * 2011-01-17 2014-10-01 信越化学工業株式会社 半導体封止用液状エポキシ樹脂組成物及び半導体装置
US8531821B2 (en) * 2011-01-28 2013-09-10 Raytheon Company System for securing a semiconductor device to a printed circuit board
JP5685451B2 (ja) * 2011-02-01 2015-03-18 アイカ工業株式会社 難燃化用組成物及び化粧板
CN102876179B (zh) * 2011-07-13 2015-03-11 中国科学院化学研究所 用于喷墨打印直接制版用铝版基的涂料及其制法和应用
TW201329145A (zh) 2011-11-28 2013-07-16 日東電工股份有限公司 底層充填材料及半導體裝置之製造方法
CN115216150A (zh) * 2014-02-24 2022-10-21 汉高知识产权控股有限责任公司 导热性预涂底部填充配制物及其用途
US9833450B2 (en) * 2015-02-19 2017-12-05 Lixte Biotechnology, Inc. Oxabicycloheptanes and oxabicycloheptenes for the treatment of depressive and stress disorders
KR102321555B1 (ko) * 2016-08-10 2021-11-03 파나소닉 아이피 매니지먼트 가부시키가이샤 봉지용 아크릴 조성물, 시트재, 적층 시트, 경화물, 반도체 장치 및 반도체 장치의 제조 방법
TWI606565B (zh) * 2016-08-31 2017-11-21 金寶電子工業股份有限公司 封裝結構及其製作方法
TWI654218B (zh) 2018-01-08 2019-03-21 財團法人工業技術研究院 樹脂組合物與導熱材料的形成方法
CN109504327A (zh) * 2018-11-13 2019-03-22 烟台德邦科技有限公司 一种高Tg高可靠性的环氧树脂封装导电胶及其制备方法
EP4227295A4 (de) * 2020-10-09 2024-10-30 Daicel Corporation Härtbares verbundprodukt
CN114149725B (zh) * 2021-11-25 2022-07-08 中国船舶重工集团公司第七二五研究所 一种破冰船用破冰涂料及其制备方法
CN119432145A (zh) * 2023-07-31 2025-02-14 华为技术有限公司 分散液、浆料及其应用
CN116814174B (zh) * 2023-08-24 2023-11-28 佛山市奥川顺新材料实业有限公司 一种复合型pet保护膜及其制备方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4217438A (en) * 1978-12-15 1980-08-12 General Electric Company Polycarbonate transesterification process
JPH04154861A (ja) * 1990-10-19 1992-05-27 Toshiba Silicone Co Ltd 樹脂組成物
IL101664A (en) * 1991-05-01 1996-01-31 Rohm & Haas Epoxy molding composition for surface mount applications
US5249101A (en) * 1992-07-06 1993-09-28 International Business Machines Corporation Chip carrier with protective coating for circuitized surface
US5307438A (en) * 1992-08-13 1994-04-26 Minnesota Mining And Manufacturing Company Index matching compositions with improved DNG/DT
JPH06232296A (ja) * 1993-02-05 1994-08-19 Nitto Denko Corp 半導体装置
RU2069461C1 (ru) * 1994-03-05 1996-11-20 Фирма "ЗИ" Способ герметизации изделий
NL9402233A (nl) * 1994-12-29 1996-08-01 3P Licensing Bv Werkwijze voor het omhullen van een elektronische component, een aldus omhulde elektronische component en daarvoor bestemd kunststofmateriaal.
JPH1176928A (ja) * 1997-09-03 1999-03-23 Asahi Glass Co Ltd 透明被覆成形品の製造方法
US6210790B1 (en) * 1998-07-15 2001-04-03 Rensselaer Polytechnic Institute Glass-like composites comprising a surface-modified colloidal silica and method of making thereof
US6576718B1 (en) * 1999-10-05 2003-06-10 General Electric Company Powder coating of thermosetting resin(s) and poly(phenylene ethers(s))
US6555602B1 (en) * 1999-10-06 2003-04-29 Nitto Denko Corporation Composition of epoxy resin, anhydride and microcapsule accelerator
JP4633214B2 (ja) * 1999-12-08 2011-02-16 富士通株式会社 エポキシ樹脂組成物
US6578718B2 (en) * 2000-05-01 2003-06-17 Raymond H. Levy Paint chip display system
US6548189B1 (en) * 2001-10-26 2003-04-15 General Electric Company Epoxy adhesive
US6833629B2 (en) * 2001-12-14 2004-12-21 National Starch And Chemical Investment Holding Corporation Dual cure B-stageable underfill for wafer level
US20030164555A1 (en) * 2002-03-01 2003-09-04 Tong Quinn K. B-stageable underfill encapsulant and method for its application
US7037399B2 (en) * 2002-03-01 2006-05-02 National Starch And Chemical Investment Holding Corporation Underfill encapsulant for wafer packaging and method for its application
EP1508261B1 (de) * 2002-05-23 2010-09-22 3M Innovative Properties Company Elektronische baugruppe und verfahren zur herstellung einer elektronischen baugruppe
US20040102529A1 (en) * 2002-11-22 2004-05-27 Campbell John Robert Functionalized colloidal silica, dispersions and methods made thereby
US20040101688A1 (en) * 2002-11-22 2004-05-27 Slawomir Rubinsztajn Curable epoxy compositions, methods and articles made therefrom
JP4481672B2 (ja) * 2003-02-07 2010-06-16 株式会社日本触媒 半導体封止材用微粒子および半導体封止用樹脂組成物

