ATE152827T1 - Verfahren und vorrichtung zum nachweis von teilchen - Google Patents

Verfahren und vorrichtung zum nachweis von teilchen

Info

Publication number
ATE152827T1
ATE152827T1 AT92301275T AT92301275T ATE152827T1 AT E152827 T1 ATE152827 T1 AT E152827T1 AT 92301275 T AT92301275 T AT 92301275T AT 92301275 T AT92301275 T AT 92301275T AT E152827 T1 ATE152827 T1 AT E152827T1
Authority
AT
Austria
Prior art keywords
light
angle
hypertelecentric
mirror
degrees
Prior art date
Application number
AT92301275T
Other languages
English (en)
Inventor
Charly Dany Allemand
Original Assignee
Inspex Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inspex Inc filed Critical Inspex Inc
Application granted granted Critical
Publication of ATE152827T1 publication Critical patent/ATE152827T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4704—Angular selective
    • G01N2021/4707—Forward scatter; Low angle scatter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4738—Diffuse reflection, e.g. also for testing fluids, fibrous materials
    • G01N21/474—Details of optical heads therefor, e.g. using optical fibres
    • G01N2021/4742—Details of optical heads therefor, e.g. using optical fibres comprising optical fibres

Landscapes

  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
AT92301275T 1991-02-19 1992-02-17 Verfahren und vorrichtung zum nachweis von teilchen ATE152827T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US65720791A 1991-02-19 1991-02-19

Publications (1)

Publication Number Publication Date
ATE152827T1 true ATE152827T1 (de) 1997-05-15

Family

ID=24636256

Family Applications (1)

Application Number Title Priority Date Filing Date
AT92301275T ATE152827T1 (de) 1991-02-19 1992-02-17 Verfahren und vorrichtung zum nachweis von teilchen

Country Status (4)

Country Link
US (1) US5317380A (de)
EP (1) EP0500293B1 (de)
AT (1) ATE152827T1 (de)
DE (1) DE69219501T2 (de)

Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3271425B2 (ja) * 1994-03-30 2002-04-02 ソニー株式会社 異物検査装置及び異物検査方法
US5864394A (en) * 1994-06-20 1999-01-26 Kla-Tencor Corporation Surface inspection system
US5883710A (en) 1994-12-08 1999-03-16 Kla-Tencor Corporation Scanning system for inspecting anomalies on surfaces
US20040057044A1 (en) * 1994-12-08 2004-03-25 Mehrdad Nikoonahad Scanning system for inspecting anamolies on surfaces
JPH08178857A (ja) * 1994-12-21 1996-07-12 Nikon Corp 大型基板用異物検査装置
US5631733A (en) * 1995-01-20 1997-05-20 Photon Dynamics, Inc. Large area defect monitor tool for manufacture of clean surfaces
US5653537A (en) * 1995-03-17 1997-08-05 Ircon, Inc. Non-contacting infrared temperature thermometer detector apparatus
US5604585A (en) * 1995-03-31 1997-02-18 Tencor Instruments Particle detection system employing a subsystem for collecting scattered light from the particles
US5982500A (en) * 1995-05-07 1999-11-09 Platsch; Hans Georg Device for measuring the surface of a print product
US5649169A (en) * 1995-06-20 1997-07-15 Advanced Micro Devices, Inc. Method and system for declustering semiconductor defect data
US5539752A (en) * 1995-06-30 1996-07-23 Advanced Micro Devices, Inc. Method and system for automated analysis of semiconductor defect data
US5742422A (en) * 1995-09-19 1998-04-21 Inspex, Inc. Adjustable fourier mask
US5777901A (en) * 1995-09-29 1998-07-07 Advanced Micro Devices, Inc. Method and system for automated die yield prediction in semiconductor manufacturing
US5825482A (en) * 1995-09-29 1998-10-20 Kla-Tencor Corporation Surface inspection system with misregistration error correction and adaptive illumination
US5913105A (en) * 1995-11-29 1999-06-15 Advanced Micro Devices Inc Method and system for recognizing scratch patterns on semiconductor wafers
EP0979398B1 (de) * 1996-06-04 2012-01-04 KLA-Tencor Corporation Optische rastervorrichtung fur oberflaechenpruefung
US5801824A (en) * 1996-11-25 1998-09-01 Photon Dynamics, Inc. Large area defect monitor tool for manufacture of clean surfaces
KR100540314B1 (ko) * 1997-03-31 2006-01-10 마이크로썸, 엘엘씨 광학 검사 모듈, 및 통합 처리 도구 내에서 기판 상의 입자 및 결함을 검출하기 위한 방법
US5745239A (en) * 1997-04-07 1998-04-28 Taiwan Semiconductor Manufacturing Company Multiple focal plane image comparison for defect detection and classification
US5917589A (en) * 1997-04-28 1999-06-29 International Business Machines Corporation Surface inspection tool
US5867261A (en) * 1997-04-28 1999-02-02 International Business Machines Corporation Surface inspection tool
US5933230A (en) * 1997-04-28 1999-08-03 International Business Machines Corporation Surface inspection tool
US6073501A (en) * 1997-06-20 2000-06-13 Advanced Micro Devices, Inc. Apparatus and method for semiconductor wafer processing which facilitate determination of a source of contaminants or defects
US5812270A (en) * 1997-09-17 1998-09-22 Ircon, Inc. Window contamination detector
ES2232137T3 (es) 1998-05-15 2005-05-16 Astrazeneca Ab Derivados de benzamida para el tratamiento de enfermedades mediadas por citoquinas.
US6879391B1 (en) 1999-05-26 2005-04-12 Kla-Tencor Technologies Particle detection method and apparatus
US6486946B1 (en) 1999-06-15 2002-11-26 Ade Corporation Method for discriminating between holes in and particles on a film covering a substrate
US6806951B2 (en) 2000-09-20 2004-10-19 Kla-Tencor Technologies Corp. Methods and systems for determining at least one characteristic of defects on at least two sides of a specimen
US7349090B2 (en) 2000-09-20 2008-03-25 Kla-Tencor Technologies Corp. Methods and systems for determining a property of a specimen prior to, during, or subsequent to lithography
US6891627B1 (en) 2000-09-20 2005-05-10 Kla-Tencor Technologies Corp. Methods and systems for determining a critical dimension and overlay of a specimen
US6630996B2 (en) 2000-11-15 2003-10-07 Real Time Metrology, Inc. Optical method and apparatus for inspecting large area planar objects
US6809809B2 (en) * 2000-11-15 2004-10-26 Real Time Metrology, Inc. Optical method and apparatus for inspecting large area planar objects
US7072034B2 (en) * 2001-06-08 2006-07-04 Kla-Tencor Corporation Systems and methods for inspection of specimen surfaces
US6538730B2 (en) * 2001-04-06 2003-03-25 Kla-Tencor Technologies Corporation Defect detection system
JP4472931B2 (ja) 2001-05-03 2010-06-02 ケーエルエー−テンカー コーポレイション 光ビームに試料全体を走査させるためのシステムおよび方法
JP4030815B2 (ja) 2001-07-10 2008-01-09 ケーエルエー−テンカー テクノロジィース コーポレイション 同時のまたは連続的な多重の斜視的な試料欠陥検査のためのシステムおよび方法
US6778267B2 (en) 2001-09-24 2004-08-17 Kla-Tencor Technologies Corp. Systems and methods for forming an image of a specimen at an oblique viewing angle
US20040032581A1 (en) * 2002-01-15 2004-02-19 Mehrdad Nikoonahad Systems and methods for inspection of specimen surfaces
KR100493847B1 (ko) * 2003-04-09 2005-06-08 삼성전자주식회사 파티클을 검출하기 위한 장치 및 방법
US7078712B2 (en) * 2004-03-18 2006-07-18 Axcelis Technologies, Inc. In-situ monitoring on an ion implanter
JP4593243B2 (ja) * 2004-11-18 2010-12-08 株式会社トプコン 気中粒子監視装置および真空処理装置
WO2007061383A1 (en) * 2005-11-25 2007-05-31 Agency For Science, Technology & Research Determination of field distribution
JP4876019B2 (ja) * 2007-04-25 2012-02-15 株式会社日立ハイテクノロジーズ 欠陥検査装置およびその方法
US7767982B2 (en) * 2007-06-06 2010-08-03 Hermes-Microvision, Inc. Optical auto focusing system and method for electron beam inspection tool
JP2009002733A (ja) * 2007-06-20 2009-01-08 Toshiba Corp 浮遊パーティクル検出装置及び浮遊パーティクル検出方法
US20090002686A1 (en) * 2007-06-29 2009-01-01 The Material Works, Ltd. Sheet Metal Oxide Detector
CN102645437A (zh) * 2012-04-11 2012-08-22 法国圣戈班玻璃公司 光学测量装置和光学测量方法
US9395340B2 (en) 2013-03-15 2016-07-19 Kla-Tencor Corporation Interleaved acousto-optical device scanning for suppression of optical crosstalk
US9599572B2 (en) * 2014-04-07 2017-03-21 Orbotech Ltd. Optical inspection system and method
US9588056B2 (en) * 2014-05-29 2017-03-07 Corning Incorporated Method for particle detection on flexible substrates
KR102619157B1 (ko) * 2016-01-21 2023-12-28 도쿄엘렉트론가부시키가이샤 약액 공급 장치 및 도포 현상 시스템
CN106352960B (zh) * 2016-08-16 2018-11-06 黄阳 一种马赛克瓷砖重量检测装置
CN106323988B (zh) * 2016-08-19 2018-10-23 泉州台商投资区五季网络有限公司 一种马赛克瓷砖针孔检测装置
FR3056295B1 (fr) * 2016-09-21 2018-09-14 Constellium Neuf Brisach Dispositif de detection des defauts superficiels de bandes laminees d'aluminium
CN107421916B (zh) * 2017-05-02 2021-02-23 京东方科技集团股份有限公司 检测装置、工艺系统和检测方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2947212A (en) * 1956-04-30 1960-08-02 American Brass Co Method of detecting surface conditions of sheet metal
US3782836A (en) * 1971-11-11 1974-01-01 Texas Instruments Inc Surface irregularity analyzing method
US4342515A (en) * 1978-01-27 1982-08-03 Hitachi, Ltd. Method of inspecting the surface of an object and apparatus therefor
US4337340A (en) * 1979-06-14 1982-06-29 Sterling Drug Inc. Processes for preparing substituted furopyridinones and furopyrazinones
US4468120A (en) * 1981-02-04 1984-08-28 Nippon Kogaku K.K. Foreign substance inspecting apparatus
US4669875A (en) * 1982-11-04 1987-06-02 Hitachi, Ltd. Foreign particle detecting method and apparatus
JPS61162738A (ja) * 1985-01-11 1986-07-23 Hitachi Ltd 異物検査方法
JPH0727125B2 (ja) * 1986-05-23 1995-03-29 株式会社日立製作所 光走査装置
US4772126A (en) * 1986-10-23 1988-09-20 Inspex Incorporated Particle detection method and apparatus
US4889998A (en) * 1987-01-29 1989-12-26 Nikon Corporation Apparatus with four light detectors for checking surface of mask with pellicle
US4898471A (en) * 1987-06-18 1990-02-06 Tencor Instruments Particle detection on patterned wafers and the like
US4812664A (en) * 1987-11-12 1989-03-14 High Yield Technology Apparatus for scanning a flat surface to detect defects
JPH0820371B2 (ja) * 1988-01-21 1996-03-04 株式会社ニコン 欠陥検査装置及び欠陥検査方法
US5127726A (en) * 1989-05-19 1992-07-07 Eastman Kodak Company Method and apparatus for low angle, high resolution surface inspection
US5076692A (en) * 1990-05-31 1991-12-31 Tencor Instruments Particle detection on a patterned or bare wafer surface

Also Published As

Publication number Publication date
EP0500293A3 (en) 1993-01-20
DE69219501D1 (de) 1997-06-12
EP0500293A2 (de) 1992-08-26
EP0500293B1 (de) 1997-05-07
US5317380A (en) 1994-05-31
DE69219501T2 (de) 1998-01-02

Similar Documents

Publication Publication Date Title
ATE152827T1 (de) Verfahren und vorrichtung zum nachweis von teilchen
ATE176416T1 (de) Laserbearbeitungsgerät
JP3458139B2 (ja) パターニングされた基板の光学検査用装置
ATE152824T1 (de) Verfahren und gerät zur messung des winkels eines werkstücks
EP0265229A3 (de) Verfahren und Vorrichtung zum Nachweis von Teilchen
EP1014199A3 (de) Trägerplattesteuerungsvorrichtung und Belichtungsapparat
DE68902329D1 (de) Verfahren und apparat zur ueberwachung des oberflaechenprofils eines werkstueckes.
ATE221650T1 (de) Optisches verfahren und vorrichtung zum erkennen von fehlstellen
KR930010527A (ko) 조사를 이용한 표면상태 검사방법 및 그 장치
JPS647618A (en) Method and apparatus for exposing semiconductor
US5359388A (en) Microlithographic projection system
SE8000727L (sv) Sett och anordning for att meta avstand
DE69034142D1 (de) Verfahren und vorrichtung zum aufspüren eines objektes
JPS57181537A (en) Light pattern projector
JPS6345541A (ja) 検査方法および装置
JPS61260632A (ja) 異物検査装置
ATE159814T1 (de) Vorrichtung und verfahren zum prüfen von optischen elementen
DE50109820D1 (de) Vorrichtung und Verfahren zur Erfassung der Geometrie von Werkstücken
JPH0645218A (ja) 露光装置の位置合わせ精度測定方法及び位置測定方法
JPH07134104A (ja) 異物検査装置
JPS6432625A (en) Exposure method for semiconductor
JPS6211145A (ja) 異物検査装置
KR890011009A (ko) 반도체 집적회로 장치의 제조 방법 및 그것에 사용되는 노출장치
JPS5950522A (ja) 投影露光装置
Schneider et al. Automatic optical detection and classification of submicron defects on e-beam mask blanks

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties