WO2020062045A1 - 金刚石涂层氮化硅陶瓷整体刀具及其制备方法与刀具在石墨中的应用 - Google Patents

金刚石涂层氮化硅陶瓷整体刀具及其制备方法与刀具在石墨中的应用 Download PDF

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Publication number
WO2020062045A1
WO2020062045A1 PCT/CN2018/108380 CN2018108380W WO2020062045A1 WO 2020062045 A1 WO2020062045 A1 WO 2020062045A1 CN 2018108380 W CN2018108380 W CN 2018108380W WO 2020062045 A1 WO2020062045 A1 WO 2020062045A1
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Prior art keywords
diamond
silicon nitride
nitride ceramic
tool
cutter
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PCT/CN2018/108380
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English (en)
French (fr)
Inventor
王成勇
周玉海
郑李娟
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Guangdong University of Technology
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Guangdong University of Technology
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Priority to JP2021517244A priority Critical patent/JP7360202B2/ja
Priority to PCT/CN2018/108380 priority patent/WO2020062045A1/zh
Publication of WO2020062045A1 publication Critical patent/WO2020062045A1/zh
Anticipated expiration legal-status Critical
Priority to US17/214,979 priority patent/US12617023B2/en
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23C—MILLING
    • B23C5/00—Milling-cutters
    • B23C5/02—Milling-cutters characterised by the shape of the cutter
    • B23C5/10—Shank-type cutters, i.e. with an integral shaft
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
    • B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
    • B23B27/148—Composition of the cutting inserts
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5001—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with carbon or carbonisable materials
    • C04B41/5002—Diamond
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/85—Coating or impregnation with inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0254—Physical treatment to alter the texture of the surface, e.g. scratching or polishing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/271—Diamond only using hot filaments
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B2226/00—Materials of tools or workpieces not comprising a metal
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B2226/00—Materials of tools or workpieces not comprising a metal
    • B23B2226/31—Diamond
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
    • B23B2228/10—Coatings
    • B23B2228/105—Coatings with specified thickness
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23C—MILLING
    • B23C2210/00—Details of milling cutters
    • B23C2210/04—Angles
    • B23C2210/0407—Cutting angles
    • B23C2210/0442—Cutting angles positive
    • B23C2210/0457—Cutting angles positive radial rake angle
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23C—MILLING
    • B23C2210/00—Details of milling cutters
    • B23C2210/04—Angles
    • B23C2210/0485—Helix angles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23C—MILLING
    • B23C2210/00—Details of milling cutters
    • B23C2210/08—Side or top views of the cutting edge
    • B23C2210/082—Details of the corner region between axial and radial cutting edges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23C—MILLING
    • B23C2210/00—Details of milling cutters
    • B23C2210/20—Number of cutting edges
    • B23C2210/203—Number of cutting edges four
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23C—MILLING
    • B23C2226/00—Materials of tools or workpieces not comprising a metal
    • B23C2226/18—Ceramic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23C—MILLING
    • B23C2226/00—Materials of tools or workpieces not comprising a metal
    • B23C2226/31—Diamond
    • B23C2226/315—Diamond polycrystalline [PCD]

Definitions

  • the invention relates to the field of ceramic tools, in particular to a diamond-coated silicon nitride ceramic integral tool, a preparation method thereof and application of the tool in graphite.
  • Ceramic tools are widely used in high-speed dry machining of various hard and brittle materials due to their excellent chemical stability and good mechanical properties.
  • silicon nitride Si 3 N 4
  • Si 3 N 4 tools have the characteristics of high strength, good fracture toughness, less crack initiation, and low cost. However, they have high wear rates and short tool life. , Especially cutting hardened steel and cold brittle cast iron difficult to machine materials, thus limiting the promotion and application of Si 3 N 4 tools.
  • Chemical vapor deposition (CVD) diamond films are widely used in various tools due to their excellent chemical and physical properties, as well as extremely high hardness, excellent wear resistance and chemical stability. This method combines the advantages of the coating material and the substrate of the silicon nitride ceramic cutting tool, and the coated tool has good cutting performance.
  • Cemented carbide (WC-Co) and silicon nitride ceramics Si 3 N 4 are the two main substrate materials for preparing coated tools.
  • WC-Co needs to pretreat the substrate. It is necessary to remove cobalt (Co) by etching to improve the bonding force between the diamond film and the WC-Co substrate.
  • the presence of the Co phase on the surface of the cemented carbide is not conducive to nucleation of the diamond coating and will reduce the bonding force between the coating and the substrate.
  • the substrate In order to obtain high nucleation density and coating quality, the substrate must be subjected to coating deposition. Pre-processing.
  • Isotropic graphite produced by the CIP (Cold Isostatic Pressing) process has excellent mechanical and physical properties such as high compressive strength and uniform physical and chemical properties. It is widely used in mold EDM machining. Electron Discharge Machining (EDM) graphite electrodes, solar cell manufacturing equipment, aerospace and other fields. At present, high-speed processing has the advantages of fast cutting speed and high processing quality, and has become the main processing method for precision graphite parts with complex shapes and fine structures.
  • Graphite is a typical brittle material with a layered structure. Hard graphite materials are directly brittlely fractured during high-speed cutting to produce fine-grained chipping chips, which are easy to bond and accumulate on the front and rear blade surfaces and the processed surface. They are easy to chip and wear during processing Serious, is a typical difficult to process materials.
  • the CVD diamond film coating on the surface of the ceramic tool substrate improves the cutting and wear interface conditions of the tool. It has the advantages of extremely high hardness and wear resistance, high thermal conductivity, and low thermal expansion coefficient.
  • most researches on ceramic coated tools focus on the mechanism of ceramic blade turning.
  • a TiN coating was prepared on the ceramic substrate, and hard turning was performed under dry cutting conditions. It was found that the processing cost of the coated ceramic tool was low and the surface quality of the workpiece was good.
  • the Si 3 N 4 substrate was used to prepare graphite electrodes for MCD and NCD tool turning. It was found that the tool wear was low and the cutting force was much lower than 20N. The main reason was that the Si 3 N 4 substrate and the coating had a very strong bonding force.
  • the graphite mold has a complex shape, the dimensional accuracy requirement does not exceed ⁇ 0.02mm, the roughness of the ground surface after cutting is not higher than 0.016 ⁇ m, and the surface quality and finish are extremely high.
  • brittle graphite is easy to be crushed, fractured, deformed, processed with low accuracy and severe tool wear during high-speed processing, which is the bottleneck of the development of design and manufacturing technology for graphite mold industry.
  • There is an urgent need for a tool that can increase its surface hardness, reduce its friction coefficient, and improve its wear and corrosion resistance.
  • Ceramic tools are widely used in high-speed dry machining of various hard and brittle materials due to their excellent chemical stability and good mechanical properties.
  • silicon nitride Si 3 N 4
  • Si 3 N 4 tools have the characteristics of high strength, good fracture toughness, less crack initiation, and low cost. However, they have high wear rates and short tool life. , Especially cutting hardened steel and cold brittle cast iron difficult to machine materials, thus limiting the promotion and application of Si 3 N 4 tools.
  • Chemical vapor deposition (CVD) diamond films are widely used in various tools due to their excellent chemical and physical properties, as well as extremely high hardness, excellent wear resistance and chemical stability. This method combines the advantages of the coating material and the substrate of the silicon nitride ceramic cutting tool, and the coated tool has good cutting performance.
  • Cemented carbide (WC-Co) and silicon nitride ceramics Si 3 N 4 are the two main substrate materials for preparing coated tools.
  • WC-Co needs to pretreat the substrate. It is necessary to remove cobalt (Co) by etching to improve the bonding force between the diamond film and the WC-Co substrate.
  • the presence of the Co phase on the surface of the cemented carbide is not conducive to nucleation of the diamond coating and will reduce the bonding force between the coating and the substrate.
  • the substrate In order to obtain high nucleation density and coating quality, the substrate must be subjected to coating deposition. Pre-processing.
  • Isotropic graphite produced by the CIP (Cold Isostatic Pressing) process has excellent mechanical and physical properties such as high compressive strength and uniform physical and chemical properties. It is widely used in mold EDM machining. Electron Discharge Machining (EDM) graphite electrodes, solar cell manufacturing equipment, aerospace and other fields. At present, high-speed processing has the advantages of fast cutting speed and high processing quality, and has become the main processing method for precision graphite parts with complex shapes and fine structures.
  • Graphite is a typical brittle material with a layered structure. Hard graphite materials are directly brittlely fractured during high-speed cutting to produce fine-grained chipping chips, which are easy to bond and accumulate on the front and rear blade surfaces and the processed surface. They are easy to chip and wear during processing. Serious, is a typical difficult to process materials.
  • the CVD diamond film coating on the surface of the ceramic tool substrate improves the cutting and wear interface conditions of the tool. It has the advantages of extremely high hardness and wear resistance, high thermal conductivity, and low thermal expansion coefficient.
  • most researches on ceramic coated tools focus on the mechanism of ceramic blade turning.
  • a TiN coating was prepared on the ceramic substrate, and hard turning was performed under dry cutting conditions. It was found that the processing cost of the coated ceramic tool was low and the surface quality of the workpiece was good.
  • the Si 3 N 4 substrate was used to prepare graphite electrodes for MCD and NCD tool turning. It was found that the tool wear was low and the cutting force was much lower than 20N. The main reason was that the Si 3 N 4 substrate and the coating had a very strong bonding force.
  • the graphite mold has a complex shape, the dimensional accuracy requirement does not exceed ⁇ 0.02mm, the roughness of the ground surface after cutting is not higher than 0.016 ⁇ m, and the surface quality and finish are extremely high.
  • brittle graphite is easy to be crushed, fractured, deformed, processed with low accuracy and severe tool wear during high-speed processing, which is the bottleneck of the development of design and manufacturing technology for graphite mold industry.
  • There is an urgent need for a tool that can increase its surface hardness, reduce its friction coefficient, and improve its wear and corrosion resistance.
  • the purpose of the present invention is to avoid the shortcomings in the prior art and provide a diamond-coated silicon nitride ceramic overall tool, a method for preparing the same and application of the tool.
  • the diamond-coated silicon nitride ceramic overall tool has high hardness and resistance to Good abrasiveness, low friction coefficient, and long service life; the diamond-coated silicon nitride ceramic overall tool does not need to pretreat the substrate during the chemical vapor deposition of diamond, nor does it need to be corroded to remove cobalt (Co), and the diamond film
  • the coating has good binding force; the diamond-coated silicon nitride ceramic overall cutter can be applied to high-speed processing of curved mobile phone curved glass graphite molds with high precision requirements.
  • the purpose of the present invention is achieved by the following technical solution: to provide a diamond-coated silicon nitride ceramic overall cutter, namely Diamond (Si 3 N 4 ), the cutter is composed of a silicon nitride ceramic substrate and a diamond thin film coating.
  • the diamond film coating is applied on the surface of the silicon nitride ceramic substrate, and the thickness of the diamond film coating is 7 ⁇ m to 12 ⁇ m.
  • the tool includes a cutting tip, a blade portion and a clamping holder, a peripheral edge rake angle ⁇ of the blade portion is 5 to 15 °, a peripheral edge rake angle ⁇ of the blade portion is 10 to 14 °, and a spiral of the blade portion The angle ⁇ is 15 to 45 °, and the number of blades in the blade portion is four.
  • the arc radius R of the cutting tip is 0.18 to 0.22 mm.
  • the length H1 of the blade portion is 4.7 to 5.3 mm.
  • the length H2 of the cutter is 49.5-50.5 mm.
  • a method for preparing the diamond-coated silicon nitride ceramic monolithic tool as described above comprising the steps:
  • S1 The silicon nitride ceramic substrate is placed in a suspension of diamond fine powder n-hexane, and diamond seeds are planted by an ultrasonic vibration method;
  • step S2 After step S1 is completed, the silicon nitride ceramic substrate is ultrasonically cleaned with acetone for 3 to 8 minutes, and then ultrasonically cleaned with 92% to 98% absolute alcohol for 2 to 4 minutes. After drying, it is placed into a hot wire CVD chemical vapor deposition. Coating furnace.
  • step S1 the rake face of the tool is ground and shaped on a cast iron grinding disc using diamond slurry, and then CF4 plasma dry etching is performed to perform surface nano-treatment to control micro-roughening.
  • the filament temperature CVD deposition parameters are filament temperature of 2000 to 2400 ° C, substrate temperature of 750 to 800 ° C, total pressure of 3.0 to 5.0 kPa, and total flow of 300 to 350.
  • sccm, CH4 / H2 is 1% ⁇ 3% ,
  • the deposition time is 6 ⁇ 10h.
  • the size of the diamond fine powder is 0.5-1 ⁇ m.
  • the diamond-coated silicon nitride ceramic monolithic tool as described above in graphite is provided.
  • the diamond-coated silicon nitride ceramic monolithic tool can be applied to the high-speed processing of curved curved mobile phone graphite graphite molds.
  • a diamond-coated silicon nitride ceramic overall cutter of the present invention is composed of a silicon nitride ceramic substrate and a diamond thin film coating, and the diamond thin film coating is coated on the silicon nitride ceramic substrate On the surface, the thickness of the diamond film coating is 7 ⁇ m to 12 ⁇ m.
  • Chemical vapor deposition (CVD) diamond films are widely used in various tools due to their excellent chemical and physical properties, as well as extremely high hardness, excellent wear resistance and chemical stability. This method combines the advantages of the coating material and the silicon nitride ceramic cutting tool substrate.
  • the coated tool has good cutting performance, extremely high hardness, wear resistance and corrosion resistance, and low friction coefficient.
  • a method for preparing a diamond-coated silicon nitride ceramic monolithic tool according to the present invention includes the following steps:
  • S1 The silicon nitride ceramic substrate is placed in a suspension of diamond fine powder n-hexane, and diamond seeds are planted by an ultrasonic vibration method;
  • step S2 After step S1 is completed, the silicon nitride ceramic substrate is ultrasonically cleaned with acetone for 3 to 8 minutes, and then ultrasonically cleaned with 92% to 98% absolute alcohol for 2 to 4 minutes. After drying, it is placed into a hot wire CVD chemical vapor deposition. Coating furnace. During the chemical vapor deposition of diamond, ceramic materials can reduce the thermal expansion stress of CVD diamond films and ceramic substrates due to their thermal expansion coefficients close to diamond (3.0 and 3.7, respectively). Since the ceramic substrate does not have cobalt, the treated ceramics A mixed phase is generated between the tool substrate and the coating, which can improve the bonding force between the diamond and the substrate. During the preparation process, the ceramic substrate does not need to pretreat the substrate and does not need to be corroded to remove cobalt (Co).
  • Co cobalt
  • the diamond-coated silicon nitride ceramic overall cutter of the present invention can be applied to the high-speed processing of curved mobile phone hot-bent glass graphite molds, and in silicon nitride ceramics.
  • the CVD diamond film coating on the surface of the tool substrate improves the cutting wear interface conditions. It has the advantages of extremely high hardness and wear resistance, high thermal conductivity, and low thermal expansion coefficient. It can be used to process various difficult-to-process materials such as graphite and ceramics, effectively It solves the problems of easy tool wear, electrode collapse angle, and slow processing speed when processing graphite electrodes, and gives full play to the maximum high-speed performance of high-speed machines.
  • FIG. 1 is a partial schematic view of a peripheral edge of a cutting edge portion of a tool in an embodiment
  • FIG. 2 is a schematic view of a helix angle of a cutter blade portion in an embodiment
  • FIG. 3 is a schematic diagram of a cutter in the embodiment
  • FIG. 5 is a cross-sectional SEM image of a diamond-coated silicon nitride ceramic overall cutter
  • FIG. 6 is a schematic diagram of Raman spectral intensity of a silicon nitride ceramic matrix diamond film
  • FIG. 9 is a life diagram of a diamond-coated silicon nitride ceramic overall tool
  • the picture includes: 1-cutting tip, 2-edge, 3-holding shank, Diamond film. Best Mode of the Invention
  • the cutter is composed of a silicon nitride ceramic substrate and a diamond thin film coating, and the diamond thin film coating is applied on the surface of the silicon nitride ceramic substrate, and the diamond The thickness of the thin film coating was 10 ⁇ m.
  • the chemical vapor deposition (CVD) diamond film of this embodiment has extremely high hardness, excellent wear resistance, and chemical stability due to its excellent chemical and physical properties. Combining the advantages of the coating material and the ceramic cutting tool base, the diamond-coated silicon nitride ceramic overall tool has good cutting performance, extremely high hardness and wear resistance, and low friction coefficient, which can improve the service life of the tool.
  • the tool includes a cutting tip 1, a cutting edge portion 2, and a clamping holder 3.
  • the cutting edge rake angle ⁇ of the cutting edge portion 2 is 8 °, and the cutting edge rake angle ⁇ of the cutting edge portion 2.
  • the helix angle ⁇ of the blade portion 2 is 35 °
  • the arc radius R of the cutting tip 1 is 0.2mm
  • the length H1 of the blade portion 2 is 5mm
  • the length H2 of the cutter is 50mm
  • the blade has four blades.
  • the method for preparing diamond-coated silicon nitride ceramic overall cutter from silicon nitride ceramic substrate is as follows:
  • S1 The silicon nitride ceramic substrate is placed in a suspension of diamond fine powder n-hexane, and diamond seeds are planted by an ultrasonic vibration method;
  • the rake face of the tool is grinded and shaped on a cast iron grinding disc with diamond slurry, and then CF4 plasma dry etching is performed to perform surface nano-treatment to control micro-roughening.
  • the CVD deposition parameters are a filament temperature of 2200 ° C, a substrate temperature of 780 ° C, a total pressure of 4.0kPa, a total flow of 320sccm, a CH4 / H2 of 2%, and a deposition time of 8h.
  • the size of the diamond fine powder is 1 ⁇ m.
  • the surface of the silicon nitride substrate is rough, which is conducive to diamond nucleation and bonding with the substrate. It can be seen that the thin film / substrate interface has good uniformity and good adhesion, which confirms that Si in the silicon nitride ceramic substrate improves the bonding force between the coating and the substrate, thereby improving the wear resistance and life of the tool.
  • the quality and residual stress of the diamond film were measured by a LabRAM HR Evolution type Raman spectrometer.
  • the laser wavelength of the spectrometer is 800 nm and the light transmission efficiency is> 30%.
  • Natural pure diamond (ND) has a sharp characteristic peak only at 1332.5cm-1.
  • the Raman frequency shift corresponding to the maximum Raman spectral intensity of the silicon nitride ceramic substrate diamond film is 1335 cm-1, and the full width at half maximum (FWHM) of the peak is 2.5 cm-1.
  • the peak of the maximum spectral shift is 2.5 cm-1, and the peak position is slightly shifted up, indicating that the diamond film has a smaller compressive stress, and a smaller FWHM value indicates that the diamond film has a higher
  • the quality and surface are all cubic crystal diamonds with SP3 hybrid structure.
  • Diamond (Si 3 N 4 ) tools is significantly higher than that of carbide CVD diamond coated tools.
  • Zh Silicon nitride ceramic materials can reduce the thermal expansion stress of CVD diamond films and silicon nitride ceramic substrates by virtue of their thermal expansion coefficients close to that of diamond (3.0 and 3.7, respectively), thus creating a good bond between the two. Because there is no cobalt in the ceramic substrate, the ceramic substrate does not need to pretreat the substrate during the preparation process, nor does it need to be corroded to remove cobalt (Co). At the same time, by depositing a CVD diamond film on a silicon nitride ceramic material, it can not only fill defects on the surface of the silicon nitride ceramic material, but also improve its surface hardness, reduce friction coefficient, and improve wear resistance and corrosion resistance, thereby improving tool wear resistance and Service life.
  • the diamond-coated silicon nitride ceramic overall cutter of this embodiment can be applied to the high-speed processing of a curved curved glass mobile phone graphite mold.
  • the cutter is composed of a silicon nitride ceramic substrate and a diamond thin film coating, and the diamond thin film coating is applied on the surface of the silicon nitride ceramic substrate, and the diamond The thickness of the thin film coating was 10 ⁇ m.
  • the chemical vapor deposition (CVD) diamond film of this embodiment has extremely high hardness, excellent wear resistance, and chemical stability due to its excellent chemical and physical properties. Combining the advantages of the coating material and the ceramic cutting tool base, the diamond-coated silicon nitride ceramic overall tool has good cutting performance, extremely high hardness and wear resistance, and low friction coefficient, which can improve the service life of the tool.
