WO2021007962A1 - 柔性oled显示面板、制作方法及智能穿戴设备 - Google Patents

柔性oled显示面板、制作方法及智能穿戴设备 Download PDF

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WO2021007962A1
WO2021007962A1 PCT/CN2019/110391 CN2019110391W WO2021007962A1 WO 2021007962 A1 WO2021007962 A1 WO 2021007962A1 CN 2019110391 W CN2019110391 W CN 2019110391W WO 2021007962 A1 WO2021007962 A1 WO 2021007962A1
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Prior art keywords
layer
display panel
oled display
flexible
pmma
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PCT/CN2019/110391
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English (en)
French (fr)
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张月
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武汉华星光电半导体显示技术有限公司
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Priority to US16/630,445 priority Critical patent/US11296298B2/en
Publication of WO2021007962A1 publication Critical patent/WO2021007962A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/81—Anodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/805—Electrodes
    • H10K59/8051—Anodes
    • H10K59/80517—Multilayers, e.g. transparent multilayers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/80—Manufacture or treatment specially adapted for the organic devices covered by this subclass using temporary substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • H10K77/111—Flexible substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/311—Flexible OLED
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/351—Thickness
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • This application relates to the technical field of display panels, and in particular to a flexible OLED display panel, a manufacturing method and a smart wearable device.
  • ITO Indium tin oxide
  • the sheet resistance of the ITO electrode will rise rapidly after the flexible OLED display panel is bent many times. Therefore, it is not suitable for making flexible OLEDs, especially for making smart OLED panels.
  • Wearable devices ITO electrodes are even more unable to adapt to the different bending shapes of smart wearable devices when worn on different parts of the human body.
  • the raw material resources of ITO become more and more scarce, the cost is getting higher and higher, and it is not acid-resistant and easy to bear. Shortcomings such as fragility; therefore, there is an urgent need for a self-supporting and flexible OLED display panel.
  • the embodiments of the present application provide a flexible OLED display panel, a manufacturing method, and a smart wearable device, so as to solve the problems of the existing ITO electrode material shortage, complicated manufacturing process, and unsuitability for flexible bending of the flexible OLED display panel.
  • a flexible OLED display panel which includes a conductive layer and a metal anode layer disposed on one side of the conductive layer.
  • the material of the conductive layer is a mixture of silver nanowires and PMMA.
  • the flexible OLED display panel provided by the embodiment of the present application, it further includes a flexible supporting layer, the flexible supporting layer is disposed on the side of the conductive layer away from the metal anode layer, and the material of the flexible supporting layer is PMMA .
  • the thickness of the flexible support layer is 1 um-10 um.
  • the thickness of the conductive layer is 50 nm to 150 nm.
  • the orthographic projection of the conductive layer on the metal anode layer coincides with the metal anode layer.
  • a flexible OLED module is provided on the metal anode layer.
  • a manufacturing method of a flexible OLED display panel including:
  • the material of the conductive layer is a mixture of silver nanowires and PMMA;
  • a metal anode layer is formed on the conductive layer.
  • the method before the forming of the conductive layer, the method further includes:
  • a flexible supporting layer is formed, the conductive layer is formed on the flexible supporting layer, and the material of the flexible supporting layer is PMMA.
  • the forming the flexible support layer includes:
  • the method further includes:
  • the hydrophobic layer is peeled off from the flexible support layer.
  • the conductive layer is formed, and the conductive layer is made of a mixture of silver nanowires and PMMA, including:
  • the first spin-coating process is used to spin-coat a mixed dispersion solution of silver nanowires and PMMA on the flexible support layer, and then a first baking process is performed on the spin-coated silver nanowires and PMMA mixed dispersion solution to solidify the material to form It is a conductive layer of a mixture of silver nanowires and PMMA.
  • the rotation speed of the mixed dispersion solution of spin-coated silver nanowires and PMMA is 1000-3000 rpm, and the spin-coated silver
  • the time for the mixed dispersion solution of nanowires and PMMA is 10 s to 60 s.
  • the baking temperature in the first baking process is 100° C.
  • the baking time is 3 min.
  • the thickness of the conductive layer is 50 nm to 150 nm.
  • the forming the flexible supporting layer, and the material of the flexible supporting layer is PMMA includes:
  • a second spin-coating process is used to spin-coat the PMMA solution on the hydrophobic layer, and then the spin-coated PMMA solution is subjected to a second baking process to be cured to form a flexible support layer of PMMA.
  • the rotation speed of the PMMA solution is 600-3000 rpm, and the time for the PMMA solution is 10 s ⁇ 120s.
  • the baking temperature in the second baking process is 100° C.
  • the baking time is 3 min.
  • the concentration of the PMMA solution is 1 mg/ml-10 mg/ml.
  • the substrate is a silicon wafer rigid substrate or a glass rigid substrate.
  • the forming a hydrophobic layer on the surface of the substrate includes:
  • the cleaned substrate was allowed to stand in n-octadecyltrichlorosilane vapor at 95°C for 4 hours to form the hydrophobic layer on the surface of the substrate.
  • a smart wearable device which includes the flexible OLED display panel as described in any one of the foregoing.
  • the beneficial effect of the present application is: by using a mixture of silver nanowires and PMMA as the material of the conductive layer, the roughness of the surface of the conductive layer is reduced, so that the conductive layer has good continuity, thereby improving the metal anode layer on the conductive layer.
  • the use of PMMA as the material of the flexible support layer realizes the flexible support of the flexible support layer to other parts of the flexible OLED display panel.
  • a layer is formed on the surface of the substrate.
  • the hydrophobic layer realizes that the flexible OLED display panel is well separated from the substrate through the hydrophobic layer after the flexible support layer is completed. On the whole, the flexible support layer realizes a good overall flexible support for the flexible OLED display panel, and the conductive layer also has good flexibility The bending ability makes the flexible OLED display panel suitable for smart wearable devices.
  • FIG. 1 is a schematic structural diagram of a flexible OLED display panel provided by an embodiment of the application
  • FIG. 2 is a schematic block diagram of a manufacturing method of a flexible OLED display panel provided by an embodiment of the application;
  • FIG. 3 is a schematic block diagram of another method for manufacturing a flexible OLED display panel according to an embodiment of the application.
  • connection should be interpreted broadly unless otherwise clearly specified and limited.
  • it can be a fixed connection or a detachable connection. Connected or integrally connected; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal communication between two components.
  • connection should be interpreted broadly unless otherwise clearly specified and limited.
  • it can be a fixed connection or a detachable connection. Connected or integrally connected; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal communication between two components.
  • an embodiment of the present application provides a flexible OLED display panel, which includes a conductive layer 1 and a metal anode layer 2 provided on one side of the conductive layer 1.
  • the conductive layer is made of silver nanowires and A mixture of PMMA (Polymethyl methacrylate).
  • the metal anode layer 2 is made of a silver metal material, in the mixture of the silver nanowires and PMMA, PMMA (Polymethyl methacrylate) is polymethyl methacrylate, and the diameter of the silver nanowires is 10um ⁇ 200um.
  • the thickness of the conductive layer 1 is 50 nm to 150 nm.
  • the orthographic projection of the conductive layer 1 on the metal anode layer 2 overlaps with the metal anode layer. It can be understood that the pattern of the orthographic projection of the conductive layer 1 on the metal anode layer 2 is the same as The metal anode layer 2 has the same anode pattern, and the material of the conductive layer 1 is a mixture of silver nanowires and PMMA. Compared with the original ITO electrode, the conductive layer formed by the mixture of silver nanowires and PMMA is conductive The surface roughness of the layer 1 is lower, smoother and more uniform, and the continuity of the metal anode layer 2 (especially the silver metal anode layer) is improved, so that the metal anode layer 2 has better conductivity.
  • the flexible OLED display panel further includes a flexible supporting layer 3, which is disposed on the side of the conductive layer 1 away from the metal anode layer 2, and the flexible supporting layer 3
  • the material is PMMA (Polymethyl methacrylate); In one embodiment, specifically, the thickness of the flexible support layer 3 is 1um-10um.
  • the flexible support layer 3 and the metal anode layer 2 are respectively located on both sides of the conductive layer 1, wherein the PMMA material is colorless, transparent and transparent.
  • the light rate reaches 90% to 92%, and it has good toughness.
  • PMMA as the material of the flexible support layer, it can well realize the flexible support of the flexible support layer to other parts of the flexible OLED display panel.
  • the metal anode layer 2 is provided with a flexible OLED module 4; it is understandable that the structure of the flexible OLED module 4 is well known to those skilled in the art Common structural forms. In one embodiment, the following structure is taken as an example, but not limited to this.
  • the flexible OLED module 4 disposed on the metal anode layer 2 includes in turn: a hole injection layer and a hole transport layer , Organic light-emitting layer, electron transport layer, electron injection layer, metal cathode layer and encapsulation layer.
  • this application uses a mixture of silver nanowires and PMMA as the material of the conductive layer to reduce the surface roughness of the conductive layer, so that the conductive layer has good continuity, thereby improving the conductivity of the metal anode layer on the conductive layer.
  • the use of PMMA as the material of the flexible support layer realizes the flexible support of the flexible support layer to other parts of the flexible OLED display panel; schematically, as shown in Figure 1, the flexible OLED display panel of the present application is In the bent state, there is no need for the support of the rigid backplane, and the flexible support layer can achieve flexible self-support in the bent state.
