CN100523780C - 粒子监测装置和真空处理装置 - Google Patents
粒子监测装置和真空处理装置 Download PDFInfo
- Publication number
- CN100523780C CN100523780C CNB2005101149669A CN200510114966A CN100523780C CN 100523780 C CN100523780 C CN 100523780C CN B2005101149669 A CNB2005101149669 A CN B2005101149669A CN 200510114966 A CN200510114966 A CN 200510114966A CN 100523780 C CN100523780 C CN 100523780C
- Authority
- CN
- China
- Prior art keywords
- particle
- light
- light intensity
- light source
- size
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000002245 particle Substances 0.000 title claims abstract description 232
- 238000012806 monitoring device Methods 0.000 title claims description 49
- 238000009489 vacuum treatment Methods 0.000 title claims description 38
- 238000000034 method Methods 0.000 claims abstract description 22
- 230000008569 process Effects 0.000 claims abstract description 19
- 238000012544 monitoring process Methods 0.000 claims abstract description 16
- 238000001514 detection method Methods 0.000 claims abstract description 14
- 230000003287 optical effect Effects 0.000 claims abstract description 13
- 238000009826 distribution Methods 0.000 claims description 53
- 238000004891 communication Methods 0.000 claims description 45
- 238000009434 installation Methods 0.000 claims description 37
- 238000012360 testing method Methods 0.000 claims description 22
- 238000005520 cutting process Methods 0.000 claims description 14
- 238000003860 storage Methods 0.000 claims description 10
- 230000009466 transformation Effects 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 abstract description 16
- 230000004907 flux Effects 0.000 abstract 4
- 230000002708 enhancing effect Effects 0.000 abstract 1
- 238000009827 uniform distribution Methods 0.000 abstract 1
- 238000012545 processing Methods 0.000 description 26
- 238000005516 engineering process Methods 0.000 description 15
- 239000000203 mixture Substances 0.000 description 14
- 238000010586 diagram Methods 0.000 description 13
- 238000001312 dry etching Methods 0.000 description 7
- 238000005530 etching Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000013078 crystal Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 239000013307 optical fiber Substances 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 238000004380 ashing Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000004816 latex Substances 0.000 description 2
- 229920000126 latex Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 238000004886 process control Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/10—Investigating individual particles
- G01N15/14—Optical investigation techniques, e.g. flow cytometry
- G01N15/1434—Optical arrangements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/10—Investigating individual particles
- G01N15/14—Optical investigation techniques, e.g. flow cytometry
- G01N2015/1486—Counting the particles
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/10—Investigating individual particles
- G01N15/14—Optical investigation techniques, e.g. flow cytometry
- G01N2015/1493—Particle size
Landscapes
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
Description
Claims (7)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004334759A JP4593243B2 (ja) | 2004-11-18 | 2004-11-18 | 気中粒子監視装置および真空処理装置 |
JP2004334759 | 2004-11-18 | ||
US60/636,487 | 2004-12-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1776400A CN1776400A (zh) | 2006-05-24 |
CN100523780C true CN100523780C (zh) | 2009-08-05 |
Family
ID=36625215
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2005101149669A Expired - Fee Related CN100523780C (zh) | 2004-11-18 | 2005-11-16 | 粒子监测装置和真空处理装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7417732B2 (zh) |
JP (1) | JP4593243B2 (zh) |
CN (1) | CN100523780C (zh) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008089540A (ja) * | 2006-10-05 | 2008-04-17 | Furukawa Electric Co Ltd:The | 光計測方法および光計測装置 |
JP4389991B2 (ja) * | 2007-10-26 | 2009-12-24 | ソニー株式会社 | 微小粒子の光学的測定方法及び光学的測定装置 |
JP5239105B2 (ja) * | 2007-12-19 | 2013-07-17 | 株式会社東京精密 | レーザーダイシング装置及びダイシング方法 |
FI20090319A0 (fi) * | 2009-09-03 | 2009-09-03 | Beneq Oy | Prosessinsäätömenetelmä |
JP5950319B2 (ja) * | 2010-06-15 | 2016-07-13 | 新日本空調株式会社 | パーティクル濃度測定装置 |
KR101225296B1 (ko) | 2011-02-21 | 2013-01-23 | 성균관대학교산학협력단 | 신호 분석을 통한 실시간 입자 측정 방법 |
JP5876248B2 (ja) * | 2011-08-09 | 2016-03-02 | 東京エレクトロン株式会社 | パーティクルモニタ方法、パーティクルモニタ装置 |
DE102013206543A1 (de) * | 2012-07-16 | 2014-01-16 | Robert Bosch Gmbh | Vorrichtung zum Befüllen von Behältnissen |
CN103954537B (zh) * | 2014-05-09 | 2016-04-20 | 河北大学 | 一种干式颗粒粒度测量方法 |
CN103954539B (zh) * | 2014-05-09 | 2016-04-20 | 河北大学 | 一种干式颗粒粒度测量装置 |
CN103954538B (zh) * | 2014-05-09 | 2016-03-09 | 河北大学 | 一种干式颗粒粒度测量装置 |
US10132934B2 (en) * | 2014-09-17 | 2018-11-20 | Stmicroelectronics S.R.L. | Integrated detection device, in particular detector of particles such as particulates or alpha particles |
CN107427259B (zh) * | 2014-12-31 | 2021-03-16 | 皇家飞利浦有限公司 | 用于执行对基于时间的二氧化碳图信号的直方图分析的系统以及其操作的方法 |
CN107421916B (zh) * | 2017-05-02 | 2021-02-23 | 京东方科技集团股份有限公司 | 检测装置、工艺系统和检测方法 |
JP2021063779A (ja) * | 2019-10-17 | 2021-04-22 | 富士電機株式会社 | 粒子分析装置 |
WO2021096658A1 (en) * | 2019-11-15 | 2021-05-20 | Becton, Dickinson And Company | Methods for determining particle size and light detection systems for same |
CN113808966B (zh) * | 2020-06-16 | 2023-10-17 | 长鑫存储技术有限公司 | 半导体设备的调试方法及半导体器件的制备方法 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1405682A (en) * | 1972-11-09 | 1975-09-10 | Kernforschung Gmbh Ges Fuer | Apparatus for the rapid meausring of the angular dependence of light scattered from a scattering volume containing particles |
US3975084A (en) * | 1973-09-27 | 1976-08-17 | Block Engineering, Inc. | Particle detecting system |
US3910702A (en) * | 1974-02-12 | 1975-10-07 | Particle Technology Inc | Apparatus for detecting particles employing apertured light emitting device |
GB2073412B (en) * | 1980-03-19 | 1984-08-15 | Karabegov M | Calibrating instruments for counting and measuring particles |
US4906094A (en) * | 1987-04-23 | 1990-03-06 | Sumitomo Chemical Co. Ltd. | Fine particle measuring method and system and a flow cell for use in the system |
JPS6475943A (en) * | 1987-09-18 | 1989-03-22 | Hitachi Ltd | Method for irradiation with laser beam |
JPH0222534A (ja) * | 1988-07-11 | 1990-01-25 | Fujitsu Ltd | 粒子測定装置 |
FR2641421A1 (fr) * | 1989-01-03 | 1990-07-06 | Comp Generale Electricite | Laser a plaque avec pompage optique par source a plage d'emission etroite |
JPH02259448A (ja) * | 1989-03-31 | 1990-10-22 | Hitachi Ltd | パターン発生光学装置 |
US5011286A (en) * | 1989-08-03 | 1991-04-30 | Met One, Inc. | Multisensor particle counter utilizing a single energy source |
JPH03140840A (ja) * | 1989-10-26 | 1991-06-14 | Hitachi Ltd | 流動細胞分析装置 |
US5092675A (en) * | 1989-11-14 | 1992-03-03 | Pacific Scientific Company | Vacuum line particle detector with slab laser |
US5317380A (en) * | 1991-02-19 | 1994-05-31 | Inspex, Inc. | Particle detection method and apparatus |
US5271264A (en) * | 1991-11-27 | 1993-12-21 | Applied Materials, Inc. | Method of in-situ particle monitoring in vacuum systems |
US5481357A (en) * | 1994-03-03 | 1996-01-02 | International Business Machines Corporation | Apparatus and method for high-efficiency, in-situ particle detection |
US5654797A (en) * | 1996-02-22 | 1997-08-05 | National Research Council Of Canada | Method and apparatus for monitoring the diameter of thermally sprayed particles |
JPH1090158A (ja) * | 1996-09-19 | 1998-04-10 | Noritz Corp | 浮遊粒子群の濃度及び粒度の測定装置 |
US6134258A (en) * | 1998-03-25 | 2000-10-17 | The Board Of Trustees Of The Leland Stanford Junior University | Transverse-pumped sLAB laser/amplifier |
JP4162773B2 (ja) * | 1998-08-31 | 2008-10-08 | 東京エレクトロン株式会社 | プラズマ処理装置および検出窓 |
JP3454173B2 (ja) * | 1998-11-09 | 2003-10-06 | 三菱電機株式会社 | 光学式ほこりセンサ光学系 |
JP3849328B2 (ja) * | 1998-11-25 | 2006-11-22 | 株式会社デンソー | 噴霧測定装置 |
US20030138021A1 (en) * | 2001-10-25 | 2003-07-24 | Norman Hodgson | Diode-pumped solid-state thin slab laser |
JP3814190B2 (ja) * | 2001-11-09 | 2006-08-23 | 株式会社堀場製作所 | 粒径分布測定装置 |
JP2003229417A (ja) | 2001-11-28 | 2003-08-15 | Tokyo Electron Ltd | 真空処理装置及びその制御方法 |
US6896764B2 (en) * | 2001-11-28 | 2005-05-24 | Tokyo Electron Limited | Vacuum processing apparatus and control method thereof |
WO2004025791A1 (de) * | 2002-09-05 | 2004-03-25 | Las-Cad Gmbh | Seitlich mit fokussiertem licht von laserdioden in vielfachdurchläufen gepumpter festkörperlaser |
-
2004
- 2004-11-18 JP JP2004334759A patent/JP4593243B2/ja not_active Expired - Fee Related
-
2005
- 2005-11-14 US US11/271,945 patent/US7417732B2/en not_active Expired - Fee Related
- 2005-11-16 CN CNB2005101149669A patent/CN100523780C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2006145347A (ja) | 2006-06-08 |
JP4593243B2 (ja) | 2010-12-08 |
US20060132769A1 (en) | 2006-06-22 |
US7417732B2 (en) | 2008-08-26 |
CN1776400A (zh) | 2006-05-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN100523780C (zh) | 粒子监测装置和真空处理装置 | |
CA2604685C (en) | Diagnosis and calibration system for icp-ms apparatus | |
CN100552889C (zh) | 等离子体处理装置 | |
US7462243B2 (en) | Chemical processing system and method | |
US11119051B2 (en) | Particle detection for substrate processing | |
CN104268416A (zh) | 一种冷链物流车厢温度监控方法及系统 | |
CN100426471C (zh) | 处理装置用的多变量解析方法、处理装置的控制装置、处理装置的控制系统 | |
US8148268B2 (en) | Plasma treatment apparatus and plasma treatment method | |
US6629043B1 (en) | Multiple port leak detection system | |
CN100507511C (zh) | 粒子监视装置和具备该粒子监视装置的处理装置 | |
US20180138015A1 (en) | Processing chamber hardware fault detection using spectral radio frequency analysis | |
US20140217280A1 (en) | Mass spectrometry device | |
US11320381B2 (en) | Deterioration detecting system and method for semiconductor process kits | |
JPH06117600A (ja) | ガス、蒸気等の漏洩地点および漏洩量推定システム | |
US20190317008A1 (en) | Inline particle sensor | |
US9159599B2 (en) | Apparatus for chemically etching a workpiece | |
CN102087179B (zh) | 一种红外气体分析预处理系统 | |
KR20060069258A (ko) | 입자 모니터링 장치 및 진공 처리 장치 | |
KR20190050254A (ko) | 기판 처리 장치 및 기판 처리 모니터링 방법 | |
US11226234B2 (en) | Spectrum shaping devices and techniques for optical characterization applications | |
KR102140711B1 (ko) | 고진공 플라즈마 잔류가스 분석장치 및 이를 이용한 잔류가스 분석방법 | |
CN110534447B (zh) | 一种基于cim的自动变更检量的抽检方法 | |
KR101985809B1 (ko) | 정전척의 누설 검사 장치 | |
US20220333989A1 (en) | Spatial optical emission spectroscopy for etch uniformity | |
AT | Quality control and processes optimization for the EXFEL superconducting cavities series production at Ettore Zanon SpA |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: TOKYO ELECTRON LTD. Free format text: FORMER OWNER: TAKUHIROYASU CO., LTD.;TAKUHIROYASU CO., LTD. Effective date: 20121217 Free format text: FORMER OWNER: TOKYO ELECTRON LTD. Effective date: 20121217 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20121217 Address after: Tokyo, Japan, Hong Kong port, 5, 1, 3, 107-6325 Patentee after: Tokyo Electron Limited Address before: Tokyo, Japan Patentee before: Topcon Corp. Patentee before: Tokyo Electron Limited |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090805 Termination date: 20161116 |
|
CF01 | Termination of patent right due to non-payment of annual fee |