WO2022191232A1 - 有機el封止材用紫外線硬化性樹脂組成物 - Google Patents
有機el封止材用紫外線硬化性樹脂組成物 Download PDFInfo
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- WO2022191232A1 WO2022191232A1 PCT/JP2022/010254 JP2022010254W WO2022191232A1 WO 2022191232 A1 WO2022191232 A1 WO 2022191232A1 JP 2022010254 W JP2022010254 W JP 2022010254W WO 2022191232 A1 WO2022191232 A1 WO 2022191232A1
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- WIPO (PCT)
- Prior art keywords
- resin composition
- organic
- curable resin
- group
- component
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims abstract description 155
- 239000000565 sealant Substances 0.000 title abstract description 6
- 150000001875 compounds Chemical class 0.000 claims abstract description 89
- 239000004593 Epoxy Substances 0.000 claims abstract description 41
- 239000003505 polymerization initiator Substances 0.000 claims abstract description 23
- 150000002921 oxetanes Chemical class 0.000 claims abstract description 10
- 239000002904 solvent Substances 0.000 claims abstract description 10
- -1 oxime sulfonate compounds Chemical class 0.000 claims description 43
- 239000003566 sealing material Substances 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 32
- 239000008393 encapsulating agent Substances 0.000 claims description 27
- 239000011521 glass Substances 0.000 claims description 12
- 239000011248 coating agent Substances 0.000 claims description 11
- 238000000576 coating method Methods 0.000 claims description 11
- 238000005259 measurement Methods 0.000 claims description 11
- 238000007789 sealing Methods 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 8
- 125000005228 aryl sulfonate group Chemical group 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 37
- 125000004432 carbon atom Chemical group C* 0.000 description 33
- 125000002723 alicyclic group Chemical group 0.000 description 15
- 239000000203 mixture Substances 0.000 description 14
- 230000001588 bifunctional effect Effects 0.000 description 13
- 125000000217 alkyl group Chemical group 0.000 description 12
- 230000004888 barrier function Effects 0.000 description 10
- 150000001925 cycloalkenes Chemical class 0.000 description 10
- 125000001931 aliphatic group Chemical group 0.000 description 8
- 125000002947 alkylene group Chemical group 0.000 description 8
- 125000003700 epoxy group Chemical group 0.000 description 8
- 125000004430 oxygen atom Chemical group O* 0.000 description 8
- FNYWFRSQRHGKJT-UHFFFAOYSA-N 3-ethyl-3-[(3-ethyloxetan-3-yl)methoxymethyl]oxetane Chemical compound C1OCC1(CC)COCC1(CC)COC1 FNYWFRSQRHGKJT-UHFFFAOYSA-N 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 150000002430 hydrocarbons Chemical group 0.000 description 5
- 125000005647 linker group Chemical group 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 125000003710 aryl alkyl group Chemical group 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N cyclohexene oxide Chemical group C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 description 4
- 238000006073 displacement reaction Methods 0.000 description 4
- 238000012690 ionic polymerization Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- BIDWUUDRRVHZLQ-UHFFFAOYSA-N 3-ethyl-3-(2-ethylhexoxymethyl)oxetane Chemical compound CCCCC(CC)COCC1(CC)COC1 BIDWUUDRRVHZLQ-UHFFFAOYSA-N 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 125000003368 amide group Chemical group 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 3
- 230000002708 enhancing effect Effects 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 125000002541 furyl group Chemical group 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 125000004434 sulfur atom Chemical group 0.000 description 3
- KUAUJXBLDYVELT-UHFFFAOYSA-N 2-[[2,2-dimethyl-3-(oxiran-2-ylmethoxy)propoxy]methyl]oxirane Chemical compound C1OC1COCC(C)(C)COCC1CO1 KUAUJXBLDYVELT-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000003775 Density Functional Theory Methods 0.000 description 2
- 125000005118 N-alkylcarbamoyl group Chemical group 0.000 description 2
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 2
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 2
- 125000000732 arylene group Chemical group 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 125000005587 carbonate group Chemical group 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- FWFSEYBSWVRWGL-UHFFFAOYSA-N cyclohexene oxide Natural products O=C1CCCC=C1 FWFSEYBSWVRWGL-UHFFFAOYSA-N 0.000 description 2
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 2
- 125000004185 ester group Chemical group 0.000 description 2
- 125000001033 ether group Chemical group 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 125000003709 fluoroalkyl group Chemical group 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical group I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 125000003566 oxetanyl group Chemical group 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 125000001544 thienyl group Chemical group 0.000 description 2
- 230000036962 time dependent Effects 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- HHQAGBQXOWLTLL-UHFFFAOYSA-N (2-hydroxy-3-phenoxypropyl) prop-2-enoate Chemical compound C=CC(=O)OCC(O)COC1=CC=CC=C1 HHQAGBQXOWLTLL-UHFFFAOYSA-N 0.000 description 1
- UNMJLQGKEDTEKJ-UHFFFAOYSA-N (3-ethyloxetan-3-yl)methanol Chemical compound CCC1(CO)COC1 UNMJLQGKEDTEKJ-UHFFFAOYSA-N 0.000 description 1
- RSHKWPIEJYAPCL-UHFFFAOYSA-N (3-ethyloxetan-3-yl)methyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1(CC)COC1 RSHKWPIEJYAPCL-UHFFFAOYSA-N 0.000 description 1
- 125000005654 1,2-cyclohexylene group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([*:2])C([H])([*:1])C1([H])[H] 0.000 description 1
- 125000005837 1,2-cyclopentylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:1])C([H])([*:2])C1([H])[H] 0.000 description 1
- 125000005838 1,3-cyclopentylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:2])C([H])([H])C1([H])[*:1] 0.000 description 1
- 125000004955 1,4-cyclohexylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:1])C([H])([H])C([H])([H])C1([H])[*:2] 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- OVSKIKFHRZPJSS-UHFFFAOYSA-N 2,4-D Chemical compound OC(=O)COC1=CC=C(Cl)C=C1Cl OVSKIKFHRZPJSS-UHFFFAOYSA-N 0.000 description 1
- DVSDTPMZVLDKRT-UHFFFAOYSA-N 2-[2-[(3-ethyloxetan-3-yl)methoxy]butoxy]ethanol Chemical compound OCCOCC(CC)OCC1(CC)COC1 DVSDTPMZVLDKRT-UHFFFAOYSA-N 0.000 description 1
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- FVGDNYRHKDREFL-UHFFFAOYSA-N 3-ethyl-3-(1-phenoxyethoxymethyl)oxetane Chemical compound C=1C=CC=CC=1OC(C)OCC1(CC)COC1 FVGDNYRHKDREFL-UHFFFAOYSA-N 0.000 description 1
- PWGAXPBJOGFFMY-UHFFFAOYSA-N 3-ethyl-3-(2-methylpropoxymethoxymethyl)oxetane Chemical compound CC(C)COCOCC1(CC)COC1 PWGAXPBJOGFFMY-UHFFFAOYSA-N 0.000 description 1
- DWFIEBGQPZWYND-UHFFFAOYSA-N 3-ethyl-3-(phenylmethoxymethyl)oxetane Chemical compound C=1C=CC=CC=1COCC1(CC)COC1 DWFIEBGQPZWYND-UHFFFAOYSA-N 0.000 description 1
- JCBNYALMACLNBI-UHFFFAOYSA-N 3-ethyl-3-[(3-fluorophenyl)methoxymethyl]oxetane Chemical compound FC1=CC(=CC=C1)COCC1(COC1)CC JCBNYALMACLNBI-UHFFFAOYSA-N 0.000 description 1
- PENKVNGNXDMJKV-UHFFFAOYSA-N 3-ethyl-3-[(4-methoxyphenyl)methoxymethyl]oxetane Chemical compound C=1C=C(OC)C=CC=1COCC1(CC)COC1 PENKVNGNXDMJKV-UHFFFAOYSA-N 0.000 description 1
- GJEZBVHHZQAEDB-UHFFFAOYSA-N 6-oxabicyclo[3.1.0]hexane Chemical compound C1CCC2OC21 GJEZBVHHZQAEDB-UHFFFAOYSA-N 0.000 description 1
- PGDIJTMOHORACQ-UHFFFAOYSA-N 9-prop-2-enoyloxynonyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCCCCOC(=O)C=C PGDIJTMOHORACQ-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical group C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 229940125782 compound 2 Drugs 0.000 description 1
- 229940126214 compound 3 Drugs 0.000 description 1
- 229940125898 compound 5 Drugs 0.000 description 1
- 238000002884 conformational search Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 125000002993 cycloalkylene group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000009881 electrostatic interaction Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052757 nitrogen Chemical group 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical class C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 125000003544 oxime group Chemical group 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/842—Containers
- H10K50/8426—Peripheral sealing arrangements, e.g. adhesives, sealants
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/10—Materials in mouldable or extrudable form for sealing or packing joints or covers
- C09K3/1006—Materials in mouldable or extrudable form for sealing or packing joints or covers characterised by the chemical nature of one of its constituents
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
- H05B33/04—Sealing arrangements, e.g. against humidity
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2200/00—Chemical nature of materials in mouldable or extrudable form for sealing or packing joints or covers
- C09K2200/06—Macromolecular organic compounds, e.g. prepolymers
- C09K2200/0645—Macromolecular organic compounds, e.g. prepolymers obtained otherwise than by reactions involving carbon-to-carbon unsaturated bonds
- C09K2200/0647—Polyepoxides
Definitions
- the present invention relates to an ultraviolet curable resin composition for organic EL sealing materials.
- Organic EL elements are being used in displays and lighting devices due to their low power consumption. Since organic EL elements are easily deteriorated by moisture and oxygen in the air, it is being considered to use them after being sealed with a sealing material.
- Patent Document 1 Japanese Unexamined Patent Application Publication No. 2020-98684 describes a technique related to sealing materials for organic EL elements.
- the document describes a cationically polymerizable inkjet resin composition for encapsulating an organic EL element, which contains a curable resin, a photocationic polymerization initiator that is an iodonium salt, and a specific acrylic surfactant. It is said that such a composition is excellent in initial wet spreadability.
- Patent Document 2 JP-A-2004-91553
- a specific oxetane compound is used as a highly sensitive active energy ray-curable resin composition that is excellent in curability, strength of the cured film, adhesion to substrates, etc., and is not dependent on environmental humidity.
- a containing resin composition is described.
- the present invention provides a technique for obtaining a resin composition that suppresses displacement of the landing position when ejecting a resin composition used for an organic EL sealing material from an inkjet nozzle and has excellent adhesive strength of a cured product.
- the following UV-curable resin composition for organic EL sealing material is provided.
- An ultraviolet curable resin composition for an organic EL encapsulant containing the following components (a) and (b), When the ultraviolet curable resin composition for an organic EL encapsulant contains the following component (c), the content of the component (c) with respect to the entire ultraviolet curable resin composition for an organic EL encapsulant 0.05% by mass or less, An ultraviolet curable resin composition for an organic EL encapsulant, wherein the residual voltage of the ultraviolet curable resin composition for an organic EL encapsulant measured by the following method is 1 V or less.
- the component (b) is one or more selected from the group consisting of oxime sulfonate compounds, aryl sulfonate compounds and aryliodide compounds.
- the content of the component (b) in the ultraviolet curable resin composition for an organic EL sealing material is 0.1 parts by mass or more and 10 parts by mass or less with respect to 100 parts by mass of the component (a).
- the UV-curable resin composition for an organic EL sealing material according to any one of [1] to [6].
- a technique for obtaining a resin composition that suppresses displacement of the landing position when ejecting a resin composition used for an organic EL encapsulant from an inkjet nozzle and that exhibits excellent adhesive strength in a cured product. can be done.
- FIG. 1 is a cross-sectional view showing a configuration example of an organic EL display device according to an embodiment
- the ultraviolet curable resin composition for an organic EL sealing material (hereinafter also simply referred to as a "resin composition" as appropriate) is a composition used as a sealing material for an organic EL element.
- the resin composition contains the following components (a) and (b), the content of the component (c) is 0.05% by mass or less relative to the entire resin composition. And the residual voltage of the resin composition measured by the following method is 1 V or less.
- the inventors have studied how to control the landing position of droplets of a resin composition ejected from an inkjet nozzle.
- the resin composition contains the components (a) and (b) in combination, the content of the component (c) is controlled, and the residual voltage is controlled within the above range.
- the present inventors have newly found that it is possible to effectively suppress deviations in the landing positions of droplets (hereinafter also simply referred to as "landing deviations").
- the resin composition having the above-described structure suppresses the landing deviation of the droplets, the electrostatic interaction between the resin composition, the inner wall of the inkjet nozzle, and the landing surface of the droplets. is considered to be more preferable.
- the inventors of the present invention have focused on the residual voltage, which is a new measure, as a design guideline for suppressing landing deviation of droplets.
- the residual voltage is large, the resin composition has a high residual rate after being charged, and the resin composition has a property of being more easily charged. and the degree of interaction with the inner wall of the inkjet nozzle and the landing surface of the droplet.
- the present invention has been completed by discovering that a resin composition having excellent adhesive strength can be obtained.
- the resin composition in the present embodiment is a composition for inkjet coating, preferably for inkjet coating in an environment where the humidity is 100 ppm or less. That is, the resin composition of the present embodiment is suitable for application by the inkjet method, and is suitable for application under low humidity conditions. Since the latest organic EL elements tend to have low resistance to moisture, it is being studied to apply an ultraviolet-curable resin composition for organic EL sealing materials under low humidity conditions.
- the present inventors have found that when applying an ultraviolet curable resin composition for an organic EL encapsulant under low humidity, the positional deviation of the landing becomes remarkable, and that the ultraviolet curable resin for an organic EL encapsulant It was found that the misalignment is more remarkable when the polymerizable compound (a) contained in the composition is one or more selected from the group consisting of epoxy compounds and oxetane compounds.
- the residual voltage of the resin composition is 1 V or less, preferably 0.9 V or less, more preferably 0.7 V or less, still more preferably 0.5 V or less, and even more preferably, from the viewpoint of suppressing landing deviation of droplets. is less than or equal to 0.4V, more preferably less than or equal to 0.3V. Moreover, the residual voltage of the resin composition is 0 V or higher, and may be, for example, 0.01 V or higher or 0.1 V or higher.
- the residual voltage of the resin composition is preferably 0.2 V from the viewpoint of suitable application by an inkjet method, specifically from the viewpoint of stabilizing the shape of the resin composition when ejected from an inkjet nozzle. or more, more preferably 0.25 V or more.
- the residual voltage of the resin composition can be measured by the method described above, and more specifically by the following procedure.
- a measurement cell is prepared in which a pair of glass substrates with transparent electrodes are arranged facing each other with a cell gap of 10 ⁇ m.
- the transparent electrode is specifically an ITO electrode
- the measurement cell is specifically KSSZ-10/B111M1NSS05 manufactured by EHC (no alignment film, no rubbing, cell gap: 10 ⁇ m, B type, display electrode size : 10 mm x 10 mm, Glass thickness: 1.1 mm, Glass material: Borosilicate glass (non-alkali type), ITO resistance value: 100 ⁇ or less, Film thickness: 200 to 400 ⁇ , No ITO surface insulation treatment, Seal shape : open type, seal material: epoxy resin, cell gap tolerance ⁇ 0.5 ⁇ m).
- a resin composition is injected into the cell gap of the measurement cell. 3. After applying a voltage of 10 V for 5 ms between the transparent electrodes of the measurement cell, the residual voltage at 10 Hz, that is, the residual voltage 100 ms after the application is measured.
- the humidity (25° C.) when the resin composition is ejected by the inkjet method is, for example, 100 ppm or less, preferably 50 ppm or less, more preferably 20 ppm, from the viewpoint of suppressing landing deviation of droplets. It is below. Also, the humidity may be, for example, 1 ppm or higher.
- the structure of the resin composition will be described in more detail below. First, the constituent components of the resin composition will be described with specific examples.
- Component (a) is a polymerizable compound.
- Specific examples of component (a) include compounds having cationic polymerizable functional groups such as epoxy groups, oxetanyl groups, and vinyl ether groups (hereinafter also referred to as "cationically polymerizable compounds").
- Component (a) is preferably one or more selected from the group consisting of epoxy compounds and oxetane compounds from the viewpoint of suppressing landing deviation of droplets of the resin composition and improving the adhesive strength of the cured product. be.
- Epoxy compounds are compounds having one or more epoxy groups in one molecule, and specific examples include monoepoxy compounds, difunctional epoxy compounds, and trifunctional or higher epoxy compounds. From the viewpoint of suppressing landing deviation of droplets of the resin composition, the epoxy compound contains a bifunctional epoxy compound, more preferably one or two or more bifunctional epoxy compounds, more preferably two or more bifunctional epoxy compounds. It is a functional epoxy compound.
- the epoxy compound preferably contains an alicyclic epoxy compound.
- the alicyclic epoxy compound may be a compound having one or more alicyclic hydrocarbon structures and one or more epoxy groups in the molecule.
- the alicyclic epoxy compound may have one epoxy group or two or more epoxy groups in the molecule, but from the viewpoint of enhancing the curability of the resin composition, it preferably contains two or more epoxy groups.
- alicyclic epoxy compounds include compounds containing a cycloalkene oxide structure such as an epoxycyclohexane structure, and compounds in which an epoxy group is bonded directly or via a hydrocarbon group to a cycloaliphatic hydrocarbon.
- the alicyclic epoxy compound is preferably a compound having a cycloalkene oxide structure.
- the cycloalkene oxide structure is a structure obtained by epoxidizing a cycloalkene with an oxidizing agent such as a peroxide, and is composed of two adjacent carbon atoms and an oxygen atom that constitute an aliphatic ring. It is an epoxy group.
- Cycloalkene oxide is, for example, cyclohexene oxide, cyclopentene oxide, preferably cyclohexene oxide.
- the number of cycloalkene oxide structures in one molecule of the alicyclic epoxy compound having a cycloalkene oxide structure may be one, or two or more. From the viewpoint of enhancing the transparency, heat resistance, light resistance, etc. of the cured product, the number of cycloalkene oxide structures in one molecule is preferably two or more.
- Examples of alicyclic epoxy compounds having a cycloalkene oxide structure include compounds represented by the following general formula (1).
- X is a single bond or a linking group.
- Linking groups are, for example, divalent hydrocarbon groups, carbonyl groups, ether groups (ether bonds), thioether groups (thioether bonds), ester groups (ester bonds), carbonate groups (carbonate bonds) and amide groups (amide bonds). and groups in which a plurality of these are linked.
- divalent hydrocarbon groups examples include alkylene groups having 1 to 18 carbon atoms and divalent alicyclic hydrocarbon groups.
- specific examples of the alkylene group having 1 to 18 carbon atoms include methylene group, methylmethylene group, dimethylmethylene group, ethylene group, propylene group and trimethylene group.
- divalent alicyclic hydrocarbon groups include 1,2-cyclopentylene group, 1,3-cyclopentylene group, cyclopentylidene group, 1,2-cyclohexylene group, 1,3 divalent cycloalkylene groups (including cycloalkylidene groups) such as -cyclohexylene group, 1,4-cyclohexylene group and cyclohexylidene group.
- X is preferably a single bond or a linking group having an oxygen atom, more preferably a single bond.
- the linking group having an oxygen atom is preferably -CO- (carbonyl group), -O-CO-O- (carbonate group), -COO- (ester group), -O- (ether group ), -CONH- (amide group), a group in which a plurality of these groups are linked, or a group in which one or more of these groups are linked to one or more divalent hydrocarbon groups.
- l represents an integer of 1-10
- m represents an integer of 1-30.
- R represents an alkylene group having 1 to 8 carbon atoms, preferably an alkylene group having 1 to 3 carbon atoms such as methylene, ethylene, propylene and isopropylene.
- n1 and n2 each independently represent an integer of 1 to 30;
- Celoxide (CEL) 2021P Celoxide 2081, Celoxide 8000, and Celoxide 8010 (manufactured by Daicel Corporation).
- Preferred examples of other epoxy compounds include aliphatic epoxy compounds such as bifunctional aliphatic epoxy compounds such as neopentyl glycol diglycidyl ether (eg, SR-NPG, manufactured by Sakamoto Yakuhin Kogyo Co., Ltd.).
- the number of carbon atoms in the aliphatic epoxy compound is preferably 1-10, more preferably 2-8, more preferably 4-6.
- the epoxy resin preferably contains an alicyclic epoxy compound and an aliphatic epoxy compound.
- the content of the epoxy compound in the cationically polymerizable compound is preferably 10 parts by mass or more, more preferably 20 parts by mass or more, when the total cationically polymerizable compound is 100 parts by mass. , more preferably 30 parts by mass or more.
- the content of the epoxy compound in the cationically polymerizable compound is, for example, 100 parts by mass or less, preferably 80 parts by mass or less when the total cationically polymerizable compound is 100 parts by mass. , more preferably 70 parts by mass or less, and still more preferably 60 parts by mass or less.
- the oxetane compound is a compound having one or more oxetanyl groups in one molecule, and specific examples thereof include monooxetane compounds, bifunctional oxetane compounds, and trifunctional or higher oxetane compounds.
- the oxetane compound is preferably a bifunctional oxetane compound from the viewpoint of suppressing landing deviation of droplets of the resin composition.
- the oxetane compound is preferably a compound represented by the following general formula (2) or a general One or more compounds selected from the group consisting of compounds represented by formula (3).
- Y represents an oxygen atom, a sulfur atom or a single bond.
- R 1a in general formula (2) and R 1b in general formula (3) are each a fluorine atom, an alkyl group having 1 to 6 carbon atoms, a fluoroalkyl group having 1 to 6 carbon atoms, an allyl group, and a 18 represents an aryl group, a furyl group or an ethynyl group.
- s in General formula (2) and t in General formula (3) each represent an integer of 1 or more and 5 or less.
- R 1a or R 1b When multiple R 1a or R 1b are contained in one molecule, they may be the same or different. Also, adjacent R 1a groups or adjacent R 1b groups may form a ring structure.
- R 2a is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aralkyl group having 7 to 18 carbon atoms, or an alkyl group having 2 to 6 carbon atoms. represents a carbonyl group, an alkoxycarbonyl group having 2 to 6 carbon atoms, an N-alkylcarbamoyl group having 2 to 6 carbon atoms or a (meth)acryloyl group;
- R 2b represents an oxygen atom or a p-valent linking group.
- p represents 2, 3 or 4, preferably 2.
- R 2b is a linear or branched alkylene group having 1 to 12 carbon atoms, a linear or branched poly(alkyleneoxy) group, an arylene group, a siloxane bond, or these represents a combination.
- the oxetane compound is preferably an oxetane compound represented by the general formula (3), more preferably 3-ethyl-3 ⁇ [(3-ethyloxetane- 3-yl)methoxy]methyl ⁇ oxetane (for example, OXT-221, manufactured by Toagosei Co., Ltd.).
- the oxetane compound is also preferably a bifunctional oxetane compound represented by the following general formula (5) or (6).
- R 5 is independently a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an allyl group, an aryl group, an aralkyl group, a furyl group or a thienyl group, preferably is an alkyl group having 1 to 6 carbon atoms.
- R6 is a divalent organic residue.
- the alkyl group having 1 to 6 carbon atoms specifically includes a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group and a cyclohexyl group.
- aryl groups include phenyl, naphthyl, tolyl, and xylyl groups.
- Specific examples of the aralkyl group include a benzyl group and a phenethyl group.
- R 6 examples include an alkylene group, a polyoxyalkylene group, a phenylene group, a xylylene group, and structures represented by the following general formulas.
- R 3 is an oxygen atom, a sulfur atom, —CH 2 —, —NH—, —SO—, —SO 2 —, —C(CF 3 ) 2 — or —C(CH 3 ) 2 —.
- R 4 is an alkylene or arylene group having 1 to 6 carbon atoms. Specific examples of the alkylene group having 1 to 6 carbon atoms include methylene group, ethylene group, propylene group, butylene group and cyclohexylene group.
- the polyoxyalkylene group preferably has 4 to 30 carbon atoms, more preferably 4 to 8 carbon atoms.
- Specific examples of polyoxyalkylene groups include polyoxyethylene groups and polyoxypropylene groups.
- the oxetane compound is preferably an oxetane compound represented by the general formula (6), more preferably 3-ethyl-3 ⁇ [(3-ethyloxetane- 3-yl)methoxy]methyl ⁇ oxetane (for example, OXT-221 (manufactured by Toagosei Co., Ltd.)).
- the oxetane compound is also preferably a compound represented by the following general formula (4).
- Y is an oxygen atom or a sulfur atom. From the viewpoint of improving the weather resistance of the sealing material, Y is preferably an oxygen atom.
- R 1c represents a hydrogen atom, a fluorine atom, an alkyl group having 1 to 6 carbon atoms, a fluoroalkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 18 carbon atoms, a furyl group or a thienyl group.
- R 1c is preferably an alkyl group having 1 to 6 carbon atoms from the viewpoint of reducing the dielectric constant of the cured product of the resin composition.
- R 2c is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aralkyl group having 7 to 18 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkylcarbonyl group having 2 to 6 carbon atoms. It is an alkoxycarbonyl group, an N-alkylcarbamoyl group having 2 to 6 carbon atoms or a (meth)acryloyl group.
- R 2c is preferably an alkyl group having 1 to 10 carbon atoms from the viewpoint of reducing the dielectric constant of the cured product of the resin composition.
- Specific examples of the compound represented by the general formula (4) include 3-ethyl-3-hydroxymethyloxetane, 3-(meth)allyloxymethyl-3-ethyloxetane, (3-ethyl-3-oxetanylmethoxy)methyl Benzene, 4-fluoro-[1-(3-ethyl-3-oxetanylmethoxy)methyl]benzene, 4-methoxy-[1-(3-ethyl-3-oxetanylmethoxy)methyl]benzene, [1-(3- ethyl-3-oxetanylmethoxy)ethyl]phenyl ether, isobutoxymethyl(3-ethyl-3-oxetanylmethyl)ether, isobornyloxyethyl(3-ethyl-3-oxetanylmethyl)ether, isobornyl(3-ethyl- 3-oxetanylmethyl) ether, 2-eth
- the content of the oxetane compound in the cationically polymerizable compound is preferably 10 parts by mass or more when the total cationically polymerizable compound is 100 parts by mass, from the viewpoint of reducing the dielectric constant of the cured product of the resin composition. More preferably 20 parts by mass or more, still more preferably 30 parts by mass or more. From the same point of view, the content of the oxetane compound in the cationically polymerizable compound is, for example, 100 parts by mass or less, preferably 80 parts by mass or less, more preferably 100 parts by mass of the total cationically polymerizable compound. is 70 parts by mass or less, more preferably 60 parts by mass or less.
- the cationically polymerizable composition preferably contains an epoxy compound and an oxetane compound, more preferably an alicyclic epoxy compound, an aliphatic epoxy compound and an oxetane compound. and more preferably bifunctional alicyclic epoxy compounds, bifunctional aliphatic epoxy compounds and bifunctional oxetane compounds.
- the content of component (a) in the resin composition is preferably 70% by mass or more, more preferably 80% by mass or more, based on the total composition of the resin composition, from the viewpoint of improving the strength of the cured product. More preferably 85% by mass or more, still more preferably 90% by mass or more.
- the content of component (a) in the resin composition is preferably 99.9% by mass or less with respect to the total composition of the resin composition. , more preferably 99.5% by mass or less, still more preferably 99% by mass or less.
- Component (b) is a nonionic polymerization initiator.
- the nonionic polymerization initiator means a carboxyl group that does not form an alkali metal salt or an organic base salt in its structure, an amino group that does not form an inorganic acid salt or an organic acid salt, an oxime group, or a nitrogen-containing It is a polymerization initiator containing a polar group such as a heterocyclic group, a hydroxyl group, an amide group, an alkoxy group, and a nitrogen atom-free heterocyclic group, that is, a polar group that is not in the form of a salt.
- component (b) include one or more selected from the group consisting of thermal radical initiators and photopolymerization initiators.
- Component (b) is a nonionic photoacid generator from the viewpoint of stably forming a cured product at a low temperature.
- component (b) is a nonionic photoacid generator
- component (a) is specifically a cationic polymerizable compound.
- nonionic photoacid generators include one or more selected from the group consisting of oxime sulfonate compounds, arylsulfonate compounds and aryliodide compounds. From the viewpoint of suppressing landing deviation of droplets of the resin composition, the nonionic photoacid generator is preferably an oxime sulfonate compound.
- oxime sulfonate compounds include Irgacure250, Irgacure270, Irgacure290 (manufactured by BASF), CPI-100P, CPI-101A, CPI-200K, CPI-210S, CPI-310B, CPI-400PG (manufactured by San-Apro), SP- 150, SP-170, SP-171, SP-056, SP-066, SP-130, SP-140, SP-601, SP-606, SP-701 (manufactured by ADEKA), specific examples of iodonium compounds , PI-2074 (trade name, manufactured by Rhodia).
- the dipole moment of component (b) is preferably 0.5 or more, more preferably 0.7 or more, and still more preferably 1.0 or more. From the viewpoint of improving solubility, the dipole moment of component (b) is preferably 6.0 or less, more preferably 5.5 or less, and even more preferably 5.0 or less.
- the dipole moment of component (b) is specifically determined from the structure of each compound by A. L. Hickey, and C. N. Rowley, J. Phys. Chem. A, 2014, 118 (20) , 3678-3687 and the calculation program Gaussian09 Rev. D.01 (manufactured by Hulinks), 6-31G (d, p) and Becke's three-parameter, Lee-Yang-Parr hybrid generalization were used as the basis. Calculations are performed using time-dependent density functional theory with a family of functions known as functions.
- the content of component (b) in the resin composition is preferably 0.1 parts by mass or more, more preferably 1 part by mass or more based on 100 parts by mass of component (a). , more preferably 2 parts by mass or more, and still more preferably 3 parts by mass or more. Further, from the viewpoint of suppressing coloring of the resin composition, the content of component (b) in the resin composition is preferably 10 parts by mass or less, more preferably 8 parts by mass per 100 parts by mass of component (a). It is not more than 7 parts by mass, more preferably not more than 7 parts by mass.
- Component (c) is a solvent.
- the resin composition preferably does not contain the component (c), or when the resin composition contains a solvent is more than 0% by mass, and is 0.05% by mass or less, more preferably 0.03% by mass or less.
- a specific embodiment in which the resin composition does not contain a solvent includes one in which no solvent is intentionally blended during preparation of the resin composition.
- the resin composition may contain components other than components (a) to (c).
- other components include photosensitizers, leveling agents, and coupling agents such as silane coupling agents.
- the resin composition is preferably liquid from the viewpoint of suitability for ejection from an inkjet nozzle.
- the viscosity of the resin composition measured at 25° C. and 20 rpm using an E-type viscometer is preferably 1 mPa ⁇ s or more, more preferably 5 mPa, from the viewpoint of improving the effect of suppressing dripping during inkjet ejection. ⁇ s or more, more preferably 8 mPa ⁇ s or more. From the viewpoint of enabling more stable inkjet ejection, the viscosity of the resin composition is preferably 100 mPa ⁇ s or less, more preferably 50 mPa ⁇ s or less, and even more preferably 30 mPa ⁇ s or less.
- the surface tension of the resin composition from the viewpoint of suppressing excessive wetting and spreading when the resin composition is applied by the inkjet method, and from the viewpoint of easy retention of the desired thickness and pattern when applied by the inkjet method, It is preferably 20 mN/m or more, more preferably 25 mN/m or more.
- the surface tension of the resin composition is preferably 40 mN/m or less. and more preferably 35 mN/m or less.
- the surface tension of the resin composition is measured at 25° C. by the Wilhelmy method.
- the method of making the resin composition is not limited and includes, for example, mixing components (a) and (b) and optionally other components.
- a method for mixing each component for example, various known kneaders such as a planetary stirrer, homodisper, universal mixer, Banbury mixer, kneader, two-roll, three-roll, and extruder are used alone or in combination, Examples include a method of uniformly kneading under conditions such as normal temperature, heating, normal pressure, reduced pressure, increased pressure, or inert gas flow.
- the selection, combination, and compounding amount of the components (a) and (b) contained in the resin composition are required. is adjusted, the amount of component (c) is controlled, and the mixing conditions of the components are also important. More specifically, a mixture of a plurality of cationically polymerizable compounds is used as the component (a), and ultrasonic vibration is applied to a container containing the plurality of cationically polymerizable compounds to mix them in the preparation of the resin composition.
- the component (b) is added and mixed by applying ultrasonic vibration to the container to obtain a resin composition, so that the residual voltage of the resin composition is stabilized within the above range.
- the component (b) is added and mixed by applying ultrasonic vibration to the container to obtain a resin composition, so that the residual voltage of the resin composition is stabilized within the above range.
- the obtained resin composition can also be used to form a sealing material.
- the resin composition may be applied onto a substrate and dried.
- a known method such as an inkjet method, screen printing, or dispenser coating can be used for coating. Drying can be carried out by heating to a temperature at which the component (a) does not polymerize, for example.
- the shape of the sealing material to be obtained is not limited, and can be, for example, a film shape.
- the resin composition obtained in this embodiment is suitably used for encapsulating an organic EL display element. Further, by using the cured product of the resin composition obtained in this embodiment as a sealing material for an organic EL display element, a display device with excellent production stability can be obtained. A configuration example of the organic EL display device will be given below.
- FIG. 1 is a cross-sectional view showing a configuration example of an organic EL display device according to this embodiment.
- the display device 100 shown in FIG. 1 is an organic EL display device, and includes a substrate (base layer 50), an organic EL element (light emitting element 10) arranged on the base layer 50, and the light emitting element 10.
- an overlying sealing layer 22 (which may be an overcoat layer 22 or a barrier layer 22);
- the sealing layer 22 is made of a cured product of the resin composition of the present embodiment.
- FIG. 1 is a cross-sectional view showing a configuration example of an organic EL display device according to this embodiment.
- the display device 100 shown in FIG. 1 is an organic EL display device, and includes a substrate (base layer 50), an organic EL element (light emitting element 10) arranged on the base layer 50, and the light emitting element 10.
- an overlying sealing layer 22 (which may be an overcoat layer 22 or a barrier layer 22);
- the sealing layer 22 is made of a
- the display device 100 includes a barrier layer 21 (which may be the touch panel layer 21 or the surface protective layer 21) and a sealing layer 22 (which may be the touch panel layer 21 or the surface protective layer 21) as layers located on the observation side of the light emitting element 10. It has an overcoat layer 22 or a barrier layer 22 ), a planarizing layer 23 (which may be a sealing layer 23 ), and a barrier layer 24 .
