WO2020093426A1 - 一种使石墨烯水平平铺自组装形成石墨烯膜的方法 - Google Patents
一种使石墨烯水平平铺自组装形成石墨烯膜的方法 Download PDFInfo
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- WO2020093426A1 WO2020093426A1 PCT/CN2018/115441 CN2018115441W WO2020093426A1 WO 2020093426 A1 WO2020093426 A1 WO 2020093426A1 CN 2018115441 W CN2018115441 W CN 2018115441W WO 2020093426 A1 WO2020093426 A1 WO 2020093426A1
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 182
- 229910021389 graphene Inorganic materials 0.000 title claims abstract description 182
- 238000000034 method Methods 0.000 title claims abstract description 64
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims abstract description 48
- 238000000967 suction filtration Methods 0.000 claims abstract description 22
- 239000000243 solution Substances 0.000 claims abstract description 20
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000007864 aqueous solution Substances 0.000 claims abstract description 5
- 238000002156 mixing Methods 0.000 claims abstract description 3
- 238000001338 self-assembly Methods 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 21
- 239000000725 suspension Substances 0.000 claims description 20
- 239000012528 membrane Substances 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 238000001035 drying Methods 0.000 claims description 7
- 230000032798 delamination Effects 0.000 claims description 4
- 238000003475 lamination Methods 0.000 claims description 2
- 238000010008 shearing Methods 0.000 claims description 2
- 238000006722 reduction reaction Methods 0.000 abstract description 6
- 238000002360 preparation method Methods 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 230000000694 effects Effects 0.000 abstract description 2
- 238000009776 industrial production Methods 0.000 abstract description 2
- 239000002994 raw material Substances 0.000 abstract description 2
- 239000002699 waste material Substances 0.000 abstract description 2
- 239000003153 chemical reaction reagent Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 10
- 239000007788 liquid Substances 0.000 description 6
- 238000005507 spraying Methods 0.000 description 5
- 238000001962 electrophoresis Methods 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 229920002678 cellulose Polymers 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Chemical compound [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000001652 electrophoretic deposition Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000005087 graphitization Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000009210 therapy by ultrasound Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/194—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2204/00—Structure or properties of graphene
- C01B2204/04—Specific amount of layers or specific thickness
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2204/00—Structure or properties of graphene
- C01B2204/20—Graphene characterized by its properties
- C01B2204/22—Electronic properties
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/40—Electric properties
Definitions
- the invention belongs to the technical field of new energy material preparation, and relates to a method for horizontally tiling graphene to self-assemble to form a graphene film.
- Graphene is widely used in research fields such as transparent conductive films, electromagnetic shielding films, and thermally conductive heat dissipation films due to its outstanding physical and chemical properties and unique two-dimensional structure of a single atomic layer.
- Chen's group prepared the rGO film by spin coating method combined with thermal reduction, which can be used as a conductive transparent electrode [ACS Nano, 2008, 2: 463-470].
- Mullen's group used dip coating to assemble GO onto the quartz wafer, and thermally reduced the rGO film that can be used as a transparent conductive electrode [Nano Lett, 2008, 8: 323-327].
- the research group Zheng used the method of volatilization-induced self-assembly combined with high-temperature annealing graphitization to prepare ultra-thin flexible graphene films [AdvFunct Mater, 2014, 24: 4542-4548].
- the film exhibited excellent electromagnetic shielding efficiency as high as 20dB, while also exhibiting excellent thermal conductivity (up to 1100W m -1 K -1 ).
- the film-forming technology of graphene films is particularly important.
- the related research work on the regulation of the microscopic assembly structure of the building block graphene still needs to be supplemented and improved.
- Direct methods include silicon carbide or metal surface epitaxial growth method and chemical vapor deposition (CVD) method.
- CVD chemical vapor deposition
- the direct method can obtain a graphene film with good quality and stable performance, it requires high equipment, and the obtained film often has difficulties in transferring to other substrates, so it is not easy to achieve large-scale applications.
- Indirect methods include vacuum suction filtration method, spray coating method, spin coating method, electrophoresis method, self-assembly method, etc.
- the indirect method such as first preparing graphene and then forming a film does not require complicated equipment and has low cost, so it is relatively easy to implement large-scale applications.
