WO2021090542A1 - 搬送車システム - Google Patents
搬送車システム Download PDFInfo
- Publication number
- WO2021090542A1 WO2021090542A1 PCT/JP2020/028768 JP2020028768W WO2021090542A1 WO 2021090542 A1 WO2021090542 A1 WO 2021090542A1 JP 2020028768 W JP2020028768 W JP 2020028768W WO 2021090542 A1 WO2021090542 A1 WO 2021090542A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- container
- inert gas
- transport vehicle
- foup
- support base
- Prior art date
Links
- 239000011261 inert gas Substances 0.000 claims abstract description 106
- 239000007789 gas Substances 0.000 claims abstract description 98
- 230000032258 transport Effects 0.000 claims abstract description 84
- 238000003860 storage Methods 0.000 claims description 40
- 230000003028 elevating effect Effects 0.000 claims description 31
- 238000002347 injection Methods 0.000 claims description 24
- 239000007924 injection Substances 0.000 claims description 24
- 230000001105 regulatory effect Effects 0.000 claims description 6
- 238000000034 method Methods 0.000 description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- 229910001873 dinitrogen Inorganic materials 0.000 description 16
- 210000000078 claw Anatomy 0.000 description 11
- 238000012546 transfer Methods 0.000 description 11
- 239000004065 semiconductor Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 5
- 238000012544 monitoring process Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 2
- 230000003111 delayed effect Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G1/00—Storing articles, individually or in orderly arrangement, in warehouses or magazines
- B65G1/02—Storage devices
- B65G1/04—Storage devices mechanical
- B65G1/0457—Storage devices mechanical with suspended load carriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
- H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/6773—Conveying cassettes, containers or carriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67733—Overhead conveying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67736—Loading to or unloading from a conveyor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2201/00—Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
- B65G2201/02—Articles
- B65G2201/0297—Wafer cassette
Definitions
- This disclosure relates to a transport vehicle system.
- an inert gas such as nitrogen gas is injected into a container such as FOUP (Front Opening Unified Pod) that houses the semiconductor substrate to eliminate oxygen in the container.
- FOUP Front Opening Unified Pod
- N2 purge is known.
- Patent Document 1 discloses an article transport facility provided with a nitrogen gas supply device that supplies nitrogen gas to the FOUP held by the ceiling carrier.
- the nitrogen gas supply device is provided at a position along the traveling path of the ceiling carrier.
- Patent Document 2 discloses a configuration in which a nitrogen gas storage cylinder is provided on an automatic guided vehicle (AGV) that conveys an object to be conveyed such as a semiconductor element.
- the nitrogen gas storage cylinder stores nitrogen gas to be supplied to the storage chamber of the object to be transported in the transport vehicle.
- AGV automatic guided vehicle
- nitrogen gas can be supplied to the FOUP held by the ceiling carrier only at the gas supply position provided with the nitrogen gas supply device. Therefore, when the traveling time of the ceiling carrier is long, the nitrogen gas in the FOUP gradually decreases during the running of the ceiling carrier, and the semiconductor substrate in the FOUP may be oxidized.
- nitrogen gas can be supplied from the nitrogen gas storage cylinder to the storage chamber during transportation of the object to be transported, but the nitrogen gas in the nitrogen gas storage cylinder is not emptied. It is necessary to regularly replace the nitrogen gas storage cylinder.
- One aspect of the present disclosure is to provide a transport vehicle system capable of efficiently maintaining the supply of inert gas to a container during transport.
- the transport vehicle system is a transport vehicle that travels on a track and transports a container, and has a storage unit for storing an inert gas, and the storage unit is used during transportation of the container. It includes a transport vehicle that supplies an inert gas inside the container, and a gas supply device that is provided along the track and supplies the inert gas to the storage portion of the transport vehicle.
- the transport vehicle has a storage unit for supplying an inert gas inside the container being transported.
- the inert gas can be continuously supplied into the container during the transportation of the container, and the state in which the inside of the container is appropriately filled with the inert gas can be appropriately maintained.
- a gas supply device for supplying the inert gas to the storage unit is provided along the track on which the transport vehicle travels. Thereby, the inert gas can be easily and appropriately supplied (replenished) to the storage portion of the transport vehicle.
- the carrier is run along the track to the position where the gas supply device is provided (gas supply position) to replenish the inert gas, thereby replenishing the storage section.
- the state in which the inert gas is stored can be appropriately maintained.
- the supply of the inert gas to the container during transport can be efficiently maintained.
- the carrier system monitors the state of the inert gas stored in the storage section, determines whether or not the inert gas needs to be supplied to the storage section based on the state of the inert gas, and determines whether or not the inert gas needs to be supplied to the storage section. If it is determined that the supply of the inert gas is necessary, the controller may further include a controller for traveling the carrier to the position where the gas supply device is provided. According to the above configuration, the controller can automate the monitoring of the state of the inert gas in the storage unit and the replenishment of the inert gas into the storage unit. As a result, it is appropriately prevented that the inert gas in the storage portion of the transport vehicle is emptied.
- the transport vehicle is connected to a storage unit and is connected to a gas supply pipe for passing an inert gas and an injection port provided at the tip of the gas supply pipe and provided on the bottom surface of the container to release the inert gas. It may have a nozzle to be supplied to the inside of the container and a support base that supports the bottom surface of the container and can fix the nozzle at a position corresponding to the injection port of the container.
- the container is supported by the support base and the load of the container is applied to the support base, so that the injection port of the container and the nozzle fixed to the support base can be closely connected to each other.
- the inert gas in the storage unit can be supplied into the container in a stable state through the gas supply pipe, the nozzle, and the injection port.
- the transport vehicle further has a main body in which the container is stored during transportation of the container, and a lifting mechanism that allows the container to be suspended and lifts and lowers with respect to the main body, and the support base is provided by at least the lifting mechanism. It may be configured so that it can be retracted to a retracted position that does not interfere with the container suspended by the elevating mechanism and the elevating mechanism during the evacuation operation. According to the above configuration, since the support base is configured to be retractable to the evacuation position, it is possible to appropriately perform the container transfer operation (loading or unloading) accompanied by the evacuation operation by the evacuation mechanism.
- the container In the transport vehicle, the container is stored in the main body by grasping the container with the elevating mechanism and raising the container with the support base retracted to the evacuation position, and after the container is stored in the main body, the support base is used. May be placed below the container from the retracted position, and after the support base is placed below the container, the elevating mechanism may be operated so that the container is placed on the support base.
- the elevating mechanism may be operated so that the container is placed on the support base.
- the support base may have a regulating member that regulates the vertical movement of the container. According to the above configuration, the container is prevented from popping upward with respect to the support during the transportation of the container (during the supply of the inert gas into the container). This makes it possible to stabilize the connection state between the injection port of the container and the nozzle fixed to the support base.
- FIG. 1 is a diagram showing a ceiling carrier system according to an embodiment.
- FIG. 2 is a diagram showing a locking mechanism provided on the support base.
- FIG. 3 is a diagram showing a state in which the inert gas is supplied from the gas supply device to the ceiling carrier.
- FIG. 4 is a flowchart showing an example of the operation of the ceiling carrier system.
- FIG. 5 is a flowchart showing an example of the operation of the ceiling carrier from grabbing the FOUP to unloading it.
- 6 (A) and 6 (B) are views showing the operation of the ceiling carrier during the load gripping process.
- 7 (A) and 7 (B) are views showing the operation of the ceiling carrier during the load gripping process.
- FIG. 1 is a diagram showing a ceiling carrier system according to an embodiment.
- the ceiling transport vehicle system 1 (conveyance system) includes a traveling rail 2 (track), a ceiling transport vehicle 3 (transport vehicle), a gas supply device 4, and a host controller 5. ing.
- the traveling rail 2 is provided at a position higher than the floor surface (for example, the ceiling of a clean room).
- the ceiling carrier 3 travels on the traveling rail 2.
- the ceiling carrier 3 transports a FOUP10 (container), a reticle pod, or the like between, for example, a storage facility and a predetermined load port.
- the ceiling transport vehicle system 1 includes a plurality of ceiling transport vehicles 3, but in the present embodiment, one ceiling transport vehicle 3 will be focused on.
- the FOUP 10 accommodates a plurality of semiconductor wafers and the like.
- the FOUP 10 has a flange 10a gripped by the ceiling carrier 3. Further, the bottom surface 10b of the FOUP 10 is provided with an injection port 10c that communicates the inside of the FOUP 10 (in the present embodiment, a storage chamber in which a plurality of semiconductor wafers are housed) and the outside.
- the direction along the traveling rail 2 is the X-axis direction
- the vertical direction is the Z-axis direction
- the X-axis direction and the Z-axis are the directions along the traveling rail 2
- the direction orthogonal to both directions is defined as the Y-axis direction.
- the X-axis direction is also the traveling direction of the ceiling carrier 3.
- the Y-axis direction is also the width direction of the ceiling carrier 3.
- the ceiling carrier 3 includes a main body 31, a traveling unit 32, an elevating mechanism 33, a tank 34 (storage unit), a gas supply pipe 35, a controller 36, and a support base 37. And have.
- FIG. 1 shows a ceiling carrier 3 that conveys the FOUP 10 while supplying an inert gas to the inside of the FOUP 10.
- the main body 31 is located below the traveling rail 2.
- the traveling unit 32 is a member (for example, a roller or the like) that travels along the traveling rail 2.
- the main body portion 31 is suspended and supported by the traveling portion 32.
- a storage space S for storing the FOUP 10 is formed inside the main body 31.
- the main body portion 31 has a pair of wall portions that cover the FOUP 10 in the front-rear direction (that is, both sides of the FOUP 10 in the X-axis direction).
- the storage space S is a space sandwiched between the pair of wall portions.
- the elevating mechanism 33 has a grip portion 33a that grips the flange 10a of the FOUP 10, and one or a plurality (for example, four) belts 33b that are connected to the grip portion 33a and elevate with respect to the main body portion 31. ..
- the elevating mechanism 33 elevates and elevates the grip portion 33a by winding up or feeding out the belt 33b. As a result, the raising and lowering operation of the FOUP 10 held by the grip portion 33a is realized.
- the tank 34 stores an inert gas such as nitrogen gas.
- the tank 34 is, for example, a gas cylinder or the like that stores an inert gas in a compressed state.
- the tank 34 has a discharge port 34a for discharging the inert gas in the tank 34 to the outside, and a supply port 34b (see FIG. 3) for supplying (replenishing) the inert gas into the tank 34. doing.
- the gas supply pipe 35 is a hollow tubular member that is connected to the discharge port 34a of the tank 34 and allows the inert gas from the tank 34 to flow.
- a nozzle 35a is provided at the end (tip) of the gas supply pipe 35 opposite to the tank 34 side.
- the nozzle 35a is connected to the injection port 10c of the FOUP 10.
- the inert gas discharged from the discharge port 34a of the tank 34 is supplied to the inside of the FOUP 10 via the gas supply pipe 35, the nozzle 35a, and the injection port 10c.
- the inert gas filled inside the FOUP 10 gradually leaks to the outside through a minute gap or the like of the FOUP 10.
- the FOUP 10 may be provided with an exhaust port (not shown) for appropriately adjusting the gas pressure or the like in the FOUP 10.
- the controller 36 is an electronic control unit composed of a computer having a processor (for example, CPU or the like) and a memory (for example, ROM or RAM or the like).
- the controller 36 controls various operations of the ceiling carrier 3.
- the controller 36 can communicate with the upper controller 5 that outputs a transport command (for example, a travel command including information on the unloading point and the unloading point) to the ceiling carrier 3 by wireless communication or the like.
- the controller 36 has a sensor or the like that monitors the state of the inert gas stored in the tank 34 (for example, the amount of gas (remaining amount), gas pressure, etc.). As an example, the controller 36 determines whether or not the supply (replenishment) of the inert gas to the tank 34 is necessary based on the state of the inert gas in the tank 34. For example, when the controller 36 detects that the gas amount and / or gas pressure of the inert gas in the tank 34 is less than a preset threshold value, the controller 36 needs to supply the inert gas to the tank 34. Is determined to be.
- the controller 36 When it is determined that the supply of the inert gas to the tank 34 is necessary, the controller 36 notifies the host controller 5 of information indicating that fact, as an example.
- the host controller 5 sets the position of the ceiling transport vehicle 3 that is the notification source of the information, the planned travel route of the ceiling transport vehicle 3 (for example, the travel route according to the transport command assigned to the ceiling transport vehicle 3), and the like. Based on this, the optimum gas supply device 4 is determined. For example, the host controller 5 determines the gas supply device at the current position of the ceiling carrier 3 or the position closest to the planned travel path of the ceiling carrier 3 as the optimum gas supply device 4.
- the host controller 5 notifies the controller 36 of the ceiling carrier 3 of the determined travel command to the gas supply device 4.
- the controller 36 controls the operation of the ceiling carrier 3 so as to travel to the position where the gas supply device 4 is provided.
- the controller 36 determines whether or not the supply of the inert gas to the tank 34 is necessary, but the determination may be made by the host controller 5. For example, the controller 36 may notify the host controller 5 of information on the amount and / or gas pressure of the inert gas in the tank 34, and the host controller 5 may make the above determination based on the information. Further, in the above example, the traveling control to the gas supply device 4 is realized by the controller 36 and the upper controller 5, but the function of the upper controller 5 described above may be mounted on the controller 36. That is, the controller 36 mounted on the ceiling carrier 3 may autonomously perform the above-mentioned control. In this case, the host controller 5 may be omitted.
- the support base 37 is a member for supporting the bottom surface 10b of the FOUP 10 during the transportation of the FOUP 10 (that is, while the inert gas is being supplied to the FOUP 10).
- the support base 37 is formed in a flat plate shape.
- the support base 37 is configured so that the nozzle 35a can be fixed at a position corresponding to the injection port 10c of the FOUP 10.
- the tip portion of the gas supply pipe 35 that is, the portion provided with the nozzle 35a
- An insertion hole 37a is formed.
- the nozzle 35a inserted and fixed in the insertion hole 37a is arranged at a position facing the injection port 10c of the FOUP 10 in the Z-axis direction. Then, the FOUP 10 is placed on the support base 37, and the load of the FOUP 10 is applied to the support base 37, so that the injection port 10c is in close contact with the nozzle 35a, and the injection port 10c and the nozzle 35a are connected.
- the support base 37 is a support position for supporting the bottom surface 10b of the FOUP 10 during transportation of the FOUP 10 (that is, a position below the FOUP 10 and the elevating mechanism 33, and is viewed from the Z-axis direction. (Position that overlaps with FOUP10).
- the support base 37 if the support base 37 is fixed to the support position, the support base 37 interferes with the elevating mechanism 33 or the FOUP 10 suspended by the elevating mechanism 33 during the elevating operation of the elevating mechanism 33. Therefore, the support base 37 is configured to be able to retract to a retracted position that does not interfere with the elevation mechanism 33 or the FOUP 10 during the elevation operation by the elevation mechanism 33.
- the support base 37 has a support state arranged at the support position to support the bottom surface 10b of the FOUP 10 being conveyed and a retracted state arranged at the retracted position so as not to interfere with the evacuation operation of the evacuation mechanism 33. It is configured to be switchable.
- the support base 37 may be configured to be slidable in the traveling direction (X-axis direction) or width direction (Y-axis direction) of the ceiling carrier 3.
- the position slid from the support position in the X-axis direction or the Y-axis direction is the above-mentioned retracted position.
- the support state and the retracted state can be switched by sliding the support base 37 in the horizontal direction.
- the mode of movement of the support base 37 between the support position and the retracted position and the retracted position are not limited to the above modes.
- the support base 37 may be configured to be rotatable around the X-axis or the Y-axis.
- the support base 37 may be arranged on the side of the storage space S in the retracted state along the XZ plane or the YZ plane.
- the support base 37 may be configured to be foldable.
- the support base 37 may be arranged on the side of the storage space S in the retracted state with the support base 37 folded.
- the nozzle 35a may be configured to be fixed to the support base 37 at least in the support state, and the nozzle 35a may be removed from the support base 37 in the retracted state.
- the support base 37 includes a lock mechanism 38 for restricting the movement of the FOUP 10 with respect to the support base 37.
- the lock mechanism 38 has a claw portion 38a (regulatory member) that regulates the movement of the FOUP 10 in the vertical direction (Z-axis direction) and a pin 38b that regulates the movement of the FOUP 10 in the horizontal direction (X-axis direction or Y-axis direction). And have.
- the FOUP 10 includes the above-mentioned bottom surface 10b and has a bottom surface flange 10d protruding in the X-axis direction or the Y-axis direction. Further, the claw portion 38a is formed in a hook shape and comes into contact with the upper surface and the side surface of the end portion of the bottom surface flange 10d. As shown in FIG. 2, when the bottom surface flange 10d is sandwiched between the claw portion 38a and the support base 37, the bottom surface flange 10d protrudes upward with respect to the support base 37 (that is, in the vertical direction of the FOUP 10). Movement) is regulated.
- the claw portion 38a is configured to, for example, detect that the FOUP 10 is placed on the support base 37 (the load of the FOUP 10 is applied) and shift to the locked state shown in FIG. Further, when the lifting operation by the lifting mechanism 33 is executed at the time of unloading or the like, the claw portion 38a is locked in order to shift the support base 37 to the retracted state based on, for example, a release signal from the controller 36. Is configured to release.
- the claw portion 38a may be provided at one place or at a plurality of places.
- the claw portions 38a may be provided at two positions located on the diagonal line of the support base 37 having a substantially rectangular shape when viewed from the Z-axis direction, or may be provided at the four corners of the support base 37.
- the claw portions 38a are provided at a plurality of locations in this way, the movement of the FOUP 10 in the horizontal direction is also restricted by the claw portions 38a.
- the bottom flange 10d of the FOUP 10 is provided with a plurality of (for example, three) positioning holes 10e.
- the pin 38b is provided at a position corresponding to the positioning hole 10e. That is, the pin 38b is inserted into the positioning hole 10e in a state where the FOUP 10 is placed on the support base 37.
- the horizontal movement of the FOUP 10 with respect to the support 37 is also regulated by such pins 38b.
- the gas supply device 4 is a device for supplying the inert gas to the tank 34 of the ceiling carrier 3.
- the gas supply device 4 is provided along the traveling rail 2 so as not to interfere with the traveling of the ceiling carrier 3 along the traveling rail 2.
- the gas supply device 4 may be attached to the traveling rail 2 or may be attached to another member (for example, a ceiling or the like) arranged in the vicinity of the traveling rail 2.
- one gas supply device 4 may be provided, or a plurality of gas supply devices 4 may be provided.
- the gas supply device 4 stores the inert gas for supplying to the ceiling carrier 3, and is located at a predetermined position of the traveling rail 2 (in the present embodiment, a position below the gas supply device 4).
- the inert gas can be supplied to the tank 34 of the transport vehicle 3. That is, the gas supply device 4 functions as a station for supplying the inert gas to the ceiling carrier 3.
- the above-mentioned predetermined position is referred to as a “gas supply position”.
- FIG. 3 is a diagram showing a state in which the gas supply device 4 supplies the inert gas to the ceiling carrier 3. That is, the gas supply device 4 supplies the inert gas to the tank 34 of the ceiling carrier 3 while the ceiling carrier 3 is stopped at the gas supply position.
- the gas supply device 4 has a gas supply pipe 4a for flowing an inert gas from a supply source (not shown). Then, when the gas supply device 4 detects that the ceiling carrier 3 has stopped at the gas supply position, it controls the operation of the gas supply pipe 4a and supplies the connection port (tip portion) of the gas supply pipe 4a to the tank 34. Connect to port 34b.
- the inert gas from the supply source of the gas supply device 4 is supplied to the tank 34 via the gas supply pipe 4a and the supply port 34b.
- FIG. 3 illustrates the ceiling carrier 3 that does not carry the FOUP 10
- the gas supply device 4 may supply the inert gas to the ceiling carrier 3 that is carrying the FOUP 10. Good.
