ATE425947T1 - Neue difunktionelle fotoinitiatoren - Google Patents
Neue difunktionelle fotoinitiatorenInfo
- Publication number
- ATE425947T1 ATE425947T1 AT02783054T AT02783054T ATE425947T1 AT E425947 T1 ATE425947 T1 AT E425947T1 AT 02783054 T AT02783054 T AT 02783054T AT 02783054 T AT02783054 T AT 02783054T AT E425947 T1 ATE425947 T1 AT E425947T1
- Authority
- AT
- Austria
- Prior art keywords
- photo initiators
- new difunctional
- difunctional
- new
- iia
- Prior art date
Links
- 239000003999 initiator Substances 0.000 title 1
- 150000001875 compounds Chemical class 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
- C07C49/83—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/45—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
- C07C45/46—Friedel-Crafts reactions
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
- C07C45/63—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by introduction of halogen; by substitution of halogen atoms by other halogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
- C07C45/64—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by introduction of functional groups containing oxygen only in singly bound form
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/78—Separation; Purification; Stabilisation; Use of additives
- C07C45/81—Separation; Purification; Stabilisation; Use of additives by change in the physical state, e.g. crystallisation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Paints Or Removers (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP01811020 | 2001-11-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE425947T1 true ATE425947T1 (de) | 2009-04-15 |
Family
ID=8184197
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT02783054T ATE425947T1 (de) | 2001-11-08 | 2002-10-31 | Neue difunktionelle fotoinitiatoren |
Country Status (13)
Country | Link |
---|---|
US (1) | US7084183B2 (de) |
EP (1) | EP1442005B1 (de) |
JP (1) | JP4541701B2 (de) |
KR (1) | KR100894974B1 (de) |
CN (1) | CN1249009C (de) |
AT (1) | ATE425947T1 (de) |
BR (1) | BR0213981A (de) |
CA (1) | CA2462377C (de) |
DE (1) | DE60231636D1 (de) |
ES (1) | ES2321386T3 (de) |
MX (1) | MXPA04004347A (de) |
TW (1) | TWI312786B (de) |
WO (1) | WO2003040076A2 (de) |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NZ537094A (en) * | 2002-07-19 | 2006-09-29 | Ciba Sc Holding Ag | Compositions containing difunctional photoinitiators and aminoacrylates |
US20060209098A1 (en) * | 2003-04-16 | 2006-09-21 | Andre Fuchs | Radiation curable ink-jet ink containing an alpha hydroxy ketone as photoinitiator |
EP1620382B1 (de) * | 2003-05-05 | 2013-09-04 | Basf Se | Verfahren zur herstellung von 1-phenylindan photoinitiatoren |
NZ543895A (en) * | 2003-05-06 | 2008-03-28 | Ciba Sc Holding Ag | Novel trifunctional photoinitiators for radiation-curable compositions |
US7799295B2 (en) * | 2003-11-03 | 2010-09-21 | Oz Minerals Limited | Ore leach method with aqueous sulfuric acid containing ferric ions |
DE602005025217D1 (de) * | 2004-04-15 | 2011-01-20 | Basf Se | Verfahren zur photohärtung mit lichtemittierenden dioden |
WO2005100292A1 (en) * | 2004-04-19 | 2005-10-27 | Ciba Specialty Chemicals Holding Inc. | New photoinitiators |
