WO2022047947A1 - 一种多辊式真空镀膜装置 - Google Patents

一种多辊式真空镀膜装置 Download PDF

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WO2022047947A1
WO2022047947A1 PCT/CN2020/123849 CN2020123849W WO2022047947A1 WO 2022047947 A1 WO2022047947 A1 WO 2022047947A1 CN 2020123849 W CN2020123849 W CN 2020123849W WO 2022047947 A1 WO2022047947 A1 WO 2022047947A1
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evaporation
coating device
roller
rollers
vacuum coating
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PCT/CN2020/123849
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English (en)
French (fr)
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贾孟
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昆山鑫美源电子科技有限公司
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Publication of WO2022047947A1 publication Critical patent/WO2022047947A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Definitions

  • the utility model relates to the technical field of vacuum evaporation, in particular to a multi-roller type vacuum coating device.
  • Vacuum evaporation refers to a process in which the base material is evaporated and vaporized by a certain heating evaporation method under vacuum conditions, and the particles fly to the surface of the substrate to condense and form a film.
  • the working principle of the vacuum evaporation device is that when the flexible film is coated, the front side of the flexible film at the same position is coated by the evaporation mechanism, and the back side is closely attached to the cooling roller for cooling.
  • the utility model provides a multi-roller vacuum coating device.
  • a multi-roller type vacuum coating device includes an unwinding mechanism, a coating mechanism and a winding mechanism.
  • the unwinding mechanism, the coating mechanism and the winding mechanism are arranged in sequence, and the coating mechanism is provided with a number of cooling rollers, a number of power flattening rollers and a number of Evaporation components, a number of evaporation components are respectively located under a number of cooling rollers, and a number of cooling rollers and a number of power flattening rollers are arranged in sequence.
  • the utility model splits the cooling roller and the evaporating component into a plurality of parts, and the substrate to be plated passes through the cooling rollers in turn, so that the substrate to be plated is cooled and coated for multiple times, the cooling effect of the vacuum coating device is improved, and the occurrence of bubbles on the substrate is avoided. , substrate wrinkling, pinholes and other problems, optimize product quality.
  • the coating mechanism is also provided with a number of over-rollers, and a number of over-rollers are respectively arranged on both sides of a number of cooling rollers and a number of power flattening rollers.
  • over-rollers are arranged in the coating mechanism, and several over-rollers are respectively arranged on both sides of several cooling rollers and several power flattening rollers, which can prevent the substrate from wrinkling during the coating process and improve the working efficiency of the coating device.
  • the coating mechanism is also provided with several driving motors, and several driving motors are rotatably connected with several power flattening rollers.
  • the coating mechanism is provided with a plurality of driving motors, and the driving motors are rotatably connected with the power flattening rollers, which can prevent the substrate from breaking during the film running process and ensure that the coating device can run stably.
  • an ozone hole is also provided below the first cooling roller in the coating mechanism.
  • ozone is supplied to the bottom of the first cooling roller through the ozone hole to form an oxidized metal layer on the surface of the substrate, which is beneficial to improve the adhesion between the subsequent coating layer and the substrate.
  • partitions are also provided between several evaporation assemblies.
  • the unwinding mechanism includes an unwinding shaft and an unwinding motor, and the unwinding motor is rotatably connected with the unwinding shaft.
  • the setting of the unwinding mechanism Through the setting of the unwinding mechanism, a long substrate can be coated at one time to improve the coating efficiency; the setting of the unwinding motor can facilitate the adjustment of the film running speed of the vacuum coating device, so as to prevent the substrate from wrinkling and affecting the coating effect.
  • the winding mechanism includes a winding shaft and a winding motor, and the winding motor is rotatably connected with the winding shaft.
  • the setting of the rewinding mechanism Through the setting of the rewinding mechanism, long substrates can be coated at one time, thereby improving the coating efficiency; the setting of the rewinding motor can be easily matched with the unwinding motor and the power flattening roller, and the tension and film running speed can be adjusted at any time. , to avoid the wrinkling of the substrate to affect the coating effect.
  • the evaporation component adopts resistance evaporation, intermediate frequency induction crucible evaporation or electron beam evaporation.
  • the use of resistance evaporation, intermediate frequency induction crucible evaporation or electron beam evaporation can improve the evaporation effect of the evaporation component, thereby improving the product quality rate.
  • the evaporation assembly is provided with a movable cover plate for adjusting the opening range of the evaporation assembly.
  • the coating amount can be adjusted and the product quality rate can be improved.
  • the evaporation assembly is also provided with a lift adjustment mechanism for adjusting the distance between the evaporation assembly and the cooling roller.