- the planarization layer 23 is provided on the base layer 50 so as to cover the light emitting element 10
- the barrier layer 24 is provided on the surface of the planarization layer 23 .
- the sealing layer 22 is provided on the base layer 50 so as to cover the planarizing layer 23 and the barrier layer 24 .
- a barrier layer 21 is provided on the sealing layer 22 .
- each layer is not limited, and an appropriate configuration can be adopted based on generally known information. Moreover, such a display device 100 can be manufactured based on generally known information.
- the present invention includes the following aspects.
- An ultraviolet curable resin composition for an organic EL encapsulant comprising the following components (a) and (b), When the ultraviolet curable resin composition for an organic EL encapsulant contains the following component (c), the content of the component (c) with respect to the entire ultraviolet curable resin composition for an organic EL encapsulant 0.05% by mass or less, An ultraviolet curable resin composition for an organic EL encapsulant, wherein the residual voltage of the ultraviolet curable resin composition for an organic EL encapsulant measured by the following method is 1 V or less.
- a measurement cell is prepared in which a pair of glass substrates with transparent electrodes are arranged facing each other with a cell gap of 10 ⁇ m, and After injecting the ultraviolet curable resin composition for an organic EL sealing material and applying a voltage of 10 V for 5 ms between the pair of transparent electrodes, the residual voltage at 10 Hz is measured.
- the component (b) is a nonionic photoacid generator; Ultraviolet curable resin composition for organic EL sealing material according to . 3.
- the component (b) is one or more selected from the group consisting of oxime sulfonate compounds, aryl sulfonate compounds and aryliodide compounds; Ultraviolet curable resin composition for organic EL sealing material according to . 4.
- the component (a) is one or more selected from the group consisting of epoxy compounds and oxetane compounds. or 3.
- the component (b) is a nonionic photoradical generator; Ultraviolet curable resin composition for organic EL sealing material according to . 6. 4.
- the component (b) is one or more selected from the group consisting of acyloxine phosphide compounds, oxime ester compounds, alkylphenone compounds and benzophenone derivatives; Ultraviolet curable resin composition for organic EL sealing material according to . 7.
- the component (a) is a compound containing a (meth)acryloyl group; or 6.
- Ultraviolet curable resin composition for organic EL sealing material according to . 8. 1 wherein the content of the component (b) in the ultraviolet curable resin composition for an organic EL sealing material is 0.1 parts by mass or more and 10 parts by mass or less with respect to 100 parts by mass of the component (a); . to 7.
- Polymerizable compound 1 1,9-ND-A, manufactured by Shin-Nakamura Chemical Co., Ltd., 1,9-nonanediol diacrylate
- bifunctional polymerizable compound 2 DCP, manufactured by Shin-Nakamura Chemical Co., Ltd., tricyclodecanedimethanol Dimethacrylate
- bifunctional polymerizable compound 3 M-600A, manufactured by Kyoeisha Chemical Co., Ltd., 2-hydroxy-3-phenoxypropyl acrylate
- monofunctional polymerizable compound 4 PO-A, manufactured by Kyoeisha Chemical Co., Ltd., phenoxyethyl acrylate
- 1 Functional polymerizable compound 5 TMPT, manufactured by Shin-Nakamura Chemical Co., Ltd., trimethylolpropane trimethacrylate
- Nonionic polymerization initiator 1 nonionic photoradical generator
- TPO nonionic polymerization initiator 1
- NCI-831 manufactured by ADEKA
- Nonionic polymerization initiator 3 nonionic photoacid generator
- SP-601 manufactured by ADEKA
- Compound (b) nonionic polymerization initiator 4 nonionic photoacid generator: SP-606, manufactured by ADEKA
- compound ionic polymerization initiator 1 (ionic photoacid generator) represented by the following general formula (14)
- R 11 is hydrogen, a halogen atom or an alkyl group.
- R 12 is hydrogen, a halogen atom or an alkyl group. Both R 11 and R 12 were set to H in the calculation of the dipole moment, which will be described later.
- Nonionic polymerization initiator 1 Nonionic photoradical generator
- nonionic polymerization initiator 3 nonionic photoacid generator
- nonionic polymerization initiator 4 nonionic photoacid generator
- ionic polymerization initiator 3 ionic photoacid generator
- Examples 1 and 2 Comparative Examples 1 to 6
- Each component was blended so as to have the blending composition shown in Table 1 to obtain a resin composition that is a liquid composition containing no solvent.
- a polymerizable compound is put in a flask, and an ultrasonic wave is placed in the flask under the conditions of an ultrasonic frequency of 40 kHz and an ultrasonic output of 35 W while cooling to 30 ° C. or less under N 2 .
- Mixing and degassing were performed by applying sonic vibration.
- the amount of polymerization initiator shown in Table 1 was added to the flask, and the flask was sonicated under the conditions of an ultrasonic frequency of 40 kHz and an ultrasonic output of 35 W while cooling to 30°C or less under N 2 . Vibration was applied to mix and deaerate to obtain a resin composition.
- the physical properties of the resin composition obtained in each example or its cured product were measured by the following methods. The measurement results are also shown in Table 1.
- the viscosity of the obtained curable composition was measured at 25° C. and 20 rpm using an E-type viscometer (LV DV-II+ Pro, manufactured by BROOKFIELD).
- the residual voltage in the resin composition obtained in each example was measured and judged by the following method.
- a measurement cell manufactured by EHC, KSSZ-10/B111M1NSS05 (no alignment film, no rubbing, cell gap: 10 ⁇ m, B type, display electrode size: 10 mm ⁇ 10 mm, glass thickness: 1.1 mm, glass material: Borosilicate glass (non-alkali type), ITO resistance value: 100 ⁇ or less, Film thickness: 200 to 400 ⁇ , No insulation treatment on ITO surface, Seal shape: Open type, Seal material: Epoxy resin, Cell gap tolerance ⁇ 0.5 ⁇ m ) was used to inject the resin composition into the cell gap.
- Residual voltage is 1 V or less
- Residual voltage is over 1 V
- a polypropylene (PP) plate (PPN-050501 (product name, etc.), manufactured by AS ONE, 495 ⁇ 495 ⁇ 1 mm) was coated with 3.5 pL of inkjet droplets in a grid pattern at intervals of 120 ⁇ m in both the X and Y directions. Coating was performed using an inkjet device DMP-2831 and a 10 pL nozzle. The temperature was 25° C. and the humidity was 100 ppm.
- the coated PP plate was observed with an image observation device attached to the inkjet device DMP-2831 to evaluate the dispersion of droplet impact. Evaluation criteria are shown below.
- ⁇ Application position deviation from grid-like pattern is less than 60 ⁇ m for all droplets
- ⁇ Droplets with coating position deviation from grid-like pattern of 60 ⁇ m or more exist
- Cellotape (trademark, manufactured by Nichiban Co., Ltd.) was attached to the resulting cured product with a length of 150 mm, and one end of the tape was fixed to a load cell of a 210 type universal testing machine (manufactured by Intesco Co., Ltd.) with a load capacity of 50 N. The side glass was fixed to the bottom cell. At this time, the state in which the sample was attached and the tape was loose was defined as 0 mN, and the tape was pulled in the direction of 180 degrees toward the glass side at 23° C. and 10 mm/sec, and the average value of the load was evaluated. If the adhesive strength was 1.0 N/mm or more, it was determined that the adhesive strength was sufficient and suitable as a sealing material.
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Abstract
Description
そこで、本発明は、有機EL封止材に用いる樹脂組成物をインクジェットノズルから吐出する際の着弾位置のずれを抑制するとともに、硬化物の接着強度に優れる樹脂組成物を得る技術を提供する。
[1] 以下の成分(a)および(b)を含む、有機EL封止材用紫外線硬化性樹脂組成物であって、
当該有機EL封止材用紫外線硬化性樹脂組成物が以下の成分(c)を含むとき、前記成分(c)の含有量が当該有機EL封止材用紫外線硬化性樹脂組成物全体に対して0.05質量%以下であり、
以下の方法で測定される当該有機EL封止材用紫外線硬化性樹脂組成物の残留電圧が1V以下である、有機EL封止材用紫外線硬化性樹脂組成物。
(a)エポキシ化合物およびオキセタン化合物からなる群から選択される1種以上の重合性化合物
(b)非イオン性重合開始剤
(c)溶剤
(方法)一対の透明電極付きガラス基板がセルギャップを10μmとして対向配置されている測定セルを準備し、前記セルギャップに当該有機EL封止材用紫外線硬化性樹脂組成物を注入し、前記一対の透明電極間に、10Vの電圧を5msの間印加した後、10Hzでの前記残留電圧を測定する。
[2] 前記残留電圧が0.2V以上である、[1]に記載の有機EL封止材用紫外線硬化性樹脂組成物。
[3] 表面張力が20mN/m以上40mN/m以下である、[1]または[2]に記載の有機EL封止材用紫外線硬化性樹脂組成物。
[4] 前記成分(b)が、非イオン性光酸発生剤である、[1]乃至[3]いずれか一つに記載の有機EL封止材用紫外線硬化性樹脂組成物。
[5] 前記成分(b)の双極子モーメントが0.5以上6.0以下である、[1]乃至[4]いずれか一つに記載の有機EL封止材用紫外線硬化性樹脂組成物。
[6] 前記成分(b)が、オキシムスルホネート化合物、アリールスルホネート化合物およびアリールヨーダイド化合物からなる群から選択される1種または2種以上である、[1]乃至[5]いずれか一つに記載の有機EL封止材用紫外線硬化性樹脂組成物。
[7] 当該有機EL封止材用紫外線硬化性樹脂組成物中の前記成分(b)の含有量が、前記成分(a)100質量部に対して0.1質量部以上10質量部以下である、[1]乃至[6]いずれか1つに記載の有機EL封止材用紫外線硬化性樹脂組成物。
[8] インクジェット法による塗布に用いられる、[1]乃至[7]いずれか1つに記載の有機EL封止材用紫外線硬化性樹脂組成物。
[9] 湿度が100ppm以下である環境下における前記塗布に用いられる、[8]に記載の有機EL封止材用紫外線硬化性樹脂組成物。
本実施形態において、有機EL封止材用紫外線硬化性樹脂組成物(以下、適宜単に「樹脂組成物」とも呼ぶ。)は、有機EL素子の封止材料として用いられる組成物であって、以下の成分(a)および(b)を含み、樹脂組成物が以下の成分(c)を含むとき、成分(c)の含有量が樹脂組成物全体に対して0.05質量%以下である。そして、以下の方法で測定される樹脂組成物の残留電圧が1V以下である。
(a)エポキシ化合物およびオキセタン化合物からなる群から選択される1種以上の重合性化合物
(b)非イオン性重合開始剤
(c)溶剤
(方法)一対の透明電極付きガラス基板がセルギャップを10μmとして対向配置されている測定セルを準備し、セルギャップに樹脂組成物を注入し、一対の透明電極間に、10Vの電圧を5msの間印加した後、10Hzでの残留電圧を測定する。
樹脂組成物を上記構成とすることにより、液滴の着弾ずれが抑制される理由は必ずしも明らかではないが、樹脂組成物と、インクジェットノズル内壁および液滴の着弾面との静電的な相互作用がより好ましいものとなることが考えられる。
すなわち、本発明者らは、液滴の着弾ずれを抑制するための設計指針として、新たに、残留電圧という尺度に着目した。そして、残留電圧が大きい場合は、樹脂組成物が帯電した後の残存率が高く、樹脂組成物がより帯電しやすい性質を有することから、樹脂組成物の帯電のしやすさにより、樹脂組成物とインクジェットノズル内壁および液滴の着弾面との相互作用の程度が変化すると考えた。
そして、本発明者らがさらに鋭意検討を重ねた結果、樹脂組成物の配合成分および残留電圧をそれぞれ上述の構成とすることにより、液滴の着弾ずれを効果的に抑制できること、および、硬化物の接着強度に優れる樹脂組成物が得られることを見出して本発明を完成するに至った。
本実施形態における樹脂組成物は、インクジェット塗布用の組成物であり、好ましくは湿度が100ppm以下である環境下におけるインクジェット塗布用である。すなわち、本実施形態における樹脂組成物は、インクジェット法による塗布に好適に用いられ、低湿度下における塗布により好適に用いられる。
最新の有機EL素子は水分に対する耐性が低くなる傾向があるため、低湿度下で有機EL封止材用紫外線硬化性樹脂組成物を塗布することも検討されている。本発明者らは、低湿度下で有機EL封止材用紫外線硬化性樹脂組成物を塗布する際に、着弾の位置ずれが顕著になること、ならびに、有機EL封止材用紫外線硬化性樹脂組成物に含まれる成分(a)の重合性化合物がエポキシ化合物およびオキセタン化合物からなる群から選択される1種以上であるときに上記位置ずれがより顕著であることを見出した。
また、樹脂組成物の残留電圧は、0V以上であり、また、たとえば0.01V以上または0.1V以上であってもよい。樹脂組成物の残留電圧は、インクジェット法による塗布により好適に用いる観点から、具体的にはインクジェットノズルから吐出する際の樹脂組成物の形状を安定化させるなどの観点等から、好ましくは0.2V以上であり、より好ましくは0.25V以上である。
1.一対の透明電極付きガラス基板が、セルギャップを10μmとして対向配置されている測定セルを準備する。透明電極は、具体的にはITO電極であり、上記測定セルとして、具体的にはEHC社製、KSSZ-10/B111M1NSS05(配向膜無し、ラビング無し、セルギャップ:10μm、Bタイプ、表示電極サイズ:10mm×10mm、ガラスの厚さ:1.1mm、ガラスの材質:ボロシリケートガラス(無アルカリタイプ)、ITO抵抗値:100Ω以下、膜厚:200~400Å、ITO面絶縁処理無し、シールの形状:オープンタイプ、シールの材質:エポキシ樹脂、セルギャップ公差±0.5μm)を用いる。
2.上記1.の測定セルのセルギャップに樹脂組成物を注入する。
3.測定セルの透明電極間に、10Vの電圧を5msの間印加した後、10Hzでの残留電圧すなわち上記印加後100ミリ秒経過後の残留電圧を測定する。
成分(a)は、重合性化合物である。成分(a)は、具体的には、エポキシ基、オキセタニル基、ビニルエーテル基等のカチオン重合性の官能基を有する化合物(以下、「カチオン重合性化合物」とも呼ぶ。)が挙げられる。
成分(a)は、樹脂組成物の液滴の着弾ずれを抑制する観点、および、硬化物の接着強度向上の観点から、好ましくはエポキシ化合物およびオキセタン化合物からなる群から選択される1種以上である。
エポキシ化合物は、一分子中に1または2以上のエポキシ基を有する化合物であり、具体的には、モノエポキシ化合物、2官能エポキシ化合物、3官能以上のエポキシ化合物が挙げられる。
樹脂組成物の液滴の着弾ずれを抑制する観点から、エポキシ化合物は2官能エポキシ化合物を含み、より好ましくは1種または2種以上の2官能エポキシ化合物であり、より好ましくは2種以上の2官能エポキシ化合物である。
脂環式エポキシ化合物は、分子中に脂環式炭化水素構造およびエポキシ基をそれぞれ1つ以上有する化合物であればよい。脂環式エポキシ化合物は、分子内に1つのエポキシ基を有しても2以上のエポキシ基を有してもよいが、樹脂組成物の硬化性を高める観点から、好ましくは2以上のエポキシ基を有する。
ここで、シクロアルケンオキサイド構造とは、シクロアルケンを過酸化物などの酸化剤でエポキシ化して得られる構造であり、脂肪族環を構成する隣接する2つの炭素原子と酸素原子とで構成されるエポキシ基である。シクロアルケンオキサイドは、たとえばシクロヘキセンオキサイド、シクロペンテンオキサイドであり、好ましくはシクロヘキセンオキサイドである。
このうち、炭素数が1~18のアルキレン基の具体例として、メチレン基、メチルメチレン基、ジメチルメチレン基、エチレン基、プロピレン基、トリメチレン基が挙げられる。
また、2価の脂環式炭化水素基の具体例として、1,2-シクロペンチレン基、1,3-シクロペンチレン基、シクロペンチリデン基、1,2-シクロヘキシレン基、1,3-シクロヘキシレン基、1,4-シクロヘキシレン基、シクロヘキシリデン基等の2価のシクロアルキレン基(シクロアルキリデン基を含む)が挙げられる。
同様の観点から、酸素原子を有する連結基は、好ましくは、-CO-(カルボニル基)、-O-CO-O-(カーボネート基)、-COO-(エステル基)、-O-(エーテル基)、-CONH-(アミド基)、これらの基が複数連結した基、またはこれらの基の1以上と2価の炭化水素基の1以上とが連結した基である。
樹脂組成物の液滴の着弾ずれを抑制する観点から、エポキシ樹脂は、好ましくは脂環式エポキシ化合物および脂肪族エポキシ化合物を含む。
また、伸長反応速度を高める観点から、カチオン重合性化合物中のエポキシ化合物の含有量は、カチオン重合性化合物全体を100質量部としたとき、たとえば100質量部以下であり、好ましくは80質量部以下、より好ましくは70質量部以下、さらに好ましくは60質量部以下である。
オキセタン化合物は、一分子中に1または2以上のオキセタニル基を有する化合物であり、具体的には、モノオキセタン化合物、2官能オキセタン化合物、3官能以上のオキセタン化合物が挙げられる。樹脂組成物の液滴の着弾ずれを抑制する観点から、オキセタン化合物は好ましくは2官能オキセタン化合物である。
また、一般式(2)におけるsおよび一般式(3)におけるtは、それぞれ1以上5以下の整数を表す。R1aまたはR1bが一分子中に複数含まれる場合、これらは同一であってもよく、異なっていてもよい。また、隣り合うR1aどうし、もしくは隣り合うR1bどうしが環構造を形成していてもよい。
アリール基の例として、具体的には、フェニル基、ナフチル基、トリル基、キシリル基が挙げられる。
アラルキル基として、具体的には、ベンジル基、フェネチル基が挙げられる。
また、R4は、炭素原子数1~6のアルキレン基またはアリーレン基である。炭素原子数1~6のアルキレン基として、具体的には、メチレン基、エチレン基、プロピレン基、ブチレン基、シクロヘキシレン基が挙げられる。
また、同様の観点から、カチオン重合性化合物中のオキセタン化合物の含有量は、カチオン重合性化合物全体を100質量部としたとき、たとえば100質量部以下であり、好ましくは80質量部以下、より好ましくは70質量部以下、さらに好ましくは60質量部以下である。
また、樹脂組成物の液滴の着弾ずれを抑制する観点から、樹脂組成物中の成分(a)の含有量は、樹脂組成物の全組成に対し、好ましくは99.9質量%以下であり、より好ましくは99.5質量%以下、さらに好ましくは99質量%以下である。
成分(b)は、非イオン性重合開始剤である。ここで、非イオン性重合開始剤とは、構造中にアルカリ金属塩または有機塩基塩を形成していないカルボキシル基、無機酸塩または有機酸塩を形成していないアミノ基、オキシム基または含窒素複素環基、水酸基、アミド基、アルコキシ基、窒素原子を含まない複素環基などの極性基、すなわち塩となっていない極性基を含有する重合開始剤である。成分(b)の具体例として、熱ラジカル開始剤および光重合開始剤からなる群から選択される1種以上が挙げられる。低温で安定的に硬化物を形成する観点から、成分(b)は、非イオン性光酸発生剤である。
成分(b)が非イオン性光酸発生剤であるとき、成分(a)は具体的にはカチオン重合性化合物である。
非イオン性光酸発生剤の具体例として、オキシムスルホネート化合物、アリールスルホネート化合物およびアリールヨーダイド化合物からなる群から選択される1種または2種以上が挙げられる。
樹脂組成物の液滴の着弾ずれを抑制する観点から、非イオン性光酸発生剤は好ましくはオキシムスルホネート化合物である。
また、溶解性向上の観点から、成分(b)の双極子モーメントは、好ましくは6.0以下であり、より好ましくは5.5以下、さらに好ましくは5.0以下である。
また、樹脂組成物の着色を抑制する観点から、樹脂組成物中の成分(b)の含有量は、成分(a)100質量部に対して好ましくは10質量部以下であり、より好ましくは8質量部以下、さらに好ましくは7質量部以下である。
成分(c)は、溶剤である。
樹脂組成物の液滴の着弾ずれを抑制する観点から、本実施形態において、樹脂組成物は、好ましくは成分(c)を含有しないものであり、または、樹脂組成物が溶剤を含むときの溶剤の含有量は0質量%超であり、また、0.05質量%以下であり、より好ましくは0.03質量%以下である。樹脂組成物が溶剤を含有しないものである具体的な態様として、樹脂組成物の調製時に溶剤が意図的に配合されないものが挙げられる。
他の成分の例として、光増感剤、レベリング剤、シランカップリング剤等のカップリング剤が挙げられる。
E型粘度計を用いて25℃、20rpmにて測定される樹脂組成物の粘度は、インクジェット吐出時の液だれの抑制効果向上の観点から、好ましくは1mPa・s以上であり、より好ましくは5mPa・s以上、さらに好ましくは8mPa・s以上である。
また、より安定的なインクジェット吐出が可能になる観点から、樹脂組成物の上記粘度は、好ましくは100mPa・s以下であり、より好ましくは50mPa・s以下、さらに好ましくは30mPa・s以下である。
また、樹脂組成物をインクジェット法で塗布した際のレビリングを抑制する観点、および、半導体回路基板の回路等の被覆ムラを抑制する観点から、樹脂組成物の表面張力は、好ましくは40mN/m以下であり、より好ましくは35mN/m以下である。
ここで、樹脂組成物の表面張力は、25℃、Wilhelmy法により測定される。
樹脂組成物の製造方法は限定されず、たとえば、成分(a)および(b)ならびに適宜その他の成分を混合することを含む。各成分を混合する方法として、たとえば、遊星式撹拌装置、ホモディスパー、万能ミキサー、バンバリーミキサー、ニーダー、2本ロール、3本ロール、押出機等の公知の各種混練機を単独または併用して、常温下または加熱下で、常圧下、減圧下、加圧下または不活性ガス気流下等の条件下で均一に混練する方法が挙げられる。
また、本実施形態に得られる樹脂組成物の硬化物を有機EL表示素子の封止材料として用いることにより、製造安定性に優れる表示装置を得ることができる。
以下、有機EL表示装置の構成例を挙げる。
本実施形態において、有機EL表示装置は、樹脂組成物の硬化物に構成された層を有する。
図1は、本実施形態における有機EL表示装置の構成例を示す断面図である。図1に示した表示装置100は、有機EL表示装置であって、基板(基材層50)と、基材層50上に配置された有機EL素子(発光素子10)と、発光素子10を被覆する封止層22(オーバーコート層22またはバリア性層22であってもよい)と、を含む。そして、たとえば封止層22が、本実施形態における樹脂組成物の硬化物により構成されている。
また、図1においては、表示装置100が、発光素子10よりも観察側に位置する層として、バリア性層21(タッチパネル層21または表面保護層21であってもよい)、封止層22(オーバーコート層22またはバリア性層22であってもよい)、平坦化層23(封止層23であってもよい)、バリア性層24を有している。平坦化層23は、発光素子10を覆うように基材層50上に設けられており、バリア性層24は、平坦化層23の表面に設けられている。封止層22は、平坦化層23およびバリア性層24を覆うように基材層50上に設けられている。また、封止層22上にバリア性層21が設けられている。
1. 以下の成分(a)および(b)を含む、有機EL封止材用紫外線硬化性樹脂組成物であって、
当該有機EL封止材用紫外線硬化性樹脂組成物が以下の成分(c)を含むとき、前記成分(c)の含有量が当該有機EL封止材用紫外線硬化性樹脂組成物全体に対して0.05質量%以下であり、
以下の方法で測定される当該有機EL封止材用紫外線硬化性樹脂組成物の残留電圧が1V以下である、有機EL封止材用紫外線硬化性樹脂組成物。
(a)重合性化合物
(b)非イオン性重合開始剤
(c)溶剤
(方法)一対の透明電極付きガラス基板がセルギャップを10μmとして対向配置されている測定セルを準備し、前記セルギャップに当該有機EL封止材用紫外線硬化性樹脂組成物を注入し、前記一対の透明電極間に、10Vの電圧を5msの間印加した後、10Hzでの前記残留電圧を測定する。
2. 前記成分(b)が、非イオン性光酸発生剤である、1.に記載の有機EL封止材用紫外線硬化性樹脂組成物。
3. 前記成分(b)が、オキシムスルホネート化合物、アリールスルホネート化合物およびアリールヨーダイド化合物からなる群から選択される1種または2種以上である、2.に記載の有機EL封止材用紫外線硬化性樹脂組成物。
4. 前記成分(a)が、エポキシ化合物およびオキセタン化合物からなる群から選択される1種以上である、2.または3.に記載の有機EL封止材用紫外線硬化性樹脂組成物。
5. 前記成分(b)が、非イオン性光ラジカル発生剤である、1.に記載の有機EL封止材用紫外線硬化性樹脂組成物。
6. 前記成分(b)が、アシルオキシンホスフィド化合物、オキシムエステル化合物、アルキルフェノン化合物およびベンゾフェノン誘導体からなる群から選択される1種または2種以上である、5.に記載の有機EL封止材用紫外線硬化性樹脂組成物。
7. 前記成分(a)が、(メタ)アクリロイル基を含む化合物である、5.または6.に記載の有機EL封止材用紫外線硬化性樹脂組成物。
8. 当該有機EL封止材用紫外線硬化性樹脂組成物中の前記成分(b)の含有量が、前記成分(a)100質量部に対して0.1質量部以上10質量部以下である、1.乃至7.いずれか1つに記載の有機EL封止材用紫外線硬化性樹脂組成物。
9. インクジェット法による塗布に用いられる、1.乃至8.いずれか1つに記載の有機EL封止材用紫外線硬化性樹脂組成物。
(重合性化合物)
重合性化合物1:1,9-ND-A、新中村化学工業社製、1,9-ノナンジオールジアクリレート、2官能
重合性化合物2:DCP、新中村化学工業社製、トリシクロデカンジメタノールジメタクリレート、2官能
重合性化合物3:M-600A、共栄社化学社製、2-ヒドロキシ-3-フェノキシプロピルアクリレート、1官能
重合性化合物4:PO-A、共栄社化学社製、フェノキシエチルアクリレート、1官能
重合性化合物5:TMPT、新中村化学工業社製、トリメチロールプロパントリメタクリレート、3官能
(a)重合性化合物6:CEL8010、ダイセル社製、下記式(11)に示す脂環式エポキシ化合物(4,4'-ビス(1,2-エポキシシクロヘキサン))、2官能
(a)重合性化合物7:SR-NPG、阪本薬品工業社製、ネオペンチルグリコールジグリシジルエーテル、脂肪族エポキシ化合物、2官能
(a)重合性化合物8:OXT-221、東亞合成社製、下記式(12)に示すオキセタン化合物(3-エチル-3{〔(3-エチルオキセタン-3-イル)メトキシ〕メチル}オキセタン)、2官能
(b)非イオン性重合開始剤1(非イオン性光ラジカル発生剤):TPO、IGM Resins社製、2,4,6-トリメチルベンゾイル-ジフェニルホスフィンオキサイド
(b)非イオン性重合開始剤2(非イオン性光ラジカル発生剤):NCI-831、ADEKA社製
(b)非イオン性重合開始剤3(非イオン性光酸発生剤):SP-601、ADEKA社製、下記一般式(13)に示す化合物
(b)非イオン性重合開始剤4(非イオン性光酸発生剤):SP-606、ADEKA社製、下記一般式(14)に示す化合物
イオン性重合開始剤1(イオン性光酸発生剤):CPI-200K、サンアプロ社製
イオン性重合開始剤2(イオン性光酸発生剤):CPI-310B、サンアプロ社製
イオン性重合開始剤3(イオン性光酸発生剤):Irgacure 290、BASF社製
非イオン性重合開始剤1(非イオン性光ラジカル発生剤)、非イオン性重合開始剤3(非イオン性光酸発生剤)および非イオン性重合開始剤4(非イオン性光酸発生剤)ならびにイオン性重合開始剤3(イオン性光酸発生剤)について、各化合物の構造からA. L. Hickey, and C. N. Rowley, J. Phys. Chem. A, 2014, 118 (20), 3678-3687に記載の方法および計算プログラムGaussian09 Rev. D.01(ヒューリンクス社製)を用い、基底として、6-31G(d、p)、およびベッケの3パラメータ、Lee-Yang-Parrハイブリッド汎関数として知られている関数群を用いた時間依存的な密度汎関数理論にて配座探索の後、最安定構造で双極子モーメントを算出した。算出に際し、化合物またはイオンの構造は以下の構造1~4とし、R=Hとして計算した。
表1に示した配合組成となるように各成分を配合し、液状で溶剤を含まない組成物である樹脂組成物を得た。具体的には、表1に記載の成分のうち、重合性化合物をフラスコに入れ、N2下、30℃以下に冷却しながら40kHzの超音波周波数、35Wの超音波出力の条件でフラスコに超音波振動を加えて混合・脱気した。次に、上記フラスコに、表1に示される量の重合開始剤を加え、N2下、30℃以下に冷却しながら40kHzの超音波周波数、35Wの超音波出力の条件にてフラスコに超音波振動を加えて混合・脱気し、樹脂組成物を得た。
各例で得られた樹脂組成物またはその硬化物の物性を以下の方法で測定した。測定結果を表1にあわせて示す。
一部の実施例について、得られた硬化性組成物の粘度を、E型粘度計(LV DV-II+ Pro、BROOKFIELD社製)を用いて25℃、20rpmにて測定した。
各例で得られた硬化性組成物の表面張力を、25℃の環境下において、Wilhelmy法、協和界面科学社製CBVP-Zを用い、白金プレートを使用して測定した。
各例で得られた樹脂組成物における残留電圧を以下の方法で測定し、判定した。
測定セルとして、EHC社製、KSSZ-10/B111M1NSS05(配向膜無し、ラビング無し、セルギャップ:10μm、Bタイプ、表示電極サイズ:10mm×10mm、ガラスの厚さ:1.1mm、ガラスの材質:ボロシリケートガラス(無アルカリタイプ)、ITO抵抗値:100Ω以下、膜厚:200~400Å、ITO面絶縁処理無し、シールの形状:オープンタイプ、シールの材質:エポキシ樹脂、セルギャップ公差±0.5μm)を用い、セルギャップに樹脂組成物を注入した。
そして、測定セルの透明電極間に、10Vの電圧を5msの間印加し、100ミリ秒経過後、すなわち10Hzでの残留電圧を測定した。残留電圧の判定基準を以下に示す。
○:残留電圧が1V以下
×:残留電圧が1V超
ポリプロピレン(PP)板(アズワン社製、PPN-050501(製品名等)、495×495×1mm)に対し、3.5pLのインクジェット液滴をX、Y方向ともに120μm間隔で格子状に塗布した。
塗布は、インクジェット装置DMP-2831、10pLノズルを用いておこなった。25℃、湿度100ppmとした。
○:格子状のパターンからの塗布位置ズレが、すべての液滴について60μm未満
×:格子状のパターンからの塗布位置ズレが60μm以上の液滴が存在
無アルカリガラス(Eagle XG)コーニング社製 70mm×70mm、厚さ0.5mm上にインクジェット液滴を1mL滴下し、スピンコーター(ミカサ社製)で500rpmにて30秒回転させた。その後、窒素雰囲気下波長395nmのUV-LEDで照度1000mW/cm2、積算光量1500mJ・cm2にて硬化して、厚み10μmの硬化物を得た。得られた硬化物にセロテープ(商標、ニチバン社製)を150mmの長さで貼り付け、上記テープの一端を210型万能試験機(インテスコ社製)の載荷容量50Nのロードセルに固定し、さらに反対側のガラスを下側のセルに固定した。この時試料を取り付けてテープが緩んでいる状態を0mNと規定し、23℃、10mm/秒にてテープをガラス側に180度方向に引っ張り、荷重の平均値を評価した。接着強度が1.0N/mm以上であれば、十分な接着強度があり、封止材として適していると判断した。
21 バリア性層、タッチパネル層または表面保護層
22 封止層、オーバーコート層、またはバリア性層
23 平坦化層または封止層
24 バリア性層
50 基材層
100 表示装置
Claims (9)
- 以下の成分(a)および(b)を含む、有機EL封止材用紫外線硬化性樹脂組成物であって、
当該有機EL封止材用紫外線硬化性樹脂組成物が以下の成分(c)を含むとき、前記成分(c)の含有量が当該有機EL封止材用紫外線硬化性樹脂組成物全体に対して0.05質量%以下であり、
以下の方法で測定される当該有機EL封止材用紫外線硬化性樹脂組成物の残留電圧が1V以下である、有機EL封止材用紫外線硬化性樹脂組成物。
(a)エポキシ化合物およびオキセタン化合物からなる群から選択される1種以上の重合性化合物
(b)非イオン性重合開始剤
(c)溶剤
(方法)一対の透明電極付きガラス基板がセルギャップを10μmとして対向配置されている測定セルを準備し、前記セルギャップに当該有機EL封止材用紫外線硬化性樹脂組成物を注入し、前記一対の透明電極間に、10Vの電圧を5msの間印加した後、10Hzでの前記残留電圧を測定する。 - 前記残留電圧が0.2V以上である、請求項1に記載の有機EL封止材用紫外線硬化性樹脂組成物。
- 表面張力が20mN/m以上40mN/m以下である、請求項1または2に記載の有機EL封止材用紫外線硬化性樹脂組成物。
- 前記成分(b)が、非イオン性光酸発生剤である、請求項1乃至3いずれか一項に記載の有機EL封止材用紫外線硬化性樹脂組成物。
- 前記成分(b)の双極子モーメントが0.5以上6.0以下である、請求項1乃至4いずれか一項に記載の有機EL封止材用紫外線硬化性樹脂組成物。
- 前記成分(b)が、オキシムスルホネート化合物、アリールスルホネート化合物およびアリールヨーダイド化合物からなる群から選択される1種または2種以上である、請求項1乃至5いずれか一項に記載の有機EL封止材用紫外線硬化性樹脂組成物。
- 当該有機EL封止材用紫外線硬化性樹脂組成物中の前記成分(b)の含有量が、前記成分(a)100質量部に対して0.1質量部以上10質量部以下である、請求項1乃至6いずれか1項に記載の有機EL封止材用紫外線硬化性樹脂組成物。
- インクジェット法による塗布に用いられる、請求項1乃至7いずれか1項に記載の有機EL封止材用紫外線硬化性樹脂組成物。
- 湿度が100ppm以下である環境下における前記塗布に用いられる、請求項8に記載の有機EL封止材用紫外線硬化性樹脂組成物。
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