ATE10292T1 - Regelbare aufdampfquelle. - Google Patents

Regelbare aufdampfquelle.

Info

Publication number
ATE10292T1
ATE10292T1 AT80300618T AT80300618T ATE10292T1 AT E10292 T1 ATE10292 T1 AT E10292T1 AT 80300618 T AT80300618 T AT 80300618T AT 80300618 T AT80300618 T AT 80300618T AT E10292 T1 ATE10292 T1 AT E10292T1
Authority
AT
Austria
Prior art keywords
vapor
reservoirs
vapor deposition
vapors
reservoir
Prior art date
Application number
AT80300618T
Other languages
English (en)
Inventor
Michael Gregg Blankenship
Original Assignee
Corning Glass Works
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Glass Works filed Critical Corning Glass Works
Application granted granted Critical
Publication of ATE10292T1 publication Critical patent/ATE10292T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/06—Concentric circular ports
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/12—Nozzle or orifice plates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C03B2207/87—Controlling the temperature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Optical Integrated Circuits (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Chemical Vapour Deposition (AREA)
  • Glass Compositions (AREA)
  • Paper (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Auxiliary Devices For And Details Of Packaging Control (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Laser Surgery Devices (AREA)
  • Control Of Steam Boilers And Waste-Gas Boilers (AREA)
  • Communication Cables (AREA)
  • Fats And Perfumes (AREA)
  • Medicines Containing Material From Animals Or Micro-Organisms (AREA)
  • Lubricants (AREA)
  • Medicinal Preparation (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Mechanical Coupling Of Light Guides (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
AT80300618T 1979-03-01 1980-02-29 Regelbare aufdampfquelle. ATE10292T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/016,446 US4314837A (en) 1979-03-01 1979-03-01 Reactant delivery system method
EP80300618A EP0018068B1 (de) 1979-03-01 1980-02-29 Regelbare Aufdampfquelle

Publications (1)

Publication Number Publication Date
ATE10292T1 true ATE10292T1 (de) 1984-11-15

Family

ID=21777164

Family Applications (1)

Application Number Title Priority Date Filing Date
AT80300618T ATE10292T1 (de) 1979-03-01 1980-02-29 Regelbare aufdampfquelle.

Country Status (15)