  • the tool includes a cutting tip 1, a cutting edge portion 2, and a clamping holder 3.
  • the cutting edge rake angle ⁇ of the cutting edge portion 2 is 8 °, and the cutting edge rake angle ⁇ of the cutting edge portion 2.
  • the helix angle ⁇ of the blade portion 2 is 35 °
  • the arc radius R of the cutting tip 1 is 0.2mm
  • the length H1 of the blade portion 2 is 5mm
  • the length H2 of the cutter is 50mm
  • the blade has four blades.
  • the method for preparing diamond-coated silicon nitride ceramic overall cutter from silicon nitride ceramic substrate is as follows:
  • S1 The silicon nitride ceramic substrate is placed in a suspension of diamond fine powder n-hexane, and diamond seeds are planted by an ultrasonic vibration method;
  • the rake face of the tool is grinded and shaped on a cast iron grinding disc with diamond slurry, and then CF4 plasma dry etching is performed to perform surface nano-treatment to control micro-roughening.
  • the CVD deposition parameters are a filament temperature of 2200 ° C, a substrate temperature of 780 ° C, a total pressure of 4.0kPa, a total flow of 320sccm, a CH4 / H2 of 2%, and a deposition time of 8h.
  • the size of the diamond fine powder is 1 ⁇ m.
  • the surface of the silicon nitride substrate is rough, which is conducive to diamond nucleation and bonding with the substrate. It can be seen that the thin film / substrate interface has good uniformity and good adhesion, which confirms that Si in the silicon nitride ceramic substrate improves the bonding force between the coating and the substrate, thereby improving the wear resistance and life of the tool.
  • the quality and residual stress of the diamond film were measured by a LabRAM HR Evolution type Raman spectrometer.
  • the laser wavelength of the spectrometer is 800 nm and the light transmission efficiency is> 30%.
  • Natural pure diamond (ND) has a sharp characteristic peak only at 1332.5cm-1.
  • the Raman frequency shift corresponding to the maximum Raman spectral intensity of the silicon nitride ceramic substrate diamond film is 1335 cm-1, and the full width at half maximum (FWHM) of the peak is 2.5 cm-1.
  • the peak of the maximum spectral shift is 2.5 cm-1, and the peak position is slightly shifted up, indicating that the diamond film has a smaller compressive stress, and a smaller FWHM value indicates that the diamond film has a higher
  • the quality and surface are all cubic crystal diamonds with SP3 hybrid structure.
  • Diamond (Si 3 N 4 ) tools is significantly higher than that of carbide CVD diamond coated tools.
  • Zh Silicon nitride ceramic materials can reduce the thermal expansion stress of CVD diamond films and silicon nitride ceramic substrates by virtue of their thermal expansion coefficients close to that of diamond (3.0 and 3.7, respectively), thus creating a good bond between the two. Because there is no cobalt in the ceramic substrate, the ceramic substrate does not need to pretreat the substrate during the preparation process, nor does it need to be corroded to remove cobalt (Co). At the same time, by depositing a CVD diamond film on a silicon nitride ceramic material, it can not only fill defects on the surface of the silicon nitride ceramic material, but also improve its surface hardness, reduce friction coefficient, and improve wear resistance and corrosion resistance, thereby improving tool wear resistance and Service life.
