WO2021052457A1 - 工件、工件的制备方法、壳体以及电子设备 - Google Patents

工件、工件的制备方法、壳体以及电子设备 Download PDF

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Publication number
WO2021052457A1
WO2021052457A1 PCT/CN2020/116125 CN2020116125W WO2021052457A1 WO 2021052457 A1 WO2021052457 A1 WO 2021052457A1 CN 2020116125 W CN2020116125 W CN 2020116125W WO 2021052457 A1 WO2021052457 A1 WO 2021052457A1
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WO
WIPO (PCT)
Prior art keywords
substrate
workpiece
area
glare
protective layer
Prior art date
Application number
PCT/CN2020/116125
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English (en)
French (fr)
Inventor
盛秋春
黄义宏
黄礼忠
陈石峰
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华为技术有限公司
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Publication of WO2021052457A1 publication Critical patent/WO2021052457A1/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22—Removing surface-material, e.g. by engraving, by etching
    • B44C1/221—Removing surface-material, e.g. by engraving, by etching using streams of abrasive particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22—Removing surface-material, e.g. by engraving, by etching
    • B44C1/227—Removing surface-material, e.g. by engraving, by etching by etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C3/00—Processes, not specifically provided for elsewhere, for producing ornamental structures
    • B44C3/02—Superimposing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04M—TELEPHONIC COMMUNICATION
    • H04M1/00—Substation equipment, e.g. for use by subscribers
    • H04M1/02—Constructional features of telephone sets
    • H04M1/0202—Portable telephone sets, e.g. cordless phones, mobile phones or bar type handsets
    • H04M1/0279—Improving the user comfort or ergonomics
    • H04M1/0283—Improving the user comfort or ergonomics for providing a decorative aspect, e.g. customization of casings, exchangeable faceplate
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04M—TELEPHONIC COMMUNICATION
    • H04M1/00—Substation equipment, e.g. for use by subscribers
    • H04M1/02—Constructional features of telephone sets
    • H04M1/18—Telephone sets specially adapted for use in ships, mines, or other places exposed to adverse environment

Definitions

  • This application relates to the technical field of material surface treatment, and in particular to a workpiece, a method for preparing a workpiece, a housing, and an electronic device.
  • the appearance of the product has become one of the important factors that determine whether consumers can buy this electronic product.
  • the electronic products can have a differentiated and personalized visual effect by performing decorative processing on the back cover glass of the electronic product.
  • the visual effects of the glass back cover and other positions are mainly realized through processes such as yellow light etching and frosting.
  • Yellow light etching is also a process for surface treatment of materials.
  • the yellow light etching process mainly includes: firstly, coating photosensitive material on the surface of the material, after exposure and development, leaving a part of the protective layer that has a protective effect on the surface of the material; then, using HF etc. to unprotect the surface of the material The area is etched; finally, the protective layer is removed, so that a specific pattern is formed on the surface of the material.
  • the frosting process can be used to increase the roughness and haze of the material surface.
  • Frosting is a surface treatment process for materials.
  • the frosting process mainly includes: first, a frosting liquid prepared with frosting powder, etc.; then, the frosting liquid is used to chemically attack the surface of the material to make the surface of the material uneven.
  • frosting to process the material can make the surface of the material have a certain degree of roughness and haze, so that the light irradiated on the surface of the material is diffusely reflected, and the light is prevented from being too concentrated, thereby achieving an anti-glare effect.
  • the roughness reaches a suitable range, the frosted surface of the material also has a better hand feeling.
  • the effect of variation cannot be formed on the surface of the material.
  • the present application provides a workpiece, the surface of the workpiece has a gradual anti-glare area, the gloss, haze, and roughness of the substrate in the gradual anti-glare area gradually change, and the transition is smooth and non-obtrusive, thus presenting a uniform A new gradual anti-glare appearance effect.
  • the gradual anti-glare area on the surface of the workpiece also has a better tactile feel and anti-dirt effect.
  • the present application provides a workpiece, including a substrate, the surface of the substrate has at least one gradual anti-glare area; the gloss of the substrate in the gradual anti-glare area is along the gradient of the anti-glare area The at least one preset direction of is decreased; the haze and roughness of the substrate in the gradual anti-glare area are respectively increased along the at least one preset direction.
  • the gloss, haze, and roughness of the gradual anti-glare area on the surface of the workpiece are gradually changed, and the intermediate transition is smooth and non-obtrusive, thereby presenting a new gradual anti-glare appearance effect as a whole.
  • the formation of the gradual anti-glare area enables the workpiece to have a good three-dimensional effect, can also achieve an anti-glare effect, and also has a good touch and anti-dirt effect.
  • the visible light transmittance of the substrate in the gradual anti-glare region is along At least one preset direction in the gradual anti-glare area decreases.
  • the visible light transmittance of the gradual anti-glare area also changes gradually, and the intermediate transition is smooth and not abrupt, thus presenting a new gradual anti-glare appearance effect as a whole.
  • the formation of the gradual anti-glare area makes the workpiece have a better three-dimensional effect.
  • a first preset pattern is provided in the gradual anti-glare area, and the first preset pattern includes a plurality of second In a region, the arrangement density of the plurality of first regions increases along the at least one predetermined direction, and the surface of the substrate in the first region is a rough surface.
  • the third possible implementation manner of the first aspect 0 ⁇ R ⁇ 0.05mm, 0 ⁇ k ⁇ 5R; where R represents the size of the first region; k Indicates the distance between adjacent first regions along a preset direction.
  • the size of the first area and the distance between adjacent first areas are limited within the above range to meet the requirements of the design effect of the workpiece, realize the gradual anti-glare appearance effect, and make the workpiece have a better appearance. Good three-dimensional feeling and tactile feeling, realize anti-glare effect and anti-dirt effect.
  • the surface of the substrate in the second region is a smooth surface; wherein, the second region is the An area other than the first preset pattern in the gradual anti-glare area.
  • the material of the substrate includes one or more of glass, plastic, and ceramic.
  • a gradual anti-glare area is formed on the surface of a variety of materials, making the workpiece suitable for use in a variety of different products and a wide range of applications.
  • the present application provides a method for preparing a workpiece, which includes: providing a protective layer on at least one surface of a substrate; wherein a first predetermined pattern is formed on an area of the surface of the substrate where the protective layer is not provided,
  • the first predetermined pattern includes a plurality of first regions, and the arrangement density of the plurality of first regions increases along at least one predetermined direction; an area on the surface of the substrate where the protective layer is not formed Performing frosting or sandblasting; performing chemical polishing on the area of the substrate surface after frosting or sandblasting where the protective layer is not formed; removing the protective layer to obtain the workpiece.
  • a protective layer is first provided on the surface of the substrate, so that the area on the surface of the substrate that is not provided with the protective layer forms a first preset pattern. Since the arrangement density of the plurality of first regions in the first preset pattern not covered by the protective layer is gradually increased, the surface of the substrate not covered by the protective layer is frosted/sandblasted and chemically After the polishing treatment, along the preset direction, the density of the rough surface area becomes larger and larger, thereby forming a gradual anti-glare area on the surface of the substrate.
  • the method has simple process and is suitable for industrialized production.
  • R represents the size of the first area
  • k represents along a preset Direction, the distance between adjacent first regions.
  • the size of the first area and the distance between adjacent first areas are limited within the above range to meet the requirements of the design effect of the workpiece, realize the gradual anti-glare appearance effect, and make the workpiece have a better appearance. Good three-dimensional feeling and tactile feeling, realize anti-glare effect and anti-dirt effect.
  • the step of providing a protective layer on at least one surface of the substrate includes: forming a light on at least one surface of the substrate. Resist layer; exposing and developing the photoresist layer to form the protective layer.
  • the protective layer is formed by photoresist, the process is simple, and it is suitable for industrial production.
  • the photoresist layer when the photoresist layer adopts a negative photoresist material, the photoresist layer is exposed and developed to form the
  • the step of the protective layer includes: disposing a photomask on the photoresist layer; wherein the photomask has a second preset pattern, and the second preset pattern is the same as the first preset pattern; Expose the photoresist layer on the surface of the substrate and the photomask; develop and remove the unexposed areas of the photoresist layer to form the protective layer.
  • negative photoresist materials Compared with positive photoresist materials, negative photoresist materials have higher resolution and higher adhesion to the substrate.
  • Applying it in the method of the present application can make the photoresist layer not easy to fall off during exposure and development, and subsequent frosting/sand blasting, and prevent the workpiece from being scrapped because the gradual anti-glare area on the surface does not meet the design requirements.
  • the thickness of the photoresist layer is 2-5 ⁇ m.
  • a fifth possible implementation manner of the second aspect before the step of frosting or sandblasting is performed on the area of the substrate surface where the protective layer is not formed, It includes: sticking a protective film on the non-processed surface of the substrate.
  • the protective film can protect the non-machined surface during sandblasting/frosting and chemical polishing, and avoid damage to the non-machined surface.
  • the substrate needs to be transferred between different sections. By setting up a protective film, the substrate can also be prevented from scratches, contamination, etc. during transfer and transportation. problem.
  • the substrate is a transparent, translucent or opaque material.
  • a gradual anti-glare area is formed on the surface of a variety of materials, making the workpiece suitable for use in a variety of different products and a wide range of applications.
  • the material of the substrate includes one or more of glass, plastic, and ceramic.
  • a gradual anti-glare area is formed on the surface of a variety of materials, making the workpiece suitable for use in a variety of different products and a wide range of applications.
  • the present application provides a housing, which includes at least one of the workpieces of the first aspect, and is further provided with decorative parts or auxiliary materials.
  • the workpiece is a cover plate or a middle frame of the housing.
  • the present application provides an electronic device, the electronic device includes a housing, and the housing includes at least one workpiece of any one of the first aspect.
  • the workpiece is a cover plate or a middle frame of the housing.
  • FIG. 1 is a schematic diagram of the effect of a gradual anti-glare area on the surface of a substrate of a workpiece in this application;
  • FIG. 2 is an enlarged schematic diagram of part A in FIG. 1;
  • 3 is a schematic diagram of the effect of another gradual anti-glare area on the surface of the substrate of the workpiece in this application;
  • FIG. 4 is a schematic diagram of a side structure after forming a photoresist layer on the surface of a substrate in an implementation of the method for preparing a workpiece of this application;
  • FIG. 5 is a schematic diagram of the side structure of the photoresist layer being stacked and exposed in an implementation of the method for preparing a workpiece according to the present application;
  • FIG. 6 is a schematic diagram of a side structure after a protective layer is provided on the surface of the substrate in an implementation of the method for preparing a workpiece of this application;
  • FIG. 7 is a schematic diagram of the side structure of the substrate after frosting in an implementation of the method for preparing a workpiece of this application;
  • FIG. 8 is an enlarged schematic diagram of part B in FIG. 7;
  • FIG. 9 is a schematic diagram of the side structure of the substrate after chemical polishing in an implementation of the method for preparing a workpiece of this application;
  • FIG. 10 is an enlarged schematic diagram of part C in FIG. 9;
  • FIG. 11 is a schematic diagram of the effect of the gradual anti-glare area in the glass plate prepared in Example 1 of the application; FIG.
  • FIG. 12 is a schematic structural diagram of an implementation manner of the electronic device of this application.
  • Substrate 1 Gradient anti-glare area 11; Photoresist layer 2; Mask 3; Substrate 31; Light-shielding layer 32; Protective layer 4; First area 51; Second area 52; Electronic device 100; Cover plate 101.
  • Glossiness indicates the ability of the surface of a material to reflect light. When a material with a smooth surface is irradiated by visible light, it will have a specular reflection. The reflected light directly illuminates the human eye, making the surface of the material shiny and causing a dazzling effect.
  • Haze indicates the degree of unclearness of the material.
  • a beam of parallel light from a standard light source is used to irradiate the material perpendicularly. Due to the scattering inside and on the surface of the material, part of the parallel light deviates from the incident direction and deviates from the incident direction by more than 2.5°. It is haze.
  • Roughness refers to the small spacing and the unevenness of small peaks and valleys on the surface of the material.
  • the roughness of the material surface can be characterized by the arithmetic mean deviation of the profile Ra, or the maximum height of the profile Rz, and the two can be converted mutually on the roughness measuring instrument.
  • Ra will be uniformly used to represent.
  • Transmittance indicates the ability of light to pass through a material.
  • a beam of parallel light from a standard light source is used to irradiate the material perpendicularly, and the ratio of the luminous flux T2 passing through the material to the incident luminous flux T1 irradiating the material is the transmittance.
  • gloss, haze, and roughness can be used to measure the optical properties of transparent, translucent or opaque materials, and transmittance is mainly used to measure the optical properties of transparent or translucent materials.
  • the embodiment of the present application provides a workpiece, which can be applied to an electronic device.
  • the electronic devices in the embodiments of this application include, but are not limited to: mobile phones, tablet computers (Pad), personal computers, virtual reality (VR) terminal devices, augmented reality (Augmented Reality, AR) terminal devices, Wearable devices, TVs, vehicle terminals, etc.
  • the workpiece in the embodiment of the present application includes parts in the industrial processing process.
  • the workpiece may be a single part or a part formed by combining several parts, which is not limited in the present application.
  • the work piece of the electronic device in the present application may be a part or part of the electronic product exposed to the external environment, such as the housing of a mobile phone, the wearing structure of a wearable device, and the like. After all or part of the surface of the substrate of the workpiece is processed, a gradual anti-glare effect can be produced.
  • the gradual effect refers to the gradual change of the texture of the surface of the material, thereby producing a gradual visual effect.
  • the anti-glare effect refers to the effect of reducing the reflection or direct radiation of strong light by processing the surface of the material from a flat crystal surface into an uneven rough surface. Therefore, in the prior art, the gradient effect and the anti-glare effect are two independent visual effects.
  • the gradual anti-glare effect mentioned in this application can be understood as an overall visual effect.
  • the visual effect can be jointly characterized by the aforementioned three optical parameters of haze, roughness and gloss.
  • the substrate surface of the workpiece in the embodiment of the present application can form at least one gradual anti-glare area.
  • the gloss of the substrate in the area decreases along at least one preset direction in the gradual anti-glare area; and the haze and roughness of the substrate in the area are respectively along The at least one preset direction is raised.
  • the base material of the workpiece is made of transparent, translucent or opaque material, such as one or more of glass, plastic and ceramic.
  • the optical parameter of visible light transmittance can also be increased, and the four optical parameters are used to jointly characterize the visual effect of gradual anti-glare. That is, the visible light transmittance of the substrate in the gradual anti-glare area decreases along at least one predetermined direction in the gradual anti-glare area.
  • the gradual anti-glare area may be a flat area or a curved area, which is not limited in the present application.
  • the preset direction can be any direction on the gradual anti-glare area, which can be a straight line or a curved direction; there can be only one preset direction or multiple preset directions in a gradual anti-glare area. This application does not limit this.
  • FIG. 1 is a schematic diagram of the effect of a gradual anti-glare area on the surface of the substrate of the workpiece of the application
  • FIG. 2 is an enlarged schematic diagram of part A in FIG. 1.
  • the surface of the substrate is a plane
  • the preset direction is the X direction.
  • the visible light transmittance of the substrate in the gradual anti-glare region 11 gradually decreases, and the gloss also gradually decreases.
  • the haze of the substrate in the gradual anti-glare area 11 gradually increases, and the roughness also gradually increases.
  • FIG. 3 is a schematic diagram of the effect of another gradual anti-glare area on the surface of the substrate of the workpiece of the application.
  • the surface of the substrate is a plane, and there are multiple preset directions, that is, multiple Y directions.
  • the visible light transmittance of the substrate in the gradual anti-glare area 11 gradually decreases, and the glossiness also gradually decreases.
  • the haze of the substrate in the gradual anti-glare area 11 gradually increases, and the roughness also gradually increases.
  • the change in the gradual anti-glare area 11 shown in FIG. 3 presents a radial gradual effect, and the direction from any point on the outer circumference of the circle to the center of the circle can be regarded as a preset direction.
  • the gloss, haze, and roughness of the gradual anti-glare area on the surface of the workpiece are gradually changed.
  • the substrate of the workpiece is a transparent or translucent material
  • the visible light transmittance of the gradual anti-glare area also changes gradually.
  • the middle transition is smooth and non-obtrusive, thus presenting a new gradual anti-glare appearance as a whole.
  • a part of the area has better gloss, which makes the workpiece have a better three-dimensional effect, and a part of the area has a better haze and roughness, so as to achieve the anti-glare effect.
  • the base material of the workpiece is a transparent or semi-transparent material, because a part of the area has better visible light transmittance and gloss, the workpiece can exhibit better permeability and thus have a better three-dimensional effect.
  • the gradual anti-glare area on the surface of the workpiece also has a better touch and anti-dirt effect. Specifically, on the one hand, because the gradual anti-glare area on the surface of the workpiece has gradual roughness, it has a better tactile feel. An anti-fingerprint coating can also be provided on the surface, and the combination of the two can achieve a skin-like texture. On the other hand, because the surface of the workpiece has gradual roughness and haze, the gradual anti-glare area on the surface of the workpiece has a better anti-dirt effect (such as dust, grease, fingerprints, etc.). Compared with a smooth mirror surface, the gradual anti-glare area in the embodiment of the present application has a suitable roughness and is less likely to adhere to dirt. Even if some dirt is adhered, because the gradual anti-glare area has a suitable haze, it can produce a better visual concealment effect on the dirt, so that the naked eye is not easy to detect the dirt.
  • a first preset pattern is provided in the gradual anti-glare area, the first preset pattern includes a plurality of first regions 51, and the arrangement density of the plurality of first regions 51 Raise in at least one preset direction.
  • the area other than the first preset pattern in the gradual anti-glare area 11 is referred to as the second area 52.
  • the smooth surface in the embodiments of the present application may also be called a smooth surface or a mirror surface, and its roughness is generally very low, and may even be zero.
  • the above-mentioned rough surface is a concept opposite to a smooth surface.
  • the rough surface generally has an uneven structure, and its roughness is greater than that of a smooth surface.
  • the surface of the substrate in the first region 51 is a rough surface
  • the surface of the substrate in the second region 52 is a smooth surface.
  • the shape of the above-mentioned first area may be a regular shape or an irregular shape, which is not limited in this application.
  • the shapes and sizes of multiple first regions in the same first preset pattern can be set to be the same to facilitate industrial production.
  • the size of the first area can be measured by commonly used measurement methods. For example, when the first area is circular, a radius or a diameter can be used as its size. For another example, when the first area is a square, the side length of the square may be used as its size. For another example, when the first area has an irregular shape, the longest distance from its center of gravity to the edge can be used as its size.
  • R represents the size of the first region, it can be defined as 0 ⁇ R ⁇ 0.05 mm.
  • the first area 51 is circular, and its radius r is used to represent the size of the first area, and 0 ⁇ r ⁇ 0.05 mm.
  • the size of the first area 51 is limited within the above range to meet the requirements of the appearance design effect of the workpiece, and realize the aforementioned gradual anti-glare appearance effect.
  • the distance between adjacent first areas can be represented by the linear distance between the centers of gravity of adjacent first areas, or the shortest distance between adjacent first areas It can be expressed in other ways such as straight-line distance. Therefore, the arrangement density of the multiple first regions increases along at least one preset direction, which can also be understood as along a preset direction, the separation distance between adjacent first regions gradually decreases.
  • k is used to indicate the separation distance between adjacent first regions along a preset direction, along the X direction or the Y direction, the value of k is larger at first , As the arrangement density gradually increases, the value of k gradually decreases.
  • the first region 51 is a circle, and the separation distance can be represented by the distance between the centers of two adjacent circles, then 0 ⁇ k ⁇ 5r.
  • the separation distance between the adjacent first regions 51 is limited to the above range, so as to meet the requirements of the appearance design effect of the workpiece, and realize the aforementioned gradual anti-glare appearance effect.
  • first regions 51 in the first preset pattern may be independent of each other, or may be connected or partially overlapped. These two situations can exist in the same first preset pattern at the same time, as shown in FIG. 1 and FIG. 3.
  • the surface of the substrate in the first region is a roughened uneven surface, that is, a rough surface, which affects the visible light transmittance, gloss, haze, and roughness of the substrate.
  • the arrangement density of the plurality of first regions gradually increases. In this way, the visible light transmittance and glossiness of the substrate in the anti-glare area can be reduced along at least one preset direction in the gradual anti-glare area, so that the substrate in the anti-glare area
  • the haze and roughness are respectively increased along the at least one preset direction, so as to achieve the aforementioned gradual anti-glare effect.
  • the embodiment of the present application also provides a method for preparing a workpiece.
  • the preparation method can be applied to parts of industrial products, such as cover plates of terminal products, battery covers, decorative parts, etc., so as to prepare any of the aforementioned workpieces with gradual anti-glare areas.
  • the method may include the following steps 100 to 400.
  • Step 100 providing a protective layer on at least one surface of the substrate.
  • the substrate in the embodiments of the present application may be a transparent, translucent or opaque material, for example, it may include one or more of glass, plastic, and ceramic. In different application scenarios or design requirements, substrates of different materials can be used.
  • the substrate may have multiple surfaces.
  • a common back cover of a mobile phone it generally has an upper surface, a lower surface, and four side surfaces.
  • the lower surface and the side surface face the inside of the mobile phone after installation, and the upper surface faces the external environment.
  • the upper surface needs to be processed to form a gradual anti-glare area.
  • the surface such as the aforementioned upper surface
  • Other surfaces that do not need to be processed such as the aforementioned lower surface and four side surfaces
  • non-processed surfaces are called non-processed surfaces. Therefore, a protective layer can be provided on the processing surface.
  • the above-mentioned protective layer can be made of existing materials, such as photoresist.
  • the protective layer has a preset pattern, and the area where the protective layer is not provided on the surface of the substrate forms the first preset pattern. Therefore, the pattern of the protective layer is complementary to the first preset pattern.
  • the first preset pattern may include a plurality of first regions, and the shape of the plurality of first regions may be regular shapes or irregular shapes.
  • shape and size of the first area, and the separation distance between the first areas reference may be made to the previous related description, which will not be repeated here.
  • R represents the size of the first region, it can be defined as 0 ⁇ R ⁇ 0.05 mm.
  • FIG. 6 is a schematic diagram of a side structure after a protective layer is provided on the surface of the substrate in an implementation of the method for preparing a workpiece of the present application.
  • the protective layer 4 is provided on the substrate 1, and the area where the protective layer is not provided forms a first preset pattern, which includes a plurality of first regions 51.
  • the first area 51 is circular, and its radius r is used to represent the size of the first area, and 0 ⁇ r ⁇ 0.05 mm.
  • the separation distance between adjacent first regions gradually decreases.
  • k is used to indicate the separation distance between adjacent first regions 51 along the X direction, and along the X direction, the value of k is larger at the beginning, and as the arrangement density increases Gradually increase, the value of k gradually decreases.
  • the first region 51 is a circle, and the separation distance can be represented by the distance between the centers of two adjacent circles, then 0 ⁇ k ⁇ 5r.
  • the surface of the workpiece can meet the requirements of the appearance design effect, and the aforementioned gradual anti-glare appearance effect can be realized.
  • step 100 may include:
  • Step 110 forming a photoresist layer on at least one surface of the substrate.
  • Step 120 Expose and develop the photoresist layer to form the protective layer.
  • FIG. 4 is a schematic diagram of a side structure after forming a photoresist layer on the surface of a substrate in an implementation of the method for preparing a workpiece of the present application.
  • a photoresist layer 2 is provided on the substrate 1, and the above-mentioned photoresist layer 2 can be formed by spraying using an existing photoresist spraying machine.
  • the thickness of photoresist spraying is less than 2 ⁇ m.
  • the thickness of the photoresist layer is 2-5 ⁇ m. Further optionally, the thickness of the photoresist layer is 3-5 ⁇ m.
  • the thickness of the photoresist layer is the thickness of the protective layer.
  • the photoresist layer after the photoresist layer is sprayed by the photoresist sprayer, it can be pre-cured to make the bond between the photoresist layer and the substrate stronger.
  • the pre-curing temperature may be 110-120° C.
  • the pre-curing time may be 1-2 min.
  • photoresist materials include positive photoresist materials and negative photoresist materials.
  • the areas removed by exposure and development are correspondingly different.
  • the part of the positive photoresist material irradiated by light can be removed by the developer, and the part not irradiated by the light will not be removed by the developer.
  • Negative photoresist material is the opposite, the part irradiated by light will not be removed by the developer, and the part not irradiated by the light can be removed by the developer.
  • step 120 when a negative photoresist material is used for the photoresist layer, step 120 includes:
  • Step 121 Disposing a photomask on the photoresist layer; wherein the light shielding layer of the photomask has a second preset pattern, and the second preset pattern is the same as the first preset pattern.
  • Step 122 Expose the photoresist layer on the surface of the substrate and the photomask.
  • Step 123 developing and removing the unexposed areas of the photoresist layer to form the protective layer.
  • FIG. 5 is a schematic diagram of the side structure of the photoresist layer being stacked and exposed in an implementation of the workpiece preparation method of the present application.
  • the photomask 3 is provided above the substrate 1 on which the photoresist layer 2 is provided.
  • the photomask 3 includes a substrate 31 and a light shielding layer 32, and the light shielding layer 32 on the photomask 3 forms a second preset pattern. Since the second preset pattern is the same as the first preset pattern, the shielded part of the photoresist layer 2 is not irradiated by light during the exposure step, as shown in FIG. 5.
  • the photoresist layer 2 in these areas not irradiated by light can be removed in the development step.
  • the part of the photoresist layer 2 left on the surface of the substrate 1 forms the protective layer 4.