  • the conductive layer in the present application is supported in a flexible manner. Under different bending states, the layer can fit well to the flexible support layer and has good bending performance.
  • This application also provides a manufacturing method of a flexible OLED display panel, as shown in FIG. 2, including:
  • S20 forming a conductive layer, the material of the conductive layer is a mixture of silver nanowires and PMMA;
  • the conductive layer is formed by spin-coating a mixed dispersion solution of silver nanowires and PMMA on a base layer, and then curing by baking, the forming material is silver Conductive layer of a mixture of nanowires and PMMA; specifically, the rotation speed of the mixed dispersion solution of spin-coated silver nanowires and PMMA is 1000-3000 rpm, and the spin-coating time is 10 s-60 s; then the temperature is 100 °C Bake for 3 minutes to cure under the conditions of, and the specific thickness of the conductive layer formed can be adjusted by adjusting the relevant parameters in the actual process preparation. In this embodiment, the thickness is preferably prepared to be 50 nm to 150 nm;
  • the mixed dispersion solution of silver nanowires and PMMA used can be prepared by the following method: take 10mg of silver nanowires and place 10ml of PMMA solution and stir them with ultrasonic magnetic force to obtain silver nanowires.
  • a mixed dispersion solution of wire and PMMA; wherein the concentration of the PMMA solution is specifically 1 mg/ml to 10 mg/ml; the silver nanowire material used can be obtained through preparation or other commercial methods, and the preparation method is a technology in the art Conventional techniques well-known to the personnel will not be repeated here.
  • step S20 after the conductive layer is formed, it also includes patterning the conductive layer. Specifically, it may be physical cutting or oxygen ion etching (O2 patterning the conductive layer by plasma ion etching) so that the conductive layer forms a certain anode pattern;
  • a metal anode layer is formed on the conductive layer.
  • a metal anode layer having the same anode pattern as the conductive layer may be formed on the conductive layer by vacuum evaporation; obviously;
  • the anode layer in the existing flexible OLED display panel is patterned to form the desired anode pattern, which is a conventional functional structure, and will not be repeated here.
  • the method before forming the conductive layer, the method further includes:
  • the base layer in the foregoing step S20 may be the flexible support layer; by spin-coating a mixed dispersion solution of silver nanowires and PMMA on the flexible support layer, and then baking The curing method is to form a conductive layer made of a mixture of silver nanowires and PMMA.
  • step S10 said forming a flexible support layer includes:
  • the substrate provided may be a rigid substrate such as silicon wafer or glass.
  • a hydrophobic layer is formed on the surface of the substrate. Specifically, the substrate is allowed to stand in n-octadecyltrichlorosilane vapor at 95°C for 4 hours to allow Forming the hydrophobic layer on the surface of the substrate;
  • step S12 before forming a hydrophobic layer on the surface of the substrate, further includes a pair of cleaning treatment steps for the substrate.
  • the substrate may be sequentially passed through isopropyl alcohol (IPA) and Deionized water, ethyl alcohol Alcohol absolute) were cleaned ultrasonically for 20 minutes, then dried with nitrogen, and then dried in an inert atmosphere at 180° C. for 1 hour to obtain a clean substrate.
  • IPA isopropyl alcohol
  • Deionized water ethyl alcohol Alcohol absolute
  • step S13 forming a flexible supporting layer on the hydrophobic layer, which may be spin-coating a PMMA solution on the hydrophobic layer, and baking it to solidify to form a flexible supporting layer made of PMMA; Specifically, under the condition that the rotation speed of the spin-coated PMMA solution is 600-3000 rpm, a PMMA solution with a concentration of 1 mg/ml-10 mg/ml is spin-coated on the hydrophobic layer for 10 s to 120 s;
  • the thickness of the formed flexible support layer can be adjusted by adjusting the relevant parameters in the actual process preparation.
  • the thickness of the flexible support layer is preferably 1um-10um in this embodiment.
  • the method further includes:
  • a flexible OLED module can be formed on the metal anode layer.
  • the flexible OLED module sequentially includes: a hole injection layer
  • functional layers such as hole transport layer, organic light emitting layer, electron transport layer, electron injection layer, metal cathode layer and encapsulation layer.
  • Each functional layer can be formed by vacuum evaporation, and the specific steps will not be repeated here. .
  • step S40 the hydrophobic layer is peeled from the flexible support layer; specifically, after the flexible OLED module is formed on the metal anode layer, the hydrophobic layer is removed from the The flexible support layer is peeled off to obtain the flexible OLED display panel; it is worth noting that, before the flexible OLED module is formed on the metal anode layer, the hydrophobic layer is peeled off from the flexible support layer , In order to obtain the structure formed by the flexible support layer, the conductive layer and the metal anode layer, and then the structure is subsequently used.