  • the diamond-coated silicon nitride ceramic overall cutter of this embodiment can be applied to the high-speed processing of a curved curved glass mobile phone graphite mold.
  • Zh Graphite is a typical brittle material with a layered structure, which is easy to be crushed during processing and easy to cause tool wear. It is a typical difficult to process material.
  • Tool wear is the most important problem in graphite electrode processing. Wear not only affects tool wear costs and machining time, but also affects the surface quality of the workpiece material. Factors affecting tool wear mainly involve cutting speed, tool path, geometric angle, cutting depth, cutting amount and graphite material.
  • the graphite material has high hardness, so the tool needs high wear resistance and impact resistance.
  • the diamond-coated silicon nitride ceramic overall cutter of this embodiment has high abrasion resistance, high hardness, high lubricity on the coating surface, long processing life, and high cost performance, and is suitable for graphite finishing.
  • the diamond coating is the best choice for graphite processing tools, and it can best reflect the superior performance of graphite tools, and can ensure the dimensional accuracy and smoothness of graphite surface.

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Abstract

一种金刚石涂层氮化硅陶瓷整体刀具及其制备方法与该刀具在石墨加工中的应用，涉及陶瓷刀具领域。刀具由氮化硅陶瓷基体和金刚石薄膜涂层构成，金刚石薄膜涂层涂抹在氮化硅陶瓷基体表面，厚度为7μm～12μm。化学气相沉积(CVD)金刚石薄膜由于其优异的化学和物理性能，具有极高硬度、优异的耐磨性和化学稳定性而被广泛应用于各种刀具中。涂层刀具具有良好的切削性能，极高的硬度和耐磨性、低热膨胀系数等优点，从而提升刀具耐磨性和使用寿命。

Description

金刚石涂层氮化硅陶瓷整体刀具及其制备方法与刀具在石墨中的应用 技术领域
本发明涉及陶瓷刀具领域，具体涉及金刚石涂层氮化硅陶瓷整体刀具及其制备方法与刀具在石墨中的应用。
 背景技术
陶瓷刀具由于具有优良化学稳定性和良好的机械性能而被广泛应用于各种硬脆材料的高速干式加工中。目前，氮化硅（Si 3N 4）在陶瓷刀具材料应用广泛，其中Si 3N 4刀具具有强度大、断裂韧性好、裂纹萌生少、成本低等特点，但存在磨损率高，刀具寿命短，尤其是切削淬硬钢和冷脆铸铁难加工材料，从而限制了Si 3N 4刀具推广和应用。
化学气相沉积（CVD）金刚石薄膜由于其优异的化学和物理性能，具有极高硬度、优异的耐磨性和化学稳定性而被广泛应用于各种刀具中。这种方法结合了涂层材料和氮化硅陶瓷切削刀具基体的优点，涂层刀具具有良好的切削性能。硬质合金（WC-Co）和氮化硅陶瓷Si 3N 4是制备涂层刀具的两种主要基体材料，然而，在金刚石的化学气相沉积过程中，WC-Co有必要预处理基材，需要腐蚀除去钴（Co），改善金刚石膜在WC-Co衬底之间的结合力。有许多文献关于金刚石涂层刀具在有色金属、铝硅合金、硬脆陶瓷和增强塑料加工中的切削性能和耐磨性能报道。然而，很少有数据可用于评价Si 3N 4基体热丝CVD金刚石涂层的刀具在高速石墨加工中的性能。
硬质合金表面 Co 相的存在不利于金刚石涂层形核，并会降低涂层与基体之间的结合力，为了获得高的形核密度和涂层质量，在涂层沉积之前必须对基体进行预处理。
硬质合金中Co 相的存在和金刚石涂层与基体热膨胀系数的差别，导致金刚石涂层与基体结合力较差，金刚石涂层的脱落成为刀具失效的致命缺陷。采用除钴和中间涂层等改善方法不能克服根本问题，而且导致金刚石涂层刀具较高的制造成本、涂层质量不稳定。
  采用CIP(Cold Isostatic Pressing)工艺生产的各向同性石墨具有高抗压强度、理化特性均匀等优异的机械物理性能，被广泛应用于模具电火花放电加工Electron Discharge Machining（EDM）石墨电极、太阳硅电池制备设备、航空航天等领域。目前高速加工具有切削速度快，加工质量高等优势，成为复杂形状和微细结构精密石墨零件的主要加工方法。石墨为典型层状结构脆性材料，硬质石墨材料高速切削加工时直接脆性断裂产生微细颗粒状崩碎切屑，易粘结堆积在前后刀面和已加工表面上，加工时易崩碎且刀具磨损严重，是典型的难加工材料。
在陶瓷刀具基体表面CVD金刚石薄膜涂层改善刀具切削磨损界面条件，具有极高的硬度和耐磨性、高热导、低热膨胀系数等优点，可以用于加工石墨、陶瓷等各种难加工材料。目前关于陶瓷涂层刀具多数集中于陶瓷刀片车削加工时的机理研究。在陶瓷基体上制备了TiN 涂层，在干切削条件下进行硬车削，发现涂层陶瓷刀具的加工费用低，工件表面质量较好。采用Si 3N 4基体制备MCD和NCD刀具车削石墨电极，发现刀具磨损低，切削力远低于20N，主要原因是 Si 3N 4基体和涂层之间具有非常强结合力。
在研究中，发现石墨高速铣削时硬质合金刀具磨损严重、易折断、易粘附石墨颗粒粉尘。用AlTiN涂层硬质合金微铣刀，对石墨进行高速铣削加工指出后刀面磨损是主要磨损形式，涂层脱落和微崩刃磨损为主，提高每齿进给量和切削速度有助于减少刀具磨损。
石墨模具形状复杂，尺寸精度要求不超过±0.02mm，切削加工后研磨表面粗糙度不高于0.016μm，表面质量和光洁度要求极高。但是脆性石墨高速加工时易崩碎断裂变形、加工精度低且刀具磨损严重，是石墨模具业设计与制造技术发展的瓶颈，国内也极少有文献提及分析原因和解决办法。针对目前业界3D玻璃热弯石墨模具成品率低、加工制造成本高和品质难以保证问题。急需一种能提高其表面硬度、降低摩擦系数、提高耐磨耐蚀性能的刀具。
 技术问题
陶瓷刀具由于具有优良化学稳定性和良好的机械性能而被广泛应用于各种硬脆材料的高速干式加工中。目前，氮化硅（Si 3N 4）在陶瓷刀具材料应用广泛，其中Si 3N 4刀具具有强度大、断裂韧性好、裂纹萌生少、成本低等特点，但存在磨损率高，刀具寿命短，尤其是切削淬硬钢和冷脆铸铁难加工材料，从而限制了Si 3N 4刀具推广和应用。
化学气相沉积（CVD）金刚石薄膜由于其优异的化学和物理性能，具有极高硬度、优异的耐磨性和化学稳定性而被广泛应用于各种刀具中。这种方法结合了涂层材料和氮化硅陶瓷切削刀具基体的优点，涂层刀具具有良好的切削性能。硬质合金（WC-Co）和氮化硅陶瓷Si 3N 4是制备涂层刀具的两种主要基体材料，然而，在金刚石的化学气相沉积过程中，WC-Co有必要预处理基材，需要腐蚀除去钴（Co），改善金刚石膜在WC-Co衬底之间的结合力。有许多文献关于金刚石涂层刀具在有色金属、铝硅合金、硬脆陶瓷和增强塑料加工中的切削性能和耐磨性能报道。然而，很少有数据可用于评价Si 3N 4基体热丝CVD金刚石涂层的刀具在高速石墨加工中的性能。
硬质合金表面 Co 相的存在不利于金刚石涂层形核，并会降低涂层与基体之间的结合力，为了获得高的形核密度和涂层质量，在涂层沉积之前必须对基体进行预处理。
硬质合金中Co 相的存在和金刚石涂层与基体热膨胀系数的差别，导致金刚石涂层与基体结合力较差，金刚石涂层的脱落成为刀具失效的致命缺陷。采用除钴和中间涂层等改善方法不能克服根本问题，而且导致金刚石涂层刀具较高的制造成本、涂层质量不稳定。
  采用CIP(Cold Isostatic Pressing)工艺生产的各向同性石墨具有高抗压强度、理化特性均匀等优异的机械物理性能，被广泛应用于模具电火花放电加工Electron Discharge Machining（EDM）石墨电极、太阳硅电池制备设备、航空航天等领域。目前高速加工具有切削速度快，加工质量高等优势，成为复杂形状和微细结构精密石墨零件的主要加工方法。石墨为典型层状结构脆性材料，硬质石墨材料高速切削加工时直接脆性断裂产生微细颗粒状崩碎切屑，易粘结堆积在前后刀面和已加工表面上，加工时易崩碎且刀具磨损严重，是典型的难加工材料。
在陶瓷刀具基体表面CVD金刚石薄膜涂层改善刀具切削磨损界面条件，具有极高的硬度和耐磨性、高热导、低热膨胀系数等优点，可以用于加工石墨、陶瓷等各种难加工材料。目前关于陶瓷涂层刀具多数集中于陶瓷刀片车削加工时的机理研究。在陶瓷基体上制备了TiN 涂层，在干切削条件下进行硬车削，发现涂层陶瓷刀具的加工费用低，工件表面质量较好。采用Si 3N 4基体制备MCD和NCD刀具车削石墨电极，发现刀具磨损低，切削力远低于20N，主要原因是 Si 3N 4基体和涂层之间具有非常强结合力。
在研究中，发现石墨高速铣削时硬质合金刀具磨损严重、易折断、易粘附石墨颗粒粉尘。用AlTiN涂层硬质合金微铣刀，对石墨进行高速铣削加工指出后刀面磨损是主要磨损形式，涂层脱落和微崩刃磨损为主，提高每齿进给量和切削速度有助于减少刀具磨损。
石墨模具形状复杂，尺寸精度要求不超过±0.02mm，切削加工后研磨表面粗糙度不高于0.016μm，表面质量和光洁度要求极高。但是脆性石墨高速加工时易崩碎断裂变形、加工精度低且刀具磨损严重，是石墨模具业设计与制造技术发展的瓶颈，国内也极少有文献提及分析原因和解决办法。针对目前业界3D玻璃热弯石墨模具成品率低、加工制造成本高和品质难以保证问题。急需一种能提高其表面硬度、降低摩擦系数、提高耐磨耐蚀性能的刀具。
 技术解决方案
本发明的目的在于避免现有技术中的不足之处而提供一种金刚石涂层氮化硅陶瓷整体刀具及其制备方法与刀具的应用，该金刚石涂层氮化硅陶瓷整体刀具硬度高，耐磨性好，摩擦系数低，使用寿命长；该金刚石涂层氮化硅陶瓷整体刀具在金刚石的化学气相沉积过程中，不必预处理基材，也不需要腐蚀除去钴（Co），与金刚石薄膜涂层结合力好；该金刚石涂层氮化硅陶瓷整体刀具可以应用于高精度要求的曲面手机热弯玻璃石墨模高速加工。
    本发明的目的通过以下技术方案实现：提供一种金刚石涂层氮化硅陶瓷整体刀具，即Diamond（Si 3N 4），所述刀具由氮化硅陶瓷基体和金刚石薄膜涂层构成，所述金刚石薄膜涂层涂抹在氮化硅陶瓷基体表面，所述金刚石薄膜涂层的厚度为7μm~12μm。
    其中，所述刀具包括切削刀尖，刃部及夹持刀柄，刃部的周刃前角γ为5~15°，刃部的周刃后角α为10~14°，刃部的螺旋角β为15~45°，刃部的刃为4条。
    其中，所述切削刀尖的圆弧半径R为0.18~0.22mm。
    其中，所述刃部的长度H1为4.7~5.3mm。
    其中，所述刀具的长度H2为49.5~50.5mm。
    此外，还提供一种如上所述的金刚石涂层氮化硅陶瓷整体刀具的制备方法，包括步骤：
S1：氮化硅陶瓷基体放入混有金刚石微粉正己烷悬浮液中，采用超声振动方法进行种植金刚石种子；
S2：在完成步骤S1后，将氮化硅陶瓷基体采用丙酮超声波清洗3~8分钟，再用92%~98%无水酒精超声波清洗2~4分钟，干燥后放入热丝CVD化学气相沉积涂层炉。
    其中，在步骤S1之前，所述刀具前刀面采用金刚石浆料在铸铁研磨盘进行研磨成型，然后用CF4等离子体干法刻蚀进行表面纳米处理控制微糙化。
    其中，步骤S2中，热丝CVD沉积参数灯丝温度为2000~2400℃，基体温度为750~800℃，总压力为3.0~5.0 kPa，总流量为300~350 sccm，CH4/H2为1%~3% ，沉积时间为6~10h。
    其中，所述金刚石微粉的大小为0.5~1μm。
    此外，还提供一种如上所述的金刚石涂层氮化硅陶瓷整体刀具在石墨中的应用，所述金刚石涂层氮化硅陶瓷整体刀具可以应用在曲面手机热弯玻璃石墨模高速加工中。
   本发明的有益效果：本发明的一种金刚石涂层氮化硅陶瓷整体刀具，所述刀具由氮化硅陶瓷基体和金刚石薄膜涂层构成，所述金刚石薄膜涂层涂抹在氮化硅陶瓷基体表面，所述金刚石薄膜涂层的厚度为7μm~12μm。化学气相沉积（CVD）金刚石薄膜由于其优异的化学和物理性能，具有极高硬度、优异的耐磨性和化学稳定性而被广泛应用于各种刀具中。这种方法结合了涂层材料和氮化硅陶瓷切削刀具基体的优点，涂层刀具具有良好的切削性能，极高的硬度、耐磨性和耐蚀性、低摩擦系数等优点。
    本发明的一种金刚石涂层氮化硅陶瓷整体刀具的制备方法，包括步骤：
S1：氮化硅陶瓷基体放入混有金刚石微粉正己烷悬浮液中，采用超声振动方法进行种植金刚石种子；
S2：在完成步骤S1后，将氮化硅陶瓷基体采用丙酮超声波清洗3~8分钟，再用92%~98%无水酒精超声波清洗2~4分钟，干燥后放入热丝CVD化学气相沉积涂层炉。在金刚石的化学气相沉积过程中，陶瓷材料凭借其接近于金刚石的热膨胀系数(分别为3.0和3.7)，可以降低 CVD 金刚石薄膜与陶瓷基体的热膨胀应力，由于陶瓷基体不存在钴，处理后的陶瓷刀具基体与涂层之间会生成一种混合相，可以改善金刚石和基体的结合力，在制备过程中陶瓷基体不必预处理基材，也不需要腐蚀除去钴（Co）。
 有益效果
本发明的一种金刚石涂层氮化硅陶瓷整体刀具在石墨中的应用，所述金刚石涂层氮化硅陶瓷整体刀具可以应用在曲面手机热弯玻璃石墨模高速加工中，在氮化硅陶瓷刀具基体表面CVD金刚石薄膜涂层改善刀具切削磨损界面条件，具有极高的硬度和耐磨性、高热导、低热膨胀系数等优点，可以用于加工石墨、陶瓷等各种难加工材料，有效地解决了加工石墨电极时刀具易损耗、电极易崩角、加工速度慢的问题，充分地发挥了高速机的最大高速性能。
 附图说明
利用附图对发明作进一步说明，但附图中的实施例不构成对本发明的任何限制，对于本领域的普通技术人员，在不付出创造性劳动的前提下，还可以根据以下附图获得其它的附图。
图1是实施例中刀具刃部周刃的局部示意图；
图2是实施例中刀具刃部螺旋角示意图；
图3是实施例中刀具的示意图；
图4为金刚石涂层氮化硅陶瓷整体刀具的切削刃SEM图；
图5为金刚石涂层氮化硅陶瓷整体刀具的横截面SEM图；
图6为氮化硅陶瓷基体金刚石薄膜拉曼光谱强度的示意图；
图7为氮化硅陶瓷基体金刚石薄膜的SEM形貌图；
图8为金刚石涂层氮化硅陶瓷整体刀具的X射线衍射谱图；
图9为金刚石涂层氮化硅陶瓷整体刀具的寿命图；
图中包括有：1-切削刀尖，2-刃部，3-夹持刀柄，Diamond film-金刚石薄膜。本发明的最佳实施方式
以下结合附图和实施例对本发明的具体实施作进一步说明，但本发明并不局限于此。
    本实施例的一种金刚石涂层氮化硅陶瓷整体刀具，所述刀具由氮化硅陶瓷基体和金刚石薄膜涂层构成，所述金刚石薄膜涂层涂抹在氮化硅陶瓷基体表面，所述金刚石薄膜涂层的厚度为10μm。
    本实施例的化学气相沉积（CVD）金刚石薄膜由于其优异的化学和物理性能，具有极高硬度、优异的耐磨性和化学稳定性。结合了涂层材料和陶瓷切削刀具基体的优点，金刚石涂层氮化硅陶瓷整体刀具具有良好的切削性能，极高的硬度和耐磨性、低摩擦系数等优点，能够提高刀具的使用寿命。
    如图1~图3所示，所述刀具包括切削刀尖1，刃部2及夹持刀柄3，刃部2的周刃前角γ为8°，刃部2的周刃后角α为10°，刃部2的螺旋角β为35°，所述切削刀尖1的圆弧半径R为0.2mm，所述刃部2的长度H1为5mm，所述刀具的长度H2为50mm，刃部的刃为4条。
    石墨刀具选择合适的几何角度，有助于减小刀具的振动，石墨工件也不容易崩缺, 从而使得刀具的整体切削性能大大提高。 
氮化硅陶瓷基体制备金刚石涂层氮化硅陶瓷整体刀具的方法如下：
包括步骤：
S1：氮化硅陶瓷基体放入混有金刚石微粉正己烷悬浮液中，采用超声振动方法进行种植金刚石种子；
S2：氮化硅陶瓷基体完成种植金刚石种子后，采用丙酮超声波清洗5分钟，再用95%无水酒精超声波清洗3分钟，干燥后放入热丝CVD化学气相沉积涂层炉。
    其中，所述刀具前刀面采用金刚石浆料在铸铁研磨盘进行研磨成型，然后用CF4等离子体干法刻蚀进行表面纳米处理控制微糙化。
    其中，步骤S2中，CVD沉积参数灯丝温度为2200℃，基体温度为780℃，总压力为4.0kPa，总流量为320sccm，CH4/H2为2%,沉积时间为8h。
    所述金刚石微粉的大小为1μm。
    如图4所示，可以看出该涂层具有良好的均匀性和覆盖性。
    如图5所示，氮化硅基体表面粗糙，有利于金刚石成核生长和与基体结合。可以看出薄膜/基材界面组织致密均匀性好，粘接性好，从而证实了氮化硅陶瓷基体中Si改善了涂层与基体之间的结合力，从而提升刀具耐磨性和寿命。
金刚石膜的品质和残余应力通过LabRAM HR Evolution型拉曼光谱仪进行测定，光谱仪的激光波长为800nm,通光效率>30%。天然的纯金刚石 (ND) 仅在1332.5cm-1处有一尖锐的特征峰。如图6所示，氮化硅陶瓷基体金刚石薄膜拉曼光谱强度最大值所对应的拉曼频移为1335cm-1，波峰的半高宽（FWHM）2.5cm-1。由上述结果可以得出如下结论：光谱最大偏移峰值为2.5cm-1，峰位略有上移，说明金刚石薄膜具有较小的压应力，而较小的FWHM值说明金刚石薄膜具有较高的质量,表面均是SP3杂化结构立方晶体金刚石。
    为评价金刚石涂层刀具表面锋利程度，采用Bruker生产的Fastcan AFM原子力显微镜测量刀具表面形貌，如图7所示。从形貌中可看出，金刚石薄膜表面非常光滑，金刚石颗粒晶体清晰，表面粗糙度Ra 8.1nm,RMS 8.6 nm。由于金刚石涂层中陶瓷基体中Si 元素的引入，显著细化晶粒，降低涂层的内应力，提高涂层与基体的附着力，从而解决金刚石涂层基体结合力不够问题。
    如图8所示，Diamond（Si 3N 4）刀具中主要存在立方相氮化硅（β- Si 3N 4）和低的TiN体积分数，表明Diamond（Si 3N 4）刀具为TiN颗粒增强β- Si 3N 4陶瓷刀具。
    如图9所示，而Diamond（Si 3N 4）刀具寿命明显高于硬质合金CVD金刚石涂层刀具寿命。刀具寿命：Diamond（Si 3N 4）>Diamond (WC-Co)。
    氮化硅陶瓷材料凭借其接近于金刚石的热膨胀系数(分别为3.0和3.7)，可以降低 CVD 金刚石薄膜与氮化硅陶瓷基体的热膨胀应力，从而在两者之间产生好的结合力。由于陶瓷基体不存在钴，在制备过程中陶瓷基体不必预处理基材，也不需要腐蚀除去钴（Co）。同时，通过在氮化硅陶瓷材料上沉积CVD金刚石薄膜不但可以填补氮化硅陶瓷材料表面的缺陷还能提高其表面硬度、降低摩擦系数、提高耐磨耐蚀性能，从而提升刀具耐磨性和使用寿命。
本实施例的金刚石涂层氮化硅陶瓷整体刀具可以应用在曲面手机热弯玻璃石墨模高速加工中。
 本发明的实施方式
以下结合附图和实施例对本发明的具体实施作进一步说明，但本发明并不局限于此。
    本实施例的一种金刚石涂层氮化硅陶瓷整体刀具，所述刀具由氮化硅陶瓷基体和金刚石薄膜涂层构成，所述金刚石薄膜涂层涂抹在氮化硅陶瓷基体表面，所述金刚石薄膜涂层的厚度为10μm。
    本实施例的化学气相沉积（CVD）金刚石薄膜由于其优异的化学和物理性能，具有极高硬度、优异的耐磨性和化学稳定性。结合了涂层材料和陶瓷切削刀具基体的优点，金刚石涂层氮化硅陶瓷整体刀具具有良好的切削性能，极高的硬度和耐磨性、低摩擦系数等优点，能够提高刀具的使用寿命。
    如图1~图3所示，所述刀具包括切削刀尖1，刃部2及夹持刀柄3，刃部2的周刃前角γ为8°，刃部2的周刃后角α为10°，刃部2的螺旋角β为35°，所述切削刀尖1的圆弧半径R为0.2mm，所述刃部2的长度H1为5mm，所述刀具的长度H2为50mm，刃部的刃为4条。
    石墨刀具选择合适的几何角度，有助于减小刀具的振动，石墨工件也不容易崩缺, 从而使得刀具的整体切削性能大大提高。 