  • the pattern of the protective layer 4 is a pattern complementary to the first preset pattern, and the area where the protective layer 4 is not provided on the surface of the substrate 1 is formed
  • the first preset pattern is shown in Figure 6.
  • the aforementioned photomask 3 can be made of glass and chrome materials.
  • the quartz glass with high purity, low reflectivity, and low thermal expansion coefficient is used as the substrate 31.
  • the chromium material is plated on the substrate 31 by sputtering to form a chromium layer (that is, the light-shielding layer 32).
  • the pattern of the chromium layer is the second The preset pattern is shown in Figure 5.
  • the thickness of the chromium layer may be about 70 nm. Since the chromium material is completely opaque to light, overlaying the photomask on top of the photoresist layer can block the light during the exposure step, and only covers the area outside the area corresponding to the second preset pattern on the photoresist layer. Part of the exposure.
  • the exposure energy in the exposure step can be 80 mJ/cm 2 .
  • a developing solution is used to remove the photoresist in the unexposed area to form a protective layer complementary to the first preset pattern.
  • the temperature of the developer solution in the developing step may be 23 ⁇ 2° C.
  • the wind cutting pressure may be 150 KPa.
  • step 120 may include:
  • Step 124 Disposing a photomask on the photoresist layer; wherein the photomask has a third preset pattern, and the third preset pattern is complementary to the first preset pattern.
  • Step 125 Expose the photoresist layer on the surface of the substrate and the photomask.
  • Step 126 developing and removing the exposed area of the photoresist layer to form the protective layer.
  • the unshielded portion of the photoresist layer is irradiated with light in the exposure step, and it can be removed in the development step.
  • the protective layer left on the surface of the substrate is the same as the third predetermined pattern and complementary to the first predetermined pattern, and the area on the surface of the substrate without the protective layer forms the first predetermined pattern.
  • the above-mentioned photomask may also be made of glass and chromium materials, and reference may be made to the aforementioned related descriptions.
  • the difference between the two is that the pattern of the chromium layer is the third preset pattern.
  • negative photoresist materials Compared with positive photoresist materials, negative photoresist materials have high resolution and high adhesion to the substrate. They are relatively difficult to fall off during exposure and development and subsequent frosting/sandblasting, and are more conducive to formation on the surface of the workpiece. Gradient anti-glare area.
  • the process conditions for exposure and development can refer to the conditions when a negative photoresist material is used or the existing process conditions, which will not be repeated here.
  • Step 200 Frosting or sandblasting the area on the surface of the substrate where the protective layer is not formed.
  • Frosting is mainly a process of chemically eroding the surface of the material with a frosting liquid to make the surface of the material uneven.
  • Sandblasting is a process that uses the impact of high-speed sand flow to physically erode the surface of the material and make the surface of the material uneven.
  • FIG. 7 is a schematic diagram of the side structure of the substrate after frosting in an implementation of the workpiece preparation method of the present application
  • FIG. 8 is an enlarged view of part B in FIG. 7. It can be seen that, through frosting or sandblasting, the area on the surface of the substrate 1 that is not protected by the protective layer 4 has an uneven structure. The area protected by the protective layer 4 will not be corroded by the frosting liquid or sandblasting.
  • the above-mentioned frosting or sand blasting can adopt the existing frosting or sand blasting process.
  • frosting the concentration of the frosting solution and the time of soaking are different, and the uneven structure formed will be different.
  • sandblasting is used, the size of sandblasting, sandblasting speed, time, etc. are different, and the uneven structure formed will also be different.
  • the haze and roughness of the gradual anti-glare area can be adjusted to a certain extent.
  • siliceous sand with edges and corners, or other granular materials with similar properties, with a particle size of 2-10 ⁇ m can be used.
  • Silica sand or other similar granular materials should not contain impurities that pollute the surface of the glass, and should be fully dried with a moisture content of not more than 0.5%.
  • the compressed air used for sandblasting needs to be cooled and filtered before entering the sandblasting tank to achieve an oil-free and water-free state.
  • the pressure of the compressed air can be controlled between 0.1-0.5MPa, and the air supply volume is not less than 1 cubic meter/minute.
  • the frosting process is adopted in the embodiments of this application, and the protective layer on the surface of the substrate is relatively less likely to fall off, so as to avoid damage to the area that should be kept smooth, and to prevent the workpiece from being affected by the gradual anti-glare area on the surface It is scrapped if it meets the design requirements.
  • Step 300 chemically polishing the area on the surface of the substrate where the protective layer is not formed after frosting or sandblasting.
  • FIG. 9 is a schematic diagram of the side structure of the substrate after chemical polishing in an implementation of the workpiece preparation method of the present application;
  • FIG. 10 is an enlarged view of part C in FIG. 9. It can be seen from FIG. 9 and FIG. 10 that by chemical polishing, part of the sharp and convex parts of the uneven structure are eroded, so that the height difference of the uneven structure is reduced.
  • the area on the surface of the substrate 1 where the protective layer 4 is not formed forms a rough surface. These rough surfaces will affect the transmittance, haze, roughness and gloss of the substrate.
  • polishing liquids can be used for chemical polishing.
  • the polishing liquid when the substrate is glass, the polishing liquid can be a fluorine-containing chemical liquid, such as HF.
  • the concentration of the polishing liquid when applied to a glass substrate, the concentration of the polishing liquid may be 0.2% ⁇ concentration of the polishing liquid ⁇ 2%.
  • the polishing time can be 5-30 min.
  • the polishing liquid when the substrate is ceramic, the polishing liquid can be a strong acid solution, such as HCl.
  • the surface of the substrate may be cleaned to remove the polishing liquid for subsequent steps.
  • Step 400 Remove the protective layer to obtain the workpiece.
  • the area on the surface of the substrate where the protective layer is removed remains a smooth surface.
  • the protective layer can be removed by a method commonly used in the art.
  • the material of the protective layer is a photoresist material
  • the surface of the substrate can be treated with a photoresist.
  • the de-light-resisting solution may be a NaOH solution with a concentration of 5%, and the temperature of the de-light-resist treatment is 50 ⁇ 2°C.
  • the above method may further include step 500.
  • Step 500 sticking a protective film on the non-processed surface of the substrate.
  • the protective film is a protective film that is resistant to sandblasting/frosting and chemical polishing, so as to protect the non-processed surface during the process of sandblasting/frosting and chemical polishing to avoid damage to the non-processed surface.
  • the substrate needs to be transferred between different sections. By setting up a protective film, the substrate can also be prevented from scratches, contamination, etc. during transfer and transportation. problem.
  • the surface of the workpiece may be chemically strengthened, so as to obtain a workpiece with better mechanical strength.
  • the chemical strengthening treatment can adopt existing methods, which will not be repeated here.
  • the arrangement density of the multiple first areas not covered by the protective layer is gradually increased along the preset direction, frosting/sand blasting and chemical polishing are performed on the surface of the substrate that is not covered by the protective layer After the treatment, along the preset direction, the density of the rough surface area becomes larger and larger.
  • the visible light transmittance and glossiness of the substrate in the gradual anti-glare area can be reduced along at least one preset direction in the gradual anti-glare area, so that the substrate in the anti-glare area
  • the visible light transmittance, gloss, haze, and roughness of the gradual anti-glare area on the surface of the workpiece are gradually changed, and the intermediate transition is smooth and non-obtrusive, thus presenting a new gradual anti-glare appearance effect as a whole .
  • a part of the area has good visible light transmittance and gloss, so that the workpiece has better permeability and a better three-dimensional effect, and some areas have better fog Degree and roughness, so as to achieve anti-glare effect.
  • the gradual anti-glare area on the surface of the workpiece also has a better tactile feel and anti-fouling effect.
  • a spraying machine is used to spray a negative photoresist material on one surface of the glass plate to form a photoresist layer with a thickness of 3 ⁇ m.
  • the pre-curing temperature is 120°C, and the time is 1 min.
  • (b) Prepare a glass mask, the thickness of the chromium layer in the glass mask is about 70 nm, and the chromium layer forms a second predetermined pattern.
  • the second predetermined pattern includes a plurality of sub-regions, and the arrangement density of the plurality of sub-regions increases along at least one predetermined direction.
  • the glass mask and the glass plate provided with the photoresist layer were superimposed, and placed in an exposure machine for exposure with an exposure energy of 80 mJ/cm 2 .
  • a developer solution is used to remove the unexposed photoresist material on the photoresist layer, the temperature of the developer solution is 23 ⁇ 2°C, and the wind cutting pressure is 150KPa.
  • a protective layer is formed on the glass plate, and the pattern of the protective layer is complementary to the second preset pattern. That is, the area where the protective layer is not provided on the surface of the glass plate forms a first preset pattern, and the first preset pattern is the same as the second preset pattern.
  • (e) Choose siliceous sand with edges and corners, with a grain size of 2-10 ⁇ m, and a water content of not more than 0.5%.
  • Compressed air is used to spray siliceous sand on the side of the glass plate where the protective layer is provided, and impact the area where the protective layer and sandblasting protective film are not provided, so that the surface has an uneven structure.
  • the compressed air needs to be cooled and filtered before entering the sandblasting tank to achieve an oil-free and water-free state.
  • the pressure of the compressed air is controlled between 0.1-0.5MPa, and the air supply volume is not less than 1 cubic meter/minute.
  • the HF solution is used as the polishing solution, and the glass plate is immersed in the HF solution for chemical polishing.
  • the concentration of HF is 1%, and the polishing time is 20 minutes. After polishing is completed, take out the glass plate and put it in a washing machine to clean it.
  • a spraying machine is used to spray a negative photoresist material on one of the surfaces of the glass plate to form a photoresist layer with a thickness of 5 ⁇ m.
  • the pre-curing temperature is 110°C, and the time is 2 minutes.
  • (b) Prepare a glass mask, the thickness of the chromium layer in the glass mask is about 70 nm, and the chromium layer forms a second predetermined pattern.
  • the second predetermined pattern includes a plurality of sub-regions, and the arrangement density of the plurality of sub-regions increases along at least one predetermined direction.
  • the glass mask and the glass plate provided with the photoresist layer were superimposed, and placed in an exposure machine for exposure with an exposure energy of 80 mJ/cm 2 .
  • a developer solution is used to remove the unexposed photoresist material on the photoresist layer, the temperature of the developer solution is 23 ⁇ 2°C, and the wind cutting pressure is 150KPa.
  • a protective layer is formed on the glass plate, and the pattern of the protective layer is complementary to the second preset pattern. That is, the area where the protective layer is not provided on the surface of the glass plate forms a first preset pattern, and the first preset pattern is the same as the second preset pattern.
  • the frosting powder and industrial hydrochloric acid are mixed and reacted at a mass ratio of 1:1, and the mixing reaction time is 60 hours to obtain a frosting liquid.
  • stir the frosting liquid thoroughly Place the glass plate on the sand-casting stand (the angle of the glass plate is between 25-30°), and the side of the glass plate to be frosted faces up. Pour the frosting liquid evenly from bottom to top on the surface of the glass plate that needs to be frosted.
  • the frosting liquid needs to be poured to every part of the surface during sanding.
  • the sanding time is 2-10 minutes.
  • the frosting liquid chemically corrodes the area where the protective layer and the frosting protective film are not provided, so that the surface has an uneven structure.
  • the HF solution is used as the polishing solution, and the glass plate is immersed in the HF solution for chemical polishing.
  • the concentration of HF is 1%, and the polishing time is 20 minutes. After polishing is completed, take out the glass plate and put it in a washing machine to clean it.
  • a spraying machine is used to spray a positive photoresist material on one surface of the plastic board to form a photoresist layer with a thickness of 5 ⁇ m.
  • the pre-curing temperature is 110°C, and the time is 2 minutes.
  • (b) Prepare a glass mask, the thickness of the chromium layer in the glass mask is about 70 nm, and the chromium layer forms a second predetermined pattern.
  • the area where the chromium layer is not provided includes a plurality of sub-areas, and the arrangement density of the plurality of sub-areas increases along at least one preset direction.
  • the glass mask and the plastic plate provided with the photoresist layer were superimposed, and placed in an exposure machine for exposure with an exposure energy of 80 mJ/cm 2 .
  • a developer is used to remove the exposed photoresist material on the photoresist layer, the temperature of the developer is 23 ⁇ 2°C, and the wind cutting pressure is 150KPa.
  • a protective layer is formed on the plastic plate, and the pattern of the protective layer is the same as the second preset pattern. That is, the area where the protective layer is not provided on the surface of the plastic plate forms a first preset pattern, and the first preset pattern is complementary to the second preset pattern.
  • (e) Choose siliceous sand with edges and corners, with a grain size of 2-10 ⁇ m, and a water content of not more than 0.5%.
  • Compressed air is used to spray siliceous sand on the side of the plastic board where the protective layer is provided, and impact the area where the protective layer and sandblasting protective film are not provided, so that the surface has an uneven structure.
  • the compressed air needs to be cooled and filtered before entering the sandblasting tank to achieve an oil-free and water-free state.
  • the pressure of the compressed air is controlled between 0.1-0.5MPa, and the air supply volume is not less than 1 cubic meter/minute.
  • the plastic plate can be chemically polished by the acetone solution water bath heating method.
  • the acetone solution is used as the polishing liquid, and the acetone solution is heated in a water bath to volatilize the acetone vapor to the surface of the plastic plate.
  • the plastic plate reacts with acetone and swells to achieve the polishing effect.
  • the temperature is controlled at 56 degrees and the maintenance time is 1mins.
  • a spraying machine is used to spray a negative photoresist material on one of the surfaces of the ceramic plate to form a photoresist layer with a thickness of 2 ⁇ m.
  • the pre-curing temperature is 120°C, and the time is 1 min.
  • (b) Prepare a glass mask, the thickness of the chromium layer in the glass mask is about 70 nm, and the chromium layer forms a second predetermined pattern.
  • the second predetermined pattern includes a plurality of sub-regions, and the arrangement density of the plurality of sub-regions increases along at least one predetermined direction.
  • the glass mask and the ceramic plate provided with the photoresist layer were superimposed, and placed in an exposure machine for exposure with an exposure energy of 80 mJ/cm 2 .
  • a developer solution is used to remove the unexposed photoresist material on the photoresist layer, the temperature of the developer solution is 23 ⁇ 2°C, and the wind cutting pressure is 150KPa.
  • a protective layer is formed on the ceramic plate, and the pattern of the protective layer is complementary to the second preset pattern. That is, the area where the protective layer is not provided on the surface of the ceramic plate forms a first preset pattern, and the first preset pattern is the same as the second preset pattern.
  • (e) Choose siliceous sand with edges and corners, with a grain size of 2-10 ⁇ m, and a water content of not more than 0.5%.
  • Compressed air is used to spray siliceous sand on the side of the ceramic plate where the protective layer is provided, and impact the area where the protective layer and sandblasting protective film are not provided, so that the surface has an uneven structure.
  • the compressed air needs to be cooled and filtered before entering the sandblasting tank to achieve an oil-free and water-free state.
  • the pressure of the compressed air is controlled between 0.1-0.5MPa, and the air supply volume is not less than 1 cubic meter/minute.
  • a spraying machine is used to spray a negative photoresist material on one surface of the glass plate to form a photoresist layer with a thickness of 1 ⁇ m.
  • the pre-curing temperature is 110°C, and the time is 2 minutes.
  • (b) Prepare a glass mask, the thickness of the chromium layer in the glass mask is about 70 nm, and the chromium layer forms a second predetermined pattern.
  • the second predetermined pattern includes a plurality of sub-regions, and the arrangement density of the plurality of sub-regions increases along at least one predetermined direction.
  • the glass mask is superimposed on the glass plate provided with the photoresist layer, and placed in an exposure machine for exposure with an exposure energy of 80 mJ/cm 2 .
  • a developer solution is used to remove the unexposed photoresist material on the photoresist layer, the temperature of the developer solution is 23 ⁇ 2°C, and the wind cutting pressure is 150KPa.
  • a protective layer is formed on the glass plate, and the pattern of the protective layer is complementary to the second preset pattern. That is, the area where the protective layer is not provided on the surface of the glass plate forms a first preset pattern, and the first preset pattern is the same as the second preset pattern.
  • the NaOH solution with a concentration of 5% is used as the deglazing resist, and the glass plate is immersed in the deglazing resist to remove the protective layer.
  • the temperature of the fading resistance is 50 ⁇ 2°C. After the fading resistance is completed, the concave portion on the surface of the glass plate is formed with the same pattern as the first preset pattern, and the glass plate after yellow light etching is obtained.
  • a transparent glass plate is used as the base material, and one of the surfaces of the glass plate is used as the processing surface, and the frosting protective film is pasted on all surfaces except the processing surface.
  • FIG. 11 is a schematic diagram of the effect of the gradual anti-glare area in the glass plate made in Example 1.
  • the gradual anti-glare area in the glass plate prepared in Example 1 was divided into three areas: upper, middle, and lower. Determine a detection position in each area (corresponding to 123 in Figure 11), and respectively detect the haze, visible light transmittance, roughness and gloss of each detection position. The results are shown in Table 1.
  • Example 2 The effect of the gradual anti-glare area in the glass plate made in Example 2 is similar to that of Example 1.
  • the gradual anti-glare area in the glass plate prepared in Example 2 is also divided into three areas: upper, middle, and lower. Similar to the glass plate of detection example 1, a detection position is also determined in each area, and the haze, visible light transmittance, roughness and gloss of each detection position are respectively detected. The results are shown in Table 2.
  • Example 1 Haze (%) Visible light transmittance T(%) Roughness Ra(nm) Gloss(%) 1 5 91.5 5 91 2 30 55 40 60 3 65 35 120 30
  • the anti-glare areas of the multiple workpieces produced by the method of the present application are uniformly divided into three areas: upper, middle, and lower. Count the haze, visible light transmittance, roughness and gloss corresponding to each area, and the range is shown in Table 3.
  • the above-mentioned appearance effect of the gradual anti-glare area can be applied to the housing of an electronic device.
  • a housing is also provided in the embodiment of the present application.
  • the housing includes any of the aforementioned workpieces.
  • the workpiece can be a middle frame or cover made of transparent, translucent or opaque material.
  • the middle frame or the cover includes a substrate, and the surface of the substrate has at least one gradual anti-glare area.
  • the glossiness of the substrate in the gradual anti-glare area decreases along at least one preset direction in the gradual anti-glare area; the haze and roughness of the substrate in the gradual anti-glare area are respectively along the aforementioned at least one
  • the preset direction is raised to form a gradual anti-glare appearance effect.
  • the visible light transmittance of the base material in the gradual anti-glare area decreases along at least one preset direction in the gradual anti-glare area.
  • the anti-glare area can be prepared by any of the aforementioned methods.
  • the gradual anti-glare area on its surface, and the corresponding preparation method please refer to the aforementioned related description, which will not be repeated here.
  • the housing may include only the middle frame, or only the cover plate, or both the middle frame and the cover plate.
  • the middle frame and the cover plate can be two independent workpieces, or can be made into one workpiece by integral molding, which is not limited in this application.
  • decorative parts or auxiliary materials are also provided on the shell.
  • the decorative parts here can be commonly used decorative parts in electronic equipment, such as lens of a camera, a lampshade of a flashlight, and the like.
  • the auxiliary material can be the auxiliary material commonly used in electronic equipment, such as foam, adhesive, dustproof mat, etc.
  • Accessories such as foam and adhesive can be installed on one side of the housing, which faces the inside of the electronic device after the housing is assembled into the electronic device.
  • the gradual anti-glare area may be formed on the other side of the housing, which faces the outside of the electronic device after the housing is assembled into the electronic device, and is located in the external environment.
  • An embodiment of the present application also provides an electronic device, which includes a housing, and the housing includes at least one of the aforementioned workpieces.
  • the above-mentioned workpiece may be a cover plate or a frame of the housing, that is, any one of the aforementioned gradual anti-glare areas is provided on the cover or frame of the housing.
  • FIG. 12 is a schematic structural diagram of an implementation manner of the back of the electronic device 100 of this application.
  • the back of the electronic device 100 is a cover 101, and a gradient anti-glare area 11 is provided on the cover 101.
  • the gradual anti-glare area can be realized by any of the aforementioned preparation methods, and the aforementioned related descriptions can be referred to, which will not be repeated here.
  • other necessary components in the above-mentioned electronic device may be different according to different electronic devices.
  • other components may include a display screen, a processor, an external memory interface, an internal memory, a universal serial bus (USB) interface, a charging management module, a power management module, a battery, an antenna, a mobile communication module, and wireless communication Module, audio module, speaker, receiver, microphone, earphone interface, sensor module, button, motor, indicator, camera, subscriber identification module (SIM) card interface, etc.
  • SIM subscriber identification module
  • first and second are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined with “first” and “second” may explicitly or implicitly include one or more of these features.
  • the meaning of “plurality” means two or more than two, unless otherwise specifically defined.

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Abstract

一种工件和工件的制备方法。该工件和工件的制备方法可以应用在电子设备（100）的壳体中，例如手机的盖板、中框等。该工件包括基材（1），基材（1）表面具有至少一个渐变防眩光区域（11）；渐变防眩光区域（11）中的基材（1）的光泽度沿着渐变防眩光区域（11）中的至少一个预设方向降低；渐变防眩光区域（11）中的基材（1）的雾度和粗糙度，分别沿着至少一个预设方向升高。上述工件表面的渐变防眩光区域（11）的光泽度、雾度、粗糙度都是逐渐变化的，中间过渡顺畅、不突兀，从而整体上呈现出一种新的渐变防眩光的外观效果。并且，该工件表面的渐变防眩光区域（11）还具有较好的防眩光和防脏污效果，具有较好的触感。

Description

工件、工件的制备方法、壳体以及电子设备 技术领域
本申请涉及材料表面处理技术领域，具体涉及一种工件，一种工件的制备方法，一种壳体，以及一种电子设备。
背景技术
在电子产品(例如手机等)领域，从美学角度和个性化定制角度出发，产品外观成为了决定消费者能否购买这一电子产品的重要因素之一。对于经典的双镜面设计的电子产品，通过对电子产品的后盖玻璃等进行装饰工艺处理，可以使该电子产品具有差异化、个性化的视觉效果。对于目前的电子产品而言，其玻璃后盖等位置的视觉效果，主要通过黄光蚀刻、蒙砂等工艺来实现。
黄光蚀刻也是一种材料表面的处理工艺。黄光蚀刻的过程主要包括：首先，在材料表面涂覆光敏物质，经曝光、显影之后，留下部分对材料表面具有保护作用的保护层；然后，采用HF等对材料表面上未被保护起来的区域进行蚀刻；最后，将保护层除去，从而使材料表面形成特定的图形。
采用黄光蚀刻的方式来处理材料(例如玻璃)，可以在材料表面形成特定图形。这些图形使得材料表面整体呈现出特定的纹理。由于图形表面仍旧为光面，因此该材料的可见光透过率和光泽度较高，具有较好的立体感。但是同时，该材料表面的粗糙度、雾度很低，故而该材料无法实现防眩光(anti glare，AG)效果。
当光线被过度集中时会使画面的清晰度下降，同时会使观看者产生视觉疲劳，即所谓的眩光。对于表面为镜面的材料而言，直接穿过该材料的光线，或者经该材料表面的镜面反射的光线，由于光线比较集中，故而眩光现象比较明显。为了解决这个问题，可以通过蒙砂工艺来增加材料表面的粗糙度和雾度。
蒙砂是一种材料表面的处理工艺。蒙砂的过程主要包括：首先，用蒙砂粉等配制成的蒙砂液；然后，采用蒙砂液对材料表面进行化学侵蚀，从而使材料表面凹凸不平。
采用蒙砂的方式来处理材料，可以使材料表面具有一定的粗糙度和雾度，从而使照射到材料表面的光线进行漫反射，避免光线过于集中，从而起到防眩光效果。当粗糙度到达一个合适的区间时，该材料的蒙砂面还具有较好的手感。但是，由于材料表面被均一地处理，故而无法在材料表面形成变化的效果。
因此，如何研发一种表面具有新的外观效果的材料，是本领域技术人员亟待解决的问题。
发明内容
本申请提供一种工件，该工件表面具有渐变防眩光区域，该渐变防眩光区域中的基材的光泽度、雾度和粗糙度分别逐渐变化，过渡顺畅、不突兀，从而整体上呈现出一种新的渐变防眩光的外观效果。此外，该工件表面的渐变防眩光区域还具有较好的触感和防脏污效果。
第一方面，本申请提供一种工件，包括基材，所述基材表面具有至少一个渐变防眩光区域；所述渐变防眩光区域中的基材的光泽度沿着所述渐变防眩光区域中的至少一个预设方向降低；所述渐变防眩光区域中的基材的雾度和粗糙度，分别沿着所述至少一个预设方向升高。
采用本实现方式，工件表面的渐变防眩光区域的光泽度、雾度、粗糙度都是逐渐变化的，中间过渡顺畅、不突兀，从而整体上呈现出一种新的渐变防眩光的外观效果。并且，该渐变防眩光区域的形成，使得工件具有较好的立体感，也能实现防眩光效果，还具有较好的触感和防脏污效果。
结合第一方面，在第一方面第一种可能的实现方式中，当所述基材为透明或者半透明的材料时，所述渐变防眩光区域中的基材的可见光透过率，沿着所述渐变防眩光区域中的至少一个预设方向降低。在这种情况下，渐变防眩光区域的可见光透过率也是逐渐变化的，中间过渡顺畅、不突兀，从而整体上呈现出一种新的渐变防眩光的外观效果。并且，该渐变防眩光区域的形成，使得工件具有更好的立体感。
结合第一方面及上述可能的实现方式，在第一方面第二种可能的实现方式中，所述渐变防眩光区域中设有第一预设图案，所述第一预设图案包括多个第一区域，所述多个第一区域的排布密度沿着所述至少一个预设方向升高，所述第一区域中的所述基材的表面为粗糙表面。通过设计第一预设图案中第一区域的排布方式，并将第一区域中的基材的表面设置为粗糙表面，从而形成可见光透过率、光泽度、雾度、粗糙度都逐渐变化的渐变防眩光区域。
结合第一方面及上述可能的实现方式，在第一方面第三种可能的实现方式中，0＜R≤0.05mm，0＜k≤5R；其中，R表示所述第一区域的尺寸；k表示沿着一个预设方向，相邻的所述第一区域之间的间隔距离。将第一区域的尺寸，以及相邻的第一区域之间的间隔距离限定在上述范围之内，以满足工件的外观设计效果的需求，实现渐变防眩光的外观效果，并且，使工件具有较好的立体感和触感，实现防眩光效果和防脏污效果。
结合第一方面及上述可能的实现方式，在第一方面第四种可能的实现方式中，在第二区域中的所述基材的表面为光滑表面；其中，所述第二区域为所述渐变防眩光区域中除所述第一预设图案以外的区域。
结合第一方面及上述可能的实现方式，在第一方面第五种可能的实现方式中，所述基材的材料包括玻璃、塑料和陶瓷中的一种或多种。在多种材料的表面形成渐变防眩光区域，使该工件适合应用在多种不同的产品中，应用范围较广。
第二方面，本申请提供一种工件的制备方法，包括：在基材的至少一个表面设置保护层；其中，所述基材表面的未设置所述保护层的区域形成第一预设图案，所述第一预设图案包括多个第一区域，所述多个第一区域的排布密度沿着至少一个预设方向升高；在所述基材表面的未形成所述保护层的区域进行蒙砂或者喷砂；对蒙砂或者喷砂后的所述基材表面的未形成所述保护层的区域进行化学抛光；去除所述保护层，得到所述工件。
采用本实现方式，首先在基材表面设置一个保护层，使基材表面的未设置所述保护层的区域形成第一预设图案。由于未被保护层覆盖的第一预设图案中的多个第一区域的排布密度是逐渐升高的，因此，在对未被保护层覆盖的基材表面进行蒙砂/喷砂以及化学抛光处理之后，沿着预设方向，粗糙表面的区域的密度越来越大，从而在基材表面形成渐变防眩 光区域。该方法工艺简单，适合工业化生产。
结合第二方面，在第二方面第一种可能的实现方式中，0＜R≤0.05mm，0＜k≤5R；其中，R表示所述第一区域的尺寸；k表示沿着一个预设方向，相邻的所述第一区域之间的间隔距离。将第一区域的尺寸，以及相邻的第一区域之间的间隔距离限定在上述范围之内，以满足工件的外观设计效果的需求，实现渐变防眩光的外观效果，并且，使工件具有较好的立体感和触感，实现防眩光效果和防脏污效果。
结合第二方面及上述可能的实现方式，在第二方面第二种可能的实现方式中，在基材的至少一个表面设置保护层的步骤，包括：在所述基材的至少一个表面形成光阻层；对所述光阻层曝光、显影，形成所述保护层。通过光阻来形成保护层，工艺简单，适合工业化生产。
结合第二方面及上述可能的实现方式，在第二方面第三种可能的实现方式中，当所述光阻层采用负光阻材料时，对所述光阻层曝光、显影，形成所述保护层的步骤包括：在所述光阻层上设置光罩；其中，所述光罩具有第二预设图案，所述第二预设图案与所述第一预设图案相同；将所述基材表面的光阻层与所述光罩进行曝光；显影去除所述光阻层的未被曝光的区域，形成所述保护层。与正光阻材料相比，负光阻材料的解析力高，与基材的粘附性高。将其应用在本申请的方法中，可以使得光阻层在曝光显影，以及后续的蒙砂/喷砂过程中不易脱落，避免工件因为表面的渐变防眩光区域不符合设计要求而报废。
结合第二方面及上述可能的实现方式，在第二方面第四种可能的实现方式中，所述光阻层的厚度为2～5μm。通过形成上述厚度的光阻层，可以避免光阻层在后续的蒙砂或者喷砂过程中发生掉点、脱落等问题，从而避免工件因为表面的渐变防眩光区域不符合设计要求而报废。
结合第二方面及上述可能的实现方式，在第二方面第五种可能的实现方式中，在所述基材表面的未形成所述保护层的区域进行蒙砂或者喷砂的步骤之前，还包括：在所述基材的非加工表面贴设保护膜。保护膜可以在喷砂/蒙砂以及耐化学抛光的过程中保护非加工面，避免非加工面被损伤。此外，在喷砂/蒙砂以及耐化学抛光的过程中，需要将基材在不同的工段之间周转，通过设置保护膜，也可以避免基材在周转运输时产生划伤、沾染脏污等问题。
结合第二方面及上述可能的实现方式，在第二方面第六种可能的实现方式中，所述基材为透明、半透明或者不透明的材料。在多种材料的表面形成渐变防眩光区域，使该工件适合应用在多种不同的产品中，应用范围较广。
结合第二方面及上述可能的实现方式，在第二方面第七种可能的实现方式中，所述基材的材料包括玻璃、塑料和陶瓷中的一种或多种。在多种材料的表面形成渐变防眩光区域，使该工件适合应用在多种不同的产品中，应用范围较广。
第三方面，本申请提供一种壳体，该壳体包括至少一个第一方面的任一种工件，所述壳体上还设置有装饰件或者辅料。
结合第三方面，在第三方面第一种可能的实现方式中，所述工件为壳体的盖板或者中框。
第四方面，本申请提供一种电子设备，所述电子设备包括壳体，所述壳体包括至少一个第一方面的任一种工件。
结合第四方面，在第四方面第一种可能的实现方式中，所述工件为壳体的盖板或者中框。
附图说明
为了更清楚地说明本申请的技术方案，下面将对实施例中所需要使用的附图作简单地介绍。
图1为本申请中工件的基材表面的一个渐变防眩光区域的效果示意图；
图2为图1中的局部A的放大示意图；
图3为本申请中工件的基材表面的另一个渐变防眩光区域的效果示意图；
图4为本申请的工件制备方法的一种实现方式中，在基材表面形成光阻层之后的侧面结构示意图；
图5为本申请的工件制备方法的一种实现方式中，在光阻层上叠放光罩，进行曝光的侧面结构示意图；
图6为本申请的工件制备方法的一种实现方式中，在基材表面设置好保护层之后的侧面结构示意图；
图7为本申请的工件制备方法的一种实现方式中，蒙砂之后的基材的侧面结构示意图；
图8为图7中的局部B的放大示意图；
图9为本申请的工件制备方法的一种实现方式中，化学抛光之后的基材的侧面结构示意图；
图10为图9中的局部C的放大示意图；
图11为本申请的实施例1所制得的玻璃板中的渐变防眩光区域的效果示意图；
图12为本申请的电子设备的一种实现方式的结构示意图。
附图标记说明：
基材1；渐变防眩光区域11；光阻层2；光罩3；基板31；遮光层32；保护层4；第一区域51；第二区域52；电子设备100；盖板101。
具体实施方式
为便于理解本申请的技术方案，以下先对光泽度、雾度、粗糙度、透过率等材料的几个重要的光学性能参数的概念作简单介绍。
光泽度表示材料表面的反射光的能力。表面平滑的材料受到可见光的照射时会产生镜面反射，反射的光线直接照射人眼，使材料表面带有光泽，造成炫目的效果。
雾度表示材料不清晰的程度。用标准光源的一束平行光垂直照射材料，由于材料内部和表面造成散射，使部分平行光偏离入射方向，偏离入射方向大于2.5°的散射光通量Td与透过材料的光通量T2之比的百分率，即为雾度。
粗糙度表示材料表面具有的较小间距和微小峰谷的不平度。材料表面的粗糙度可以采用轮廓的算术平均偏差Ra来表征，也可以采用轮廓的最大高度Rz来表征，在粗糙度测量仪器上二者可以相互转换。在本申请的实施例中将统一采用Ra来表示。
透过率表示光线透过材料的能力。用标准光源一束平行光垂直照射材料，透过材料的光通量T2与照射到材料的入射光通量T1之比，即透过率。
一般地，光泽度、雾度、粗糙度可以用于衡量透明、半透明或者不透明材料的光学性 能，透过率则主要是用于衡量透明或者半透明的材料的光学性能。
本申请实施例提供一种工件，该工件可以被应用在电子设备中。本申请实施例中的电子设备包括但不限于：手机(mobile phone)、平板电脑(Pad)、个人计算机、虚拟现实(virtual reality，VR)终端设备、增强现实(Augmented Reality，AR)终端设备、可穿戴设备、电视、车载终端等。
本申请实施例中的工件包括工业加工过程中的零部件，工件可以是单个零件，也可以是几个零件组合形成的部件等，本申请对此不作限定。本申请中的电子设备的工件可以是电子产品中全部或者局部暴露于外界环境中的零部件，例如手机的壳体、可穿戴设备的佩戴结构等。该工件的基材的全部或者局部表面经过加工之后，可以产生渐变防眩光的效果。
在现有技术中，渐变效果指的是材料表面的纹理逐渐变化，从而产生渐变的视觉效果。防眩光效果指的是通过将材料表面由平整的晶面处理成凹凸不平的粗糙表面，从而具有降低强光反射或直射的效果。因此，在现有技术中，渐变效果和防眩光效果是两种彼此独立的视觉效果。而本申请所说的渐变防眩光效果可以理解为一种整体性的视觉效果。该视觉效果可以用前述的雾度、粗糙度和光泽度这三个光学参数来共同表征。
基于此，本申请实施例中的工件的基材表面可以形成至少一个渐变防眩光区域。对于每一个渐变防眩光区域而言，该区域中的基材的光泽度沿着该渐变防眩光区域中的至少一个预设方向降低；而该区域中基材的雾度和粗糙度，分别沿着所述至少一个预设方向升高。
该工件的基材采用透明、半透明或者不透明的材料，例如玻璃、塑料和陶瓷中的一种或多种。当基材为透明或者半透明的材料时，还可以增加可见光透过率这一光学参数，以四个光学参数来共同表征渐变防眩光的视觉效果。即，渐变防眩光区域中的基材的可见光透过率，沿着所述渐变防眩光区域中的至少一个预设方向降低。
在本申请实施例中，渐变防眩光区域可以为平面区域，也可以为曲面区域，本申请对此不作限定。预设方向可以是渐变防眩光区域上的任意方向，其可以是直线方向，也可以是曲线方向；在一个渐变防眩光区域中可以仅存在一个预设方向，也可以存在多个预设方向，本申请对此不作限定。
例如，请参见图1和图2，图1为本申请的工件的基材表面的一个渐变防眩光区域的效果示意图，图2为图1中的局部A的放大示意图。在图1中，基材表面是一个平面，预设方向为X方向。沿着X方向，该渐变防眩光区域11中的基材的可见光透过率逐渐降低，光泽度也逐渐降低。同时，沿着该X方向，该渐变防眩光区域11中的基材的雾度逐渐升高，粗糙度也逐渐升高。
又例如，请参见图3，图3为本申请的工件的基材表面的另一个渐变防眩光区域的效果示意图。在图3中，基材表面是一个平面，存在多个预设方向，即多个Y方向。沿着多个Y方向，渐变防眩光区域11中的基材的可见光透过率分别逐渐降低，光泽度也分别逐渐降低。同时，沿着多个Y方向，该渐变防眩光区域11中的基材的雾度分别逐渐升高，粗糙度也分别逐渐升高。实际上，图3所示的渐变防眩光区域11中的变化呈现的一种放射状的渐变效果，从圆形的外周的任一个点到圆心的方向，都可以视为一个预设方向。
上述工件表面的渐变防眩光区域的光泽度、雾度、粗糙度都是逐渐变化的，当工件的基材为透明或半透明材料时，渐变防眩光区域的可见光透过率也是逐渐变化的，中间过渡顺畅、不突兀，从而整体上呈现出一种新的渐变防眩光的外观效果。在该工件表面的渐变 防眩光区域中，一部分区域具有较好的光泽度，使工件具有较好的立体感，一部分区域具有较好的雾度和粗糙度，从而实现防眩光效果。当工件的基材为透明或半透明材料时，由于一部分区域具有较好的可见光透过率和光泽度，工件可以呈现出较好的通透性，从而具有更好的立体感。
除此以外，该工件表面的渐变防眩光区域还具有较好的触感和防脏污效果。具体来说，一方面，由于该工件表面的渐变防眩光区域具有渐变的粗糙度，从而使其具有较好的触感。其表面还可以再设置抗指纹涂层，二者结合可以实现类肤质质感。另一方面，由于该工件表面具有渐变的粗糙度和雾度，使得该工件表面的渐变防眩光区域具有较好的防脏污(例如灰尘、油脂、指纹等)效果。相对于平滑的镜面来说，本申请实施例中的渐变防眩光区域具有合适的粗糙度，更不容易粘附脏污。即便粘附了一些脏污，由于渐变防眩光区域具有合适的雾度，故而可以对脏污产生较好的视觉掩盖效果，使肉眼不容易察觉到这些脏污。
可选地，请参见图1至图3，渐变防眩光区域中设有第一预设图案，所述第一预设图案包括多个第一区域51，多个第一区域51的排布密度沿着至少一个预设方向升高。在本申请的实施例中，将渐变防眩光区域11中除第一预设图案以外的区域称为第二区域52。
本申请实施例中的光滑表面，也可以称为光面或镜面，其粗糙度一般很低，甚至可以为0。上述的粗糙表面是与光滑表面相对的概念，粗糙表面一般具有凹凸不平的结构，其粗糙度比光滑表面大。上述第一区域51中的基材的表面为粗糙表面，第二区域52中的基材的表面为光滑表面。
上述第一区域的形状可以是规则形状，也可以是不规则形状，本申请对此不作限定。一般地，同一个第一预设图案中的多个第一区域的形状和尺寸，可以设置为相同，以便于工业化生产。
第一区域的尺寸，可以采用常用的计量方式来度量。例如，当第一区域为圆形时，可以采用半径或者直径作为其尺寸。又例如，当第一区域为正方形时，可以采用正方形的边长作为其尺寸。还例如，当第一区域为不规则形状时，可以采用其重心到边缘的最长距离来作为其尺寸。
可选地，以R表示第一区域的尺寸，则可以限定0＜R≤0.05mm。例如，在图1所示的例子中，第一区域51为圆形，以其半径r来表示第一区域的尺寸，0＜r≤0.05mm。将第一区域51的尺寸限定在上述范围之内，以满足工件的外观设计效果的需求，实现前述的渐变防眩光的外观效果。
沿着一个预设方向，相邻的第一区域之间的间隔距离，可以采用相邻的第一区域的重心之间的直线距离来表示，也可以采用相邻的第一区域之间的最短直线距离等其他方式来表示。因此，多个第一区域的排布密度沿着至少一个预设方向升高，也可以理解为沿着一个预设方向，相邻的第一区域之间的间隔距离逐渐减小。例如，在图1和图3的例子中，以k表示沿着一个预设方向，相邻的第一区域之间的间隔距离，则沿着X方向或者Y方向，一开始k取值较大，随着排布密度的逐渐升高，k的取值逐渐减小。
可选地，0＜k≤5R。例如，在图1和图2所示的例子中，第一区域51为圆形，可以以相邻的两个圆的圆心之间的距离来表示间隔距离，则0＜k≤5r。将相邻的第一区域51之间的间隔距离限定在上述范围之内，以满足工件的外观设计效果的需求，实现前述的渐变防眩光的外观效果。
需要说明的是，对于第一预设图案中相邻的多个第一区域51，其可以彼此独立，也可以连接或者部分重叠。这两种情况可以同时存在于同一个第一预设图案中，如图1和图3所示。
第一区域的基材表面都是经过粗化的凹凸不平的表面，即粗糙表面，其对基材的可见光透过率、光泽度、雾度和粗糙度都存在影响。沿着预设方向，多个第一区域的排布密度逐渐升高。通过这样的方式，可以使得防眩光区域的中的基材的可见光透过率和光泽度，分别沿着该渐变防眩光区域中的至少一个预设方向降低，使得该防眩光区域中基材的雾度和粗糙度，分别沿着所述至少一个预设方向升高，从而实现前述的渐变防眩光效果。
本申请实施例中还提供一种工件的制备方法。该制备方法可以应用到工业产品的零部件上，例如终端产品的盖板、电池盖、装饰件等，从而制备得到前述的任一种具有渐变防眩光区域的工件。该方法可以包括以下步骤100至步骤400。
步骤100：在基材的至少一个表面设置保护层。
本申请实施例中的基材可以是透明、半透明或者不透明的材料，例如可以包括玻璃、塑料和陶瓷中的一种或多种。在不同的应用场景或者设计需求中，可以采用不同材料的基材。
基材可以具有多个表面。例如，对于一个常见的手机后盖而言，其一般具有上表面、下表面以及四个侧表面。其中，下表面和侧表面在安装好之后都面向手机内部，上表面则面向外部环境。根据外观设计方案，需要对上表面进行处理以形成渐变防眩光区域。在本申请实施例中，将需要处理以形成渐变防眩光区域的表面(例如前述的上表面)，称为加工面。将其他不需要处理的表面(例如前述的下表面和四个侧表面)，称为非加工面。因此，可以在加工面上设置保护层。
上述保护层可以采用现有的材料，例如光阻等。保护层具有预先设定好的图案，基材的表面上未设置保护层的区域则形成第一预设图案，因此，保护层的图案和第一预设图案互补。
如前所述，第一预设图案可以包括多个第一区域，这多个第一区域的形状可以是规则形状，也可以是不规则形状。第一区域的形状、尺寸，以及第一区域之间的间隔距离，可以参考此前相关描述，此处不再赘述。
可选地，以R表示第一区域的尺寸，则可以限定0＜R≤0.05mm。例如，请参见图6，图6为本申请的工件制备方法的一种实现方式中，在基材表面设置好保护层之后的侧面结构示意图。在图1和图6所示的例子中，基材1上设置有保护层4，未设置保护层的区域则形成第一预设图案，其中包括了多个第一区域51。第一区域51为圆形，以其半径r来表示第一区域的尺寸，0＜r≤0.05mm。通过将R限定在上述范围之内，以在经过后续的处理步骤之后，使工件表面能够满足外观设计效果的需求，实现前述的渐变防眩光的外观效果。
沿着一个预设方向，相邻的第一区域之间的间隔距离逐渐减小。例如，在图6的例子中，以k表示沿着X方向，相邻的第一区域51之间的间隔距离，则沿着X方向，一开始k取值较大，随着排布密度的逐渐升高，k的取值逐渐减小。
可选地，0＜k≤5R。例如，在图1和图6所示的例子中，第一区域51为圆形，可以以相邻的两个圆的圆心之间的距离来表示间隔距离，则0＜k≤5r。通过将k限定在上述范围 之内，以在经过后续的处理步骤之后，使工件表面能够满足外观设计效果的需求，实现前述的渐变防眩光的外观效果。
需要说明的是，与图1所示的例子类似地，对于第一预设图案中相邻的多个第一区域，其可以彼此独立，也可以连接或者部分重叠。
可选地，可以采用曝光显影的方式来形成保护层。在一种实现方式中，步骤100可以包括：
步骤110：在所述基材的至少一个表面形成光阻层。
步骤120：对所述光阻层曝光、显影，形成所述保护层。
请参见图4，图4为本申请的工件制备方法的一种实现方式中，在基材表面形成光阻层之后的侧面结构示意图。在图4的例子中，基材1上设置有光阻层2，上述的光阻层2可以采用现有的光阻喷涂机进行喷涂形成。
在一般的方案中，光阻喷涂的厚度在2μm以下。而在本申请的实施例中，光阻层的厚度为2-5μm。进一步可选地，光阻层的厚度为3-5μm。光阻层的厚度即为保护层的厚度，通过形成上述厚度的光阻层，可以避免光阻层在后续的蒙砂或者喷砂过程中发生掉点、脱落等问题，从而避免工件因为表面的渐变防眩光区域不符合设计要求而报废。
可选地，在光阻喷涂机喷涂形成光阻层之后，还可以对其进行预固化，从而使光阻层与基材之间的粘结更加牢固。可选地，在一个例子中，预固化的温度可以为110-120℃，预固化的时间可以为1-2min。
在形成光阻层之后，可以采用光罩遮住光阻层的部分区域，然后将其放置在曝光机中进行曝光，再通过显影去掉曝光的或者未曝光的区域，就形成了前述的保护层。一般地，光阻材料有正光阻材料和负光阻材料，在采用不同的光阻时曝光显影所去掉的区域相应地存在区别。其中，正光阻材料被光照射的部分可以被显影液去除，未被光照射的部分不会被显影液去除。负光阻材料则相反，被光照射的部分不会被显影液去除，未被光照射的部分可以被显影液去除。
具体来说，在一种实现方式中，当光阻层采用负光阻材料时，步骤120包括：
步骤121：在所述光阻层上设置光罩；其中，所述光罩的遮光层具有第二预设图案，所述第二预设图案与所述第一预设图案相同。
步骤122：将所述基材表面的光阻层与所述光罩进行曝光。
步骤123：显影去除所述光阻层的未被曝光的区域，形成所述保护层。
请参见图5至图6，其中，图5为本申请的工件制备方法的一种实现方式中，在光阻层上叠放光罩，进行曝光的侧面结构示意图。在图5的例子中，光罩3设置在设置了光阻层2的基材1的上方。光罩3包括基板31和遮光层32，光罩3上遮光层32形成第二预设图案。由于第二预设图案与第一预设图案相同，因此，光阻层2上被遮挡部分在曝光步骤中未被光照射到，如图5所示。未被光线照射到的这些区域的光阻层2可以在显影步骤中被去除。这样，基材1表面留下的光阻层2部分就形成了保护层4，保护层4的图案是与第一预设图案互补的图案，而基材1表面未设置保护层4的区域形成第一预设图案，如图6所示。
可选地，上述的光罩3，可以采用玻璃和铬材料制成。以高纯度、低反射率、低热膨胀系数的石英玻璃为基板31，通过溅射的方式，将铬材料镀在基板31上，形成铬层(即 遮光层32)，铬层的图案为第二预设图案，如图5所示。可选地，铬层的厚度可以约为70nm。由于铬材料对光线完全不透明，故而将该光罩叠放在光阻层上方，就可以在曝光步骤中起到遮挡光线的作用，仅对光阻层上第二预设图案对应的区域以外的部分进行曝光。
可选地，曝光步骤中曝光能量可以采用80mJ/cm 2。在曝光之后，采用显影液去除未曝光区域的光阻，形成与第一预设图案互补的保护层。可选地，显影步骤中显影液的温度可以为23±2℃，风切压力可以采用150KPa。
在另一种实现方式中，当光阻层采用正光阻材料时，步骤120可以包括：
步骤124：在所述光阻层上设置光罩；其中，所述光罩具有第三预设图案，所述第三预设图案与所述第一预设图案互补。
步骤125：将所述基材表面的光阻层与所述光罩进行曝光。
步骤126：显影去除所述光阻层的被曝光的区域，形成所述保护层。
由于光罩上的第三预设图案与第一预设图案互补，因此，光阻层上未被遮挡部分在曝光步骤中被光照射到，其可以在显影步骤中被去除。这样，基材表面留下的保护层，是与第三预设图案相同、与第一预设图案互补的图案，而基材表面未设置保护层的区域形成第一预设图案。
可选地，上述的光罩同样可以采用玻璃和铬材料制成，可以参考前述的相关描述。与前述采用负光阻的方案中的光罩相比，二者的区别是铬层的图案为第三预设图案。
与正光阻材料相比，负光阻材料的解析力高，与基材的粘附性高，在曝光显影，以及后续的蒙砂/喷砂过程中相对不易脱落，更有利于在工件表面形成渐变防眩光区域。
当采用正光阻材料时，曝光和显影的工艺条件，可以参考采用负光阻材料时的条件或者采用现有的工艺条件，此处不再赘述。
步骤200：在所述基材表面的未形成所述保护层的区域进行蒙砂或者喷砂。
蒙砂主要是采用蒙砂液对材料表面进行化学侵蚀，使材料表面凹凸不平的过程。而喷砂是利用高速砂流的冲击作用，对材料表面进行物理侵蚀，使材料表面凹凸不平的过程。
请参见图7和图8，图7为本申请的工件制备方法的一种实现方式中，蒙砂之后的基材的侧面结构示意图；图8为图7中的局部B的放大图。可见，通过蒙砂或者喷砂处理，基材1表面未被保护层4保护起来的区域产生了凹凸不平的结构。而被保护层4保护起来的区域则不会被蒙砂液或者喷砂侵蚀。
上述蒙砂或者喷砂可以采用现有的蒙砂或者喷砂工艺。当采用蒙砂处理时，蒙砂液的浓度、浸泡的时间不同，形成的凹凸不平的结构会存在差异。当采用喷砂处理时，喷砂的粒径、喷砂的速度、时间等不同，形成的凹凸不平的结构也会存在差异。通过控制蒙砂或者喷砂的处理工艺，一定程度上可以调整渐变防眩光区域的雾度和粗糙度。
可选地，当采用喷砂工艺时，可以采用带有棱角、质坚的硅质砂或其它类似性能的粒状物，粒径为2-10μm。硅质砂或其它类似的粒状物不应含有污染玻璃表面的杂质，并且应充分干燥，含水量不大于0.5％。在喷砂时，喷砂用压缩空气进入喷砂罐前需要冷却过滤，达到无油无水的状态。压缩空气的压力可以控制在0.1-0.5MPa之间，供气量不小于1立方米/分钟。
与喷砂相比，在本申请实施例中采用蒙砂工艺，基材表面的保护层相对不容易脱落，从而可以避免对本应当保持平滑的区域造成损伤，避免工件因为表面的渐变防眩光区域不 符合设计要求而报废。
步骤300：对蒙砂或者喷砂后的所述基材表面的未形成所述保护层的区域进行化学抛光。
将蒙砂或者喷砂后的基材浸入到抛光液中，使抛光液对未形成保护层的区域中的基材表面进行侵蚀。请参见图9和图10，图9为本申请的工件制备方法的一种实现方式中，化学抛光之后的基材的侧面结构示意图；图10为图9中的局部C的放大图。从图9和图10可见，通过化学抛光，凹凸不平的结构中的部分尖锐凸起的部分被侵蚀，从而使凹凸不平的结构的高低差异减小。通过蒙砂/喷砂以及化学抛光的步骤之后，基材1表面的未形成所述保护层4的区域就形成了粗糙表面。这些粗糙表面会对基材的透过率、雾度、粗糙度和光泽度产生影响。
可选地，当基材的材料不同时，可以采用不同的抛光液来进行化学抛光。例如，当基材为玻璃时，抛光液可以采用含氟药液，比如HF等。可选地，应用于玻璃基材时，抛光液的浓度可以为0.2％＜抛光液浓度＜2％。可选地，抛光时间可以为5-30min。又例如当基材为陶瓷时，抛光液可以采用强酸溶液，比如HCl等。
可选地，在化学抛光之后，可以对基材表面进行清洗，除去抛光液，以便进行后续步骤。
步骤400：去除所述保护层，得到所述工件。
基材表面上去除了保护层的区域仍然为光滑表面。去除保护层可以采用本领域常用的方法。例如，当保护层的材料为光阻材料时，可以对基材表面进行退光阻处理。可选地，在一种实现方式中，退光阻液可以采用浓度为5％的NaOH溶液，退光阻处理的温度为50±2℃。可选地，在步骤200之前，上述方法还可以包括步骤500。
步骤500：在所述基材的非加工表面贴设保护膜。
该保护膜为能够耐喷砂/蒙砂，以及耐化学抛光的保护膜，从而在喷砂/蒙砂以及耐化学抛光的过程中保护非加工面，避免非加工面被损伤。此外，在喷砂/蒙砂以及耐化学抛光的过程中，需要将基材在不同的工段之间周转，通过设置保护膜，也可以避免基材在周转运输时产生划伤、沾染脏污等问题。
可选地，在通过前述任一种方法制备得到工件以后，还可以对该工件表面进行化学强化处理，从而得到机械强度更好的工件。化学强化处理可以采用现有的方法，此处不再赘述。
由于沿着预设方向，未被保护层覆盖的多个第一区域的排布密度是逐渐升高的，因此，在对未被保护层覆盖的基材表面进行蒙砂/喷砂以及化学抛光处理之后，沿着预设方向，粗糙表面的区域的密度越来越大。通过这样的方式，可以使得渐变防眩光区域的中的基材的可见光透过率和光泽度，分别沿着该渐变防眩光区域中的至少一个预设方向降低，使得该防眩光区域中基材的雾度和粗糙度，分别沿着所述至少一个预设方向升高。
该工件表面的渐变防眩光区域的可见光透过率、光泽度、雾度、粗糙度都是逐渐变化的，中间过渡顺畅、不突兀，从而整体上呈现出一种新的渐变防眩光的外观效果。在该工件表面的渐变防眩光区域中，一部分区域具有较好的可见光透过率、光泽度，使工件呈现出较好的通透性，具有较好的立体感，一部分区域具有较好的雾度和粗糙度，从而实现防眩光效果。除此以外，该工件表面的渐变防眩光区域还具有较好的触感和防脏污效果，具 体可以参考前述的相关描述，此处不再赘述。
下面通过实施例进一步说明本申请的技术方案，但并不因此将本申请限制在以下实施例的范围之内。需要说明的是，实施例中未做特别说明的试剂、原料和仪器设备均可通过商业途径直接购得。未注明具体条件的实验方法，按照常规方法和条件，或按照商品说明书选择。
实施例1
(a)以透明的玻璃板为基材，在玻璃板的其中一个表面上，采用喷涂机喷涂负光阻材料，形成光阻层，光阻层厚度3μm。喷涂后进行预固化，预固化温度为120℃，时间为1min。
(b)准备一玻璃光罩，玻璃光罩中的铬层厚度约70nm，铬层形成第二预设图案。第二预设图案包括多个子区域，这多个子区域的排布密度沿着至少一个预设方向升高。将该玻璃光罩与设置光阻层的玻璃板叠加，放入曝光机中进行曝光，曝光能量80mJ/cm 2。
(c)采用显影液去除光阻层上未被曝光的光阻材料，显影液温度为23±2℃，风切压力150KPa。显影完成后，玻璃板上形成保护层，保护层的图案与第二预设图案互补。也即，玻璃板的该表面上未设置保护层的区域，形成第一预设图案，第一预设图案与第二预设图案是相同的。
(d)除设置有保护层的一面以外，将玻璃板的其他表面都黏贴喷砂保护膜。
(e)选取带有棱角、质坚的硅质砂，粒径为2-10μm，含水量不大于0.5％。采用压缩空气将硅质砂喷向玻璃板的设置有保护层的一面，对未设置保护层和喷砂保护膜的区域进行冲击，从而使其表面产生凹凸不平的结构。在喷砂时，压缩空气在进入喷砂罐之前需要冷却过滤，达到无油无水的状态。压缩空气的压力控制在0.1-0.5MPa之间，供气量不小于1立方米/分钟。
(f)喷砂完成之后，以HF溶液为抛光液，将玻璃板浸泡在HF溶液中，进行化学抛光。HF的浓度1％，抛光时间为20min。抛光完成过后，将玻璃板取出，放入清洗机中清洗干净。
(g)以浓度为5％的NaOH溶液作为退光阻液，将玻璃板浸泡在退光阻液中，除去保护层。退光阻的温度为50±2℃。退光阻完成后，玻璃板表面上的光面部分就形成了与第一预设图案互补的图案，粗糙面部分就形成了与第一预设图案相同的图案。最后，除去玻璃板其他表面上的喷砂保护膜，就得到了具有特定渐变防眩光区域的玻璃板。
实施例2
(a)以透明的玻璃板为基材，在玻璃板的其中一个表面上，采用喷涂机喷涂负光阻材料，形成光阻层，光阻层厚度5μm。喷涂后进行预固化，预固化温度为110℃，时间为2min。
(b)准备一玻璃光罩，玻璃光罩中的铬层厚度约70nm，铬层形成第二预设图案。第二预设图案包括多个子区域，这多个子区域的排布密度沿着至少一个预设方向升高。将该玻璃光罩与设置光阻层的玻璃板叠加，放入曝光机中进行曝光，曝光能量80mJ/cm 2。
(c)采用显影液去除光阻层上未被曝光的光阻材料，显影液温度为23±2℃，风切压力150KPa。显影完成后，玻璃板上形成保护层，保护层的图案与第二预设图案互补。也即，玻璃板的该表面上未设置保护层的区域，形成第一预设图案，第一预设图案与第二预设图案是相同的。
(d)除设置有保护层的一面以外，将玻璃板的其他表面都黏贴蒙砂保护膜。
(e)将蒙砂粉与工业盐酸按1:1的质量比进行混合反应，混合反应的时间为60小时，得到蒙砂液。在使用前，将蒙砂液充分搅拌均匀。将玻璃板放在淋砂架台上(玻璃板斜放角度在25-30°之间)，将玻璃板的需蒙砂处理的一面朝上。将蒙砂液由下到上均匀地淋在玻璃板的需要蒙砂处理的表面上，淋砂时蒙砂液需淋至该表面的每个位置，淋砂时间为2-10分钟。蒙砂液对未设置保护层和蒙砂保护膜的区域进行化学侵蚀，从而使其表面产生凹凸不平的结构。处理完成后，取出已蒙砂的玻璃板，回滴10-30秒以回收蒙砂液。最后，清洗干净该玻璃玻璃板。
(f)蒙砂完成之后，以HF溶液为抛光液，将玻璃板浸泡在HF溶液中，进行化学抛光。HF的浓度1％，抛光时间为20min。抛光完成过后，将玻璃板取出，放入清洗机中清洗干净。
(g)以浓度为5％的NaOH溶液作为退光阻液，将玻璃板浸泡在退光阻液中，除去保护层。退光阻的温度为50±2℃。退光阻完成后，玻璃板表面上的光面部分就形成了与第一预设图案互补的图案，粗糙面部分就形成了与第一预设图案相同的图案。最后，除去玻璃板其他表面上的蒙砂保护膜，就得到了具有特定渐变防眩光区域的玻璃板。
实施例3
(a)以透明的ABS塑料板为基材，在塑料板的其中一个表面上，采用喷涂机喷涂正光阻材料，形成光阻层，光阻层厚度5μm。喷涂后进行预固化，预固化温度为110℃，时间为2min。
(b)准备一玻璃光罩，玻璃光罩中的铬层厚度约70nm，铬层形成第二预设图案。未设置铬层的区域，包括多个子区域，这多个子区域的排布密度沿着至少一个预设方向升高。将该玻璃光罩与设置光阻层的塑料板叠加，放入曝光机中进行曝光，曝光能量80mJ/cm 2。
