TW200617367A - Particle monitoring apparatus and vacuum processing apparatus - Google Patents

Particle monitoring apparatus and vacuum processing apparatus

Info

Publication number
TW200617367A
TW200617367A TW094140492A TW94140492A TW200617367A TW 200617367 A TW200617367 A TW 200617367A TW 094140492 A TW094140492 A TW 094140492A TW 94140492 A TW94140492 A TW 94140492A TW 200617367 A TW200617367 A TW 200617367A
Authority
TW
Taiwan
Prior art keywords
laser beam
strip
vacuum processing
emitted
particles
Prior art date
Application number
TW094140492A
Other languages
Chinese (zh)
Inventor
Yoichiro Iwa
Kazuhiro Miyakawa
Susumu Saito
Original Assignee
Topcon Corp
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2004334759A external-priority patent/JP4593243B2/en
Application filed by Topcon Corp, Tokyo Electron Ltd filed Critical Topcon Corp
Publication of TW200617367A publication Critical patent/TW200617367A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

This invention is to enhance the detection precision of the size of particles by preventing or reducing the fluctuations in the detected intensity of scattering light corresponding to the passing position of the particles in an air flow passing region in an air particle monitor device. Ten laser beam fluxes L1-L10 arranged in a unidimensional state are emitted from a laser beam source 10 and converted to one strip-like [width direction (d) of a strip] beam flux L0 by a projection optical system 20. Ten laser beam fluxes L1-L10 emitted from the laser beam source 10 are partially superposed one upon another so that the intensity of the beam flux L0 becomes an almost uniform distribution with respect to the width direction (d) of the strip in the air flow passing region R of a semiconductor process 200.
TW094140492A 2004-11-18 2005-11-17 Particle monitoring apparatus and vacuum processing apparatus TW200617367A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004334759A JP4593243B2 (en) 2004-11-18 2004-11-18 Air particle monitoring device and vacuum processing device
US63648704P 2004-12-17 2004-12-17

Publications (1)

Publication Number Publication Date
TW200617367A true TW200617367A (en) 2006-06-01

Family

ID=37163407

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094140492A TW200617367A (en) 2004-11-18 2005-11-17 Particle monitoring apparatus and vacuum processing apparatus

Country Status (2)

Country Link
KR (1) KR100717553B1 (en)
TW (1) TW200617367A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101857950B1 (en) 2016-06-21 2018-05-16 한국표준과학연구원 High accuracy real-time particle counter
KR102530974B1 (en) 2021-07-27 2023-05-16 한국생산기술연구원 A device for measuring real-time flow and concentration of abnormal fumes generated during the powder bed fusion process, and a method for measuring real-time flow and concentration of abnormal fumes using the same

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6707544B1 (en) * 1999-09-07 2004-03-16 Applied Materials, Inc. Particle detection and embedded vision system to enhance substrate yield and throughput

Also Published As

Publication number Publication date
KR20060069258A (en) 2006-06-21
KR100717553B1 (en) 2007-05-15

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