Also Published As

Publication number Publication date
RU2358353C2 (ru) 2009-06-10
JP2007504321A (ja) 2007-03-01
KR20060093707A (ko) 2006-08-25
MXPA06002522A (es) 2006-06-20
CN1875477A (zh) 2006-12-06
CA2537828A1 (en) 2005-03-17
DE602004023734D1 (de) 2009-12-03
US20050049334A1 (en) 2005-03-03
AU2004271534A1 (en) 2005-03-17
ZA200602266B (en) 2007-07-25
CN100490130C (zh) 2009-05-20
BRPI0413778A (pt) 2006-10-31
ZA200602267B (en) 2007-07-25
EP1665376A1 (de) 2006-06-07
RU2006110520A (ru) 2007-10-10
US20050049352A1 (en) 2005-03-03
WO2005024939A1 (en) 2005-03-17
CN1875478A (zh) 2006-12-06

Similar Documents

Publication Publication Date Title
ATE446589T1 (de) Lösungsmittel-modifizierte harz-zusammensetzungen und verwendungsverfahren dafür
MY138890A (en) Combinations of resin compositions and methods of use therof
DE60336302D1 (de) Benzoxazin enthaltende vernetztbare misschungen
TWI299748B (en) Adhesive composition, its manufacturing method, and adhesive film, substrate for carrying a semiconductor device and semiconductor device using such adhesive composition
TW200940672A (en) Adhesive film composition for semiconductor assembly, adhesive film, dicing die bonding film, device package, and associated methods
ATE295868T1 (de) Lackierbares material
SG121779A1 (en) Curing accelerator, epoxy resin composition, and semiconductor device
SG158878A1 (en) Epoxy resin composition, method of rendering the same latent, and semiconductor device
MY145608A (en) Thermosetting resin composition and semiconductor sealing medium
TWI260331B (en) Aging-stable epoxy resin system, molded materials and structural elements manufactured therefrom, and their usages
TW200614900A (en) A substrate having a built-in chip and external connection terminals on both sides and a method for manufacturing the same
WO2009084831A3 (en) Epoxy resin composition for encapsulating semiconductor device and semiconductor device using the same
TW200511454A (en) Adhesive sheet for producing a semiconductor device
BRPI0413780A (pt) composições de resina de solvente modificada e método de uso das mesmas
TW200801064A (en) Semiconductor encapsulating epoxy resin composition and semiconductor device
SG160407A1 (en) Epoxy resin composition and semiconductor device
ATE409712T1 (de) Epoxidharz zusammensetzung
MY144685A (en) Epoxy resin composition for semiconductor encapsulating use, and semiconductor device
TW200624380A (en) Low-adhesion material and mold for molding resin using the same
SG151236A1 (en) Attach paste composition for semiconductor package
CN102559119A (zh) 一种具有良好流变稳定性的单组份环氧包封胶及制备方法
TW200502307A (en) Epoxy resin composition for semiconductor sealing and semiconductor device
US20080193751A1 (en) Uv-Curing Adhesive, Preparation Process, Adhesively Bonded Semiconductor Component, and Method of Adhesive Bonding
DE60336591D1 (de) Epoxidharz-zusammensetzung
TW200720350A (en) Liquid epoxy resin compostie

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties