JP4472931B2 - 光ビームに試料全体を走査させるためのシステムおよび方法 - Google Patents
光ビームに試料全体を走査させるためのシステムおよび方法 Download PDFInfo
- Publication number
- JP4472931B2 JP4472931B2 JP2002588257A JP2002588257A JP4472931B2 JP 4472931 B2 JP4472931 B2 JP 4472931B2 JP 2002588257 A JP2002588257 A JP 2002588257A JP 2002588257 A JP2002588257 A JP 2002588257A JP 4472931 B2 JP4472931 B2 JP 4472931B2
- Authority
- JP
- Japan
- Prior art keywords
- aod
- scan
- light
- acousto
- light beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
- G02F1/33—Acousto-optical deflection devices
Description
Claims (2)
- 光ビームに試料の表面全体を走査させるように構成されたシステムであって、
光ビームを角度走査に沿って様々な角度で導くように構成された第1の音響光学偏向器と、
導かれる光ビームを拡大し、かつ、角度走査を線形走査に変換するように構成されたレンズと、
前記レンズにより線形走査に変換された光ビームを走査線上に集束させるように構成された第2の音響光学偏向器と
を備え、
第2のチャープ・パケットが前記第2の音響光学偏向器を通って伝搬し、光ビームを走査線上に集束させている間、第1の音響光学偏向器の第1のチャープ・パケットを音響信号で充填することができ、前記第1の音響光学偏向器に印加される駆動信号の振幅の変化により、前記第2の音響光学偏向器を通って伝搬する第2のチャープ・パケットの減衰が補償されることを特徴とするシステム。 - 光ビームに試料の表面全体を走査させる方法であって、
第1の音響光学偏向器を使用して、光ビームを角度走査に沿って様々な角度で導くステップと、
導かれるビームを拡大し、かつ、レンズを使用して、角度走査を線形走査に変換するステップと、
第2の音響光学偏向器を使用して、前記レンズにより線形走査に変換されたビームを走査線に集束させるステップとを含み、
第2の音響光学偏向器を通って伝搬している第2のチャープ・パケットを使用して光ビームを走査線上に集束させている間、第1の音響光学偏向器の第1のチャープ・パケットに音響信号を充填するステップを含み、前記第1の音響光学偏向器に印加される駆動信号の振幅の変化により、前記第2の音響光学偏向器を通って伝搬する第2のチャープ・パケットの減衰が補償されることを特徴とする方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US28863201P | 2001-05-03 | 2001-05-03 | |
PCT/US2002/014132 WO2002091057A1 (en) | 2001-05-03 | 2002-05-03 | Systems and methods for scanning a beam of light across a specimen |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004535596A JP2004535596A (ja) | 2004-11-25 |
JP4472931B2 true JP4472931B2 (ja) | 2010-06-02 |
Family
ID=23107966
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002588257A Expired - Lifetime JP4472931B2 (ja) | 2001-05-03 | 2002-05-03 | 光ビームに試料全体を走査させるためのシステムおよび方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US6775051B2 (ja) |
EP (2) | EP1393115B1 (ja) |
JP (1) | JP4472931B2 (ja) |
AT (1) | ATE535834T1 (ja) |
WO (1) | WO2002091057A1 (ja) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6809808B2 (en) * | 2002-03-22 | 2004-10-26 | Applied Materials, Inc. | Wafer defect detection system with traveling lens multi-beam scanner |
US6943898B2 (en) * | 2002-05-07 | 2005-09-13 | Applied Materials Israel, Ltd. | Apparatus and method for dual spot inspection of repetitive patterns |
US7002695B2 (en) * | 2002-05-07 | 2006-02-21 | Applied Materials Inc. | Dual-spot phase-sensitive detection |
US7466466B2 (en) * | 2005-05-11 | 2008-12-16 | Gsi Group Corporation | Optical scanning method and system and method for correcting optical aberrations introduced into the system by a beam deflector |
DE102005046755A1 (de) * | 2005-09-29 | 2007-04-19 | Carl Zeiss Jena Gmbh | Vorrichtung und Verfahren zum Erzeugen eines Bildes eines Objektes |
GB0617945D0 (en) * | 2006-09-12 | 2006-10-18 | Ucl Business Plc | Imaging apparatus and methods |
TWI523720B (zh) * | 2009-05-28 | 2016-03-01 | 伊雷克托科學工業股份有限公司 | 應用於雷射處理工件中的特徵的聲光偏轉器及相關雷射處理方法 |
GB201006679D0 (en) | 2010-04-21 | 2010-06-09 | Ucl Business Plc | Methods and apparatus to control acousto-optic deflectors |
GB201106787D0 (en) | 2011-04-20 | 2011-06-01 | Ucl Business Plc | Methods and apparatus to control acousto-optic deflectors |
US8995746B2 (en) | 2013-03-15 | 2015-03-31 | KLA—Tencor Corporation | Image synchronization of scanning wafer inspection system |
US9395340B2 (en) | 2013-03-15 | 2016-07-19 | Kla-Tencor Corporation | Interleaved acousto-optical device scanning for suppression of optical crosstalk |
US9546962B2 (en) * | 2014-02-12 | 2017-01-17 | Kla-Tencor Corporation | Multi-spot scanning collection optics |
US9970873B1 (en) | 2014-11-12 | 2018-05-15 | Kla-Tencor Corporation | System and method for luminescent tag based wafer inspection |
US9864173B2 (en) | 2015-04-21 | 2018-01-09 | Kla-Tencor Corporation | Systems and methods for run-time alignment of a spot scanning wafer inspection system |
US9891175B2 (en) | 2015-05-08 | 2018-02-13 | Kla-Tencor Corporation | System and method for oblique incidence scanning with 2D array of spots |
JP6561290B2 (ja) * | 2015-11-02 | 2019-08-21 | 株式会社Joled | 表示パネルの製造方法および表示パネル |
US11927873B2 (en) * | 2018-08-14 | 2024-03-12 | Femtonics Kft. | Method of scanning an optical beam using an acousto-optic deflector driven by chirped acoustic signals |
EP3933499A1 (en) * | 2020-07-03 | 2022-01-05 | Mycronic Ab | Device and method for controlling focus of a laser beam |
Family Cites Families (25)
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JPS5793907U (ja) * | 1980-11-26 | 1982-06-09 | ||
US4391524A (en) | 1981-03-16 | 1983-07-05 | Rca Corporation | Method for determining the quality of light scattering material |
US4441124A (en) | 1981-11-05 | 1984-04-03 | Western Electric Company, Inc. | Technique for inspecting semiconductor wafers for particulate contamination |
JPS60220940A (ja) | 1983-05-20 | 1985-11-05 | Hitachi Ltd | 異物自動検査装置 |
JPS60121423A (ja) * | 1984-10-31 | 1985-06-28 | Hitachi Ltd | レ−ザビ−ム偏向装置 |
US4889998A (en) | 1987-01-29 | 1989-12-26 | Nikon Corporation | Apparatus with four light detectors for checking surface of mask with pellicle |
US4827125A (en) * | 1987-04-29 | 1989-05-02 | The United States Of America As Represented By The Secretary Of The Department Of Health And Human Services | Confocal scanning laser microscope having no moving parts |
US4971413A (en) * | 1987-05-13 | 1990-11-20 | Nikon Corporation | Laser beam depicting apparatus |
US4912487A (en) | 1988-03-25 | 1990-03-27 | Texas Instruments Incorporated | Laser scanner using focusing acousto-optic device |
JPH01316724A (ja) * | 1988-06-17 | 1989-12-21 | Sony Corp | 音響光学偏向器の広帯域駆動方式 |
US4907863A (en) * | 1988-09-22 | 1990-03-13 | Chesapeake Laser Systems, Inc. | Digital frequency synthesizer for use with precision AO scanning and positioning |
US4992880A (en) * | 1989-05-24 | 1991-02-12 | The United States Of America As Represented By The Secretary Of The Navy | High definition video-rate laser-addressed liquid-crystal light-valve projection display |
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JP3132419B2 (ja) * | 1997-05-20 | 2001-02-05 | 日本電気株式会社 | ビーム偏向装置 |
US6020957A (en) | 1998-04-30 | 2000-02-01 | Kla-Tencor Corporation | System and method for inspecting semiconductor wafers |
-
2002
- 2002-05-03 JP JP2002588257A patent/JP4472931B2/ja not_active Expired - Lifetime
- 2002-05-03 US US10/138,782 patent/US6775051B2/en not_active Expired - Lifetime
- 2002-05-03 AT AT02734188T patent/ATE535834T1/de active
- 2002-05-03 EP EP02734188A patent/EP1393115B1/en not_active Expired - Lifetime
- 2002-05-03 WO PCT/US2002/014132 patent/WO2002091057A1/en active Application Filing
- 2002-05-03 EP EP11191074.1A patent/EP2490064B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
ATE535834T1 (de) | 2011-12-15 |
EP1393115A4 (en) | 2010-03-17 |
WO2002091057A1 (en) | 2002-11-14 |
US20020181119A1 (en) | 2002-12-05 |
EP1393115B1 (en) | 2011-11-30 |
JP2004535596A (ja) | 2004-11-25 |
US6775051B2 (en) | 2004-08-10 |
EP2490064B1 (en) | 2013-09-18 |
EP1393115A1 (en) | 2004-03-03 |
EP2490064A1 (en) | 2012-08-22 |
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