JP4593243B2 - 気中粒子監視装置および真空処理装置 - Google Patents
気中粒子監視装置および真空処理装置 Download PDFInfo
- Publication number
- JP4593243B2 JP4593243B2 JP2004334759A JP2004334759A JP4593243B2 JP 4593243 B2 JP4593243 B2 JP 4593243B2 JP 2004334759 A JP2004334759 A JP 2004334759A JP 2004334759 A JP2004334759 A JP 2004334759A JP 4593243 B2 JP4593243 B2 JP 4593243B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- particle
- intensity
- size
- particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000002245 particle Substances 0.000 title claims description 233
- 238000012545 processing Methods 0.000 title claims description 81
- 238000012806 monitoring device Methods 0.000 title claims description 22
- 238000009826 distribution Methods 0.000 claims description 49
- 230000003287 optical effect Effects 0.000 claims description 39
- 238000001514 detection method Methods 0.000 claims description 37
- 238000012544 monitoring process Methods 0.000 claims description 34
- 230000004907 flux Effects 0.000 claims description 28
- 238000012360 testing method Methods 0.000 claims description 14
- 238000003860 storage Methods 0.000 claims description 9
- 230000000149 penetrating effect Effects 0.000 claims description 7
- 238000005259 measurement Methods 0.000 claims description 6
- 238000009827 uniform distribution Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 description 43
- 239000004065 semiconductor Substances 0.000 description 15
- 238000005530 etching Methods 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 5
- 238000001312 dry etching Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000001427 coherent effect Effects 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000009530 blood pressure measurement Methods 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/10—Investigating individual particles
- G01N15/14—Optical investigation techniques, e.g. flow cytometry
- G01N15/1434—Optical arrangements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/10—Investigating individual particles
- G01N15/14—Optical investigation techniques, e.g. flow cytometry
- G01N2015/1486—Counting the particles
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/10—Investigating individual particles
- G01N15/14—Optical investigation techniques, e.g. flow cytometry
- G01N2015/1493—Particle size
Landscapes
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Description
する領域(以下、気流通過領域という。)Rを通過するパーティクルJの大きさと、受光器40によって検出された散乱光Kの強度との対応関係が予め記憶されたメモリ51(記憶手段)を有している。
20 投射光学系
30 検出光学系
40 受光器(光検出手段)
50 粒子検出手段
51 メモリ(記憶手段)
100 パーティクルカウンタ(気中粒子監視装置)
200 半導体プロセス
210 排気口
L0 投射光束
L1〜L10 出射光束
K 散乱光
d 帯の幅方向
R 気流通過領域
A 気流
J パーティクル(粒子)
Claims (5)
- 所定強度の光を出射する光源と、該光源から出射した光を帯状の光束とし、所定の気流がこの帯状の光束を貫通するように、該帯状の光束を前記所定の気流の流路上に導光する投射光学系と、光の強度を検出する光検出手段と、前記気流中に含まれて前記光束を貫通した粒子による散乱光を、前記光検出手段に導く検出光学系と、前記光検出手段によって検出された前記散乱光の強度に基づいて、前記光束を貫通した粒子の大きさを求めるとともに、所定時間に前記光束を貫通した前記粒子の数を計数する粒子検出手段とを備えた気中粒子監視装置において、
前記光源は少なくとも2つの光源からなり、前記投射光学系は前記各光源から出射された光束をそれぞれ開き角の小さい複数の光束に分割するとともに、互いに異なる光源から出射され分割された光束が隣接されるように、かつこれら隣接した分割光束の一部同士を重ね合わせることにより、前記帯状の光束の光強度が、該帯の幅方向について略均一分布となるように設定されていることを特徴とする気中粒子監視装置。 - 前記光源は、複数の光束を少なくとも一次元状に配列して出射する光源であり、前記投射光学系は、前記帯状の光束の、該帯の幅方向についての光強度の分布が略均一となるように、前記光源から出射された複数の光束の一部同士を重ね合わせることを特徴とする請求項1に記載の気中粒子監視装置。
- 前記投射光学系は、前記光源から出射された複数の光束のそれぞれを各別に導光させる、前記光束の数に対応した複数の光学系を備えたことを特徴とする請求項1または2に記載の気中粒子監視装置。
- 前記粒子検出手段は、前記測定対象領域を通過する粒子の大きさと前記光検出手段によって検出される光強度との対応関係が予め記憶された記憶手段を備え、前記記憶手段に記憶された対応関係は、大きさが既知の複数のテスト用粒子を、前記測定対象領域を順次通過させ、前記各テスト用粒子が前記測定対象領域をそれぞれ通過したときの前記散乱光の光強度を前記光検出手段により各別に検出し、前記光検出手段により検出された光強度の頻度分布を求め、前記頻度分布に基づいて前記粒子の大きさとこの大きさの粒子による散乱光の検出光強度との対応関係を求め、同様に、前記測定対象領域を通過させるテスト用粒子を、他の既知の大きさのテスト用粒子に変更した上で前記粒子の通過による散乱光の強度を検出して、前記他の大きさと散乱光の検出光強度との対応関係を求めることにより、規定されたものであることを特徴とする請求項1から3のうちいずれか1項に記載の気中粒子監視装置。
- 容器の内部に配置される被処理体に対して、所定の真空雰囲気中で処理を施す真空処理装置において、
請求項1から4のうちいずれか1項に記載の気中粒子監視装置を備えたことを特徴とする真空処理装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004334759A JP4593243B2 (ja) | 2004-11-18 | 2004-11-18 | 気中粒子監視装置および真空処理装置 |
US11/271,945 US7417732B2 (en) | 2004-11-18 | 2005-11-14 | Particle monitoring apparatus and vacuum processing apparatus |
CNB2005101149669A CN100523780C (zh) | 2004-11-18 | 2005-11-16 | 粒子监测装置和真空处理装置 |
KR1020050109599A KR100717553B1 (ko) | 2004-11-18 | 2005-11-16 | 입자 모니터링 장치 및 진공 처리 장치 |
TW094140492A TW200617367A (en) | 2004-11-18 | 2005-11-17 | Particle monitoring apparatus and vacuum processing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004334759A JP4593243B2 (ja) | 2004-11-18 | 2004-11-18 | 気中粒子監視装置および真空処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006145347A JP2006145347A (ja) | 2006-06-08 |
JP4593243B2 true JP4593243B2 (ja) | 2010-12-08 |
Family
ID=36625215
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004334759A Expired - Fee Related JP4593243B2 (ja) | 2004-11-18 | 2004-11-18 | 気中粒子監視装置および真空処理装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7417732B2 (ja) |
JP (1) | JP4593243B2 (ja) |
CN (1) | CN100523780C (ja) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008089540A (ja) * | 2006-10-05 | 2008-04-17 | Furukawa Electric Co Ltd:The | 光計測方法および光計測装置 |
JP4389991B2 (ja) * | 2007-10-26 | 2009-12-24 | ソニー株式会社 | 微小粒子の光学的測定方法及び光学的測定装置 |
JP5239105B2 (ja) * | 2007-12-19 | 2013-07-17 | 株式会社東京精密 | レーザーダイシング装置及びダイシング方法 |
FI20090319A0 (fi) * | 2009-09-03 | 2009-09-03 | Beneq Oy | Prosessinsäätömenetelmä |
JP5950319B2 (ja) * | 2010-06-15 | 2016-07-13 | 新日本空調株式会社 | パーティクル濃度測定装置 |
KR101225296B1 (ko) | 2011-02-21 | 2013-01-23 | 성균관대학교산학협력단 | 신호 분석을 통한 실시간 입자 측정 방법 |
JP5876248B2 (ja) * | 2011-08-09 | 2016-03-02 | 東京エレクトロン株式会社 | パーティクルモニタ方法、パーティクルモニタ装置 |
DE102013206543A1 (de) * | 2012-07-16 | 2014-01-16 | Robert Bosch Gmbh | Vorrichtung zum Befüllen von Behältnissen |
CN103954538B (zh) * | 2014-05-09 | 2016-03-09 | 河北大学 | 一种干式颗粒粒度测量装置 |
CN103954539B (zh) * | 2014-05-09 | 2016-04-20 | 河北大学 | 一种干式颗粒粒度测量装置 |
CN103954537B (zh) * | 2014-05-09 | 2016-04-20 | 河北大学 | 一种干式颗粒粒度测量方法 |
US10132934B2 (en) * | 2014-09-17 | 2018-11-20 | Stmicroelectronics S.R.L. | Integrated detection device, in particular detector of particles such as particulates or alpha particles |
CN107427259B (zh) * | 2014-12-31 | 2021-03-16 | 皇家飞利浦有限公司 | 用于执行对基于时间的二氧化碳图信号的直方图分析的系统以及其操作的方法 |
CN107421916B (zh) * | 2017-05-02 | 2021-02-23 | 京东方科技集团股份有限公司 | 检测装置、工艺系统和检测方法 |
JP2021063779A (ja) * | 2019-10-17 | 2021-04-22 | 富士電機株式会社 | 粒子分析装置 |
US20210148810A1 (en) * | 2019-11-15 | 2021-05-20 | Becton, Dickinson And Company | Methods for determining particle size and light detection systems for same |
CN113808966B (zh) * | 2020-06-16 | 2023-10-17 | 长鑫存储技术有限公司 | 半导体设备的调试方法及半导体器件的制备方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000146819A (ja) * | 1998-11-09 | 2000-05-26 | Mitsubishi Electric Corp | 光学式ほこりセンサ光学系 |
JP2000162119A (ja) * | 1998-11-25 | 2000-06-16 | Denso Corp | 噴霧測定装置 |
JP2003149123A (ja) * | 2001-11-09 | 2003-05-21 | Horiba Ltd | 粒径分布測定装置 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1405682A (en) * | 1972-11-09 | 1975-09-10 | Kernforschung Gmbh Ges Fuer | Apparatus for the rapid meausring of the angular dependence of light scattered from a scattering volume containing particles |
US3975084A (en) * | 1973-09-27 | 1976-08-17 | Block Engineering, Inc. | Particle detecting system |
US3910702A (en) * | 1974-02-12 | 1975-10-07 | Particle Technology Inc | Apparatus for detecting particles employing apertured light emitting device |
GB2073412B (en) * | 1980-03-19 | 1984-08-15 | Karabegov M | Calibrating instruments for counting and measuring particles |
US4906094A (en) * | 1987-04-23 | 1990-03-06 | Sumitomo Chemical Co. Ltd. | Fine particle measuring method and system and a flow cell for use in the system |
JPS6475943A (en) * | 1987-09-18 | 1989-03-22 | Hitachi Ltd | Method for irradiation with laser beam |
JPH0222534A (ja) * | 1988-07-11 | 1990-01-25 | Fujitsu Ltd | 粒子測定装置 |
FR2641421A1 (fr) * | 1989-01-03 | 1990-07-06 | Comp Generale Electricite | Laser a plaque avec pompage optique par source a plage d'emission etroite |
JPH02259448A (ja) * | 1989-03-31 | 1990-10-22 | Hitachi Ltd | パターン発生光学装置 |
US5011286A (en) * | 1989-08-03 | 1991-04-30 | Met One, Inc. | Multisensor particle counter utilizing a single energy source |
JPH03140840A (ja) * | 1989-10-26 | 1991-06-14 | Hitachi Ltd | 流動細胞分析装置 |
US5092675A (en) * | 1989-11-14 | 1992-03-03 | Pacific Scientific Company | Vacuum line particle detector with slab laser |
US5317380A (en) * | 1991-02-19 | 1994-05-31 | Inspex, Inc. | Particle detection method and apparatus |
US5271264A (en) * | 1991-11-27 | 1993-12-21 | Applied Materials, Inc. | Method of in-situ particle monitoring in vacuum systems |
US5481357A (en) * | 1994-03-03 | 1996-01-02 | International Business Machines Corporation | Apparatus and method for high-efficiency, in-situ particle detection |
US5654797A (en) * | 1996-02-22 | 1997-08-05 | National Research Council Of Canada | Method and apparatus for monitoring the diameter of thermally sprayed particles |
JPH1090158A (ja) * | 1996-09-19 | 1998-04-10 | Noritz Corp | 浮遊粒子群の濃度及び粒度の測定装置 |
US6134258A (en) * | 1998-03-25 | 2000-10-17 | The Board Of Trustees Of The Leland Stanford Junior University | Transverse-pumped sLAB laser/amplifier |
JP4162773B2 (ja) | 1998-08-31 | 2008-10-08 | 東京エレクトロン株式会社 | プラズマ処理装置および検出窓 |
US20030138021A1 (en) * | 2001-10-25 | 2003-07-24 | Norman Hodgson | Diode-pumped solid-state thin slab laser |
US6896764B2 (en) | 2001-11-28 | 2005-05-24 | Tokyo Electron Limited | Vacuum processing apparatus and control method thereof |
JP2003229417A (ja) | 2001-11-28 | 2003-08-15 | Tokyo Electron Ltd | 真空処理装置及びその制御方法 |
WO2004025791A1 (de) * | 2002-09-05 | 2004-03-25 | Las-Cad Gmbh | Seitlich mit fokussiertem licht von laserdioden in vielfachdurchläufen gepumpter festkörperlaser |
-
2004
- 2004-11-18 JP JP2004334759A patent/JP4593243B2/ja not_active Expired - Fee Related
-
2005
- 2005-11-14 US US11/271,945 patent/US7417732B2/en not_active Expired - Fee Related
- 2005-11-16 CN CNB2005101149669A patent/CN100523780C/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000146819A (ja) * | 1998-11-09 | 2000-05-26 | Mitsubishi Electric Corp | 光学式ほこりセンサ光学系 |
JP2000162119A (ja) * | 1998-11-25 | 2000-06-16 | Denso Corp | 噴霧測定装置 |
JP2003149123A (ja) * | 2001-11-09 | 2003-05-21 | Horiba Ltd | 粒径分布測定装置 |
Also Published As
Publication number | Publication date |
---|---|
CN100523780C (zh) | 2009-08-05 |
CN1776400A (zh) | 2006-05-24 |
JP2006145347A (ja) | 2006-06-08 |
US20060132769A1 (en) | 2006-06-22 |
US7417732B2 (en) | 2008-08-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4593243B2 (ja) | 気中粒子監視装置および真空処理装置 | |
JP2020065081A (ja) | プラズマ処理装置及びプラズマ処理装置の運転方法 | |
US7842189B2 (en) | Treatment device, treatment device consumable parts management method, treatment system, and treatment system consumable parts management method | |
JP4343875B2 (ja) | エッチング量計測装置、エッチング装置及びエッチング量計測方法 | |
US11915951B2 (en) | Plasma processing method | |
JP4943733B2 (ja) | 荷電粒子ビームを用いた検査方法及び検査装置 | |
US20090301655A1 (en) | Plasma Processing Apparatus | |
US11119051B2 (en) | Particle detection for substrate processing | |
KR20220149637A (ko) | 에칭 시스템을 위한 웨이퍼 프로파일링 | |
US7352461B2 (en) | Particle detecting method and storage medium storing program for implementing the method | |
US11854767B2 (en) | Measuring method and plasma processing apparatus | |
JP4544459B2 (ja) | パーティクル検出方法及びパーティクル検出プログラム | |
KR100717553B1 (ko) | 입자 모니터링 장치 및 진공 처리 장치 | |
KR102508505B1 (ko) | 플라즈마 모니터링 장치 및 플라즈마 처리 시스템 | |
EP3038132B1 (en) | Method and apparatus for real-time monitoring of plasma etch uniformity | |
US11320381B2 (en) | Deterioration detecting system and method for semiconductor process kits | |
JP2006310371A (ja) | 半導体装置の製造方法および製造装置 | |
US20220328283A1 (en) | Self-differential confocal tilt sensor for measuring level variation in charged particle beam system | |
KR20190050254A (ko) | 기판 처리 장치 및 기판 처리 모니터링 방법 | |
JP2011023629A (ja) | ドライエッチング方法、電子デバイスの製造方法、ドライエッチング装置、処理制御プログラム及び記録媒体 | |
TW202233371A (zh) | 用於若發生處理轉移時使用調整的夾持電壓進行夾持操作的方法、系統及設備 | |
KR20200114941A (ko) | 플라즈마 설비 진단 장치 및 이를 이용한 반도체 장치의 제조 방법 | |
TW201942995A (zh) | 偵測基板自基板處理系統之靜電卡盤的部分鬆脫 | |
JPH09289240A (ja) | 粒子計測器 | |
JP2006093519A (ja) | プラズマ処理装置及びウェハのプラズマ処理方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20071106 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20100413 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100420 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100621 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100914 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100915 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130924 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130924 Year of fee payment: 3 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313117 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130924 Year of fee payment: 3 |
|
R360 | Written notification for declining of transfer of rights |
Free format text: JAPANESE INTERMEDIATE CODE: R360 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130924 Year of fee payment: 3 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313117 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130924 Year of fee payment: 3 |
|
R370 | Written measure of declining of transfer procedure |
Free format text: JAPANESE INTERMEDIATE CODE: R370 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130924 Year of fee payment: 3 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |