ATE366469T1 - Halbleiterlaserbauelement und verfahren zu seiner herstellung - Google Patents

Halbleiterlaserbauelement und verfahren zu seiner herstellung

Info

Publication number
ATE366469T1
ATE366469T1 AT01925886T AT01925886T ATE366469T1 AT E366469 T1 ATE366469 T1 AT E366469T1 AT 01925886 T AT01925886 T AT 01925886T AT 01925886 T AT01925886 T AT 01925886T AT E366469 T1 ATE366469 T1 AT E366469T1
Authority
AT
Austria
Prior art keywords
active layer
waveguide region
region
light
semiconductor laser
Prior art date
Application number
AT01925886T
Other languages
English (en)
Inventor
Hiroaki Matsumura
Original Assignee
Nichia Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nichia Corp filed Critical Nichia Corp
Application granted granted Critical
Publication of ATE366469T1 publication Critical patent/ATE366469T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227Buried mesa structure ; Striped active layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/32Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/323Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/32308Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm
    • H01S5/32341Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm blue laser based on GaN or GaP
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S2301/00Functional characteristics
    • H01S2301/18Semiconductor lasers with special structural design for influencing the near- or far-field
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/065Mode locking; Mode suppression; Mode selection ; Self pulsating
    • H01S5/0651Mode control
    • H01S5/0653Mode suppression, e.g. specific multimode
    • H01S5/0655Single transverse or lateral mode emission
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1003Waveguide having a modified shape along the axis, e.g. branched, curved, tapered, voids
    • H01S5/1014Tapered waveguide, e.g. spotsize converter
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1053Comprising an active region having a varying composition or cross-section in a specific direction
    • H01S5/1064Comprising an active region having a varying composition or cross-section in a specific direction varying width along the optical axis
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2004Confining in the direction perpendicular to the layer structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227Buried mesa structure ; Striped active layer
    • H01S5/2275Buried mesa structure ; Striped active layer mesa created by etching
AT01925886T 2000-06-08 2001-04-25 Halbleiterlaserbauelement und verfahren zu seiner herstellung ATE366469T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000172797 2000-06-08
JP2001116197 2001-04-13

Publications (1)

Publication Number Publication Date
ATE366469T1 true ATE366469T1 (de) 2007-07-15

Family

ID=26593596

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01925886T ATE366469T1 (de) 2000-06-08 2001-04-25 Halbleiterlaserbauelement und verfahren zu seiner herstellung

Country Status (11)

Country Link
US (3) US6925101B2 (de)
EP (1) EP1306944B1 (de)
KR (2) KR100763827B1 (de)
CN (1) CN1251372C (de)
AT (1) ATE366469T1 (de)
AU (1) AU2001252558A1 (de)
CA (1) CA2411445C (de)
DE (1) DE60129227T2 (de)
MY (1) MY135464A (de)
TW (1) TW490898B (de)
WO (1) WO2001095446A1 (de)

Families Citing this family (128)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3797151B2 (ja) * 2001-07-05 2006-07-12 ソニー株式会社 レーザダイオード、光学ピックアップ装置、光ディスク装置および光通信装置
JP3878868B2 (ja) * 2002-03-01 2007-02-07 シャープ株式会社 GaN系レーザ素子
JP2004006498A (ja) * 2002-05-31 2004-01-08 Toyoda Gosei Co Ltd Iii族窒化物系化合物半導体発光素子
JP4216011B2 (ja) * 2002-07-17 2009-01-28 シャープ株式会社 窒化物半導体レーザ素子チップとそれを含むレーザ装置
US7076130B2 (en) * 2002-09-11 2006-07-11 Adc Telecommunications, Inc. Semiconductor optical device having asymmetric ridge waveguide and method of making same
US6927412B2 (en) 2002-11-21 2005-08-09 Ricoh Company, Ltd. Semiconductor light emitter
JP2006511944A (ja) * 2002-12-20 2006-04-06 クリー インコーポレイテッド 半導体メサ構造および導電性接合部を含む電子素子ならびに関連素子を形成する方法
KR100964399B1 (ko) * 2003-03-08 2010-06-17 삼성전자주식회사 반도체 레이저 다이오드 및 이를 채용한 반도체 레이저다이오드 조립체
JP2004287093A (ja) * 2003-03-20 2004-10-14 Fujitsu Ltd 光導波路、光デバイスおよび光導波路の製造方法
US6870969B2 (en) * 2003-04-23 2005-03-22 Intel Corporation Method and apparatus for phase shifting and optical beam in an optical device with reduced contact loss
US7301979B2 (en) * 2003-05-22 2007-11-27 Matsushita Electric Industrial Co., Ltd. Semiconductor laser
US6954558B2 (en) * 2003-06-24 2005-10-11 Intel Corporation Method and apparatus for phase shifting an optical beam in an optical device
JP4472278B2 (ja) * 2003-06-26 2010-06-02 三菱電機株式会社 半導体レーザ素子
US20050116243A1 (en) * 2003-12-01 2005-06-02 Atsunori Mochida Semiconductor laser device and its manufacturing method
JP4751024B2 (ja) * 2004-01-16 2011-08-17 シャープ株式会社 半導体レーザおよびその製造方法
JP2005209952A (ja) * 2004-01-23 2005-08-04 Matsushita Electric Ind Co Ltd 半導体レーザ装置およびそれを用いた光ピックアップ装置
JP2005268581A (ja) * 2004-03-19 2005-09-29 Matsushita Electric Ind Co Ltd 窒化ガリウム系化合物半導体発光素子
JP2005347665A (ja) * 2004-06-07 2005-12-15 Fujitsu Ltd 光半導体装置及びその製造方法
JP4613304B2 (ja) * 2004-09-07 2011-01-19 独立行政法人産業技術総合研究所 量子ナノ構造半導体レーザ
JP3857294B2 (ja) * 2004-11-11 2006-12-13 三菱電機株式会社 半導体レーザ
KR101100425B1 (ko) * 2005-05-07 2011-12-30 삼성전자주식회사 반도체 레이저 다이오드 및 그 제조방법
US7280712B2 (en) * 2005-08-04 2007-10-09 Intel Corporation Method and apparatus for phase shifiting an optical beam in an optical device
US7352788B2 (en) * 2005-08-15 2008-04-01 Avago Technologies Ecbu Ip (Singapore) Pte, Ltd. Nitride semiconductor vertical cavity surface emitting laser
KR100809209B1 (ko) * 2006-04-25 2008-02-29 삼성전기주식회사 비극성 m면 질화물 반도체 제조방법
US20070280309A1 (en) * 2006-05-23 2007-12-06 Ansheng Liu Optical waveguide with single sided coplanar contact optical phase modulator
JP4948134B2 (ja) * 2006-11-22 2012-06-06 シャープ株式会社 窒化物半導体発光素子
US7773650B2 (en) * 2006-12-28 2010-08-10 Nichia Corporation Nitride semiconductor laser element
US7646798B2 (en) * 2006-12-28 2010-01-12 Nichia Corporation Nitride semiconductor laser element
US7668218B2 (en) * 2007-02-20 2010-02-23 Nichia Corporation Nitride semiconductor laser element
DE102007051315B4 (de) 2007-09-24 2018-04-05 Osram Opto Semiconductors Gmbh Strahlungsemittierendes Bauelement
US8242006B2 (en) * 2007-12-21 2012-08-14 General Electric Company Smooth electrode and method of fabricating same
JP2009200478A (ja) * 2008-01-21 2009-09-03 Sanyo Electric Co Ltd 半導体レーザ素子およびその製造方法
US8144743B2 (en) * 2008-03-05 2012-03-27 Rohm Co., Ltd. Nitride based semiconductor device and fabrication method for the same
DE102008016613B4 (de) * 2008-04-01 2010-04-15 Epcos Ag Verfahren zur Herstellung eines elektrischen Bauelements mit mindestens einer dielektrischen Schicht und ein elektrisches Bauelement mit mindestens einer dielektrischen Schicht