氮化硅陶瓷基体制备金刚石涂层氮化硅陶瓷整体刀具的方法如下：
包括步骤：
S1：氮化硅陶瓷基体放入混有金刚石微粉正己烷悬浮液中，采用超声振动方法进行种植金刚石种子；
S2：氮化硅陶瓷基体完成种植金刚石种子后，采用丙酮超声波清洗5分钟，再用95%无水酒精超声波清洗3分钟，干燥后放入热丝CVD化学气相沉积涂层炉。
    其中，所述刀具前刀面采用金刚石浆料在铸铁研磨盘进行研磨成型，然后用CF4等离子体干法刻蚀进行表面纳米处理控制微糙化。
    其中，步骤S2中，CVD沉积参数灯丝温度为2200℃，基体温度为780℃，总压力为4.0kPa，总流量为320sccm，CH4/H2为2%,沉积时间为8h。
    所述金刚石微粉的大小为1μm。
    如图4所示，可以看出该涂层具有良好的均匀性和覆盖性。
    如图5所示，氮化硅基体表面粗糙，有利于金刚石成核生长和与基体结合。可以看出薄膜/基材界面组织致密均匀性好，粘接性好，从而证实了氮化硅陶瓷基体中Si改善了涂层与基体之间的结合力，从而提升刀具耐磨性和寿命。
金刚石膜的品质和残余应力通过LabRAM HR Evolution型拉曼光谱仪进行测定，光谱仪的激光波长为800nm,通光效率>30%。天然的纯金刚石 (ND) 仅在1332.5cm-1处有一尖锐的特征峰。如图6所示，氮化硅陶瓷基体金刚石薄膜拉曼光谱强度最大值所对应的拉曼频移为1335cm-1，波峰的半高宽（FWHM）2.5cm-1。由上述结果可以得出如下结论：光谱最大偏移峰值为2.5cm-1，峰位略有上移，说明金刚石薄膜具有较小的压应力，而较小的FWHM值说明金刚石薄膜具有较高的质量,表面均是SP3杂化结构立方晶体金刚石。
    为评价金刚石涂层刀具表面锋利程度，采用Bruker生产的Fastcan AFM原子力显微镜测量刀具表面形貌，如图7所示。从形貌中可看出，金刚石薄膜表面非常光滑，金刚石颗粒晶体清晰，表面粗糙度Ra 8.1nm,RMS 8.6 nm。由于金刚石涂层中陶瓷基体中Si 元素的引入，显著细化晶粒，降低涂层的内应力，提高涂层与基体的附着力，从而解决金刚石涂层基体结合力不够问题。
    如图8所示，Diamond（Si 3N 4）刀具中主要存在立方相氮化硅（β- Si 3N 4）和低的TiN体积分数，表明Diamond（Si 3N 4）刀具为TiN颗粒增强β- Si 3N 4陶瓷刀具。
    如图9所示，而Diamond（Si 3N 4）刀具寿命明显高于硬质合金CVD金刚石涂层刀具寿命。刀具寿命：Diamond（Si 3N 4）>Diamond (WC-Co)。
    氮化硅陶瓷材料凭借其接近于金刚石的热膨胀系数(分别为3.0和3.7)，可以降低 CVD 金刚石薄膜与氮化硅陶瓷基体的热膨胀应力，从而在两者之间产生好的结合力。由于陶瓷基体不存在钴，在制备过程中陶瓷基体不必预处理基材，也不需要腐蚀除去钴（Co）。同时，通过在氮化硅陶瓷材料上沉积CVD金刚石薄膜不但可以填补氮化硅陶瓷材料表面的缺陷还能提高其表面硬度、降低摩擦系数、提高耐磨耐蚀性能，从而提升刀具耐磨性和使用寿命。
 最后应当说明的是，以上实施例仅用以说明本发明的技术方案，而非对本发明保护范围的限制，尽管参照较佳实施例对本发明作了详细地说明，本领域的普通技术人员应当理解，可以对本发明的技术方案进行修改或者等同替换，而不脱离本发明技术方案的实质和范围。
 工业实用性
本实施例的金刚石涂层氮化硅陶瓷整体刀具可以应用在曲面手机热弯玻璃石墨模高速加工中。
    石墨为典型层状结构脆性材料，加工时易崩碎，且易使刀具磨损严重，是典型的难加工材料。刀具磨损是石墨电极加工中最重要的问题。磨损不仅影响刀具损耗费用、加工时间，而且影响工件材料的表面质量。影响刀具磨损主要涉及切削速度、刀具路径，几何角度、切削深度、切削用量和石墨材料等因素。石墨材料硬度大，故刀具需较高的耐磨性和抗冲击性。本实施例的金刚石涂层氮化硅陶瓷整体刀具具有高耐磨性、高硬度、涂层表面高润滑性、加工寿命长和性价比高，适合石墨的精加工。现阶段金刚石涂层是石墨加工刀具的最佳选择，也最能体现石墨刀具优越的使用性能，能保障石墨表面尺寸精度和光洁度。

Claims (10)

  1. [根据细则26改正22.11.2018]　
    金刚石涂层氮化硅陶瓷整体刀具，其特征在于：所述刀具由氮化硅陶瓷基体和金刚石薄膜涂层构成，所述金刚石薄膜涂层涂抹在氮化硅陶瓷基体表面，所述金刚石薄膜涂层的厚度为7~12μm。
  2. [根据细则26改正22.11.2018]　
    根据权利要求1所述的金刚石涂层氮化硅陶瓷整体刀具，其特征在于：所述刀具包括切削刀尖，刃部及夹持刀柄，刃部的周刃前角γ为5~15°，刃部的周刃后角α为10~14°，刃部的螺旋角β为15~45°，刃部的刃为4条。
  3. [根据细则26改正22.11.2018]　
    根据权利要求2所述的金刚石涂层氮化硅陶瓷整体刀具，其特征在于：所述切削刀尖的圆弧半径R为0.18~0.22mm。
  4. [根据细则26改正22.11.2018]　
    根据权利要求2所述的金刚石涂层氮化硅陶瓷整体刀具，其特征在于：所述刃部的长度H1为4.7~5.3mm。
  5. [根据细则26改正22.11.2018]　
    根据权利要求2所述的金刚石涂层氮化硅陶瓷整体刀具，其特征在于：所述刀具的长度H2为49.5~50.5mm。
  6. [根据细则26改正22.11.2018]
    如权利要求1~5任一项所述的金刚石涂层氮化硅陶瓷整体刀具的制备方法，其特征在于，包括步骤：
    S1：氮化硅陶瓷基体放入混有金刚石微粉正己烷悬浮液中，采用超声振动方法进行种植金刚石种子；
    S2：完成步骤S1后，将氮化硅陶瓷基体采用丙酮超声波清洗3~8分钟，再用92%~98%无水酒精超声波清洗2~4分钟，干燥后放入热丝CVD化学气相沉积涂层炉。
  7. [根据细则26改正22.11.2018]　
    根据权利要求6所述的制备方法，其特征在于：在步骤S1之前，所述刀具前刀面采用金刚石浆料在铸铁研磨盘进行研磨成型，然后用CF4等离子体干法刻蚀进行表面纳米处理控制微糙化。
  8. [根据细则26改正22.11.2018]　
    根据权利要求6所述的制备方法，其特征在于：步骤S2中，热丝CVD沉积参数灯丝温度为2000~2400℃，基体温度为750~800℃，总压力为3.0~5.0 kPa，总流量为300~350 sccm，CH4/H2为1%~3%，沉积时间为6~10h。
  9. [根据细则26改正22.11.2018]　
    根据权利要求6所述的制备方法，其特征在于：所述金刚石微粉的大小为0.5~1μm。
  10. [根据细则26改正22.11.2018]　
    如权利要求1~5的任一项所述的金刚石涂层氮化硅陶瓷整体刀具在石墨中的应用，其特征在于：所述金刚石涂层氮化硅陶瓷整体刀具应用在曲面手机热弯玻璃石墨模高速加工中。
PCT/CN2018/108380 2018-09-28 2018-09-28 金刚石涂层氮化硅陶瓷整体刀具及其制备方法与刀具在石墨中的应用 Ceased WO2020062045A1 (zh)

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