(c)采用显影液去除光阻层上被曝光的光阻材料，显影液温度为23±2℃，风切压力150KPa。显影完成后，塑料板上形成保护层，保护层的图案与第二预设图案相同。也即，塑料板的该表面上未设置保护层的区域，形成第一预设图案，第一预设图案与第二预设图案互补。
(d)除设置有保护层的一面以外，将塑料板的其他表面都黏贴喷砂保护膜。
(e)选取带有棱角、质坚的硅质砂，粒径为2-10μm，含水量不大于0.5％。采用压缩空气将硅质砂喷向塑料板的设置有保护层的一面，对未设置保护层和喷砂保护膜的区域进行冲击，从而使其表面产生凹凸不平的结构。在喷砂时，压缩空气在进入喷砂罐之前需要冷却过滤，达到无油无水的状态。压缩空气的压力控制在0.1-0.5MPa之间，供气量不小于1立方米/分钟。
(f)喷砂完成之后，可采用丙酮溶液水浴加热法对塑料板进行化学抛光。以丙酮溶液为抛光液，水浴加热丙酮溶液，使丙酮蒸汽挥发至塑料板表面。塑胶板与丙酮发生反应，溶胀以实现抛光效果。化学抛光时温度控制在56度，维持时间1mins。完成后停止加热，使塑料板冷却至室温，待塑料板表面的溶剂完全挥发后取出。
(g)以浓度为5％的NaOH溶液作为退光阻液，将塑料板浸泡在退光阻液中，除去保护层。退光阻的温度为50±2℃。退光阻完成后，塑料板表面上的光面部分就形成了与第一预设图案互补的图案，粗糙面部分就形成了与第一预设图案相同的图案。最后，除去塑料板其他表面上的喷砂保护膜，就得到了具有特定渐变防眩光区域的塑料板。
实施例4
(a)以不透明的陶瓷板为基材，在陶瓷板的其中一个表面上，采用喷涂机喷涂负光阻材料，形成光阻层，光阻层厚度2μm。喷涂后进行预固化，预固化温度为120℃，时间为1min。
(b)准备一玻璃光罩，玻璃光罩中的铬层厚度约70nm，铬层形成第二预设图案。第二预设图案包括多个子区域，这多个子区域的排布密度沿着至少一个预设方向升高。将该玻璃光罩与设置光阻层的陶瓷板叠加，放入曝光机中进行曝光，曝光能量80mJ/cm 2。
(c)采用显影液去除光阻层上未被曝光的光阻材料，显影液温度为23±2℃，风切压力150KPa。显影完成后，陶瓷板上形成保护层，保护层的图案与第二预设图案互补。也即，陶瓷板的该表面上未设置保护层的区域，形成第一预设图案，第一预设图案与第二预设图案是相同的。
(d)除设置有保护层的一面以外，将陶瓷板的其他表面都黏贴喷砂保护膜。
(e)选取带有棱角、质坚的硅质砂，粒径为2-10μm，含水量不大于0.5％。采用压缩空气将硅质砂喷向陶瓷板的设置有保护层的一面，对未设置保护层和喷砂保护膜的区域进行冲击，从而使其表面产生凹凸不平的结构。在喷砂时，压缩空气在进入喷砂罐之前需要冷却过滤，达到无油无水的状态。压缩空气的压力控制在0.1-0.5MPa之间，供气量不小于1立方米/分钟。
(f)喷砂完成之后，以盐酸溶液为抛光液，将陶瓷板浸泡在盐酸溶液中，进行化学抛光。盐酸的浓度10％，抛光时间为20min。抛光完成过后，将陶瓷板取出，放入清洗机中清洗干净。
(g)以浓度为5％的NaOH溶液作为退光阻液，将陶瓷板浸泡在退光阻液中，除去保护层。退光阻的温度为50±2℃。退光阻完成后，陶瓷板表面上的光面部分就形成了与第一预设图案互补的图案，粗糙面部分就形成了与第一预设图案相同的图案。最后，除去陶瓷板其他表面上的喷砂保护膜，就得到了具有特定渐变防眩光区域的陶瓷板。
比较例1采用黄光蚀刻工艺处理玻璃板
(a)以透明的玻璃板为基材，在玻璃板的其中一个表面上，采用喷涂机喷涂负光阻材料，形成光阻层，光阻层厚度1μm。喷涂后进行预固化，预固化温度为110℃，时间为2min。
(b)准备一玻璃光罩，玻璃光罩中的铬层厚度约70nm，铬层形成第二预设图案。第二预设图案包括多个子区域，这多个子区域的排布密度沿着至少一个预设方向升高。将该玻璃光罩与设置光阻层的玻璃板叠加，放入曝光机中进行曝光，曝光能量80mJ/cm 2。
(c)采用显影液去除光阻层上未被曝光的光阻材料，显影液温度为23±2℃，风切压力150KPa。显影完成后，玻璃板上形成保护层，保护层的图案与第二预设图案互补。也即，玻璃板的该表面上未设置保护层的区域，形成第一预设图案，第一预设图案与第二预设图案是相同的。
(d)采用HF溶液对未设置保护层和蒙砂保护膜的区域进行蚀刻，从而使其表面产生光洁的凹面结构。
(e)蚀刻完成之后，以浓度为5％的NaOH溶液作为退光阻液，将玻璃板浸泡在退光阻液中，除去保护层。退光阻的温度为50±2℃。退光阻完成后，玻璃板表面上的凹面部分就形成了与第一预设图案相同的图案，得到经过黄光蚀刻之后的玻璃板。
比较例2采用蒙砂工艺处理玻璃板
(a)以透明的玻璃板为基材，以玻璃板的其中一个表面为加工面，将除加工面以外的其他表面都黏贴蒙砂保护膜。
(b)将玻璃板浸泡到蒙砂液中，对玻璃板的加工面进行化学侵蚀，从而加工面表面产生凹凸不平的结构。
(c)蒙砂完成之后，将玻璃板取出，除去玻璃板其他表面上的蒙砂保护膜，清洗干净，得到经过蒙砂处理之后的玻璃板。
效果实施例
图11为实施例1所制得的玻璃板中的渐变防眩光区域的效果示意图。其中，颜色越深，表示该区域的对应的雾度越大，可见光透过率越小，粗糙度越大，光泽度越小。将实施例1所制得的玻璃板中的渐变防眩光区域划分为上、中、下三个区域。在每个区域中确定一个检测位置(对应图11中的①②③)，分别检测每个检测位置的雾度、可见光透过率、粗糙度和光泽度，结果如表1所示。
实施例2所制得的玻璃板中的渐变防眩光区域的效果与实施例1的类似。将实施例2所制得的玻璃板中的渐变防眩光区域也划分为上、中、下三个区域。与检测实施例1的玻璃板类似地，在每个区域中也确定一个检测位置，分别检测每个检测位置的雾度、可见光透过率、粗糙度和光泽度，结果如表2所示。
表1实施例1所制得的玻璃板中的渐变防眩光区域的参数检测结果
实施例1 雾度(％) 可见光透过率T(％) 粗糙度Ra(nm) 光泽度(％)
① 5 91.5 5 91
② 30 55 40 60
③ 65 35 120 30
表2实施例2所制得的玻璃板中的渐变防眩光区域的参数检测结果
实施例2 雾度 可见光透过率T(％) 粗糙度Ra(nm) 光泽度(％)
① 3 91.5 2 91
② 45 75 80 70
③ 95 55 180 45
将采用本申请的方法所制得的多个工件的防眩光区域都统一划分为上、中、下三个区域。统计每一个区域对应的雾度、可见光透过率、粗糙度和光泽度，其范围如表3所示。
表3工件的防眩光区域中不同区域参数范围
Figure PCTCN2020116125-appb-000001
检测比较例1和比较例2制得的玻璃板的不同区域的雾度、可见光透过率、粗糙度和光泽度。由于比较例1中黄光蚀刻的凹面仍然为光面，并且凹面的深度一致，故而不同区域检测得到的雾度、可见光透过率、粗糙度和光泽度总体一致，如表4所示。比较例2中整个玻璃板的加工面进行了均一的蒙砂处理，故而其不同区域的雾度、可见光透过率、粗 糙度和光泽度总体也一致，如表5所示。
表4比较例1所制得的玻璃板的检测结果
  雾度 可见光透过率T(％) 粗糙度Ra(nm) 光泽度(％)
比较例1 0 90 1 90
表5比较例2所制得的玻璃板的检测结果
  雾度 可见光透过率T(％) 粗糙度Ra(nm) 光泽度(％)
比较例2 63 32 116 30
通过上述实施例和比较例的检测结果也可见，采用黄光蚀刻工艺对玻璃板表面进行处理之后，玻璃板表面的雾度仍然为零，粗糙度也很小，无法实现防眩光效果。采用蒙砂工艺对玻璃板表面进行处理之后，玻璃板表面的雾度、可见光透过率、粗糙度和光泽度都是均一的，无法实现本申请中的渐变防眩光的效果。而采用本申请的方法处理的玻璃板，可见光透过率、光泽度、雾度、粗糙度都是沿着预设的方向逐渐变化的，中间过渡顺畅、不突兀，从而整体上呈现出一种渐变防眩光的外观效果。
上述的渐变防眩光区域的外观效果，可以应用在电子设备的壳体上。基于此，在本申请的实施例中还提供一种壳体。该壳体包括了前述的任一种工件。工件具体可以是透明、半透明或者不透明材料制成的中框或盖板(cover)等。中框或盖板包括基材，基材表面具有至少一个渐变防眩光区域。该渐变防眩光区域中的基材的光泽度沿着该渐变防眩光区域中的至少一个预设方向降低；该渐变防眩光区域中的基材的雾度和粗糙度，分别沿着前述至少一个预设方向升高，从而形成渐变防眩光的外观效果。当中框或盖板采用透明或者半透明的材料为基材时，渐变防眩光区域中的基材的可见光透过率沿着所述渐变防眩光区域中的至少一个预设方向降低。该防眩光区域可以由前述的任一种方法制备得到。工件、其表面的渐变防眩光区域，以及相应的制备方法可以参考前述相关描述，此处不再赘述。
需要说明的是，壳体可以仅包括中框，或仅包括盖板，也可以同时包括中框和盖板。中框和盖板可以是两个各自独立的工件，也可以通过一体成型的方式制作成一个工件，本申请对此不作限定。
可选地，壳体上还设置有装饰件或者辅料。这里的装饰件可以是电子设备中常用的装饰件，例如摄像头的镜片、闪光灯灯罩等。辅料可以是电子设备中常用的辅料，例如泡棉、背胶、防尘垫等。泡棉、背胶等辅料可以安装在壳体的一面，这一面在壳体被组装成电子设备之后朝向电子设备的内部。而渐变防眩光区域可以在壳体的另一面形成，这一面在壳体被组装成电子设备之后朝向电子设备的外部，处于外界环境中。
本申请实施例中还提供一种电子设备，该电子设备包括壳体，壳体包括至少一个前述的任一种工件。上述的工件可以是壳体的盖板或者边框等，也就是说，在壳体的盖板或者边框上设置前述的任一种渐变防眩光区域。例如，请参见图12，图12为本申请的电子设备100的背面的一种实现方式的结构示意图。该电子设备100的背面为盖板101，盖板101上设置有渐变防眩光区域11。渐变防眩光区域可以通过前述的任一种制备方法来实现，可以参考前述相关描述，此处不再赘述。
此外，上述电子设备中的其他必要的组件，可以根据电子设备的不同而不同。例如，其他组件可以包括显示屏、处理器、外部存储器接口、内部存储器、通用串行总线(universal serial bus，USB)接口、充电管理模块、电源管理模块、电池、天线、移动通信模块、无 线通信模块、音频模块、扬声器、受话器、麦克风、耳机接口、传感器模块、按键、马达、指示器、摄像头、用户标识模块(subscriber identification module，SIM)卡接口等。
应理解，在本申请的描述中，术语“上”、“下”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。
应理解，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。“多个”的含义是两个或两个以上，除非另有明确具体的限定。
还应理解，本说明书中各个实施例之间相同相似的部分互相参见即可，上述的实施例并不构成对本发明保护范围的限定。对于本领域的技术人员来说，本发明可以有各种更改和变化。凡在本发明的精神和原则之内所作的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。

Claims (18)

  1. 一种工件，其特征在于，包括基材，所述基材表面具有至少一个渐变防眩光区域；所述渐变防眩光区域中的基材的光泽度沿着所述渐变防眩光区域中的至少一个预设方向降低；所述渐变防眩光区域中的基材的雾度和粗糙度，分别沿着所述至少一个预设方向升高。
  2. 根据权利要求1所述的工件，其特征在于，当所述基材为透明或者半透明的材料时，所述渐变防眩光区域中的基材的可见光透过率，沿着所述渐变防眩光区域中的至少一个预设方向降低。
  3. 根据权利要求1或2所述的工件，其特征在于，所述渐变防眩光区域中设有第一预设图案，所述第一预设图案包括多个第一区域，所述多个第一区域的排布密度沿着所述至少一个预设方向升高，所述第一区域中的所述基材的表面为粗糙表面。
  4. 根据权利要求3所述的工件，其特征在于，0＜R≤0.05mm，0＜k≤5R；其中，R表示所述第一区域的尺寸；k表示沿着一个预设方向，相邻的所述第一区域之间的间隔距离。
  5. 根据权利要求3或4所述的工件，其特征在于，在第二区域中的所述基材的表面为光滑表面；其中，所述第二区域为所述渐变防眩光区域中除所述第一预设图案以外的区域。
  6. 根据权利要求1-5任一项所述的工件，其特征在于，所述基材的材料包括玻璃、塑料和陶瓷中的一种或多种。
  7. 一种工件的制备方法，其特征在于，包括：
    在基材的至少一个表面设置保护层；其中，所述基材表面的未设置所述保护层的区域形成第一预设图案，所述第一预设图案包括多个第一区域，所述多个第一区域的排布密度沿着至少一个预设方向升高；
    在所述基材表面的未形成所述保护层的区域进行蒙砂或者喷砂；
    对蒙砂或者喷砂后的所述基材表面的未形成所述保护层的区域进行化学抛光；
    去除所述保护层，得到所述工件。
  8. 根据权利要求7所述的方法，其特征在于，0＜R≤0.05mm，0＜k≤5R；其中，R表示所述第一区域的尺寸；k表示沿着一个预设方向，相邻的所述第一区域之间的间隔距离。
  9. 根据权利要求7或8所述的方法，其特征在于，在基材的至少一个表面设置保护层的步骤，包括：
    在所述基材的至少一个表面形成光阻层；
    对所述光阻层曝光、显影，形成所述保护层。
  10. 根据权利要求9所述的方法，其特征在于，当所述光阻层采用负光阻材料时，对所述光阻层曝光、显影，形成所述保护层的步骤包括：
    在所述光阻层上设置光罩；其中，所述光罩的遮光层具有第二预设图案，所述第二预设图案与所述第一预设图案相同；
    将所述基材表面的光阻层与所述光罩进行曝光；
    显影去除所述光阻层的未被曝光的区域，形成所述保护层。
  11. 根据权利要求9所述的方法，其特征在于，所述光阻层的厚度为2～5μm。
  12. 根据权利要求7-11任一项所述的方法，其特征在于，在所述基材表面的未形成所 述保护层的区域进行蒙砂或者喷砂的步骤之前，还包括：
    在所述基材的非加工表面贴设保护膜。
  13. 根据权利要求7-12任一项所述的方法，其特征在于，所述基材为透明、半透明或者不透明的材料。
  14. 根据权利要求7-13任一项所述的方法，其特征在于，所述基材的材料包括玻璃、塑料和陶瓷中的一种或多种。
  15. 一种壳体，其特征在于，包括至少一个权利要求1-6任一项所述的工件，所述壳体上还设置有装饰件或者辅料。
  16. 根据权利要求15所述的壳体，其特征在于，所述工件为壳体的盖板或者中框。
  17. 一种电子设备，其特征在于，所述电子设备包括壳体，所述壳体包括至少一个权利要求1-6任一项所述的工件。
  18. 根据权利要求17所述的电子设备，其特征在于，所述工件为所述壳体的盖板或者中框。
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