  • a hydrophobic layer is formed on the surface of the substrate to achieve good separation of the flexible support layer from the substrate through the hydrophobic layer; and, by spin coating
  • the flexible support layer and the conductive layer are made with the drying method, and the thickness of the flexible support layer and the conductive layer can be well controlled by adjusting the spin coating solution concentration and spin coating time and other parameters.
  • the present application also provides a smart wearable device, which includes the flexible OLED display panel as described in any one of the foregoing; the smart wearable device has good adaptability to various parts of the human body, especially The flexible OLED display panel can be bent and fit to the surface of the worn part according to the wearing part, and also has a certain self-supporting ability. For example, when worn on the wrist, the flexible OLED display panel on the smart wearable device can be wound around Surface display of the wrist, etc.
  • this application uses a mixture of silver nanowires and PMMA as the material of the conductive layer to reduce the surface roughness of the conductive layer, so that the conductive layer has good continuity, thereby improving the conductivity of the metal anode layer on the conductive layer.
  • PMMA as the material of the flexible support layer realizes the flexible support of the flexible support layer to other parts of the flexible OLED display panel.
  • a hydrophobic layer is formed on the surface of the substrate. After the flexible OLED display panel is manufactured, the hydrophobic layer is well separated from the substrate. On the whole, the flexible support layer achieves a good overall flexible support for the flexible OLED display panel, and the conductive layer also has good flexible bending ability , Which makes the flexible OLED display panel suitable for smart wearable devices.

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Abstract

本申请公开了一种柔性OLED显示面板、制作方法及智能穿戴设备；所述显示面板包括导电层和设置于所述导电层一侧的金属阳极层，所述导电层的材料为银纳米线与PMMA的混合物。

Description

柔性OLED显示面板、制作方法及智能穿戴设备 技术领域
本申请涉及显示面板技术领域，尤其涉及一种柔性OLED显示面板、制作方法及智能穿戴设备。
 背景技术
随着移动互联网技术的发展和低功耗芯片、柔性电路板等穿戴设备核心硬件技术的成熟，具备柔性显示功能的穿戴设备已经从概念化的设想逐渐走向商用化。
目前，柔性OLED显示面板产业化生产大多采用硬屏玻璃基板，常用的阳极结构式上面附有阳极ITO/Ag/ITO的结构，即主要电极材料是ITO(Indium tin oxide)，因为ITO的高透光性和高导电率而广泛应用于光电器件的电极上。
 技术问题
当ITO电极应用在柔性OLED显示面板上时，在柔性OLED显示面板经过多次弯曲后，ITO电极的方块电阻会迅速上升，因此不适于制作柔性OLED，尤其是用于制作具有柔性OLED面板的智能穿戴设备，ITO电极更加无法适应智能穿戴设备穿戴于人体不同部位时的不同弯曲形状，并且，随着ITO的原材料资源越来越紧缺，导致成本越来越高，还有着其自身不耐酸、易脆等缺点；因此，急需一种能实现自支撑且柔性的OLED显示面板。
 技术解决方案
本申请实施例提供一种柔性OLED显示面板、制作方法及智能穿戴设备，以解决现有ITO电极材料短缺、制作工艺复杂、不适用于柔性OLED显示面板柔性弯曲的问题。
为解决上述问题，本申请提供的技术方案如下：
本申请实施例一方面提供了一种柔性OLED显示面板，包括导电层和设置于所述导电层一侧的金属阳极层，所述导电层的材料为银纳米线与PMMA的混合物。
在本申请实施例所提供的柔性OLED显示面板中，还包括柔性支撑层，所述柔性支撑层设置于所述导电层远离所述金属阳极层的一侧，所述柔性支撑层的材料为PMMA。
在本申请实施例所提供的柔性OLED显示面板中，所述柔性支撑层的厚度为1um～10um。
在本申请实施例所提供的柔性OLED显示面板中，所述导电层的厚度为50 nm～150nm。
在本申请实施例所提供的柔性OLED显示面板中，所述导电层在金属阳极层上的正投影与所述金属阳极层重合。
在本申请实施例所提供的柔性OLED显示面板中，所述金属阳极层上设有柔性OLED模组。
根据本发明的上述目的，还提供一种柔性OLED显示面板的制作方法，包括：
形成导电层，所述导电层的材料为银纳米线与PMMA的混合物；及
在所述导电层上形成金属阳极层。
在本申请实施例所提供的柔性OLED显示面板的制作方法中，在所述形成导电层之前，还包括：
形成柔性支撑层，所述导电层形成于所述柔性支撑层上，所述柔性支撑层的材料为PMMA。
在本申请实施例所提供的柔性OLED显示面板的制作方法中，所述形成柔性支撑层包括：
提供一衬底；
在所述衬底表面形成一层疏水层；
在所述疏水层上形成一柔性支撑层；及
所述在所述导电层上形成金属阳极层之后，还包括：
将所述疏水层从所述柔性支撑层上剥离。
在本申请实施例所提供的柔性OLED显示面板的制作方法中，所述形成导电层，所述导电层的材料为银纳米线与PMMA的混合物，包括：
采用第一旋涂制程在所述柔性支撑层上旋涂银纳米线与PMMA的混合分散溶液，然后对旋涂的银纳米线与PMMA的混合分散溶液进行第一烘烤制程使其固化形成材料为银纳米线与PMMA的混合物的导电层。
在本申请实施例所提供的柔性OLED显示面板的制作方法中，所述第一旋涂制程中，旋涂银纳米线与PMMA的混合分散溶液的转速为1000～3000转/分，旋涂银纳米线与PMMA的混合分散溶液的时间为10 s～60s。
在本申请实施例所提供的柔性OLED显示面板的制作方法中，所述第一烘烤制程中烘烤的温度为100℃，烘烤的时间为3min。
在本申请实施例所提供的柔性OLED显示面板的制作方法中，所述导电层的厚度为50 nm～150nm。
在本申请实施例所提供的柔性OLED显示面板的制作方法中，所述形成柔性支撑层，所述柔性支撑层的材料为PMMA，包括：
采用第二旋涂制程在所述疏水层上旋涂PMMA溶液，然后对旋涂的PMMA溶液进行第二烘烤制程使其固化形成材料为PMMA的柔性支撑层。
在本申请实施例所提供的柔性OLED显示面板的制作方法中，所述第二旋涂制程中，旋涂PMMA溶液的转速为600～3000转/分，旋涂PMMA溶液的时间为10 s～120s。
在本申请实施例所提供的柔性OLED显示面板的制作方法中，所述第二烘烤制程中烘烤的温度为100℃，烘烤的时间为3min。
在本申请实施例所提供的柔性OLED显示面板的制作方法中，所述PMMA溶液的浓度为1mg/ml～10mg/ml。
在本申请实施例所提供的柔性OLED显示面板的制作方法中，所述衬底为硅片刚性衬底或玻璃刚性衬底。
在本申请实施例所提供的柔性OLED显示面板的制作方法中，所述在所述衬底表面形成一层疏水层，包括：
对所述衬底清洁处理；及
将清洁处理后的所述衬底在95℃的正十八烷基三氯硅烷蒸汽中静置4小时，使所述衬底表面形成所述疏水层。
根据本申请的上述目的，还提供一种智能穿戴设备，所述智能穿戴设备包括如前述中任意一项所述的柔性OLED显示面板。
 有益效果