- a common vacuum suction filtration method is to adjust the concentration of the graphene / graphene oxide aqueous solution to a desired concentration, and then perform rapid vacuum suction filtration. If the thickness of the prepared film is large, it can be transferred directly; if the thickness of the film is small, the solvent can be used to dissolve the filter membrane before being transferred to a suitable substrate.
- Vacuum-filtered different volumes of graphene oxide aqueous dispersion with mixed cellulose ester film to obtain graphene oxide film on the mixed cellulose ester film.
- the graphene oxide film was transferred to glass On the substrate or plastic substrate, the graphene film was successfully obtained after chemical reduction and thermal annealing treatment [Nature Nanotech, 2008, 3 (5): 270-274].
- the spraying method is to spray the graphene dispersion liquid onto the preheated substrate with a spray gun, and the graphene film can be obtained after the solvent is volatilized.
- Gilje et al. Sprayed graphene oxide dissolved in water onto the SiO 2 / Si substrate by spraying method, and obtained a graphene film after reduction [Nano Lett, 2007, 7 (11): 3394-3398].
- the spin coating method is to drop the graphene solution onto the rotating substrate, and the graphene solution can be spread evenly on the substrate by adjusting the rotation speed of the substrate, and the graphene film can be obtained after drying.
- Robinson et al. Added graphene oxide suspension droplets onto SiO 2 / Si substrates and dried them with N 2 to prepare relatively flat graphene films [Nano Lett, 2008, 8 (10): 3441-3445].
- Graphene oxide has more polar oxygen-containing groups, so it has good suspendability in polar solvents and can be charged.
- the graphene oxide film can be prepared by the electrophoretic properties of the graphene oxide suspension. Graphene can be charged and become a stable suspension after treatment. Under certain conditions, graphene can also be electrophoretically deposited with polymers to obtain composite films. Wu et al. Obtained graphene / isopropanol dispersion by ultrasonic treatment. The addition of magnesium nitrate aqueous solution can make the graphene sheet positively charged, and then the graphene film can be formed on the surface of the ITO conductive glass by electrophoretic deposition [AdvMater, 2009, 21 (17): 1756-1760].
- the self-assembly method is to use the physical and chemical properties of the interface where graphene is located, so that graphene is arranged and combined spontaneously at the interface.
- Chen et al. Used self-assembly method to synthesize graphene oxide film.
- the graphene oxide suspension is heated in a constant temperature water bath to form a condensed film very quickly at the liquid air boundary, and then the suspension under the film is poured out and dried to obtain a graphene oxide film [AdvMater, 2009, 21 (29): 3007-3011].
- the vacuum suction filtration method is simple and efficient, but the existing vacuum suction filtration method can only orient the graphene horizontally, but cannot control the orientation of the (002) plane of the graphene, that is, the graphene cannot be spread as horizontally as possible, so the suction filtration
- the obtained graphene film has a layered structure at the micrometer scale, but at the nanometer scale, its elementary graphene will generate many folds due to its forced compression by external force.
- the presence of folds greatly increases the voids and specific surface area inside the graphene film , Increase the contact resistance and phonon scattering between the sheets, and ultimately lead to the loss of electrical and thermal conductivity; spraying method and suspension coating method can prepare a large area of graphene film, but the microstructure of the graphene film is disordered, The random stacking of elementary graphene causes a lot of contact resistance and phonon scattering, resulting in poor electrical and thermal conductivity of the graphene film; the electrophoresis method is easy to operate, easy to control, low in cost, and suitable for large-scale preparation.
- the prepared film is relatively uniform, but its elementary graphene is freely oriented, and many graphene edges are exposed on the surface of the graphene film, indicating that there are Large contact resistance and phonon scattering.
- the self-assembly method is simple and easy, and can make the graphene oxide tile on the liquid surface.
- the (002) planes of graphene oxide are parallel to each other, and the obtained graphene oxide film exhibits good uniformity and controllability.
- graphene oxide is used as an intermediate, subsequent complicated reduction treatment will destroy the original regularity and leveling.
- the paved microstructure causes loss of electrical and thermal conductivity.
- the object of the present invention is to provide a method for horizontally tiling graphene to self-assemble to form a graphene film.
- a graphene film whose (002) planes of graphene are parallel to each other.
- the invention discloses a method for horizontally self-assembling graphene to form a graphene film.
