WO2021106974A1 - ポリアリーレンスルフィド樹脂組成物、成形品、積層体およびそれらの製造方法 - Google Patents
ポリアリーレンスルフィド樹脂組成物、成形品、積層体およびそれらの製造方法 Download PDFInfo
- Publication number
- WO2021106974A1 WO2021106974A1 PCT/JP2020/043923 JP2020043923W WO2021106974A1 WO 2021106974 A1 WO2021106974 A1 WO 2021106974A1 JP 2020043923 W JP2020043923 W JP 2020043923W WO 2021106974 A1 WO2021106974 A1 WO 2021106974A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- carbonate
- polyarylene sulfide
- sulfide resin
- resin composition
- resin
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 65
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 45
- 229920000412 polyarylene Polymers 0.000 title claims abstract description 33
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 title claims abstract description 32
- 229920005989 resin Polymers 0.000 claims abstract description 105
- 239000011347 resin Substances 0.000 claims abstract description 105
- 229910052751 metal Inorganic materials 0.000 claims abstract description 97
- 239000002184 metal Substances 0.000 claims abstract description 97
- 238000000034 method Methods 0.000 claims abstract description 60
- 238000007747 plating Methods 0.000 claims abstract description 44
- 229920005992 thermoplastic resin Polymers 0.000 claims abstract description 43
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims abstract description 34
- 229920002725 thermoplastic elastomer Polymers 0.000 claims abstract description 29
- 238000000465 moulding Methods 0.000 claims abstract description 27
- 229920000098 polyolefin Polymers 0.000 claims abstract description 24
- 238000002156 mixing Methods 0.000 claims abstract description 15
- 239000002253 acid Substances 0.000 claims description 23
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 claims description 21
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 17
- 229910052802 copper Inorganic materials 0.000 claims description 17
- 239000010949 copper Substances 0.000 claims description 17
- 238000007772 electroless plating Methods 0.000 claims description 16
- 239000002245 particle Substances 0.000 claims description 13
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 12
- 238000003486 chemical etching Methods 0.000 claims description 12
- 238000005530 etching Methods 0.000 claims description 12
- 229910000019 calcium carbonate Inorganic materials 0.000 claims description 11
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 10
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 claims description 10
- KQTXIZHBFFWWFW-UHFFFAOYSA-L disilver;carbonate Chemical compound [Ag]OC(=O)O[Ag] KQTXIZHBFFWWFW-UHFFFAOYSA-L 0.000 claims description 10
- 238000009713 electroplating Methods 0.000 claims description 10
- 238000004898 kneading Methods 0.000 claims description 10
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 10
- 238000007788 roughening Methods 0.000 claims description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 8
- 239000008187 granular material Substances 0.000 claims description 7
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 claims description 7
- 150000003839 salts Chemical class 0.000 claims description 7
- 239000001095 magnesium carbonate Substances 0.000 claims description 6
- 229910000021 magnesium carbonate Inorganic materials 0.000 claims description 6
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 6
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 claims description 5
- 239000004277 Ferrous carbonate Substances 0.000 claims description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 5
- FMRLDPWIRHBCCC-UHFFFAOYSA-L Zinc carbonate Chemical compound [Zn+2].[O-]C([O-])=O FMRLDPWIRHBCCC-UHFFFAOYSA-L 0.000 claims description 5
- 239000001099 ammonium carbonate Substances 0.000 claims description 5
- 235000012501 ammonium carbonate Nutrition 0.000 claims description 5
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 claims description 5
- 229910000009 copper(II) carbonate Inorganic materials 0.000 claims description 5
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 claims description 5
- 239000011646 cupric carbonate Substances 0.000 claims description 5
- 235000019854 cupric carbonate Nutrition 0.000 claims description 5
- 239000010459 dolomite Substances 0.000 claims description 5
- 229910000514 dolomite Inorganic materials 0.000 claims description 5
- RAQDACVRFCEPDA-UHFFFAOYSA-L ferrous carbonate Chemical compound [Fe+2].[O-]C([O-])=O RAQDACVRFCEPDA-UHFFFAOYSA-L 0.000 claims description 5
- 235000019268 ferrous carbonate Nutrition 0.000 claims description 5
- 229910000015 iron(II) carbonate Inorganic materials 0.000 claims description 5
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 claims description 5
- 229910052808 lithium carbonate Inorganic materials 0.000 claims description 5
- 239000011656 manganese carbonate Substances 0.000 claims description 5
- 235000006748 manganese carbonate Nutrition 0.000 claims description 5
- 229940093474 manganese carbonate Drugs 0.000 claims description 5
- 229910000016 manganese(II) carbonate Inorganic materials 0.000 claims description 5
- XMWCXZJXESXBBY-UHFFFAOYSA-L manganese(ii) carbonate Chemical compound [Mn+2].[O-]C([O-])=O XMWCXZJXESXBBY-UHFFFAOYSA-L 0.000 claims description 5
- 229910052763 palladium Inorganic materials 0.000 claims description 5
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 5
- LKZMBDSASOBTPN-UHFFFAOYSA-L silver carbonate Substances [Ag].[O-]C([O-])=O LKZMBDSASOBTPN-UHFFFAOYSA-L 0.000 claims description 5
- 235000017557 sodium bicarbonate Nutrition 0.000 claims description 5
- 229910000030 sodium bicarbonate Inorganic materials 0.000 claims description 5
- 229910052725 zinc Inorganic materials 0.000 claims description 5
- 239000011701 zinc Substances 0.000 claims description 5
- 239000011667 zinc carbonate Substances 0.000 claims description 5
- 235000004416 zinc carbonate Nutrition 0.000 claims description 5
- 229910000010 zinc carbonate Inorganic materials 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052793 cadmium Inorganic materials 0.000 claims description 4
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 239000011651 chromium Substances 0.000 claims description 4
- 229910017052 cobalt Inorganic materials 0.000 claims description 4
- 239000010941 cobalt Substances 0.000 claims description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 239000011133 lead Substances 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 229910052703 rhodium Inorganic materials 0.000 claims description 4
- 239000010948 rhodium Substances 0.000 claims description 4
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000004332 silver Substances 0.000 claims description 4
- 239000011135 tin Substances 0.000 claims description 4
- 229910052718 tin Inorganic materials 0.000 claims description 4
- 150000004649 carbonic acid derivatives Chemical class 0.000 claims description 2
- 239000012765 fibrous filler Substances 0.000 claims 4
- 239000000853 adhesive Substances 0.000 abstract description 31
- 230000001070 adhesive effect Effects 0.000 abstract description 31
- 239000000203 mixture Substances 0.000 abstract description 8
- 239000000047 product Substances 0.000 description 68
- 239000001993 wax Substances 0.000 description 28
- -1 alkali metal salt Chemical class 0.000 description 27
- 239000000243 solution Substances 0.000 description 24
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 16
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 15
- 125000004432 carbon atom Chemical group C* 0.000 description 14
- 238000002844 melting Methods 0.000 description 14
- 230000008018 melting Effects 0.000 description 14
- 239000004734 Polyphenylene sulfide Substances 0.000 description 13
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 13
- 229920000069 polyphenylene sulfide Polymers 0.000 description 13
- 229910052799 carbon Inorganic materials 0.000 description 11
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 10
- 150000001336 alkenes Chemical group 0.000 description 10
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- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 6
- ZGEGCLOFRBLKSE-UHFFFAOYSA-N 1-Heptene Chemical compound CCCCCC=C ZGEGCLOFRBLKSE-UHFFFAOYSA-N 0.000 description 6
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- 239000000057 synthetic resin Substances 0.000 description 6
- 239000004711 α-olefin Substances 0.000 description 6
- DFPAKSUCGFBDDF-UHFFFAOYSA-N Nicotinamide Chemical group NC(=O)C1=CC=CN=C1 DFPAKSUCGFBDDF-UHFFFAOYSA-N 0.000 description 5
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- 125000003277 amino group Chemical group 0.000 description 4
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- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 3
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Definitions
- the present invention relates to polyphenylene sulfide resin compositions, molded articles and laminates, and methods for producing them. More specifically, a laminate capable of easily forming a metal film on the surface of a polyphenylene sulfide resin molded article with high adhesion, a method for producing the laminate, a polyarylene sulfide resin composition for providing the laminate, and a molded article. And their manufacturing methods.
- polyphenylene sulfide (sometimes abbreviated as "PAS") represented by so-called polyphenylene sulfide (sometimes abbreviated as “PPS”) may be abbreviated because of its excellent heat resistance and chemical resistance. ) Containing resin composition
- PAS polyphenylene sulfide
- PPS polyphenylene sulfide
- polyphenylene sulfide is formed by forming a primer resin layer and a metal layer containing metal particles on the surface of the PAS molded product by an immersion method, and then forming a metal plating layer by an electrolytic plating method, an electroless plating method, or the like. It has been proposed that when a metal film is formed on the surface of the polyphenylene sulfide, a metal film can be easily formed on the surface of polyphenylene sulfide with high adhesive strength (see Patent Documents 3 and 4).
- this method is a method of sequentially forming a primer resin layer, a metal layer containing metal particles, and a metal plating layer on the surface of a PAS molded product, the number of steps is large, and the steps are further increased from the viewpoint of productivity. Proposals for fewer methods were desired.
- An object to be solved by the present invention is to provide a laminate capable of forming a metal film on the surface of a PAS molded product with a high adhesive force by a simple process and a method for producing the same. Further, it is to provide a PAS resin composition, a molded product, and a method for producing the same, which can be used for such a laminate and a method for producing the same.
- a PAS resin from the group consisting of a PAS resin (A), a thermoplastic elastomer (b1), and a thermoplastic resin (b2) having a hydrolyzable property.
- a molded product obtained by melt-molding a PAS resin composition containing a thermoplastic resin (B), a carbonate (C), and a polyolefin-based wax (D) other than the above is roughened by a chemical etching treatment, the resin composition is roughened.
- the present invention has been completed by finding that a metal film formed by a metal plating treatment method exhibits high adhesive strength on a roughened surface.
- the present invention is a laminate having a step of roughening the surface of a molded product obtained by molding a PAS resin composition by a chemical etching treatment and a step of performing a metal plating treatment on the surface of the roughened molded product. It is a manufacturing method of The PAS resin composition is Thermoplastic resin (B), carbonate (C) and polyolefin-based wax other than PAS resin selected from the group consisting of PAS resin (A), thermoplastic elastomer (b1) and thermoplastic resin (b2) having hydrolyzability.
- the present invention relates to a method for producing a laminate, which comprises blending (D).
- the present invention is a laminate in which a metal layer is laminated on a roughened surface of a molded product obtained by molding a PAS resin composition.
- the PAS resin composition Thermoplastic resin (B), carbonate (C) and polyolefin-based wax other than PAS resin selected from the group consisting of PAS resin (A), thermoplastic elastomer (b1) and thermoplastic resin (b2) having hydrolyzability.
- the present invention relates to a laminate characterized by blending (D).
- the present invention relates to a thermoplastic resin (B) other than the PAS resin selected from the group consisting of the PAS resin (A), the thermoplastic elastomer (b1) and the thermoplastic resin (b2) having a hydrolyzable property, and a carbonate (
- the present invention relates to a method for producing a PAS resin composition, which comprises a step of blending C) and a polyolefin-based wax (D) and melt-kneading them.
- the present invention also relates to a method for producing a molded product, which comprises a step of melt-molding the PAS resin composition produced by the method for producing a PAS resin composition described above.
- the present invention relates to a thermoplastic resin (B) other than the PAS resin selected from the group consisting of the PAS resin (A), the thermoplastic elastomer (b1) and the thermoplastic resin (b2) having a hydrolyzable property, and a carbonate (
- the present invention relates to a PAS resin composition, which comprises blending C) and a polyolefin-based wax (D).
- the present invention also relates to a molded product obtained by melt molding the PAS resin composition described above.
- bonding the surface of a PAS molded product and a metal film to each other is referred to as adhesion.
- Example 3 is an SEM photograph of the PAS molded product produced in Example 3 before the roughened surface.
- Example 3 is an SEM photograph of the PAS molded product produced in Example 3 after the roughened surface.
- a molded product obtained by molding a PAS resin composition is used as a support, and the surface of the support is roughened by a chemical etching treatment, and the surface of the roughened support is roughened.
- the PAS resin composition is Thermoplastic resin (B), carbonate (C) and polyolefin-based wax other than PAS resin selected from the group consisting of PAS resin (A), thermoplastic elastomer (b1) and thermoplastic resin (b2) having hydrolyzability. It is characterized by blending (D).
- the PAS resin (A) has a resin structure having a structure in which an aromatic ring and a sulfur atom are bonded as a repeating unit. Specifically, the structural portion represented by the following general formula (1) is repeated. It is a resin as a unit.
- R 1 and R 2 independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a nitro group, an amino group, a phenyl group, a methoxy group, and an ethoxy group, respectively.
- R 1 and R 2 in the general formula (1) are preferably hydrogen atoms because the mechanical strength of the PAS resin (A) is improved, and in that case, they are represented by the following general formula (2). Examples thereof include those that are bonded at the para-position and those that are bonded at the meta-position represented by the following general formula (3).
- the heat resistance and crystallinity of the PAS (A) are such that the bond of the sulfur atom to the aromatic ring in the repeating unit has a structure in which the sulfur atom is bonded at the para position represented by the general formula (2). It is preferable because it improves.
- the PAS resin (A) contains at least one selected from not only the structural parts represented by the general formula (1) but also the structural parts represented by the following general formulas (4) to (7). You may have.
- the molar ratio of these structural parts in the PAS resin (A) is 30 mol% because heat resistance and mechanical strength are good. The following is preferable, and 10 mol% or less is more preferable.
- the binding of the structural parts represented by the general formula (1) to the repeating unit is as follows. It may be a random type or a block type.
- the PAS resin (A) may have a trifunctional structural site represented by the following general formula (8), a naphthyl sulfide bond, or the like in its structure.
- the molar ratio of these structural parts in the PAS resin (A) is preferably 3 mol% or less, and more preferably 1 mol% or less.
- the PAS resin (A) can be produced, for example, by the methods (1) to (5) below.
- (1) A method of reacting sodium sulfide with p-dichlorobenzene in an amide solvent such as N-methylpyrrolidone or dimethylacetamide or a sulfone solvent such as sulfolane.
- (2) A method of polymerizing p-dichlorobenzene in the presence of sulfur and sodium carbonate.
- Sodium sulfide is added dropwise to a mixed solvent of a polar solvent and p-dichlorobenzene, a mixture of sodium hydrosulfide and sodium hydroxide is added dropwise, or a mixture of hydrogen sulfide and sodium hydroxide is added.
- a method of dropping and polymerizing (4) A method by self-condensation of p-chlorothiophenol. (5) The diiode aromatic compound, elemental sulfur, and a polymerization inhibitor having a functional group, if necessary, the diiodo aromatic compound and the elemental sulfur, or a reactant thereof, and if necessary, the above. A method comprising reacting a polymerization inhibitor with a molten state.
- the method (1) in which sodium sulfide and p-dichlorobenzene are reacted in an amide solvent such as N-methylpyrrolidone or dimethylacetamide or a sulfone solvent such as sulfolane is easy to control the reaction. , It is preferable because it has excellent industrial productivity. Further, in this method (1), it is preferable to add an alkali such as an alkali metal salt of a carboxylic acid, an alkali metal salt of a sulfonic acid, or a hydroxide in order to adjust the degree of polymerization.
- an alkali such as an alkali metal salt of a carboxylic acid, an alkali metal salt of a sulfonic acid, or a hydroxide in order to adjust the degree of polymerization.
- the melt viscosity of the PAS resin measured at 300 ° C. is preferably 2 Pa ⁇ s or more, more preferably 10 Pa ⁇ s or more, still more preferably 60 Pa ⁇ s or more, preferably 1000 Pa ⁇ s or less, more preferably 500 Pa ⁇ s.
- the range is more preferably 200 Pa ⁇ s or less.
- the melt viscosity is 2 Pa ⁇ s or more, the material strength can be maintained, which is preferable.
- the melt viscosity is 1000 Pa ⁇ s or less, it is preferable from the viewpoint of moldability.
- the PAS resin (A) can reduce the amount of residual metal ions to improve the moisture resistance characteristics and reduce the residual amount of low molecular weight impurities produced as a by-product during polymerization. Therefore, the PAS (A) is produced. After that, it is preferably treated with an acid and then washed with water.
- acetic acid for example, acetic acid, hydrochloric acid, sulfuric acid, phosphoric acid, silicic acid, carbonic acid, and propyl acid are preferable.
- acetic acid and hydrochloric acid are preferable because the amount of residual metal ions can be efficiently reduced without decomposing the PAS (A).
- Examples of the acid treatment method include a method of immersing the PAS resin (A) in an acid or an acid aqueous solution. At this time, further stirring or heating may be performed as needed.
- an aqueous acetic acid solution having a pH of 4 is heated to 80 to 90 ° C., the PAS resin (A) is immersed therein, and 20 to 20 to A method of stirring for 40 minutes can be mentioned.
- the PAS resin (A) treated with acid in this manner is washed with water or warm water several times in order to physically remove the remaining acid and salt.
- the water used at this time is preferably distilled water or deionized water.
- the PAS resin (A) to be subjected to the acid treatment is preferably a powder or granular material, and specifically, it may be a granular material such as pellets or a slurry-state material after polymerization. Good.
- the PAS molded product has an improved adhesive force with the metal layer due to the metal plating treatment. Therefore, the PAS resin composition of the present invention further comprises a thermoplastic elastomer (b1) and a thermoplastic resin having a hydrolyzable property. A thermoplastic resin (B) other than the PAS resin selected from the group consisting of (b2) is blended as an essential component.
- thermoplastic elastomer (b1) used in the present invention is not particularly limited as long as it is known, but it is preferably removed by a chemical etching treatment described later.
- polyolefin-based thermoplastic elastomers sometimes referred to as "olefin copolymer-based thermoplastic elastomers”
- fluorine-based thermoplastic elastomers silicone-based thermoplastic elastomers
- styrene-based thermoplastic elastomers styrene-based thermoplastic elastomers
- fluororesin-based thermoplastic elastomers Urethane resin-based thermoplastic elastomer and the like, and in particular, polyolefin-based thermoplastic elastomer is mentioned as preferable.
- the polyolefin-based thermoplastic elastomer includes a homopolymer of an ⁇ -olefin, a copolymer of two or more ⁇ -olefins, or a vinyl polymerizable compound having one or two or more ⁇ -olefins and a functional group. Copolymers can be mentioned.
- examples of the ⁇ -olefin include ⁇ -olefins having a carbon atom number of 2 or more and 8 or less, such as ethylene, propylene, and 1-butene.
