ATA10182002A - Diamantelektrode und verfahren zu ihrer herstellung - Google Patents

Diamantelektrode und verfahren zu ihrer herstellung

Info

Publication number
ATA10182002A
ATA10182002A AT10182002A AT10182002A ATA10182002A AT A10182002 A ATA10182002 A AT A10182002A AT 10182002 A AT10182002 A AT 10182002A AT 10182002 A AT10182002 A AT 10182002A AT A10182002 A ATA10182002 A AT A10182002A
Authority
AT
Austria
Prior art keywords
production
diamond electrode
diamond
electrode
Prior art date
Application number
AT10182002A
Other languages
English (en)
Other versions
AT412002B (de
Inventor
Robert Ing Mag Hermann
Michael Dipl Ing Kotschan
Michael Dipl Ing Schelch
Wolfgang Dr Mag Staber
Wolfgang Dipl Ing Mag Wesner
Original Assignee
Wolfgang Dipl Ing Mag Wesner
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wolfgang Dipl Ing Mag Wesner filed Critical Wolfgang Dipl Ing Mag Wesner
Priority to AT0101802A priority Critical patent/AT412002B/de
Priority to US10/520,930 priority patent/US7455754B2/en
Priority to JP2004518488A priority patent/JP2005532472A/ja
Priority to EP03718708A priority patent/EP1527212A1/de
Priority to PCT/EP2003/003085 priority patent/WO2004005585A1/de
Priority to AU2003222779A priority patent/AU2003222779A1/en
Publication of ATA10182002A publication Critical patent/ATA10182002A/de
Application granted granted Critical
Publication of AT412002B publication Critical patent/AT412002B/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/46109—Electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/46109—Electrodes
    • C02F2001/46133—Electrodes characterised by the material
    • C02F2001/46138—Electrodes comprising a substrate and a coating
    • C02F2001/46147—Diamond coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12625—Free carbon containing component
AT0101802A 2002-07-08 2002-07-08 Diamantelektrode und verfahren zu ihrer herstellung AT412002B (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
AT0101802A AT412002B (de) 2002-07-08 2002-07-08 Diamantelektrode und verfahren zu ihrer herstellung
US10/520,930 US7455754B2 (en) 2002-07-08 2003-03-25 Diamond electrode and method for production thereof
JP2004518488A JP2005532472A (ja) 2002-07-08 2003-03-25 ダイヤモンド電極およびその製造法
EP03718708A EP1527212A1 (de) 2002-07-08 2003-03-25 Diamantelektrode und verfahren zu ihrer herstellung
PCT/EP2003/003085 WO2004005585A1 (de) 2002-07-08 2003-03-25 Diamantelektrode und verfahren zu ihrer herstellung
AU2003222779A AU2003222779A1 (en) 2002-07-08 2003-03-25 Diamond electrode and method for production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT0101802A AT412002B (de) 2002-07-08 2002-07-08 Diamantelektrode und verfahren zu ihrer herstellung

Publications (2)

Publication Number Publication Date
ATA10182002A true ATA10182002A (de) 2004-01-15
AT412002B AT412002B (de) 2004-08-26

Family

ID=30004247

Family Applications (1)

Application Number Title Priority Date Filing Date
AT0101802A AT412002B (de) 2002-07-08 2002-07-08 Diamantelektrode und verfahren zu ihrer herstellung

Country Status (6)

Country Link
US (1) US7455754B2 (de)
EP (1) EP1527212A1 (de)
JP (1) JP2005532472A (de)
AT (1) AT412002B (de)
AU (1) AU2003222779A1 (de)
WO (1) WO2004005585A1 (de)