- Toluene and alcohol are added to an aqueous solution of graphene in proportion and mixed thoroughly, and then poured into a vacuum suction filter device; to be suction filtered
- a vacuum suction filter device to be suction filtered
- graphene is confined at the interface and spread horizontally under the action of shear force at the interface.
- the (002) plane of graphene tends to be parallel to the interface, and graphene occurs
- the graphene film is formed by self-assembly.
- the suction filter device is started to draw out the solution, and the graphene film on the microscopic level with the (002) plane of the graphene parallel to each other is obtained on the filter paper.
- the above method for horizontally tiling graphene to self-assemble to form a graphene film includes the following steps:
- the mixture A is poured into the vacuum suction filtration device immediately after mixing.
- the graphene transfers to the delamination interface until it is finally limited to all At the interface, graphene spontaneously tiles horizontally and drifts freely under the action of the interface shearing force, and its (002) plane tends to be parallel to the interface, while performing highly oriented self-assembly;
- the concentration of graphene in the graphene suspension is 0.01-2 mg / mL.
- the volume ratio of water to toluene is ⁇ 1: 8; the volume ratio of alcohol to toluene is 1: 8 to 2: 1.
- step 3 the mixture A is processed under the condition that the ultrasonic power is 30-60W for 5-30s.
- step 3 the waiting time for observing the delamination phenomenon of mixture A is 0.5 to 5 min.
- the drying temperature is 25-80 ° C, and the drying time is 2-24 hours.
- the method further includes repeating steps 2) to 4) to control the thickness of the graphene film by controlling the number of times of lamination.
- the present invention has the following beneficial effects:
- the method disclosed in the present invention can effectively control the micro-assembly structure of graphene film, can make graphene tile as horizontally as possible, and form graphene films with (002) planes of graphene parallel to each other on the micro level; the whole process is Physical process, no chemical reaction, simple process; the toluene and alcohol used are inexpensive and can be reused after purification; the required equipment is only a common vacuum suction filter device, and the cost is low; there is no raw material waste in the film making process, and the yield is 100%; Direct use of graphene avoids the subsequent reduction reaction required for the use of graphene oxide, and the product quality is good; the entire production cycle takes only a few minutes and the production efficiency is high; suitable for industrial production.
- the graphene film prepared by the invention not only has the (002) planes of graphene parallel to each other on the microstructure level, but also is uniform and dense overall on the macroscopic level.
- the transparency of the transparent conductive film is greatly improved and the square resistance is reduced after adopting the present invention.
- the square resistance of the graphene film decreases after adopting the invention, and the thermal conductivity and air tightness are significantly improved.
- the invention can repeat the entire film-forming step multiple times on the same area, and the thickness of the graphene film can be controlled by controlling the number of superimposed layers so that the thickness can be adjusted accurately.
- Figure 2 is a graphene film obtained by suction filtration of 5 layers, and the (002) planes of graphene on the micro level are parallel to each other;
- FIG. 3 is a comparison graph of the same amount of graphene obtained by the ordinary suction filtration method (a) and the method (b) of the present invention.
- the present invention provides a method for horizontally tiling graphene to self-assemble to form a graphene film, which includes the following steps:
- the concentration range of graphene is 0.01 ⁇ 2mg / ml, preferably the concentration range is 0.5 ⁇ 1mg / ml;
- step b) Take out a certain amount of the suspension in step a), add water, alcohol and toluene, adjust the amount of these three liquids to achieve a predetermined suitable volume ratio between the three, and get mixture A; the volume of water and toluene The ratio should be greater than or equal to 1: 8, no upper limit; the volume ratio of alcohol to toluene is between 1: 8 and 2: 1; the preferred volume ratio of water, alcohol and toluene is 1: 1: 2;
- Ultrasonic and oscillate mixture A wait until it is evenly mixed in a short time, and then pour it into the suction filter device; the ultrasonic power is between 30W and 60W, and the time is between 5-30s;
- the waiting time range is 0.5 to 5min, preferably the waiting time is 1 to 2min;
- the filter membrane Dry the filter membrane to obtain graphene membranes whose (002) planes of graphene are parallel to each other on the micro level; the drying temperature range is 25 ⁇ 80 °C, preferably the temperature is 60 °C; the drying time range is 2 ⁇ 24h , The preferred time is 12h.
- step b) Take out 1mL of the suspension prepared in step a), add water, alcohol and toluene to it, adjust the dosage of these three liquids to achieve a predetermined suitable volume ratio of 1: 1: 2 between the three to obtain a mixture A;
- step i) Take out 5mL of the suspension in step a), directly filter the membrane with the same suction filtration device, and dry at 60 ° C for 12h to obtain graphene membrane No. 2.
- step b) Take out 1mL of the suspension in step a), add water, alcohol, and toluene, adjust the dosage of these three liquids so that the predetermined suitable volume ratio between the three is 2: 1: 4, and mixture A is obtained;
- step i) Take out 5mL of the suspension in step a), directly filter the membrane with the same suction filtration device, and dry at 60 ° C for 12h to obtain graphene membrane 2.
- the invention reduces the square resistance of the graphene film by 40%, and significantly improves the electrical conductivity.
- FIG. 3 a comparison graph of membranes obtained by the same amount of graphene under the ordinary suction filtration method (a) and the method (b) of the present invention, as can be seen from the figure, obtained by using the method of the present invention
- the coverage area of the membrane is much larger than that obtained by the ordinary suction filtration method, which shows that the present invention has the effect of promoting the graphene sheets to spread as horizontally as possible (the 002 planes are parallel to each other).
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Abstract
Description
Claims (8)
- 一种使石墨烯水平平铺自组装形成石墨烯膜的方法,其特征在于,向石墨烯水溶液中按比例加入甲苯、酒精后充分混合均匀,然后倒入真空抽滤装置中;待抽滤瓶中的溶液形成上下分层的溶液体系时,石墨烯被限制在界面处,并在界面处剪切力的作用下水平铺展,石墨烯的(002)面趋于和界面平行,石墨烯发生自组装形成石墨烯膜,此时启动抽滤装置抽掉溶液,则在滤纸上获得在微观层面上石墨烯的(002)面相互平行的石墨烯膜。
- 根据权利要求1所述的一种使石墨烯水平平铺自组装形成石墨烯膜的方法,其特征在于,包括以下步骤:1)将石墨烯分散在水中,超声处理,得到石墨烯悬浮液;2)向石墨烯悬浮液中按比例加入甲苯、酒精和水,充分混合,得到混合物A;3)将混合物A进行短时间的超声、振荡处理,待其混合均匀后即刻倒入真空抽滤装置中,待观察混合物A发生分层现象,石墨烯向分层界面处转移直至最终全部限制在界面处,石墨烯在界面剪切力度作用下自发水平平铺、自由漂移,其(002)面趋于和界面平行,同时进行高度取向的自组装;4)自组装完成后,在界面处形成稳定均匀的石墨烯膜,启动真空抽滤装置,将溶液抽除,界面处的石墨烯膜整体缓缓下降并最终完整附着在滤纸表面;5)将滤膜烘干,得到在微观层面上石墨烯的(002)面相互平行的石墨烯膜。
- 根据权利要求2所述的使石墨烯水平平铺自组装形成石墨烯膜的方法,其特征在于,步骤1)中,石墨烯悬浮液中石墨烯的浓度为0.01~2mg/mL。
- 根据权利要求2所述的使石墨烯水平平铺自组装形成石墨烯膜的方法,其特征在于,混合物A中,水与甲苯的体积比≥1:8;酒精与甲苯的体积比为1:8~2:1。
- 根据权利要求2所述的使石墨烯水平平铺自组装形成石墨烯膜的方法, 其特征在于,步骤3)中,将混合物A在超声功率为30~60W的条件下,处理5~30s。
- 根据权利要求2所述的使石墨烯水平平铺自组装形成石墨烯膜的方法,其特征在于,步骤3)中,观察混合物A发生分层现象的等待时间为0.5~5min。
- 根据权利要求2所述的使石墨烯水平平铺自组装形成石墨烯膜的方法,其特征在于,步骤5)中,烘干温度为25~80℃,烘干时间为2~24h。
- 根据权利要求2所述的使石墨烯水平平铺自组装形成石墨烯膜的方法,其特征在于,还包括重复步骤2)~步骤4)的操作,通过控制层叠次数控制石墨烯膜的厚度。
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