- Examples of the vinyl polymerizable compound having the functional group include vinyl acetate; ⁇ , ⁇ -unsaturated carboxylic acid such as (meth) acrylate; ⁇ , ⁇ - such as methyl acrylate, ethyl acrylate, and butyl acrylate.
- Alkyl ester of unsaturated carboxylic acid metal salt of ⁇ , ⁇ -unsaturated carboxylic acid such as ionomer (alkali metal such as sodium as metal, alkaline earth metal such as calcium, zinc etc.); ⁇ such as glycidyl methacrylate Glycidyl ester of ⁇ -unsaturated carboxylic acid, etc .; ⁇ , ⁇ -unsaturated dicarboxylic acid such as maleic acid, fumaric acid, itaconic acid; Derivatives of ⁇ , ⁇ -unsaturated dicarboxylic acid (monoester, diester, acid anhydride) ), Etc., or two or more.
- ionomer alkali metal such as sodium as metal, alkaline earth metal such as calcium, zinc etc.
- ⁇ such as glycidyl methacrylate Glycidyl ester of ⁇ -unsaturated carboxylic acid, etc .
- thermoplastic elastomer examples include styrene-butadiene-based rubber (SBR) and hydrogenated SBR.
- SBR styrene-butadiene-based rubber
- silicone-based thermoplastic elastomers such as silicone-based rubber, fluororesin-based thermoplastic elastomers such as fluororubber, and urethane resin-based thermoplastic elastomers such as urethane-based rubber.
- the above-mentioned thermoplastic elastomer may be used alone or in combination of two or more.
- the hydrolyzable thermoplastic resin (b2) is not particularly limited as long as it is a known hydrolyzable thermoplastic resin, but exhibits hydrolyzability by a chemical etching treatment described later.
- Resin is preferably mentioned.
- polyamide resin, polyester resin, polycarbonate resin, polyether resin, polyurethane resin, polyketone resin, polylactone resin, polyacetal resin, polyimide resin, polyamideimide resin, polyarylate resin, polyetherimide resin, polyether ether ketone examples thereof include a resin, a thermoplastic epoxy resin, a thermoplastic phenol resin, and a copolymer containing the resin structure.
- thermoplastic resins (b2) a polyamide resin and a polycarbonate resin can be exemplified as preferable ones from the viewpoint of excellent adhesive strength between the PAS molded product obtained and the metal layer, and further, the polyamide resin is more preferable. It can be exemplified.
- aromatic polyamide resin examples include aromatic polyamide resins containing a repeating unit represented by the following structural formula (10).
- R 2 represents an alkylene group having a carbon atom number in the range of 2 or more to 12 or less.
- a terephthalic acid amide structure is formed by the reaction of terephthalic acid or terephthalic acid dihalide with an aliphatic diamine having a carbon atom number in the range of 2 or more and 12 or less.
- Specific examples of the aliphatic diamine used here in the range of 2 to 12 carbon atoms are ethylenediamine, propanediamine, 1,4-butanediamine, 1,6-hexanediamine, and 1,7-heptane.
- Linear aliphatic alkylene diamines such as diamine, 1,8-octanediamine, 1,9-nonanediamine, 1,10-decanediamine, 1,11-undecanediamine, 1,12-dodecanediamine; 1-butyl-1 , 2-Etandiamine, 1,1-dimethyl-1,4-butanediamine, 1-ethyl-1,4-butanediamine, 1,2-dimethyl-1,4-butanediamine, 1,3-dimethyl-1 , 4-butanediamine, 1,4-dimethyl-1,4-butanediamine, 2,3-dimethyl-1,4-butanediamine, 2-methyl-1,5-pentanediamine, 3-methyl-1,5 -Pentandiamine, 2,5-dimethyl-1,6-hexanediamine, 2,4-dimethyl-1,6-hexanediamine, 3,3-dimethyl-1,6-hexanediamine, 2,2-dimethyl-1 , 6-Hexanediamine, 2,
- Chain aliphatic alkylene diamines examples include alicyclic diamines such as cyclohexanediamine, methylcyclohexanediamine, isophoronediamine, norbornandimethylamine, and tricyclodecanedimethylamine.
- the linear aliphatic alkylenediamine having a carbon atom number in the range of 4 or more to 8 or less and having a carbon atom number of 5 are particularly excellent in the adhesive force with the metal layer.
- Branched chain aliphatic alkylenediamines in the range from the above to 10 or less are preferable.
- aromatic polyamide resin an aromatic polyamide resin containing a repeating unit represented by the following structural formula (11) can also be exemplified.
- R 2 is synonymous with R 2 in the structural formula (10).
- aromatic polyamide resin may have an acid amide structure represented by the following structural formula (12).
- R 2 has the same meaning as R 2 in the structural formula (10), R 3 has a number of carbon atoms is an aliphatic hydrocarbon radical in the range from 4 or more to 10 or less.
- the acid amide structure represented by the structural formula (12) has an aliphatic dicarboxylic acid having a carbon atom number in the range of 4 or more to 10 or less, an acid esterified product thereof, an acid anhydride thereof, or an acid halide thereof. And is formed by the reaction with an aliphatic diamine having a carbon atom number in the range of 2 or more to 12 or less.
- Specific examples of the aliphatic dicarboxylic acid having a carbon atom number of 4 or more to 10 or less used here are malonic acid, dimethylmalonic acid, succinic acid, glutaric acid, adipic acid, 2-methyladiponic acid, and trimethyl.
- Aliphatic dicarboxylic acids such as adipic acid, pimeric acid, 2,2-dimethylglutaric acid, 3,3-diethylsuccinic acid, azelaic acid, sebacic acid, and suberic acid; 1,3-cyclopentanedicarboxylic acid, 1,4- Examples thereof include aliphatic dicarboxylic acids such as alicyclic dicarboxylic acids such as cyclohexanedicarboxylic acids.
- the acid halide of the aliphatic dicarboxylic acid having a carbon atom number in the range of 4 or more to 10 or less include a methyl ester form, an ethyl ester form, a t-butyl ester form and the like.
- the halogen atom constituting the acid halide of the aliphatic dicarboxylic acid include a bromine atom and a chlorine atom.
- the aromatic polyamide resin preferably has an amide structure represented by the structural formula (10), structural formula (11), and structural formula (12) as a structural site, but one molecule of dicarboxylic acid and one molecule of dicarboxylic acid are used.
- the acid amide structure composed of one molecule of diamine is regarded as one unit, the terephthalic acid amide structure is 50 mol% or more and isophthalic acid with respect to the total acid amide structure constituting the aromatic polyamide resin (B).
- the amide structure is contained in an amount of 10 mol% or more and the aliphatic hydrocarbon acid amide structure is contained in an amount of 5 mol% or more from the viewpoint of excellent adhesion to the metal layer in the obtained PAS molded product.
- the aromatic polyamide resin is more excellent in adhesive force to the metal layer in the obtained PAS molded product.
- the terephthalic acid amide structure represented by the structural formula (10) is in the range of 50 mol% or more to 80 mol% or less.
- the isophthalic acid amide structure represented by the structural formula (11) is in the range of 10 mol% or more to 30 mol% or less.
- the acid amide structure represented by the structural formula (12) is in the range of 5 mol% or more to 20 mol% or less.
- Polyamide resin composed of is preferable.
- the melting point ranges from 290 ° C. or higher to 330 ° C. or lower, and Tg 90 ° C. or higher to 140 ° C. from the viewpoint that the recrystallization peak temperature of the aromatic polyamide resin becomes lower and the dispersibility with the PAS resin becomes better. It is preferably in the range of ° C. or lower.
- the aromatic polyamide resin described above can be produced, for example, by the following methods (1) to (3).
- An alkaline compound that accepts an acid such as a tertiary amine with an acid halide of a dicarboxylic acid component containing terephthalic acid and a diamine component containing an aliphatic diamine having a carbon atom number in the range of 2 or more to 12 or less.
- a solution polymerization method in which the reaction is carried out in an organic solvent in the presence of the compound.
- the blending ratio of the thermoplastic resin (B) is not particularly limited, but since the adhesive force with the metal layer by the metal plating treatment is further improved, the thermoplastic elastomer (b1) and the thermoplastic having hydrolyzability
- the total amount of the thermoplastic resin (B) other than the PAS resin selected from the group consisting of the resin (b2) is preferably 5 parts by mass or more, more preferably 15 parts by mass with respect to 100 parts by mass of the PAS resin (A).
- the range is more than parts by mass, more preferably 30 parts by mass or more, preferably 70 parts by mass or less, more preferably 60 parts by mass or less, still more preferably 50 parts by mass or less.
- the PAS molded product has improved adhesive strength with the metal layer by the metal plating treatment. Therefore, the PAS resin composition of the present invention is further blended with carbonate (C) as an essential component.
- the carbonate (C) is not particularly limited as long as it is known, but preferably one that is removed by a chemical etching treatment described later. Specifically, calcium carbonate, magnesium carbonate, potassium carbonate, sodium carbonate, sodium hydrogen carbonate, ammonium carbonate, barium carbonate, lithium carbonate, copper (II) carbonate, iron (II) carbonate, silver (I) carbonate, manganese carbonate. , Zinc carbonate, dolomite, hydromagnesite and the like, and calcium carbonate is particularly preferable.