  • the distance between the evaporation assembly and the cooling roller can be adjusted, so as to control and adjust the coating effects such as film thickness.
  • the beneficial effects of the vacuum coating device include: by splitting the cooling roller and the evaporation component in the vacuum coating device into several, the substrate to be plated passes through the cooling rollers in sequence, so that the substrate to be plated is subjected to multiple Cooling and coating, improve the cooling effect of the vacuum coating device, improve the local deformation of the flexible film, avoid the occurrence of bubbles, wrinkling, pinholes and other problems in the substrate, and optimize the product quality.
  • Fig. 1 is the structural representation of the first embodiment of the present utility model
  • Fig. 2 is the structural representation of the second embodiment of the present utility model
  • Embodiment 3 is a schematic structural diagram of Embodiment 3 of the present utility model
  • FIG. 4 is a schematic structural diagram of Embodiment 4 of the present invention.
  • this embodiment discloses a multi-roller vacuum coating device, which includes an unwinding mechanism, a coating mechanism and a winding mechanism.
  • the unwinding mechanism, the coating mechanism and the winding mechanism are arranged in sequence.
  • the winding speed is consistent with the winding speed of the winding mechanism.
  • a number of cooling rollers 2, a number of power flattening rollers 3 and a number of evaporation assemblies 5 are arranged in the coating mechanism.
  • a number of evaporation components 5 are respectively located under a number of cooling rollers 2, and a number of cooling rollers 2 and a number of power flattening rollers 3 are arranged in sequence.
  • four sets of cooling rollers 2 and evaporating components 5 are provided, and three power flattening rollers 3 are provided;
  • the substrate 6 to be plated is manually pulled from the unwinding shaft 1 through the cooling roller 2 and the power flattening roller 3 to the winding shaft 4, and then the vacuum coating device is started, and the unwinding speed of the unwinding shaft 1 is adjusted.
  • the substrate 6 can be coated.
  • the unwinding diameter is 600 mm
  • the material of the base material 6 is PET, PI, etc.
  • the evaporation component 5 is an intermediate frequency induction crucible.
  • the main function of the cooling roller 2 is to provide cooling for the coating substrate 6, transfer the heat formed during the coating process to the outside of the equipment through the cooling roller 2, and keep the surface of the substrate 6 at a reduced temperature to complete the evaporation process.
  • the cooling roller 2 is cooled by circulating cooling liquid, the cooling temperature is between -15°C and 20°C, and the film is coated under the condition of vacuum ⁇ 6.7 ⁇ 10-2Pa, and the film running speed is 100 ⁇ 600m/min.
  • the cooling roller 2 and the evaporation assembly 5 are divided into four groups, and the substrate 6 to be plated passes through the four groups of cooling rollers 2 in turn, so that the substrate 6 to be plated is cooled and coated for multiple times, which can improve the cooling effect of the vacuum coating device , to avoid the occurrence of bubbles in the base material 6, wrinkling of the base material 6, pinholes and other problems, and optimize the product quality.
  • a plurality of pass rollers 7 are also arranged in the coating mechanism, and a plurality of pass rollers 7 are respectively arranged on a plurality of cooling rolls 2 and a plurality of power flattening rolls 3 sides.
  • the substrate 6 to be plated is manually passed from the unwinding shaft 1 through the roller 7, the cooling roller 2 and the power flattening roller 3, and pulled to the winding shaft 4, and then the vacuum coating device is started, and the unwinding shaft 1 is adjusted.
  • the unwinding speed of 1 is consistent with the winding speed of the winding shaft 4, and the coating of the substrate 6 can be carried out.
  • several pass rollers 7 are further arranged in the coating mechanism, so that the substrate 6 can be prevented from wrinkling and breaking during the coating process, and the working efficiency of the coating device can be improved.
  • the difference between this embodiment and the above-mentioned embodiment is that the ozone hole 8 is further provided under the first cooling roller 2 of the coating mechanism.
  • an ozone hole 8 is respectively provided on the left and right sides below the cooling roller 2 .
  • the ozone hole 8 provides ozone to the bottom of the first cooling roller 2 to form an oxidized metal layer on the surface of the substrate 6, which is beneficial to improve the adhesion between the subsequent coating layer and the substrate.
  • a partition plate 9 is further provided between several evaporation assemblies 5 .
  • the partitions 9 by arranging the partitions 9 on the evaporation components 5, the mutual influence of the evaporation components 5 can be avoided, thereby improving the product quality rate.
  • the coating mechanism is further provided with several driving motors, and several driving motors are rotatably connected with several power flattening rollers 3 .
  • the evaporation assembly 5 is provided with a movable cover plate for adjusting the opening range of the evaporation assembly 5 .
  • a movable cover plate By arranging a movable cover plate on the evaporation assembly 5 to control the size and range of the opening, the coating amount can be adjusted and the product quality rate can be improved.
  • the evaporation assembly 5 is further provided with a lift adjustment mechanism for adjusting the distance between the evaporation assembly 5 and the cooling roller 2 .
  • a lift adjustment mechanism for adjusting the distance between the evaporation assembly 5 and the cooling roller 2 .
  • the utility model is suitable for the vacuum evaporation coating process of relatively thin materials, such as the evaporation coating process of 2-30 ⁇ m plastic film, composite film, paper, cloth and other substrates 6 in a vacuum environment; wherein, the coating device is more suitable for 2-8 ⁇ m.
  • Evaporation coating process of plastic films such as PET, PEN, PI, PP, PE, non-woven fabrics, thin paper, etc. in a vacuum environment.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

一种多辊式真空镀膜装置，该多辊式真空镀膜装置包括放卷机构、镀膜机构以及收卷机构，放卷机构、镀膜机构及收卷机构依次排列，镀膜机构内设有若干冷却辊（2）、若干动力展平辊（3）及若干蒸发组件（5），若干蒸发组件（5）分别位于若干冷却辊（2）下方，若干冷却辊（2）与若干动力展平辊（3）依次排列。将真空镀膜装置中冷却辊（2）及蒸发组件（5）拆分为若干个，待镀基材依次通过各冷却辊（2）并针对待镀基材进行多次冷却及镀膜，从而提高真空镀膜装置冷却效果，避免基材出现串泡、基材起皱、针孔等问题，优化产品质量。

Description

一种多辊式真空镀膜装置 技术领域
本实用新型涉及真空蒸镀技术领域，具体的说，是涉及一种多辊式真空镀膜装置。
背景技术
真空蒸镀是指在真空条件下，采用一定的加热蒸发方式蒸发镀基材料并使之气化，粒子飞至基片表面凝聚成膜的工艺方法。真空蒸镀装置的工作原理是在对柔性膜进行镀膜的时候，柔性膜的同一位置的正面被蒸镀机构镀膜同时背面与冷却辊贴紧进行冷却。
随着柔性导电材料性能要求的不断提高，由于导电材料的厚度较薄，在生产超薄柔性导电材料时，由于温度过高，现有设备的冷却效果不佳，容易出现薄膜起皱、镀空线、串泡、表面镀层外观不良、针孔等问题，影响产品质量。
以上缺陷，有待改善。
发明内容
为了克服现有的技术的不足，本实用新型提供一种多辊式真空镀膜装置。
本实用新型技术方案如下所述：
一种多辊式真空镀膜装置，包括放卷机构、镀膜机构以及收卷机构，放卷机构、镀膜机构及收卷机构依次排列，镀膜机构内设有若干冷却辊、若干动力展平辊及若干蒸发组件，若干蒸发组件分别位于若干冷却辊下方，若干冷却辊与若干动力展平辊依次排列。
本实用新型将冷却辊及蒸发组件拆分为多个，待镀基材依次通过各冷却辊从而针对待镀基材进行多次冷却及镀膜，提高真空镀膜装置冷却效果，避免基材出现串泡、基材起皱、针孔等问题，优化产品质量。
进一步地，镀膜机构内还设有若干过辊，若干过辊分别设于若干冷却辊以及若干动力展平辊两侧。
镀膜机构内设置若干过辊，若干过辊分别设于若干冷却辊以及若干动力展平辊 的两侧，能够避免基材在镀膜过程中起皱，提高镀膜装置的工作效率。
进一步地，镀膜机构还设有若干驱动电机，若干驱动电机与若干动力展平辊转动连接。
镀膜机构设置若干驱动电机，若干驱动电机与若干所述动力展平辊转动连接，能够避免在走膜过程中基材断裂，保证镀膜装置能够稳定运行。
进一步地，镀膜机构中第一个冷却辊下方还设有通臭氧孔。
真空镀膜装置启动时，通臭氧孔向第一个冷却辊下方提供臭氧使得基材表面形成氧化金属层，有利于提高后续镀层与基材的粘结力。
进一步地，若干蒸发组件之间还设有隔板。
通过在蒸发组件设置隔板能够避免各蒸发组件相互影响，从而提高产品优率。
进一步地，放卷机构包括放卷轴及放卷电机，放卷电机与放卷轴转动连接。
通过放卷机构的设置，可以一次性对较长的基材进行镀膜，提高镀膜效率；放卷电机的设置能够便于调整真空镀膜装置的走膜速度，避免基材发生褶皱影响镀膜效果。
进一步地，收卷机构包括收卷轴及收卷电机，收卷电机与收卷轴转动连接。
通过收卷机构的设置，可以一次性对较长的基材进行镀膜，从而提高镀膜效率；收卷电机的设置能够便于与放卷电机及动力展平辊相配合，随时调整张力及走膜速度，避免基材发生褶皱影响镀膜效果。
进一步地，蒸发组件采用电阻式蒸发、中频感应坩埚蒸发或电子束蒸发。
采用电阻式蒸发、中频感应坩埚蒸发或电子束蒸发能够提高蒸发组件的蒸发效果，从而提高产品优率。
进一步地，蒸发组件上设有用于调节蒸发组件开口范围的活动盖板。
通过在蒸发组件上设置活动盖板从而控制开口大小及范围，能够调节镀膜量，提高产品优率。
进一步地，蒸发组件还设有用于调节蒸发组件与冷却辊距离的升降调节机构。
通过在蒸发组件设置升降调节机构，能够调节蒸发组件与冷却辊之间的距离，从而控制并调节膜厚等镀膜效果。
本申请实施例提供的真空镀膜装置的有益效果包括：通过将真空镀膜设备中的冷却辊及蒸发组件拆分为若干个，待镀基材依次通过各冷却辊从而针对待镀基材进行多次冷却及镀膜，提高真空镀膜装置冷却效果，改善柔性膜局部变形的现象出现，避免基材出现串泡、基材起皱、针孔等问题，优化产品质量。
附图说明
为了更清楚地说明本实用新型实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本实用新型的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本实用新型实施例一的结构示意图；
图2为本实用新型实施例二的结构示意图；
图3为本实用新型实施例三的结构示意图；
图4为本实用新型实施例四的结构示意图。
在图中，
1、放卷轴；
2、冷却辊；
3、动力展平辊；
4、收卷轴；
5、蒸发组件；
6、基材；
7、过辊；
8、通臭氧孔；
9、隔板。
具体实施方式
为了更好的解释本实用新型，以便于理解，下面结合附图，通过具体实施方式，对本实用新型作详细描述。显然，所描述的实施例仅仅是本实用新型一部分实施例，而不是全部的实施例。基于本实用新型中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本实用新型保护的范围。
实施例一
如图1所示，本实施例公开了一种多辊式真空镀膜装置，包括放卷机构、镀膜机构以及收卷机构，放卷机构、镀膜机构及收卷机构依次排列，放卷机构的放卷速度与收卷机构的收卷速度一致。镀膜机构内设有若干冷却辊2、若干动力展平辊3及若干蒸发组件5，若干蒸发组件5分别位于若干冷却辊2下方，若干冷却辊2与 若干动力展平辊3依次排列。本实施例中冷却辊2及蒸发组件5设有四组，且设有三个动力展平辊3；放卷机构为放卷轴1，收卷机构为收卷轴4。
具体实施时，人工将待镀基材6从放卷轴1依次经过冷却辊2、动力展平辊3将其拉至收卷轴4，然后将真空镀膜装置启动，调整放卷轴1的放卷速度与收卷轴4的收卷速度到一致，即可进行基材6镀膜。本实施例的放卷直径为600mm，基材6材料为PET、PI等，蒸发组件5为中频感应坩埚。冷却辊2的主要作用是为镀膜基材6提供冷却量，将镀膜过程中所形成的热量通过冷却辊2传递到设备外部，保持基材6表面在降低的温度状态下完成蒸镀过程。本实施例中冷却辊2采用冷却液循环冷却，冷却温度在-15℃-20℃之间，在真空≤6.7×10-2Pa的条件下镀膜，走膜速度为100～600m/min。本实施例将冷却辊2及蒸发组件5拆分为四组，待镀基材6依次通过四组冷却辊2从而针对待镀基材6进行多次冷却及镀膜，能够提高真空镀膜装置冷却效果，避免基材6出现串泡、基材6起皱、针孔等问题，优化产品质量。
实施例二
