WO2020203663A1 - 感光性樹脂組成物作製キットおよび感光性樹脂組成物、硬化膜、硬化膜付き基板およびその製造方法 - Google Patents
感光性樹脂組成物作製キットおよび感光性樹脂組成物、硬化膜、硬化膜付き基板およびその製造方法 Download PDFInfo
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- WO2020203663A1 WO2020203663A1 PCT/JP2020/013735 JP2020013735W WO2020203663A1 WO 2020203663 A1 WO2020203663 A1 WO 2020203663A1 JP 2020013735 W JP2020013735 W JP 2020013735W WO 2020203663 A1 WO2020203663 A1 WO 2020203663A1
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- DYUWTXWIYMHBQS-UHFFFAOYSA-N n-prop-2-enylprop-2-en-1-amine Chemical compound C=CCNCC=C DYUWTXWIYMHBQS-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 125000003566 oxetanyl group Chemical group 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- XFZRQAZGUOTJCS-UHFFFAOYSA-N phosphoric acid;1,3,5-triazine-2,4,6-triamine Chemical compound OP(O)(O)=O.NC1=NC(N)=NC(N)=N1 XFZRQAZGUOTJCS-UHFFFAOYSA-N 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001610 polycaprolactone Polymers 0.000 description 1
- 239000004632 polycaprolactone Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 150000003138 primary alcohols Chemical class 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 235000019512 sardine Nutrition 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- JIWBIWFOSCKQMA-UHFFFAOYSA-N stearidonic acid Natural products CCC=CCC=CCC=CCC=CCCCCC(O)=O JIWBIWFOSCKQMA-UHFFFAOYSA-N 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- IAHFWCOBPZCAEA-UHFFFAOYSA-N succinonitrile Chemical compound N#CCCC#N IAHFWCOBPZCAEA-UHFFFAOYSA-N 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229910002029 synthetic silica gel Inorganic materials 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- 229940098465 tincture Drugs 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- VPYJNCGUESNPMV-UHFFFAOYSA-N triallylamine Chemical compound C=CCN(CC=C)CC=C VPYJNCGUESNPMV-UHFFFAOYSA-N 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- PLCFYBDYBCOLSP-UHFFFAOYSA-N tris(prop-2-enyl) 2-hydroxypropane-1,2,3-tricarboxylate Chemical compound C=CCOC(=O)CC(O)(CC(=O)OCC=C)C(=O)OCC=C PLCFYBDYBCOLSP-UHFFFAOYSA-N 0.000 description 1
- XHGIFBQQEGRTPB-UHFFFAOYSA-N tris(prop-2-enyl) phosphate Chemical compound C=CCOP(=O)(OCC=C)OCC=C XHGIFBQQEGRTPB-UHFFFAOYSA-N 0.000 description 1
- GTOWTBKGCUDSNY-UHFFFAOYSA-K tris[[ethyl(methyl)phosphoryl]oxy]alumane Chemical compound [Al+3].CCP(C)([O-])=O.CCP(C)([O-])=O.CCP(C)([O-])=O GTOWTBKGCUDSNY-UHFFFAOYSA-K 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 150000007964 xanthones Chemical class 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D201/00—Coating compositions based on unspecified macromolecular compounds
- C09D201/02—Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
- C09D201/06—Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing oxygen atoms
- C09D201/08—Carboxyl groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/65—Additives macromolecular
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
Definitions
- the present invention relates to a photosensitive resin composition preparation kit and a photosensitive resin composition. Furthermore, the present invention relates to a cured film made of a cured product of a photosensitive resin composition, a substrate with a cured film, and a method for producing the same.
- An insulating film is provided on the wiring of the flexible printed wiring board (FPC).
- a photosensitive resin composition containing a photosensitive resin, a thermosetting resin, a matting agent (filler), a coloring agent, a polymerization initiator and the like is used for forming the solder resist film (for example, Patent Document 1).
- Patent Document 2 provides a kit in which the constituent components of the photosensitive resin composition are divided into two or more kinds of solutions and individually prepared in order to improve the stability of long-term storage, and two or more kinds of kits constituting the kit are provided. It has been proposed to mix the solutions into a photosensitive resin composition.
- the cured film obtained by applying a photosensitive resin composition containing a matting agent and a coloring agent on a substrate and curing it by exposure may have minute hole defects.
- minute hole defects hereinafter referred to as “micro hole defects”
- the metal wiring is covered with the hardened film at the minute hole defect portion. Since it is not covered, insulation and insulation reliability cannot be guaranteed.
- the present invention provides a photosensitive resin composition capable of suppressing the formation of microhole defects in a cured film provided on a substrate such as a printed wiring board, and a kit used for preparing the photosensitive resin composition.
- the purpose is to provide.
- One embodiment of the present invention is a photosensitive resin composition preparation kit containing agents A and B (hereinafter, may be simply referred to as "kit").
- a photosensitive resin composition can be prepared by mixing the agent A and the agent B.
- a substrate with a cured film is obtained by applying a photosensitive resin composition on a substrate to form a coating film, and exposing and developing the coating film.
- the substrate on which the photosensitive resin composition is applied may be a printed wiring board.
- the 30 mm square coating film obtained by drying the photosensitive resin composition at 80 ° C. for 20 minutes may have an adhesion amount of 0.7 g or less when zirconia beads having a diameter of 0.3 mm are attached.
- Agent A of the kit includes (a1) a compound having a carboxy group and no ethylenically unsaturated group, (a2) a compound having a carboxy group and an ethylenically unsaturated group, (a3) a matting agent, and (a4).
- Agent B of the kit contains (b1) a compound having a reactive group capable of reacting with a carboxy group, (b2) a photoradical polymerization initiator, (b3) a colorant, and (b4) a second dispersant.
- At least one of the agent A and the agent B may contain (c) a compound having an ethylenically unsaturated group without having a carboxy group.
- the acid value of the first dispersant contained in Agent A is 1 to 60 mgKOH / g.
- the amine value of the second dispersant contained in Agent B is 1 mgKOH / g or more.
- the matting agent contained in the agent A may contain metal oxide particles.
- the amount of the metal oxide particles contained in the agent A may be 20 parts by weight or more with respect to 100 parts by weight of the resin content of the agent A.
- the matting agent may contain a solid flame retardant, and may contain metal oxide particles and a flame retardant as the matting agent.
- the metal oxide particles include silica particles.
- the amount of the matting agent contained in the agent A may be 60 parts by weight or more with respect to 100 parts by weight of the resin content of the agent A.
- One embodiment of the present invention relates to a photosensitive resin composition suitably used for forming a cured film.
- Another embodiment of the present invention relates to a kit used for preparing the photosensitive resin composition.
- the photosensitive resin composition preparation kit contains an agent A as a main agent and an agent B as a curing agent.
- Agent A includes (a1) a compound having a carboxy group and an ethylenically unsaturated group, (a2) a compound having a carboxy group and not having an ethylenically unsaturated group, and (a3) a matting agent.
- Agent B includes (b1) a compound having a reactive group capable of reacting with a carboxy group, (b2) a photoradical polymerization initiator, and (b3) a colorant. Either one or both of Agent A and Agent B may contain (c) a compound having no carboxy group and having an ethylenically unsaturated group.
- Agent A further contains (a4) a first dispersant in addition to the above (a1) to (a3).
- Agent B further contains (b4) a second dispersant in addition to the above (b1) to (b3).
- the (a4) first dispersant contained in the A agent is an acid value type or amphoteric type dispersant
- the (b4) second dispersant contained in the B agent is an amine value type or amphoteric type dispersant. is there.
- a photosensitive resin composition can be prepared by mixing an agent A as a main agent and an agent B as a curing agent.
- the component (a1), the component (a2), the component (b1) and the component (c) are resin components.
- the component (a1) and the component (a2) have a carboxy group, they are alkali-soluble.
- the photoradical polymerization initiator (b2) is activated by exposure (irradiation with active light), and the ethylenically unsaturated group of the component (a1) and the component (c) used as needed The photoradical polymerization reaction proceeds.
- Photocuring makes the resin composition insoluble in alkali.
- the carboxy groups of the components (a1) and (a2) react with the reactive groups of the component (b1) to form a crosslinked structure, so that the coloration is excellent in heat resistance and insulation.
- a cured film soldder resist film
- the components (a1) and (a2) contained in the agent A of the kit are compounds having at least one carboxy group in the molecule, and are the main components for forming a coating film of the resin composition.
- the components (a1) and (a2) form a crosslinked structure in the cured film when the carboxy group reacts with the component (b1) described later.
- the carboxy group of the component (a1) and the component (a2) may be a carboxylic acid anhydride obtained by dehydrating the two carboxy groups. Since the resin composition contains the carboxy group-containing compound as the component (a1) and the component (a2), the photosensitive resin composition before curing is alkaline-soluble.
- the carboxy group of the component (a1) and the component (a2) may be a carboxylic acid anhydride group obtained by dehydrating the two carboxy groups.
- the acid value of the components (a1) and (a2) is preferably 5 to 200 mgKOH / g, more preferably 10 to 150 mgKOH / g, and even more preferably 15 to 100 mgKOH / g.
- the resin composition before curing exhibits appropriate alkali solubility. Further, when the acid value is in the above range, the heat resistance, insulation reliability and chemical resistance of the cured film can be improved, and the flexibility tends to be improved.
- the component (a1) is a compound having a carboxy group and no ethylenically unsaturated group
- the component (a2) is a compound having a carboxy group and an ethylenically unsaturated group.
- an acryloyl group or a methacryloyl group is preferable because of its high photoradical reactivity.
- the concentration of carboxy group and the concentration of ethylenically unsaturated group in the photosensitive resin composition can be adjusted. It can be adjusted independently. Therefore, the photosensitive and alkali solubility of the photosensitive resin composition and the flexibility of the cured film are well-balanced without excessively increasing the crosslink density of the cured film obtained by curing the photosensitive resin composition. It becomes possible to control.
- the component (a1) is preferably a polymer having a carboxy group and no ethylenically unsaturated group.
- the weight average molecular weight of the component (a1) in terms of polyethylene glycol is preferably 1,000 to 1,000,000, more preferably 2,000 to 200,000, further preferably 3,000 to 100,000, and 4,000. ⁇ 50,000 is particularly preferable.
- a cured film capable of appropriately controlling solution characteristics such as viscosity of the kit and the photosensitive resin composition and having excellent heat resistance, chemical resistance and flexibility can be obtained. Easy to obtain.
- the component (a1) include a carboxy group-containing (meth) acrylic polymer, a carboxy group-containing vinyl polymer, an acid-modified polyurethane, an acid-modified polyester, an acid-modified polycarbonate, an acid-modified polyamide, an acid-modified polyimide, and an acid-modified polyurethane.
- examples thereof include amide and acid-modified polyurethaneimide.
- a carboxy group-containing (meth) acrylic copolymer, acid-modified polyurethane, acid-modified polyamide, and acid-modified polyimide are preferable.
- the component (a1) can be obtained by various known methods.
- the polymerization may be either solution polymerization or solvent-free polymerization, but solution polymerization is preferable in order to control the reaction.
- As the organic solvent for solution polymerization a solvent capable of dissolving both the monomer component and the polymer after polymerization can be used without particular limitation.
- the amount of the solvent in the solution polymerization may be adjusted so that the solution concentration is 5 to 90% by weight, preferably 20 to 70% by weight.
- the carboxy group-containing (meth) acrylic polymer is a copolymer containing a (meth) acrylic acid ester and a compound having a carboxy group and a polymerizable double bond in one molecule as a monomer component.
- the carboxy group-containing monomer include (meth) acrylic acid, crotonic acid, isocrotonic acid, myristolenic acid, palmitereic acid, oleic acid, ellagic acid, buxenoic acid, gadrain acid, eicosenoic acid, erucic acid, nervonic acid, and ⁇ -carboxy.
- -Polycaprolactone mono (meth) acrylate, monohydroxyethyl phthalate (meth) acrylate, (meth) acrylic acid dimer, 2- (meth) acryloyoxypropyl hexahydrophthalic acid, 2- (meth) acryloyoxyethyl succinct Acids, maleic acid, fumaric acid, citraconic acid, mesaconic acid, atropic acid, cinnamic acid, linoleic acid, eikosazienoic acid, docosadienoic acid, linolenic acid, pinolenic acid, eleostearic acid, meadic acid, dihomo-Y-linolenic acid , Eikosatrienic acid, stearidonic acid, arachidonic acid, eikosatetraenoic acid, adrenoic acid, boseopentaenoic acid, eikosapentaenoic acid, o
- the carboxy group-containing (meth) acrylic polymer has (meth) acrylamide such as diacetone (meth) acrylamide, acrylonitrile and vinyl-n-butyl ether as copolymerization components. Etc., Esters of vinyl alcohol, styrene, vinyl toluene and the like may be contained.
- the carboxy group-containing (meth) acrylic polymer can be obtained, for example, by radical polymerization of the above-mentioned monomer components.
- the radical polymerization may be thermal polymerization or photopolymerization.
- a polymerization initiator may be used for radical polymerization.
- the carboxy group-containing (meth) acrylic polymer is preferably obtained by solution polymerization using an azo compound, an organic peroxide, a persulfate, hydrogen peroxide or the like as a thermal polymerization initiator.
- the acid-modified polyurethane can be obtained, for example, by reacting a diol compound containing two hydroxyl groups and one carboxy group with a diisocyanate compound.
- the acid-modified polyester is obtained, for example, by reacting a diol compound containing two hydroxyl groups and one carboxy group with a dicarboxylic acid.
- the acid-modified polyamide is a compound having an amic acid structure, and is obtained, for example, by reacting a diamino compound with a tetracarboxylic dianhydride.
- the acid-modified polyimide can be obtained, for example, by reacting a diisocyanate compound with a tetracarboxylic dianhydride. By adding the tetracarboxylic dianhydride in excess of the equivalent amount of the diisocyanate compound, an imide compound having a carboxylic acid anhydride group at the terminal is obtained. By reacting an imide compound having a carboxylic acid anhydride group at the terminal with water and / or a primary alcohol such as methanol, ethanol, propanol or butanol, an imide compound having a carboxy group at the terminal can be obtained.
- diol compound containing two hydroxyl groups and one carboxy group examples include 2,2-bis (hydroxymethyl) propionic acid, 2,2-bis (2-hydroxyethyl) propionic acid, and 2,2-bis (3-bis). Hydroxymepropyl) propionic acid, 2,3-dihydroxy-2-methylpropionic acid, 2,2-bis (hydroxymethyl) butanoic acid, 2,2-bis (2-hydroxyethyl) butanoic acid, 2,2-bis Aliphatic diols such as (3-hydroxypropyl) butanoic acid, 2,3-dihydroxybutanoic acid, 2,4-dihydroxy-3,3-dimethylbutanoic acid, and 2,3-dihydroxyhexadecanoic acid; 2,3- Fragrant diols such as dihydroxybenzoic acid, 2,4-dihydroxybenzoic acid, 2,5-dihydroxybenzoic acid, 2,6-dihydroxybenzoic acid, 3,4-dihydroxybenzoic acid, and 3,5-dihydroxybenzo
- the diisocyanate compound may be either an alicyclic diisocyanate compound or an aliphatic diisocyanate compound.
- the diisocyanate compound may be a reaction product of a compound having two or more functional groups capable of reacting with the isocyanate group of the diisocyanate compound, and may be, for example, a urethane compound having an isocyanate group at the terminal.
- the tetracarboxylic acid dianhydride may be either an aromatic tetracarboxylic acid dianhydride or an aliphatic tetracarboxylic acid dianhydride, and the aromatic tetracarboxylic acid dianhydride having a carboxylic acid anhydride group directly bonded to the aromatic ring.
- An anhydride is preferred.
- aromatic tetracarboxylic dianhydrides are preferable, and those in which an anhydrous carboxy group is directly bonded to an aromatic ring are preferable.
- the diamino compound may be either an aromatic diamine or an aliphatic diamine, and an aromatic diamine is preferable.
- an acid-modified epoxy (meth) obtained by adding a saturated or unsaturated polyvalent carboxylic acid anhydride to an ester obtained by reacting an epoxy resin with an unsaturated monocarboxylic acid.
- Examples of commercially available epoxy (meth) acrylate products having a carboxy group include KAYARAD ZFR series, ZAR series, ZCR series, CCR series, PCR series, and UXE series manufactured by Nippon Kayaku.
- Examples of commercially available urethane (meth) acrylates having a carboxy group include the UX series manufactured by Nippon Kayaku.
- Examples of commercially available (meth) acrylic (meth) acrylate products include the Cyclomer ACA series manufactured by Daicel Cytec.
- the component (b1) contained in the agent B of the kit is a compound having a reactive group capable of reacting with a carboxy group, and may be any of a monomer, an oligomer, and a polymer.
- the reactive group capable of reacting with the carboxy group include an epoxy group, an oxetanyl group, an isocyanate group, an amino group, a hydroxyl group and the like.
- an epoxy group is preferable as the reactive group because the reactivity with the carboxy group is low at room temperature and the reactivity with the carboxy group is exhibited by heating.
- the component (b1) is preferably an epoxy resin having at least one epoxy group in the molecule, and among them, two or more epoxy groups in the molecule.
- a polyfunctional epoxy resin having is preferable.
- polyfunctional epoxy resin examples include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, hydrogenated bisphenol A type epoxy resin, biphenyl type epoxy resin, phenoxy type epoxy resin, naphthalene type epoxy resin, and phenol novolac.
- examples thereof include type epoxy resin, cresol novolac type epoxy resin, trisphenol methane type epoxy resin, dicyclopentadiene type epoxy resin, amine type epoxy resin and the like.
- the epoxy resin may be a modified epoxy resin made of urethane, rubber, chelate, dimer acid or the like.
- a commercially available epoxy resin may be used as it is as the component (C).
- the epoxy equivalent of the epoxy resin (mass (g) of the compound containing 1 equivalent of the epoxy group) is preferably 2000 or less, and more preferably 1500 or less.
- the weight average molecular weight of the epoxy resin is preferably about 150 to 2000, more preferably about 200 to 1500.
- the component (b1) may not be completely dissolved in an organic solvent at room temperature (25 ° C.) in the agent B, and may be present in whole or in part as a solid. Since the component (b1) is present as a solid, it does not show reactivity at room temperature, but shows reactivity when it is melted (or melted) by heating, so that the storage stability of the kit and the photosensitive resin composition is improved. Can contribute to.
- the presence of component (b1) as a solid in the solution can be confirmed, for example, by measuring the particle size by a method using a gauge specified in JIS K 5600-2-5.
- the photosensitive resin composition may contain, as the component (c), a compound which does not have a carboxy group and has at least one ethylenically unsaturated group.
- the component (c) may be contained in either agent A or agent B of the kit, or may be contained in both agents. If the component (c) is contained in a solution different from that of the photoradical polymerization initiator (b2) described later, photopolymerization in a storage environment tends to be suppressed and the storage stability of the kit tends to be improved. Therefore, in the kit used for preparing the photosensitive resin composition containing the component (c), it is preferable that the agent A contains the component (c).