本申请的有益效果为：通过将银纳米线与PMMA的混合物作为导电层的材料，降低了导电层表面的粗糙度，使得导电层具有很好的连续性，从而提高了导电层上金属阳极层的导电性，同时，采用PMMA作为柔性支撑层的材料，很好的实现了柔性支撑层对柔性OLED显示面板中其它部分的柔性支撑，此外，在制备过程中，通过在衬底表面形成一层疏水层，实现在柔性OLED显示面板制作完成后通过疏水层与衬底很好的分离，整体上，通过柔性支撑层实现柔性OLED显示面板很好的整体柔性支撑，导电层也具备很好的柔性弯曲能力，使得柔性OLED显示面板能很好的适用于智能设穿戴设备。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本申请实施例提供的一种柔性OLED显示面板的结构示意图；
图2为本申请实施例提供的一种柔性OLED显示面板的制作方法的流程示意框图；
图3为本申请实施例提供的另一种柔性OLED显示面板的制作方法的流程示意框图。
 本发明的实施方式
这里所公开的具体结构和功能细节仅仅是代表性的，并且是用来描述本申请的示例性实施例的目的。但是本申请可以通过许多替换形式来具体实现，并且不应当被解释成仅仅受限于这里所阐述的实施例。
在本申请的描述中，需要理解的是，术语“中心”、“横向”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，术语“第一”、“第二”仅用来描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本申请的描述中，除非另有说明，“多个”的含义是两个或两个以上。另外，术语“包括”及其任何变形，意图在于覆盖不排他的包含。
在本申请的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本申请中的具体含义。
这里所使用的术语仅仅是为了描述具体实施例而不意图限制示例性实施例。除非上下文明确地另有所指，否则这里所使用的单数形式“一个”、“一项”还意图包括复数。还应当理解的是，这里所使用的术语“包括”和/或“包含”规定所陈述的特征、整数、步骤、操作、单元和/或组件的存在，而不排除存在或添加一个或更多其他特征、整数、步骤、操作、单元、组件和/或其组合。
下面结合附图和实施例对本申请作进一步说明。
如图1所示，本申请实施例提供了一种柔性OLED显示面板，包括导电层1和设置于所述导电层1一侧的金属阳极层2，所述导电层的材料为银纳米线与PMMA（Polymethyl methacrylate)的混合物。具体的，所述金属阳极层2采用银金属材料，所述银纳米线与PMMA的混合物中，PMMA（Polymethyl methacrylate)即聚甲基丙烯酸甲酯，银纳米线的直径为10um～200um，所述导电层1的厚度为50nm～150nm。
在一实施例中，所述导电层1在金属阳极层2上的正投影与所述金属阳极层重合，可以理解的是，所述导电层1在金属阳极层2上的正投影的图案与金属阳极层2所具有的阳极图案相同，并且，所述导电层1的材料为银纳米线与PMMA的混合物，相比于原有的ITO电极，该银纳米线与PMMA的混合物所形成的导电层1表面粗糙度较低，更加平滑均匀，提高了所述金属阳极层2（尤其是银金属阳极层）的连续性，使得金属阳极层2具备更好的导电性。
在一实施例中，所述柔性OLED显示面板还包括柔性支撑层3，所述柔性支撑层3设置于所述导电层1远离所述金属阳极层2的一侧，所述柔性支撑层3的材料为PMMA（Polymethyl methacrylate)；在一实施例中，具体的，所述柔性支撑层3的厚度为1um～10um。
可以理解的是，在本申请的柔性OLED显示面板中，所述柔性支撑层3和所述金属阳极层2分别位于所述导电层1的两侧，其中，所述PMMA材料无色透明，透光率达90%～92%，具有很好的韧性，采用PMMA作为柔性支撑层的材料，很好的实现了柔性支撑层对柔性OLED显示面板中其它部分的柔性支撑。
承上，在本申请的柔性OLED显示面板中，所述金属阳极层2上设有柔性OLED模组4；可以理解的是，所述柔性OLED模组4的结构为本领域技术人员所熟知的常用结构形式，在一实施例中以如下结构为例，但并不以此为限，设置于所述金属阳极层2上的柔性OLED模组4依次包括：空穴注入层、空穴传输层、有机发光层、电子传输层、电子注入层、金属阴极层和封装层等。
综上，本申请通过将银纳米线与PMMA的混合物作为导电层的材料，降低了导电层表面的粗糙度，使得导电层具有很好的连续性，从而提高了导电层上金属阳极层的导电性，同时，采用PMMA作为柔性支撑层的材料，很好的实现了柔性支撑层对柔性OLED显示面板中其它部分的柔性支撑；示意的，如图1所示，本申请的柔性OLED显示面板在折弯状态下，无需刚性背板的支撑，通过柔性支撑层可以很好的在折弯状态下实现柔性自支撑，并且，相比于现有的ITO电极，本申请中的导电层在柔性支撑层不同折弯状态下，能很好的贴合于柔性支撑层，具有很好的折弯性能。
本申请还提供一种柔性OLED显示面板的制作方法，如图2所示，包括：
S20：形成导电层，所述导电层的材料为银纳米线与PMMA的混合物；
S30：在所述导电层上形成金属阳极层。
在一实施例中，步骤S20，形成导电层，可以是通过在一基础层上旋涂(spin-coating)银纳米线与PMMA的混合分散溶液，然后通过烘烤固化的方式，形成材料为银纳米线与PMMA的混合物的导电层；具体的，旋涂银纳米线与PMMA的混合分散溶液的转速为1000～3000转/分，旋涂的时间为10 s～60s；然后在温度为100℃的条件下烘烤3min使其固化；具体所形成导电层的厚度可通过调整实际工艺制备中的相关参数进行调整，本实施例优选制备其厚度为50nm～150nm；
承上，在一实施例中，采用的所述银纳米线与PMMA的混合分散溶液可以是通过以下方法制备获得：取10mg银纳米线置于10ml的PMMA溶液中经过超声波磁力搅拌以得到银纳米线与PMMA的混合分散溶液；其中，所述PMMA溶液浓度具体为1mg/ml～10mg/ml；所采用的银纳米线材料可以是通过制备或其它商业方式获取，并且其制备方法是本领域技术人员所熟知的常规技术，在此不再赘述。
值得注意的是，步骤S20中，形成导电层之后，还包括，将所述导电层图案化，具体的，可以是通过物理切割或者氧离子刻蚀(O2 plasma ion etching)的方式将所述导电层图案化，以使所述导电层形成一定的阳极图案；
在一实施例中，步骤S30中，在所述导电层上形成金属阳极层，具体的，可以是通过真空蒸镀的方式在导电层上形成具有与导电层相同阳极图案的金属阳极层；显然，对于本领域技术人员而言，现有的柔性OLED显示面板中阳极层都是通过图案化形成所需的阳极图案，是常规的功能结构，在此不再赘述。
在一实施例中，如图3所示，在所述形成导电层之前，还包括：
S10：形成柔性支撑层，所述导电层形成于所述柔性支撑层上，所述柔性支撑层的材料为PMMA。
显然，在一实施例中，前述步骤S20中的基础层可以是所述柔性支撑层；通过在柔性支撑层上旋涂(spin-coating)银纳米线与PMMA的混合分散溶液，然后通过烘烤固化的方式，形成材料为银纳米线与PMMA的混合物的导电层。
具体的，步骤S10中，所述形成柔性支撑层包括：
S11：提供一衬底；
S12：在所述衬底表面形成一层疏水层；
S13：在所述疏水层上形成一柔性支撑层；
在一实施例中，步骤S11中，提供的所述衬底可以是硅片或玻璃等刚性衬底。
在一实施例中，步骤S12，在所述衬底表面形成一层疏水层，具体可以是将所述衬底在95℃的正十八烷基三氯硅烷蒸汽中静置4小时，使所述衬底表面形成所述疏水层；
其中，步骤S12，在所述衬底表面形成一层疏水层之前，还包括一对所述衬底清洁处理步骤，具体的，可以是将所述衬底依次经过异丙醇(IPA)、去离子水(deionized water)、无水乙醇(ethyl alcohol absolute)分别超声清洗20分钟，然后用氮气吹干，随后经过180℃的惰性气氛烘干1h，以得到清洁的衬底。
在一实施例中，步骤S13：在所述疏水层上形成一柔性支撑层，可以是在所述疏水层上旋涂PMMA溶液，并烘烤使其固化，形成材料为PMMA的柔性支撑层；具体的，在旋涂PMMA溶液的转速为600～3000转/分的条件下，将浓度为1mg/ml～10mg/ml 的PMMA溶液在所述疏水层上旋涂10 s～120s；然后在温度为100℃的条件下烘烤3min使其固化，具体所形成柔性支撑层的厚度可通过调整实际工艺制备中的相关参数进行调整，本实施例优选制备柔性支撑层厚度为1um～10um。
所述在所述导电层上形成金属阳极层之后，还包括：
S40：将所述疏水层从所述柔性支撑层上剥离；
可以理解的，在制作柔性OLED显示面板过程中，可以在所述金属阳极层上形成柔性OLED模组，在一实施例中，如前所述，以柔性OLED模组依次包括：空穴注入层、空穴传输层、有机发光层、电子传输层、电子注入层、金属阴极层和封装层等功能层为例，各功能层都可以通过真空蒸镀的方式形成，具体步骤就不再此赘述。
在一实施例中，步骤S40，将所述疏水层从所述柔性支撑层上剥离；具体的，可以是在所述金属阳极层上形成柔性OLED模组之后，将所述疏水层从所述柔性支撑层上剥离，以获得所述柔性OLED显示面板；值得注意的是，也可以是在所述金属阳极层上形成柔性OLED模组之前，将所述疏水层从所述柔性支撑层上剥离，以获得柔性支撑层、导电层和金属阳极层所形成的结构，然后对该结构进行后续利用。
综上，本申请柔性OLED显示面板的制作方法，在制做过程中，通过在衬底表面形成一层疏水层，实现柔性支撑层通过疏水层与衬底很好的分离；并且，通过旋涂配合烘干的方式制作柔性支撑层和导电层，可以通过调整所旋涂的溶液浓度和旋涂时间等参数，很好的控制柔性支撑层和导电层制作的厚度。
本申请还提供一种智能穿戴设备，所述智能穿戴设备包括如前述中任意一项所述的柔性OLED显示面板；该智能穿戴设备对人体各穿戴部位具有很好的适应性，尤其是其中的柔性OLED显示面板可以根据各穿戴部位，很好的弯曲贴合于所穿戴部位表面，并且也具备一定的自支撑能力，例如，穿戴在手腕上，该智能穿戴设备上的柔性OLED显示面板可以绕手腕进行曲面显示等。
综上，本申请通过将银纳米线与PMMA的混合物作为导电层的材料，降低了导电层表面的粗糙度，使得导电层具有很好的连续性，从而提高了导电层上金属阳极层的导电性，同时，采用PMMA作为柔性支撑层的材料，很好的实现了柔性支撑层对柔性OLED显示面板中其它部分的柔性支撑，此外，在制备过程中，通过在衬底表面形成一层疏水层，实现在柔性OLED显示面板制作完成后通过疏水层与衬底很好的分离，整体上，通过柔性支撑层实现柔性OLED显示面板很好的整体柔性支撑，导电层也具备很好的柔性弯曲能力，使得柔性OLED显示面板能很好的适用于智能设穿戴设备。
综上所述，虽然本申请已以优选实施例揭露如上，但上述优选实施例并非用以限制本申请，本领域的普通技术人员，在不脱离本申请的精神和范围内，均可作各种更动与润饰，因此本申请的保护范围以权利要求界定的范围为准。

Claims (20)

  1. 一种柔性OLED显示面板，包括导电层和设置于所述导电层一侧的金属阳极层，所述导电层的材料为银纳米线与PMMA的混合物。
  2. 根据权利要求1所述的一种柔性OLED显示面板，还包括柔性支撑层，所述柔性支撑层设置于所述导电层远离所述金属阳极层的一侧，所述柔性支撑层的材料为PMMA。
  3. 根据权利要求2所述的柔性OLED显示面板，其中，所述柔性支撑层的厚度为1um～10um。
  4. 根据权利要求1所述的柔性OLED显示面板，其中，所述导电层的厚度为50 nm～150nm。
  5. 根据权利要求1所述的柔性OLED显示面板，其中，所述导电层在金属阳极层上的正投影与所述金属阳极层重合。
  6. 根据权利要求1所述的柔性OLED显示面板，其中，所述金属阳极层上设有柔性OLED模组。
  7. 一种柔性OLED显示面板的制作方法，包括：
    形成导电层，所述导电层的材料为银纳米线与PMMA的混合物；及
    在所述导电层上形成金属阳极层。
  8. 根据权利要求7所述的柔性OLED显示面板的制作方法，其中，在所述形成导电层之前，还包括：
    形成柔性支撑层，所述导电层形成于所述柔性支撑层上，所述柔性支撑层的材料为PMMA。
  9. 根据权利要求8所述的柔性OLED显示面板的制作方法，其中，所述形成柔性支撑层包括：
    提供一衬底；
    在所述衬底表面形成一层疏水层；
    在所述疏水层上形成一柔性支撑层；及
    所述在所述导电层上形成金属阳极层之后，还包括：
    将所述疏水层从所述柔性支撑层上剥离。
  10. 根据权利要求8所述的柔性OLED显示面板的制作方法，其中，所述形成导电层，所述导电层的材料为银纳米线与PMMA的混合物，包括：
    采用第一旋涂制程在所述柔性支撑层上旋涂银纳米线与PMMA的混合分散溶液，然后对旋涂的银纳米线与PMMA的混合分散溶液进行第一烘烤制程使其固化形成材料为银纳米线与PMMA的混合物的导电层。
  11. 根据权利要求10所述的柔性OLED显示面板的制作方法，其中，所述第一旋涂制程中，旋涂银纳米线与PMMA的混合分散溶液的转速为1000～3000转/分，旋涂银纳米线与PMMA的混合分散溶液的时间为10 s～60s。
  12. 根据权利要求10所述的柔性OLED显示面板的制作方法，其中，所述第一烘烤制程中烘烤的温度为100℃，烘烤的时间为3min。
  13. 根据权利要求10所述的柔性OLED显示面板的制作方法，其中，所述导电层的厚度为50 nm～150nm。
  14. 根据权利要求9所述的柔性OLED显示面板的制作方法，其中，所述形成柔性支撑层，所述柔性支撑层的材料为PMMA，包括：
    采用第二旋涂制程在所述疏水层上旋涂PMMA溶液，然后对旋涂的PMMA溶液进行第二烘烤制程使其固化形成材料为PMMA的柔性支撑层。
  15. 根据权利要求14所述的柔性OLED显示面板的制作方法，其中，所述第二旋涂制程中，旋涂PMMA溶液的转速为600～3000转/分，旋涂PMMA溶液的时间为10 s～120s。
  16. 根据权利要求14所述的柔性OLED显示面板的制作方法，其中，所述第二烘烤制程中烘烤的温度为100℃，烘烤的时间为3min。
  17. 根据权利要求14所述的柔性OLED显示面板的制作方法，其中，所述PMMA溶液的浓度为1mg/ml～10mg/ml。
  18. 根据权利要求9所述的柔性OLED显示面板的制作方法，其中，所述衬底为硅片刚性衬底或玻璃刚性衬底。
  19. 根据权利要求9所述的柔性OLED显示面板的制作方法，其中，所述在所述衬底表面形成一层疏水层，包括：
    对所述衬底清洁处理；及
    将清洁处理后的所述衬底在95℃的正十八烷基三氯硅烷蒸汽中静置4小时，使所述衬底表面形成所述疏水层。
  20. 一种智能穿戴设备，所述智能穿戴设备包括如权利要求2所述的柔性OLED显示面板。
PCT/CN2019/110391 2019-07-18 2019-10-10 柔性oled显示面板、制作方法及智能穿戴设备 WO2021007962A1 (zh)

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