Country Link
US (1) US4314837A (de)
EP (1) EP0018068B1 (de)
JP (1) JPS55116640A (de)
AT (1) ATE10292T1 (de)
AU (1) AU517154B2 (de)
BR (1) BR8001187A (de)
CA (1) CA1136402A (de)
DE (1) DE3069619D1 (de)
DK (1) DK154416C (de)
ES (1) ES8103386A1 (de)
FI (1) FI67361C (de)
IL (1) IL59484A (de)
IN (1) IN152644B (de)
NO (1) NO147416C (de)
YU (1) YU56880A (de)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2490211B1 (de) * 1980-09-17 1990-09-21 Passaret Michel
US4395270A (en) * 1981-04-13 1983-07-26 Corning Glass Works Method of fabricating a polarization retaining single-mode optical waveguide
NL8102105A (nl) * 1981-04-29 1982-11-16 Philips Nv Inrichting en werkwijze voor het verzadigen van een gas met de damp van een vloeistof.
IT1155119B (it) * 1982-03-05 1987-01-21 Cselt Centro Studi Lab Telecom Procedimento e dispositivo per la produzione di preforme per fibre ottiche
JPS6031777B2 (ja) * 1982-11-19 1985-07-24 住友電気工業株式会社 原料ガス供給装置
AU563417B2 (en) * 1984-02-07 1987-07-09 Nippon Telegraph & Telephone Public Corporation Optical fibre manufacture
JPS60186429A (ja) * 1984-03-01 1985-09-21 Sumitomo Electric Ind Ltd 光フアイバ用母材の製造方法
US4619844A (en) * 1985-01-22 1986-10-28 Fairchild Camera Instrument Corp. Method and apparatus for low pressure chemical vapor deposition
JPS61254242A (ja) * 1985-05-01 1986-11-12 Sumitomo Electric Ind Ltd 原料供給装置
JPS63500918A (ja) * 1985-09-16 1988-04-07 エアー・プロダクツ・アンド・ケミカルズ・インコーポレーテツド 真空蒸気伝送制御
JPS62156938A (ja) * 1985-12-28 1987-07-11 航空宇宙技術研究所 傾斜機能材料の製造方法
US4915716A (en) * 1986-10-02 1990-04-10 American Telephone And Telegraph Company Fabrication of lightguide soot preforms
GB8708436D0 (en) * 1987-04-08 1987-05-13 British Telecomm Reagent source
GB2210613B (en) * 1987-09-25 1991-08-14 Gen Electric Co Plc Manufacture of optical fibre preforms
ATE164369T1 (de) * 1989-11-13 1998-04-15 Corning Inc Verfahren und vorrichtung zum herstellen einer vorform mit einem dotierten metalloxyd
US5203897A (en) * 1989-11-13 1993-04-20 Corning Incorporated Method for making a preform doped with a metal oxide
US5078092A (en) * 1989-12-22 1992-01-07 Corning Incorporated Flash vaporizer system for use in manufacturing optical waveguide fiber
JP3118822B2 (ja) * 1990-09-07 2000-12-18 住友電気工業株式会社 ガラス物品の製造方法
DE4236324C1 (de) * 1992-10-28 1993-09-02 Schott Glaswerke, 55122 Mainz, De
US5296012A (en) * 1992-12-28 1994-03-22 Corning Incorporated Method of making optical waveguide preforms
US5356451A (en) * 1993-12-20 1994-10-18 Corning Incorporated Method and apparatus for vaporization of liquid reactants
US5632797A (en) * 1994-12-30 1997-05-27 Corning Incorporated Method of providing vaporized halide-free, silicon-containing compounds
US5558687A (en) * 1994-12-30 1996-09-24 Corning Incorporated Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds
US5599371A (en) * 1994-12-30 1997-02-04 Corning Incorporated Method of using precision burners for oxidizing halide-free, silicon-containing compounds
US5838866A (en) 1995-11-03 1998-11-17 Corning Incorporated Optical fiber resistant to hydrogen-induced attenuation
US5966499A (en) * 1997-07-28 1999-10-12 Mks Instruments, Inc. System for delivering a substantially constant vapor flow to a chemical process reactor
WO2002014230A1 (en) * 2000-08-15 2002-02-21 Corning Incorporated Flame hydrolysis deposition process for making integrated optical components
US6789401B1 (en) * 2001-06-28 2004-09-14 Asi/Silica Machinery, Llc Particle deposition system and method
AU2002313486A1 (en) * 2002-06-28 2004-01-19 Pirelli & C. S.P.A. Method and device for vaporizing a liquid reactant in manufacturing a glass preform
KR100521957B1 (ko) * 2003-07-11 2005-10-14 엘에스전선 주식회사 광섬유 제조를 위한 외부 기상 증착 장치 및 이를 이용한광섬유 모재 제조방법
US20050205215A1 (en) * 2004-03-17 2005-09-22 General Electric Company Apparatus for the evaporation of aqueous organic liquids and the production of powder pre-forms in flame hydrolysis processes
US7680399B2 (en) * 2006-02-07 2010-03-16 Brooks Instrument, Llc System and method for producing and delivering vapor
US20080050076A1 (en) * 2006-08-23 2008-02-28 Ming-Jun Li Low loss photonic waveguide having high index contrast glass layers
JP5148367B2 (ja) * 2007-05-29 2013-02-20 信越化学工業株式会社 高周波誘導熱プラズマトーチを用いた光ファイバプリフォームの製造方法
JP5023016B2 (ja) * 2007-08-10 2012-09-12 信越化学工業株式会社 光ファイバ製造装置および線引き炉のシール方法
US10464838B2 (en) 2015-01-13 2019-11-05 Asi/Silica Machinery, Llc Enhanced particle deposition system and method
JP6793676B2 (ja) 2018-04-02 2020-12-02 信越化学工業株式会社 光ファイバ用多孔質ガラス母材の製造装置および製造方法
JP7155075B2 (ja) * 2019-07-31 2022-10-18 株式会社フジクラ 光ファイバの製造方法
JP7449842B2 (ja) * 2020-11-02 2024-03-14 信越化学工業株式会社 多孔質ガラス母材の製造方法及び製造装置
JP7428632B2 (ja) 2020-12-14 2024-02-06 信越化学工業株式会社 多孔質ガラス母材の製造方法及び製造装置

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US3771260A (en) * 1970-01-29 1973-11-13 Black Sivalls & Bryson Inc Method of vaporizing and combining a liquefied cryogenic fluid stream with a gas stream
US3826560A (en) * 1972-03-30 1974-07-30 Corning Glass Works Method of forming a light focusing fiber waveguide
US3938384A (en) * 1972-10-13 1976-02-17 Tylan Corporation Mass flow meter with reduced attitude sensitivity
JPS4983453A (de) * 1972-12-14 1974-08-10
US3859073A (en) * 1973-10-19 1975-01-07 Corning Glass Works Method of producing glass by flame hydrolysis
US3939858A (en) * 1974-09-13 1976-02-24 Tylan Corporation Assembly and method of obtaining a controlled gas mixture
JPS51120334A (en) * 1975-04-14 1976-10-21 Nippon Soken Inc Electronic type ignition time adjustor for internal combustion engine
CA1034818A (en) * 1975-04-16 1978-07-18 Northern Electric Company Limited Manufacture of optical fibres
DE2546162B1 (de) * 1975-10-15 1976-09-23 Jenaer Glaswerk Schott & Gen Lichtleitfaser mit Brechungsindexgradient zur Nachrichtenuebertragung
JPS52121341A (en) * 1976-04-06 1977-10-12 Nippon Telegr & Teleph Corp <Ntt> Production of optical fiber base materials and production apparatus fo r the same
US4111219A (en) * 1977-05-11 1978-09-05 Tmc, Inc. Industrial fuel blender and fuel blending method
JPS5927728B2 (ja) * 1977-08-11 1984-07-07 日本電信電話株式会社 煤状ガラスロッドの製造方法
CA1117334A (en) * 1977-09-29 1982-02-02 Suresh T. Gulati Gradient index optical waveguide
US4220460A (en) * 1979-02-05 1980-09-02 Western Electric Company, Inc. Vapor delivery system and method

Also Published As

Publication number Publication date
IN152644B (de) 1984-03-03
DK85880A (da) 1980-09-02
ES489018A0 (es) 1981-02-16
ES8103386A1 (es) 1981-02-16
JPS55116640A (en) 1980-09-08
IL59484A0 (en) 1980-05-30
NO800571L (no) 1980-09-02
AU5596180A (en) 1980-09-04
FI67361B (fi) 1984-11-30
NO147416B (no) 1982-12-27
FI67361C (fi) 1985-03-11
AU517154B2 (en) 1981-07-09
US4314837A (en) 1982-02-09
DE3069619D1 (en) 1984-12-20
DK154416B (da) 1988-11-14
DK154416C (da) 1989-05-16
CA1136402A (en) 1982-11-30
NO147416C (no) 1984-03-21
YU56880A (en) 1983-09-30
FI800604A (fi) 1980-09-02
IL59484A (en) 1985-01-31
EP0018068A1 (de) 1980-10-29
JPS6320772B2 (de) 1988-04-30
BR8001187A (pt) 1980-11-04
EP0018068B1 (de) 1984-11-14

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