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GB0318215D0 (en) * 2003-08-04 2003-09-03 Element Six Ltd Diamond microelectrodes
EP1730508A1 (de) * 2004-03-09 2006-12-13 Element Six B.V. Diamantpartikel umfassender elektrochemischer sensor
KR100841465B1 (ko) * 2004-05-21 2008-06-25 디아콘 게엠베하 다이아몬드로 코팅된 전극
DE102004025669A1 (de) * 2004-05-21 2005-12-15 Diaccon Gmbh Funktionelle CVD-Diamantschichten auf großflächigen Substraten
AT413109B (de) * 2004-05-28 2005-11-15 Gruber Karl Dipl Ing Dr Diamantelektrode auf kunststoffbasis
AT413707B (de) * 2004-07-19 2006-05-15 Voest Alpine Ind Anlagen Verfahren und vorrichtung zum beizen von metallen
DE102006002224A1 (de) * 2006-01-16 2007-07-19 Schaeffler Kg Anordnung zum Schutz eines Substrates vor Korrosion, Verfahren zu dessen Herstellung sowie Riemenscheibe
AT503402B1 (de) * 2006-04-10 2008-02-15 Pro Aqua Diamantelektroden Pro Verfahren zur herstellung einer diamantelektrode und diamantelektrode
JP4841316B2 (ja) * 2006-05-29 2011-12-21 株式会社神戸製鋼所 ダイヤモンド電極
JP2008001932A (ja) * 2006-06-21 2008-01-10 Sumitomo Electric Ind Ltd 電解用電極
US7923068B2 (en) 2007-02-12 2011-04-12 Lotus Applied Technology, Llc Fabrication of composite materials using atomic layer deposition
US20080200224A1 (en) 2007-02-20 2008-08-21 Gametank Inc. Instrument Game System and Method
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FR2942220B1 (fr) * 2009-02-16 2011-04-08 Orege Procede et dispositif d'epuration d'effluents liquides
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AT511665A1 (de) * 2011-06-30 2013-01-15 Pro Aqua Diamantelektroden Produktion Gmbh & Co Kg Tauchzelle zur elektrolytischen reinigung von wasser
JP2013095935A (ja) * 2011-10-28 2013-05-20 Eagle Industry Co Ltd 放電表面処理用電極
AT511817B1 (de) * 2012-02-22 2013-03-15 Pro Aqua Diamantelektroden Produktion Gmbh & Co Kg Verfahren zur Herstellung einer Elektrode
AT511952B1 (de) * 2012-02-29 2013-04-15 Pro Aqua Diamantelektroden Produktion Gmbh & Co Kg Elektrolysezelle und Verfahren zu ihrer Herstellung
JP6426155B2 (ja) * 2013-05-17 2018-11-21 スチュアート，マーティン，エー． ダイヤモンドまたはダイヤモンド様炭素を利用する誘電体壁加速器
WO2015146012A1 (ja) * 2014-03-24 2015-10-01 株式会社 東芝 光電気化学セル、光電気化学セルの製造方法、および光電気化学反応装置
AT516720B1 (de) * 2015-05-18 2016-08-15 Pro Aqua Diamantelektroden Produktion Gmbh & Co Kg Verfahren zur Herstellung einer Elektrode
KR101771548B1 (ko) * 2015-06-09 2017-09-12 한국과학기술연구원 복합 전선 구조체 및 그 제조 방법
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CA2946465C (en) 2015-11-12 2022-03-29 Delta Faucet Company Ozone generator for a faucet
CN105350055B (zh) * 2015-11-18 2017-07-18 上海应用技术学院 一种用于熔盐电解的Ni‑导电金刚石复合电极的制备方法
CN105369327B (zh) * 2015-11-25 2017-07-18 上海应用技术学院 一种导电金刚石复合电极的制备方法
CN105624726A (zh) * 2015-12-30 2016-06-01 金刚宝石水高科技有限公司 用于电化学电池的电极
RU2689355C1 (ru) * 2016-03-24 2019-05-27 Федеральное государственное унитарное предприятие "Специальное конструкторско-технологическое бюро "Технолог" Способ получения цинк-наноалмазного электрохимического покрытия
JP6575920B2 (ja) * 2016-03-25 2019-09-18 パナソニックＩｐマネジメント株式会社 エレクトロクロミック素子及びエレクトロクロミック装置
JP6810536B2 (ja) * 2016-04-25 2021-01-06 臼井国際産業株式会社 金属材およびその製造方法
EP3323380B1 (de) * 2016-11-18 2020-01-08 Markus Schlee Behandlungssystem zur reinigung eines mit biofilmverunreinigten bauteils, insbesondere eines implantat-teils
DE102017103602A1 (de) 2017-02-22 2018-08-23 Schlütter Oberflächentechnik GmbH Beschichtung eines Werkstoffes und Verfahren zu deren Erzeugung sowie Werkstück
US11407661B2 (en) 2017-07-17 2022-08-09 Watkins Manufacturing Corporation Chlorine generator system
JP7441441B2 (ja) 2020-11-18 2024-03-01 トーメイダイヤ株式会社 焼結ダイヤモンド電極素材
EP4272226A1 (de) * 2020-12-31 2023-11-08 Alpha Tech Research Corp Poolartiger flüssigmetallgekühlter salzschmelzreaktor
JP7340783B1 (ja) 2022-07-22 2023-09-08 トーメイダイヤ株式会社 オゾン発生用電極素材の製造方法および電極素材

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JP2000045097A (ja) * 1998-05-27 2000-02-15 Tektronix Inc コ―ティング形成方法及び電極構体
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US6267866B1 (en) * 1999-10-14 2001-07-31 The United States Of America As Represented By The Secretary Of The Navy Fabrication of a high surface area boron-doped diamond coated metal mesh for electrochemical applications
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Also Published As

Publication number Publication date
JP2005532472A (ja) 2005-10-27
US7455754B2 (en) 2008-11-25
AT412002B (de) 2004-08-26
AU2003222779A1 (en) 2004-01-23
US20060151803A1 (en) 2006-07-13
EP1527212A1 (de) 2005-05-04
WO2004005585A1 (de) 2004-01-15

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Legal Events

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EIH Change in the person of patent owner
MM01 Lapse because of not paying annual fees

Effective date: 20190115