- the compound having a (meth) acryloyl group as an ethylenically unsaturated group include stearyl (meth) acrylate, lauryl (meth) acrylate, methoxydiethylene glycol (meth) acrylate, methoxytriethylene glycol (meth) acrylate, and methoxypolyethylene.
- Glycol (meth) acrylate methoxydipropylene glycol (meth) acrylate, phenoxyethyl (meth) acrylate, phenoxydiethylene glycol (meth) acrylate, phenoxypolyethylene glycol (meth) acrylate, nonylphenoxyethylene glycol (meth) acrylate, nonylphenoxypolyethylene glycol (Meta) Acrylate, Nonylphenoxy Polypropylene Glycol (Meta) Acrylate, ⁇ - (Meta) Acryloyloxyethyl Hydrogenphthalate, ⁇ - (Meta) Acryloyloxyethyl Hydrogen Succinate, 3-Chloro-2-hydroxypropyl (Meta) Monofunctional (meth) acrylic compounds such as acrylate, 1- (meth) acryloyloxypropyl-2-phthalate, polyoxyethylene alkyl ether (meth) acrylate; ethylene glycol di (meth) acrylate, diethylene glycol
- the polyfunctional (meth) acrylic compound may be a compound having 3 or more (meth) acryloyl groups in one molecule.
- Examples of the trifunctional or higher functional (meth) acrylic compound include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, ethoxylated totimethylolpropane tri (meth) acrylate, and propoxylated totimethylolpropane tri (meth) acrylate.
- the compound having a vinyl group as an ethylenically unsaturated device include diallylamine, diallyldimethylsilane, diallyl disulfide, diallyl ether, diallyl cyanurate, diallyl isophthalate, diallyl terephthalate, 1,3-dialyloxy-2-propanol.
- the component (c) may be a polymer (oligomer).
- the polyfunctional (meth) acrylic oligomer include urethane (meth) acrylate, epoxy (meth) acrylate, polyester (meth) acrylate, and acrylic (meth) acrylate. Urethane (meth) acrylate is preferable because a cured film having excellent flexibility is easily formed.
- the polyfunctional (meth) acrylic oligomer is preferably a bifunctional (meth) acrylic compound.
- the molecular weight of the polyfunctional (meth) acrylic oligomer is preferably about 250 to 20,000, more preferably 300 to 15,000, and 350 to 10,000. More preferred.
- the molecular weight of the polyfunctional (meth) acrylic oligomer may be 400 or more, 5,000 or less, 3,000 or less, 2,000 or less, 1,500 or less, or 1,000 or less.
- the photosensitive resin composition has (a1) a compound having a carboxy group and no ethylenically unsaturated group, (a2) a compound having a carboxy group and an ethylenically unsaturated group, and (B1) contains a compound having a reactive group capable of reacting with a carboxy group, and if necessary, (c) contains a compound having no carboxy group and having an ethylenically unsaturated group.
- the amount of the component (a1) with respect to 100 parts by weight of the total solid content in the photosensitive resin composition after mixing the agent A and the agent B is preferably 1 to 30 parts by weight, more preferably 2 to 20 parts by weight.
- the amount of the component (a2) is preferably 10 to 70 parts by weight.
- the amount of the component (b1) is preferably 1 to 50 parts by weight, more preferably 5 to 20 parts by weight.
- the solid content is a non-volatile content, and even if it exists as a liquid in the agents A and B, what remains as a solid content in the cured film after curing is included in the solid content.
- the developability of the resin composition and the adhesion to the substrate, as well as the heat resistance, chemical resistance and electricity of the cured film It tends to have excellent insulation reliability. If the amount of the component (a1) is excessively large, the photosensitivity and developability may decrease. If the amount of the component (a2) is excessively large, the tack-free property of the coating film of the photosensitive resin composition is lowered, and the stickiness of the coating film may cause adhesion of foreign matter or the like.
- the amount of the component (c) is preferably 10 to 100 parts by weight, preferably 15 parts by weight, based on 100 parts by weight of the total of the components (a1) and (a2). Up to 50 parts by weight is more preferable, and 20 to 40 parts by weight is further preferable.
- the component (c) is within the above range, the light sensitivity of the photosensitive resin composition is improved, the contrast and alkali resistance of the cured film after exposure and development are improved, and the coating film of the photosensitive resin composition is improved. Tack-free property tends to improve.
- the amount of the component (c) is small, the contrast and alkali resistance of the cured film tend to decrease. If the amount of the component (c) is excessively large, the tack-free property of the coating film is lowered, which may cause adhesion of foreign matter or the like.
- Photoradical polymerization initiator As the component (b2) absorbs and activates light energy such as UV (ultraviolet light), and photoradical polymerization reaction of the ethylenically unsaturated group of the components (a1) and (c). Is a compound that initiates and promotes.
- photoradical polymerization initiators are self-cleaving photoradical polymerization initiators such as benzoin compounds, acetophenones, aminoketones, oxime esters, acylphosphine oxide compounds, azo compounds; and benzophenones, benzoins.
- Hydrogen abstraction type photorades such as ethers, benzyl ketals, dibenzosverones, anthraquinones, xanthones, thioxanthones, halogenoacetophenones, dialkoxyacetophenones, hydroxyacetophenones, halogenobis imidazoles, and halogenotriazines.
- a polymerization initiator can be mentioned.
- a photoradical polymerization initiator having an absorption band at a wavelength of 405 nm may be used.
- the absorbance of a 0.001 wt% methanol solution measured by a visible-ultraviolet spectrophotometer using a quartz cell with an optical path length of 1 cm at a wavelength of 405 nm is 0.02 or more, that is, the extinction coefficient at a wavelength of 405 nm is , 20 [% -1 ⁇ cm -1 ] or more, and a photoradical polymerization initiator is preferable.
- Examples of the photoradical polymerization initiator having an absorption band at a wavelength of 405 nm include acylphosphine oxide compounds, acetophenones, aminoketones, and oxime esters. Of these, oxime esters are preferable because of their high photosensitivity.
- Commercially available products of oxime esters having an absorption band at a wavelength of 405 nm include ADEKA's "Adeka Arkuru's NCI-831", “Adeka Arkuru's N-1717” and “Adeka Arkuru's N-1919", and BASF's "Adeka Arkuru's N-1919". Irgacure OXE03 "and the like.
- the photopolymerization initiator near the irradiation surface was activated by absorbing the light and was not absorbed near the irradiation surface. The light reaches the bottom.
- the photosensitive resin composition contains a colorant, the colorant absorbs the active light in addition to the photopolymerization initiator, so that the amount of the active light reaching the bottom is small, and the bottom portion is compared with the light irradiation surface. Photocuring is likely to be insufficient.
- short-wavelength light has a relatively high energy
- photocuring by irradiation with active light short-wavelength light is preferentially used near the light-irradiated surface, and long-wavelength light that is not absorbed near the light-irradiated surface is used.
- Light easily reaches the bottom.
- photoradical polymerization initiator having an absorption band at a long wavelength (405 nm) as the component (b2)
- photocuring by the long wavelength light reaching the bottom is likely to proceed. Therefore, even when the composition has a colorant, the photocuring reaction at the bottom can be maintained, and the heat resistance of the cured film tends to be improved.
- a photoradical polymerization initiator having an absorption band at a wavelength of 405 nm and a photoradical having no absorption band at a wavelength of 405 nm (absorption coefficient is less than 20 [% -1 ⁇ cm- 1 ]). It may be used in combination with a polymerization initiator.
- the amount of the component (b2) is preferably 0.1 to 20 parts by weight, preferably 0.2 to 10 parts by weight, based on 100 parts by weight of the total of the compound having an ethylenically unsaturated group, that is, the component (a2) and the component (c). Parts by weight are more preferred.
- the resin composition has appropriate photosensitivity, so that curing can be performed in an appropriate exposure time while suppressing overexposure.
- the matting agent contained in the agent A exists as a solid in the agent A, and is clearly separated from the above resin component as a solid in the photosensitive resin composition after mixing the agent A and the agent B and the cured film thereof. It is a component that exists as a phase.
- the matting agent is typically what is called an organic filler or an inorganic filler.
- the shape of the filler include spherical shape, powder shape, fibrous shape, needle shape, and scale shape.
- examples of the organic filler include polytetrafluoroethylene, polyethylene, benzoguanamine, melamine, phthalocyanine and the like.
- the organic filler may be core-shell particles having a multi-layer structure using silicone, acrylic, styrene butadiene rubber, butadiene rubber or the like.
- the inorganic filler examples include metal oxides such as silica, titania and alumina, metal nitrides such as silicon nitride and boron nitride, and metal salts such as calcium carbonate, calcium hydrogen phosphate, calcium phosphate and aluminum phosphate.
- the inorganic filler may be surface-modified with a silane coupling agent, other organic compounds, or the like.
- the filler material is preferably an inorganic filler such as a metal oxide, a metal nitrogen compound, or a metal salt.
- metal oxides are preferable, and silica is particularly preferable.
- a solid flame retardant may be contained in addition to the above filler.
- a solid flame retardant that acts as a matting agent flame retardancy is imparted to the cured film, and contact failure and process contamination caused by bleeding out of the flame retardant can be suppressed.
- a phosphoric acid ester compound As the flame retardant, a phosphoric acid ester compound, a halogen-containing compound, a metal hydroxide, a phosphorus compound, a silicone compound, or the like can be used. From the viewpoint of preventing environmental pollution, non-halogen flame retardants such as metal hydroxides and phosphorus compounds are preferable, and phosphorus compounds are particularly preferable.
- Phosphorus-based flame retardants include red phosphorus, condensed phosphate ester compounds, cyclic organic phosphorus compounds, phosphazene compounds, phosphorus-containing (meth) acrylate compounds, phosphorus-containing epoxy compounds, phosphorus-containing polyol compounds, and phosphorus-containing agents.
- examples thereof include amine compounds, ammonium polyphosphate, melamine phosphate, and metal phosphinic acid salts.
- the phosphinic acid metal salt is preferable.
- an aluminum salt is preferable because high flame retardancy can be obtained, and aluminum diethylphosphinate, aluminum methylethylphosphinate and the like are particularly preferable.
- the blending amount of the (a3) matting agent in the agent A is 60 parts by weight or more with respect to the resin content contained in the agent A, that is, 100 parts by weight in total of the components (a1), (a2) and (c). Preferably, it is 65 parts by weight or more, and may be 70 parts by weight or more or 75 parts by weight or more.
- the amount of the matting agent with respect to 100 parts by weight of the total solid content of the matting agent (a3) and the first dispersant (a4) described later is preferably 38 parts by weight or more, more preferably 40 parts by weight or more.
- the amount is preferably 40 parts by weight or more, more preferably 45 parts by weight or more, and further preferably 50 parts by weight or more.
- the blending amount of the (a3) matting agent in the agent A is preferably 200 parts by weight or less, more preferably 150 parts by weight or less, and 100 parts by weight or less with respect to 100 parts by weight of the total resin content contained in the agent A. Is more preferable, and it may be 90 parts by weight or less or 85 parts by weight or less.
- the amount of the matting agent with respect to 100 parts by weight of the total solid content of the agent A is preferably 65 parts by weight or less, more preferably 60 parts by weight or less, and may be 55 parts by weight or less or 50 parts by weight or less.
- the amount of the matting agent with respect to a total of 100 parts by weight of the resin content contained in the photosensitive resin composition is preferably 150 parts by weight or less, more preferably 100 parts by weight or less, further preferably 80 parts by weight or less, and 75 parts by weight or less. It may be 70 parts by weight or less.
- the amount of the matting agent is within the above range, the viscosity characteristics of the agent A and the photosensitive resin composition are appropriately controlled, the printability can be improved, and the tack-free property of the coating film of the photosensitive resin composition is improved.
- adhesion of foreign matter or the like to the surface of the coating film is suppressed.
- the amount of the matting agent is small, the tack-free property of the coating film tends to decrease, which may cause adhesion of foreign matter or the like. If the amount of the matting agent is excessively large, the viscosity and thixotropy of the solution may increase, which may cause a decrease in printability of the photosensitive resin composition and a poor leveling of the coating film.
- the blending amount of the metal oxide particles in the agent A is preferably 20 parts by weight or more, preferably 23 parts by weight, based on 100 parts by weight of the total amount of the resin contained in the agent A.
- the above is more preferable, and it may be 25 parts by weight or more or 27 parts by weight or more.
- the amount of the metal oxide particles with respect to 100 parts by weight of the total solid content of the agent A is preferably 10 parts by weight or more, more preferably 12 parts by weight or more.
- the amount of the metal oxide particles with respect to 100 parts by weight of the total resin content contained in the photosensitive resin composition is preferably 8 parts by weight or more, more preferably 10 parts by weight or more.
- the upper limit of the blending amount of the metal oxide fine particles is the same as the upper limit of the blending amount of the matting agent described above.
- the content of metal oxide particles such as silica has a large influence on the solution characteristics such as viscosity.
- the viscosity characteristics of the agent A and the photosensitive resin composition can be appropriately controlled, the printability can be improved, and the tack-free property of the coating film of the photosensitive resin composition can be improved. Is improved, and the adhesion of foreign matter or the like to the surface of the coating film tends to be suppressed.
- the matting agent may contain a solid flame retardant in addition to a filler such as metal oxide particles.
- the content of the flame retardant is preferably 1 to 50 parts by weight, more preferably 5 to 40 parts by weight, still more preferably 10 to 30 parts by weight, based on 100 parts by weight of the total solid content of the resin composition.
- the colorant is either a dye or a pigment, and phthalocyanine compounds, azo compounds, carbon black, titanium oxide and the like are used. A plurality of colorants may be combined.
- the content of the colorant may be appropriately set according to the type of the colorant and the color of the cured film.
- the amount of the colorant may be adjusted so that the brightness L * of the cured film having a film thickness of 20 ⁇ m is 10 to 30.
- the amount of the colorant in the agent B is preferably 0.5 to 50 parts by weight, preferably 1 to 40 parts by weight, based on 100 parts by weight of the total solid content of the agent B. More preferably, it is more preferably 3 to 30 parts by weight, and it may be 5 to 25 parts by weight.
- the amount of the colorant in the photosensitive resin composition after mixing the agent A and the agent B is preferably 1 to 30 parts by weight, preferably 3 to 20 parts by weight, based on 100 parts by weight of the total solid content of the photosensitive resin composition. The portion is more preferable.
- Each of the A and B agents in the kit contains a dispersant.
- the agent A contains the first dispersant as the component (a4)
- the dispersibility of the filler is improved, and the viscosity and thixotropy of the agent A can be adjusted in an appropriate range.
- the agent B contains the second dispersant as the component (b4)
- the dispersibility of the colorant is improved, and the viscosity and thixotropy of the agent B can be adjusted in an appropriate range.
- the dispersant examples include a surfactant type dispersant and a resin type (polymer) dispersant. From the viewpoint of dispersion stability, resin-type dispersants are preferable, and those having a high molecular weight are particularly preferable.
- the weight average molecular weight of the resin type dispersant is, for example, 1000 to 200,000, preferably 5000 to 100,000, more preferably 8,000 to 80,000, still more preferably 10,000 to 60,000.
- resin-type dispersants include urethane dispersants, polyethyleneimine dispersants, polyoxyethylene alkyl ether dispersants, polyoxyethylene glycol diester dispersants, sorbitan aliphatic ester dispersants, and aliphatic modified polyesters. Examples include system dispersants.
- resin-type dispersants include BASF's "EFKA” series, Big Chemie's “DISPERBYK” series, Kusumoto Kasei's “Disparon” series, Lubrizol's “SOLSPERSE” series, and Ajinomoto Fine-Techno's “DISPERBY” series. Examples include the “Ajinomoto” series, the “Hinoact” series manufactured by Kawaken Fine Chemicals, and the "TERPLUS” series manufactured by Otsuka Chemical.
- the dispersant is an acid value type dispersant having an acid value of 0 and an acid value of more than 0; an amine value type dispersion having an acid value of 0 and an amine value of more than 0.
- Agents Can be classified as amphoteric dispersants with acid and amine values greater than 0.
- the acidic group of the acid value type dispersant and the amphoteric type dispersant include a carboxy group, a phosphoric acid group, a sulfonic acid group, and a phenolic hydroxyl group. Of these, a carboxy group is preferable.
- the (a4) first dispersant contained in the agent A is an acid value type or an amphoteric type.
- the acid value of the first dispersant is 1 to 60 mgKOH / g.
- the dispersibility of the matting agent in the photosensitive resin composition after mixing the agent A and the agent A and the agent B is improved, and the printability of the composition is improved.
- the tack-free property is improved, and the formation of microhole defects in the cured film tends to be suppressed.
- the acid value of the first dispersant is preferably 3 or more, and may be 5 or more. If the acid value is excessively small, the effect of the dispersant may not be sufficiently obtained.
- the acid value of the first dispersant is preferably 50 or less, more preferably 40 or less, further preferably 30 or less, and may be 20 or less. When the oxidation is excessively large, the dispersibility of the matting agent is good and insufficient, the printability is deteriorated, and the occurrence of microhole defects tends to increase.
- the amine value of the first dispersant is not particularly limited.
- the amine value of the acid value type dispersant is 0.
- the amine value may be 1 or more. If the amine value of the first dispersant is excessively high, the storage stability of the agent A may decrease due to the reaction with the carboxy group of the component (a1) and the component (a4). In addition, the viscosity and thixotropy of the solution increase with the reaction, which may cause deterioration of printability of the photosensitive resin composition. Therefore, the amine value of the first dispersant is preferably 50 or less, more preferably 40 or less, further preferably 30 or less, and may be 25 or less or 20 or less.
- the (b4) second dispersant contained in Agent B is an amine-valent type or an amphoteric type.
- the amine value of the second dispersant is 1 or more.
- the acid value of the second dispersant is within this range, the dispersibility of the colorant in the agent B and the photosensitive resin composition is improved, the printability of the composition is improved, the tack-free property is improved, and the curing is performed. The formation of micropore defects in the membrane tends to be suppressed.
- the amine value of the second dispersant is preferably 3 or more, more preferably 5 or more, and may be 10 or more. If the amine value is excessively small, the effect of the dispersant may not be sufficiently obtained.
- the upper limit of the amine value of the second dispersant is not particularly limited, but is generally 200 or less, and may be 150 or less, 130 or less, 120 or less, or 110 or less.
- the acid value of the second dispersant is not particularly limited.
- the acid value of the amine-valent dispersant is 0.
- the acid value may be 1 or more.
- the acid value of the second dispersant is preferably 60 or less, and may be 50 or less, 40 or less, 30 or less, or 20 or less.
- the amount of the (a4) first dispersant in the agent A is 0.01 to 15 parts by weight of the active ingredient (solid content) as the dispersant with respect to 100 parts by weight of the total solid content of the agent A excluding the dispersant. It is preferably 1 to 10 parts by weight, more preferably 2 to 7 parts by weight.
- the amount of the active ingredient of the (a4) first dispersant in the agent A is preferably 1 to 40 parts by weight, more preferably 2 to 30 parts by weight, and 3 to 25 parts by weight with respect to 100 parts by weight of the (a3) matting agent. Is more preferable, and may be 5 to 20 parts by weight.
- the blending amount of the second dispersant in Agent B is that the active ingredient (solid content) as the dispersant is 0.01 to 15 parts by weight with respect to 100 parts by weight of the total solid content of Agent B excluding the dispersant. Is preferable, 1 to 10 parts by weight is more preferable, and 2 to 7 parts by weight is further preferable.
- the amount of the active ingredient of the (b4) second dispersant in the agent B is preferably 1 to 40 parts by weight, more preferably 2 to 30 parts by weight, and 3 to 25 parts by weight with respect to 100 parts by weight of the (b3) colorant. Is more preferable, and may be 5 to 20 parts by weight.
- the amount of the dispersant When the amount of the dispersant is small, the dispersibility of the matting agent and the colorant in the agent A, the agent B and the photosensitive resin composition is lowered, and the printability tends to be lowered due to the increase in viscosity and thixo property. If the amount of the dispersant blended is excessively large, bridging aggregation between the dispersants is likely to occur, which may cause a decrease in dispersibility and poor insulation of the cured film.
- the photosensitive resin composition preparation kit individually contains the agent A and the agent B, and the photosensitive resin composition can be prepared by mixing the agent A and the agent B.
- the photosensitive resin composition preparation kit is not limited to the two-component type composed of the A agent and the B agent, and may be a type in which three or more liquids are mixed.
- the component (a1) and the component (a2) containing a carboxy group are contained in the agent A, and the component (b1) having a reactive group with the carboxy group is contained in the agent B, and both are stored as a kit without being mixed. Thereby, the reaction between the component (a1) and the component (a2) and the component (b1) can be prevented.
- the photoradical initiator was activated by light in a storage environment because the component (a2) having photoradical polymerization property was contained in the agent A and the photoradical polymerization initiator (b2) was contained in the agent B. Even in this case, the polymerization reaction of the component (a2) can be prevented.
- the photosensitive resin composition contains the component (c) which is a photoradical polymerizable compound containing no carboxy group, the component (c) is contained in the agent A from the viewpoint of suppressing the polymerization reaction of the component (c). Is preferable.
- Agent A has a larger amount of resin than agent B and has the role of a main agent. Therefore, in general, the main agent, agent A, has a larger volume than agent B. Good dispersibility can be ensured by containing the (a3) matting agent in the agent A having a relatively large volume. Further, by incorporating the (b3) colorant in the low-viscosity B agent having a relatively low resin content, the dispersibility of the colorant can be improved.
- the matting agent and the coloring agent are dispersed in different solutions, so that the dispersibility of each can be enhanced. ..
- the dispersibility of the matting agent in the A agent can be improved.
- the method of incorporating the dispersant in the agent A can be appropriately selected.
- the dispersant may be added when the resin component and the matting agent are added, or the dispersant may be added after the resin component and the matting agent are added and both are mixed.
- the dispersibility of the colorant in the B agent can be improved.
- the method of incorporating the dispersant in the agent B can be appropriately selected.
- the dispersant may be added when the resin component and the colorant are added, or the dispersant may be added after the resin component and the colorant are added and both are mixed.
- a photosensitive resin composition is obtained by mixing the above agent A and agent B.
- the mixing ratio of the agent A and the agent B is not particularly limited, and the composition after mixing may be set so as to be the desired composition of the photosensitive resin composition.
- the total solid content of the agent B is about 5 to 60 parts by weight with respect to 100 parts by weight of the total solid content contained in the agent A, and is 10 to 50 parts by weight or 15 to 40 parts by weight. It may be.
- the pulverization / dispersion may be carried out using, for example, a kneading device such as a bead mill, a ball mill, or a three-roll. These treatments may be performed during the preparation of the A and B agents of the kit, and these treatments may be performed both during the preparation of the kit and when the A and B agents are mixed.
- the photosensitive resin composition contains a defoaming agent, a leveling agent, an adhesion imparting agent, a polymerization inhibitor, and a curing agent, if necessary. It may contain additives such as auxiliaries and sensitizers. These additives may be added in advance to the agents A and / or B of the kit, or the additives may be added to the composition after mixing the agents A and B.
- each of the agent A and the agent B of the kit contains a predetermined dispersant, the dispersibility of the matting agent in the agent A and the dispersibility of the colorant in the agent B are good. Therefore, even in the photosensitive resin composition in which the agent A and the agent B are mixed, the dispersibility of the matting agent and the coloring agent is good, and the generation of agglomerates is suppressed. Further, since the dispersibility of solid components such as a matting agent and a coloring agent is good, a solution having a viscosity and a thixo property suitable for printing can be easily prepared.
- a cured film is formed by applying a photosensitive resin composition to a substrate, removing a solvent by heating if necessary, and then performing photocuring and thermosetting. Since the photosensitive resin composition has a colorant, a colored cured film colored in black or the like can be obtained. By using the above-mentioned photosensitive composition, a cured film having few microhole defects and excellent insulating properties can be formed on the metal wiring of the printed wiring board.
- the formation of the cured film using the photosensitive resin composition can be carried out by various known methods.
- the photosensitive resin composition (solution) may be applied onto the substrate by screen printing, curtain roll, reverse roll, spray coating, rotary coating using a spinner, or the like.
- the thickness of the coating film may be adjusted so that the thickness after drying is about 5 to 100 ⁇ m, preferably about 10 to 50 ⁇ m.
- the drying temperature is preferably 120 ° C. or lower, more preferably 40 to 100 ° C. from the viewpoint of suppressing the thermosetting reaction.
- the coating film after drying and removing the solvent is preferably in a tack-free state with less stickiness on the surface.
- the tack-free property can be evaluated by the amount of zirconia beads adhering to the surface of the coating film.
- the photosensitive resin composition is applied onto a substrate by printing or the like and dried at 80 ° C. for 20 minutes to obtain a laminate having a coating film formed on the substrate.
- a 0.3 mm ⁇ zirconia bead is spread on a petri dish, and a 30 cm square laminated body is placed on the petri dish so that the coating film is in contact with the zirconia bead, and a 100 g weight is placed on the zirconia bead and allowed to stand for 1 minute. After that, pull up the laminate.
- the adhered weight of the zirconia beads in this test is preferably 0.7 g or less.
- the substrate and the photomask adhere to the surface of the coating film when the substrates (process work in process) with the coating film before exposure are stacked or when the photomask is placed at the time of exposure. Can be prevented. Further, if the tack-free property is good, the adhesion of foreign matter to the surface of the coating film can be suppressed, and the formation of microhole defects due to poor exposure can be prevented.
- the amount of the matting agent in the agent A and the photosensitive resin composition is adjusted within a predetermined range, and the matting agent is satisfactorily dispersed in the solution by the action of the dispersant or the like. It is in a state of being. Therefore, when the coating film is formed, unevenness is likely to be uniformly formed on the surface of the coating film, and the tack-free property is improved.
- Photo-curing is performed by exposing the dried coating film.
- a desired pattern can be formed by arranging a photomask on the coating film, selectively exposing a part of the surface of the coating film, and then developing the photomask.
- An alkaline aqueous solution is generally used as the developing solution, and an organic alkaline aqueous solution and an inorganic alkaline aqueous solution can be used without particular limitation.
- the developer may contain an organic solvent that is miscible with water, such as metanol, etanol, n-propanol, isopropanol, and N-methyl-2-pyrrolidone.
- the alkali concentration of the developing solution is generally 0.01 to 20% by weight, preferably 0.02 to 10% by weight, and the developed pattern film is preferably rinsed with water, an acidic aqueous solution or the like.
- the curing temperature is preferably 100 to 250 ° C, more preferably 120 to 200 ° C, and 130 to 130 to 180 ° C. is more preferable.
- the cured film formed by curing the photosensitive resin composition is suitably used as a surface protective material (salter resist film) for a printed wiring board.
- the printed wiring board may be a flexible printed wiring board provided with metal wiring on a flexible film such as a polyimide film.
- the cured film formed by applying the photosensitive resin composition prepared by mixing the agent A and the agent B of the above kit onto the substrate by printing or the like and curing the coating film has microhole defects. It is less and tends to have excellent insulation properties, and is suitable as a solder resist film provided on the metal wiring of a printed wiring board.
- the estimation factors are agglomerates in the photosensitive resin composition, and since the agglomerates block light during exposure, the deep part of the coating film is not cured but melts during development to form hole defects. Can be considered.
- Another factor is the tackiness of the coating film. When the tack-free property of the coating film is low, foreign matter (for example, suspended matter in the atmosphere) tends to adhere to the surface of the coating film, which may cause hole defects due to poor exposure, similar to the above-mentioned agglomerates.
- the third presumed factor is the rheology of the photosensitive resin composition during printing.
- the photosensitive resin composition has a high viscosity or thixotropy, it is applied to the stepped portion between the substrate and the wiring or between the wirings during printing. It is considered that a portion where the film is not formed (uncoated portion) is formed, and this portion becomes a hole defect.
- the kit and the photosensitive resin composition As described above, there is a tendency to ensure the dispersibility of solid components in the kit and the photosensitive resin composition, suppress the generation of aggregates, and appropriately control the rheology. Further, the tack-free property tends to be good because the amount of the matting agent is adjusted and the dispersibility thereof is good. Therefore, it is considered that a cured film having few microhole defects can be obtained by using the kit of the present embodiment.
- a1 Solution of carboxy group-containing acrylic polymer obtained in Synthesis Example 1: 10.2 g a2: Solution of the compound having a carboxy group and acryloyl group obtained in Synthesis Example 2: 33.5 g, and a 65% solution of acid-modified bisphenol type epoxy acrylate (Nippon Kayaku "KAYARAD ZAR-2000", weight average molecular weight 13,000, acid value 98 mgKOH / g): 18.8 g c: aliphatic urethane methacrylate (“GENOMER 4297” manufactured by Rahn, weight average molecular weight 400 to 600): 7.0 parts by weight a3: Synthetic amorphous silica particles (“Gasil HP-230” manufactured by PQ Corporation), average particle diameter 3.
- particulate phosphorus flame retardant aluminum diethylphosphinate, Clariant “Exolit OP-935”, average particle size 2.5 ⁇ m, phosphorus content 23%): 22.0 g
- Defoamer Butadiene defoamer (Kyoeisha Chemical Co., Ltd. "Floren AC-2000"): 5.1 g
- Solvent Ethylene diglycol acetate: 9.4 g
- the following dispersant was added to the above solution A (120 g in total) and stirred for 10 minutes to prepare a solution containing the dispersant.
- the viscosity of the obtained solution at a temperature of 25 ° C. was measured with a B-type viscometer (“HB DV-IPlime” manufactured by Eiko Seiki Co., Ltd., rotor No. 7) at rotation speeds of 2 rpm, 10 rpm and 20 rpm.
- HB DV-IPlime manufactured by Eiko Seiki Co., Ltd., rotor No. 7
- the ratio of the viscosity at the rotation speed of 20 rpm and the viscosity at the rotation speed of 2 rpm was calculated. Table 1 shows the types and amounts of dispersants and the viscosity measurement results.
- Dispersant Dispersant 1: Big Chemie “DISPERBYK-2013” (solvent-free type, acid value 8 mgKOH / g, amine value 18 mgKOH / g)
- Dispersant 2 “TERPLUS MD1000” manufactured by Otsuka Chemical Co., Ltd. (solid content concentration 40%, acid value 81 mgKOH / g)
- Dispersant 3 "TERPLUS D1200” manufactured by Otsuka Chemical Co., Ltd. (solid content concentration 55%, amine value 107 mgKOH / g)
- Dispersant 4 “TERPLUS D1410” manufactured by Otsuka Chemical Co., Ltd.
- Dispersant 5 (solid content concentration 56%, amine value 83 mgKOH / g)
- Dispersant 5 "TERPLUS D1480" manufactured by Otsuka Chemical Co., Ltd. (solid content concentration 48%, amine value 45 mgKOH / g)
- Dispersants 1 to 4 were added to this dispersion (120 g in total) in the same manner as in the above example, and the viscosity of the obtained solution (colorant dispersion) was measured. Viscosity measurement is performed by rotor No. It was carried out under the same conditions as in the above example except that 5. Table 2 shows the types and amounts of dispersants and the viscosity measurement results.
- dispersant 1 which is an amphoteric dispersant
- amine-valent dispersant 3 TERPLUS D1200
- dispersant 4 TERPLUS D1410
- dispersant 5 TERPLUS D1480
- Dispersant 1 (manufactured by BIC Chemie) so that the amount of the dispersant in the solution B is 0.6 parts by weight based on 100 parts by weight of the total solid content of the components (b1), (b2) and (b3).
- DISPERBYK-2013 was added to prepare Agent B.
- Agent A and Agent B are the same as in Example 1 except that the dispersant of Agent B is changed to Dispersant 5: “DISPERBYK-2163” manufactured by Big Chemie (solid content concentration 45% by weight, amine value 10). Was prepared.
- Agents A and B were prepared in the same manner as in Example 1 except that the dispersant of Agent B was changed to Dispersant 3 (“TERPLUS D1200” manufactured by Otsuka Chemical Co., Ltd.).
- Agents A and B were prepared in the same manner as in Example 1 except that the dispersant of Agent A was changed to Dispersant 2 (“TERPLUS MD1000” manufactured by Otsuka Chemical Co., Ltd.).
- Agent A and Agent B were prepared in the same manner as in Example 1 except that the dispersant of Agent B was changed to Dispersant 2 (“TERPLUS MD1000” manufactured by Otsuka Chemical Co., Ltd.).
- Agents A and B were prepared in the same manner as in Example 1 except that the dispersant of Agent A was changed to Dispersant 5 (“TERPLUS D1480” manufactured by Otsuka Chemical Co., Ltd.).
- Solution A and solution B were used as agents A and B without adding a dispersant.
- Agents A and B were prepared in the same manner as in Example 1 except that the blending amount of the component (c) in the agent A was changed (increased) as shown in Table 3.
- Agents A and B were prepared in the same manner as in Example 1 except that the blending amount of the silica particles of the component (a3) in the agent A was changed (reduced) as shown in Table 3.
- Agents A and B were prepared in the same manner as in Example 1 except that the component (a3) was not added to the agent A to make the agent A.
- Agents A and B prepared in each Example and Comparative Example were mixed to prepare a photosensitive resin composition having the composition shown in Table 3.
- the numerical value of the blending amount in Table 3 is a part by weight, and the number in parentheses indicates the solid content amount of each component.
- the viscosity of the photosensitive resin composition at a temperature of 25 ° C. was measured under the same conditions as in Experimental Example 2 described above.
- a 0.3 mm ⁇ zirconia bead was spread on a petri dish, a laminate was placed on the petri dish so that the coating film was in contact with the zirconia bead, and a 100 g weight was placed on the laminate and allowed to stand for 1 minute. The weight of the sample with the zirconia beads attached to the surface of the coating film was measured, and the weight of the zirconia beads attached was calculated.
- ⁇ Preparation and evaluation of cured film> In the same manner as described above, after printing and drying the photosensitive resin composition on the PET film, the entire surface of the coating film was exposed to ultraviolet rays having an integrated light intensity of 100 mJ / cm 2 . Then, 1.0 wt% sodium carbonate aqueous solution (30 ° C.) was sprayed for 60 seconds for development. The developed sample was immersed in pure water to be thoroughly washed, and then heat-cured in an oven at 160 ° C. for 90 minutes to prepare a cured film.
- the obtained cured film was placed on a light table, and the number of defects (microhole defects) in which light leakage was visually recognized as white spots was counted.
- Table 3 shows the compositions of the kits and photosensitive resin compositions of Examples and Comparative Examples, and the evaluation results.
- the viscosity in Table 3 is a measured value at a rotation speed of 10 rpm, and the chixo value is a ratio (2 rpm / 20 rpm) of the viscosity at a rotation speed of 20 rpm and the viscosity at a rotation speed of 2 rpm.
- Example 1 using the amphoteric dispersant 1 (DISPERBYK-2013), which was shown to have good dispersibility in Experimental Examples 1 and 2 above, as the dispersant for Agents A and B, beads adhered. It can be seen that the amount is small and the tack-free property is good. Further, in Example 1, it can be seen that a good cured film with few microhole defects is formed.
- DISPERBYK-2013 amphoteric dispersant 1
- the photosensitive resin composition had good tack-free property and had microhole defects. A small amount of cured film was formed.
- Comparative Example 1 in which the dispersant 2 having a large acid value was used as the dispersant of the agent A, the tack-free property was good, but the number of microhole defects in the cured film was increased.
- Comparative Example 2 in which the dispersant 2 was used as the dispersant for the agent B and Comparative Example 3 in which the amine-valent dispersant 5 was used as the dispersant for the agent A also had the same number of microhole defects as in Comparative Example 1. It was increasing.
- Comparative Examples 1 to 3 the viscosity and the thixo value of the photosensitive resin composition were higher than those in Examples 1 to 3, and the fact that these solution characteristics affected the printability was the cause of the microhole defects. It is presumed to be one of the causes of the increase. From these results, as shown in Examples 1 to 3, Agent A and Agent B were used by using appropriate dispersants for each of Agent A and Agent B, and by controlling the characteristics (rheology) of each solution. It is considered that the solution characteristics in the composition after mixing with the agent are also appropriately controlled, and micropore defects can be reduced.
- Comparative Example 4 in which the dispersant was not used in either Agent A or Agent B, the viscosity and the thixo value of the photosensitive resin composition were the same as those in Examples 1 to 3, but the amount of beads attached was large. , The tack-free property was lowered, and the number of microhole defects was increased. Even in Comparative Examples 5 to 7 in which the amount of the component (a3) (particularly the amount of silica particles) relative to the resin component of the agent A is relatively small, beads adhered as compared with Examples 1 to 3 as in Comparative Example 4. The amount increased and the number of microhole defects increased.
- Agent A main agent
- Agent B curing agent
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Abstract
Description
以下、感光性樹脂組成物を構成する各成分の好ましい形態について、順に説明する。なお、特に断りがない限り、以下の各成分は、それぞれ、単独で使用してもよく、2種以上を組み合わせて使用してもよい。本明細書において、「(メタ)アクリル」は、アクリルまたはメタクリルを意味し、「(メタ)アクリロイル」は、アクリロイルまたはメタクリロイルを意味する。
キットのA剤に含まれる(a1)成分および(a2)成分は、分子内に少なくとも1つのカルボキシ基を有する化合物であり、樹脂組成物による塗膜を形成するための主成分である。(a1)成分および(a2)成分は、カルボキシ基が後述の(b1)成分と反応することにより、硬化膜において架橋構造を形成する。
キットのB剤に含まれる(b1)成分は、カルボキシ基と反応可能な反応性基を有する化合物であり、モノマー、オリゴマー、ポリマーのいずれでもよい。カルボキシ基と反応可能な反応性基としては、エポキシ基、オキセタニル基、イソシアネート基、アミノ基、水酸基等が挙げられる。中でも、室温ではカルボキシ基との反応性が低く、加熱によりカルボキシ基との反応性を示すことから、反応性基はエポキシ基が好ましい。また、硬化膜の耐熱性および電気絶縁信頼性が優れることからも、(b1)成分は、分子内に少なくとも1つのエポキシ基を有するエポキシ樹脂が好ましく、中でも、分子内に2以上のエポキシ基を有する多官能エポキシ樹脂が好ましい。
感光性樹脂組成物は、(c)成分として、カルボキシ基を有さず、少なくとも1つのエチレン性不飽和基を有する化合物を含んでいてもよい。(c)成分は、前述の(a1)成分とともに、光ラジカル反応に関与する。そのため、(c)成分を含めることにより、感光性樹脂組成物の感光性が向上する傾向がある。
上記の通り、感光性樹脂組成物は、樹脂分として、(a1)カルボキシ基を有しエチレン性不飽和基を有さない化合物、(a2)カルボキシ基およびエチレン性不飽和基を有する化合物、および(b1)カルボキシ基と反応可能な反応性基を有する化合物を含み、さらに必要に応じて(c)カルボキシ基を有さずエチレン性不飽和基を有する化合物を含む。
(b2)成分としての光ラジカル重合開始剤は、UV(紫外光)等の光エネルギーを吸収して活性化し、上記(a1)成分および(c)成分のエチレン性不飽和基の光ラジカル重合反応を、開始・促進させる化合物である。
A剤に含まれるマット剤は、A剤において固体で存在し、かつA剤とB剤とを混合後の感光性樹脂組成物およびその硬化膜においても固体として上記の樹脂成分と明確に分離した相として存在する成分である。
着色剤は、硬化膜を所望の色とするために添加される。着色剤は、染料または顔料のいずれかであり、フタロシアニン系化合物、アゾ系化合物、カーボンブラック、酸化チタン等が用いられる。複数の着色剤を組み合わせてもよい。
キットのA剤およびB剤のそれぞれは、分散剤を含む。A剤が(a4)成分として第一分散剤を含むことにより、フィラーの分散性が向上し、A剤の粘度およびチクソトロピーを適切な範囲に調整できる。B剤が(b4)成分として第二分散剤を含むことにより、着色剤の分散性が向上し、B剤の粘度およびチクソトロピーを適切な範囲に調整できる。
上記のように、感光性樹脂組成物作製キットはA剤とB剤とを個別に含み、A剤とB剤とを混合することにより、感光性樹脂組成物を調製できる。なお、感光性樹脂組成物作製キットは、A剤とB剤からなる2液型に限定されず、3液以上を混合するタイプのものでもよい。
上記のA剤とB剤とを混合することにより、感光性樹脂組成物が得られる。A剤とB剤の混合比は特に限定されず、混合後の組成が目的とする感光性樹脂組成物の組成となるように設定すればよい。A剤が主剤である構成においては、A剤に含まれる全固形分100重量部に対するB剤の全固形分量が、5~60重量部程度であり、10~50重量部または15~40重量部であってもよい。
感光性樹脂組成物を基板に塗布し、必要に応じて加熱により溶媒を除去した後、光硬化および熱硬化を行うことにより、硬化膜が形成される。感光性樹脂組成物は着色剤を有しているため、黒色等に着色した着色硬化膜が得られる。上記の感光性組成物を用いることにより、プリント配線板の金属配線上にも、微小穴欠陥が少なく絶縁性に優れる硬化膜を形成できる。
<合成例1:(a1)成分の調製>
攪拌機、温度計、滴下漏斗、および窒素導入管を備えた反応容器に、重合用溶媒としてメチルトリグライム(1,2-ビス(2-メトキシエトキシ)エタン)100.0gを仕込み、窒素気流下で攪拌しながら80℃に昇温した。これに、室温で予め混合しておいた、メタクリル酸14.0g、アクリル酸エチル38.0g、メタクリル酸メチル38.0g、スチレン10.0gおよびラジカル重合開始剤としてアゾビスイソブチロニトリル0.4gを、80℃に保温した状態で3時間かけて滴下漏斗から滴下した。滴下終了後、反応溶液を攪拌しながら90℃に昇温し、反応溶液の温度を90℃に保ちながらさらに2時間攪拌を行い、分子内にカルボキシ基を含有するアクリル系ポリマーの溶液を得た。溶液の固形分濃度は50%、ポリマーの重量平均分子量は71,000、酸価は90mgKOH/gであった。
攪拌機、温度計、滴下漏斗、および空気導入管を備えた反応容器に、重合用溶媒としてカルビトールアセテート204.8g、エポキシ当量217のクレゾールノボラック型エポキシ樹脂217.0g、重合禁止剤としてハイドロキノン0.2g、および触媒としてトリフェニルホスフィン1.0gを仕込み、空気気流下で攪拌しながら80℃に昇温した。次いで、85~105℃に保温した状態で、攪拌しながら、アクリル酸72.0gを徐々に加え、16時間反応させた。さらに、テトラヒドロフタル酸無水物91.2gを加えて付加反応を行い、分子内にカルボキシ基およびアクリロイル基を有する化合物の溶液を得た。溶液の固形分濃度は65%、化合物の酸価は65mgKOH/gであった。
JIS K 5601-1-2に従って測定を行った。乾燥条件は170℃×1時間とした。
ゲルパーミエーションクロマトグラフィー(GPC)により、下記条件で測定を行った。
使用装置:東ソー HLC-8220GPC相当品
カラム:東ソー TSK gel Super AWM-H(6.0mm I.D.×15cm)×2本
ガードカラム:東ソー TSK guard column Super AW-H
溶離液:30mM LiBr + 20mM H3PO4 in DMF
流速:0.6mL/min
カラム温度:40℃
検出条件:RI:ポラリティ(+)、レスポンス(0.5sec)
試料濃度:約5mg/mL
分子量標準品:PEG(ポリエチレングリコール)
JIS K 5601-2-1に従って測定を行った。
<実験例1:A剤への分散剤の添加>
下記の(a1)~(a3)成分、(c)成分、消泡剤および溶媒を混合して、分散剤を含まない溶液Aを調製した。
a1:合成例1で得られたカルボキシ基含有アクリル系ポリマーの溶液:10.2g
a2:合成例2で得られたカルボキシ基およびアクリロイル基を有する化合物の溶液:33.5g、および
酸変性ビスフェノール型エポキシアクリレートの65%溶液(日本化薬製「KAYARAD ZAR-2000」、重量平均分子量13,000、酸価98mgKOH/g):18.8g
c:脂肪族ウレタンメタクリレート(Rahn製「GENOMER 4297」、重量平均分子量400~600):7.0重量部
a3:合成アモルファスシリカ粒子(PQ Corporation製「Gasil HP-230」)、平均粒子径3.5μm):13.9g、および
粒子状のリン系難燃剤(ジエチルホスフィン酸アルミニウム、クラリアント製「Exolit OP-935」、平均粒子径2.5μm、リン含有量23%):22.0g
消泡剤:ブタジエン系消泡剤(共栄社化学製「フローレン AC-2000」):5.1g
溶媒:エチレンジグリコールアセテート:9.4g
分散剤1:ビックケミー製「DISPERBYK-2013」(無溶剤型、酸価8mgKOH/g、アミン価18mgKOH/g)
分散剤2:大塚化学製「TERPLUS MD1000」(固形分濃度40%、酸価81mgKOH/g)
分散剤3:大塚化学製「TERPLUS D1200」(固形分濃度55%、アミン価107mgKOH/g)
分散剤4:大塚化学製「TERPLUS D1410」(固形分濃度56%、アミン価83mgKOH/g)
分散剤5:大塚化学製「TERPLUS D1480」(固形分濃度48%、アミン価45mgKOH/g)
下記の着色剤を重量比1:1:1で混合した黒色着色剤13.8gを、106.2gのエチレンジグリコールアセテートに添加して撹拌し、着色剤濃度が11.5重量%の分散液を調製した。
(着色剤)
BASF製「GLVO」;Pigment Blue 15:3
クラリアント製「GRL」;Pigment Orange 43
クラリアント製「ER-02」;Pigment Violet 19
<実施例1>
(A剤の調製)
上記の溶液Aと同一組成の溶液を調製し、(a1)(a2)(a3)および(c)成分の固形分の合計100重量部に対する分散剤の量(固形分)が4重量部となるように、上記の分散剤1(ビックケミー製「DISPERBYK-2013」)を添加して、A剤を調製した。
下記の(b1)~(b3)成分、エポキシ樹脂硬化剤および溶媒を混合して、分散剤を含まない溶液Bを調製した。
b1:液状ビスフェノールA型エポキシ樹脂(三菱ケミカル製「jER 828US」、エポキシ当量187):7.8重量部、および
固形状ビフェニル型エポキシ樹脂(三菱ケミカル製「jER YX4000K」、エポキシ当量185、融点107℃):5.1重量部
b2:下記の光ラジカル重合開始剤:合計1.8重量部
2,4-ジエチルチオキサントン(日本化薬製「KAYACURE DETX-S」):0.4重量部、
エタノン,1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]-,1-(o-アセチルオキシム)(BASF製「Irgacure OXE02」):1.2重量部、および
ニトロ基置換カルバゾール型オキシムエステル光ラジカル重合開始剤(ADEKA製「アデカアークルズ NCI-831」):0.2重量部
b3:上記の黒色着色剤:1.5重量部
エポキシ樹脂硬化剤:ジシアンジアミド粉砕品(三菱ケミカル製「jER Cure DICY-7」、平均粒子径3μm):0.1重量部
溶媒:エチレンジグリコールアセテート:5.0重量部
B剤の分散剤を、分散剤5:ビックケミー製「DISPERBYK-2163」(固形分濃度45重量%、アミン価10)に変更したこと以外は、実施例1と同様にして、A剤およびB剤を調製した。
B剤の分散剤を、上記の分散剤3(大塚化学製「TERPLUS D1200」)に変更したこと以外は、実施例1と同様にして、A剤およびB剤を調製した。
A剤の分散剤を、上記の分散剤2(大塚化学製「TERPLUS MD1000」)に変更したこと以外は、実施例1と同様にして、A剤およびB剤を調製した。
B剤の分散剤を、上記の分散剤2(大塚化学製「TERPLUS MD1000」)に変更したこと以外は、実施例1と同様にして、A剤およびB剤を調製した。
A剤の分散剤を、上記の分散剤5(大塚化学製「TERPLUS D1480」)に変更したこと以外は、実施例1と同様にして、A剤およびB剤を調製した。
分散剤を添加せず、溶液Aおよび溶液BをそのままA剤およびB剤とした。
A剤における(c)成分の配合量を表3に示すように変更(増量)したこと以外は、実施例1と同様にして、A剤およびB剤を調製した。
A剤における(a3)成分のシリカ粒子の配合量を表3に示すように変更(減量)したこと以外は、実施例1と同様にして、A剤およびB剤を調製した。
A剤に(a3)成分を添加せずA剤としたこと以外は、実施例1と同様にして、A剤およびB剤を調製した。
各実施例および比較例で調製したA剤とB剤を混合し、表3に示す組成の感光性樹脂組成物を調製した。表3における配合量の数値は重量部であり、括弧内の数字は各成分の固形分量を示している。感光性樹脂組成物の温度25℃における粘度を、前述の実験例2と同様の条件で測定した。
<タック性評価>
スクリーン印刷機(ミノグループ製「ミノマットSR5575」)を用いて、厚み22μmのPETフィルム上に、最終乾燥厚みが20μmとなるように感光性樹脂組成物を180mm×270mmの面積に印刷し、80℃で20分乾燥した。PETフィルム上に塗膜が形成された積層体を30mm角に切り出し、重量を測定した。シャーレに0.3mmφのジルコニアビーズを敷き詰め、その上に、塗膜がジルコニアビーズに接するように積層体を載置し、その上に100gの錘を載せて1分間静置した。塗膜表面にジルコニアビーズが付着した試料の重量を測定し、ジルコニアビーズの付着重量を算出した。
上記と同様に、PETフィルム上への感光性樹脂組成物の印刷および乾燥を実施した後、塗膜全面に積算光量100mJ/cm2の紫外線を照射して露光を実施した。次いで1.0重量%の炭酸ナトリウム水溶液(30℃)を60秒間スプレーして現像を行った。現像後の試料を純水に浸漬して十分洗浄した後、160℃のオーブンで90分加熱硬化させて硬化膜を作製した。
Claims (16)
- A剤およびB剤を含む感光性樹脂組成物作製キットであって、
A剤が、
(a1)カルボキシ基を有しエチレン性不飽和基を有さない化合物、
(a2)カルボキシ基およびエチレン性不飽和基を有する化合物
(a3)マット剤、および
(a4)第一分散剤
を含有し、
B剤が、
(b1)カルボキシ基と反応可能な反応性基を有する化合物、
(b2)光ラジカル重合開始剤、
(b3)着色剤、および
(b4)第二分散剤
を含有し、
前記第一分散剤の酸価が1~60mgKOH/gであり、
前記第二分散剤のアミン価が1mgKOH/g以上であり、
前記A剤において、樹脂分100重量部に対する前記マット剤の含有量が、60重量部以上である、
感光性樹脂組成物作製キット。 - 前記A剤は、前記マット剤として金属酸化物粒子を含む、請求項1に記載の感光性樹脂組成物作製キット。
- 前記A剤において、樹脂分100重量部に対する前記金属酸化物粒子の含有量が、20重量部以上である、請求項2に記載の感光性樹脂組成物作製キット。
- A剤およびB剤を含む感光性樹脂組成物作製キットであって、
A剤が、
(a1)カルボキシ基を有しエチレン性不飽和基を有さない化合物、
(a2)カルボキシ基およびエチレン性不飽和基を有する化合物
(a3)マット剤、および
(a4)第一分散剤
を含有し、
B剤が、
(b1)カルボキシ基と反応可能な反応性基を有する化合物、
(b2)光ラジカル重合開始剤、
(b3)着色剤、および
(b4)第二分散剤
を含有し、
前記(a4)第一分散剤の酸価が1~60mgKOH/gであり、
前記(b4)第二分散剤のアミン価が1mgKOH/g以上であり、
前記A剤は、前記マット剤として金属酸化物粒子を含み、
前記A剤において、樹脂分100重量部に対する前記金属酸化物粒子の含有量が、20重量部以上である、
感光性樹脂組成物作製キット。 - 前記A剤および前記B剤の少なくとも一方が、(c)カルボキシ基を有さずエチレン性不飽和基を有する化合物を含む、請求項1~4のいずれか1項に記載の感光性樹脂組成物作製キット。
- 前記A剤において、前記第一分散剤を除く全固形分100重量部に対する前記第一分散剤の固形分の量が、0.01~15重量部である、請求項1~5のいずれか1項に記載の感光性樹脂組成物作製キット。
- 前記B剤において、前記第二分散剤を除く全固形分100重量部に対する前記第二分散剤の固形分の量が、0.01~15重量部である、請求項1~6のいずれか1項に記載の感光性樹脂組成物作製キット。
- 前記B剤の全固形分100重量部に対する前記着色剤の量が、0.5~50重量部である、請求項1~7のいずれか1項に記載の感光性樹脂組成物作製キット。
- 前記マット剤として、固形状の難燃剤を含む、請求項1~8のいずれか1項に記載の感光性樹脂組成物作製キット。
- 前記光ラジカル重合開始剤が、波長405nmに吸収帯を有する、請求項1~9のいずれか1項に記載の感光性樹脂組成物作製キット。
- 請求項1~10のいずれか1項に記載の感光性樹脂組成物作製キットの前記A剤と前記B剤との混合物である、感光性樹脂組成物。
- 80℃で20分乾燥させた、30mm角、20μm厚みの塗膜に、直径0.3mmのジルコニアビーズを付着させた際に、ジルコニアビーズの付着重量が0.7g以下である、請求項11に記載の感光性樹脂組成物。
- 請求項11または12に記載の感光性樹脂組成物の硬化物からなる硬化膜。
- プリント配線板の金属配線上に接して、請求項13に記載の硬化膜を備える硬化膜付き基板。
- 請求項1~10のいずれか1項に記載の感光性樹脂組成物作製キットの前記A剤と前記B剤とを混合して感光性樹脂組成物を調製し、
前記感光性樹脂組成物を基板上に塗布して塗膜を形成し、
前記塗膜の露光および現像を行う、硬化膜付き基板の製造方法。 - 前記基板がプリント配線板であり、
プリント配線板の金属配線上に、前記感光性樹脂組成物を塗布して前記塗膜を形成する、請求項15に記載の硬化膜付き基板の製造方法。
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012147745A1 (ja) * | 2011-04-25 | 2012-11-01 | 株式会社カネカ | 新規な感光性樹脂組成物及びその利用 |
JP2012255112A (ja) * | 2011-06-09 | 2012-12-27 | Fujifilm Corp | 組成物、感光性フイルム、感光性積層体、永久パターン形成方法およびプリント基板 |
JP2013029780A (ja) * | 2011-07-29 | 2013-02-07 | Fujifilm Corp | 感光性樹脂組成物 |
JP2013109164A (ja) * | 2011-11-21 | 2013-06-06 | Kaneka Corp | 新規な感光性樹脂組成物作製キット及びその利用 |
WO2016027798A1 (ja) * | 2014-08-20 | 2016-02-25 | 東レ株式会社 | 感光性着色組成物、それを用いた固体撮像素子の製造方法、および固体撮像素子 |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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JP2012255112A (ja) * | 2011-06-09 | 2012-12-27 | Fujifilm Corp | 組成物、感光性フイルム、感光性積層体、永久パターン形成方法およびプリント基板 |
JP2013029780A (ja) * | 2011-07-29 | 2013-02-07 | Fujifilm Corp | 感光性樹脂組成物 |
JP2013109164A (ja) * | 2011-11-21 | 2013-06-06 | Kaneka Corp | 新規な感光性樹脂組成物作製キット及びその利用 |
WO2016027798A1 (ja) * | 2014-08-20 | 2016-02-25 | 東レ株式会社 | 感光性着色組成物、それを用いた固体撮像素子の製造方法、および固体撮像素子 |
Cited By (4)
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JPWO2021039787A1 (ja) * | 2019-08-26 | 2021-03-04 | ||
JP7083467B2 (ja) | 2019-08-26 | 2022-06-13 | 国立大学法人富山大学 | 微粒子吸着防止ポリマー |
JP7219378B1 (ja) | 2021-12-09 | 2023-02-08 | 東洋インキScホールディングス株式会社 | 感光性着色組成物、光学フィルタ、画像表示装置、及び固体撮像素子 |
JP2023085600A (ja) * | 2021-12-09 | 2023-06-21 | 東洋インキScホールディングス株式会社 | 感光性着色組成物、光学フィルタ、画像表示装置、及び固体撮像素子 |
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