ATE206488T1 - Diamant - Google Patents

Diamant

Info

Publication number
ATE206488T1
ATE206488T1 AT97305716T AT97305716T ATE206488T1 AT E206488 T1 ATE206488 T1 AT E206488T1 AT 97305716 T AT97305716 T AT 97305716T AT 97305716 T AT97305716 T AT 97305716T AT E206488 T1 ATE206488 T1 AT E206488T1
Authority
AT
Austria
Prior art keywords
tension
tensile rupture
600mpa
300mpa
insert
Prior art date
Application number
AT97305716T
Other languages
German (de)
English (en)
Inventor
John Lloyd Collins
Original Assignee
De Beers Ind Diamond
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by De Beers Ind Diamond filed Critical De Beers Ind Diamond
Application granted granted Critical
Publication of ATE206488T1 publication Critical patent/ATE206488T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/274—Diamond only using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/278—Diamond only doping or introduction of a secondary phase in the diamond
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S427/00—Coating processes
    • Y10S427/103—Diamond-like carbon coating, i.e. DLC
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T407/00—Cutters, for shaping
    • Y10T407/27—Cutters, for shaping comprising tool of specific chemical composition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Drilling Tools (AREA)
AT97305716T 1996-07-31 1997-07-30 Diamant ATE206488T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB9616043.7A GB9616043D0 (en) 1996-07-31 1996-07-31 Diamond

Publications (1)

Publication Number Publication Date
ATE206488T1 true ATE206488T1 (de) 2001-10-15

Family

ID=10797775

Family Applications (1)

Application Number Title Priority Date Filing Date
AT97305716T ATE206488T1 (de) 1996-07-31 1997-07-30 Diamant

Country Status (11)

Country Link
US (1) US5981057A (https=)
EP (1) EP0822269B1 (https=)
JP (2) JP4588129B2 (https=)
KR (1) KR100497693B1 (https=)
AT (1) ATE206488T1 (https=)
AU (1) AU714582B2 (https=)
CA (1) CA2211705C (https=)
DE (1) DE69707071T2 (https=)
GB (1) GB9616043D0 (https=)
TW (1) TW378167B (https=)
ZA (1) ZA976542B (https=)

Families Citing this family (53)

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GB9616043D0 (en) * 1996-07-31 1996-09-11 De Beers Ind Diamond Diamond
DE19912721C1 (de) * 1999-03-20 2000-08-10 Simon Karl Gmbh & Co Kg Verfahren zum Herstellen einer Fräslamelle und nach dem Verfahren hergestellte Fräslamelle
JP4469552B2 (ja) * 2000-06-15 2010-05-26 エレメント シックス （プロプライエタリイ）リミテッド 厚い単結晶ダイヤモンド層、それを造る方法及びその層から形成された宝石の原石
DE60135653D1 (de) * 2000-06-15 2008-10-16 Element Six Pty Ltd Einkristalldiamant hergestellt durch cvd
US6815052B2 (en) * 2000-12-01 2004-11-09 P1 Diamond, Inc. Filled diamond foam material and method for forming same
CN1538890A (zh) * 2001-08-10 2004-10-20 住友电气工业株式社 有凹口或槽口的超高压烧结切削工具及其制造方法和保持机构
DE10153310A1 (de) * 2001-10-29 2003-05-22 Infineon Technologies Ag Photolithographisches Strukturierungsverfahren mit einer durch ein plasmaunterstützes Abscheideeverfahren hergestellten Kohlenstoff-Hartmaskenschicht diamantartiger Härte
GB0130005D0 (en) * 2001-12-14 2002-02-06 Diamanx Products Ltd Boron doped diamond
CA2419709C (en) * 2002-02-26 2008-09-23 Smith International, Inc. Semiconductive polycrystalline diamond
EP1602478B1 (en) * 2002-02-26 2009-10-14 Smith International, Inc. Cutting element including semiconductive polycrystalline diamond
JP2003321296A (ja) * 2002-04-25 2003-11-11 Shin Etsu Chem Co Ltd ダイヤモンド膜及びその製造方法
US7517588B2 (en) * 2003-10-08 2009-04-14 Frushour Robert H High abrasion resistant polycrystalline diamond composite
US7595110B2 (en) * 2003-10-08 2009-09-29 Frushour Robert H Polycrystalline diamond composite
JP2006152424A (ja) * 2004-12-01 2006-06-15 Osg Corp 硬質被膜および硬質被膜被覆加工工具
JP2006150572A (ja) * 2004-12-01 2006-06-15 Osg Corp ボロンドープダイヤモンド被膜およびダイヤモンド被覆加工工具
WO2007081492A2 (en) * 2006-01-04 2007-07-19 Uab Research Foundation High growth rate methods of producing high-quality diamonds
ES2638115T3 (es) * 2006-09-05 2017-10-18 Element Six Technologies Limited Electrodo de diamante sólido
GB0622483D0 (en) 2006-11-10 2006-12-20 Element Six Ltd Electrochemical apparatus having a forced flow arrangement
GB0622482D0 (en) 2006-11-10 2006-12-20 Element Six Ltd Diamond electrode
GB0716268D0 (en) * 2007-08-21 2007-09-26 Reedhycalog Uk Ltd PDC cutter with stress diffusing structures
DE202007011816U1 (de) * 2007-08-24 2007-12-20 Jakob Lach Gmbh & Co. Kg Monoblock-Planfräser
TWI457475B (zh) * 2008-05-05 2014-10-21 Carnegie Inst Of Washington 超韌性單晶型摻硼鑽石
JP5261690B2 (ja) * 2008-05-20 2013-08-14 貞雄 竹内 高強度ダイヤモンド膜工具
JP5165484B2 (ja) * 2008-07-16 2013-03-21 ユニタック株式会社 ドリルヘッドの製作方法及びドリルヘッド
US8342780B2 (en) * 2008-10-17 2013-01-01 Precorp, Inc. Shielded PCD or PCBN cutting tools
WO2010068419A2 (en) * 2008-11-25 2010-06-17 Carnegie Institution Of Washington Production of single crystal cvd diamond rapid growth rate
GB2467570B (en) * 2009-02-09 2012-09-19 Reedhycalog Uk Ltd Cutting element
EP2424694A1 (en) * 2009-04-28 2012-03-07 Diamond Innovations, Inc. Method to attach or improve the attachment of articles
US8945720B2 (en) * 2009-08-06 2015-02-03 National Oilwell Varco, L.P. Hard composite with deformable constituent and method of applying to earth-engaging tool
US9783885B2 (en) 2010-08-11 2017-10-10 Unit Cell Diamond Llc Methods for producing diamond mass and apparatus therefor
US10258959B2 (en) * 2010-08-11 2019-04-16 Unit Cell Diamond Llc Methods of producing heterodiamond and apparatus therefor
US8919463B2 (en) 2010-10-25 2014-12-30 National Oilwell DHT, L.P. Polycrystalline diamond cutting element
US8997900B2 (en) 2010-12-15 2015-04-07 National Oilwell DHT, L.P. In-situ boron doped PDC element
SG191220A1 (en) 2010-12-23 2013-07-31 Element Six Ltd Controlling doping of synthetic diamond material
GB201021865D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
GB201021860D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for diamond synthesis
GB201021853D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
GB201021870D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
GB201021855D0 (en) 2010-12-23 2011-02-02 Element Six Ltd Microwave power delivery system for plasma reactors
GB201021913D0 (en) 2010-12-23 2011-02-02 Element Six Ltd Microwave plasma reactors and substrates for synthetic diamond manufacture
US8741010B2 (en) 2011-04-28 2014-06-03 Robert Frushour Method for making low stress PDC
US8858665B2 (en) 2011-04-28 2014-10-14 Robert Frushour Method for making fine diamond PDC
US8974559B2 (en) 2011-05-12 2015-03-10 Robert Frushour PDC made with low melting point catalyst
US9061264B2 (en) 2011-05-19 2015-06-23 Robert H. Frushour High abrasion low stress PDC
US8828110B2 (en) 2011-05-20 2014-09-09 Robert Frushour ADNR composite
EP2772330A4 (en) * 2012-01-10 2015-07-08 Sumitomo Elec Hardmetal Corp DIAMOND COATED TOOL
JP2012232898A (ja) * 2012-08-17 2012-11-29 Sadao Takeuchi 高強度ダイヤモンド膜工具
JP6076775B2 (ja) * 2013-02-27 2017-02-08 三星ダイヤモンド工業株式会社 スクライビングホイール、ホルダーユニット、スクライブ装置及びスクライビングホイールの製造方法
CN104400028A (zh) * 2014-11-06 2015-03-11 成都迅德科技有限公司 一种数控设备用切削刀具
CN108602699B (zh) 2016-02-05 2021-04-27 西门子能源美国公司 在升高的压力下的电氧化
DE102019117796A1 (de) 2019-07-02 2021-01-07 WIKUS-Sägenfabrik Wilhelm H. Kullmann GmbH & Co. KG Zerspanungswerkzeug mit Pufferpartikeln
DE102019117799B4 (de) * 2019-07-02 2022-10-20 WIKUS-Sägenfabrik Wilhelm H. Kullmann GmbH & Co. KG Zerspanungswerkzeug mit asymmetrischen Zähnen mit Schneidpartikeln
JP7098856B2 (ja) * 2019-10-18 2022-07-12 住友電工ハードメタル株式会社 ダイヤモンド被覆工具

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JPS57195219A (en) * 1981-05-25 1982-11-30 Matsushita Electric Ind Co Ltd Liquid crystal color display panel
JPS61251158A (ja) * 1985-04-30 1986-11-08 Sumitomo Electric Ind Ltd 放熱基板
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JPH02141494A (ja) * 1988-07-30 1990-05-30 Kobe Steel Ltd ダイヤモンド気相合成装置
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Also Published As

Publication number Publication date
KR100497693B1 (ko) 2005-09-08
ZA976542B (en) 1998-04-01
KR980009531A (ko) 1998-04-30
TW378167B (en) 2000-01-01
JP2009039856A (ja) 2009-02-26
EP0822269B1 (en) 2001-10-04
JP4588129B2 (ja) 2010-11-24
DE69707071D1 (de) 2001-11-08
AU2943097A (en) 1998-02-05
DE69707071T2 (de) 2002-03-07
AU714582B2 (en) 2000-01-06
JPH10146703A (ja) 1998-06-02
CA2211705A1 (en) 1998-01-31
EP0822269A1 (en) 1998-02-04
GB9616043D0 (en) 1996-09-11
US5981057A (en) 1999-11-09
CA2211705C (en) 2004-04-20

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee