WO2020211518A1 - 显示背板及其制作方法、显示装置 - Google Patents

显示背板及其制作方法、显示装置 Download PDF

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Publication number
WO2020211518A1
WO2020211518A1 PCT/CN2020/075713 CN2020075713W WO2020211518A1 WO 2020211518 A1 WO2020211518 A1 WO 2020211518A1 CN 2020075713 W CN2020075713 W CN 2020075713W WO 2020211518 A1 WO2020211518 A1 WO 2020211518A1
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WIPO (PCT)
Prior art keywords
sublayer
substrate
display area
layer
transparent display
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PCT/CN2020/075713
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English (en)
French (fr)
Inventor
陈鹏
孙阔
庞暄
赵艳艳
白珊珊
盖人荣
Original Assignee
京东方科技集团股份有限公司
成都京东方光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 成都京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US16/960,883 priority Critical patent/US11723234B2/en
Publication of WO2020211518A1 publication Critical patent/WO2020211518A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/82—Cathodes
    • H10K50/822—Cathodes characterised by their shape
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/82—Cathodes
    • H10K50/828—Transparent cathodes, e.g. comprising thin metal layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/805—Electrodes
    • H10K59/8052—Cathodes
    • H10K59/80523—Multilayers, e.g. opaque multilayers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/351—Thickness
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/805—Electrodes
    • H10K59/8051—Anodes
    • H10K59/80515—Anodes characterised by their shape

Definitions

  • This application relates to the field of display technology manufacturing. Specifically, this application relates to a display backplane, a manufacturing method thereof, and a display device.
  • transparent display has attracted people's attention as a new technology application that has emerged in recent years, and this technology has expanded the scene and scope of display applications.
  • the transparent display screen has a certain degree of penetrability in a certain area, so that the viewer can clearly see the background behind the display screen.
  • transparent display screens are suitable for a variety of applications such as building windows, car windows and shop windows.
  • transparent display functions they also have the potential for future development as information displays, so they have attracted market attention.
  • Partial transparent display refers to the division of the display into a normal display area and a transparent display area.
  • components such as a camera can also be set in the transparent display area, thereby greatly increasing the screen-to-body ratio and realizing a full screen.
  • the inventor of the present application found that the bottleneck of the partial transparent display of organic light-emitting diodes (OLEDs) at this stage is the low transmittance of the cathode formed by vapor deposition on the entire surface, which will affect the transparent display effect.
  • the thickness of commonly used cathode materials must be thinner than 20nm in order to have good light penetration characteristics.
  • the cathode layer is very thin, there will be technical problems such as disconnection or easy oxidation of the metal. These defects will further form defects and lead to charge injection.
  • the process loss increases, and at the same time, the thinner the thickness of the metal cathode layer, the higher the square resistance, which causes the technical problem of uneven brightness of the active matrix organic light emitting diode (AMOLED) display.
  • AMOLED active matrix organic light emitting diode
  • the inventors of the present application have discovered through in-depth research that the first and second sublayers can be formed by two evaporations, and the second sublayer in the transparent display area is patterned. In this way, it is not only guaranteed The transparent display effect of the transparent display area, and the cathode transmittance at the openings of the normal display area and the transparent display area are the same, thereby ensuring the optical uniformity of the partially transparent display screen, thereby solving the color shift problem of the display device.
  • an objective of the present application is to provide a display backplane for achieving partial transparent display with better transparent display effect and better optical uniformity.
  • this application proposes a display backplane.
  • the display backplane includes: a substrate on which a transparent display area and a normal display area are defined; a first insulating layer, the first insulating layer is provided on one side of the substrate, And has a plurality of openings; a light-emitting layer, the light-emitting layer is provided in the opening; a first electrode, the first electrode is provided on the side of the light-emitting layer away from the substrate, and includes a stacked first Sublayer and second sublayer, wherein the orthographic projection of the light-emitting layer on the substrate is within the orthographic projection of the second sublayer on the substrate, and, in the transparent display area, The second sublayer is patterned.
  • the display backplane of the embodiment of the present application can be divided into two layers to form the first sublayer and the second sublayer to form the first electrode in the OLED structure, and the second sublayer in the transparent display area
  • the sublayer is patterned, so that the transparent display effect of the transparent display area can be guaranteed, and the transmittance of the first electrode at the opening of the normal display area and the transparent display area is the same, thereby ensuring the optical uniformity of the partially transparent display , And then solve the color cast problem of the display device.
  • the display backplane according to the foregoing embodiment of the present application may also have the following additional technical features:
  • the first sublayer in the transparent display area and the normal display area, has a whole layer structure; in the normal display area, the second sublayer has a whole layer structure .
  • the first sublayer is located between the second sublayer and the light-emitting layer.
  • the thickness of the first sublayer is smaller than the thickness of the second sublayer.
  • the first sublayer is in direct contact with the second sublayer.
  • the orthographic projection of the second electrode on the substrate is within the orthographic projection of the second sublayer on the substrate.
  • the transparent display area is arranged on one side of the normal display area.
  • the transparent display area is arranged between two normal display areas.
  • this application proposes a method for manufacturing a display backplane.
  • the method includes forming a first insulating layer and a light emitting layer on one side of a substrate, and the substrate is divided into a transparent display area and a normal display area, and the first insulating layer has A plurality of openings, the orthographic projection of the opening on the substrate is within the orthographic projection of the light-emitting layer on the substrate; on the side of the light-emitting layer and the first insulating layer away from the substrate Forming a first sub-layer of the first electrode; forming a second sub-layer of the first electrode on the surface of the first sub-layer away from the substrate, and protecting the second sub-layer in the transparent display area
  • the patterning process is performed, and the orthographic projection of the light-emitting layer on the substrate is within the orthographic projection of the second sublayer on the substrate.
  • the manufacturing method according to the foregoing embodiment of the present application may also have the following additional technical features:
  • the method further includes: forming a second electrode on one side of the substrate, the second electrode being formed between the substrate and the first insulating layer, and being in contact with each other in the opening The light-emitting layer contacts.
  • the first mask used for vapor deposition to form the first sublayer has a first opening portion, and the shape of the first opening portion corresponds to the shape of the first sublayer.
  • the second mask used for vapor deposition to form the second sublayer defines a second opening portion and a fine metal mask portion, and the opening shape of the second opening portion is the same as the normal shape.
  • the shape of the second sublayer in the display area corresponds to the shape of the hollow pattern of the fine metal mask portion corresponds to the shape of the second sublayer in the transparent display area.
  • this application proposes a display device.
  • the display device includes the above-mentioned display backplane.
  • the inventor found through research that the display device of the embodiment of the present application has better transparent display effect and better optical uniformity of the display backplane, so that the partial transparent display effect of the display device is better and the optical uniformity is better. In turn, the market competitiveness of the display device is higher.
  • the features and advantages described above for the display backplane are still applicable to the display device, and will not be repeated here.
  • FIG. 1 is a schematic cross-sectional structure diagram of a normal display area and a transparent display area of a display backplane according to an embodiment of the present application;
  • FIG. 2 is a schematic diagram of the distribution of three normal display areas and transparent display areas according to an embodiment of the present application
  • FIG. 3 is a schematic cross-sectional structure diagram of a normal display area and a transparent display area of a display backplane according to another embodiment of the present application;
  • FIG. 4 is a flowchart of a method for manufacturing a display backplane according to an embodiment of the present application
  • FIG. 5 is a schematic diagram of a first mask plate and a second mask plate corresponding to the partitions of the display backplane according to an embodiment of the present application;
  • FIG. 6 is a schematic diagram of a first mask plate and a second mask plate corresponding to the partitions of the display backplane according to another embodiment of the present application;
  • FIG. 7 is a schematic diagram of a first mask plate and a second mask plate corresponding to the partitions of the display backplane according to another embodiment of the present application;
  • FIG. 8 is a schematic diagram of the hollow pattern distribution of the fine metal mask portion of the second mask plate according to an embodiment of the present application.
  • FIG. 9 is a schematic diagram of the hollow pattern distribution of the fine metal mask portion of the second mask plate according to another embodiment of the present application.
  • this application proposes a display backplane.
  • the display backplane includes a substrate 100, a first insulating layer 400, a light-emitting layer 500, and a first electrode; wherein, referring to FIG. 2, a transparent display area B and a normal display are defined on the substrate 100 Area A; the first insulating layer 400 covers the substrate 100, and the first insulating layer 400 has a plurality of openings 401, the orthographic projection of the openings 401 on the substrate 100 is within the orthographic projection of the second electrode 300 on the substrate 100; 500 is arranged in the opening 401 and is in contact with the second electrode 300; and the first electrode is arranged on the side of the light-emitting layer 500 away from the substrate 100, and the first electrode includes a first sublayer 610 and a second sublayer 620 which are stacked, Wherein, in the transparent display area B, the second sub-layer 620 is patterned, and the orthographic projection of the light-emitting layer 500 on the substrate 100 is within the orthographic projection
  • patterning in this article specifically refers to a non-integral layer structure, that is, a structure in which the entire layer of material is first formed during the manufacturing process and then a specific shape is carved out.
  • the second sub-layer 620 in the transparent display area B may include a plurality of sub-patterns spaced apart from each other, and each sub-pattern corresponds to a sub-pixel.
  • the display backplane may further include a second electrode 300, wherein, referring to FIG. 3, the second electrode 300 is disposed between the second insulating layer 200 and the substrate 100, and the second The electrode 300 is in contact with the light emitting layer 500 in the opening 401, so that an OLED structure with a more complete structure and function can be obtained.
  • the second electrode 300 may be an opaque anode
  • the first electrode 400 may be a light-transmitting cathode, so that the display backplane can have a top-emitting display mode.
  • FIG. 3 there is a bank 402 between the openings 401 of the first insulating layer 400; in the transparent display area B, the projection of the bank 402 on the substrate and the second sublayer 620
  • the overlap of the orthographic projection parts on the substrate 100 can further ensure that the transmittances at the openings of the normal display area and the transparent display area are more consistent, thereby further ensuring the optical uniformity of the partially transparent display screen, thereby fully solving the problem of the display device. Color cast problem.
  • the first sublayer 610 may cover the light-emitting layer 500 and the first insulating layer 400
  • the second sublayer 620 may cover the surface of the first sublayer 610 away from the substrate 100.
  • the second sublayer Both the 620 and the entire first sublayer 610 can be flatter.
  • the positions of the first sublayer 610 and the second sublayer 620 can be interchanged, that is, the second sublayer 620 can cover the light emitting layer 500 and the first insulating layer 400, and the first sublayer 610 It can cover the surface of the second sub-layer 620 away from the substrate 100. In this way, the optical uniformity of the partially transparent display screen can also be achieved, thereby solving the color shift problem of the display device.
  • the second sub-layer 620 is patterned only in the transparent display area B, that is, the second sub-layer 620 is an entire layer structure in the normal display area A, and the first A sub-layer 610 has an entire layer structure in both the transparent display area B and the normal display area A.
  • the first electrode composed of the first sub-layer 610 and the second sub-layer 620 only two sub-layers need to be deposited, and then the second sub-layer 620 of the transparent display area B is patterned. achieve.
  • the thickness of the first sub-layer 610 may be less than 10 nm, and the thickness of the second sub-layer 620 may be greater than 10 nm. In this way, the thinner whole-layer first sub-layer 610 has good light penetration.
  • the transparent characteristics can make the transparent display area B outside the opening area have a better transparent display effect, and in the transparent display area B, the first electrode composed of the first sublayer 610 and the patterned second sublayer 620 It can also make the thickness of the first electrode in the area of the light-emitting layer 500 in the transparent display area B the same as the thickness of the first electrode in the normal display area A, thereby ensuring the optical uniformity of the entire partially transparent display screen, thereby solving the color shift problem.
  • the total thickness of the first electrode composed of the first sub-layer 610 and the second sub-layer 620 may be 12-15 nm.
  • the total thickness of the entire layer of the first electrode is uniformly integrated with the existing design. Similar, but the transparent display area B can have a better transparent display effect, and the optical uniformity of the entire partially transparent display screen is better.
  • the first sub-layer 610 can directly contact the second sub-layer 620, that is, the first sub-layer 610 and the second sub-layer 620 are designed with parallel resistors on the circuit.
  • the first electrode composed of a sub-layer and a second sub-layer in parallel can significantly reduce the square resistance of the first electrode, thereby further reducing the risk of disconnection and solving the problem of uneven brightness.
  • the orthographic projection of the first sub-layer 610 on the substrate 100 is within the orthographic projection of the second sub-layer 620 on the substrate 100, and thus, as a part of the cathode
  • the second sub-layer 620 can completely cover the second electrode as the anode, so that the bottom emission of the OLED structure is better.
  • the specific distribution mode of the normal display area A and the transparent display area B on the substrate 100 is not particularly limited, and those skilled in the art can design accordingly according to the specific type of the display backplane.
  • the transparent display area B may be arranged on one side of the normal display area A, for example, the transparent display area B in Fig.
  • the transparent display area B can also be arranged between two normal display areas A. In this way, the design requirements for intermediate transparency of billboards and windows can be met.
  • the display backplane may further include a thin film transistor (TFT) disposed between the substrate 100 and the second insulating layer 200, and the thin film transistor includes a stacked active Layer 710, gate insulating layer 720, gate electrode 730, interlayer insulating layer 740, source electrode 751 and drain electrode 752, wherein the source electrode 751 and drain electrode 752 pass through the gate insulating layer 720 and the first interlayer insulating layer 740
  • the via 760 is electrically connected to the active layer 710
  • the second electrode 300 is electrically connected to the drain 752 through the second via 201 penetrating the second insulating layer 200. In this way, OLED devices with more complete functions and structures can be obtained.
  • the material for forming the first electrode includes at least one of aluminum (Al), silver (Ag), magnesium-silver alloy (Mg-Ag), and calcium (Ca).
  • Al aluminum
  • Ag silver
  • Mg-Ag magnesium-silver alloy
  • Ca calcium
  • the thickness of the metal material is less than 10 nanometers, which can have better light penetration characteristics.
  • the specific material for forming the light-emitting layer 500 is not particularly limited, and light-emitting materials commonly used in the art can be used, and those skilled in the art can select accordingly according to the specific requirements of the partial transparent display effect.
  • the material for forming the second electrode 300 is not particularly limited, and any light-transmitting anode material commonly used in the art can be used. Those skilled in the art can choose according to the specific material of the light-emitting layer 500.
  • the formation of each insulating layer is not particularly limited, as long as the insulating light-transmitting material is However, those skilled in the art can make a corresponding selection according to the requirements of the actual insulation effect.
  • the present application proposes a display backplane, which can be divided into two layers to form a first sub-layer and a second sub-layer to form the first electrode in the OLED structure, and, The second sub-layer in the transparent display area is patterned.
  • the transparent display effect of the transparent display area can be ensured, and the transmittance of the first electrode at the openings of the normal display area and the transparent display area is the same, so as to ensure local
  • the optical uniformity of the transparent display screen solves the color shift problem of the display device.
  • this application proposes a method for manufacturing a display backplane.
  • the manufacturing method includes:
  • S100 forming a first insulating layer and a light emitting layer on one side of the substrate.
  • a first insulating layer and a light emitting layer are formed on one side of the substrate, and the substrate is divided into a transparent display area and a normal display area, and the first insulating layer has a plurality of openings, and the orthographic projection of the openings on the substrate Within the orthographic projection of the light-emitting layer on the substrate.
  • a whole second insulating layer can be deposited on one side of the substrate first, and then a patterned second electrode can be formed by vapor deposition on the surface of the second insulating layer away from the substrate, and then continue on the second electrode and the second insulating layer.
  • a whole first insulating layer is deposited on the surface away from the substrate, and an opening is etched in the area of the second electrode, and then a light-emitting layer is formed in the opening, and the light-emitting layer contacts the second electrode in the opening.
  • the light emitting layer and the first insulating layer formed in step S100 are continued on the side away from the substrate to form the first sublayer of the first electrode, and the first sublayer has a whole surface structure.
  • the thickness of the first sub-layer formed by vapor deposition may be less than 10 nm. In this way, the thinner entire-layer first sub-layer may have good light penetration characteristics.
  • the first mask C used for vapor deposition to form the first sublayer has a first opening portion c1, and the shape of the first opening portion c1 is similar to that of the first sublayer.
  • the shape corresponds to that, by using the above-mentioned first mask C, a thinner first sub-layer can be formed directly by evaporation.
  • the second sublayer of the first electrode is formed on the surface of the first sublayer away from the substrate, and the second sublayer in the transparent display area is patterned.
  • the orthographic projection of the light-emitting layer on the substrate is on the The second sublayer is within the orthographic projection on the substrate.
  • the thickness of the second sub-layer formed may be greater than 10 nm. In this way, the thickness of the first electrode composed of the first sub-layer and the second sub-layer in the open area of the transparent display area is different from the normal thickness.
  • the thickness of the display area is consistent, so as to ensure the optical uniformity of the entire partially transparent display screen, thereby solving the problem of color shift.
  • the second mask plate D used for vapor deposition to form the second sublayer defines a second opening portion d1 and a fine metal mask portion d2, and the second opening portion
  • the opening shape of d1 corresponds to the shape of the second sub-layer in the normal display area
  • the hollow pattern of the fine metal mask portion d2 corresponds to the shape of the second sub-layer in the transparent display area.
  • the hollow pattern e in the fine metal mask portion d2 of the second mask D can be arranged in an array of pixel units, for example, each pixel unit includes The red sub-pixel (R), the green sub-pixel (G) and the blue sub-pixel (B), in this way, the pixel unit area is within the hollow pattern e, so that a second sub-layer can be formed that simultaneously covers a single sub-pixel of RGB.
  • the hollow pattern in the fine metal mask portion d2 of the second mask D can also be arranged in an array of sub-pixels, for example, in each pixel unit Including red sub-pixel (R), green sub-pixel (G) and blue sub-pixel (B).
  • each hollow pattern e individually corresponds to different RGB sub-pixels, so that the transparent effect area in the transparent display area is larger. In turn, the partially transparent display effect is further improved.
  • the present application proposes a manufacturing method that can form a first sublayer and a second sublayer with different shapes in two steps to form the first electrode in the OLED structure.