US8847249B2 (en) 2008-06-16 2014-09-30 Soraa, Inc. Solid-state optical device having enhanced indium content in active regions
US8259769B1 (en) 2008-07-14 2012-09-04 Soraa, Inc. Integrated total internal reflectors for high-gain laser diodes with high quality cleaved facets on nonpolar/semipolar GaN substrates
US8805134B1 (en) 2012-02-17 2014-08-12 Soraa Laser Diode, Inc. Methods and apparatus for photonic integration in non-polar and semi-polar oriented wave-guided optical devices
KR101479623B1 (ko) * 2008-07-22 2015-01-08 삼성전자주식회사 질화물 반도체 발광소자
CN102131957A (zh) * 2008-08-28 2011-07-20 硅绝缘体技术有限公司 基于紫外线吸收的监测器和对氯化物气流的控制
US8247886B1 (en) 2009-03-09 2012-08-21 Soraa, Inc. Polarization direction of optical devices using selected spatial configurations
US8634442B1 (en) 2009-04-13 2014-01-21 Soraa Laser Diode, Inc. Optical device structure using GaN substrates for laser applications
US8242522B1 (en) 2009-05-12 2012-08-14 Soraa, Inc. Optical device structure using non-polar GaN substrates and growth structures for laser applications in 481 nm
US8254425B1 (en) 2009-04-17 2012-08-28 Soraa, Inc. Optical device structure using GaN substrates and growth structures for laser applications
US8837545B2 (en) 2009-04-13 2014-09-16 Soraa Laser Diode, Inc. Optical device structure using GaN substrates and growth structures for laser applications
WO2010120819A1 (en) * 2009-04-13 2010-10-21 Kaai, Inc. Optical device structure using gan substrates for laser applications
US8294179B1 (en) 2009-04-17 2012-10-23 Soraa, Inc. Optical device structure using GaN substrates and growth structures for laser applications
US8416825B1 (en) 2009-04-17 2013-04-09 Soraa, Inc. Optical device structure using GaN substrates and growth structure for laser applications
US8293628B2 (en) * 2009-05-28 2012-10-23 Technion Research & Development Foundation Ltd. Strain-controlled atomic layer epitaxy, quantum wells and superlattices prepared thereby and uses thereof
US9800017B1 (en) 2009-05-29 2017-10-24 Soraa Laser Diode, Inc. Laser device and method for a vehicle
US8247887B1 (en) 2009-05-29 2012-08-21 Soraa, Inc. Method and surface morphology of non-polar gallium nitride containing substrates
US8427590B2 (en) 2009-05-29 2013-04-23 Soraa, Inc. Laser based display method and system
US9829780B2 (en) 2009-05-29 2017-11-28 Soraa Laser Diode, Inc. Laser light source for a vehicle
US8509275B1 (en) 2009-05-29 2013-08-13 Soraa, Inc. Gallium nitride based laser dazzling device and method
US9250044B1 (en) 2009-05-29 2016-02-02 Soraa Laser Diode, Inc. Gallium and nitrogen containing laser diode dazzling devices and methods of use
US10108079B2 (en) 2009-05-29 2018-10-23 Soraa Laser Diode, Inc. Laser light source for a vehicle
US8384300B2 (en) * 2009-09-01 2013-02-26 Topanga Technologies, Inc. Integrated RF electrodeless plasma lamp device and methods
US8750342B1 (en) 2011-09-09 2014-06-10 Soraa Laser Diode, Inc. Laser diodes with scribe structures
US8355418B2 (en) 2009-09-17 2013-01-15 Soraa, Inc. Growth structures and method for forming laser diodes on {20-21} or off cut gallium and nitrogen containing substrates
US9583678B2 (en) 2009-09-18 2017-02-28 Soraa, Inc. High-performance LED fabrication
KR20110042560A (ko) * 2009-10-19 2011-04-27 엘지이노텍 주식회사 발광소자, 발광소자 제조방법 및 발광소자 패키지
TWI411128B (zh) * 2009-10-20 2013-10-01 Univ Nat Cheng Kung 發光二極體晶片之製造方法
KR100999779B1 (ko) 2010-02-01 2010-12-08 엘지이노텍 주식회사 발광소자, 발광소자의 제조방법 및 발광소자 패키지
US8367450B2 (en) * 2010-02-21 2013-02-05 Technion Research & Development Foundation Ltd. Light emitting system and method of fabricating and using the same
US8492702B2 (en) * 2010-02-21 2013-07-23 Technion Research & Development Foundation Limited Method and system for detecting light having a light absorbing layer with bandgap modifying atoms
US9927611B2 (en) 2010-03-29 2018-03-27 Soraa Laser Diode, Inc. Wearable laser based display method and system
US8451876B1 (en) 2010-05-17 2013-05-28 Soraa, Inc. Method and system for providing bidirectional light sources with broad spectrum
US9450143B2 (en) * 2010-06-18 2016-09-20 Soraa, Inc. Gallium and nitrogen containing triangular or diamond-shaped configuration for optical devices
US8816319B1 (en) 2010-11-05 2014-08-26 Soraa Laser Diode, Inc. Method of strain engineering and related optical device using a gallium and nitrogen containing active region
US9048170B2 (en) 2010-11-09 2015-06-02 Soraa Laser Diode, Inc. Method of fabricating optical devices using laser treatment
US9318875B1 (en) 2011-01-24 2016-04-19 Soraa Laser Diode, Inc. Color converting element for laser diode
US9025635B2 (en) 2011-01-24 2015-05-05 Soraa Laser Diode, Inc. Laser package having multiple emitters configured on a support member
US9595813B2 (en) 2011-01-24 2017-03-14 Soraa Laser Diode, Inc. Laser package having multiple emitters configured on a substrate member
US9093820B1 (en) 2011-01-25 2015-07-28 Soraa Laser Diode, Inc. Method and structure for laser devices using optical blocking regions
JP5742344B2 (ja) * 2011-03-20 2015-07-01 富士通株式会社 受光素子、光受信器及び光受信モジュール
US8913897B2 (en) * 2011-04-29 2014-12-16 Huawei Technologies Co., Ltd. Laser diode, method for manufacturing laser diode and passive optical network system
DE102011100175B4 (de) * 2011-05-02 2021-12-23 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Laserlichtquelle mit einer Stegwellenleiterstruktur und einer Modenfilterstruktur
US8686431B2 (en) 2011-08-22 2014-04-01 Soraa, Inc. Gallium and nitrogen containing trilateral configuration for optical devices
US8971370B1 (en) 2011-10-13 2015-03-03 Soraa Laser Diode, Inc. Laser devices using a semipolar plane
US8603847B2 (en) * 2012-01-16 2013-12-10 Varian Semiconductor Equipment Associates, Inc. Integration of current blocking layer and n-GaN contact doping by implantation
JP2013149724A (ja) * 2012-01-18 2013-08-01 Sumitomo Electric Ind Ltd 光集積素子の製造方法
JP5880065B2 (ja) 2012-01-18 2016-03-08 住友電気工業株式会社 光集積素子の製造方法
JP5880063B2 (ja) * 2012-01-18 2016-03-08 住友電気工業株式会社 光集積素子の製造方法
US9020003B1 (en) 2012-03-14 2015-04-28 Soraa Laser Diode, Inc. Group III-nitride laser diode grown on a semi-polar orientation of gallium and nitrogen containing substrates
US9343871B1 (en) 2012-04-05 2016-05-17 Soraa Laser Diode, Inc. Facet on a gallium and nitrogen containing laser diode
US9800016B1 (en) 2012-04-05 2017-10-24 Soraa Laser Diode, Inc. Facet on a gallium and nitrogen containing laser diode
US10559939B1 (en) 2012-04-05 2020-02-11 Soraa Laser Diode, Inc. Facet on a gallium and nitrogen containing laser diode
US9099843B1 (en) 2012-07-19 2015-08-04 Soraa Laser Diode, Inc. High operating temperature laser diodes
US8971368B1 (en) 2012-08-16 2015-03-03 Soraa Laser Diode, Inc. Laser devices having a gallium and nitrogen containing semipolar surface orientation
US9978904B2 (en) 2012-10-16 2018-05-22 Soraa, Inc. Indium gallium nitride light emitting devices
DE102012111512B4 (de) * 2012-11-28 2021-11-04 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Halbleiterstreifenlaser
US9166372B1 (en) 2013-06-28 2015-10-20 Soraa Laser Diode, Inc. Gallium nitride containing laser device configured on a patterned substrate
US9362715B2 (en) 2014-02-10 2016-06-07 Soraa Laser Diode, Inc Method for manufacturing gallium and nitrogen bearing laser devices with improved usage of substrate material
US9368939B2 (en) 2013-10-18 2016-06-14 Soraa Laser Diode, Inc. Manufacturable laser diode formed on C-plane gallium and nitrogen material
US9520695B2 (en) 2013-10-18 2016-12-13 Soraa Laser Diode, Inc. Gallium and nitrogen containing laser device having confinement region
US9379525B2 (en) 2014-02-10 2016-06-28 Soraa Laser Diode, Inc. Manufacturable laser diode
US9419189B1 (en) 2013-11-04 2016-08-16 Soraa, Inc. Small LED source with high brightness and high efficiency
US9209596B1 (en) 2014-02-07 2015-12-08 Soraa Laser Diode, Inc. Manufacturing a laser diode device from a plurality of gallium and nitrogen containing substrates
US9871350B2 (en) 2014-02-10 2018-01-16 Soraa Laser Diode, Inc. Manufacturable RGB laser diode source
US9520697B2 (en) 2014-02-10 2016-12-13 Soraa Laser Diode, Inc. Manufacturable multi-emitter laser diode
DE102014105191B4 (de) 2014-04-11 2019-09-19 Osram Opto Semiconductors Gmbh Halbleiter-Streifenlaser und Halbleiterbauteil
US9564736B1 (en) 2014-06-26 2017-02-07 Soraa Laser Diode, Inc. Epitaxial growth of p-type cladding regions using nitrogen gas for a gallium and nitrogen containing laser diode
CN104184045B (zh) * 2014-08-22 2017-04-05 华中科技大学 一种定波长单纵模工作的脊波导分布反馈半导体激光器
US9246311B1 (en) 2014-11-06 2016-01-26 Soraa Laser Diode, Inc. Method of manufacture for an ultraviolet laser diode
JP2016092364A (ja) 2014-11-11 2016-05-23 スタンレー電気株式会社 発光装置及び灯具
US9653642B1 (en) 2014-12-23 2017-05-16 Soraa Laser Diode, Inc. Manufacturable RGB display based on thin film gallium and nitrogen containing light emitting diodes
US9666677B1 (en) 2014-12-23 2017-05-30 Soraa Laser Diode, Inc. Manufacturable thin film gallium and nitrogen containing devices
JP6409614B2 (ja) 2015-02-23 2018-10-24 日亜化学工業株式会社 半導体素子の製造方法及び半導体素子
KR102347387B1 (ko) * 2015-03-31 2022-01-06 서울바이오시스 주식회사 자외선 발광 소자
US11437775B2 (en) 2015-08-19 2022-09-06 Kyocera Sld Laser, Inc. Integrated light source using a laser diode
US11437774B2 (en) 2015-08-19 2022-09-06 Kyocera Sld Laser, Inc. High-luminous flux laser-based white light source
US10879673B2 (en) 2015-08-19 2020-12-29 Soraa Laser Diode, Inc. Integrated white light source using a laser diode and a phosphor in a surface mount device package
US10938182B2 (en) 2015-08-19 2021-03-02 Soraa Laser Diode, Inc. Specialized integrated light source using a laser diode
DE102015116712A1 (de) 2015-10-01 2017-04-06 Osram Opto Semiconductors Gmbh Optoelektronisches Bauelement
US9847454B2 (en) * 2015-10-02 2017-12-19 Epistar Corporation Light-emitting device
US9787963B2 (en) 2015-10-08 2017-10-10 Soraa Laser Diode, Inc. Laser lighting having selective resolution
US11495942B2 (en) * 2016-10-28 2022-11-08 Nlight, Inc. Method, system and apparatus for higher order mode suppression
WO2018168430A1 (ja) * 2017-03-16 2018-09-20 パナソニックIpマネジメント株式会社 半導体レーザ装置、半導体レーザモジュール及び溶接用レーザ光源システム
