WO2020162396A1 - マスクアダプタ、マスクアダプタ取付工具、露光装置、およびデバイス製造方法 - Google Patents

マスクアダプタ、マスクアダプタ取付工具、露光装置、およびデバイス製造方法 Download PDF

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Publication number
WO2020162396A1
WO2020162396A1 PCT/JP2020/003936 JP2020003936W WO2020162396A1 WO 2020162396 A1 WO2020162396 A1 WO 2020162396A1 JP 2020003936 W JP2020003936 W JP 2020003936W WO 2020162396 A1 WO2020162396 A1 WO 2020162396A1
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WO
WIPO (PCT)
Prior art keywords
mask
adapter
detected
attached
mask adapter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2020/003936
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
弘樹 小宮山
澄夫 八田
智和 長野
瀬名 寺西
博圭 浅海
高橋　大輔
智之 大川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to KR1020217023186A priority Critical patent/KR20210122240A/ko
Priority to CN202080010606.7A priority patent/CN113330370B/zh
Priority to CN202410317332.6A priority patent/CN118068658A/zh
Priority to JP2020571184A priority patent/JP7517155B2/ja
Publication of WO2020162396A1 publication Critical patent/WO2020162396A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/17—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] specially adapted for supporting large square shaped substrates

Definitions

  • the present invention relates to a mask adapter, a mask adapter mounting tool, an exposure apparatus, and a device manufacturing method.
  • the present application claims priority based on Japanese Patent Application No. 2019-020167 filed on February 6, 2019, and the content thereof is incorporated herein.
  • Patent Document 1 describes a mask holding member attached to an exposure mask used in an exposure apparatus.
  • a mask holding member attached When using an exposure mask with such a mask holding member attached, it has been a problem to improve the exposure accuracy of the exposure apparatus.
  • One aspect of the mask adapter of the present invention is a mask adapter which is used in an exposure apparatus that illuminates a mask supported by a stage and exposes a pattern formed on the mask onto a substrate, and is attached to the mask.
  • a main body having a supporting portion that supports the mask outside the area where the pattern is formed, and a supported portion that is supported by the stage; and a detection portion of the exposure apparatus that is on the main body portion.
  • a first detected part that can be detected by the first detected part, the first detected part including information about the mask adapter.
  • the information about the mask adapter may include control information for controlling the movement of the stage that supports the mask adapter to which the mask is attached during the exposure.
  • the information regarding the mask adapter may include the rigidity of the mask adapter.
  • the first detected portion may be a bar code.
  • One aspect of the mask adapter of the present invention is a mask adapter which is used in an exposure apparatus that illuminates a mask supported by a stage and exposes a pattern formed on the mask onto a substrate, and is attached to the mask.
  • a main body having a mounting portion mounted outside the area where the pattern is formed in the mask, and a supported portion supported by the stage;
  • a second detected part that can be detected by a unit, and the second detected part includes information about the mask attached to the mask adapter.
  • a second detected section that can be detected by the detection section of the exposure apparatus is provided, and the second detected section may include information about the mask attached to the mask adapter. Good.
  • the first detected part and the second detected part may be arranged adjacent to each other.
  • the information regarding the mask includes at least one of the flatness of the mask, the type of the pattern formed on the mask, the dimensional error of the mask, the weight error of the mask, and the drawing error of the pattern formed on the mask. It may be configured to include.
  • It may be configured to include a display unit that displays the second detected unit in a changeable manner.
  • the display unit may be configured to display information about the mask included in the mask.
  • the second detected part may be an electronic barcode.
  • the display unit may be configured to display information about the mask of the different mask when another mask different from the mask is attached to the mask adapter.
  • One aspect of the mask adapter of the present invention is a mask adapter which is used in an exposure apparatus that illuminates a mask supported by a stage and exposes a pattern formed on the mask onto a substrate, and is attached to the mask.
  • a body portion having a mounting portion mounted outside the pattern-formed region of the mask, and a supported portion supported by the stage; the mask adapter to which the mask is mounted; and the mask.
  • a first sensor for the exposure apparatus to recognize that the mask adapter to which the mask is attached is transferred to the stage by a transfer device that can transfer different masks. And a recognized part.
  • the exposure apparatus uses a first sensor. It may be configured to further include a first recognized portion for recognizing using.
  • the first recognized portion includes a reflecting portion that is provided on the main body portion and reflects the light emitted from the first sensor, and the reflecting portion reflects the light emitted from the first sensor by the first portion. It may be configured to reflect in a direction different from the direction in which one sensor is located.
  • the first recognized part may have a first passing part through which the light emitted from the first sensor passes.
  • the first recognized part may be configured to be detected by the first sensor provided in the transport device of the exposure apparatus.
  • One aspect of the mask adapter of the present invention is a mask adapter which is used in an exposure apparatus that illuminates a mask supported by a stage and exposes a pattern formed on the mask onto a substrate, and is attached to the mask.
  • a body portion having a mounting portion mounted outside the pattern-formed region of the mask, and a supported portion supported by the stage; the mask adapter to which the mask is mounted; and the mask.
  • a second recognition target part for allowing the exposure apparatus to recognize that the mask adapter is supported by the second sensor on the stage capable of supporting different masks.
  • the second recognized part may be configured to have a second passing part through which the light emitted from the second sensor passes.
  • the second passage portion may be a through hole provided in the main body portion.
  • the second recognized portion may be detected by the second sensor provided on the stage.
  • the main body portion may have a frame-like shape surrounding the periphery of the mask.
  • One aspect of the exposure apparatus of the present invention is an illumination optical system for illuminating the mask attached to the mask adapter, and projection optics for projecting the pattern of the mask illuminated by the illumination optical system onto the substrate. And a system.
  • One aspect of the device manufacturing method of the present invention includes exposing the substrate with the above-described exposure apparatus, and developing the exposed substrate.
  • One aspect of the device manufacturing method of the present invention exposes the substrate by illuminating the mask attached to the mask adapter and projecting an image of the illuminated pattern of the mask onto the substrate. And developing the exposed substrate.
  • One aspect of the mask adapter installation tool of the present invention is to install the mask on the mask adapter.
  • a mask adapter attachment tool of the present invention is a mask adapter attachment tool for attaching the mask to a mask adapter used in an exposure apparatus for exposing a pattern formed on a mask onto a substrate. And a writing unit that causes a display unit provided on the mask adapter to display a second detected unit including information about the mask attached to the mask adapter.
  • a second detection unit that detects a third detection unit that is provided on the mask and that includes information about the mask; and the writing unit is based on information detected by the second detection unit from the third detection unit. Then, the second detection target portion may be displayed on the display unit.
  • the display of the display unit may be erased when it is detected that there is a break.
  • the configuration may include a second detection unit that is provided on the mask and that detects a third detection unit that includes information about the mask.
  • a mask adapter attaching tool of the present invention is a mask adapter attaching tool for attaching the mask to a mask adapter used in an exposure apparatus for exposing a pattern formed on a mask onto a substrate, the mask adapter attaching tool comprising: A second detection unit that detects a third detection target that includes information about the provided mask is provided.
  • the elevator may be configured to move the mask in a vertical direction with respect to the mask adapter, and the elevator may lower the mask located above the mask adapter and place the mask on the mask adapter.
  • the elevating device may have a configuration in which the mask is arranged on the mask adapter having a frame shape surrounding the periphery of the mask in a plan view.
  • One aspect of the exposure apparatus of the present invention is an illumination optical system that illuminates the mask attached to the mask adapter by the mask adapter attachment tool, and a pattern of the mask illuminated by the illumination optical system.
  • One aspect of the device manufacturing method of the present invention is to attach a mask to a mask adapter using the above-mentioned mask adapter attaching tool, illuminate the mask attached to the mask adapter, and illuminate the mask. Exposing the substrate by projecting an image of the pattern of the mask onto the substrate; and developing the exposed substrate.
  • FIG. 1 is a schematic configuration diagram showing an exposure apparatus of this embodiment.
  • FIG. 2 is a perspective view showing the mask case of this embodiment.
  • FIG. 3A is a plan view of a mask assembly in which the mask adapter according to the present embodiment is attached to a mask, as viewed from above.
  • FIG. 3B is a plan view of a mask, which is handled alone in the exposure apparatus of this embodiment, as viewed from above.
  • FIG. 4 is a perspective view showing a part of the mask adapter of this embodiment.
  • FIG. 5 is a plan view of a part of the mask adapter of the present embodiment viewed from above.
  • FIG. 6 is a perspective view showing the mask adapter installation tool of the present embodiment.
  • FIG. 1 is a schematic configuration diagram showing an exposure apparatus of this embodiment.
  • FIG. 2 is a perspective view showing the mask case of this embodiment.
  • FIG. 3A is a plan view of a mask assembly in which the mask adapter according to the present embodiment is attached to a mask, as
  • FIG. 7 is a plan view of the mask adapter installation tool of this embodiment as viewed from above.
  • FIG. 8 is a sectional view showing the mask adapter installation tool of the present embodiment, which is a sectional view taken along line VIII-VIII in FIG. 7.
  • FIG. 9 is a plan view showing a part of the procedure of exposing a substrate in an exposure apparatus using the mask to which the mask adapter of this embodiment is attached.
  • FIG. 10 is a plan view of the mask stage in which the mask assembly according to the present embodiment is arranged, as viewed from above.
  • FIG. 11 is a plan view of a part of the mask stage in which the mask assembly of the present embodiment is arranged, as viewed from above.
  • the Z-axis direction shown in each drawing is a vertical direction in which the positive side is the upper side and the negative side is the lower side.
  • the X axis direction and the Y axis direction are directions orthogonal to the vertical direction (Z axis direction), and are horizontal directions orthogonal to each other.
  • a direction parallel to the Z-axis direction is referred to as “up-and-down direction Z”
  • a direction parallel to the X-axis direction is referred to as “first direction X”
  • a direction parallel to the Y-axis direction is referred to as “second direction”.
  • Direction Y is a direction parallel to the Z-axis direction in each drawing.
  • the positive side (+X side) of the first direction X is referred to as “one side of the first direction X”, and the negative side ( ⁇ X side) is referred to as “the other side of the first direction X”.
  • the positive side (+Y side) of the second direction Y is referred to as “one side of the second direction Y”, and the negative side ( ⁇ Y side) is referred to as “the other side of the second direction Y”.
  • the first direction X and the second direction Y are horizontal directions with respect to the mask adapter and the mask.
  • the rotation (tilt) direction around the vertical direction Z (Z-axis direction) will be described as the ⁇ z direction.
  • FIG. 1 is a schematic configuration diagram showing an exposure apparatus EX of this embodiment.
  • the exposure apparatus EX is an apparatus that exposes the substrate P by projecting an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P.
  • the substrate P exposed by the exposure apparatus EX of the present embodiment is, for example, a flat panel display substrate.
  • the exposure apparatus EX includes an exposure unit EP, a mask library LB, transfer devices H1 and H2, a chamber CH, and a control device CONT.
  • the exposure part EP is a part for exposing the pattern of the mask M onto the substrate P.
  • the exposure unit EP includes a mask stage (stage) MST, a substrate stage PST, an illumination optical system IL, and a projection unit PL.
  • the exposure apparatus EX illuminates the mask M supported by the mask stage MST and exposes the pattern formed on the mask M on the substrate P.
  • the mask stage MST supports the mask M.
  • the substrate stage PST supports the substrate P.
  • the illumination optical system IL is configured similarly to the illumination optical system disclosed in, for example, US Pat. No. 5,729,331, and illuminates the mask M supported by the mask stage MST with the exposure light EL.
  • the exposure light EL for example, light including at least one wavelength of i-line (wavelength 365 nm), g-line (wavelength 436 nm), and h-line (wavelength 405 nm) is used.
  • the wavelength of the light source used in the illumination optical system IL and the exposure light EL emitted from the light source is not particularly limited, and examples thereof include ArF excimer laser light (wavelength 193 nm) and KrF excimer laser light (wavelength 248 nm). It may be ultraviolet light or vacuum ultraviolet light such as F 2 laser light (wavelength 157 nm).
  • the projection unit PL projects and exposes the image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P supported by the substrate stage PST.
  • the projection unit PL is a so-called multi-lens type projection optical system having the same configuration as the projection optical system disclosed in, for example, US Pat. No. 6,552,775, and for example, both sides that form an erect normal image. It has multiple telecentric projection optics.
  • the plurality of projection optical systems included in the projection unit PL have a correction mechanism capable of correcting the focus position, the shift amount, the non-linear correction amount, etc. in each projection optical system.
  • the configuration and method described in, for example, Japanese Patent Publication No. 4,211,272 and US Pat. No. 6,811,953 can be adopted.
  • the exposure unit EP has a drive unit that can move the mask stage MST in the first direction X and the second direction Y, and a substrate stage PST that can move the substrate stage PST in the first direction X and the second direction Y. And a drive device.
  • the mask library LB is a storage unit for storing the mask case C in which the mask M is stored.
  • the mask library LB includes a plurality of storage units LBa.
  • the plurality of accommodating portions LBa are arranged along the vertical direction Z.
  • a mask case C is housed in each housing portion LBa.
  • the masks M are individually housed one by one.
  • the mask case C in which the mask M is stored is transported to the exposure apparatus EX by the transport vehicle V and stored in each storage portion LBa of the mask library LB.
  • FIG. 2 is a perspective view showing the mask case C of this embodiment.
  • the mask case C includes a mask storage portion CA and a handle portion CB.
  • the mask storage portion CA includes a storage portion main body CA1 and a lid portion CA2.
  • the storage unit main body CA1 has a box shape that is open upward and is rectangular in a plan view.
  • the mask M is stored inside the storage unit main body CA1.
  • the mask case C may have the same configuration as the mask case disclosed in, for example, U.S. Patent Application Publication No. 2010/0220304, International Publication No. 2016/121635, and the like.
  • the lid CA2 is detachably attached to the storage unit main body CA1.
  • the lid portion CA2 closes the upper opening of the storage portion main body CA1 and seals the inside of the storage portion main body CA1.
  • a handle portion CB is provided on the outer edge portion of the lid portion CA2.
  • the handle portion CB is a portion used when opening and closing the lid portion CA2. For example, three handle parts CB are provided.
  • a first window portion CC1 and a second window portion CC2 are provided on the upper surface of the lid portion CA2.
  • the first window portion CC1 and the second window portion CC2 are transparent portions that allow the inside of the mask case C to be visually recognized when the lid portion CA2 is attached to the storage portion main body CA1.
  • the first window portion CC1 and the second window portion CC2 are formed of, for example, transparent resin or the like.
  • the first window CC1 is provided on the outer edge of the upper surface of the lid CA2. Through the first window portion CC1, the mask M housed in the mask case C or the detected portion provided in the mask adapter 10 described later can be read from the outside of the mask case C by the reader.
  • the reader is a bar code reader.
  • the second window CC2 is provided in the center of the upper surface of the lid CA2. For example, four second window portions CC2 are provided. By looking inside the mask case C through the second window portion CC2, it can be confirmed whether or not the mask M is stored in the mask case C.
  • the transfer device H1 is a device that transfers the mask case C.
  • the transfer device H1 includes a mask case transfer unit that can move the mask case C in the vertical direction Z and the second direction Y.
  • the transfer device H1 stores the mask case C on the transfer vehicle V in the storage section LBa of the mask library LB by the mask case transfer section. Further, the transfer device H1 transfers the mask M in the mask case C by raising the mask case C stored in the storage part LBa of the mask library LB to the uppermost part of the transfer device H1 with the lid CA2 removed. Hand over to device H2.
  • the transport device H2 is a device that transports the mask M in the mask case C moved to the uppermost part of the transport device H1 to the exposure unit EP.
  • the carrier device H2 includes a carrier guide H2a and a carrier H2b.
  • the carrier guide H2a extends in the first direction X.
  • the carrier H2b holds and holds the mask M from the upper side.
  • the carrier H2b moves in the first direction X along the carrier guide H2a and moves to the upper side of the mask stage MST.
  • the carrier H2b places the gripped mask M on the mask stage MST.
  • the chamber CH accommodates the exposure unit EP, the mask library LB, and the transfer devices H1 and H2 inside.
  • the inside of the chamber CH is set to a predetermined environment.
  • the control device CONT controls the overall operation of the exposure apparatus EX including the operations of the transport devices H1 and H2.
  • the controller CONT exposes (forms) the pattern on the mask M on the substrate P so that the mask stage MST.
  • the substrate stage PST are relatively moved in the first direction X with respect to the projection unit PL and the illumination optical system IL.
  • the controller CONT may sequentially expose a plurality of shot areas on the substrate P.
  • control device CONT causes the mask stage MST and the substrate stage PST to move in the second direction with respect to the projection unit PL and the illumination optical system IL. It may be moved relatively to Y.
  • FIG. 3A is a plan view of the mask assembly MA in which the mask adapter 10 of the present embodiment is attached to the mask M1 as viewed from above.
  • FIG. 3B is a plan view of the mask M2 that is handled alone in the exposure apparatus EX, as viewed from above.
  • FIG. 4 is a perspective view showing a part of the mask adapter 10 of this embodiment.
  • FIG. 5 is a plan view of a part of the mask adapter 10 of the present embodiment as viewed from above.
  • the mask M is a glass plate-shaped member on which a pattern is formed.
  • the mask M handled by the exposure apparatus EX of the present embodiment is a mask M1 treated in the state of the mask assembly MA to which the mask adapter 10 is attached as shown in FIG. 3A, and a mask treated alone as shown in FIG. 3B. And M2.
  • the mask M1 is housed in the mask case C in the state of the mask assembly MA to which the mask adapter 10 is attached, is transported by the transport device H2 in the state of the mask assembly MA, and is placed on the mask stage MST.
  • the mask M2 is housed in the mask case C by itself, is carried by the carrying device H2 by itself, and is placed on the mask stage MST.
  • the mask M1 is smaller than the mask M2 that is treated alone.
  • the dimensions of the mask M1 in the first direction X and the dimensions of the second direction Y are shorter than the dimensions of the mask M2 in the first direction X and the second direction Y.
  • the mask assembly MA in which the mask adapter 10 is attached to the mask M1 has the same size as the mask M2 that is handled alone. That is, the dimension of the mask assembly MA in the second direction Y is substantially equal to the dimension of the mask M2 in the second direction Y. That is, it can be said that the mask adapter 10 is a changing device that changes the size of the mask M1 in the second direction Y so as to be substantially equal to the size of the mask M2 in the second direction Y.
  • the dimension of the mask assembly MA in the first direction X is substantially equal to the dimension of the mask M2 in the first direction X. That is, it can be said that the mask adapter 10 is a changing device that changes the size of the mask M1 in the first direction X to be substantially equal to the size of the mask M2 in the first direction X.
  • the mask adapter 10 By attaching the mask adapter 10 to the mask M1 and making it the same size as the mask M2, the mask M1 smaller than the mask M2 can be used in the exposure apparatus EX in which the mask M2 is used alone.
  • the mask M1 includes a third detected portion MB at the center of the outer edge on one side (+Y side) of the second direction Y in the first direction X.
  • the third detected portion MB is a barcode.
  • the third detected portion MB is, for example, a sticker attached to the upper surface of the mask M1.
  • the third detected portion MB includes information regarding the mask M1.
  • the information about the mask M1 includes, for example, the flatness of the mask M1, the type of the pattern formed on the mask M1, the dimensional error of the mask M1, the weight error of the mask M1, the drawing error of the pattern formed on the mask M1, and the like. Even if the mask M1 is manufactured by the same manufacturing method, there are slight individual differences.
  • the information on the mask M1 included in the third detected portion MB has information on the individual difference of the mask M1.
  • the detected part includes information
  • the detected part can be detected by the detection part such as a reader to obtain the information.
  • the reader capable of reading the detected portion is not particularly limited, and may be a reader provided in the exposure apparatus EX, or a second detecting portion 26 provided in the mask adapter mounting tool 20 described later. It may be a different reader. As described above, the reader may be a bar code reader, or may be, for example, a camera (imaging device).
  • the mask M2 that is handled alone also includes a detected portion M2a that includes information regarding the mask M2.
  • the detected portion M2a provided on the mask M2 is provided on a portion of the outer edge of the mask M2 on one side (+Y side) in the second direction Y, which is closer to one side (+X side) in the first direction X. ..
  • the detected portion M2a provided on the mask M2 is, for example, a barcode and is a sticker attached to the mask M2.
  • the information on the mask M2 includes the flatness of the mask M2, the type of the pattern formed on the mask M2, the drawing error of the pattern formed on the mask M2, and the like.
  • the information on the mask M2 included in the detected portion M2a provided on the mask M2 differs depending on the individual difference of the mask M2.
  • the mask adapter 10 is a frame-shaped member that surrounds the periphery of the mask M1 to which the mask adapter 10 is attached when seen in a plan view along the vertical direction Z.
  • the mask adapter 10 has a rectangular frame shape that is long in the first direction X.
  • the outer shape of the mask adapter 10 is substantially the same in shape and size as the outer shape of the mask M2 that is handled alone.
  • the mask adapter 10 is configured such that the weight when the mask M1 is attached to the mask adapter 10 is substantially equal to the weight of the mask M2.
  • the mask adapter 10 includes a frame portion (supported portion) 11, a first detected portion 13, a display device 12, a support portion 16, first positioning portions 14 and 15, and a second positioning portion 17. Prepare The frame portion 11 and the support portion 16 form a main body portion of the mask adapter 10.
  • the frame portion 11 is a portion that is attached to a portion of the mask M1 outside the area where the pattern is formed and is supported by the mask stage MST.
  • the frame portion 11 has a frame-like shape surrounding the periphery of the mask M1.
  • the frame portion 11 has a rectangular frame shape.
  • the frame portion 11 includes a first side portion 11a, a second side portion 11b, a third side portion 11c, and a fourth side portion 11d.
  • the first side portion 11a and the second side portion 11b extend in the first direction X and are arranged at intervals in the second direction Y.
  • the first side portion 11a is located on one side (+Y side) in the second direction Y with respect to the second side portion 11b.
  • the third side portion 11c and the fourth side portion 11d extend in the second direction Y and are arranged at intervals in the first direction X.
  • the third side portion 11c is located on one side (+X side) in the first direction X with respect to the fourth side portion 11d.
  • the third side portion 11c connects the one side end portion of the first side portion 11a in the first direction X and the one side end portion of the second side portion 11b in the first direction X.
  • the fourth side portion 11d connects the end portion of the first side portion 11a on the other side ( ⁇ X side) in the first direction X and the end portion of the second side portion 11b on the other side in the first direction X. ..
  • the frame portion 11 includes a plurality of members (for example, four members of the first to fourth side portions 11a to 11d, a member in which the first side portion 11a and the third side portion 11c are connected, and a second side portion 11b). And a member in which the fourth side portion 11d is connected) and the like) may be mechanically connected to each other, or an opening may be formed in a central portion from a single plate to be integrated. ..
  • the frame portion 11 is formed with a plurality of cutout portions 11f that penetrate the frame portion 11 in the vertical direction Z.
  • Two cutout portions 11f are provided at each of the inner edge portion of the first side portion 11a and the inner edge portion of the second side portion 11b at intervals in the first direction X.
  • the cutout portion 11f opens inside the frame portion 11.
  • the cutout portion 11f is a portion where the inside of the frame portion 11 is cut out.
  • the cutout portion 11f is located outside the mask M1 when viewed in the vertical direction Z when the mask M1 is attached to the mask adapter 10.
  • the first detected part 13 is a part from which information can be read by a reader.
  • the first detected portion 13 is arranged on the upper surface (the surface on the +Z side) of the frame portion 11. More specifically, the first detected portion 13 is arranged at a portion slightly closer to one side (+X side) in the center of the outer edge portion of the first side portion 11a in the first direction X.
  • the position of the first detected portion 13 is the position of the first window portion CC1 provided in the lid portion CA2 of the mask case C and the first direction X when the mask assembly MA is placed in the mask case C.
  • the reader With the position where the positions in the second direction Y substantially overlap, that is, the mask assembly MA is placed in the mask case C and the lid portion CA2 is closed, the reader is connected to the second detected portion via the first window portion CC1. It is a position where MBa can be read. That is, the first detected portion 13 is provided at a position that can be detected by the reader (first detection portion) of the exposure apparatus EX.
  • the first detected part 13 is a bar code. That is, the first detected part 13 can read the information by the barcode reader.
  • the first detected part 13 is, for example, a sticker attached to the upper surface of the frame part 11.
  • the first detected part 13 includes information about the mask adapter 10.
  • the information regarding the mask adapter 10 is the control information necessary for controlling each unit in the exposure apparatus EX when the mask assembly MA, that is, the mask M1 to which the mask adapter 10 is attached, is arranged in the exposure apparatus EX. Parameter) and various parameters of the mask adapter 10.
  • the control information includes information for controlling the movement of the mask stage MST during exposure. Specifically, the control information includes, for example, a control gain when moving the mask stage MST, a filter that compensates each control parameter according to the individual difference of the mask adapter 10, and the like.
  • Various parameters of the mask adapter 10 include the rigidity of the mask adapter 10, the mass of the mask adapter 10, the dimensions of the mask adapter 10, the material of the mask adapter 10, and the like.
  • the information about the mask adapter 10 included in the first detected portion 13 differs depending on the individual difference of the mask adapter 10.
  • the display device 12 is arranged on the upper surface (the surface on the +Z side) of the frame portion 11. More specifically, the display device 12 is arranged in a portion of the outer edge portion of the first side portion 11a that is closer to one side (+X side) in the first direction X. The display device 12 is arranged adjacent to one side of the first detected portion 13 in the first direction X.
  • the display device 12 includes a display unit 12a.
  • the display unit 12a is made of, for example, electronic paper. Characters, marks and the like based on the information input to the display device 12 are displayed on the display unit 12a. Inputting, erasing, rewriting, etc. of information to the display device 12 is performed by the writing unit 27 described later. For example, inputting, erasing, rewriting, etc. of information to the display device 12 can be performed only by the writing unit 27 corresponding to the display device 12.
  • the first detected part 13 and the display part 12a are arranged adjacent to each other in the first direction X.
  • the display unit 12a displays the second detected portion MBa.
  • the second detected portion MBa is provided on the frame portion 11 that is the supported portion, and the first detected portion 13 and the second detected portion MBa are arranged adjacent to each other.
  • the second detected portion MBa is a display on which information can be read by a reader.
  • the second detected portion MBa is an electronic barcode. That is, the second detected portion MBa can read the information by the barcode reader.
  • the second detected portion MBa includes information about the mask M1 attached to the mask adapter 10.
  • the information on the mask M1 is at least one of the flatness of the mask M1, the type of the pattern formed on the mask M1, the dimensional error of the mask M1, the weight error of the mask M1, and the drawing error of the pattern formed on the mask M1. Including.
  • the information about the mask M1 included in the second detected portion MBa differs depending on the individual difference of the mask M1 attached to the mask adapter 10.
  • the second detected portion MBa is a display unit based on the information included in the third detected portion MB provided on the mask M1 being input to the display device 12 via a writer such as a writing unit 27 described later. 12a is displayed. That is, the display unit 12a displays the information provided on the mask M1 as information about the mask M1. In the present embodiment, the second detected portion MBa has the same mark as the third detected portion MB. That is, in the present embodiment, the display unit 12a displays the same mark as the third detected portion MB provided on the mask M1 as the second detected portion MBa.
  • the position of the second detected portion MBa displayed on the display unit 12a in the mask assembly MA is viewed along the vertical direction Z when the mask assembly MA and the mask M2 handled as a single body are stacked in the vertical direction Z. It is a position that overlaps with the detected portion M2a provided on the mask M2 described above. That is, the relative position of the second detected portion MBa with respect to each part of the exposure apparatus EX when handling the mask assembly MA in the exposure apparatus EX is the mask M2 for each section of the exposure apparatus EX when handling the mask M2 in the exposure apparatus EX. Is substantially the same as the relative position of the detected portion M2a.
  • the position of the second detected portion MBa is the position of the first window portion CC1 provided in the lid portion CA2 of the mask case C and the first direction when the mask assembly MA is placed in the mask case C.
  • a sticker on which information about the mask M1 is printed may be provided.
  • a plurality of supporting portions 16 are provided at each of the inner edge portion of the first side portion 11a and the inner edge portion of the second side portion 11b.
  • the support portions 16 are arranged side by side along the first direction X at intervals on each side.
  • Each support portion 16 projects from each side portion inside the frame portion 11 along the second direction Y.
  • the support portion 16 supports the mask M1 attached to the mask adapter 10 from below. As a result, the mask M1 attached to the mask adapter 10 is positioned in the vertical direction Z with respect to the mask adapter 10.
  • the pair of first positioning portions 14 are provided on the inner edge of the fourth side portion 11d at intervals in the second direction Y.
  • the pair of first positioning portions 14 are provided at both ends of the inner edge of the fourth side portion 11d in the second direction Y, respectively.
  • a pair of the first positioning portions 15 are provided on the inner edge portion of the third side portion 11c at intervals in the second direction Y.
  • the pair of first positioning portions 15 are provided at both end portions in the second direction Y at the inner edge portion of the third side portion 11c.
  • the first positioning unit 14 and the first positioning unit 15 position the mask M1 in the first direction X by sandwiching the mask M1 attached to the mask adapter 10 in the first direction X.
  • the first positioning portion 14 includes a protrusion 14a that protrudes inside (+X side) of the frame 11.
  • the protrusion 14a contacts the edge of the mask M1 on the other side ( ⁇ X side) in the first direction X.
  • the first positioning portion 15 includes a main body portion 15a and an elastic portion 15b.
  • the main body 15a is fixed to the frame 11 by screwing through a long hole extending in the first direction X. That is, the main body portion 15a is movable in the first direction X within the range of the long hole before being fixed by screwing.
  • the elastic portion 15b is connected to the main body portion 15a via an elastic hinge. The elastic portion 15b contacts an edge portion on one side (+X side) of the first direction X in the mask M1.
  • the elastic portion 15b applies an elastic force to the mask M1 in a direction in which the mask M1 is pressed against the first positioning portion 14.
  • the mask M1 can be attached to the mask adapter 10 in a state where the elastic force in the first direction X is applied to the mask M1, and the position of the mask M1 with respect to the mask adapter 10 in the first direction X can be determined.
  • the mask M1 may be fixed to the mask adapter 10 by using a clamp component. Even in this case, the elastic portion 15b may apply an elastic force in the first direction X to the mask M1. Thereby, the force acting on the mask M1 can be concentrated in the first direction X.
  • the first positioning unit 14 and the first positioning unit 15 fix the mask M1 to the mask adapter 10 from the first direction X. Since the size of the mask assembly MA in the XY plane is large, when the mask assembly MA is placed on the mask stage MST, both ends of the mask assembly MA in the second direction Y are supported by the mask stage MST, and the mask assembly MA is in the YZ plane. Then, the mask assembly MA is deformed (flexed) so as to be convex downward.
  • the controller CONT controls each projection optical system of the projection unit PL in accordance with the bending of the mask assembly MA. The substrate P can be exposed without being affected by the bending of the mask assembly MA.
  • the mask M2 is deformed (flexed) so as to be convex downward, similarly to the mask adapter 10. Therefore, regardless of whether the mask M2 is placed on the mask stage MST or the mask assembly MA is placed on the mask stage MST, the mask M bends so as to be convex downward in the YZ plane.
  • the projection optics of the projection unit PL can likewise be controlled by the device CONT.
  • the first positioning portion 14 and the first positioning portion 15 are provided on the first side portion 11a and the second side portion 11b, respectively, so that the mask M1 is fixed to the mask adapter 10 in the second direction Y. Good.
  • the control device CONT may move the substrate stage PST in the first direction X while adjusting the position in the vertical direction (Z direction) so as to follow the deformation of the mask M1 during exposure.
  • the control device CONT can maintain the position of the substrate P in the vertical direction Z at the focus position of the projection optical system of the projection unit PL during the exposure.
  • the pair of second positioning portions 17 are provided so as to sandwich the mask M1 in the second direction Y.
  • Each of the pair of second positioning portions 17 is provided at the central portion in the first direction X at the inner edge portion of the first side portion 11a and the central portion in the first direction X at the inner edge portion of the second side portion 11b.
  • the pair of second positioning portions 17 sandwiches the mask M1 attached to the mask adapter 10 in the second direction Y and positions the mask M1 in the second direction Y.
  • the second positioning portion 17 is fixed to the frame portion 11 by screwing through a long hole extending in the second direction Y. That is, the second positioning portion 17 is movable in the second direction Y within the range of the long hole before being screwed and fixed.
  • the mask adapter 10 includes a recognized portion 18.
  • the recognized portion 18 is a portion for identifying that the mask M (mask M1) is attached to the mask adapter 10 by each sensor described later provided in the exposure apparatus EX.
  • the recognized portion 18 is a portion for identifying the mask assembly MA or the mask M2 not attached to the mask adapter 10 by each sensor.
  • the recognized part 18 includes a first recognized part 18a and a second recognized part 18b. The first recognized portion 18a and the second recognized portion 18b are provided on the outer edge portion of the first side portion 11a of the frame portion 11.
  • the first recognized portion 18a is provided in the frame portion 11, as shown in FIG. More specifically, the first recognized portion 18a is embedded in the recess 11e provided in the first side portion 11a.
  • the recess 11e is recessed downward from the upper surface of the first side 11a and is open to the outside of the frame 11.
  • the first recognized portion 18a is, for example, screwed and fixed to the bottom surface of the recess 11e.
  • the first recognized portion 18a includes a reflecting portion 18c that reflects light.
  • the reflecting portion 18c is a part of the upper surface of the first recognized portion 18a.
  • the reflecting portion 18c is an inclined surface that is inclined toward the other side ( ⁇ X side) in the first direction X and is positioned downward.
  • the reflector 18c reflects light SL emitted from a sensor (first sensor) S1 described later in a direction different from the direction in which the sensor S1 is located.
  • the reflecting portion 18c reflects the light SL emitted from the upper side in an obliquely upward direction inclined to the other side in the first direction X.
  • the second recognized portion 18b is a penetrating portion that penetrates the mask adapter 10, as shown in FIG.
  • the second recognized portion 18b is a through hole that is provided in the frame portion 11 and penetrates the first side portion 11a in the vertical direction Z.
  • the second recognized portion 18b is, for example, an oval hole that is long in the first direction X.
  • the second recognized portion 18b allows the light SL emitted from a sensor (second sensor) S4 described below to pass through. That is, the second recognized portion 18b has a passage portion (second passage portion) through which the light SL emitted from the sensor S4 passes.
  • FIG. 6 is a perspective view showing the mask adapter installation tool 20 of the present embodiment for attaching the mask M1 to the mask adapter 10.
  • FIG. 7 is a plan view of the mask adapter installation tool 20 viewed from the upper side (+Z side). 8 is a sectional view showing the mask adapter installation tool 20, which is a sectional view taken along the line VIII-VIII in FIG. 7.
  • the mask adapter mounting tool 20 is a tool for mounting the mask M1 on the mask adapter 10 and also a tool for removing the mask M1 from the mask adapter 10.
  • the mask adapter installation tool 20 moves the mask M1 in the vertical direction Z with respect to the mask adapter 10 to attach the mask M1 to the mask adapter 10 and remove the mask M1 from the mask adapter 10. To do.
  • the mask adapter installation tool 20 includes a base portion 21, guide portions 22a, 22b, 22c, a movable portion 24, a lifting device 23, a pair of mask holding portions 25, and a second portion.
  • the detection unit 26, the writing unit 27, and the third detection unit 28 are provided. 6 and 8, the second detection unit 26, the writing unit 27, and the third detection unit 28 are not shown. Further, in FIG. 7, the illustration of the base portion 21 and the elevating device 23 is omitted.
  • the base portion 21 has an angular U-shape that is open to the other side ( ⁇ X side) in the first direction X when viewed in the vertical direction Z.
  • the base portion 21 includes pillar portions 21a, 21b, 21c and a plurality of foot portions 21d.
  • the column portion 21a extends in the second direction Y.
  • the pillar portion 21b extends from the other end ( ⁇ Y side) of the pillar portion 21a in the second direction Y to the other side ( ⁇ X side) of the first direction X.
  • the pillar portion 21c extends from the end portion on one side (+Y side) of the second direction Y of the pillar portion 21a to the other side of the first direction X.
  • the plurality of feet 21d extend downward from the pillars 21a, 21b, 21c.
  • the mask adapter installation tool 20 is installed on the ground via a plurality of legs 21d.
  • the carrier V having the mask case C mounted therein can enter the inside of the angular U-shaped base portion 21 from the opening on the other side ( ⁇ X side) in the first direction X. ..
  • the mask case C mounted on the transport vehicle V entering the inside of the base 21 is in a state in which the lid CA2 is removed, and the mask adapter 10 is housed inside.
  • the guide portion 22a extends upward from the center portion of the pillar portion 21a in the second direction Y.
  • the guide portion 22b extends upward from the other end ( ⁇ X side) of the column portion 21b in the first direction X.
  • the guide portion 22c extends upward from the other end of the pillar portion 21c in the first direction X.
  • the movable part 24 has an angular U-shape that is open to the other side ( ⁇ X side) in the first direction X when viewed in the vertical direction Z.
  • the movable portion 24 is supported by the guide portions 22a, 22b, 22c and is arranged above the base portion 21.
  • the movable portion 24 is movable in the up-down direction Z along the guide portions 22a, 22b, 22c.
  • the movable part 24 includes pillars 24a, 24b, 24c.
  • the column portion 24a extends in the second direction Y.
  • the central portion of the column portion 24a in the second direction Y is connected to the guide portion 22a.
  • the pillar portion 24b extends from the other end ( ⁇ Y side) of the pillar portion 24a in the second direction Y to the other side ( ⁇ X side) of the first direction X.
  • the other end of the pillar portion 24b in the first direction X is connected to the guide portion 22b.
  • the pillar portion 24c extends from the end portion on one side (+Y side) of the second direction Y of the pillar portion 24a to the other side ( ⁇ X side) of the first direction X.
  • the other end of the pillar portion 24c in the first direction X is connected to the guide portion 22c.
  • Rail portions 24d extending in the first direction X are provided on the upper surfaces of the pillar portions 24b and 24c, respectively.
  • the lifting device 23 is provided at the center of the pillar 21a in the second direction Y.
  • the elevating device 23 is a device that can move the movable portion 24 in the vertical direction Z along the guide portions 22a, 22b, 22c.
  • the lifting device 23 includes a handle portion 23a. The operator can move the movable portion 24 in the vertical direction Z by turning the handle portion 23a.
  • the elevating device 23 moves the movable portion 24 in the vertical direction Z to move the mask M1 held by the mask holding portion 25 in the vertical direction Z.
  • the pair of mask holding portions 25 are attached to the movable portion 24, and can move in the vertical direction Z together with the movable portion 24.
  • the pair of mask holding portions 25 are arranged at intervals in the first direction X.
  • the pair of mask holding units 25 are arranged symmetrically to each other in the first direction X, for example.
  • Each of the pair of mask holding portions 25 includes a rail portion 25a, a pair of first slide portions 25e, a pair of second slide portions 25b, a pair of arm portions 25c, and a pair of hand portions 25d.
  • the rail portion 25a extends in the second direction Y. Both ends of the rail portion 25a in the second direction Y are connected to the rail portions 24d of the pillar portions 24b and 24c via the pair of first slide portions 25e, respectively.
  • the rail portion 25a can move in the first direction X.
  • the pair of second slide portions 25b are arranged on the rail portion 25a along the second direction Y.
  • the pair of second slide portions 25b can move in the second direction Y along the rail portion 25a.
  • the pair of arm portions 25c extend downward from the side surfaces of the pair of second slide portions 25b in the first direction X.
  • the pair of hand parts 25d are fixed to the lower ends of the pair of arm parts 25c, respectively.
  • the arm portion 25c and the hand portion 25d are movable in the second direction Y via the second slide portion 25b.
  • the pair of hand portions 25d can approach the edges of the mask M1 in the second direction Y, approaching from both sides of the mask M1 in the second direction Y, respectively.
  • the mask holding portions 25 are provided as a pair, the mask M1 can be held and held by the four hand portions 25d in total.
  • the mask M1 can be moved in the vertical direction Z by moving the movable unit 24 in the vertical direction Z by the elevating device 23 while holding the mask M1 by the pair of mask holding units 25.
  • the second detector 26 is attached to the pillar 24c, as shown in FIG.
  • the second detection unit 26 projects from the column portion 24c to the other side ( ⁇ Y side) in the second direction Y.
  • the second detection unit 26 includes a detection main body 26a at the other end in the second direction Y.
  • the detection body 26a is located above the third detected portion MB of the mask M1 held by the mask adapter installation tool 20.
  • the detection main body portion 26a irradiates the third detected portion MB, which is a barcode, with light from the upper side, and reads the reflected light from the third detected portion MB to read the information contained in the third detected portion MB. It is readable.
  • the second detection unit 26 can read and detect the third detected portion MB including the information about the mask M1 provided on the mask M1.
  • the second detection unit 26 transmits the read information to the writing unit 27.
  • the writing unit 27 is attached to the pillar 24c.
  • the writing unit 27 is arranged on one side (+X side) of the second detection unit 26 in the first direction X.
  • the writing portion 27 projects from the pillar portion 24c to the other side ( ⁇ Y side) in the second direction Y.
  • the other end of the writing unit 27 in the second direction Y is located above the mask adapter 10 in the mask case C mounted on the transport vehicle V that has entered the inside of the base 21.
  • the writing unit 27 can send the information sent from the second detection unit 26 to the display device 12 provided in the mask adapter 10. Accordingly, the writing unit 27 causes the display unit 12a provided in the mask adapter 10 to display the second detected portion MBa including the information included in the third detected portion MB. That is, the writing unit 27 causes the display unit 12a of the mask adapter 10 to display the second detected portion MBa based on the information detected (read) by the second detection unit 26 from the third detected portion MB. The writing unit 27 can also send a signal to the display device 12 to erase the display on the display unit 12a.
  • the third detector 28 is attached to the pillar 24b.
  • the third detection unit 28 includes a stretching unit 28a, a first measuring unit 28b, and a second measuring unit 28c.
  • the extending portion 28a extends from the column portion 24b to one side (+Y side) in the second direction Y.
  • One end of the extending portion 28a on the one side in the second direction Y is located above the mask M1 held by the mask adapter installation tool 20.
  • the first measuring section 28b and the second measuring section 28c are provided in the extending section 28a.
  • the first measuring unit 28b is located above the mask adapter 10 in the mask case C mounted on the transport vehicle V that has entered the inside of the base 21.
  • the first measuring unit 28b can measure the position of the mask adapter 10 in the vertical direction Z.
  • the second measuring unit 28c is located above the mask M1 held by the mask adapter installation tool 20.
  • the second measuring unit 28c can measure the position of the mask M1 in the vertical direction Z.
  • the first measuring unit 28b and the second measuring unit 28c are, for example, laser displacement meters.
  • the third detection unit 28 based on the position in the vertical direction Z of the mask adapter 10 measured by the first measurement unit 28b and the position in the vertical direction Z of the mask adapter 10 measured by the second measurement unit 28c, It is possible to detect whether or not the mask adapter 10 is attached to the mask M1.
  • the third detection unit 28 calculates the relative position of the mask M1 and the mask adapter 10 in the vertical direction Z from the measurement result of the first measurement unit 28b and the measurement result of the second measurement unit 28c.
  • the third detection unit 28 stores relative position information in the vertical direction Z between the mask M1 and the mask adapter 10 in the state where the mask M1 is attached to the mask adapter 10.
  • the third detection unit 28 determines that the mask M1 is attached to the mask adapter 10.
  • the third detector 28 removes the mask M1 from the mask adapter 10. To judge. Accordingly, the third detection unit 28 can detect that the mask M1 is attached to the mask adapter 10 and that the mask M1 is removed from the mask adapter 10.
  • the third detection unit 28 determines that the mask M1 is removed from the mask adapter 10 when the relative position of the mask M1 with respect to the mask adapter 10 changes to the upper side. Accordingly, the third detection unit 28 can detect that the mask M1 has been removed from the mask adapter 10. The third detection unit 28 can transmit the detection result to the second detection unit 26 and the writing unit 27.
  • the worker attaches the mask M1 to the mask adapter 10 using the above-mentioned mask adapter attachment tool 20.
  • the operator holds the mask M1 on the mask adapter installation tool 20.
  • the operator moves the mask M1 arranged on the lifter (not shown) into the inside of the base portion 21 together with the lifter, and raises the mask M1 to the position of the mask holding portion 25 in the vertical direction Z by the lifter.
  • the operator moves each hand portion 25d in the second direction Y, and causes each hand portion 25d to grip the outer edge portion of the mask M1 lifted by the lifter.
  • the worker can cause the mask adapter installation tool 20 to hold the mask M1.
  • the worker puts out the lifter outside the base 21, and then, as shown in FIG. 8, puts the carrier V on which the mask case C is mounted inside the base 21.
  • the lid portion CA2 of the mask case C is removed, and the mask adapter 10 is arranged inside the mask case C. Therefore, the storage section main body CA1 is open to the upper side, and the mask adapter 10 is exposed to the upper side through the opening of the storage section main body CA1.
  • the operator turns the handle portion 23a of the elevating device 23 to move the mask M1 together with the movable portion 24 and the mask holding portion 25 to the lower side, and brings the mask M1 closer to the mask adapter 10 from the upper side.
  • the operator moves the mask M1 to a position where it is supported from below by the support portion 16 of the mask adapter 10, and arranges the mask M1 inside the mask adapter 10.
  • the elevating device 23 lowers the mask M1 located above the mask adapter 10 and arranges the mask M1 inside the mask adapter 10 having a frame shape surrounding the periphery of the mask M1 in a plan view.
  • each hand portion 25d is inserted into the cutout portion 11f provided in the mask adapter 10. Therefore, the mask M1 can be moved to a position where the mask adapter 10 is supported from below by the support portion 16 without the hand portion 25d interfering with the mask adapter 10.
  • the operator finely adjusts the position of the mask M1 in the first direction X and abuts it on the protruding portion 14a of the first positioning portion 14 of the mask adapter 10.
  • the mask M1 is positioned in the first direction X with respect to the mask adapter 10.
  • the operator moves the main body portion 15a of the first positioning portion 15 in the first direction X along the elongated hole (not shown) to bring the elastic portion 15b into contact with the mask M1.
  • the worker screws and fixes the main body 15a to the frame 11.
  • the mask M1 can be fixed to the mask adapter 10 in the first direction X.
  • the operator moves the second positioning portion 17 in the second direction Y along a long hole (not shown) to bring it into contact with the mask M1, and fixes the second positioning portion 17 to the frame portion 11 with screws.
  • the mask M1 can be fixed to the mask adapter 10 in the second direction Y.
  • the operator can attach the mask M1 to the mask adapter 10.
  • the third detection unit 28 detects that the mask M1 is attached to the mask adapter 10, and the detection result of the third detection unit 28 is transmitted to the second detection unit 26. ..
  • the second detection unit 26, which has received the detection result from the third detection unit 28, reads the third detected portion MB of the mask M1 and transmits the read information to the writing unit 27.
  • the writing unit 27 that has received the information obtained by reading the third detected portion MB from the second detection unit 26 transmits the information to the display device 12 of the mask adapter 10 and displays the second detected portion MBa on the display unit 12a.
  • the third detection unit 28 of the present embodiment attaches the mask M1 to the mask adapter 10 when the mask M1 is supported by the support unit 16 from below and is arranged inside the mask adapter 10.
  • the detection result is transmitted, and the detection result is transmitted to the second detection unit 26. That is, in the present embodiment, for example, when the mask M1 is fixed to the mask adapter 10 by the above-described first positioning portions 14 and 15 and the second positioning portion 17, the second detection portion 26 and the writing portion 27 are It operates as described above to display the second detected portion MBa on the display unit 12a.
  • the worker moves the hand unit 25d in the cutout portion 11f in the second direction Y to move the hand unit. 25d is removed from the mask M1. Then, the worker rotates the handle portion 23a of the elevating device 23 in a direction opposite to that when mounting the handle portion 23a, raises the movable portion 24 and the mask holding portion 25, and returns them to their original positions. After that, the worker puts the transport vehicle V out of the base portion 21 and attaches the lid portion CA2 to the storage portion main body CA1 of the mask case C.
  • the mask case C housing the mask assembly MA in which the mask M1 is attached to the mask adapter 10 is transported by the transport vehicle V to the mask library LB of the exposure apparatus EX, and is stored in the storage section LBa by the transport apparatus H1.
  • the control device CONT of the exposure apparatus EX reads and stores the information of the mask M housed in the mask case C transported to the housing part LBa.
  • the control device CONT detects the state of the mask M by reading a detected portion such as a mark through the first window portion CC1 by a reader (not shown) provided in the transport device H1.
  • a reader first detection unit
  • the control device CONT identifies that the stored mask M is the mask M1 attached to the mask adapter 10, and the information about the mask adapter 10 included in the first detected portion 13 and the second detected portion.
  • Information about the mask M1 included in the detection unit MBa is stored.
  • the control device CONT identifies that the stored mask M is the mask M2 not attached to the mask adapter 10, and stores information about the mask M2 included in the detected portion M2a of the mask M2.
  • the control device CONT lists and stores the information of the mask M in the mask case C housed in each housing portion LBa of the mask library LB as described above.
  • FIG. 9 is a plan view showing a part of a procedure for exposing the substrate P in the exposure apparatus EX using the mask assembly MA, that is, the mask M1 attached to the mask adapter 10.
  • the controller CONT causes the mask M1 attached to the mask adapter 10 as the mask M used for the next exposure of the substrate P to be transferred to the mask stage MST by the transfer devices H1 and H2.
  • the transfer device H1 moves the mask case C, in which the mask M1 to be used is stored, from the storage part LBa to the uppermost part of the transfer device H1 by a mask case transfer part (not shown).
  • the mask case transporting unit moves the mask case C with the lid CA2 removed and left inside the accommodation unit LBa.
  • the controller CONT removes the lid portion CA2 by the mask case transport section of the transport apparatus H1 and then moves the mask case C by a reader (not shown) provided in the transport apparatus H1 by the reader (not shown) provided in the transport apparatus H1.
  • the mask M is detected by reading the detected portion provided in the.
  • the control device CONT confirms whether or not the mask M to be conveyed is the mask M to be used for exposing the next substrate P. Based on the information read by the reader, the control device CONT confirms that the mask M to be conveyed is not incorrect, and then the mask case conveying section of the conveying device H1 conveys the mask case C containing the mask M to the conveying device. Move to the top of H1.
  • Information of the mask M is listed and stored in the control device CONT when the mask case C is stored in the mask library LB.
  • the mask M to be used is conveyed as described above, the mask M is stored. It is possible to prevent the erroneous mask M from being conveyed to the exposure part EP by reading the detected portion of No. 2 and confirming the mask M again.
  • the control device CONT controls the conveying device H1 to return the mask M to the mask library LB.
  • the carrying device H2 holds the mask M1 housed in the mask case C moved to the uppermost part of the carrying device H1 together with the mask adapter 10 by the carrier H2b as shown in FIG. ..
  • the carrier H2b includes a carrier body H2c and a plurality of claws H2d protruding from the carrier body H2c in the second direction Y.
  • two claws H2d are provided on each edge of the carrier main body H2c in the second direction Y, four in total.
  • the carrier H2b grips the mask assembly MA, in which the mask M1 is attached to the mask adapter 10, by the four claws H2d in the second direction Y. More specifically, the carrier H2b holds the mask adapter 10 by sandwiching it with the claw portions H2d.
  • the carrier H2b grips the mask M2 by sandwiching the mask M2 with the claw portions H2d when the mask M2 is transported.
  • the control device CONT uses the sensors S1, S2, S3 provided on the carrier H2b to attach the mask M gripped by the carrier H2b to the mask adapter 10.
  • the mask M1 or the mask M2 handled alone is identified.
  • the sensors S1, S2, S3 are, for example, sensors that are turned on when the emitted light is reflected by the mask adapter 10 or the mask M2 and receive the reflected light, and are turned off when the reflected light is not received. ..
  • the sensor S1 is provided on the carrier main body H2c at a position where the first recognized portion 18a provided on one end (+Y side) of the second direction Y of the mask M can be identified.
  • the sensor S1 includes a light emitting portion for emitting the light SL and a light receiving portion capable of receiving the reflected light obtained by reflecting the light SL.
  • the sensor S1 when the carrier H2b grips the mask assembly MA, the sensor S1 is located above the first recognized portion 18a of the mask adapter 10.
  • the emitting portion of the sensor S1 emits the light SL to the first recognized portion 18a. More specifically, the sensor S1 emits the light SL from the upper side toward the reflecting portion 18c of the first recognized portion 18a.
  • the reflecting portion 18c has the inclined surface that is inclined downward toward the other side ( ⁇ X side) in the first direction X, so that the carrier H2b holds the mask assembly MA.
  • the light SL emitted from the sensor S1 is reflected by the reflector 18c in a direction different from the direction in which the sensor S1 is located. Therefore, the light receiving portion of the sensor S1 does not receive the light SL reflected from the first recognized portion 18a and is in the OFF state.
  • the sensors S2 and S3 are provided at both ends of the carrier body H2c in the first direction X, respectively.
  • the sensors S2 and S3 include a light emitting portion for emitting the light SL and a light receiving portion for receiving the reflected light obtained by reflecting the light SL, like the sensor S1.
  • the sensors S2 and S3 are located above the mask M1 when the carrier H2b holds the mask assembly MA.
  • the respective emission parts of the sensors S2 and S3 emit light SL toward the mask M1 from above.
  • the light SL emitted from the sensors S2 and S3 is reflected by the mask M1 and received by the light receiving portions of the sensors S2 and S3. Therefore, the sensors S2 and S3 are turned on.
  • the control device CONT detects that the carrier H2b holds the mask assembly MA and identifies that the mask M being conveyed is the mask M1.
  • the control device CONT detects that the carrier H2b holds the mask M2 handled alone, and the mask M being conveyed is the mask M2. Identify that there is.
  • the first recognized part 18a conveys the mask M2, which is not attached to the mask adapter 10 by the conveying device H2, to the mask stage MST by the sensor S1 provided in the conveying device H2 in the exposure apparatus EX.
  • the exposure apparatus EX determines whether the transport apparatus H2 is transporting the mask adapter 10 to which the mask M1 is attached to the mask stage MST.
  • the control device CONT detects that the carrier H2b is not holding anything.
  • the control device CONT determines whether the mask M identified as described above matches the mask M to be used. When the mask M matches the mask M to be used, the control device CONT moves the carrier H2b along the carrier guide H2a and places the mask M on the mask stage MST. On the other hand, when the identified mask M does not match the mask M to be used, the mask M held by the carrier H2b is returned to the mask case C, and another mask M that matches the mask M to be used is conveyed again. In the present description, the control unit CONT determines that the mask M1 held by the carrier H2b matches the mask M used, and places the mask M1 on the mask stage MST in the state of the mask assembly MA attached to the mask adapter 10. ..
  • the number of sensors included in the carrier H2b is not limited to three and may be four or more.
  • FIG. 10 is a plan view of the mask stage MST in which the mask assembly MA is arranged, as viewed from above.
  • FIG. 11 is a plan view of a part of the mask stage MST in which the mask assembly MA is arranged, as viewed from above.
  • the mask stage MST has a rectangular frame shape, and the inner edge portion supports the outer edge portion of the mask adapter 10 from below. That is, the mask stage MST supports the mask adapter 10 to which the mask M1 is attached via the frame portion 11 that is the supported portion.
  • the mask stage MST adsorbs and holds the mask adapter 10.
  • the method of supporting the mask adapter 10 of the mask stage MST is, for example, the method disclosed in International Publication No. 2017/038,788.
  • a penetrating portion PH penetrating the mask stage MST in the vertical direction Z is provided at the inner edge of the mask stage MST.
  • the claw portion H2d of the carrier H2b is inserted into the penetrating portion PH. Accordingly, the mask assembly MA can be arranged on the mask stage MST by the carrier H2b without the claw portion H2d interfering with the mask stage MST.
  • the mask stage MST is provided with sensors S4 and S5.
  • the sensors S4 and S5 include a light emitting portion for emitting the light SL and a light receiving portion for receiving the light reflected by the light SL, as in the case of S1, S2, and S3.
  • the sensors S4 and S5 are turned on when the light emitted from the emitting portion is reflected by the mask assembly MA or the mask M2 and the reflected light is received by the light receiving portion, and is turned off when the reflected light is not received. It is a sensor.
  • the sensor S4 includes an emitting portion S4a that emits the light SL on the upper side.
  • the emitting portion S4a In a state where the mask assembly MA is arranged on the mask stage MST, the emitting portion S4a is located below the second recognized portion 18b which is the penetrating portion. The sensor S4 emits light from the emitting portion S4a to the second recognized portion 18b.
  • the sensor S5 includes an emitting portion S5a that emits the light SL on the upper side.
  • the injection portion S5a is located below the corner portion 11g of the frame portion 11 of the mask adapter 10.
  • the emission parts S4a and S5a of the sensors S4 and S5 are located below the mask M2.
  • the controller CONT uses the sensors S4 and S5 to handle the placed mask M as the mask M1 to which the mask adapter 10 is attached or as a single unit.
  • the mask M2 is identified.
  • the mask M arranged on the mask stage MST is the mask assembly MA in which the mask M1 is attached to the mask adapter 10
  • the light SL emitted from the sensor S4 passes through the second recognized portion 18b which is a penetrating portion. To do. Therefore, the light receiving unit of the sensor S4 is in the OFF state without receiving the reflected light.
  • the mask M arranged on the mask stage MST is the mask M1
  • the light SL emitted from the sensor S5 is reflected by the corner portion 11g of the mask adapter 10 and received by the sensor S5. Therefore, the sensor S5 is turned on.
  • the controller CONT identifies that the mask assembly MA is arranged on the mask stage MST when the sensor S4 is in the OFF state and the sensor S5 is in the ON state.
  • the control device CONT identifies that the mask M arranged on the mask stage MST is the mask M2 that is handled alone.
  • the frame S11 of the mask adapter 10 to which the mask M1 is attached is supported by the mask stage MST by the sensor S4 provided on the mask stage MST, or It is used to identify whether the mask M2 not attached is supported by the mask stage MST.
  • the control device CONT detects that nothing is placed on the mask stage MST.
  • the control device CONT determines whether the mask M identified as described above matches the mask M to be used. When the mask M matches the mask M to be used, the controller CONT controls the exposure unit EP to start the exposure of the substrate P. On the other hand, when the identified mask M does not match the mask M used, the mask M arranged on the mask stage MST is returned to the mask case C, and another mask M matching the mask M used is conveyed again. ..
  • the control device CONT uses the sensors S4 and S5 to identify again whether another mask M that has been conveyed again matches the mask M used, and repeats the operation until it matches. In the present description, the control unit CONT determines that the mask M1 arranged on the mask stage MST matches the mask M used, and starts the exposure of the substrate P using the mask M1 attached to the mask adapter 10. ..
  • the controller CONT moves the mask stage MST based on the information read from the first detected portion 13 and the second detected portion MBa. Is controlled to expose the substrate P.
  • the control device CONT changes the setting of the projection unit PL using the information obtained from each detected part and each recognized part before exposing the substrate P.
  • the information obtained from each detected part and each recognized part is called "identification information”.
  • the control device CONT identifies that the mask M mounted on the mask stage MST is the mask M1 attached to the mask adapter 10 based on the identification information, each projection optical system provided in the projection unit PL. It controls each correction mechanism provided inside.
  • control device CONT controls each correction mechanism based on the information of the size and individual difference of the mask M when the mask M is supported by the mask stage MST among the identification information. Since the degree of bending of the mask M changes depending on the size of the mask M and individual differences, the control device CONT controls each correction mechanism in accordance with the difference in the bending direction due to the size of the mask M and individual differences. Note that the control device CONT may perform the above-described control of the correction mechanism before the mask M is placed on the mask stage MST by the transport devices H1 and H2. In this case, the substrate P can be exposed immediately after the mask M is placed on the mask stage MST.
  • the control apparatus CONT controls the illumination optical system IL to expose a plurality of substrates P, and to control the illumination optical system IL.
  • the exposure light EL is not supplied to the projection optical system located at both ends in the second direction Y of the projection optical system.
  • no pattern is formed on the mask adapter 10
  • the exposure light EL is projected.
  • the light is reflected by the mask adapter 10 and becomes noise light in the exposed portion EP, which may cause defective exposure.
  • the control unit CONT also does not change the correction mechanism that changes the focus position, the shift amount, the image plane inclination, etc., provided in the projection optical system located at both ends in the second direction Y.
  • the projection optical system that does not supply the exposure light EL from the illumination optical system IL is not limited to the projection optical systems located at both ends in the second direction Y, and may depend on the size of the mask M1 attached to the mask adapter 10. , Determined as appropriate.
  • the control device CONT When the exposure using the mask M1 is completed, the control device CONT returns the mask assembly MA arranged on the mask stage MST to the original mask case C by the transport device H2, and the mask case C in which the mask assembly MA is stored. It is accommodated in the accommodating portion LBa of the mask library LB by the transport device H1.
  • the control device CONT receives the information about the mask case C taken out from the exposure device EX, the control device CONT loads the corresponding mask case C on the transport vehicle V by the transport device H1. As a result, the mask case C can be taken out of the exposure apparatus EX by the transport vehicle V.
  • the mask M stored in the taken-out mask case C is the mask M1 attached to the mask adapter 10.
  • the worker removes the lid CA2 of the mask case C taken out of the exposure apparatus EX by the transport vehicle V and releases the fixation of the mask M1 to the mask adapter 10. Specifically, the operator removes the screws of the first positioning portion 15 and the second positioning portion 17 of the mask adapter 10 so that the first positioning portion 15 and the second positioning portion 17 are separated from the mask M1.
  • the worker inserts the carrier V loaded with the mask case C with the lid CA2 removed into the inside of the base 21 of the mask adapter installation tool 20. Then, the worker turns the handle portion 23a of the elevating device 23 to move the movable portion 24 and the mask holding portion 25 downward, and causes the mask holding portion 25 to hold the mask M1 via the hand portion 25d. After holding the mask M1 on the mask holding unit 25, the operator turns the handle unit 23a in the opposite direction to move the mask M1 together with the movable unit 24 and the mask holding unit 25 to the upper side, and removes it from the mask adapter 10.
  • the third detection unit 28 provided in the mask adapter installation tool 20 detects the mask M1 from the mask adapter 10 as described above. The removal is detected, and the detection result is sent to the writing unit 27.
  • the writing unit 27 that has received the detection result sends a signal to the display device 12 of the mask adapter 10 to erase the second detected portion MBa displayed on the display unit 12a. In this way, the writing unit 27 erases the display of the display unit 12a when the third detection unit 28 detects that the mask M1 is removed from the mask adapter 10.
  • the operator moves the mask M1 upward and removes it from the mask adapter 10, and then takes out the carrier V to the outside of the base 21, and instead causes a lifter (not shown) to enter the inside of the base 21. Then, the operator raises the lifter to the height of the mask M1 and loads the mask M1 on the lifter. The operator removes the mask M1 from the mask holding unit 25 by moving the hand unit 25d in the second direction Y with the mask M1 placed on the lifter. Then, the worker lowers the lifter on which the mask M1 is arranged and takes it out from the inside of the base portion 21. After that, the worker uses the lifter to convey the mask M1 to a predetermined storage place.
  • the mask M1 is used again in the exposure apparatus EX, the mask M1 is attached to the mask adapter 10 in the same procedure as described above.
  • the mask M1 attached to the mask adapter 10 is another mask M1 different from the previously attached mask M1
  • a second detected portion MBa different from the previous time is displayed on the display unit 12a. That is, the display unit 12a displays information regarding another mask M1 when the other mask M1 is attached to the mask adapter 10.
  • the mask adapter 10 has individual differences due to manufacturing errors and the like. Therefore, parameters such as rigidity are different for each mask adapter 10, so that the bending on the mask stage MST and the behavior when the mask stage MST is moved are different. As a result, even if the control information for using the mask M1 to which the mask adapter 10 is attached is input in advance to the control device CONT, the parameters of the mask adapter 10 vary due to individual differences, and the exposure accuracy decreases. was there. Particularly, when the substrate P is a flat panel display substrate, the substrate P is relatively large, and the mask adapter 10 and the mask M1 are also relatively large. Therefore, the behavior of the mask M1 and the mask adapter 10 during the exposure may change significantly even with a slight manufacturing error, and the exposure accuracy may be significantly reduced.
  • the mask adapter 10 includes the first detected portion 13 including information about the mask adapter 10. Therefore, by reading the first detected portion 13 in the exposure apparatus EX, it is possible to perform exposure according to the individual difference of the mask adapter 10. This makes it possible to improve the exposure accuracy of the exposure apparatus EX when using the mask M1 attached to the mask adapter 10.
  • the information regarding the mask adapter 10 included in the first detected portion 13 includes control information for controlling the movement of the mask stage MST during exposure. Therefore, for example, the mask stage MST holding the mask M1 attached to the mask adapter 10 can be appropriately controlled and moved during exposure. Thereby, the exposure accuracy of the exposure apparatus EX can be further improved.
  • the information regarding the mask adapter 10 included in the first detected portion 13 includes the rigidity of the mask adapter 10.
  • the rigidity of the mask adapter 10 is likely to particularly affect the movement control of the mask stage MST. Specifically, the mask stage MST should move substantially straight in the first direction X during exposure, but if there is no information related to the mask adapter 10, it meanders in the second direction Y or rotates in the ⁇ z direction. There is a possibility of moving in the first direction X while doing. Therefore, since the rigidity of the mask adapter 10 is included in the information included in the first detected portion 13, the mask stage MST can be moved in the first direction X more accurately during exposure. Thereby, the exposure accuracy of the exposure apparatus EX can be further improved.
  • the first detected portion 13 is a barcode. Therefore, it is possible to easily read the first detected portion 13 by the exposure apparatus EX. Further, for example, the first detected portion 13 can be easily provided on the mask adapter 10 by printing the first detected portion 13 on a sticker and adhering it to the mask adapter 10.
  • the parameters of the mask M also vary due to individual differences. Therefore, the mask M is provided with a detected portion including information about the mask M.
  • the control device CONT reads the detected portion M2a provided in the mask M2 by the reader in the exposure apparatus EX, and according to the individual difference of the mask M2. Adjust the control during exposure.
  • the mask M1 attached to the mask adapter 10 is smaller than the mask M2 used alone.
  • the third detected part MB provided on the mask M1 attached to the mask adapter 10 has a different relative position to the detected part M2a provided on the mask M2 used alone and the respective parts of the exposure apparatus EX, In some cases, the reader in the exposure apparatus EX cannot read or is difficult to read.
  • the mask adapter 10 includes the second detected portion MBa including information about the mask M1 attached to the mask adapter 10. Therefore, when the mask M1 attached to the mask adapter 10 is used by providing the second detected portion MBa at the same relative position as the detected portion M2a provided on the mask M2 used alone. Also, it is easy to read the second detected portion MBa by the same reader that reads the detected portion M2a of the mask M2 used alone. Therefore, the information on the mask M1 can be easily read.
  • the first detected portion 13 and the second detected portion MBa are arranged adjacent to each other. Therefore, it is easy to read both the first detected portion 13 and the second detected portion MBa by one reader provided in the exposure apparatus EX.
  • the information regarding the mask M1 includes the flatness of the mask M1, the type of the pattern formed on the mask M1, the dimensional error of the mask M1, the weight error of the mask M1, and the pattern formed on the mask M1. At least one of the drawing errors is included. Therefore, when the mask M1 attached to the mask adapter 10 is used, each unit in the exposure apparatus EX can be controlled more preferably. Thereby, the exposure accuracy of the exposure apparatus EX can be further improved.
  • the mask adapter 10 includes the display portion 12a on which the second detected portion MBa is displayed, and the display portion 12a is different when the different mask M1 is attached to the mask adapter 10.
  • the information regarding the mask M1 of is displayed. Therefore, for each mask M1 attached to the mask adapter 10, the second detected portion MBa corresponding to each mask M1 can be displayed on the display unit 12a. Thereby, the mask adapter 10 can be used for a plurality of different masks M1.
  • the display unit 12a displays the information (third detected portion MB) provided on the mask M1 as information about the mask M1. Therefore, the information about the mask M1 attached to the mask adapter 10 can be appropriately displayed on the display unit 12a.
  • the second detected portion MBa is an electronic barcode. Therefore, it is possible to easily read the second detected portion MBa by the exposure apparatus EX. Moreover, writing and displaying of information on the display unit 12a can be facilitated.
  • the control device CONT of the exposure apparatus EX erroneously recognizes the mask M1 attached to the mask adapter 10 and the mask M2 handled as a single unit, the control during exposure becomes improper control. Therefore, the substrate P may not be normally exposed, or the exposure accuracy may be significantly reduced.
  • the mask adapter 10 includes the recognized portion 18 for identifying that the mask M is attached to the mask adapter 10 by the sensor provided in the exposure apparatus EX. Therefore, the control device CONT of the exposure apparatus EX can easily identify that the mask M is attached to the mask adapter 10 by identifying the recognized portion 18 with the sensor. As a result, when the mask M1 attached to the mask adapter 10 is used, it is possible to prevent the control device CONT from erroneously recognizing that the mask M2 is not attached to the mask adapter 10. Therefore, the control during the exposure can be appropriately performed, and the exposure accuracy of the exposure apparatus EX can be improved.
  • the mask adapter 10 transfers the mask M2, which is not attached to the mask adapter 10 by the transfer device H2, to the mask stage MST by the sensor S1 provided in the transfer device H2 in the exposure apparatus EX.
  • the exposure apparatus EX is provided with a first recognized portion 18a for identifying whether the transport apparatus H2 is transporting the mask adapter 10 to which the mask M1 is attached to the mask stage MST. Therefore, it is possible to identify that the mask M is attached to the mask adapter 10 before placing the mask M on the mask stage MST.
  • the first recognized portion 18a includes the reflecting portion 18c, and the reflecting portion 18c does not indicate the direction in which the sensor S1 positions the light SL emitted from the sensor S1 that is the first sensor. Reflect in different directions. Therefore, the control device CONT can identify that the mask M is attached to the mask adapter 10 because the sensor S1 does not receive the reflected light SL.
  • the mask adapter 10 is configured so that the frame portion 11 of the mask adapter 10 to which the mask M1 is attached is supported by the mask stage MST by the sensor S4 provided on the mask stage MST.
  • the second recognized portion 18b for identifying whether or not the mask M2 not attached to the mask is supported by the mask stage MST. Therefore, when the mask M is placed on the mask stage MST, it can be identified that the mask M is attached to the mask adapter 10.
  • the second recognized portion 18b has a passage portion (second passage portion) through which the light SL emitted from the sensor S4 passes. Therefore, the control device CONT can identify that the mask adapter 10 is attached to the mask M because the light SL emitted from the sensor S4 is not reflected and is not received by the sensor S4.
  • the second recognized portion 18b includes a passage portion (second passage portion).
  • the passage portion (second passage portion) of the second recognized portion 18b is a through hole provided in the frame portion 11. Therefore, the passage portion of the second recognized portion 18b can be easily made by punching out a part of the mask adapter 10 by, for example, press working. Thereby, the manufacture of the mask adapter 10 can be facilitated.
  • the control device CONT stops the transport of the mask M if the wrong mask M is transported when identifying the state of at least one of the two masks M. Therefore, it is possible to further suppress the exposure of the substrate P using the wrong mask M.
  • the frame portion 11 has a frame-like shape surrounding the periphery of the mask M1 attached to the mask adapter 10. Therefore, as the mask assembly MA in which the mask M1 is attached to the mask adapter 10, the outer shape can be made larger than the outer shape of the mask M1.
  • the mask assembly MA to which the mask adapter 10 is attached the mask M1 smaller than the mask M2 can be handled in the exposure apparatus EX in which the mask M2 is used alone. Therefore, since the size of the mask M used in the exposure apparatus EX can be reduced, the cost of preparing the mask M can be reduced.
  • the mask M1 used in the exposure apparatus EX for the mask M1 can also be used in the exposure apparatus EX for the mask M2 by using the mask adapter 10. Thereby, when performing the test exposure by the exposure apparatus EX for the mask M2, it is possible to perform the test exposure without making the mask M2.
  • the exposure accuracy of the exposure apparatus EX may decrease.
  • the mask adapter mounting tool 20 for mounting the mask M1 on the mask adapter 10 includes the second detected portion MBa including the information on the mask M1 mounted on the mask adapter 10 in the mask adapter 10.
  • the mask adapter installation tool 20 includes the second detection unit 26 that detects the third detected portion MB including the information about the mask M1 provided on the mask M1, and the writing unit 27 includes:
  • the second detection unit 26 causes the display unit 12a to display the second detection unit MBa based on the information detected from the third detection unit MB. Therefore, it is possible to prevent the writing unit 27 from writing wrong information of the mask M1 on the display unit 12a, and it is possible to display an appropriate second detected portion MBa on the display unit 12a of the mask adapter 10. As a result, it is possible to further prevent the information read by the reader in the exposure apparatus EX from becoming inappropriate information, and it is possible to further improve the exposure accuracy of the exposure apparatus EX.
  • the second detected portion MBa displayed on the display portion 12a of the mask adapter 10 is forgotten to be erased after removing the mask M1 from the mask adapter 10, the second detected portion MBa remains displayed.
  • the information on the display unit 12a may not be overwritten. Therefore, the second detected portion MBa different from the second detected portion MBa of the mask M1 attached to the mask adapter 10 may remain displayed on the display unit 12a.
  • the mask adapter installation tool 20 is also a tool for removing the mask M1 from the mask adapter 10, and the third detection for detecting that the mask M1 has been removed from the mask adapter 10.
  • the unit 28 is provided. Then, when the writing unit 27 detects that the mask M1 is removed from the mask adapter 10 by the third detection unit 28, the display unit 12a erases the display. Therefore, when removing the mask M1 from the mask adapter 10, it is possible to suppress forgetting to erase the second detected portion MBa displayed on the display unit 12a. Therefore, it is possible to prevent the second detected portion MBa for the different mask M1 from being displayed on the display unit 12a. As a result, it is possible to further prevent the information read by the reader in the exposure apparatus EX from becoming inappropriate information, and it is possible to further improve the exposure accuracy of the exposure apparatus EX.
  • the mask adapter installation tool 20 includes the lifting device 23 that moves the mask M1 in the vertical direction Z, and the lifting device 23 lowers the mask M1 located above the mask adapter 10,
  • the mask M1 is arranged inside the mask adapter 10 having a frame shape surrounding the periphery of the mask M1 in a plan view. Therefore, the mask M1 smaller than the mask adapter 10 can be moved to attach the mask M1 to the mask adapter 10. Therefore, it is easier to attach the mask M1 to the mask adapter 10 as compared with the case where the mask adapter 10 is moved and attached to the mask M1.
  • the embodiments of the present invention are not limited to the above-described embodiments, and the following configurations can be adopted.
  • the first detection target is not particularly limited as long as it can read information by a reader and includes information about the mask adapter.
  • the second detected part is not particularly limited as long as it can read information by a reader, includes information about a mask attached to the mask adapter, and can be displayed on the display part.
  • the third detected portion is not particularly limited as long as the information can be read by the reader and includes information about the mask.
  • the first detected portion, the second detected portion, and the third detected portion may be a one-dimensional code such as the above-mentioned bar code, a two-dimensional code, or characters and numbers. May be
  • the first detected part and the third detected part may be IC chips or the like.
  • the information included in the second detected part and the information included in the third detected part may be different from each other as long as the information includes mask information.
  • the writing unit of the mask adapter installation tool may cause the display unit to display only a part of the information about the mask read by the reading unit from the third detected unit as the second detected unit.
  • At least one piece of information about the mask adapter included in the first detected portion is enough. At least one piece of information about the mask included in the second detected portion may be provided. At least one piece of information about the mask included in the third detected portion may be present. The information regarding the mask may include control information for controlling the mask in the exposure apparatus. The first detected part may not be provided.
  • the recognized part is not particularly limited as long as it is a part used to identify that the mask adapter is attached to the mask.
  • the recognized part may be a part that absorbs light.
  • the first recognized portion 18a of the above-described embodiment has a horizontal surface in the first direction X and the second direction Y instead of the inclined surface like the reflecting portion 18c, and reflects on the horizontal surface.
  • the structure may be such that an prevention film is provided.
  • the first recognized portion 18a may include a passage portion (first passage portion) through which the light SL emitted from the sensor S1 passes. In this case, since the light SL of the sensor S1 passes through the passing portion of the first recognized portion 18a, the sensor S1 is in the OFF state.
  • the passage portion (first passage portion) of the first recognized portion 18a may be a through hole that penetrates the mask adapter 10 in the up-down direction Z similarly to the second recognized portion 18b, or may be a notch.
  • the first recognized portion 18a is not particularly limited as long as the light SL emitted from the sensor S1 does not enter the light receiving portion of the sensor S1.
  • the second recognized portion 18b of the above-described embodiment need not be a through hole and may be a notch. Further, the second recognized portion 18b may have an inclined surface like the first recognized portion 18a, or a surface provided with an antireflection film horizontally in the first direction X and the second direction Y. May have. That is, the second recognized portion 18b is not particularly limited as long as the light SL emitted from the sensor S2 does not enter the light receiving portion of the sensor S2. The recognized part may not be provided.
  • the display section is not particularly limited as long as it can display the second detected section.
  • the display unit may be a liquid crystal display or an organic electroluminescence display. The display unit may not be provided. Instead of the display unit, a seal on which the second detected portion MBa is printed may be provided.
  • the mask adapter 10 has been described as a frame-shaped member surrounding the four sides of the mask M1 in the above-described embodiment, but the invention is not limited to this.
  • the mask adapter may be U-shaped surrounding the three sides of the mask.
  • the U-shaped mask adapter that surrounds the three sides of the mask is, for example, the mask adapter in the state where there is no one of the third side portion 11c and the fourth side portion 11d in the mask adapter 10 of the above-described embodiment. Is.
  • the mask adapter is formed in a state where both the third side portion 11c and the fourth side portion 11d are absent in the mask adapter 10 of the above-described embodiment, that is, is formed only by the first side portion 11a and the second side portion 11b.
  • the configuration may be different.
  • the exposure apparatus may have a sensor that measures the position of the mask in the first direction X with respect to the mask adapter. By using the sensor, the position of the mask in the first direction X with respect to the mask adapter can be
  • the mask adapter may be formed by only one of the first side portion 11a and the second side portion 11b in the mask adapter 10 of the above-described embodiment.
  • the mask stage supports the mask on one side in the second direction Y of the mask assembly and supports the mask adapter on the other side in the second direction Y.
  • a mask assembly is provided on both sides of the mask in the second direction Y, and a case where the mask adapter is provided on only one side of the mask in the second direction Y.
  • the control device may control each projection optical system based on the bending shape.
  • the mask adapter when the exposure apparatus includes the mask stage that supports both ends of the mask assembly in the first direction X, the mask adapter includes only the third side portion 11c and the fourth side portion 11d in the mask adapter 10 of the above-described embodiment. It may be configured, or may be configured by only one of the third side portion 11c and the fourth side portion 11d.
  • the mask adapter is a device that can change the size of the mask M1 so that the mask assembly can be supported by the mask stage, as in the case where the mask M2 that is handled alone is supported by the mask stage. It is not particularly limited.
  • the identification information may include information that identifies the orientation of the mask.
  • the mask assembly has, for example, different dimensions in the first direction X and the second direction Y, like the mask assembly MA shown in FIG. 3A and the like.
  • the identification information is arranged on the mask stage such that the long side of the mask assembly is parallel to the first direction X (the short side is parallel to the second direction Y), or the long side of the identification information is the second side. It may include information for identifying whether the mask stage is arranged so as to be parallel to the direction Y (short side is parallel to the first direction X).
  • the control device CONT may detect the orientation when the mask assembly MA is placed on the mask stage MST using the sensors S4 and S5.
  • the control device CONT may detect the orientation when the mask assembly MA is placed on the mask stage MST using the sensors S4 and S5.
  • the long side of the mask assembly MA is arranged in parallel with the second direction Y
  • the light from the emission part S5a of the sensor S5 is not reflected by the mask assembly MA and is not reflected. Therefore, the light receiving portion of the sensor S5 does not receive light, and the sensor S5 is in the OFF state.
  • the light from the emitting portion S4a of the sensor S4 is reflected by the mask adapter 10, and the light receiving portion of the sensor S4 receives the reflected light. Therefore, the sensor S4 is turned on.
  • the control device CONT can detect the orientation of the mask assembly MA mounted on the mask stage MST from the respective states of the sensor S4 and the sensor S5. In this case, the control device CONT may detect that the mask assembly MA is arranged on the mask stage MST before the mask M is arranged on the mask stage MST.
  • the position of the mask assembly MA supported by the mask stage MST varies depending on the orientation when the mask assembly MST is placed.
  • the position of the mask stage MST in the second direction Y may be changed by configuring the mask stage MST with the configuration disclosed in Japanese Patent Publication No. 5,626,206.
  • the amount of bending of the mask assembly MA in the YZ plane varies depending on the orientation of the mask assembly MA when it is placed on the mask stage MST.
  • the control unit CONT controls each part of each projection optical system in the projection unit PL based on the difference in the bending amount according to the direction in which the mask assembly MA is arranged, and the number of projection optical systems that shields light and each projection optical system. It is advisable to control the focus position, shift amount, etc.
  • the identification information may also include information that specifies the direction in which the mask M1 is attached to the mask adapter 10.
  • the control unit CONT may adjust each projection optical system of the projection unit PL before exposure or adjust the position of the substrate stage PST during exposure based on this identification information.
  • the mask adapter mounting tool is not particularly limited as long as it is a tool used for mounting the mask on the mask adapter.
  • the mask adapter installation tool need not be the tool used to remove the mask from the mask adapter.
  • the mask adapter installation tool may have a portion that is manually moved by an operator as in the above-described embodiment, or may be fully automatically installed.
  • the mask adapter attachment tool may attach the mask to the mask adapter by moving the mask adapter.
  • the mask adapter installation tool may remove the mask from the mask adapter by moving the mask adapter.
  • the reading unit may be a handy scanner or the like separated from the mask adapter installation tool.
  • the reading unit may not be provided.
  • the detection unit provided in the mask adapter installation tool may be able to detect that the mask is fixed to the mask adapter by the above-described first positioning unit and second positioning unit, for example.
  • the detection unit may not be provided.
  • control device CONT may send each piece of identification information to a device other than the exposure device EX, such as a coater for applying a resist to the substrate P or a developer for developing the substrate P exposed by the exposure device EX. ..
  • the coater may change the type of resist to be coated on the substrate P, the coating amount, the thickness, and the like, based on the identification information received from the exposure apparatus EX.
  • the developer may appropriately change the developing method, the cleaning method of the substrate P, and the like based on each identification information.
  • the projection optical system provided in the projection unit PL may be a unity magnification system, a reduction system, or an enlargement system.
  • the exposure apparatus EX of the above-described embodiment may be a step-and-scan projection exposure apparatus that is an exposure target, a so-called scanner, or a stepper-type exposure apparatus that has a projection area of approximately the same size as the exposure target area. Good.
  • the exposure apparatus EX may be an exposure apparatus for a liquid crystal that transfers a liquid crystal display element pattern onto a rectangular glass plate, and is also applicable to an exposure apparatus for manufacturing an organic EL (Electro-Luminescence) panel, for example.
  • the exposure apparatus EX of the above-described embodiment manufactures not only microdevices such as semiconductor elements, but also masks or reticles used in light exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, electron beam exposure apparatuses, and the like. Therefore, it can be applied to an exposure apparatus that transfers a circuit pattern onto a glass substrate, a silicon wafer, or the like.
  • the substrate P to be exposed in the above-described exposure apparatus EX is not limited to the glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or a mask blank. Further, when the exposure target is the substrate P for a flat panel display as in the above-described embodiment, the thickness of the substrate P is not particularly limited.
  • the substrate P may be, for example, in the form of a film (a flexible sheet-shaped member).
  • the exposure apparatus EX of the above-described embodiment is particularly effective when the substrate P whose one side length or diagonal length is 500 mm or more is an exposure target. When the substrate P that is the exposure target is a flexible sheet, the sheet-shaped substrate P may be formed in a roll shape.
  • the step of designing the function/performance of the device the step of producing a mask (or reticle) based on this design step, the step of producing a glass substrate (or wafer)
  • the above-mentioned exposure method is executed by using the exposure apparatus of the above-described embodiment, and the device pattern is formed on the glass substrate, so that a highly integrated device can be manufactured with high productivity. ..
  • SYMBOLS 10 Mask adapter, 11... Frame part (supported part), 12a... Display part, 13... 1st detected part, 16... Support part, 18a... 1st recognized part, 18b... 2nd recognized part, 18c ... Reflecting part, 20... Mask adapter mounting tool, 23... Lifting device, 26... Second detecting part, 27... Writing part, 28... Third detecting part, EX... Exposure device, H2... Conveying device, M, M1, M2 Mask, MB... Third detected part, MBa... Second detected part, MST... Mask stage (stage), P... Substrate, S1... Sensor (first sensor), S4... Sensor (second sensor), Z ... Vertical direction

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
PCT/JP2020/003936 2019-02-06 2020-02-03 マスクアダプタ、マスクアダプタ取付工具、露光装置、およびデバイス製造方法 Ceased WO2020162396A1 (ja)

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KR1020217023186A KR20210122240A (ko) 2019-02-06 2020-02-03 마스크 어댑터, 마스크 어댑터 장착 공구, 노광 장치, 및 디바이스 제조 방법
CN202080010606.7A CN113330370B (zh) 2019-02-06 2020-02-03 掩模配接器、其安装工具、曝光装置以及元件制造方法
CN202410317332.6A CN118068658A (zh) 2019-02-06 2020-02-03 掩模配接器以及元件制造方法
JP2020571184A JP7517155B2 (ja) 2019-02-06 2020-02-03 マスクアダプタ、マスクアダプタ取付工具、露光装置、およびデバイス製造方法

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI868646B (zh) * 2023-03-30 2025-01-01 家碩科技股份有限公司 降低粉塵汙染的光罩內盒承載裝置及光罩內盒的光學檢查設備
CN120044767A (zh) * 2025-04-23 2025-05-27 新毅东(北京)科技有限公司 掩模板预对准装置及晶圆曝光设备
TWI894069B (zh) * 2024-12-10 2025-08-11 華洋精機股份有限公司 光罩圖樣面朝下之光罩移載裝置
KR20250154245A (ko) 2024-04-19 2025-10-28 캐논 가부시끼가이샤 노광 장치, 노광 방법 및 물품의 제조 방법

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230109818A (ko) * 2022-01-13 2023-07-21 삼성디스플레이 주식회사 마스크, 이를 포함하는 마스크 조립체, 및 기판 이송 설비

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6433927A (en) * 1987-07-30 1989-02-03 Canon Kk Mask holder and mask conveying method using the same
JPH0248196A (ja) * 1988-06-15 1990-02-16 Canon Inc 搬送装置
JPH06325996A (ja) * 1993-05-12 1994-11-25 Hitachi Ltd レティクルフレーム
JPH07130607A (ja) * 1993-06-29 1995-05-19 Nikon Corp 露光装置
JPH11219884A (ja) * 1998-02-03 1999-08-10 Rohm Co Ltd 投影露光装置における露光マスクサイズ変換用治具の構造
JPH11288099A (ja) * 1998-04-03 1999-10-19 Nippon Densan Shinpo Kk 露光装置
US20030086069A1 (en) * 2001-11-02 2003-05-08 Nikolaus Maier Device for aligning masks in photolithography
JP2004531923A (ja) * 2001-01-12 2004-10-14 ビジブル テクノーレッジー， エルエルシー 電子インクを使用したスマート電子ラベル
JP2007222754A (ja) * 2006-02-22 2007-09-06 Hoya Corp スピン洗浄装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001033943A (ja) 1999-07-23 2001-02-09 Mitsubishi Electric Corp マスク装置
JP2004165249A (ja) 2002-11-11 2004-06-10 Sony Corp 露光装置及び露光方法
US7236233B2 (en) 2003-10-27 2007-06-26 Asml Netherlands B.V. Assembly of a reticle holder and a reticle
US20100085554A1 (en) 2008-10-02 2010-04-08 Fan Chih-Shen Adaptor of an aligner system
JP5334675B2 (ja) 2009-05-13 2013-11-06 株式会社日立ハイテクノロジーズ プロキシミティ露光装置、プロキシミティ露光装置のマスクの位置ずれ防止方法、及び表示用パネル基板の製造方法

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6433927A (en) * 1987-07-30 1989-02-03 Canon Kk Mask holder and mask conveying method using the same
JPH0248196A (ja) * 1988-06-15 1990-02-16 Canon Inc 搬送装置
JPH06325996A (ja) * 1993-05-12 1994-11-25 Hitachi Ltd レティクルフレーム
JPH07130607A (ja) * 1993-06-29 1995-05-19 Nikon Corp 露光装置
JPH11219884A (ja) * 1998-02-03 1999-08-10 Rohm Co Ltd 投影露光装置における露光マスクサイズ変換用治具の構造
JPH11288099A (ja) * 1998-04-03 1999-10-19 Nippon Densan Shinpo Kk 露光装置
JP2004531923A (ja) * 2001-01-12 2004-10-14 ビジブル テクノーレッジー， エルエルシー 電子インクを使用したスマート電子ラベル
US20030086069A1 (en) * 2001-11-02 2003-05-08 Nikolaus Maier Device for aligning masks in photolithography
JP2007222754A (ja) * 2006-02-22 2007-09-06 Hoya Corp スピン洗浄装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI868646B (zh) * 2023-03-30 2025-01-01 家碩科技股份有限公司 降低粉塵汙染的光罩內盒承載裝置及光罩內盒的光學檢查設備
KR20250154245A (ko) 2024-04-19 2025-10-28 캐논 가부시끼가이샤 노광 장치, 노광 방법 및 물품의 제조 방법
TWI894069B (zh) * 2024-12-10 2025-08-11 華洋精機股份有限公司 光罩圖樣面朝下之光罩移載裝置
CN120044767A (zh) * 2025-04-23 2025-05-27 新毅东(北京)科技有限公司 掩模板预对准装置及晶圆曝光设备

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JPWO2020162396A1 (ja) 2021-12-02
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