  • a display backplane with better transparent display effect and better optical uniformity in the transparent display area can be manufactured, and the manufacturing method is simple to operate and easy to realize.
  • this application proposes a display device.
  • the display device includes the above-mentioned display backplane.
  • the specific type of the display device is not particularly limited, such as a display screen, a TV, a mobile phone, a tablet computer, or a smart watch, etc., and those skilled in the art can make corresponding actions according to the actual use requirements of the display device. The choice is not repeated here.
  • the display device also includes other necessary components and structures. Taking the OLED display screen as an example, specifically such as a housing, a control circuit board, or a power cord, etc., those skilled in the art can follow The functions of the display device are supplemented accordingly, which will not be repeated here.
  • the present application proposes a display device, the transparent display effect of the display backplane is better, and the optical uniformity is better, so that the partial transparent display effect of the display device is better , The optical uniformity is better, and the market competitiveness of the display device is higher.
  • first and second are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined with “first” and “second” may explicitly or implicitly include at least one of the features. In the description of the present application, "a plurality of” means at least two, such as two, three, etc., unless specifically defined otherwise.

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Abstract

本申请提出了显示背板及其制作方法、显示装置。该显示背板包括：基板，其上限定有透明显示区和正常显示区；第一绝缘层，设置在基板的一侧且具有多个开口；发光层，设置在开口中；第一电极，设置在发光层远离基板的一侧且包括层叠设置的第一亚层和第二亚层，其中，发光层在基板上的正投影在第二亚层在基板上的正投影之内，且在显示区中，亚层是图案化的。

Description

显示背板及其制作方法、显示装置
优先权信息
本申请请求2019年4月15日向中国国家知识产权局提交的、专利申请号为201910298932.1的发明的专利申请的优先权和权益，并且通过参照在先文本的全文并入此处。
技术领域
本申请涉及显示技术制造领域，具体的，本申请涉及显示背板及其制作方法、显示装置。
背景技术
随着显示器技术的发展，透明显示屏(Transparent Display)作为最近几年出现的新技术应用而备受人们关注，该技术扩展了显示应用的场景和范围。透明显示屏，具有一定程度上或一定区域内的穿透性，能够使观看者清楚地看见显示屏后方的背景。
所以，透明显示屏适用于建筑物窗户、汽车车窗与商店橱窗等多种应用，除了透明显示功能以外，还具有未来可能作为信息显示器的发展潜力，因而备受市场关注。而局部透明显示，是指在显示区分为正常显示区和透明显示区，然而在透明显示区还可设置摄像头等元件，从而极大地提高屏占比，实现全面屏。
发明内容
本申请是基于发明人的下列发现而完成的：
本申请的发明人发现，现阶段有机发光二极管(OLED)的局部透明显示的瓶颈在于，整面蒸镀形成的阴极的透过率较低而会影响到的透明显示效果。目前，常用阴极材料的厚度必须薄于20nm才能具有良好的光线穿透特性，但是，当阴极层很薄时会伴有断路或者金属容易氧化的技术问题出现，这些不良会进一步形成缺陷导致电荷注入过程损耗增加，同时，金属阴极层厚度越薄其方阻越高，从而导致有源矩阵有机发光二极(AMOLED)显示屏出现亮度不均匀的技术问题。
本申请的发明人经过深入研究发现，可以通过两次蒸镀分别形成层叠的第一亚层和第二亚层，并且，透明显示区内的第二亚层是图案化的，如此，不仅保证透明显示区的透明显示效果，而且正常显示区和透明显示区的开口处的阴极透过率一致，从而可以保证局部透明显示屏的光学均一性，进而解决显示装置的色偏问题。
有鉴于此，本申请的一个目的在于提出一种透明显示效果更佳、光学均一性更好的用于实现局部透明显示的显示背板。
在本申请的第一方面，本申请提出了一种显示背板。
根据本申请的实施例，所述显示背板包括：基板，所述基板上限定有透明显示区和正常显示区；第一绝缘层，所述第一绝缘层设置在所述基板的一侧，且具有多个开口；发光层，所述发光层设置在所述开口中；第一电极，所述第一电极设置在所述发光层远离所述基板的一侧，且包括层叠设置的第一亚层和第二亚层，其中，所述发光层在所述基板上的正投影在所述第二亚层在所述基板上的正投影之内，并且，在所述透明显示区中，所述第二亚层是图案化的。
发明人经过研究发现，本申请实施例的显示背板，可分两次形成层叠的第一亚层和第二亚层，组成OLED结构中的第一电极，并且，透明显示区内的第二亚层是图案化的，如此，可保证透明显示区的透明显示效果，且正常显示区和透明显示区的开口处的第一电极透过率一致，从而可以保证局部透明显示屏的光学均一性，进而解决显示装置的色偏问题。
另外，根据本申请上述实施例的显示背板，还可以具有如下附加的技术特征：
根据本申请的实施例，在所述第一绝缘层的所述开口之间具有隔堤；在所述透明显示区中，所述隔堤在所述基板上的正投影与所述第二亚层在所述基板上的正投影部分重合。
根据本申请的实施例，在所述透明显示区和所述正常显示区中，所述第一亚层为整层结构；在所述正常显示区中，所述第二亚层为整层结构。
根据本申请的实施例，所述第一亚层位于所述第二亚层和所述发光层之间。
根据本申请的实施例，所述第一亚层的厚度小于所述第二亚层的厚度。
根据本申请的实施例，所述第一亚层与所述第二亚层直接接触。
根据本申请的实施例，在所述透明显示区中，所述第二电极在所述基板上的正投影在所述第二亚层在所述基板上的正投影之内。
根据本申请的实施例，所述透明显示区设置在所述正常显示区的一侧。
根据本申请的实施例，所述透明显示区设置在两个所述正常显示区之间。
在本申请的第二方面，本申请提出了一种制作显示背板的方法。
根据本申请的实施例，所述方法包括：在基板的一侧形成第一绝缘层和发光层，且所述基板上分为透明显示区和正常显示区，并且，所述第一绝缘层具有多个开口，所述开口在所述基板上的正投影在所述发光层在所述基板上的正投影之内；在所述发光层和所述第一绝缘层远离所述基板的一侧形成第一电极的第一亚层；在所述第一亚层远离所述基板的 表面形成所述第一电极的第二亚层，且对所述透明显示区中的所述第二亚层进行图案化处理，所述发光层在所述基板上的正投影在所述第二亚层在所述基板上的正投影之内。
发明人经过研究发现，采用本申请实施例的制作方法，可通过两步分别形成形状不同的第一亚层和第二亚层，组成OLED结构中的第一电极，如此，可制作出透明显示区的透明显示效果更佳、光学均一性更好的显示背板，并且，该制作方法操作简便、容易实现。
另外，根据本申请上述实施例的制作方法，还可以具有如下附加的技术特征：
根据本申请的实施例，所述方法进一步包括：在基板的一侧形成第二电极，所述第二电极形成在所述基板与所述第一绝缘层之间，且在所述开口中与所述发光层接触。
根据本申请的实施例，蒸镀形成所述第一亚层使用的第一掩膜板具有第一开口部分，所述第一开口部分的形状与所述第一亚层的形状对应。
根据本申请的实施例，蒸镀形成所述第二亚层使用的第二掩膜板限定有第二开口部分和精细金属掩膜部分，且所述第二开口部分的开口形状与所述正常显示区中的所述第二亚层的形状对应，所述精细金属掩膜部分的镂空图案与所述透明显示区的所述第二亚层的形状对应。
在本申请的第三方面，本申请提出了一种显示装置。
根据本申请的实施例，所述显示装置包括上述的显示背板。
发明人经过研究发现，本申请实施例的显示装置，其显示背板的透明显示效果更好、光学均一性更好，从而使该显示装置的局部透明显示效果更佳、光学均一性更好，进而使该显示装置的市场竞争力更高。本领域技术人员能够理解的是，前面针对显示背板所描述的特征和优点，仍适用于该显示装置，在此不再赘述。
附图说明
图1是本申请一个实施例的显示背板的正常显示区和透明显示区的截面结构示意图；
图2是本申请一个实施例的三种正常显示区和透明显示区的分布示意图；
图3是本申请另一个实施例的显示背板的正常显示区和透明显示区的截面结构示意图；
图4是本申请一个实施例的制作显示背板的方法流程图；
图5是本申请一个实施例的显示背板的分区对应的第一掩膜板和第二掩膜板的示意图；
图6是本申请另一个实施例的显示背板的分区对应的第一掩膜板和第二掩膜板的示意图；
图7是本申请另一个实施例的显示背板的分区对应的第一掩膜板和第二掩膜板的示意图；
图8是本申请一个实施例的第二掩膜板的精细金属掩膜部分的镂空图案分布示意图；
图9是本申请另一个实施例的第二掩膜板的精细金属掩膜部分的镂空图案分布示意图。
附图标记
100 基板
200 第二绝缘层
201 第二过孔
300 第二电极
400 第一绝缘层
401 开口
402 隔堤
500 发光层
610 第一亚层
620 第二亚层
710 有源层
720 栅绝缘层
730 栅极
740 层间绝缘层
751 源极
752 漏极
760 第一过孔
A 正常显示区
B 透明显示区
C 第一掩膜板
c1 第一开口部分
D 第二掩膜板
d1 第二开口部分
d2 精细金属部分
具体实施方式
在本申请的一个方面，本申请提出了一种显示背板。
根据本申请的实施例，参考图1，显示背板包括基板100、第一绝缘层400、发光层500和第一电极；其中，参考图2，基板100上限定有透明显示区B和正常显示区A；第一绝缘层400覆盖基板100，且第一绝缘层400具有多个开口401，开口401在基板100上的正投影在第二电极300在基板100上的正投影之内；发光层500设置在开口401中并与第二电极300接触；而第一电极设置在发光层500远离基板100的一侧，且第一电极包括层叠设置的第一亚层610和第二亚层620，其中，在透明显示区B中，第二亚层620是图案化的，且发光层500在基板100上的正投影在图案化的第二亚层620在基板100上的正投影之内。需要说明的是，本文中的“图案化”具体是指非整层结构，即制作过程中先形成整层的材料再刻出具体形状后的结构。具体的，透明显示区B中第二亚层620可以包括多个相互间隔的子图案，且每个子图案对应一个子像素。
在本申请的一些实施例中，参考图1，显示背板还可包括第二电极300，其中，参考图3，第二电极300设置在第二绝缘层200与基板100之间，且第二电极300在开口401中与发光层500接触，如此，可获得结构和功能更完善的OLED结构。在一些具体示例中，第二电极300可以为不透光的阳极，而第一电极400可以为透光的阴极，如此，可使该显示背板具有顶发光的显示模式。
在本申请的一些实施例中，参考图3，在第一绝缘层400的开口401之间具有隔堤402；在透明显示区B中，隔堤402在基板上的投影与第二亚层620在基板100上的正投影部分重合如此，可进一步保证正常显示区和透明显示区的开口处的透过率更一致，从而可进一步保证局部透明显示屏的光学均一性，进而充分解决显示装置的色偏问题。
在本申请的一些实施例中，第一亚层610可覆盖发光层500和第一绝缘层400，第二亚层620可覆盖第一亚层610远离基板100的表面，如此，第二亚层620和整层的第一亚层610都可以更平整。在本申请的另一些实施例中，第一亚层610和第二亚层620的位置可以互换，即第二亚层620可覆盖发光层500和第一绝缘层400，第一亚层610可覆盖第二亚层620远离基板100的表面，如此，也可实现局部透明显示屏的光学均一性，从而解决显示装置的色偏问题。
在本申请的一些实施例中，参考图1，第二亚层620只在透明显示区B中为图案化的，即第二亚层620在正常显示区A中为整层结构，并且，第一亚层610在透明显示区B和正常显示区A中都是整层结构。如此，由第一亚层610和第二亚层620组成的第一电极在制作过程中，只需沉积两层亚层，再对透明显示区B的第二亚层620进行图案化处理即可实现。
在本申请的一些实施例中，第一亚层610的厚度可小于10nm，且第二亚层620的厚度可大于10nm，如此，较薄的整层第一亚层610具有很好的光穿透特性，能使透明显示区B中开口区以外具有较好的透明显示效果，且在透明显示区B中整层的第一亚层610和图案化的第二亚层620组成的第一电极，还能使透明显示区B中发光层500区域内第一电极的厚度与正常显示区A的第一电极的厚度一致，从而保证整个局部透明显示屏的光学均一性，进而解决色偏问题。在一些具体示例中，由第一亚层610和第二亚层620组成的第一电极的总厚度可为12～15nm，如此，与现有设计的均匀一体的整层第一电极的总厚度近似，但可使透明显示区B具有更好的透明显示效果，且整个局部透明显示屏的光学均一性更好。
在本申请的一些实施例中，第一亚层610可与第二亚层620直接接触，即在电路上第一亚层610与第二亚层620是采用并联电阻的设计，如此，由第一亚层和第二亚层并联后组成的第一电极，可显著降低第一电极的方阻，从而进一步减小断路的风险并解决亮度不均的问题。
在本申请的一些实施例中，在透明显示区B中，第一亚层610在基板100上的正投影在第二亚层620在基板100上的正投影之内，如此，作为阴极一部分的第二亚层620可完全覆盖住作为阳极的第二电极，从而使OLED结构的底发射出光效果更好。
根据本申请的实施例，基板100上正常显示区A和透明显示区B的具体分布方式不受特别的限制，本领域技术人员可根据该显示背板的具体种类进行相应地设计。在本申请的一些实施例中，参考图2的(1)和(2)，透明显示区B可设置在正常显示区A的一侧，例如图2的(1)中透明显示区B设置在正常显示区A的短边一侧，从而按照手机屏的设计可将摄像头等元件安装在透明显示区B中，或例如图2的(2)中透明显示区B设置在正常显示区A的长边一侧，从而按照平板电脑屏的设计可将摄像头等元件安装在透明显示区B中。在本申请的另一些实施例中，参考图2的(3)，透明显示区B还可设置在两个正常显示区A之间，如此，可满足广告牌、窗户等中间透明的设计要求。
在本申请的一些具体示例中，参考图3，显示背板还可包括薄膜晶体管(TFT)，该薄膜晶体管设置在基板100与第二绝缘层200之间，且薄膜晶体管包括层叠设置的有源层710、栅绝缘层720、栅极730、层间绝缘层740、源极751和漏极752，其中，源极751和漏极752通过贯穿栅绝缘层720和层间绝缘层740的第一过孔760与有源层710电连接，并且，第二电极300通过贯穿第二绝缘层200的第二过孔201与漏极752电连接。如此，可获得功能和结构都更完善的OLED器件。
根据本申请的实施例，形成第一电极的材料包括铝(Al)、银(Ag)、镁银合金(Mg-Ag)、钙(Ca)中的至少一种，如此，采用上述种类的导电金属材料的厚度在10纳米以下，可具有更好的光线穿透特性。根据本申请的实施例，形成发光层500的具体材料不受特别的限 制，本领域常用的发光材料均可，本领域技术人员可以根据局部透明显示效果的具体要求进行相应地选择。根据本申请的实施例，形成第二电极300的材料不受特别的限制，本领域常用的透光的阳极材料均可，本领域技术人员可根据发光层500的具体材料进行相应地选择。根据本申请的实施例，形成各个绝缘层(包括第二绝缘层200、第一绝缘层400、栅绝缘层720和层间绝缘层740等)的不受特别的限制，只要绝缘透光材料即可，本领域技术人员可根据实际绝缘效果的要求进行相应地选择。
综上所述，根据本申请的实施例，本申请提出了一种显示背板，可分两次形成层叠的第一亚层和第二亚层，组成OLED结构中的第一电极，并且，透明显示区内的第二亚层是图案化的，如此，可保证透明显示区的透明显示效果，且正常显示区和透明显示区的开口处的第一电极透过率一致，从而可以保证局部透明显示屏的光学均一性，进而解决显示装置的色偏问题。
在本申请的另一个方面，本申请提出了一种制作显示背板的方法。根据本申请的实施例，参考图4，该制作方法包括：
S100：在基板的一侧形成第一绝缘层和发光层。
在该步骤中，在基板的一侧形成第一绝缘层和发光层，且基板上分为透明显示区和正常显示区，并且，第一绝缘层具有多个开口，开口在基板上的正投影在发光层在基板上的正投影之内。
具体的，可先在基板的一侧沉积一整层的第二绝缘层，再在第二绝缘层远离基板的表面蒸镀形成图案化的第二电极，继续在第二电极和第二绝缘层远离基板的表面沉积一整层的第一绝缘层，并在第二电极的区域内光刻出开口，然后在开口内形成发光层，且发光层在开口内与第二电极接触。
S200：在发光层和第一绝缘层远离基板的一侧形成第一电极的第一亚层。
在该步骤中，继续在步骤S100形成的发光层和第一绝缘层远离基板的一侧，形成第一电极的第一亚层，且第一亚层为整面结构。在本申请的一些实施例中，蒸镀形成的第一亚层的厚度可小于10nm，如此，较薄的整层第一亚层可具有很好的光穿透特性。
在本申请的一些实施例中，参考图5～7，蒸镀形成第一亚层使用的第一掩膜板C具有第一开口部分c1，且第一开口部分c1的形状与第一亚层的形状对应，如此，通过使用上述的第一掩膜板C，即可直接蒸镀形成较薄的第一亚层。
S300：在第一亚层远离基板的表面形成第一电极的第二亚层。
在该步骤中，在第一亚层远离基板的表面形成第一电极的第二亚层，且对透明显示区中的第二亚层进行图案化处理，发光层在基板上的正投影在第二亚层在基板上的正投影之 内。在本申请的一些实施例中，形成的第二亚层的厚度可大于10nm，如此，由第一亚层和第二亚层组成的第一电极，在透明显示区的开口区域的厚度与正常显示区的厚度一致，从而保证整个局部透明显示屏的光学均一性，进而解决色偏问题。
在本申请的一些实施例中，参考图5～7，蒸镀形成第二亚层使用的第二掩膜板D限定有第二开口部分d1和精细金属掩膜部分d2，且第二开口部分d1的开口形状与正常显示区中的第二亚层的形状对应，精细金属掩膜部分d2的镂空图案与透明显示区的第二亚层的形状对应，如此，通过使用上述的第一掩膜板D，即可直接蒸镀形成在正常显示区整层而在透明显示区图案化的第二亚层。
在本申请的一些实施例中，参考图8，第二掩膜板D的精细金属掩膜部分d2中的镂空图案e，可按照像素单元的阵列排布方式，例如，每个像素单元中包括红色子像素(R)、绿色子像素(G)和蓝色子像素(B)，如此，像素单元区域在镂空图案e之内，从而可形成同时覆盖RGB单个子像素的第二亚层。
在本申请的另一些实施例中，参考图9，第二掩膜板D的精细金属掩膜部分d2中的镂空图案，也可按照子像素的阵列排布方式，例如，每个像素单元中包括红色子像素(R)、绿色子像素(G)和蓝色子像素(B)，如此，每个镂空图案e单独对应不同的RGB子像素，从而使透明显示区中透明效果区域更大，进而使局部透明显示效果进一步更好。
综上所述，根据本申请的实施例，本申请提出了一种制作方法，可通过两步分别形成形状不同的第一亚层和第二亚层，组成OLED结构中的第一电极，如此，可制作出透明显示区的透明显示效果更佳、光学均一性更好的显示背板，并且，该制作方法操作简便、容易实现。
在本申请的另一个方面，本申请提出了一种显示装置。根据本申请的实施例，显示装置包括上述的显示背板。
根据本申请的实施例，该显示装置的具体类型不受特别的限制，具体例如显示屏、电视、手机、平板电脑或智能手表等，本领域技术人员可根据显示装置的实际使用要求进行相应地选择，在此不再赘述。需要说明的是，该显示装置中除了显示面板以外，还包括其他必要的组成和结构，以OLED显示屏为例，具体例如外壳、控制电路板或电源线，等等，本领域技术人员可根据该显示装置的功能进行相应地补充，在此不再赘述。
综上所述，根据本申请的实施例，本申请提出了一种显示装置，其显示背板的透明显示效果更好、光学均一性更好，从而使该显示装置的局部透明显示效果更佳、光学均一性更好，进而使该显示装置的市场竞争力更高。本领域技术人员能够理解的是，前面针对显示背板所描述的特征和优点，仍适用于该显示装置，在此不再赘述。
在本申请的描述中，需要理解的是，术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”、“轴向”、“径向”、“周向”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。
此外，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。在本申请的描述中，“多个”的含义是至少两个，例如两个，三个等，除非另有明确具体的限定。
在本说明书的描述中，参考术语“一个实施例”、“一些实施例”、“示例”、“具体示例”、或“一些示例”等的描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本申请的至少一个实施例或示例中。在本说明书中，对上述术语的示意性表述不必须针对的是相同的实施例或示例。而且，描述的具体特征、结构、材料或者特点可以在任一个或多个实施例或示例中以合适的方式结合。此外，在不相互矛盾的情况下，本领域的技术人员可以将本说明书中描述的不同实施例或示例以及不同实施例或示例的特征进行结合和组合。
尽管上面已经示出和描述了本申请的实施例，可以理解的是，上述实施例是示例性的，不能理解为对本申请的限制，本领域的普通技术人员在本申请的范围内可以对上述实施例进行变化、修改、替换和变型。

Claims (14)

  1. 一种显示背板，包括：
    基板，所述基板上限定有透明显示区和正常显示区；
    第一绝缘层，所述第一绝缘层设置在所述基板的一侧，且具有多个开口；
    发光层，所述发光层设置在所述开口中；
    第一电极，所述第一电极设置在所述发光层远离所述基板的一侧，且包括层叠设置的第一亚层和第二亚层，其中，所述发光层在所述基板上的正投影在所述第二亚层在所述基板上的正投影之内，并且，在所述透明显示区中，所述第二亚层是图案化的。
  2. 根据权利要求1所述的显示背板，在所述第一绝缘层的所述开口之间具有隔堤；
    在所述透明显示区中，所述隔堤在所述基板上的正投影与所述第二亚层在所述基板上的正投影部分重合。
  3. 根据权利要求1或2所述的显示背板，在所述透明显示区和所述正常显示区中，所述第一亚层为整层结构；
    在所述正常显示区中，所述第二亚层为整层结构。
  4. 根据权利要求1～3中任一项所述的显示背板，所述第一亚层位于所述第二亚层和所述发光层之间。
  5. 根据权利要求1～4中任一项所述的显示背板，所述第一亚层的厚度小于所述第二亚层的厚度。
  6. 根据权利要求1～5中任一项所述的显示背板，所述第一亚层与所述第二亚层直接接触。
  7. 根据权利要求1～6中任一项所述的显示背板，在所述透明显示区中，所述第二电极在所述基板上的正投影在所述第二亚层在所述基板上的正投影之内。
  8. 根据权利要求1～7中任一项所述的显示背板，所述透明显示区设置在所述正常显示区的一侧。
  9. 根据权利要求1～7中任一项所述的显示背板，所述透明显示区设置在两个所述正常显示区之间。
  10. 一种制作显示背板的方法，包括：
    在基板的一侧形成第一绝缘层和发光层，且所述基板上分为透明显示区和正常显示区，并且，所述第一绝缘层具有多个开口，所述开口在所述基板上的正投影在所述发光层在所述基板上的正投影之内；
    在所述发光层和所述第一绝缘层远离所述基板的一侧形成第一电极的第一亚层；
    在所述第一亚层远离所述基板的表面形成所述第一电极的第二亚层，且对所述透明显示区中的所述第二亚层进行图案化处理，所述发光层在所述基板上的正投影在所述第二亚层在所述基板上的正投影之内。
  11. 根据权利要求10所述的方法，进一步包括：
    在基板的一侧形成第二电极，所述第二电极形成在所述基板与所述第一绝缘层之间，且在所述开口中与所述发光层接触。
  12. 根据权利要求10或11所述的方法，蒸镀形成所述第一亚层使用的第一掩膜板具有第一开口部分，所述第一开口部分的形状与所述第一亚层的形状对应。
  13. 根据权利要求10～12中任一项所述的方法，蒸镀形成所述第二亚层使用的第二掩膜板限定有第二开口部分和精细金属掩膜部分，且所述第二开口部分的开口形状与所述正常显示区中的所述第二亚层的形状对应，所述精细金属掩膜部分的镂空图案与所述透明显示区的所述第二亚层的形状对应。
  14. 一种显示装置，包括权利要求1～9中任一项所述的显示背板。
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