DE60225909D1 - Kathodenzerstäubung von thioaluminat leuchtstofffilmen unter verwendung eines einzeltargets - Google Patents

Kathodenzerstäubung von thioaluminat leuchtstofffilmen unter verwendung eines einzeltargets

Info

Publication number
DE60225909D1
DE60225909D1 DE60225909T DE60225909T DE60225909D1 DE 60225909 D1 DE60225909 D1 DE 60225909D1 DE 60225909 T DE60225909 T DE 60225909T DE 60225909 T DE60225909 T DE 60225909T DE 60225909 D1 DE60225909 D1 DE 60225909D1
Authority
DE
Germany
Prior art keywords
phosphor
composition
elements
thioaluminate
single target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60225909T
Other languages
English (en)
Other versions
DE60225909T2 (de
Inventor
Alexander Kosyachkov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
iFire IP Corp
Original Assignee
iFire IP Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by iFire IP Corp filed Critical iFire IP Corp
Publication of DE60225909D1 publication Critical patent/DE60225909D1/de
Application granted granted Critical
Publication of DE60225909T2 publication Critical patent/DE60225909T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/77—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
    • C09K11/7728—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing europium
    • C09K11/7729—Chalcogenides
    • C09K11/7731—Chalcogenides with alkaline earth metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides
DE60225909T 2001-05-29 2002-05-07 Kathodenzerstäubung von thioaluminat leuchtstofffilmen unter verwendung eines einzeltargets Expired - Fee Related DE60225909T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/867,080 US6447654B1 (en) 2001-05-29 2001-05-29 Single source sputtering of thioaluminate phosphor films
US867080 2001-05-29
PCT/CA2002/000688 WO2002097155A1 (en) 2001-05-29 2002-05-07 Single source sputtering of thioaluminate phosphor films

Publications (2)

Publication Number Publication Date
DE60225909D1 true DE60225909D1 (de) 2008-05-15
DE60225909T2 DE60225909T2 (de) 2009-04-09

Family

ID=25349045

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60225909T Expired - Fee Related DE60225909T2 (de) 2001-05-29 2002-05-07 Kathodenzerstäubung von thioaluminat leuchtstofffilmen unter verwendung eines einzeltargets

Country Status (8)

Country Link
US (2) US6447654B1 (de)
EP (1) EP1392881B1 (de)
JP (1) JP4308648B2 (de)
KR (1) KR100914357B1 (de)
AT (1) ATE391195T1 (de)
CA (1) CA2447626C (de)
DE (1) DE60225909T2 (de)
WO (1) WO2002097155A1 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3479273B2 (ja) * 2000-09-21 2003-12-15 Ｔｄｋ株式会社 蛍光体薄膜その製造方法およびｅｌパネル
US6686062B2 (en) * 2001-06-13 2004-02-03 Ifire Technology Inc. Magnesium calcium thioaluminate phosphor
WO2003081957A1 (en) * 2002-03-27 2003-10-02 Ifire Technology Inc. Yttrium substituted barium thioaluminate phosphor materials
KR20050092703A (ko) * 2002-12-16 2005-09-22 이화이어 테크놀로지 코포레이션 복합구조 스퍼터링 타겟 및 형광체 증착방법
TW200420740A (en) 2003-01-30 2004-10-16 Ifire Technology Inc Controlled sulfur species deposition process
JP4263001B2 (ja) * 2003-03-06 2009-05-13 アイファイヤー アイピー コーポレイション スパッタリングターゲット
JP2007527950A (ja) * 2003-07-03 2007-10-04 アイファイアー・テクノロジー・コープ 発光体堆積のための硫化水素注入方法
CA2540592A1 (en) * 2003-10-07 2005-04-14 Ifire Technology Corp. Polysulfide thermal vapour source for thin sulfide film deposition
EP1721026A4 (de) * 2004-03-04 2009-11-11 Ifire Ip Corp Quellen von reaktivem metall und abscheidungsverfahren für thioaluminat-leuchtstoffe
US8057856B2 (en) 2004-03-15 2011-11-15 Ifire Ip Corporation Method for gettering oxygen and water during vacuum deposition of sulfide films
US7812522B2 (en) * 2004-07-22 2010-10-12 Ifire Ip Corporation Aluminum oxide and aluminum oxynitride layers for use with phosphors for electroluminescent displays
US7427367B2 (en) * 2004-08-06 2008-09-23 Ifire Technology Corp. Barium thioaluminate phosphor materials with novel crystal structures
WO2006045195A1 (en) * 2004-10-29 2006-05-04 Ifire Technology Corp. Novel thiosilicate phosphor compositions and deposition methods using barium-silicon vacuum deposition sources for deposition of thiosilicate phosphor films
JP4747751B2 (ja) * 2005-05-09 2011-08-17 三菱マテリアル株式会社 エレクトロルミネッセンス素子における蛍光体膜形成用高強度スパッタリングターゲット
JP2007217755A (ja) * 2006-02-17 2007-08-30 Mitsubishi Materials Corp エレクトロルミネッセンス素子における蛍光体膜形成用高強度スパッタリングターゲット
JP5028962B2 (ja) * 2006-11-09 2012-09-19 住友金属鉱山株式会社 Ｅｌ発光層形成用スパッタリングターゲットとその製造方法
KR100839222B1 (ko) 2006-12-19 2008-06-19 고려대학교 산학협력단 펄스파 레이저 박막 증착장치 및 이를 이용한혼성금속나노점배열 형성방법
CN104140814A (zh) * 2013-05-06 2014-11-12 海洋王照明科技股份有限公司 铕掺杂硫代铝酸盐发光材料、制备方法及其应用

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4389295A (en) * 1982-05-06 1983-06-21 Gte Products Corporation Thin film phosphor sputtering process
US4675092A (en) * 1986-03-27 1987-06-23 Gte Laboratories Incorporated Method of producing thin film electroluminescent structures
US4725344A (en) * 1986-06-20 1988-02-16 Rca Corporation Method of making electroluminescent phosphor films
WO1992008333A1 (en) * 1990-11-02 1992-05-14 Kabushiki Kaisha Komatsu Seisakusho Thin-film el element
US5309070A (en) * 1991-03-12 1994-05-03 Sun Sey Shing AC TFEL device having blue light emitting thiogallate phosphor
US5432015A (en) 1992-05-08 1995-07-11 Westaim Technologies, Inc. Electroluminescent laminate with thick film dielectric
JP2858397B2 (ja) * 1994-09-07 1999-02-17 株式会社デンソー エレクトロルミネッセンス素子及びその製造方法
US5780966A (en) * 1995-04-20 1998-07-14 Nippondenso Co., Ltd. Electroluminescent device with improved blue color purity
US6771019B1 (en) 1999-05-14 2004-08-03 Ifire Technology, Inc. Electroluminescent laminate with patterned phosphor structure and thick film dielectric with improved dielectric properties

Also Published As

Publication number Publication date
ATE391195T1 (de) 2008-04-15
KR100914357B1 (ko) 2009-08-28
US20030000829A1 (en) 2003-01-02
EP1392881B1 (de) 2008-04-02
WO2002097155A1 (en) 2002-12-05
US6841045B2 (en) 2005-01-11
JP2004533095A (ja) 2004-10-28
JP4308648B2 (ja) 2009-08-05
KR20040030632A (ko) 2004-04-09
CA2447626C (en) 2014-04-29
DE60225909T2 (de) 2009-04-09
US6447654B1 (en) 2002-09-10
EP1392881A1 (de) 2004-03-03
CA2447626A1 (en) 2002-12-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee