ES2082942T3 - Herramienta de diamante policristalino y metodo para producirla. - Google Patents
Herramienta de diamante policristalino y metodo para producirla.Info
- Publication number
- ES2082942T3 ES2082942T3 ES91310636T ES91310636T ES2082942T3 ES 2082942 T3 ES2082942 T3 ES 2082942T3 ES 91310636 T ES91310636 T ES 91310636T ES 91310636 T ES91310636 T ES 91310636T ES 2082942 T3 ES2082942 T3 ES 2082942T3
- Authority
- ES
- Spain
- Prior art keywords
- diamond
- impurities
- concentration
- resistance
- polycrystalline diamond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/271—Diamond only using hot filaments
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/274—Diamond only using microwave discharges
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/276—Diamond only using plasma jets
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/277—Diamond only using other elements in the gas phase besides carbon and hydrogen; using other elements besides carbon, hydrogen and oxygen in case of use of combustion torches; using other elements besides carbon, hydrogen and inert gas in case of use of plasma jets
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/278—Diamond only doping or introduction of a secondary phase in the diamond
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/279—Diamond only control of diamond crystallography
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S76/00—Metal tools and implements, making
- Y10S76/12—Diamond tools
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T407/00—Cutters, for shaping
- Y10T407/27—Cutters, for shaping comprising tool of specific chemical composition
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T408/00—Cutting by use of rotating axially moving tool
- Y10T408/78—Tool of specific diverse material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T408/00—Cutting by use of rotating axially moving tool
- Y10T408/81—Tool having crystalline cutting edge
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
- Y10T428/12021—All metal or with adjacent metals having metal particles having composition or density gradient or differential porosity
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
- Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
- Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
- Y10T428/12049—Nonmetal component
- Y10T428/12056—Entirely inorganic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
- Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
- Y10T428/12146—Nonmetal particles in a component
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Crystallography & Structural Chemistry (AREA)
- Combustion & Propulsion (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
UN DIAMANTE POLICRISTALINO (2) TIENE UNA CONCENTRACION DE IMPUREZAS NO UNIFORME A LO LARGO DE LA DIRECCION DE SU GROSOR. EL DIAMANTE CERCA DE LA SUPERFICIE INCLINADA (4) TIENE UNA CONCENTRACION DE IMPUREZAS MENOR. EL DIAMENTE CERCA DE LA SUPERFICIE DE FIJACION (5) TIENE UNA ALTA CONCENTRACION DE IMPUREZAS. EL DIAMANTE CON MAYOR CONCENTRACION DE IMPUREZAS CERCA DE LA SUPERFICIE DE FIJACION ALIVIA UNA FUERTE TENSION Y ABSORBE LOS GOLPES EXTERNOS. DEBIDO A LA MAYOR CONCENTRACION DE IMPUREZAS DEL DIAMANTE CERCA DE LA SUPERFICIE DE FIJACION, LA HERRAMIENTA DE DIAMANTE PRESENTA GRAN DUREZA Y UNA ALTA RESISTENCIA AL DESCASCARILLAMIENTO . EL DIAMANTE CON UNA ALTA CONCENTRACION DE IMPUREZAS CERCA DE LA SUPERFICIE INCLINADA ELEVA SU RESISTENCIA A LA ABRASION, SU RESISTENCIA A LA ADHESION Y SU FUERZA.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31921090 | 1990-11-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2082942T3 true ES2082942T3 (es) | 1996-04-01 |
Family
ID=18107639
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES91310636T Expired - Lifetime ES2082942T3 (es) | 1990-11-22 | 1991-11-19 | Herramienta de diamante policristalino y metodo para producirla. |
Country Status (5)
Country | Link |
---|---|
US (1) | US5584045A (es) |
EP (1) | EP0487292B1 (es) |
KR (1) | KR940004903B1 (es) |
DE (1) | DE69117140T2 (es) |
ES (1) | ES2082942T3 (es) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5370299A (en) * | 1992-04-23 | 1994-12-06 | Sumitomo Electric Industries, Ltd. | Bonding tool having diamond head and method of manufacturing the same |
CA2112308C (en) * | 1993-01-22 | 2000-08-15 | Louis K. Bigelow | Method of making white diamond film |
EP0668372A1 (en) * | 1994-02-16 | 1995-08-23 | General Electric Company | Semi-transparent diamond film |
DE69526129T2 (de) | 1994-05-23 | 2002-08-22 | Sumitomo Electric Industries, Ltd. | Verfahren und Vorrichtung zum Herstellen eines mit hartem Material bedeckten Halbleiters durch Polieren |
JP3675577B2 (ja) * | 1995-07-05 | 2005-07-27 | 日本特殊陶業株式会社 | ダイヤモンド被覆物品の製造方法 |
GB9616043D0 (en) * | 1996-07-31 | 1996-09-11 | De Beers Ind Diamond | Diamond |
DE19748110C2 (de) * | 1996-11-07 | 2000-07-13 | Koenig & Bauer Ag | Schneidmesser |
US5788426A (en) * | 1997-03-05 | 1998-08-04 | Ultra Tool Corporation | Cutting tool cartridge holder |
US6344149B1 (en) * | 1998-11-10 | 2002-02-05 | Kennametal Pc Inc. | Polycrystalline diamond member and method of making the same |
US6161990A (en) * | 1998-11-12 | 2000-12-19 | Kennametal Inc. | Cutting insert with improved flank surface roughness and method of making the same |
US6338754B1 (en) | 2000-05-31 | 2002-01-15 | Us Synthetic Corporation | Synthetic gasket material |
GB2366804B (en) * | 2000-09-19 | 2003-04-09 | Kinik Co | Cast diamond tools and their formation by chemical vapor deposition |
JP4228557B2 (ja) * | 2001-02-05 | 2009-02-25 | 三菱マテリアル株式会社 | スローアウェイチップ |
ATE356226T1 (de) * | 2002-10-29 | 2007-03-15 | Element Six Pty Ltd | Herstellungsverfahren eines verbundwerkstoffes |
GB0508889D0 (en) * | 2005-04-29 | 2005-06-08 | Element Six Ltd | Diamond transistor and method of manufacture thereof |
KR20120070558A (ko) | 2009-07-14 | 2012-06-29 | 엠에스엠 크리스탈 지비알 | 인덱스 가능한 인서트의 제조 방법 |
KR101729804B1 (ko) * | 2010-09-07 | 2017-04-24 | 스미또모 덴꼬오 하드메탈 가부시끼가이샤 | 절삭 공구 |
GB201021865D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | A microwave plasma reactor for manufacturing synthetic diamond material |
GB201021853D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | A microwave plasma reactor for manufacturing synthetic diamond material |
GB201021855D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | Microwave power delivery system for plasma reactors |
GB201021870D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | A microwave plasma reactor for manufacturing synthetic diamond material |
GB201021860D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | A microwave plasma reactor for diamond synthesis |
MY173889A (en) * | 2010-12-23 | 2020-02-26 | Element Six Ltd | Controlling doping of synthetic diamond material |
GB201021913D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | Microwave plasma reactors and substrates for synthetic diamond manufacture |
US9194189B2 (en) | 2011-09-19 | 2015-11-24 | Baker Hughes Incorporated | Methods of forming a cutting element for an earth-boring tool, a related cutting element, and an earth-boring tool including such a cutting element |
US9242342B2 (en) | 2012-03-14 | 2016-01-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Manufacture and method of making the same |
US10501998B1 (en) | 2013-01-04 | 2019-12-10 | Us Synthetic Corporation | Polycrystalline diamond compacts and applications therefor |
US9346149B1 (en) * | 2013-01-04 | 2016-05-24 | Us Synthetic Corporation | Polycrystalline diamond compacts and applications therefor |
US10773303B2 (en) * | 2015-08-05 | 2020-09-15 | Halliburton Energy Services, Inc. | Spark plasma sintered polycrystalline diamond compact |
WO2017023312A1 (en) * | 2015-08-05 | 2017-02-09 | Halliburton Energy Services, Inc. | Spark plasma sintered polycrystalline diamond |
JP6752213B2 (ja) * | 2015-10-19 | 2020-09-09 | 住友電気工業株式会社 | 単結晶ダイヤモンド、これを用いた工具及び単結晶ダイヤモンドの製造方法 |
DE102017204109B4 (de) | 2017-03-13 | 2019-03-14 | Gühring KG | Verwendung einer mit Fremdatomen dotierten Diamantschicht zur Erfassung des Abnutzungsgrades einer undotierten diamantenen Funktionsschicht eines Werkzeugs |
Family Cites Families (25)
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JPS5212126A (en) * | 1975-07-16 | 1977-01-29 | Hitachi Chem Co Ltd | Process for preparation of methacrylic acid |
IE46644B1 (en) * | 1977-02-18 | 1983-08-10 | Gen Electric | Temperature resistant abrasive compact and method for making same |
US4151686A (en) * | 1978-01-09 | 1979-05-01 | General Electric Company | Silicon carbide and silicon bonded polycrystalline diamond body and method of making it |
US4504284A (en) * | 1981-07-24 | 1985-03-12 | General Electric Company | Indexable composite cutting insert having corner cutting edges |
JPS5927753B2 (ja) * | 1981-11-25 | 1984-07-07 | 科学技術庁無機材質研究所長 | ダイヤモンドの合成法 |
US4525178A (en) * | 1984-04-16 | 1985-06-25 | Megadiamond Industries, Inc. | Composite polycrystalline diamond |
US4985051A (en) * | 1984-08-24 | 1991-01-15 | The Australian National University | Diamond compacts |
US4694918A (en) * | 1985-04-29 | 1987-09-22 | Smith International, Inc. | Rock bit with diamond tip inserts |
US5225275A (en) * | 1986-07-11 | 1993-07-06 | Kyocera Corporation | Method of producing diamond films |
ATE86537T1 (de) * | 1986-12-23 | 1993-03-15 | De Beers Ind Diamond | Werkzeugeinsatz. |
DE3706340A1 (de) * | 1987-02-27 | 1988-09-08 | Winter & Sohn Ernst | Verfahren zum auftragen einer verschleissschutzschicht und danach hergestelltes erzeugnis |
US4766040A (en) * | 1987-06-26 | 1988-08-23 | Sandvik Aktiebolag | Temperature resistant abrasive polycrystalline diamond bodies |
JPH01153228A (ja) * | 1987-12-10 | 1989-06-15 | Asahi Daiyamondo Kogyo Kk | 気相合成ダイヤモンド工具の製造法 |
EP0327051B2 (en) * | 1988-02-01 | 1997-09-17 | Sumitomo Electric Industries Limited | Diamond and its preparation by chemical vapor deposition method |
JPH01210201A (ja) * | 1988-02-16 | 1989-08-23 | Asahi Daiyamondo Kogyo Kk | 気相合成ダイヤモンド膜装着工具 |
JP2628601B2 (ja) * | 1988-07-12 | 1997-07-09 | 富士通株式会社 | ダイアモンド被覆超硬合金および超硬合金のダイアモンド被覆方法 |
JPH02106210A (ja) * | 1988-10-14 | 1990-04-18 | Sumitomo Electric Ind Ltd | ねじれ刃多結晶ダイヤモンド工具及びその製造方法 |
US4919974A (en) * | 1989-01-12 | 1990-04-24 | Ford Motor Company | Making diamond composite coated cutting tools |
US5266409A (en) * | 1989-04-28 | 1993-11-30 | Digital Equipment Corporation | Hydrogenated carbon compositions |
US5011509A (en) * | 1989-08-07 | 1991-04-30 | Frushour Robert H | Composite compact with a more thermally stable cutting edge and method of manufacturing the same |
US5064682A (en) * | 1989-10-26 | 1991-11-12 | Sanyo Electric Co., Ltd. | Method of forming a pseudo-diamond film on a base body |
DE69112465T2 (de) * | 1990-03-30 | 1996-03-28 | Sumitomo Electric Industries | Polykristallines Diamantwerkzeug und Verfahren für seine Herstellung. |
US5071677A (en) * | 1990-05-24 | 1991-12-10 | Houston Advanced Research Center | Halogen-assisted chemical vapor deposition of diamond |
SE9002135D0 (sv) * | 1990-06-15 | 1990-06-15 | Sandvik Ab | Improved tools for percussive and rotary crusching rock drilling provided with a diamond layer |
AU644213B2 (en) * | 1990-09-26 | 1993-12-02 | De Beers Industrial Diamond Division (Proprietary) Limited | Composite diamond abrasive compact |
-
1991
- 1991-11-19 EP EP91310636A patent/EP0487292B1/en not_active Expired - Lifetime
- 1991-11-19 DE DE69117140T patent/DE69117140T2/de not_active Expired - Fee Related
- 1991-11-19 ES ES91310636T patent/ES2082942T3/es not_active Expired - Lifetime
- 1991-11-22 KR KR1019910021051A patent/KR940004903B1/ko not_active IP Right Cessation
-
1995
- 1995-11-06 US US08/554,100 patent/US5584045A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5584045A (en) | 1996-12-10 |
EP0487292B1 (en) | 1996-02-14 |
DE69117140T2 (de) | 1996-07-04 |
KR940004903B1 (ko) | 1994-06-04 |
KR920010012A (ko) | 1992-06-26 |
DE69117140D1 (de) | 1996-03-28 |
EP0487292A1 (en) | 1992-05-27 |
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