ZA895348B - Energy-curable cyanate compositions - Google Patents

Energy-curable cyanate compositions

Info

Publication number
ZA895348B
ZA895348B ZA895348A ZA895348A ZA895348B ZA 895348 B ZA895348 B ZA 895348B ZA 895348 A ZA895348 A ZA 895348A ZA 895348 A ZA895348 A ZA 895348A ZA 895348 B ZA895348 B ZA 895348B
Authority
ZA
South Africa
Prior art keywords
energy
cyanate compositions
curable cyanate
curable
compositions
Prior art date
Application number
ZA895348A
Other languages
English (en)
Inventor
Fred Boyle Mccormick
Boyle Mccormick Fred
Katherine Ann Brown-Wensley
Ann Brown-Wensley Katherine
Robert James Devoe
James Devoe Robert
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Publication of ZA895348B publication Critical patent/ZA895348B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/0622—Polycondensates containing six-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms
    • C08G73/0638—Polycondensates containing six-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms with at least three nitrogen atoms in the ring
    • C08G73/065—Preparatory processes
    • C08G73/0655—Preparatory processes from polycyanurates
    • C08G73/0661—Preparatory processes from polycyanurates characterised by the catalyst used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
ZA895348A 1988-08-19 1989-07-13 Energy-curable cyanate compositions ZA895348B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/234,464 US5215860A (en) 1988-08-19 1988-08-19 Energy-curable cyanate compositions

Publications (1)

Publication Number Publication Date
ZA895348B true ZA895348B (en) 1990-04-25

Family

ID=22881503

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA895348A ZA895348B (en) 1988-08-19 1989-07-13 Energy-curable cyanate compositions

Country Status (9)

Country Link
US (3) US5215860A (de)
EP (1) EP0364073B1 (de)
JP (1) JP2858802B2 (de)
KR (1) KR0138522B1 (de)
AU (1) AU620892B2 (de)
CA (1) CA1336934C (de)
DE (1) DE68909550T2 (de)
ES (1) ES2059765T3 (de)
ZA (1) ZA895348B (de)

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US5215860A (en) * 1988-08-19 1993-06-01 Minnesota Mining And Manufacturing Company Energy-curable cyanate compositions
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US5143785A (en) * 1990-08-20 1992-09-01 Minnesota Mining And Manufacturing Company Cyanate ester adhesives for electronic applications
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AU3141193A (en) * 1991-11-12 1993-06-15 University Of Georgia Research Foundation, Inc., The Anionic photoinitiation
US5652280A (en) * 1991-11-12 1997-07-29 University Of Georgia Research Foundation, Inc. Anionic photoinitiation
US5524422A (en) * 1992-02-28 1996-06-11 Johnson Matthey Inc. Materials with low moisture outgassing properties and method of reducing moisture content of hermetic packages containing semiconductor devices
US5744557A (en) * 1993-06-16 1998-04-28 Minnesota Mining And Manufacturing Company Energy-curable cyanate/ethylenically unsaturated compositions
US5514728A (en) * 1993-07-23 1996-05-07 Minnesota Mining And Manufacturing Company Catalysts and initiators for polymerization
US5670590A (en) * 1994-05-06 1997-09-23 Minnesota Mining And Manufacturing Company Energy polymerizable compositions, homopolymers and copolymers of oxazolines
US5856022A (en) * 1994-06-15 1999-01-05 Minnesota Mining And Manufacturing Company Energy-curable cyanate/ethylenically unsaturated compositions
US5494981A (en) * 1995-03-03 1996-02-27 Minnesota Mining And Manufacturing Company Epoxy-cyanate ester compositions that form interpenetrating networks via a Bronsted acid
US5741879A (en) * 1995-03-03 1998-04-21 Minnesota Mining And Manufacturing Company Energy-polymerizable compositions comprising a cyanate ester monomer or oligomer and a polyol
US5912377A (en) 1995-06-05 1999-06-15 Minnesota Mining And Manufacturing Company Aromatic cyanate ester silane coupling agents
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US6790473B2 (en) * 1995-10-26 2004-09-14 International Business Machines Corporation Lead protective coating composition, process and structure thereof
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US6228133B1 (en) 1998-05-01 2001-05-08 3M Innovative Properties Company Abrasive articles having abrasive layer bond system derived from solid, dry-coated binder precursor particles having a fusible, radiation curable component
US6057382A (en) * 1998-05-01 2000-05-02 3M Innovative Properties Company Epoxy/thermoplastic photocurable adhesive composition
US6274643B1 (en) 1998-05-01 2001-08-14 3M Innovative Properties Company Epoxy/thermoplastic photocurable adhesive composition
US6077601A (en) 1998-05-01 2000-06-20 3M Innovative Properties Company Coated abrasive article
US6136398A (en) * 1998-05-01 2000-10-24 3M Innovative Properties Company Energy cured sealant composition
US6709738B2 (en) * 2001-10-15 2004-03-23 3M Innovative Properties Company Coated substrate with energy curable cyanate resin
CN101488480A (zh) * 2002-06-17 2009-07-22 亨凯尔公司 间层电介质和预施涂的模片连接粘合剂材料
KR100765684B1 (ko) * 2002-07-03 2007-10-11 삼성전자주식회사 합금 패턴 형성용 유기금속 전구체 혼합물 및 이를 이용한합금 패턴 형성방법
US6841333B2 (en) * 2002-11-01 2005-01-11 3M Innovative Properties Company Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions
US7122294B2 (en) * 2003-05-22 2006-10-17 3M Innovative Properties Company Photoacid generators with perfluorinated multifunctional anions
US7521492B2 (en) * 2005-06-01 2009-04-21 3M Innovative Properties Company Self-extinguishing polymer composition
US20070080330A1 (en) * 2005-10-06 2007-04-12 Peters Edward N Flame retardant composition and method
US7488766B2 (en) * 2005-10-06 2009-02-10 Sabic Innovative Plastics Ip B.V. Polymer composition, method, and article
US7495047B2 (en) * 2005-10-06 2009-02-24 At&T Intellectual Property, I, L.P. Poly(arylene ether) composition, method, and article
US7767736B2 (en) * 2005-12-05 2010-08-03 3M Innovative Properties Company Flame retardant polymer composition
US20090130451A1 (en) * 2007-11-19 2009-05-21 Tony Farrell Laser-weldable thermoplastics, methods of manufacture, and articles thereof
JP5804328B2 (ja) * 2012-03-29 2015-11-04 スリーボンドファインケミカル株式会社 硬化性組成物
WO2014193903A2 (en) * 2013-05-30 2014-12-04 Henkel US IP LLC Primer compositions for injection molding
JP6156638B2 (ja) * 2013-08-19 2017-07-05 株式会社スリーボンド シアネートエステル樹脂組成物
JP6179720B2 (ja) * 2013-11-01 2017-08-16 株式会社スリーボンド シアネートエステル樹脂組成物
JP6196531B2 (ja) * 2013-11-05 2017-09-13 株式会社日本触媒 熱硬化性樹脂組成物
JP6350811B2 (ja) * 2014-06-25 2018-07-04 株式会社スリーボンド シアネートエステル樹脂組成物
CN104694069B (zh) * 2014-12-31 2016-09-28 黑龙江省科学院石油化学研究院 一种中温固化氰酸酯发泡结构胶的制备方法
JP6889271B2 (ja) * 2017-10-10 2021-06-18 株式会社クレハ ポリアリーレンスルフィドの製造方法
US11934101B2 (en) * 2019-11-27 2024-03-19 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist composition and method of forming photoresist pattern
CN111500248B (zh) * 2020-05-13 2022-03-22 遂宁立讯精密工业有限公司 一种低固化温度耐热氰酸酯胶黏剂及其制备方法
WO2023247374A1 (de) 2022-06-23 2023-12-28 Technische Universität Wien Cyanatester als monomere in polymerisierbaren zusammensetzungen

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Also Published As

Publication number Publication date
EP0364073B1 (de) 1993-09-29
JPH02105823A (ja) 1990-04-18
AU620892B2 (en) 1992-02-27
DE68909550T2 (de) 1994-04-07
JP2858802B2 (ja) 1999-02-17
AU3815589A (en) 1990-02-22
HK1008035A1 (en) 1999-04-30
CA1336934C (en) 1995-09-05
US5387492A (en) 1995-02-07
ES2059765T3 (es) 1994-11-16
DE68909550D1 (de) 1993-11-04
EP0364073A1 (de) 1990-04-18
US5215860A (en) 1993-06-01
US5294517A (en) 1994-03-15
KR900003232A (ko) 1990-03-26
KR0138522B1 (ko) 1998-05-01

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