US7309550B2 (en) * | 2004-09-20 | 2007-12-18 | Chemence, Inc. | Photosensitive composition with low yellowing under UV-light and sunlight exposure |
CN100560663C (zh) * | 2004-10-29 | 2009-11-18 | 大日本油墨化学工业株式会社 | 活性能量射线固化型喷墨记录用墨 |
JP4967310B2 (ja) * | 2004-10-29 | 2012-07-04 | Dic株式会社 | 活性エネルギー線硬化型インクジェット記録用インク |
JP4506453B2 (ja) * | 2004-12-22 | 2010-07-21 | Dic株式会社 | 光ディスク用活性エネルギー線硬化型組成物及びそれを用いた光ディスク |
JP2006276640A (ja) * | 2005-03-30 | 2006-10-12 | Taiyo Ink Mfg Ltd | 感光性ペースト及びそれを用いて得られる焼成物パターン |
ITVA20050032A1 (it) * | 2005-05-13 | 2006-11-14 | Lamberti Spa | Esteri fenilgliossilici generanti residui a bassa migrabilita' e odore |
JP4678399B2 (ja) * | 2006-12-01 | 2011-04-27 | Jsr株式会社 | 反射防止膜 |
WO2008122504A1 (en) * | 2007-04-04 | 2008-10-16 | Basf Se | Alpha-hydroxyketones |
WO2009050116A2 (en) * | 2007-10-17 | 2009-04-23 | Basf Se | Adhesion promoting photoinitiators for uv cured coatings over metal surfaces |
MX2011003670A (es) | 2008-10-31 | 2011-04-28 | Basf Se | Esteres fosfonicos de (met) acrilato como promotores de la adhesion. |
US8259021B2 (en) * | 2008-12-22 | 2012-09-04 | Industrial Technology Research Institute | Electromagnetic radiation apparatus and method for forming the same |
WO2010077132A1 (en) | 2008-12-31 | 2010-07-08 | Draka Comteq B.V. | Uvled apparatus for curing glass-fiber coatings |
US20110054062A1 (en) * | 2009-08-26 | 2011-03-03 | Desanto Jr Ronald F | UV Pressure-Sensitive Adhesive for Stickers and Labels |
GB2484843A (en) * | 2009-10-15 | 2012-04-25 | Johnson Matthey Plc | Polymorphs of Bromfenac sodium |
DK2388239T3 (da) | 2010-05-20 | 2017-04-24 | Draka Comteq Bv | Hærdningsapparat, der anvender vinklede UV-LED'er |
US8871311B2 (en) | 2010-06-03 | 2014-10-28 | Draka Comteq, B.V. | Curing method employing UV sources that emit differing ranges of UV radiation |
EP2418183B1 (de) | 2010-08-10 | 2018-07-25 | Draka Comteq B.V. | Verfahren zur Härtung beschichteter Glasfasern mit erhöhter UVLED-Intensität |
JP2015061897A (ja) * | 2013-08-23 | 2015-04-02 | Dicグラフィックス株式会社 | 紫外線硬化型コーティングニス組成物の印刷方法 |
JP6308360B2 (ja) * | 2014-03-28 | 2018-04-11 | セイコーエプソン株式会社 | 非水系光硬化型インクジェット組成物収容体及び記録方法 |
CN107075000B (zh) | 2014-09-04 | 2020-01-31 | Igm集团公司 | 多环光引发剂 |
CN104591991A (zh) * | 2014-12-05 | 2015-05-06 | 沈阳师范大学 | 羟基酮双官能团光引发剂的制备方法 |
WO2016198117A1 (en) * | 2015-06-12 | 2016-12-15 | Polycrystalline S.R.L. | New crystal forms of minodronic acid |
US9988539B2 (en) * | 2015-11-12 | 2018-06-05 | Ricoh Company, Ltd. | Active-energy-ray-curable composition, active-energy-ray-curable ink, composition stored container, two-dimensional or three-dimensional image forming apparatus, two-dimensional or three-dimensional image forming method, cured material, and structure |
CN106278848A (zh) * | 2016-08-16 | 2017-01-04 | 甘肃金盾化工有限责任公司 | 一种双[4‑(2‑羟基‑2‑甲基丙酰基)苯基]甲烷的生产工艺 |
CN106365974B (zh) * | 2016-08-29 | 2019-07-02 | 天津久日新材料股份有限公司 | 新的羟基酮类光引发剂及其制备和应用 |
CN112279800B (zh) * | 2019-07-24 | 2022-12-09 | 常州强力电子新材料股份有限公司 | 增感化合物、感光性树脂组合物及各自的应用 |
US20220153918A1 (en) * | 2020-11-17 | 2022-05-19 | Divergent Technologies, Inc. | Isocyanurate resin compositions |
CN115894202A (zh) * | 2022-12-06 | 2023-04-04 | 常州久日化学有限公司 | 一种光引发剂1173蒸馏釜残的处理方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2722264C2 (de) * | 1977-05-17 | 1984-06-28 | Merck Patent Gmbh, 6100 Darmstadt | Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren |
EP0003002B1 (de) * | 1977-12-22 | 1984-06-13 | Ciba-Geigy Ag | Verwendung von aromatisch-aliphatischen Ketonen als Photoinitiatoren, photopolymerisierbare Systeme enthaltend solche Ketone und neue aromatisch-aliphatische Ketone |
DE3008411A1 (de) * | 1980-03-05 | 1981-09-10 | Merck Patent Gmbh, 6100 Darmstadt | Neue aromatisch-aliphatische ketone, ihre verwendung als photoinitiatoren sowie photopolymerisierbare systeme enthaltend solche ketone |
IT1176018B (it) * | 1984-04-12 | 1987-08-12 | Lamberti Flli Spa | Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione |
JPS6277346A (ja) * | 1985-09-28 | 1987-04-09 | Nippon Oil & Fats Co Ltd | 新規なビスヒドロキシアルキルフエノンおよびそれを有効成分とする光重合開始剤 |
US4987159A (en) * | 1990-04-11 | 1991-01-22 | Fratelli Lamberti S.P.A. | Carbonyl derivatives of 1-phenylindan suitable for use as polymerization photoinitiators, their preparation and use |
JPH06102698B2 (ja) * | 1990-04-27 | 1994-12-14 | 積水化学工業株式会社 | 光重合性組成物 |
SG53043A1 (en) | 1996-08-28 | 1998-09-28 | Ciba Geigy Ag | Molecular complex compounds as photoinitiators |
NZ537094A (en) | 2002-07-19 | 2006-09-29 | Ciba Sc Holding Ag | Compositions containing difunctional photoinitiators and aminoacrylates |
-
2002
- 2002-10-28 TW TW091132019A patent/TWI312786B/zh not_active IP Right Cessation
- 2002-10-31 EP EP02783054A patent/EP1442005B1/de not_active Expired - Lifetime
- 2002-10-31 AT AT02783054T patent/ATE425947T1/de not_active IP Right Cessation
- 2002-10-31 WO PCT/EP2002/012160 patent/WO2003040076A2/en active Application Filing
- 2002-10-31 ES ES02783054T patent/ES2321386T3/es not_active Expired - Lifetime
- 2002-10-31 CA CA2462377A patent/CA2462377C/en not_active Expired - Fee Related
- 2002-10-31 BR BR0213981-2A patent/BR0213981A/pt not_active IP Right Cessation
- 2002-10-31 MX MXPA04004347A patent/MXPA04004347A/es active IP Right Grant
- 2002-10-31 US US10/494,593 patent/US7084183B2/en not_active Expired - Lifetime
- 2002-10-31 KR KR1020047006995A patent/KR100894974B1/ko active IP Right Grant
- 2002-10-31 JP JP2003542125A patent/JP4541701B2/ja not_active Expired - Lifetime
- 2002-10-31 CN CNB028221931A patent/CN1249009C/zh not_active Expired - Lifetime
- 2002-10-31 DE DE60231636T patent/DE60231636D1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP4541701B2 (ja) | 2010-09-08 |
CA2462377C (en) | 2011-03-15 |
TW200406426A (en) | 2004-05-01 |
DE60231636D1 (de) | 2009-04-30 |
WO2003040076A3 (en) | 2003-12-24 |
WO2003040076A2 (en) | 2003-05-15 |
KR20050042064A (ko) | 2005-05-04 |
MXPA04004347A (es) | 2004-08-11 |
CN1582267A (zh) | 2005-02-16 |
TWI312786B (en) | 2009-08-01 |
CN1249009C (zh) | 2006-04-05 |
KR100894974B1 (ko) | 2009-04-24 |
CA2462377A1 (en) | 2003-05-15 |
BR0213981A (pt) | 2004-08-31 |
US7084183B2 (en) | 2006-08-01 |
EP1442005A2 (de) | 2004-08-04 |
EP1442005B1 (de) | 2009-03-18 |
US20050004249A1 (en) | 2005-01-06 |
ES2321386T3 (es) | 2009-06-05 |
JP2005508378A (ja) | 2005-03-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |