ATE296335T1 - Abscheidungsverfahren mit verschiedenen quellen - Google Patents

Abscheidungsverfahren mit verschiedenen quellen

Info

Publication number
ATE296335T1
ATE296335T1 AT01271929T AT01271929T ATE296335T1 AT E296335 T1 ATE296335 T1 AT E296335T1 AT 01271929 T AT01271929 T AT 01271929T AT 01271929 T AT01271929 T AT 01271929T AT E296335 T1 ATE296335 T1 AT E296335T1
Authority
AT
Austria
Prior art keywords
composition
substrate
pellet
deposition
sulphide
Prior art date
Application number
AT01271929T
Other languages
English (en)
Inventor
Dan Daeweon Cheong
Original Assignee
Ifire Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ifire Technology Corp filed Critical Ifire Technology Corp
Application granted granted Critical
Publication of ATE296335T1 publication Critical patent/ATE296335T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/77—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
    • C09K11/7728—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing europium
    • C09K11/7729—Chalcogenides
    • C09K11/7731—Chalcogenides with alkaline earth metals
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/77—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
    • C09K11/7728—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing europium
    • C09K11/7734—Aluminates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
AT01271929T 2000-12-22 2001-12-17 Abscheidungsverfahren mit verschiedenen quellen ATE296335T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/747,315 US6610352B2 (en) 2000-12-22 2000-12-22 Multiple source deposition process
PCT/CA2001/001823 WO2002051960A1 (en) 2000-12-22 2001-12-17 Multiple source deposition process

Publications (1)

Publication Number Publication Date
ATE296335T1 true ATE296335T1 (de) 2005-06-15

Family

ID=25004562

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01271929T ATE296335T1 (de) 2000-12-22 2001-12-17 Abscheidungsverfahren mit verschiedenen quellen

Country Status (8)

Country Link
US (2) US6610352B2 (de)
EP (1) EP1346007B1 (de)
JP (2) JP2004522826A (de)
KR (1) KR100874523B1 (de)
AT (1) ATE296335T1 (de)
CA (1) CA2431084C (de)
DE (1) DE60111077T2 (de)
WO (1) WO2002051960A1 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6771019B1 (en) * 1999-05-14 2004-08-03 Ifire Technology, Inc. Electroluminescent laminate with patterned phosphor structure and thick film dielectric with improved dielectric properties
US6627251B2 (en) * 2001-04-19 2003-09-30 Tdk Corporation Phosphor thin film, preparation method, and EL panel
US7005198B2 (en) 2001-04-19 2006-02-28 The Westaim Corporation Phosphor thin film, preparation method, and EL panel
US6793782B2 (en) * 2001-12-21 2004-09-21 Ifire Technology Inc. Sputter deposition process for electroluminescent phosphors
JP2003301171A (ja) * 2002-02-06 2003-10-21 Tdk Corp 蛍光体薄膜、その製造方法およびｅｌパネル
DE60308550T2 (de) * 2002-12-16 2007-06-06 Ifire Technology Corp., Fort Saskatchewan Zusammengesetztes zerstäubungs-target und phosphor-abscheidungsmethode
WO2004057925A1 (en) 2002-12-20 2004-07-08 Ifire Technology Corp. Aluminum nitride passivated phosphors for electroluminescent displays
TW200420740A (en) * 2003-01-30 2004-10-16 Ifire Technology Inc Controlled sulfur species deposition process
US7155250B2 (en) * 2003-03-10 2006-12-26 Lucent Technologies Inc. Fast method for adjusting downlink transmitted power
JP2007527950A (ja) * 2003-07-03 2007-10-04 アイファイアー・テクノロジー・コープ 発光体堆積のための硫化水素注入方法
WO2005033360A1 (en) * 2003-10-07 2005-04-14 Ifire Technology Corp. Polysulfide thermal vapour source for thin sulfide film deposition
US20050092253A1 (en) * 2003-11-04 2005-05-05 Venkat Selvamanickam Tape-manufacturing system having extended operational capabilites
US8057856B2 (en) * 2004-03-15 2011-11-15 Ifire Ip Corporation Method for gettering oxygen and water during vacuum deposition of sulfide films
US8133554B2 (en) 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
US7699932B2 (en) 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
US7427367B2 (en) * 2004-08-06 2008-09-23 Ifire Technology Corp. Barium thioaluminate phosphor materials with novel crystal structures
US20060046594A1 (en) * 2004-08-30 2006-03-02 David Starrett Flame retardant sound dampening appliance insulation
CA2590400A1 (en) * 2004-10-29 2006-05-04 Ifire Ip Corporation Novel thiosilicate phosphor compositions and deposition methods using barium-silicon vacuum deposition sources for deposition of thiosilicate phosphor films
JP4849829B2 (ja) * 2005-05-15 2012-01-11 株式会社ソニー・コンピュータエンタテインメント センタ装置
JP5016848B2 (ja) * 2006-05-19 2012-09-05 キヤノン株式会社 多原色ディスプレイ
KR20080045974A (ko) * 2006-11-21 2008-05-26 삼성전자주식회사 박막 증착장치 및 박막 증착방법
US10276740B1 (en) 2018-03-19 2019-04-30 The United States Of America As Represented By The Secretary Of The Air Force Co-deposition of black silicon

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Also Published As

Publication number Publication date
EP1346007B1 (de) 2005-05-25
US6610352B2 (en) 2003-08-26
WO2002051960A1 (en) 2002-07-04
KR20030091948A (ko) 2003-12-03
CA2431084C (en) 2010-03-23
US20040028957A1 (en) 2004-02-12
KR100874523B1 (ko) 2008-12-16
CA2431084A1 (en) 2002-07-04
DE60111077T2 (de) 2006-01-26
EP1346007A1 (de) 2003-09-24
JP2004522826A (ja) 2004-07-29
US20020081371A1 (en) 2002-06-27
DE60111077D1 (de) 2005-06-30
JP2009062619A (ja) 2009-03-26

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