如图2所示，本实施例与上述实施例的区别特征在于：本实施例中镀膜机构内还设有若干过辊7，若干过辊7分别设于若干冷却辊2以及若干动力展平辊3两侧。
具体实施时，人工将待镀基材6从放卷轴1依次经过过辊7、冷却辊2以及动力展平辊3，将其拉至收卷轴4，然后将真空镀膜装置启动，调整放卷轴1的放卷速度与收卷轴4的收卷速度到一致，即可进行基材6镀膜。本实施例通过在镀膜机构内还设置若干过辊7，能够避免基材6在镀膜过程中起皱、断裂，提高镀膜装置的工作效率。
实施例三
如图3所示，本实施例与上述实施例的区别特征在于：镀膜机构的第一个冷却辊2下方还设有通臭氧孔8。本实施例中，冷却辊2下方左右两侧分别设有一通臭氧孔8。真空镀膜装置启动时，通臭氧孔8向第一个冷却辊2下方提供臭氧使得基材6表面形成氧化金属层，有利于提高后续镀层与基材的粘结力。
实施例四
如图4所示，本实施例与上述实施例的区别特征在于：若干蒸发组件5之间还设有隔板9。本实施例通过在蒸发组件5设置隔板9能够避免各蒸发组件5相互影响，从而提高产品优率。
实施例五
本实施例与上述实施例的区别特征在于：镀膜机构还设有若干驱动电机，若干驱动电机与若干动力展平辊3转动连接。本实施中驱动电机设有三个，分别与动力展平辊3转动连接并带动动力展平辊3旋转。通过在动力展平辊3上设置驱动电机，能够避免在走膜过程中基材6断裂，保证镀膜装置能够稳定运行。
实施例六
本实施例与上述实施例的区别特征在于：蒸发组件5上设有用于调节所述蒸发组件5开口范围的活动盖板。通过在蒸发组件5上设置活动盖板从而控制开口大小及范围，能够调节镀膜量，提高产品优率。
实施例七
本实施例与上述实施例的区别特征在于：蒸发组件5还设有用于调节蒸发组件5与冷却辊2距离的升降调节机构。通过在蒸发组件5设置升降调节机构，能够调节蒸发组件5与冷却辊2之间的距离，从而控制膜厚等镀膜效果。
本实用新型适用于较薄材料的真空蒸发镀膜过程，如2～30μm塑料薄膜、复合薄膜、纸张、布料等基材6在真空环境的蒸发镀膜过程；其中，本镀膜装置更适于2～8μm塑料薄膜如PET、PEN、PI、PP、PE以及无纺布、薄纸张等在真空环境的蒸发镀膜过程。
应当理解的是，对本领域普通技术人员来说，可以根据上述说明加以改进或变换，而所有这些改进和变换都应属于本实用新型所附权利要求的保护范围。
上面结合附图对本实用新型专利进行了示例性的描述，显然本实用新型专利的实现并不受上述方式的限制，只要采用了本实用新型专利的方法构思和技术方案进行的各种改进，或未经改进将本实用新型专利的构思和技术方案直接应用于其它场合的，均在本实用新型的保护范围内。

Claims (10)

  1. 一种多辊式真空镀膜装置，包括放卷机构、镀膜机构以及收卷机构，所述放卷机构、所述镀膜机构及所述收卷机构依次排列，其特征在于：所述镀膜机构内设有若干冷却辊、若干动力展平辊及若干蒸发组件，若干所述蒸发组件分别位于若干所述冷却辊下方，若干所述冷却辊与若干所述动力展平辊依次排列。
  2. 根据权利要求1所述的一种多辊式真空镀膜装置，其特征在于：所述镀膜机构内还设有若干过辊，若干所述过辊分别设于若干所述冷却辊以及若干所述动力展平辊两侧。
  3. 根据权利要求1所述的一种多辊式真空镀膜装置，其特征在于：所述镀膜机构还设有若干驱动电机，若干所述驱动电机与若干所述动力展平辊转动连接。
  4. 根据权利要求1所述的一种多辊式真空镀膜装置，其特征在于：所述镀膜机构中第一个所述冷却辊下方还设有通臭氧孔。
  5. 根据权利要求4所述的一种多辊式真空镀膜装置，其特征在于：若干所述蒸发组件之间还设有隔板。
  6. 根据权利要求1所述的一种多辊式真空镀膜装置，其特征在于：所述放卷机构包括放卷轴及放卷电机，所述放卷电机与所述放卷轴转动连接。
  7. 根据权利要求1所述的一种多辊式真空镀膜装置，其特征在于：所述收卷机构包括收卷轴及收卷电机，所述收卷电机与所述收卷轴转动连接。
  8. 根据权利要求1所述的一种多辊式真空镀膜装置，其特征在于：所述蒸发组件采用电阻式蒸发、中频感应坩埚蒸发或电子束蒸发。
  9. 根据权利要求8所述的一种多辊式真空镀膜装置，其特征在于：所述蒸发组件上设有用于调节所述蒸发组件开口范围的活动盖板。
  10. 根据权利要求8所述的一种多辊式真空镀膜装置，其特征在于：所述蒸发组件还设有用于调节所述蒸发组件与所述冷却辊距离的升降调节机构。
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