- the processing of supplying the inert gas from the gas supply device 4 to the tank 34 of the ceiling carrier 3 is performed as follows, for example. That is, the gas supply device 4 receives a supply request signal including information on the required gas supply amount from the controller 36 of the ceiling carrier 3 stopped at the gas supply position. Then, the gas supply device 4 executes the above-mentioned gas supply operation (that is, connection of the gas supply pipe 4a to the supply port 34b and supply of the inert gas) with the reception of the supply request signal as a trigger. .. Then, when the supply of the gas supply amount is completed, the gas supply device 4 notifies the controller 36 of the completion of the gas supply and disconnects the gas supply pipe 4a and the supply port 34b of the tank 34. As a result, the ceiling carrier 3 is disconnected from the gas supply device 4 and can move along the traveling rail 2.
- the controller 36 of the ceiling carrier 3 continuously monitors the state of the inert gas in the tank 34 (as an example in this embodiment, the amount of gas and the gas pressure) (step S1). ). Then, while the amount of gas and the gas pressure in the tank 34 are equal to or higher than the preset threshold values (step S1: YES), the controller 36 travels based on the instruction from the upper controller 5 while continuing the above monitoring. The running of the rail 2 and the conveying operation of the FOUP 10 are executed.
- step S1 NO
- the controller 36 receives the gas supply from the gas supply device 4 (that is, the gas supply device 4). Control of traveling to the gas supply position) (step S2).
- the controller 36 notifies the upper controller 5 that the inert gas needs to be supplied to the tank 34, and based on the subsequent instruction from the upper controller 5.
- the ceiling carrier 3 is driven to the designated gas supply position. Subsequently, after the ceiling carrier 3 arrives at the gas supply position, the above-mentioned inert gas supply process is performed (step S3).
- step S11 the controller 36 confirms whether or not the support base 37 is in the retracted state (that is, whether or not the support base 37 is located in the retracted position) (step S11). If the support base 37 is in the retracted state (step S11: YES), the process proceeds to step S13.
- step S11: NO when the support base 37 is not in the retracted state (step S11: NO), that is, when the support base 37 is located at the support position (below the elevating mechanism 33), the support base 37 is retracted to the retracted position (step S11: NO).
- step S12 the elevating mechanism 33 can be lowered in order to grab the FOUP 10 located below the ceiling carrier 3.
- steps S11 and S12 described above are processes for ensuring safety, and are not essential processes. Specifically, when the previous unloading process is normally completed, the support base 37 is guaranteed to be in the retracted state. Therefore, if it is confirmed that the previous unloading process has been completed normally, the processes of steps S11 and S12 may be omitted.
- the controller 36 executes the load-grabbing process of the FOUP10 to be transferred (step S13). Specifically, the controller 36 lowers the elevating mechanism 33 by feeding out the belt 33b, and causes the grip portion 33a to grip the flange 10a of the FOUP 10 to be transferred (see FIG. 6A). Then, the controller 36 raises the elevating mechanism 33 by winding up the belt 33b, and stores the FOUP 10 in the storage space S (see FIG. 6B).
- the controller 36 shifts the support base 37 to the support state (see FIG. 7 (A)), and places the FOUP 10 on the support base 37 (see FIG. 7 (B)) (step S14).
- the elevating mechanism 33 is lowered by feeding out the belt 33b.
- the load of FOUP 10 is applied to the support base 37. That is, the bottom surface 10b of the FOUP 10 is supported by the support base 37.
- the grip of the flange 10a by the grip portion 33a may be released.
- the injection port 10c of the FOUP 10 and the nozzle 35a fixed to the support base 37 are connected.
- the bottom flange 10d of the FOUP 10 is locked by the lock mechanism 38.
- step S15 the supply of the inert gas stored in the tank 34 into the FOUP 10 is started via the gas supply pipe 35, the nozzle 35a, and the injection port 10c (step S15).
- step S16: NO the ceiling carrier 3 travels on the traveling rail 2 while supplying the inert gas from the tank 34 into the FOUP 10.
- the controller 36 detects that, for example, the ceiling carrier 3 has moved to the unloading position of the FOUP 10 (or a position within a predetermined distance from the unloading position), the transfer process (unloading process) of the FOUP 10 is required. Judgment (step S16: YES).
- the controller 36 stops the supply of the inert gas from the tank 34 into the FOUP 10 in order to execute the unloading process of the FOUP 10 (step S17), and retracts the support base 37 (that is, FIG. 6 (B). ) (Step S18). Subsequently, the controller 36 executes the unloading process of the FOUP 10. Specifically, the controller 36 lowers the elevating mechanism 33 by feeding out the belt 33b, places the FOUP 10 in an unloading position such as a storage shelf, and then releases the grip of the flange 10a by the grip portion 33a. As a result, the unloading process of FOUP10 is completed.
- the ceiling transport vehicle 3 has a tank 34 for supplying the inert gas inside the FOUP 10 being transported.
- the inert gas can be continuously supplied into the FOUP 10 during the transportation of the FOUP 10, and the state in which the inside of the FOUP 10 is filled with the inert gas can be appropriately maintained.
- a gas supply device 4 for supplying an inert gas to the tank 34 is provided along the traveling rail 2 on which the ceiling carrier 3 travels. As a result, the inert gas can be easily and appropriately supplied (replenished) to the tank 34 of the ceiling carrier 3.
- the overhead carrier 3 is run along the traveling rail 2 to the position where the gas supply device 4 is provided (gas supply position) to replenish the inert gas.
- the state in which the inert gas is stored in the tank 34 can be appropriately maintained.
- the supply of the inert gas to the FOUP 10 during transport can be efficiently maintained.
- the ceiling carrier system 1 includes a controller (in this embodiment, the controller 36 and the host controller 5).
- the controller monitors the state of the inert gas stored in the tank 34, determines whether or not the supply of the inert gas to the tank 34 is necessary based on the state of the inert gas, and determines whether the inert gas needs to be supplied to the tank 34.
- the ceiling carrier 3 is driven to the gas supply position.
- the controller can automate the monitoring of the state of the inert gas in the tank 34 and the replenishment of the inert gas in the tank 34.
- the inert gas in the tank 34 of the ceiling carrier 3 is appropriately prevented from being emptied. That is, according to the above configuration, the gas shortage in the tank 34 is reduced while reducing the labor of manually checking the remaining amount of the inert gas in the tank 34 of the ceiling carrier 3 and replacing the tank 34. Can be appropriately prevented.
- the ceiling carrier 3 is connected to the tank 34 and is connected to a gas supply pipe 35 for circulating an inert gas and an injection port 10c provided at the tip of the gas supply pipe 35 and provided on the bottom surface 10b of the FOUP 10.
- the FOUP 10 is supported by the support base 37 and the load of the FOUP 10 is applied to the support base 37, so that the injection port 10c of the FOUP 10 and the nozzle 35a fixed to the support base 37 are closely connected to each other. be able to.
- the inert gas in the tank 34 can be supplied into the FOUP 10 in a stable state via the gas supply pipe 35, the nozzle 35a, and the injection port 10c.
- the ceiling carrier 3 has a main body 31 in which the FOUP 10 is stored during the transportation of the FOUP 10, and an elevating mechanism 33 that allows the FOUP 10 to be suspended and moves up and down with respect to the main body 31.
- the support base 37 is configured to be retractable to a retracted position that does not interfere with the FOUP 10 suspended by the elevating mechanism 33 and the elevating mechanism 33, at least during the evacuation operation by the elevating mechanism 33. According to the above configuration, since the support base 37 is configured to be retractable to the retracted position, it is possible to appropriately perform the transfer operation (loading or unloading) of the FOUP 10 accompanied by the evacuation operation by the evacuation mechanism 33. ..
- the ceiling carrier 3 stores the FOUP 10 in the main body 31 by grasping and raising the FOUP 10 by the elevating mechanism 33 in a state where the support base 37 is retracted to the retracted position (step in FIG. 5). S11 to S13). Then, in the ceiling carrier 3, after the FOUP 10 is stored in the main body 31, the support base 37 is arranged below the FOUP 10 (that is, the support position) from the retracted position (see FIG. 7A), and the support base 37 is placed. Is placed below the FOUP10, and then the evacuation mechanism 33 is operated so that the FOUP10 is placed on the support base 37 (see FIG. 7B).
- the FOUP 10 can be smoothly transitioned to a state in which the inert gas from the tank 34 can be supplied into the FOUP 10 after being loaded. Can be made to.
- the support base 37 has a claw portion 38a that restricts the movement of the FOUP 10 in the vertical direction.
- the FOUP 10 is prevented from jumping upward with respect to the support base 37 during the transportation of the FOUP 10 (during the supply of the inert gas into the FOUP 10).
- the connection state between the injection port 10c of the FOUP 10 and the nozzle 35a fixed to the support base 37 can be stabilized.
- the host controller 5 that allocates the transport command (transport of the FOUP 10 from the first point to the second point) to the ceiling transport vehicle 3 determines the state of the inert gas (gas amount and / or) in the tank 34 of the ceiling transport vehicle 3.
- Various transport controls can be performed based on the gas pressure, etc.).
- the host controller 5 gives a transport command based on the remaining amount of the inert gas in each tank 34 of the plurality of ceiling transport vehicles 3 arranged in the ceiling transport vehicle system 1 and the transport distance related to the transport command.
- the ceiling carrier 3 to be assigned to may be determined.
- the host controller 5 may determine the ceiling transport vehicle 3 having the tank 34 that stores the amount of gas that does not empty the inert gas during the transport of the FOUP 10 as the allocation destination of the transport command.
- the inert gas in the tank 34 can be prevented from being emptied during the transfer of the FOUP 10, and the oxidation of the semiconductor wafer in the FOUP 10 can be appropriately prevented.
- the ceiling carrier 3 in which the FOUP 10 is transferred in the vertical direction by the elevating mechanism 33 is illustrated, but the ceiling carrier 3 is configured so that the FOUP 10 can be transferred in the horizontal direction (Y-axis direction). You may. Further, when the ceiling carrier 3 is a trolley dedicated to lateral transfer in this way, it is not always necessary to retract the support pedestal 37 during the transfer operation of the FOUP 10 (at the time of grabbing or unloading). That is, the support base 37 may be a member fixed at the above-mentioned support position.
- the ceiling transport vehicle system 1 including a plurality of overhead transport vehicles has been described, but the transport vehicle in the transport vehicle system is a vehicle traveling on a track. It may be a ground transport vehicle that travels on a rail provided on the ground, for example.
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (6)
- 軌道と、
前記軌道を走行して容器を搬送する搬送車であって、不活性ガスを貯留する貯留部を有し、前記容器の搬送中に前記貯留部から前記容器の内部に前記不活性ガスを供給する前記搬送車と、
前記軌道に沿って設けられ、前記搬送車の前記貯留部に前記不活性ガスを供給するガス供給装置と、を備える搬送車システム。 - 前記貯留部に貯留されている前記不活性ガスの状態を監視し、前記不活性ガスの状態に基づいて前記貯留部への前記不活性ガスの供給が必要であるか否かを判定し、前記不活性ガスの供給が必要であると判定された場合に、前記搬送車を前記ガス供給装置が設けられた位置まで走行させるコントローラを更に備える、請求項1に記載の搬送車システム。
- 前記搬送車は、
前記貯留部と接続され、前記不活性ガスを流通させるガス供給管と、
前記ガス供給管の先端に設けられ、前記容器の底面に設けられた注入口に接続されることにより、前記不活性ガスを前記容器の内部に供給するノズルと、
前記容器の前記底面を支持すると共に、前記容器の前記注入口に対応する位置に前記ノズルを固定可能な支持台と、を有する、請求項1又は2に記載の搬送車システム。 - 前記搬送車は、前記容器の搬送中に前記容器が格納される本体部と、前記容器を吊り下げ可能とされ、前記本体部に対して昇降する昇降機構と、を更に有し、
前記支持台は、少なくとも前記昇降機構による昇降動作時において、前記昇降機構及び前記昇降機構により吊り下げられた前記容器と干渉しない退避位置に退避可能に構成されている、請求項3に記載の搬送車システム。 - 前記搬送車は、
前記支持台を前記退避位置に退避させた状態で、前記昇降機構で前記容器を荷掴みして上昇させることにより、前記容器を前記本体部内に格納し、
前記容器が前記本体部内に格納された後に、前記支持台を前記退避位置から前記容器の下方に配置し、
前記支持台が前記容器の下方に配置された後に、前記容器が前記支持台上に載置されるように前記昇降機構を動作させる、請求項4に記載の搬送車システム。 - 前記支持台は、前記容器の上下方向への移動を規制する規制部材を有する、請求項3~5のいずれか一項に記載の搬送車システム。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202080063388.3A CN114365271A (zh) | 2019-11-05 | 2020-07-27 | 输送车系统 |
US17/769,853 US20220375774A1 (en) | 2019-11-05 | 2020-07-27 | Transport vehicle system |
EP20883714.6A EP4057325A4 (en) | 2019-11-05 | 2020-07-27 | TRANSPORT VEHICLE SYSTEM |
KR1020227009720A KR102627684B1 (ko) | 2019-11-05 | 2020-07-27 | 반송차 시스템 |
JP2021554819A JP7188615B2 (ja) | 2019-11-05 | 2020-07-27 | 搬送車システム |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019-200737 | 2019-11-05 | ||
JP2019200737 | 2019-11-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2021090542A1 true WO2021090542A1 (ja) | 2021-05-14 |
Family
ID=75848329
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2020/028768 WO2021090542A1 (ja) | 2019-11-05 | 2020-07-27 | 搬送車システム |
Country Status (7)
Country | Link |
---|---|
US (1) | US20220375774A1 (ja) |
EP (1) | EP4057325A4 (ja) |
JP (1) | JP7188615B2 (ja) |
KR (1) | KR102627684B1 (ja) |
CN (1) | CN114365271A (ja) |
TW (1) | TWI834927B (ja) |
WO (1) | WO2021090542A1 (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61196856A (ja) | 1985-02-27 | 1986-09-01 | 株式会社ダイフク | 搬送車 |
JPH05310323A (ja) * | 1991-03-15 | 1993-11-22 | Shinko Electric Co Ltd | クリーンルーム用の無人搬送装置 |
JP2015533026A (ja) * | 2012-10-31 | 2015-11-16 | 株式会社ダイフク | ウェハパージ可能な天井保管装置(apparatusforstockingandpurgingwaferatceiling) |
JP2016096192A (ja) | 2014-11-12 | 2016-05-26 | 株式会社ダイフク | 物品搬送設備 |
JP2017159975A (ja) * | 2016-03-07 | 2017-09-14 | 株式会社ダイフク | 容器搬送設備 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103548130B (zh) * | 2011-05-25 | 2016-08-17 | 村田机械株式会社 | 载入机装置、搬运系统、以及容器搬出方法 |
SG11201606283WA (en) * | 2014-02-07 | 2016-09-29 | Murata Machinery Ltd | Purge device and purge method |
JP6241693B2 (ja) * | 2014-09-25 | 2017-12-06 | 村田機械株式会社 | パージ装置及びパージ方法 |
KR101691607B1 (ko) * | 2015-08-26 | 2016-12-30 | (주)젠스엠 | 퍼지 기능을 갖는 웨이퍼 용기 이송 장치 |
JP6460245B2 (ja) * | 2015-08-27 | 2019-01-30 | 村田機械株式会社 | 取出装置及び保管装置 |
JP6455404B2 (ja) * | 2015-11-17 | 2019-01-23 | 株式会社ダイフク | 容器搬送設備 |
JP6607314B2 (ja) * | 2016-06-08 | 2019-11-20 | 村田機械株式会社 | 容器保管装置及び容器保管方法 |
KR101841925B1 (ko) | 2017-07-28 | 2018-03-26 | 크린팩토메이션 주식회사 | 웨이퍼 내장 풉에 대한 지상 퍼지 스테이션 |
US11608229B2 (en) * | 2017-09-08 | 2023-03-21 | Murata Machinery, Ltd. | Storage system and purge method in storage system |
-
2020
- 2020-07-27 JP JP2021554819A patent/JP7188615B2/ja active Active
- 2020-07-27 EP EP20883714.6A patent/EP4057325A4/en not_active Withdrawn
- 2020-07-27 WO PCT/JP2020/028768 patent/WO2021090542A1/ja unknown
- 2020-07-27 KR KR1020227009720A patent/KR102627684B1/ko active IP Right Grant
- 2020-07-27 US US17/769,853 patent/US20220375774A1/en not_active Abandoned
- 2020-07-27 CN CN202080063388.3A patent/CN114365271A/zh active Pending
- 2020-11-02 TW TW109138022A patent/TWI834927B/zh active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61196856A (ja) | 1985-02-27 | 1986-09-01 | 株式会社ダイフク | 搬送車 |
JPH05310323A (ja) * | 1991-03-15 | 1993-11-22 | Shinko Electric Co Ltd | クリーンルーム用の無人搬送装置 |
JP2015533026A (ja) * | 2012-10-31 | 2015-11-16 | 株式会社ダイフク | ウェハパージ可能な天井保管装置(apparatusforstockingandpurgingwaferatceiling) |
JP2016096192A (ja) | 2014-11-12 | 2016-05-26 | 株式会社ダイフク | 物品搬送設備 |
JP2017159975A (ja) * | 2016-03-07 | 2017-09-14 | 株式会社ダイフク | 容器搬送設備 |
Non-Patent Citations (1)
Title |
---|
See also references of EP4057325A4 |
Also Published As
Publication number | Publication date |
---|---|
KR20220050211A (ko) | 2022-04-22 |
KR102627684B1 (ko) | 2024-01-23 |
EP4057325A4 (en) | 2023-11-22 |
EP4057325A1 (en) | 2022-09-14 |
TWI834927B (zh) | 2024-03-11 |
US20220375774A1 (en) | 2022-11-24 |
TW202120415A (zh) | 2021-06-01 |
JP7188615B2 (ja) | 2022-12-13 |
CN114365271A (zh) | 2022-04-15 |
JPWO2021090542A1 (ja) | 2021-05-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI731185B (zh) | 物品搬送設備 | |
JP4337683B2 (ja) | 搬送システム | |
KR101463473B1 (ko) | 이송 장치 | |
US8374719B2 (en) | Article processing facility and its control method | |
TWI654125B (zh) | 物品收納設備 | |
JP6969512B2 (ja) | 物品搬送装置 | |
JP5369419B2 (ja) | 保管庫、保管庫セット及び保管庫付き搬送システム | |
KR102043874B1 (ko) | 물품 보관 설비 및 물품 보관 방법 | |
WO2012160917A1 (ja) | ロードポート装置、搬送システム、及びコンテナ搬出方法 | |
TW201813899A (zh) | 物品搬送設備 | |
JP2013154983A (ja) | 物品搬送設備 | |
KR102376371B1 (ko) | 반송 시스템 | |
JP6566051B2 (ja) | 保管装置及び搬送システム | |
JP4200387B2 (ja) | 搬送システム | |
WO2021090542A1 (ja) | 搬送車システム | |
JP2015117073A (ja) | 搬送システム | |
JP7322924B2 (ja) | 物品収容設備 | |
KR102264563B1 (ko) | 화물 이송 시스템 및 화물 이송 방법 | |
WO2024214513A1 (ja) | 搬送車 | |
KR20230076583A (ko) | Oht 비히클 및 이의 동작 제어 방법 | |
JP2024006450A (ja) | 物品収容設備 | |
TW202329312A (zh) | 搬送系統 | |
TWI481539B (zh) | 保管庫以及出入庫方法 | |
JP2016054253A (ja) | ストッカ及びストッカでの移載装置のバックアップ方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 20883714 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 2021554819 Country of ref document: JP Kind code of ref document: A |
|
ENP | Entry into the national phase |
Ref document number: 20227009720 Country of ref document: KR Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
ENP | Entry into the national phase |
Ref document number: 2020883714 Country of ref document: EP Effective date: 20220607 |