- the size of the carbonate (C) is not particularly limited, but the average particle size of the obtained PAS molded product is in the range of 6 ⁇ m or less from the viewpoint of being more excellent in adhesive strength to the metal layer. Is preferable, it is more preferably 3 ⁇ m or less, further preferably 1.2 ⁇ m or less, while the lower limit is not limited, but it is preferably in the range of 0.3 ⁇ m or more, preferably 0.5 ⁇ m or more. Is more preferable, and the range is more preferably 0.8 ⁇ m or more.
- the average particle size can be measured by observing a cross section of the obtained molded product with an electron microscope. For example, at least 100 arbitrary particles can be measured in an observation range of 3000 times the size of one side. There is a method of finding the average value.
- the proportion of the carbonate (C) blended is not particularly limited, but is preferable with respect to 100 parts by mass of the PAS resin (A) because the adhesive force with the metal layer by the metal plating treatment is further improved. Is in the range of 10 parts by mass or more, more preferably 25 parts by mass or more, further preferably 40 parts by mass or more, preferably 90 parts by mass or less, more preferably 80 parts by mass or less, still more preferably 70 parts by mass or less. ..
- the PAS molded product has improved adhesive strength with the metal layer by the metal plating treatment. Therefore, the PAS resin composition of the present invention is further blended with a polyolefin wax (D) as an essential component.
- D polyolefin wax
- polyolefin wax sometimes referred to as "polyolefin wax"
- the wax is a low molecular weight resin that is produced by polymerization and is usually solid at 25 ° C., and exhibits a shape-removing effect in a mold, for example, as an additive to a PAS resin composition during melt molding. ..
- the molecular weight (Mn) is preferably in the range of 250 or more, more preferably 300 or more, preferably 20,000 or less, and more preferably 10,000 or less.
- the molecular weight When the molecular weight is 250 or more, volatilization from the vacuum vent can be suppressed during melt kneading or melt molding, and the mold release effect tends to be easily exerted. Further, during molding, it may be possible to prevent the wax from bleeding out more than necessary and causing stains on the mold. On the other hand, when the molecular weight is 20,000 or less, it tends to be difficult to bleed out and the mold release effect tends to be improved.
- the olefin wax (D) it is particularly preferable to use a polyethylene wax and / or a 1-alkene polymer polymerized from ethylene and / or 1-alkene as a raw material, and an extremely good mold release effect can be obtained. Not only that, in the obtained PAS molded product, the adhesive strength with the metal layer is more excellent.
- Currently widely known methods for producing polyethylene wax can be used, such as ethylene polymerized under high temperature and high pressure, polyethylene pyrolyzed, and low molecular weight components separated and purified from polyethylene polymer. Can be mentioned.
- 1-Alkenes include propylene, 1-butene, 1-pentene, 1-hexene, 1-heptene, 1-octene, 1-nonene, 1-decene, 1-dodecene, 1-tetradecene, 1-hexadecene, 1-heptene, 1-Octadecene, 1-Nonadecene, 1-Eikosen, 1-Heneikosen, 1-Dodecene, 1-Tricosene, 1-Tetracosen, 1-Pentacosene, 1-Hexacosene, 1-Heptene, 1-Octacene, 1-Nonacosene, etc. Be done.
- the aliphatic hydrocarbon group constituting the olefin wax (B) used in the present invention both a linear type and a branched type can be used.
- the olefin wax (D) used in the present invention may have a polar group.
- the polar group is at least one selected from the group consisting of a carboxy group, an acid anhydride, an amino group, a hydroxyl group, a thiol group, an epoxy group, an ether bond, an ester bond, an amide bond, an imide bond, a urea bond, a urea bond and a sulfide bond.
- a polar group is at least one selected from the group consisting of a carboxy group, an acid anhydride, an amino group, a hydroxyl group, a thiol group, an epoxy group, an ether bond, an ester bond, an amide bond, an imide bond, a urea bond, a urea bond and a sulfide bond.
- the olefin wax (D) used in the present invention has a polar group, a carboxy group, an acid anhydride, or an amino that can be copolymerized with the monomer obtained when the ethylene and / or 1-alkene is polymerized or copolymerized.
- the proportion of the olefin wax (D) to be blended is not particularly limited, but since the adhesive force with the metal layer by the metal plating treatment is further improved, the PAS resin (A) is added to 100 parts by mass with respect to 100 parts by mass. It is preferably 0.01 parts by mass, more preferably 0.05 parts by mass, still more preferably 0.1 parts by mass or more, preferably 10 parts by mass or less, more preferably 5 parts by mass or less, still more preferably 2 parts by mass. The range is up to the part or less.
- the PAS resin composition of the present invention can further contain a filler other than the carbonate (C) as an optional component.
- a filler a known and commonly used material can be used as long as the effect of the present invention is not impaired, and examples thereof include fillers having various shapes such as granular and fibrous. Specifically, fibers such as glass fiber, carbon fiber, silane glass fiber, ceramic fiber, aramid fiber, metal fiber, potassium titanate, silicon carbide, calcium sulfate, calcium silicate, and natural fiber such as wollastonite. Shaped filler can be used.
- the filler used in the present invention is not an essential component, but when used, the mixing ratio thereof is not particularly limited as long as the effect of the present invention is not impaired, and it varies depending on the respective purposes and is generally defined. However, for example, it is preferably 10 parts by mass or more, more preferably 40 parts by mass or more, 90 parts by mass or less, and more preferably 70 parts by mass or less with respect to 100 parts by mass of the PAS resin. Will be done. Within this range, various performances can be improved according to the purpose of the filler to be added, such as strength, rigidity, heat resistance, heat dissipation and dimensional stability.
- the filler one processed with a surface treatment agent or a sizing agent can also be used. This is preferable because the adhesive force with the PAS resin (A) can be improved.
- the surface treatment agent or sizing agent is selected from the group consisting of, for example, a silane compound having a functional group such as an amino group, an epoxy group, an isocyanate group, and a vinyl group, a titanate compound, an acrylic resin, a urethane resin, and an epoxy resin. At least one polymer and the like can be mentioned.
- the PAS resin composition of the present invention contains a synthetic resin, for example, an epoxy resin, a polyimide resin, or a poly, as a component other than the thermoplastic resin (B) and the olefin wax (D), depending on the intended use.
- a synthetic resin for example, an epoxy resin, a polyimide resin, or a poly, as a component other than the thermoplastic resin (B) and the olefin wax (D), depending on the intended use.
- Etherimide resin polyphenylene ether resin, polysulphon resin, polyether sulfone resin, polyether ether ketone resin, polyether ketone resin, polyarylene resin, polyethylene resin, polypropylene resin, polytetrafluorinated ethylene resin, polydifluorinated ethylene
- a synthetic resin such as a resin, a polystyrene resin, an ABS resin, a phenol resin, a urethane resin, or a liquid crystal polymer (hereinafter, simply referred to as a synthetic resin) can be blended as an optional component.
- the synthetic resin is not an essential component in the present invention, when it is blended, the blending ratio is not particularly limited as long as the effect of the present invention is not impaired, and it varies depending on the respective purposes and is unconditionally different.
- the ratio of the synthetic resin to be blended in the resin composition according to the present invention includes, for example, a range of 5 parts by mass or more and 15 parts by mass or less with respect to 100 parts by mass of PAS resin (A).
- the ratio of the PAS resin (A) to the total of the PAS resin (A) and the synthetic resin may be in the range of (100/115) or more on a mass basis, and preferably ( It may be in the range of 100/105) or less.
- the PAS resin composition of the present invention also contains a colorant, an antistatic agent, an antioxidant, a heat-resistant stabilizer, an ultraviolet stabilizer, an ultraviolet absorber, a foaming agent, a flame retardant, a flame retardant aid, and a rust preventive agent.
- a known and commonly used additive such as a coupling agent may be blended as an optional component, if necessary.
- additives are not essential ingredients, but when they are blended, the blending ratio is not particularly limited as long as the effects of the present invention are not impaired, and they differ according to their respective purposes and can be unconditionally specified.
- PAS resin (A) preferably in the range of 0.01 parts by mass or more and 1,000 parts by mass or less, as appropriate according to the purpose and application so as not to impair the effects of the present invention. It may be adjusted and used.
- the PAS resin composition of the present invention contains the PAS resin (A), the thermoplastic resin (B), the carbonate (C) and the polyolefin wax (D) as essential components, and if necessary, the above optional components. Is compounded as needed.
- the method for producing the PAS resin composition comprises PAS resin (A), the thermoplastic resin (B), the carbonate (C) and the polyolefin wax (D) as essential components, and if necessary, the above-mentioned optional method. It has a step of blending the components as necessary and melt-kneading them at a temperature equal to or higher than the melting point of the PAS resin.
- the essential component and the optional component are put into a ribbon blender, a Henschel mixer, a V blender or the like in various forms such as powder, pellets, and strips to dry blend.
- a known melt-kneader such as a Banbury mixer, a mixing roll, a single-screw or twin-screw extruder, and a kneader
- the temperature range is equal to or higher than the melting point of PAS resin, preferably + 10 ° C. or higher.
- the temperature range is, more preferably the melting point + 20 ° C.
- the melting and kneading step is performed in the temperature range of the melting point + 100 ° C. or lower, more preferably the melting point + 50 ° C. or lower.
- Each component may be added to and mixed with the melt kneader at the same time, or may be divided.
- the melt kneader a twin-screw kneading extruder is preferable from the viewpoint of dispersibility and productivity.
- the discharge amount of the resin component is in the range of 5 to 500 (kg / hr) and the screw rotation speed is 50 to 500 (rpm). It is preferable to melt-knead while appropriately adjusting the range of, and melt-knead under the condition that the ratio (discharge amount / screw rotation speed) is in the range of 0.02 to 5 (kg / hr / rpm). Is even more preferable.
- the position of the side feeder is preferably such that the ratio of the distance from the extruder resin input portion (top feeder) to the side feeder with respect to the total screw length of the twin-screw kneading extruder is 0.1 or more, and is 0. It is more preferable that the value is 3 or more. Further, such a ratio is preferably 0.9 or less, and more preferably 0.7 or less.
- the PAS resin composition of the present invention obtained by melt-kneading in this manner is a melt mixture containing the essential components, optional components added as necessary, and components derived from them.
- a known method for example, a melted PAS resin composition is extruded into a strand shape, processed into pellets, chips, granules, powders, and the like, and then 100 to 100 to, if necessary. It is preferable to pre-dry the product in a temperature range of 150 ° C. and use it for various moldings.
- the resin composition according to the present invention preferably the shear rate 500 sec -1 or less shear area, more preferably from the following shear rate 100 sec -1, which melts at 0 sec -1 over a shear area It may have a process.
- the PAS resin composition of the present invention produced by the production method contains the thermoplastic resin (B), the carbonate (C) and the polyolefin wax (D) in addition to the PAS resin (A). Can be done. It is considered that the PAS resin composition has a morphology in which at least each dispersed phase of the thermoplastic resin (B) or the carbonate (C) is formed in the continuous phase of the PAS resin. Further, by using the polyolefin wax (D), the effect of pushing out the thermoplastic resin (B) and the carbonate (C) to the surface of the molded product is enhanced, and as a result, the PAS molded product is subjected to the roughening treatment step. The thermoplastic resin (B) and the carbonate formed on the roughened surface are removed, and the formed voids are easily filled with the metal constituting the metal layer by the metal plating treatment, and adhere to the metal layer. It is thought that the power will be improved.
- the PAS molded product of the present invention can be obtained, for example, by melt molding the PAS resin composition.
- the method for producing a PAS molded product of the present invention includes a step of melt-molding the PAS resin composition. Further, the method of manufacturing PAS molded article of the present invention, the PAS resin composition, preferably a shear rate of 500 sec -1 or less shear area, more preferably from the following shear rate 100 sec -1, 0 sec -1 over a shear area It may have a step of melting with.
- the melt molding may be a known method, and various molding methods such as injection molding, compression molding, extrusion molding of composites, sheets, pipes and the like, drawing molding, blow molding, transfer molding and the like can be applied.
- the temperature range of the resin is equal to or higher than the melting point of the PAS resin, preferably the melting point of + 10 ° C. or higher, more preferably the melting point of + 20 ° C. or higher, and the temperature range.
- the PAS resin composition may be injected into a mold from a resin discharge port for molding. ..
- the mold temperature range is also preferably a known temperature range, for example, room temperature (23 ° C.) or higher, more preferably 40 ° C. or higher, and even more preferably 120 ° C. or higher. Further, the mold temperature is preferably 300 ° C. or lower, more preferably 200 ° C. or lower, and further preferably 180 ° C. or lower.
- the shape of the PAS molded product of the present invention is not particularly limited.
- a conductive pattern When a conductive pattern is formed and used in an electronic circuit application as described later, it may be in the form of a plate, a film or a sheet, for example.
- the thickness is preferably 0.5 mm or more, more preferably 1.0 mm or more, preferably 100 mm or less, and more preferably 10 mm or less.
- the thickness is preferably in the range of 1 ⁇ m or more, preferably 5,000 ⁇ m or less, more preferably 300 ⁇ m or less, and further preferably 200 ⁇ m or less. Further, it may have a three-dimensional shape formed by a mold such as a connector or a flexible tube.
- the PAS molded product thus obtained can be used in the laminate of the present invention and the method for producing the same, as will be described later.
- the laminate of the present invention is a laminate in which a metal layer is laminated on a roughened surface of a molded product obtained by molding a PAS resin composition.
- the PAS resin composition Thermoplastic resin (B), carbonate (C) and olefin wax other than PAS resin selected from the group consisting of PAS resin (A), thermoplastic elastomer (b1) and hydrolyzable thermoplastic resin (b2). It is characterized by blending (D).
- the laminate of the present invention is subjected to a step of roughening the surface of a molded product obtained by molding a PAS resin composition by a chemical etching process (hereinafter, may be simply referred to as a "roughening process”), or a roughening process. It is manufactured by a manufacturing method having a step of performing a metal plating treatment on the surface of the molded product (hereinafter, may be simply referred to as a “metal plating treatment step”).
- the roughening treatment step includes a step of contacting the surface of the PAS molded product with an etching solution such as by applying an etching solution by a dipping method.
- the etching solution is not particularly limited as long as it can remove the thermoplastic resin (B) and the carbonate present on the surface of the PAS molded product, but includes, for example, a strong acid or a salt thereof. Is preferable. Examples of such a strong acid or a salt thereof include chromic acid, sulfuric acid, ammonium fluoride, nitric acid, and chromic anhydride, and one or a combination of two or more of these can be used.
- the conditions for contacting the etching solution with the surface of the PAS molded product are preferably performed while appropriately adjusting the concentration of the strong acid or a salt thereof in the etching solution, the temperature at the time of contact, and the time.
- a known etching solution can be used.
- the etching solution described in JP-A-5-155127 that is, an etching solution consisting of 400 g / liter of sulfuric acid, 400 g / liter of chromic anhydride, and diluted water (the total amount of the etching solution is 1 liter). it can.
- the roughening treatment step at least a part of the thermoplastic resin (B) and the carbonate (C) uniformly dispersed on the surface of the PAS molded product is removed to form voids.
- the presence of the voids or the increase in the specific surface area further improves the interaction with the metal particles constituting the metal layer, and the adhesive force between the PAS molded product and the metal layer is improved.
- the uncured adhesive or the like hangs down due to the influence of its own weight during manufacturing, and the film thickness is biased.
- the unevenness of the voids due to the location on the surface of the molded product tends to be less likely to occur, so that the uniformity of the adhesive force is also excellent.
- the surface roughness of the roughened surface of the PAS molded product is not particularly limited, but from the viewpoint of excellent adhesive strength, the ten-point average roughness Rz is preferably 0.1 ⁇ m or more, more preferably 1 ⁇ m or more. The range is preferably 10 ⁇ m or less, more preferably 5 ⁇ m or less.
- the metal plating treatment step includes a step of forming the roughened surface of the PAS molded product by an electroplating method, an electroless plating method, or a combination thereof.
- the voids formed by removing the thermoplastic resin (B) and the carbonates formed on the roughened surface of the PAS molded product are subjected to metal plating treatment. It is preferable because the metal constituting the metal layer is easily filled, the adhesive force with the metal layer is further improved, and a conductive pattern having excellent conductivity can be obtained.
- an electroless plating method for example, by bringing an electroless plating solution into contact with the roughened surface of the PAS molded product, a metal such as copper contained in the electroless plating solution is precipitated and a metal film is formed.
- An electrolytic plating layer (film) can be formed.
- the electroless plating solution is at least selected from the group consisting of, for example, nickel, copper, chromium, zinc, gold, silver, aluminum, iron, tin, cobalt, tungsten, palladium, lead, platinum, cadmium, rhodium and the like.
- Examples include one metal containing one metal (note that these metals are also referred to as “metals constituting metal plating" and “metals constituting metal layers”), a reducing agent, and a solvent such as an aqueous medium and an organic solvent. Be done.
- reducing agent examples include dimethylaminoborane, hypophosphoric acid, sodium hypophosphate, dimethylamine borane, hydrazine, formaldehyde, sodium borohydride, phenol and the like.
- the electroless plating solution includes, if necessary, monocarboxylic acids such as acetic acid and formic acid; dicarboxylic acid compounds such as malonic acid, succinic acid, adipic acid, maleic acid and fumaric acid; malic acid, lactic acid and glycol. Hydroxycarboxylic acid compounds such as acid, gluconic acid and citric acid; amino acid compounds such as glycine, alanine, iminodiacetic acid, arginine, aspartic acid and glutamic acid; iminodiacetic acid, nitrilotriacetic acid, ethylenediaminediacetic acid, ethylenediaminetetraacetic acid, diethylenetriaminepentaacetic acid and the like.
- monocarboxylic acids such as acetic acid and formic acid
- dicarboxylic acid compounds such as malonic acid, succinic acid, adipic acid, maleic acid and fumaric acid
- malic acid lactic acid and glycol.
- an organic acid such as an aminopolycarboxylic acid compound, or a complexing agent such as a soluble salt of these organic acids (sodium salt, potassium salt, ammonium salt, etc.), an amine compound such as ethylenediamine, diethylenetriamine, triethylenetetramine, etc. You can use the one.
- the electroless plating solution is preferably used in the range of 20 to 98 ° C.
- the electroplating method for example, copper contained in the electroless plating solution is energized in a state where the electroless plating solution is in contact with the surface of the electroless plating layer (film) formed by the electroless plating treatment.
- This is a method of forming an electroless plating layer (metal film) by precipitating a metal such as the above on the surface of the electroless plating layer (film) formed by the electroless treatment placed on the cathode.
- Examples of the electrolytic plating solution include metals such as nickel, copper, chromium, zinc, gold, silver, aluminum, iron, tin, cobalt, palladium, lead, platinum, cadmium, tungsten and rhodium.
- metals such as nickel, copper, chromium, zinc, gold, silver, aluminum, iron, tin, cobalt, palladium, lead, platinum, cadmium, tungsten and rhodium.
- Examples thereof include sulfides (also referred to as "metals constituting metal plating” and “metals constituting metal layers”), sulfuric acid, and an aqueous medium. Specific examples thereof include those containing copper sulfate, sulfuric acid, and an aqueous medium.
- the electrolytic plating solution is preferably used in the range of 20 to 98 ° C.
- the film thickness of the metal layer formed by the metal plating treatment is not particularly limited, but is, for example, preferably in the range of 0.1 ⁇ m or more and preferably 500 ⁇ m or less.
- the film thickness of the metal layer formed by the metal plating treatment can be adjusted by adjusting the treatment time, the current density, the amount of the plating additive used, and the like in the metal plating treatment step.
- the laminate of the present invention produced by the above production method has a metal in the roughened surface of the PAS molded product, that is, in the voids formed by removing the thermoplastic resin (B) and the carbonate (C).
- a metal film is formed by plating, and the metal film adheres to the PAS molded product with high adhesive strength. Therefore, in the electric / electronic field, the laminate of the present invention includes electronic circuits, wiring connectors, optical connectors for optical cables, optical pickups such as Blu-ray and DVD, electromagnetic wave shields, flexible printed substrates, RFID such as non-contact IC cards, and films. It can be applied to various members such as capacitors.
- the mechanical field including automobiles, bearing members, sliding members, lamp reflectors, electrical components, electromagnetic wave shield members, electric motor peripheral members, battery members, heat exchanger members, pressurizing rollers such as laser printers, and water supply (water supply). It can be applied to piping). Further, since the roughened surface of the PAS molded product is less likely to cause unevenness of voids depending on the location and has excellent uniformity of adhesive force, it is complicated such as a laminated body in which a metal layer is laminated on a PAS molded product having a three-dimensional shape. It is also preferable to apply it to a PAS molded product having a shape.
- Examples 1 to 12, Comparative Examples 1 to 8 Manufacturing process of PAS molded products
- each material except glass fiber was uniformly mixed with a tumbler.
- the compounding material is charged into the inlet (top feeder) of a twin-screw extruder with a vent (Japan Steel Works, TEX30 ⁇ ), glass fiber is charged from the side feeder, the resin component discharge amount is 30 kg / hr, and the screw is rotated.
- the number was 220 rpm, the set resin temperature was set to 320 ° C., and the mixture was melt-kneaded, and the strands discharged from the discharge port were cut to obtain pellets.
- the above pellets were supplied to an injection molding machine (SE75D-HP) manufactured by Sumitomo Heavy Industries, which was set to a cylinder temperature of 310 ° C., and the L-shaped molding die shown in FIG. 5 was temperature-controlled to a mold temperature of 140 ° C. It was used for injection molding to obtain an L-shaped molded product.
- SE75D-HP injection molding machine manufactured by Sumitomo Heavy Industries
- electroless copper plating was applied to the roughened surface of the PAS molded product on which the roughened surface obtained above was formed by the following method. It was immersed in an electroless copper plating solution (“OIC Copper” manufactured by Okuno Pharmaceutical Co., Ltd., pH 12.5) at 55 ° C. for 20 minutes to form an electroless copper plating film (thickness 0.5 ⁇ m).
- an electroless copper plating solution (“OIC Copper” manufactured by Okuno Pharmaceutical Co., Ltd., pH 12.5) at 55 ° C. for 20 minutes to form an electroless copper plating film (thickness 0.5 ⁇ m).
- the surface of the electroless copper plating obtained above is placed on the cathode, phosphorus-containing copper is placed on the anode, and electricity is used for 30 minutes at a current density of 2.5 A / dm 2 using an electroplating solution containing copper sulfate.
- an electroplating solution containing copper sulfate By plating, a copper plating layer having a thickness of 15 ⁇ m was laminated on the surface of the electroless copper plating film.
- the electroplating solution 70 g / liter of copper sulfate, 200 g / liter of sulfuric acid, 50 mg / liter of chloride ion, and 5 g / liter of Toplucina SF (brightener manufactured by Okuno Pharmaceutical Co., Ltd.) were used.
- Tables 1 to 4 show the composition of the PPS resin compositions carried out in Examples 1 to 12 and Comparative Examples 1 to 5, and the evaluation results of the adhesiveness test of the metal layer forming the laminate.
- Thermoplastic resin other than PAS resin (B1-1) Olefin-based polymer "Bond First 7L” (ethylene-maleic acid anhydride-glycidyl methacrylate copolymer), manufactured by Sumitomo Chemical Co., Ltd. (B1-2) Olefin-based weight Combined “Engage 8842” (ethylene- ⁇ -olefin polymer), Dow (B2-1) polyamide resin "AMODEL A-1004", Amodel Specialty Polymers (B2-2) polycarbonate resin "Iupiron Iupilon MB4304R", Made by Mitsubishi Chemical Co., Ltd.
- C-1 calcium carbonate "calcium carbonate NS # 2300" (average particle size * 3 1.0 ⁇ m), manufactured by Nitto Kako Kogyo Co., Ltd.
- C-2 calcium carbonate "calcium carbonate first grade” (average) Particle size * 3 6.4 ⁇ m), manufactured by Sankyo Flour Milling Co., Ltd.
- C-3 Magnesium carbonate (synthetic magnetite) "Magthermo MS-S” (average particle size * 3 1.2 ⁇ m), manufactured by Kanjima Chemical Industry Co., Ltd.
- D-Wax High-density polyethylene wax "Luwax AH-6" manufactured by BASF (D-2) Polyethylene anhydride “Recolve CE-2” manufactured by Clariant Japan Co., Ltd. (d-3) Pentaerythritol fatty acid ester " Roxyol VPG-861 "Green Polymer Additive Co., Ltd. (d-4) Montanic acid ester wax” Recolve WE-40 "manufactured by Clarant Japan Co., Ltd.
- E-1 glass fiber "T-717H” fiber length 3 mm, average diameter 10 ⁇ m
- F-1 400 g of chromic anhydride was dissolved in 200 ml of 96% concentrated sulfuric acid and further diluted with water to make the whole 1 liter.
- F-2 100 g of ammonium fluoride was dissolved in 600 ml of a 67% nitric acid aqueous solution, and diluted water was further added to make the whole 1 liter.
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Abstract
Description
前記PAS樹脂組成物は、
PAS樹脂(A)、熱可塑性エラストマー(b1)及び加水分解性を有する熱可塑性樹脂(b2)からなる群から選ばれるPAS樹脂以外の熱可塑性樹脂(B)、炭酸塩(C)およびポリオレフィン系ワックス(D)を配合してなることを特徴とする積層体の製造方法に関する。
前記PAS樹脂組成物が、
PAS樹脂(A)、熱可塑性エラストマー(b1)及び加水分解性を有する熱可塑性樹脂(b2)からなる群から選ばれるPAS樹脂以外の熱可塑性樹脂(B)、炭酸塩(C)およびポリオレフィン系ワックス(D)を配合してなることを特徴とする積層体に関する。
なお、本発明ではPAS成形品表面と金属膜とが互いに接合することを接着と表現する。
前記PAS樹脂組成物は、
PAS樹脂(A)、熱可塑性エラストマー(b1)及び加水分解性を有する熱可塑性樹脂(b2)からなる群から選ばれるPAS樹脂以外の熱可塑性樹脂(B)、炭酸塩(C)およびポリオレフィン系ワックス(D)を配合してなることを特徴とする。
(1)N-メチルピロリドン、ジメチルアセトアミド等のアミド系溶剤やスルホラン等のスルホン系溶媒中で硫化ナトリウムとp-ジクロロベンゼンとを反応させる方法。
(2)p-ジクロロベンゼンを硫黄と炭酸ソーダの存在下で重合させる方法。
(3)極性溶媒とp-ジクロロベンゼンとの混合溶媒に、硫化ナトリウムを滴下するか、水硫化ナトリウムと水酸化ナトリウムとの混合物を滴下するか、又は、硫化水素と水酸化ナトリウムとの混合物を滴下して重合させる方法。
(4)p-クロロチオフェノールの自己縮合による方法。
(5)ジヨード芳香族化合物と、単体硫黄と、必要に応じて官能基を有する重合禁止剤とを、前記ジヨード芳香族化合物及び前記単体硫黄と、またはそれらの反応物と、必要に応じて前記重合禁止剤とを溶融状態で反応させることを含む方法。
前記構造式(10)で表されるテレフタル酸アミド構造を50モル%以上から80モル%以下までの範囲、
前記構造式(11)で表されるイソフタル酸アミド構造を10モル%以上から30モル%以下までの範囲、
前記構造式(12)で表される酸アミド構造を5モル%以上から20モル%以下までの範囲、
で構成されるポリアミド樹脂が好ましい。
(1)テレフタル酸を含むジカルボン酸成分の酸ハライドと、炭素原子数が2以上から12以下までの範囲の脂肪族ジアミンを含むジアミン成分とを、お互いに相溶しない二種の溶媒に溶解した後、アルカリおよび触媒量の第4級アンモニウム塩の存在下に2液を混合、撹拌して重縮合反応を行う界面重合法。
(2)テレフタル酸を含むジカルボン酸成分の酸ハライドと、炭素原子数が2以上から12以下までの範囲の脂肪族ジアミンを含むジアミン成分とを第3級アミンなどの酸を受容するアルカリ性化合物の存在下、有機溶媒中で反応せしめる溶液重合法。
(3)テレフタル酸を含むジカルボン酸成分のジエステル化物と、芳香族ジアミンを原料として溶融状態でアミド交換反応する溶融重合法。
前記PAS樹脂組成物が、
PAS樹脂(A)、熱可塑性エラストマー(b1)及び加水分解性を有する熱可塑性樹脂(b2)からなる群から選ばれるPAS樹脂以外の熱可塑性樹脂(B)、炭酸塩(C)およびオレフィン系ワックス(D)を配合してなることを特徴とする。
該エッチング液としては、PAS成形品の表面に存在する前記熱可塑性樹脂(B)および前記炭酸塩を除去できるものであれば特に限定されるものではないが、例えば、強酸またはその塩を含むものであることが好ましい。このような強酸またはその塩としては、クロム酸、硫酸、フッ化アンモニウム、硝酸、無水クロム酸を例示することができ、これらの1種または2種以上を組み合わせて用いることができる。前記PAS成形品の表面に、エッチング液を接触させる際の条件は、エッチング液中の強酸またはその塩の濃度、接触させる際の温度、時間を、適宜、調整しながら行うことが好ましい。
下記製造例で製造したPPS樹脂を高化式フローテスター(島津製作所、CFT-500D)を用い、300℃、荷重:1.96×106Pa、L/D=10(mm)/1(mm)にて、6分間保持した後に溶融粘度を測定した。
(PAS成形品の製造工程)
表1~5に記載する組成成分および配合量(全て質量部)に従い、ガラス繊維を除く各材料をタンブラーで均一に混合した。その後、ベント付き2軸押出機(日本製鋼所、TEX30α)の投入口(トップフィーダ)に前記配合材料を投入し、サイドフィーダからガラス繊維を投入して、樹脂成分吐出量30kg/hr、スクリュー回転数220rpm、設定樹脂温度を320℃に設定して溶融混練し、吐出口より吐出したストランド状物をカットしてペレットを得た。
上記で得られた成形品を化学エッチング処理液に3~20分間浸漬した後、引き揚げ、成形品に粗化表面を形成させた。
次に、上記で得られた粗化表面が形成されたPAS成形品の粗化表面に以下の方法で無電解銅めっきを施した。無電解銅めっき液(奥野製薬株式会社製「OICカッパー」、pH12.5)中に55℃で20分間浸漬し、無電解銅めっき膜(厚さ0.5μm)を形成た。
<めっき接着性(密着性)の測定>
JIS Z 1522に規定された粘着テープ(粘着力:幅25mm当たり約8N、呼び幅:12~19mm、ニチバン株式会社製セロテープ(登録商標)No.405)を用いてクロスカット試験を行った。すなわち、次の手順で行った。まず、鋭利な刃物で1辺が2mmの正方形が3×6=18マスできるように素地まで達する条痕を作った内側底面と内側側面のそれぞれのめっき面に、テープ端に素地と貼り付けない部分を30~50mm残しつつ、テープ中央をマスの上に置き、指でテープを平らになるように貼る。このとき気泡ができないように注意しながら20N/cm2で約10秒間強く押し続ける。
1分以内に、テープ端の貼り付けずに残した部分を持ち、めっき面に対して90°の角度で200cm/secの速さで剥がす。
内側底面の18マス、内側側面の18マスを、それぞれ評価した。表中、「0/18」は剥離したマスが0個であり、「18/18」は剥離したマスが18個であることを意味する。なお、18マスの内、剥離面が少ないほど接着力が大きいと評価される。
以下に、PAS樹脂組成物の原料となる各成分および化学エッチング処理液を示す。
・PAS樹脂
(A)リニア型PPS(ASTM D1238-86によるMFR:600g/10分)
(B1-1)オレフィン系重合体「ボンドファースト7L」(エチレン-マレイン酸無水物-グリシジルメタクリレート共重合体)、住友化学株式会社製
(B1-2)オレフィン系重合体「Engage8842」(エチレン-α-オレフィン重合体)、ダウ社製
(B2-1)ポリアミド樹脂「AMODEL A-1004」、アモデルスペシャリティポリマーズ社製
(B2-2)ポリカーボネート樹脂「ユーピロンユーピロンMB4304R」、三菱ケミカル株式会社製
(C-1)炭酸カルシウム「炭酸カルシウムNS#2300」(平均粒子径※3 1.0μm)、日東粉化工業株式会社製
(C-2)炭酸カルシウム「炭酸カルシウム1級」(平均粒子径※3 6.4μm)、三共製粉株式会社製
(C-3)炭酸マグネシウム(合成マグネサイト)「マグサーモ MS-S」(平均粒子径※3 1.2μm)、神島化学工業株式会社製」
(D-1)高密度ポリエチレンワックス「ルワックスAH-6」BASF社製
(D-2)無水マレイン酸ポリエチレン「リコルブCE-2」クラリアントジャパン株式会社製
(d-3)ペンタエリスリトール脂肪酸エステル「ロキシオールVPG-861」グリーンポリマーアディティブ社製
(d-4)モンタン酸エステルワックス「リコルブWE-40」クラリアントジャパン株式会社製
(E-1)ガラス繊維「T-717H」(繊維長3mm、平均直径10μm)日本電気硝子株式会社製
F-1:96%濃硫酸200mlに無水クロム酸400gを溶解してさらに水で希釈し、全体を1リットルとした。
F-2:67%硝酸水溶液600mlにフッ化アンモニウム100gを溶解してさらに希釈水を加え、全体を1リットルとした。
Claims (23)
- ポリアリーレンスルフィド樹脂組成物を成形してなる成形品の表面を化学エッチング処理で粗化処理する工程、粗化処理された前記成形品表面に金属めっき処理を行う工程を有する積層体の製造方法であって、
前記ポリアリーレンスルフィド樹脂組成物は、
ポリアリーレンスルフィド樹脂(A)、熱可塑性エラストマー(b1)及び加水分解性を有する熱可塑性樹脂(b2)からなる群から選ばれるポリアリーレンスルフィド樹脂以外の熱可塑性樹脂(B)、炭酸塩(C)およびポリオレフィン系ワックス(D)を配合してなることを特徴とする、
積層体の製造方法。 - 支持体表面を化学エッチング処理で粗化処理する工程が、強酸またはその塩を含むエッチング液を前記PAS成形品の表面と接触させる工程である、請求項1に記載の積層体の製造方法。
- 炭酸塩(C)が、平均粒子径0.3μm以上から6μm以下の範囲の粒状物である、請求項1または2記載の積層体の製造方法。
- 炭酸塩(C)が、炭酸カルシウム、炭酸マグネシウム、炭酸カリウム、炭酸ナトリウム、炭酸水素ナトリウム、炭酸アンモニウム、炭酸バリウム、炭酸リチウム、炭酸銅(II)、炭酸鉄(II)、炭酸銀(I)、炭酸マンガン、炭酸亜鉛、ドロマイトおよびハイドロマグネサイトからなる群から選ばれる少なくとも1つである請求項1~3のいずれか一項記載の積層体の製造方法。
- さらに、繊維状充填剤を含む請求項1~4のいずれか一項に記載の積層体の製造方法。
- 金属めっき処理が、電解めっき法、無電解めっき法およびこれらの組み合わせである請求項1~5のいずれか一項に記載の積層体の製造方法。
- 金属めっきを構成する金属が、ニッケル、銅、クロム、亜鉛、鉄、金、銀、アルミニウム、錫、コバルト、パラジウム、鉛、白金、カドミウム及びロジウムからなる群から少なくとも1種である請求項1~6のいずれか1項記載の積層体の製造方法。
- ポリアリーレンスルフィド樹脂組成物を成形してなる成形品の粗化された表面に、金属層が積層された積層体であって、
前記ポリアリーレンスルフィド樹脂組成物が、
ポリアリーレンスルフィド樹脂(A)、熱可塑性エラストマー(b1)及び加水分解性を有する熱可塑性樹脂(b2)からなる群から選ばれるポリアリーレンスルフィド樹脂以外の熱可塑性樹脂(B)、炭酸塩(C)およびポリオレフィン系ワックス(D)を配合してなることを特徴とする、
積層体。 - 炭酸塩(C)が、平均粒子径0.3μm以上から6μm以下の範囲の粒状物である、請求項8記載の積層体。
- 炭酸塩(C)が、炭酸カルシウム、炭酸マグネシウム、炭酸カリウム、炭酸ナトリウム、炭酸水素ナトリウム、炭酸アンモニウム、炭酸バリウム、炭酸リチウム、炭酸銅(II)、炭酸鉄(II)、炭酸銀(I)、炭酸マンガン、炭酸亜鉛、ドロマイトおよびハイドロマグネサイトからなる群から選ばれる少なくとも1つである請求項8又は9に記載の積層体。
- さらに、繊維状充填剤を含む請求項8~10のいずれか一項に記載の積層体。
- 金属層を構成する金属が、ニッケル、銅、クロム、亜鉛、鉄、金、銀、アルミニウム、錫、コバルト、パラジウム、鉛、白金、カドミウム及びロジウムからなる群から少なくとも1種である請求項8~11のいずれか1項記載の積層体。
- ポリアリーレンスルフィド樹脂(A)、熱可塑性エラストマー(b1)及び加水分解性を有する熱可塑性樹脂(b2)からなる群から選ばれるポリアリーレンスルフィド樹脂以外の熱可塑性樹脂(B)、炭酸塩(C)およびポリオレフィン系ワックス(D)を配合して溶融混錬する工程を有することを特徴とする、ポリアリーレンスルフィド樹脂組成物の製造方法。
- 炭酸塩(C)が、平均粒子径0.3μm以上から6μm以下の範囲の粒状物である、請求項13記載のポリアリーレンスルフィド樹脂組成物の製造方法。
- 炭酸塩(C)が、炭酸カルシウム、炭酸マグネシウム、炭酸カリウム、炭酸ナトリウム、炭酸水素ナトリウム、炭酸アンモニウム、炭酸バリウム、炭酸リチウム、炭酸銅(II)、炭酸鉄(II)、炭酸銀(I)、炭酸マンガン、炭酸亜鉛、ドロマイトおよびハイドロマグネサイトからなる群から選ばれる少なくとも1つである請求項13又は14に記載のポリアリーレンスルフィド樹脂組成物の製造方法。
- さらに、繊維状充填剤を含む請求項13~15のいずれか一項に記載のポリアリーレンスルフィド樹脂組成物の製造方法。
- 請求項13~15のいずれか一項に記載の製造方法で製造されたポリアリーレンスルフィド樹脂組成物を溶融成形する工程を有する、成形品の製造方法。
- ポリアリーレンスルフィド樹脂(A)、熱可塑性エラストマー(b1)及び加水分解性を有する熱可塑性樹脂(b2)からなる群から選ばれるポリアリーレンスルフィド樹脂以外の熱可塑性樹脂(B)、炭酸塩(C)およびポリオレフィン系ワックス(D)を配合してなることを特徴とする、ポリアリーレンスルフィド樹脂組成物。
- 前記ポリアリーレンスルフィド樹脂組成物は、ポリアリーレンスルフィド樹脂(A)100質量部に対して、前記熱可塑性樹脂(B)が5質量部以上から70質量部以下の範囲であり、炭酸塩(C)が10質量部以上から90質量部以下の範囲であり、ポリオレフィン系ワックス(D)が0.01質量部以上から10質量部以下の範囲である、請求項18記載のポリアリーレンスルフィド樹脂組成物。
- 炭酸塩(C)が、平均粒子径0.3μm以上から6μm以下の範囲の粒状物である、請求項18又は19記載のポリアリーレンスルフィド樹脂組成物。
- 炭酸塩が、炭酸カルシウム、炭酸マグネシウム、炭酸カリウム、炭酸ナトリウム、炭酸水素ナトリウム、炭酸アンモニウム、炭酸バリウム、炭酸リチウム、炭酸銅(II)、炭酸鉄(II)、炭酸銀(I)、炭酸マンガン、炭酸亜鉛、ドロマイトおよびハイドロマグネサイトからなる群から選ばれる少なくとも1つである。請求項18~20のいずれか一項に記載のポリアリーレンスルフィド樹脂組成物。
- さらに、繊維状充填剤を含む請求項18~21のいずれか一項に記載のポリアリーレンスルフィド樹脂組成物。
- 請求項18~22のいずれか一項に記載されたポリアリーレンスルフィド樹脂組成物を溶融成形してなる成形品。
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Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6355008B2 (ja) | 1979-04-16 | 1988-11-01 | Matsushita Electric Ind Co Ltd | |
JPH05155127A (ja) | 1991-07-22 | 1993-06-22 | Tsukada Riken Kogyo Kk | 光透過型表示部材及びその製造方法 |
JP2003226810A (ja) * | 2002-02-06 | 2003-08-15 | Idemitsu Petrochem Co Ltd | ポリアリーレンスルフィド樹脂組成物及びそれを用いた成形体 |
WO2007001036A1 (ja) * | 2005-06-28 | 2007-01-04 | Dainippon Ink And Chemicals, Inc. | ポリフェニレンスルフィド樹脂構造体 |
JP2008007758A (ja) * | 2006-05-30 | 2008-01-17 | Toray Ind Inc | ポリフェニレンスルフィド樹脂組成物およびそれからなる成形品 |
WO2014002305A1 (ja) * | 2012-06-26 | 2014-01-03 | ポリプラスチックス株式会社 | 光反射部品及びその製造方法 |
WO2017154879A1 (ja) * | 2016-03-11 | 2017-09-14 | Dic株式会社 | 積層体の製造方法 |
WO2018016411A1 (ja) * | 2016-07-19 | 2018-01-25 | Dic株式会社 | ポリアリーレンスルフィド樹脂組成物、成形品及び製造方法 |
JP2019065101A (ja) * | 2017-09-29 | 2019-04-25 | 株式会社Lixil | めっき用樹脂材、めっき樹脂部材、めっき用樹脂材の製造方法、及びめっき樹脂部材の製造方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6314880A (ja) | 1986-07-04 | 1988-01-22 | Dainippon Ink & Chem Inc | 金属メツキ処理方法 |
JPH02219858A (ja) * | 1989-02-22 | 1990-09-03 | Idemitsu Petrochem Co Ltd | ポリアリーレンスルフィド樹脂組成物及びその成形体 |
US5200271A (en) * | 1989-02-22 | 1993-04-06 | Idemitsu Petrochemical Co., Ltd. | Polyarylene sulfide resin compositions and molded articles |
JPH07207141A (ja) * | 1994-01-14 | 1995-08-08 | Kakihara Kogyo Kk | メッキ特性の優れたポリフェニレンエーテル系樹脂組成物 |
DE69635219T2 (de) * | 1995-04-12 | 2006-07-13 | Sumitomo Chemical Co., Ltd. | Folie aus einer flüssigkristallinen Polyesterzusammensetzung |
US20010051682A1 (en) * | 1999-02-22 | 2001-12-13 | Idemitsu Petrochemical Co., Ltd. | Method of producing the plated molded articles by non-electrode plating, and the resin compositions for that use |
JP2002097292A (ja) | 2000-07-19 | 2002-04-02 | Polyplastics Co | 結晶性熱可塑性樹脂成形品の塗膜形成方法 |
JP2007154167A (ja) * | 2005-11-10 | 2007-06-21 | Toray Ind Inc | ポリフェニレンスルフィド樹脂組成物 |
JP6224331B2 (ja) * | 2013-03-26 | 2017-11-01 | 帝人株式会社 | 熱可塑性樹脂組成物およびその成形品 |
US10280304B2 (en) * | 2014-02-05 | 2019-05-07 | Teijin Limited | Polyarylene sulfide resin composition |
EP3252106A4 (en) * | 2015-01-26 | 2017-12-27 | Teijin Limited | Resin composition |
WO2016208672A1 (ja) * | 2015-06-26 | 2016-12-29 | Dic株式会社 | 積層体、成形品、導電性パターン、電子回路及び電磁波シールド |
JP6681222B2 (ja) | 2016-03-04 | 2020-04-15 | Jfe建材株式会社 | 搬送装置及び搬送方法 |
JP6801296B2 (ja) * | 2016-08-26 | 2020-12-16 | 東レ株式会社 | 複合構造体とその製造方法 |
CN108250668A (zh) * | 2016-12-28 | 2018-07-06 | 东丽先端材料研究开发(中国)有限公司 | 金属接合用树脂组合物及其与金属接合成型品和制造方法 |
-
2020
- 2020-11-26 CN CN202080081633.3A patent/CN114746271A/zh active Pending
- 2020-11-26 KR KR1020227019719A patent/KR20220101661A/ko unknown
- 2020-11-26 WO PCT/JP2020/043923 patent/WO2021106974A1/ja unknown
- 2020-11-26 US US17/776,157 patent/US20220410534A1/en active Pending
- 2020-11-26 EP EP20894899.2A patent/EP4067428A4/en active Pending
- 2020-11-26 JP JP2021545882A patent/JP7107445B2/ja active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6355008B2 (ja) | 1979-04-16 | 1988-11-01 | Matsushita Electric Ind Co Ltd | |
JPH05155127A (ja) | 1991-07-22 | 1993-06-22 | Tsukada Riken Kogyo Kk | 光透過型表示部材及びその製造方法 |
JP2003226810A (ja) * | 2002-02-06 | 2003-08-15 | Idemitsu Petrochem Co Ltd | ポリアリーレンスルフィド樹脂組成物及びそれを用いた成形体 |
WO2007001036A1 (ja) * | 2005-06-28 | 2007-01-04 | Dainippon Ink And Chemicals, Inc. | ポリフェニレンスルフィド樹脂構造体 |
JP2008007758A (ja) * | 2006-05-30 | 2008-01-17 | Toray Ind Inc | ポリフェニレンスルフィド樹脂組成物およびそれからなる成形品 |
WO2014002305A1 (ja) * | 2012-06-26 | 2014-01-03 | ポリプラスチックス株式会社 | 光反射部品及びその製造方法 |
WO2017154879A1 (ja) * | 2016-03-11 | 2017-09-14 | Dic株式会社 | 積層体の製造方法 |
WO2018016411A1 (ja) * | 2016-07-19 | 2018-01-25 | Dic株式会社 | ポリアリーレンスルフィド樹脂組成物、成形品及び製造方法 |
JP2019065101A (ja) * | 2017-09-29 | 2019-04-25 | 株式会社Lixil | めっき用樹脂材、めっき樹脂部材、めっき用樹脂材の製造方法、及びめっき樹脂部材の製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022113710A1 (ja) * | 2020-11-26 | 2022-06-02 | 東レ株式会社 | ポリフェニレンサルファイド樹脂組成物および成形品 |
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