US10771155B2 (en) 2017-09-28 2020-09-08 Soraa Laser Diode, Inc. Intelligent visible light with a gallium and nitrogen containing laser source
US10222474B1 (en) 2017-12-13 2019-03-05 Soraa Laser Diode, Inc. Lidar systems including a gallium and nitrogen containing laser light source
US10551728B1 (en) 2018-04-10 2020-02-04 Soraa Laser Diode, Inc. Structured phosphors for dynamic lighting
KR102651547B1 (ko) * 2018-09-07 2024-03-28 삼성전자주식회사 발광 장치 및 이를 포함하는 디스플레이 장치
US11239637B2 (en) 2018-12-21 2022-02-01 Kyocera Sld Laser, Inc. Fiber delivered laser induced white light system
US11421843B2 (en) 2018-12-21 2022-08-23 Kyocera Sld Laser, Inc. Fiber-delivered laser-induced dynamic light system
US11884202B2 (en) 2019-01-18 2024-01-30 Kyocera Sld Laser, Inc. Laser-based fiber-coupled white light system
US11228158B2 (en) 2019-05-14 2022-01-18 Kyocera Sld Laser, Inc. Manufacturable laser diodes on a large area gallium and nitrogen containing substrate
US10903623B2 (en) 2019-05-14 2021-01-26 Soraa Laser Diode, Inc. Method and structure for manufacturable large area gallium and nitrogen containing substrate
WO2020255281A1 (ja) * 2019-06-19 2020-12-24 三菱電機株式会社 半導体光素子
CN114498299B (zh) * 2022-01-21 2023-01-31 度亘激光技术(苏州)有限公司 一种半导体器件及其制备方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US165635A (en) * 1875-07-13 Improvement in watch-key combination tools
JPS52153686A (en) 1976-06-16 1977-12-20 Nippon Telegr & Teleph Corp <Ntt> Semiconductor light emitting device
JPS603177A (ja) 1983-06-21 1985-01-09 Toshiba Corp 半導体レ−ザ装置
JPS60192379A (ja) 1984-03-12 1985-09-30 Mitsubishi Electric Corp 半導体レ−ザ装置
JPH02199889A (ja) * 1989-01-30 1990-08-08 Toshiba Corp 半導体レーザ装置及びその製造方法
US5578839A (en) * 1992-11-20 1996-11-26 Nichia Chemical Industries, Ltd. Light-emitting gallium nitride-based compound semiconductor device
US5565693A (en) * 1993-01-07 1996-10-15 Nec Corporation Semiconductor optical integrated circuits
JP2814906B2 (ja) 1993-01-07 1998-10-27 日本電気株式会社 光半導体素子およびその製造方法
JP2601173B2 (ja) 1993-12-20 1997-04-16 日本電気株式会社 半導体光導波路およびその製造方法
FR2730821B1 (fr) * 1995-02-22 1997-04-30 Alcatel Optronics Guide optique segmente pouvant notamment etre inclus dans un dispositif semiconducteur
US5946336A (en) 1996-01-11 1999-08-31 Canon Kabushiki Kaisha Optical semiconductor apparatus, fabrication method thereof, modulation method therefor, light source apparatus and optical communication system or method using the same
CA2276335C (en) * 1997-01-09 2006-04-11 Nichia Chemical Industries, Ltd. Nitride semiconductor device
US6014396A (en) * 1997-09-05 2000-01-11 Sdl, Inc. Flared semiconductor optoelectronic device
JP3604278B2 (ja) 1998-02-17 2004-12-22 日亜化学工業株式会社 窒化物半導体レーザー素子
JP3630977B2 (ja) * 1998-03-19 2005-03-23 キヤノン株式会社 位相調整領域を有するレーザ及びその使用法
JP4166885B2 (ja) * 1998-05-18 2008-10-15 富士通株式会社 光半導体装置およびその製造方法
JP2000031599A (ja) 1998-07-14 2000-01-28 Sony Corp 窒化物系iii−v族化合物半導体レーザ
TW451535B (en) * 1998-09-04 2001-08-21 Sony Corp Semiconductor device and package, and fabrication method thereof
JP3031415B1 (ja) * 1998-10-06 2000-04-10 日亜化学工業株式会社 窒化物半導体レーザ素子
JP2000353859A (ja) * 1999-06-10 2000-12-19 Sharp Corp 光導波路及び半導体レーザ素子
US6657237B2 (en) 2000-12-18 2003-12-02 Samsung Electro-Mechanics Co., Ltd. GaN based group III-V nitride semiconductor light-emitting diode and method for fabricating the same
ATE487255T1 (de) * 2001-05-31 2010-11-15 Nichia Corp Halbleiterlaserelement

Also Published As

Publication number Publication date
MY135464A (en) 2008-04-30
KR100763829B1 (ko) 2007-10-05
CA2411445A1 (en) 2002-12-04
EP1306944A4 (de) 2005-11-30
US20050170542A1 (en) 2005-08-04
EP1306944A1 (de) 2003-05-02
TW490898B (en) 2002-06-11
KR20030007907A (ko) 2003-01-23
WO2001095446A1 (fr) 2001-12-13
CN1251372C (zh) 2006-04-12
US20090129418A1 (en) 2009-05-21
US6925101B2 (en) 2005-08-02
CN1434996A (zh) 2003-08-06
CA2411445C (en) 2011-08-16
US7470555B2 (en) 2008-12-30
EP1306944B1 (de) 2007-07-04
KR20060036488A (ko) 2006-04-28
DE60129227T2 (de) 2008-03-13
US20030128729A1 (en) 2003-07-10
KR100763827B1 (ko) 2007-10-05
AU2001252558A1 (en) 2001-12-17
US7709281B2 (en) 2010-05-04
DE60129227D1 (de) 2007-08-16

Similar Documents

Publication Publication Date Title
ATE366469T1 (de) Halbleiterlaserbauelement und verfahren zu seiner herstellung
JP2004523113A5 (de)
WO2002101894A1 (fr) Element laser a semi-conducteurs
DE69610101T2 (de) Mindestens fünflagige optische vorrichtung
JP2008096484A (ja) 光半導体装置
DE602006002459D1 (de) Optoelektronische Vorrichtung mit einem Laser mit integriertem Modulator und Herstellungsverfahren dafür
IL160688A0 (en) A semiconductor laser based on the effect of photonic band gap crystal-mediated filtration of higher modes of laser radiation and method of making same
ATE488038T1 (de) Photonische integrierte bauelemente mit mehreren ebenen
SE9800756D0 (sv) A method of fabricating mirrors in polymer waveguides
EP1146614A3 (de) Halbleiterlaser mit verbesserter Lichtbegrenzung und Herstellungsverfahren
JP2006251063A (ja) 光コネクタ、光結合方法及び光素子
JP2003177368A5 (de)
JP6233300B2 (ja) 光位相変調素子、素子設定方法、光機能回路、及び光マトリックス回路
ATE491964T1 (de) Optischer wellenleiter
WO2003030317A1 (fr) Dispositif laser a semi-conducteur a base de gan
TW346694B (en) Self-pulsation semiconductor laser
ATE430393T1 (de) Optoelektronische einrichtungen mit gefaltetem resonator
ATE291278T1 (de) Verfahren zur herstellung eines halbleiterbauelements
Galarza et al. A new spot-size converter concept using fiber-matched antiresonant reflecting optical waveguides
Ledentsov et al. Passive cavity laser and tilted wave laser for Bessel-like beam coherently coupled bars and stacks
ATE552632T1 (de) Verfahren und vorrichtung zur erzeugung und verstärkung von licht in einer halbführenden faser mit kern mit hohem seitenverhältnis
ATE139037T1 (de) Optischer baustein mit optischem koppler zum aufspalten oder zusammenführen von licht und verfahren zu dessen herstellung
WO2004005982A3 (de) Mikrostrukturierung von lichtwellenleitern zur erzeugung von optischen funktionselementen
KR950034943A (ko) 광디바이스
JP3925706B2 (ja) 半導体レーザ及びその製造方法

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties