WO2019225503A1 - Cadre de pellicule, photomasque et procédé de fabrication de cadre de pellicule - Google Patents

Cadre de pellicule, photomasque et procédé de fabrication de cadre de pellicule Download PDF

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Publication number
WO2019225503A1
WO2019225503A1 PCT/JP2019/019732 JP2019019732W WO2019225503A1 WO 2019225503 A1 WO2019225503 A1 WO 2019225503A1 JP 2019019732 W JP2019019732 W JP 2019019732W WO 2019225503 A1 WO2019225503 A1 WO 2019225503A1
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WIPO (PCT)
Prior art keywords
pellicle frame
thickness
photomask
sides
pellicle
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Application number
PCT/JP2019/019732
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English (en)
Japanese (ja)
Inventor
木村　幸広
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日本特殊陶業株式会社
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Priority to JP2020521206A priority Critical patent/JPWO2019225503A1/ja
Publication of WO2019225503A1 publication Critical patent/WO2019225503A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/04—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor involving a rotary work-table
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Definitions

  • the present disclosure relates to a pellicle frame, a photomask, and a method for manufacturing the pellicle frame.
  • a photomask is used in an exposure process for forming a wiring pattern on a semiconductor wafer. If foreign matter (particles, etc.) adheres to the photomask, a defect in the wiring pattern occurs.
  • a pellicle is arranged so as to cover the surface (for example, the front and back surfaces) of the photomask.
  • This pellicle is a pellicle frame, which is a rectangular frame, with a transparent thin film (pellicle film) stretched so as to cover the opening.
  • This pellicle frame is a member made of a wire having a large opening area and a thin frame portion, and is used for disposing the pellicle film at a predetermined distance from the photomask.
  • a member constituting the pellicle frame a member made of, for example, an aluminum alloy having a small diameter such as a prism having a thickness of 3 mm and a width of 2 mm is used.
  • the photomask in use undergoes bending due to its own weight (so-called self-weight bending).
  • self-weight bending When a pellicle is mounted on a bent photomask, the complex shape of the two becomes complex, and the exposure pattern formed on the surface of the photomask is irregularly distorted, resulting in the wiring of the desired shape. A pattern may not be formed.
  • Patent Document 1 discloses a technique for suppressing deformation of a photomask by providing a predetermined range of warpage on a pair of sides of the pellicle frame and attaching the pellicle frame to the photomask. . Specifically, the amount of warpage of the pellicle frame is set to 0.01% to 1.0% of the side length and within a range of ⁇ 30% of the self-weight deflection of the photomask.
  • a pellicle frame since the pellicle frame is a frame body having a large opening area and a thin frame portion, the pellicle frame actually having the shape described in Patent Document 1 cannot be manufactured. It's not easy.
  • a pellicle frame usually has a length of one side of, for example, about 150 mm in length and about 115 mm in width, and has a unique shape with a width and height of a cross section of the frame portion (column portion) of, for example, about 2 mm to 5 mm. Its manufacture is not easy.
  • the pellicle frame has a frame with a large opening formed by a small-diameter column portion, the amount of elastic deformation is large, and it is extremely difficult to stably give the amount of warpage of the side length within a predetermined range. It was difficult.
  • a pellicle frame capable of suppressing the self-weight deflection of the photomask, and further correcting the self-weight deflection of the photomask, a photomask attached with the pellicle frame, and the self-weight deflection are suppressed. It is desirable to provide a method of manufacturing a pellicle frame that can be corrected.
  • a pellicle frame includes a first surface and a second surface provided on both sides in a thickness direction, and an inner peripheral surface and an outer peripheral surface connected to the first surface and the second surface. And a pellicle frame having a rectangular shape with four corners and four sides in plan view.
  • the maximum thickness of each of the pair of opposing sides is greater than the thickness of each of the corners on both sides of the pair of opposing sides, or the minimum thickness of each of the pair of opposing sides.
  • the thickness is smaller than the thicknesses of the corner portions on both sides of each of the pair of opposing side portions.
  • the maximum thickness of each of the pair of opposing sides is at least the both sides of each of the pair of opposing sides, with respect to at least a pair of opposing sides of the four sides.
  • the thickness is larger than the thicknesses of the corners, the self-weight deflection of the photomask can be corrected by sticking (that is, adhering) the pellicle frame to the photomask.
  • the distortion due to the self-weight deflection of the photomask can be prevented from changing by pasting (that is, adhering) the pellicle frame so as to follow the deflection direction of the photomask.
  • each side part constituting a pair of side parts the thickness of each side part is larger than the thickness of each corner part on both sides of each side part, and therefore, for example, as illustrated in FIGS. 4A and 4B
  • the convex portion having a large thickness of the pellicle frame is attached to the portion where the photomask becomes convex due to its own weight deflection, so that the convex portion can be corrected to be flat.
  • the minimum thickness of each of the pair of facing side portions of at least one pair of facing side portions of the four side portions is set on both sides of each of the pair of facing side portions.
  • each side part constituting a pair of side parts the thickness of each side part is smaller than the thickness of each corner part on both sides of each side part.
  • the concave portion can be corrected to be flat by sticking the thin concave portion of the pellicle frame to the concave portion of the photomask due to its own weight deflection.
  • the thickness direction is a direction from the first surface on the near side in the plan view to the second surface on the back side
  • the corner is the pellicle frame in the plan view of the pellicle frame viewed from the thickness direction.
  • the side portion is a columnar portion disposed between a pair of adjacent corner portions along the frame.
  • the maximum thickness of each of the pair of opposing sides is the thickness of each of the corners on both sides of each of the pair of opposing sides.
  • the minimum or the minimum thickness of each of the pair of opposing sides may be smaller than the thickness of each of the corners on both sides of each of the pair of opposing sides.
  • This pellicle frame has the above-described thickness-related features on all sides. Therefore, the self-weight deflection of the photomask can be further corrected. Alternatively, it is possible to further suppress a change in distortion due to the self-weight deflection of the photomask.
  • the maximum thickness or the minimum thickness may be a thickness of a central portion in the longitudinal direction of the side portion.
  • each side portion in the longitudinal direction of each side portion is larger than the thickness of each corner portion on both sides of the side portion, for example, the portion where the thickness is large is lowered by the photomask being bent by its own weight.
  • a deformed position for example, below
  • the portion having a large thickness above the photomask at a position where the photomask is deformed downward by its own weight deflection, the deformation due to the self-weight deflection of the photomask is suitably maintained, and further deformation is performed. Can be suppressed.
  • the photomask is deformed by its own weight deflection when the thickness is small.
  • a deformed position for example, above
  • the deformation due to the self-weight deflection of the photomask is suitably maintained, and further deformation is performed. Can be suppressed.
  • the first surface of the side portion includes a first curved surface that is gradually convexly curved or gradually concaved from the corner portions on both sides of the side portion toward the central portion. It may be.
  • the side part is a side part in which the maximum thickness or the minimum thickness is defined, and the side part in which the maximum thickness in the side part is larger than the thickness of each corner part on both sides of the side part, or
  • the side portion has a minimum thickness that is smaller than the thickness of each corner on both sides of the side portion.
  • the first surface may be composed of a first curved surface.
  • the first surface of the side (that is, the side where the maximum thickness or the minimum thickness is defined) is gradually convexly curved from each corner on both sides of the side toward the center.
  • the convex portion of the pellicle frame faces upward on the lower side of the photomask, so that deformation due to the deflection of the photomask by its own weight (for example, lower deformation when curved by gravity) can be preferably corrected.
  • the deformation due to the self-weight deflection of the photomask (for example, the lower deformation when deformed by gravity) is suitably held, and further deformation Can be suppressed.
  • the first surface of the side portion that is, the side portion where the maximum thickness or the minimum thickness is defined
  • the concave portion of the pellicle frame facing down on the upper side of the photomask
  • deformation due to the self-weight deflection of the photomask for example, upper deformation when curved due to gravity
  • the photomask's deformation due to its own weight for example, the lower deformation when deformed by gravity
  • the photomask's deformation due to its own weight for example, the lower deformation when deformed by gravity
  • the second surface may include a second curved surface that is curved on the same side as the first curved surface of the first surface.
  • the first curved surface of the first surface and the second curved surface of the second surface of the pellicle frame are curved toward the same side in the thickness direction.
  • the second curved surface is curved convexly toward the first surface (in other words, the second curved surface Is curved so as to be recessed on the second surface).
  • the second curved surface is The second surface is curved convexly toward the opposite side of the first surface.
  • the 2nd surface may be comprised from the 2nd curved surface.
  • the second surface may include a flat plane.
  • one side that is, the first surface side
  • the other side second surface side
  • the second surface may be formed of a flat plane.
  • the pellicle frame for example, by making the surface on which the pellicle film is stretched flat, the pellicle film bonding operation becomes easy, which is preferable.
  • the first surface is the first curved surface and the second surface is the flat surface
  • the first surface is a surface bonded to a photomask
  • Two surfaces may be bonded to the pellicle film.
  • a difference between the maximum thickness of the side portion or the minimum thickness of the side portion and each thickness of the corner portions on both sides of the side portion may be 1 ⁇ m or more.
  • the self-weight deflection can be suitably corrected even when the self-weight deflection of the photomask is large.
  • the self-weight deflection can be maintained so that the deformation due to the self-weight deflection does not increase (that is, so as to suppress further deformation).
  • the pellicle frame may be mainly composed of ceramic, Young's modulus may be 150 GPa or more, and Vickers hardness may be 800 Hv or more.
  • Such a pellicle frame has high rigidity, and when the pellicle frame is affixed to the photomask, the pellicle frame itself is not easily deformed, so that the self-weight deflection of the photomask can be suitably corrected. Alternatively, the self-weight deflection can be maintained so that the deformation due to the self-weight deflection does not increase (that is, so as to suppress further deformation).
  • a photomask according to one aspect of the present disclosure is a photomask in which the pellicle frame is attached to at least one surface in the thickness direction of the photomask.
  • a photomask in which the above-described pellicle frame is affixed to at least one surface of the photomask in the thickness direction is corrected by the pellicle frame so that the self-weight deflection is corrected, or the self-weight deflection is performed so as to suppress further deformation. Therefore, the exposure pattern is not easily deformed. Therefore, the wiring pattern can be formed with high accuracy.
  • the thickness direction of the photomask is a direction from one main surface of the photomask to the other main surface opposite to the main surface.
  • the pellicle frame may be attached to both surfaces in the thickness direction of the photomask so as to maintain the self-weight deflection of the photomask.
  • a method for manufacturing a pellicle frame according to one aspect of the present disclosure relates to the method for manufacturing a pellicle frame described above.
  • the pellicle frame in the mounting step, is mounted on a grinding base having a horizontal surface so that the first surface or the second surface is on top and adjusted.
  • the first surface or the second surface disposed so as to be above the pellicle frame is ground using a rotating grindstone having an inclined rotation axis, and the pellicle frame The thickness of the corner and the side is adjusted.
  • a pellicle frame that is, a pellicle frame before grinding
  • a grinding base having a horizontal surface
  • the surface of the pellicle frame that is, the pellicle frame is arranged on the top.
  • the thickness of the corners and sides of the pellicle frame can be adjusted by grinding with respect to the first surface or the second surface) using a rotating grindstone whose tilting axis is inclined.
  • the material of the pellicle frame a material mainly composed of ceramic, a material made of cemented carbide, a material made of cermet, a material made of a simple substance or an alloy metal can be adopted.
  • non-conductive ceramics such as alumina, silicon nitride, zirconia, and conductive ceramics such as alumina / titanium carbide, alumina / titanium carbide / titanium nitride, zirconia / titanium carbide, and the like can be used.
  • metal aluminum alloy, stainless steel or the like can be used.
  • the width and thickness of the frame part can be in the range of 2.0 mm to 5.0 mm.
  • the dimension of the opening for example, a range of 110 mm to 120 mm in length and 145 mm to 150 mm in width can be adopted.
  • FIG. 3A is a plan view schematically showing the pellicle frame of the first embodiment
  • FIG. 3B is a cross-sectional view taken along line IIIB-IIIB in FIG. 3A
  • FIG. 3C is a cross-sectional view taken along line IIIC-IIIC in FIG. 4A, 4B, and 4C are explanatory views showing a method of using the pellicle in the first embodiment.
  • It is process drawing which shows the manufacturing method of the pellicle frame of 1st Embodiment.
  • FIG. 6A is a perspective view showing a surface processing method of the pellicle frame according to the first embodiment
  • FIG. 6B is a front view showing a part of the pellicle frame and the like in a cutaway manner in the description of the surface processing method
  • 7A is a plan view schematically showing a pellicle frame of the second embodiment
  • FIG. 7B is a sectional view taken along the line VIIB-VIIB in FIG. 7A
  • FIG. 7C is a sectional view taken along the line VIIC-VIIC in FIG.
  • FIG. 8A, FIG. 8B, and FIG. 8C are explanatory views showing a method of using the pellicle in the second embodiment.
  • FIG. 8A, FIG. 8B, and FIG. 8C are explanatory views showing a method of using the pellicle in the second embodiment.
  • FIG. 8A, FIG. 8B, and FIG. 8C are explanatory views showing a method of using the pellicle in the second embodiment.
  • FIG. 9A is a perspective view illustrating a surface processing method for a pellicle frame according to the second embodiment
  • FIG. 9B is a front view illustrating a part of the pellicle frame and the like in a cutaway manner in the description of the surface processing method
  • 10A is a plan view schematically showing a pellicle frame of the third embodiment
  • FIG. 10B is a cross-sectional view taken along the line XB-XB in FIG. 10A
  • FIG. 10C is a cross-sectional view showing a modification of the third embodiment (ie, XB of FIG. 10A).
  • -Is a cross-sectional view of the same portion as the XB cross-section).
  • FIG. 11A is a front view showing the arrangement of each member in the first application example
  • FIG. 11B is a front view showing the arrangement of each member in the second application example
  • FIG. 11C is a front view showing the arrangement of each member in the third application example
  • FIG. 11D is a front view showing the arrangement of each member in the fourth application example.
  • 12A is a front view showing the arrangement of each member in the fifth application example
  • FIG. 12B is a front view showing the arrangement of each member in the sixth application example
  • FIG. 12C is a front view showing the arrangement of each member in the seventh application example. It is.
  • the pellicle frame 1 is a member in which a pellicle film 3 (see FIG. 4A) is stretched on one side of the pellicle frame 1 (on the side opposite to the photomask 39 side (see FIG. 4A)).
  • the pellicle frame 1 is made of a material containing ceramic as a main component (for example, a conductive ceramic containing alumina as a main component and titanium carbide).
  • a member in which a pellicle film 3 is stretched on a pellicle frame 1 is a pellicle 5 (see FIG. 4A).
  • an inner surface surrounded by the pellicle frame 1 itself is referred to as an inner peripheral surface 7, and an outer surface opposite to the inner side is referred to as an outer peripheral surface 9.
  • the side where the pellicle film 3 is stretched is the lower surface (for example, the second surface) 12, and the opposite surface is the upper surface (for example, the first surface) 11. Call it.
  • the opposite surface is the upper surface (for example, the first surface) 11. Call it.
  • surfaces when it is not necessary to distinguish these surfaces, they may be simply referred to as surfaces.
  • the pellicle frame 1 is a rectangular (that is, rectangular) frame (that is, an annular shape) in a plan view viewed from the Z direction. And has a central through hole 15 that is rectangular in plan view.
  • the pellicle frame 1 has four corner portions (that is, the first corner portion 21, the second corner portion 22, the third corner portion 23,
  • the rectangular shape includes a fourth corner portion 24) and four side portions (that is, a first side portion 31, a second side portion 32, a third side portion 33, and a fourth side portion 34).
  • the pellicle frame 1 has the characteristics that the Young's modulus is 150 GPa or more and the Vickers hardness is 800 Hv or more.
  • the pellicle frame 1 has two outer peripheral portions (namely, the first side portion 31 and the third side portion 33) in the X direction, as shown in FIG. 2.
  • Bottomed holes 37a, 37b, 37c, and 37d (generally referred to as 37), which are depressions opened on the surface 9 side, are provided.
  • the bottomed hole 37 is, for example, a round hole with a bottom of ⁇ 1.5 mm and a depth of 1.2 mm, and the bottom is arranged in a conical shape.
  • the bottomed hole 37 is used for manufacturing the pellicle 5 and positioning it when it is attached to the photomask 39 (see FIG. 4A), and a gripping part when carrying it.
  • the first side 31 of the pellicle frame 1 is provided with a vent hole 40 which is a through hole of ⁇ 0.5 mm, for example.
  • the vent hole 40 is used for adjusting the atmospheric pressure between the space surrounded by the pellicle 5 and the photomask 39 and the external environment after the pellicle 5 is attached to the photomask 39.
  • a filter (not shown) is provided in the vent hole 40 so that dust does not enter from the external environment.
  • the pellicle frame 1 has a rectangular frame shape in which long first to fourth side portions 31 to 34 arranged in four directions on the same plane in plan view are rectangular. It has the structure arranged in.
  • the pellicle frame 1 includes a columnar second side portion 32 and a fourth side portion 34 (that is, a pair of second and fourth side portions 32 and 34 disposed to face each other) arranged in parallel to the X axis.
  • a columnar first side portion 31 and a third side portion 33 that is, a pair of first and fourth side portions 31 and 33 arranged opposite to each other arranged in parallel to the Y axis, and a square First to fourth corner portions 21 to 24 are provided at corner portions of the frame (mesh portions in FIG. 3A), respectively.
  • the length in the longitudinal direction (Y direction) of the first side portion 31 and the third side portion 33 is longer than the length in the longitudinal direction (X direction) of the second side portion 32 and the fourth side portion 34.
  • first side portion 31 is disposed between the first corner portion 21 and the second corner portion 22, and the second side portion 32 is disposed between the second corner portion 22 and the third corner portion 23.
  • the third side portion 33 is disposed between the third corner portion 23 and the fourth corner portion 24, and the fourth side portion 34 is disposed between the fourth corner portion 24 and the first corner portion 21. .
  • the dimensions of the outer shape of the pellicle frame 1 are, for example, horizontal (Y direction) about 149 mm ⁇ vertical (X direction) about 120 mm ⁇ thickness (Z direction) about 3 mm. Further, the first to fourth side portions 31 to 34 of the pellicle frame 1 are quadrangular prisms, and the width dimension (the width dimension viewed from the Z direction) is the same (for example, about 2 mm).
  • the pellicle frame 1 has a flat one surface 12 (that is, the second surface on which the pellicle film 3 is stretched) 12 in the thickness direction.
  • the other surface (that is, the first surface attached to the photomask 39) 11 is curved in a convex shape so as to project outward (upward in the figure).
  • the pellicle frame 1 has a maximum thickness at each side 31 to 34 for all sides (that is, the first to fourth sides 31 to 34) on both sides of each side 31 to 34. It is larger than the thickness of each corner 21 to 24 (specifically, the maximum thickness). For example, the difference between the maximum thickness of each side portion 31 to 34 and the thickness of each corner portion 21 to 24 on both sides of each side portion 31 to 34 is 1 ⁇ m or more.
  • the difference in thickness between the maximum thickness of each side portion 31 to 34 and each corner portion 21 to 24 on both sides of each side portion 31 to 34 is preferably 30 ⁇ m or less. This is because if it exceeds 30 ⁇ m, the photomask 39 may be distorted due to the pellicle frame 1.
  • each side portion 31 to 34 in the longitudinal direction is equal to the thickness of each corner portion 21 to 24 on both sides of each side portion 31 to 34. It is larger than the thickness.
  • the first surface 11 of each side portion 31 to 34 gradually increases from each corner portion 21 to 24 toward the central portion 31a to 34a. It consists of a curved surface curved in a convex shape (that is, a first curved surface).
  • the first surface 11 of the first side 31 is gradually convex upward from the first corner 21 and the second corner 22 on both sides toward the center 31a. It consists of a curved surface.
  • the first surface 11 of the fourth side portion 34 gradually increases from the fourth corner portion 24 and the first corner portion 21 on both sides toward the central portion 34a toward the center portion 34a. It consists of a curved surface that is convexly curved.
  • the plate-like photomask 39 when the plate-like photomask 39 is smoothly curved so as to protrude downward due to its own weight, for example, below the photomask 39 (for example, one main surface side).
  • the pellicle 5 is arranged. In this case, it arrange
  • the pellicle film 3 is attached to the second surface 12 of the pellicle frame 1.
  • the first surface 11 of the pellicle frame 1 is attached to the lower surface 39a of the photomask 39 with an adhesive.
  • the self-weight deflection of the photomask 39 is corrected by the convex first surface 11 of the pellicle frame 1, and the shape of the photomask 39 becomes flat as shown in FIG. 4B, for example.
  • the second surface 12 of the pellicle frame 1 is slightly convex downward.
  • the pellicle is located above the photomask 39 (for example, on the other main surface side). 5 is arranged. In this case, it arrange
  • the pellicle film 3 is attached to the second surface 12 of the pellicle frame 1.
  • the first surface 11 of the pellicle frame 1 is attached to the upper surface 39b of the photomask 39 with an adhesive.
  • the convex first surface 11 of the pellicle frame 1 is bonded so as to follow (that is, follow) the concave upper surface 39b due to the self-weight deflection of the photomask 39, and the shape of the photomask 39 is maintained.
  • transformation by the self-weight bending of the photomask 39 is hold
  • the powder is a substance that becomes the basis of the sintered body constituting the pellicle frame 1 and, as will be described later, a sintering aid or the like is appropriately added to a raw material powder such as alumina or a conductive material and wet mixed. After that, it was prepared into granules of 50 ⁇ m to 100 ⁇ m by a spray drying method.
  • the particle size of the raw material powder was measured by the laser diffraction / scattering method, but may be measured by a dynamic light scattering method or a sedimentation method.
  • this powder was molded to form the original shape of the pellicle frame 1.
  • hird step P3 Next, after forming the powder, it was fired at a predetermined temperature.
  • This firing temperature depends on the composition of the powder, but is generally 1500 ° C. or higher.
  • a sintered body having a high Young's modulus and strength that is, a sintered body constituting the pellicle frame 1.
  • the thicknesses were made uniform except for a grinding allowance (for example, 0.05 mm to 0.10 mm) for surface processing (the ninth step P9) described later.
  • a grinding allowance for example, 0.05 mm to 0.10 mm
  • the inner shape / outer shape processing was performed on the sintered body after the thickness processing.
  • the outer peripheral surface of the sintered body is gripped by a holding jig (not shown), wire electric discharge machining is performed on the inner peripheral surface and the outer peripheral surface of the sintered body, and the inner shape and outer shape are aimed. Processed to dimensions. (6th process P6) Next, surface treatment of the electric discharge machining surface was performed on the sintered body after the inner shape / outer shape machining.
  • the bottomed hole 37 was formed on the side surface of the sintered body by electric discharge machining.
  • a large number that is, a plurality of target air holes
  • air pressure adjusting air holes 40 were formed on the side surface of the sintered body by a fine hole electric discharge machine (not shown). (Eighth process P8) Next, surface treatment of the electric discharge machining surface was performed on the bottomed hole 37 and the vent hole 40.
  • this composite material was wet-mixed, an organic binder for molding was added, and then a composite ceramic base powder of alumina / titanium carbide / titanium nitride was produced by an ordinary spray drying method.
  • the composite ceramic base powder is formed into a frame shape having outer dimensions of 182 mm in length, 147 mm in width, 6 mm in thickness, and 5 mm in frame width by a die press method. ) was produced.
  • the outer shape of the pellicle frame 1 is reduced by about 20 to 30% by a baking process described later, it is previously formed larger than the pellicle frame 1 after baking.
  • the pellicle frame 1 can have various sizes according to the size of the exposure mask (that is, the photomask 39) in the semiconductor exposure apparatus. (Third step P3) In this firing step, the powder compact was debindered and fired in an inert gas at 1700 ° C. for 3 hours to obtain a dense ceramic sintered body having electrical conductivity.
  • the dimensions of the sintered body were about 151 mm long ⁇ 122 mm wide ⁇ 5 mm thick, and a frame width of about 4 mm. There was a distortion of about 0.3 mm.
  • (4th process P4) In this thickness processing step, the upper and lower surfaces (both surfaces in the thickness direction) of the sintered body were ground by the same amount with a surface grinder and processed to a thickness of 3.1 mm. The flatness of both surfaces of the sintered body after surface grinding was 20 ⁇ m to 40 ⁇ m, respectively.
  • 5th process P5 In this inner shape / outer shape processing step, the inner shape and outer shape of the sintered body were processed into a length of 149 mm ⁇ width of 120 mm and a frame width of 2 mm by wire electric discharge machining.
  • a ⁇ 1 mm pressure adjusting air hole 40 was formed in the sintered body by fine hole electric discharge machining. (Eighth process P8) In the surface treatment process of the electric discharge machining surface, the heat-affected layer on the inner peripheral surface of the bottomed hole 37 and the vent hole 40 subjected to the electric discharge machining was removed by sandblasting.
  • planar processing machine 41 First, the planar processing machine 41 will be described.
  • a planar processing machine 41 is used to process the first corresponding surface 43 a of the sintered body 43.
  • the flat surface processing machine 41 is, for example, a rotary surface grinder, and a surface 45 has a horizontal disk shape, for example, a surface plate (horizontal surface plate) 47 having a diameter of 240 mm, and a disk shape disposed above the surface plate 47.
  • a 200 mm diameter grindstone (rotary grindstone) 49 is provided.
  • the flatness of the surface 45 of the surface plate 47 is less than 1.0 ⁇ m.
  • the surface plate 47 rotates in the direction of the arrow K1 about the vertical first rotation shaft 51. Further, the grindstone 49 rotates in the arrow K2 direction around the second rotation shaft 53.
  • the first rotation shaft 51 and the second rotation shaft 53 are misaligned, and the rotation directions of the arrows K1 and K2 are opposite.
  • the 1st rotating shaft 51 and the 2nd rotating shaft 53 are arrange
  • the grindstone 49 can be rotated and set so that the second rotation shaft 53 tilts in the left-right direction from the vertical direction as shown in FIG. 6B.
  • the first rotation shaft 51 and the second rotation shaft 53 have a predetermined angle ⁇ (so that the tip end side (lower side in FIG. 6B) approaches the first rotation shaft 51.
  • ⁇ a predetermined angle
  • the second rotating shaft 53 is set so that the left / right swing width (swing width) is 5 mm.
  • planar superfinishing machine was used as the planar processing machine 41.
  • a sintered body 43 that is, a sintered body constituting the pellicle frame 1 43 after the processing in the eighth step P8 is provided.
  • the first surface (that is, the first corresponding surface) 43a in the thickness direction is placed on the upper side.
  • a frame body 55 having an opening 55 a that matches the outer shape of the sintered body 43 is fixed to the surface 45 of the surface plate 47, and the opening 55 a of the frame body 55 is fixed.
  • the sintered body 43 was fixed on the surface plate 47 by fitting the sintered body 43 to the surface plate 47.
  • the surface plate 47 is rotated in the direction of the arrow K1
  • the inclined grindstone 49 is rotated in the direction of the arrow K2
  • the grindstone 49 is moved (that is, lowered) in the grinding direction, so that the first of the sintered body 43 is obtained.
  • the corresponding surface 43a was ground.
  • the first corresponding surface 43a of the sintered body 43 (and hence the first surface 11 of the pellicle frame 1) is thicker on the center (center of gravity) side than on the outer side (outer peripheral side) in plan view. Processed. As the angle of inclination ⁇ of the grindstone 49 increases, the difference in thickness between the center of gravity side and the outer peripheral side increases. Further, the height of the first corresponding surface 43a of the sintered body 43 can be adjusted by the plane processing machine 41 in units of 1.0 ⁇ m. That is, it is possible to adjust in units of ⁇ m by physically grinding the surface of the sintered body 43 by grinding.
  • the pellicle frame 1 having the above-described shape was obtained. That is, with respect to all the side portions (that is, the first to fourth side portions 31 to 34), the maximum thickness of each side portion 31 to 34 is the respective corner portions 21 to 24 on both sides of each side portion 31 to 34. Thus, a pellicle frame 1 having a thickness greater than (specifically, the maximum thickness) was obtained.
  • the surface of the sintered body 35 is placed on the surface plate 47 with the second corresponding surface 43b facing upward, and the surface is flattened by performing normal planar processing using the grindstone 49 disposed horizontally. Can be.
  • a pellicle frame 1 mainly composed of alumina was obtained.
  • the Young's modulus and strength of the pellicle frame 1 were measured, the Young's modulus was 420 GPa and the strength was 690 MPa.
  • the maximum thickness of each side portion 31 to 34 for all the side portions is the side portion 31. Is larger than the thickness of each corner on both sides of... (Ie, the first corners 21 to 24). That is, the difference between the maximum thickness of each side portion 31 to 34 and the thickness of each corner portion 21 to 24 on both sides of each side portion 31 to 34 is 1 ⁇ m or more.
  • the thickness of the central portions 31a to 34a in the longitudinal direction of the side portions 31 to 34 is larger than the thickness of the corner portions 21 to 24 on both sides of the side portions 31 to 34.
  • the first surfaces 11 of all the side portions 31 to 34 are formed of curved surfaces that are gradually convexly curved from the respective corner portions 21 to 24 to the central portions 31a to 34a on both sides of the respective side portions 31 to 34. .
  • the self-weight deflection of the photomask 39 can be corrected. Or it can suppress that the deformation
  • the pellicle frame 1 is made of ceramic as a main component, has a Young's modulus of 150 GPa or more, a Vickers hardness of 800 Hv or more, and has high rigidity.
  • the pellicle frame 1 when the pellicle 5 provided with the pellicle frame 1 is attached to the photomask 39, the pellicle frame 1 itself is not easily deformed, so that the self-weight deflection of the photomask 39 can be preferably corrected. Or it can suppress that the deformation
  • the first corresponding surface of the sintered body 43 (corresponding to the first surface 11 of the pellicle frame 1) is placed on the surface plate 47 where the surface 45 is horizontal. Place so that 43a is on top. Then, by using the above-described plane processing machine 41 with respect to the first corresponding surface 43a of the sintered body 43, grinding is performed by rotating the grindstone 49 in which the second rotation shaft 53 is inclined by a predetermined angle ⁇ . The thickness of the sintered body 35 (and hence the pellicle frame 1) can be adjusted.
  • the thickness of the pellicle frame 1 can be adjusted so that the thickness on the center of gravity side is larger than that on the outer peripheral side in plan view.
  • the surface plate 47 and the grindstone 49 are the first surface, the second surface, the inner circumferential surface, the outer circumferential surface, the corner, the side, the pellicle frame, the central portion, the photomask, the base, and the rotating grindstone of the present disclosure, respectively. It corresponds to an example.
  • FIGS. 7A, 7B, 7C and 8A, 8B, and 8C a pellicle frame and a photomask are schematically shown in FIGS. 3A, 3B, 3C, 4A, 4B, and 4C. Is shown. Moreover, the same number is attached
  • the pellicle frame 61 has a flat surface 12 on one surface in the thickness direction (that is, the second surface on which the pellicle film 3 is stretched).
  • the other surface (first surface attached to the photomask 39) 11 is concavely curved.
  • the pellicle frame 61 has a maximum thickness at each side 31 to 34 for all sides (ie, the first to fourth sides 31 to 34) on both sides of each side 31 to 34.
  • Each corner 21 to 24 is smaller than the thickness (specifically, the maximum thickness).
  • the difference between the maximum thickness of each side portion 31 to 34 and the thickness of each corner portion 21 to 24 on both sides of each side portion 31 to 34 is 1 ⁇ m or more.
  • each of the side portions 31 to 34 in the longitudinal direction is equal to the thickness of each corner portion 21 to 24 on both sides of each side portion 31 to 34. It is smaller than the thickness.
  • the first surface 11 of each of the side portions 31 to 34 for each of the side portions has the corner portions 21 to 34. It consists of a curved surface that gradually curves in a concave shape from 24 toward the central portions 31a to 34a.
  • the first surface 11 of the first side portion 31 is gradually concavely curved upward from the first corner portion 21 and the second corner portion 22 on both sides thereof toward the central portion 31a. It consists of curved surfaces.
  • the first surface 11 of the fourth side portion 34 gradually increases from the fourth corner portion 24 and the first corner portion 21 on both sides toward the central portion 34a toward the center portion 34a. It consists of a curved surface curved in a concave shape.
  • a pellicle 63 is disposed above the photomask 39, for example. In this case, it arrange
  • the pellicle film 3 is attached to the second surface 12 of the pellicle frame 61.
  • the first surface 11 of the pellicle frame 61 is attached to the upper surface 39b of the photomask 39 with an adhesive.
  • the self-weight deflection of the photomask 39 is corrected by the concave first surface 11 of the pellicle frame 61, and the shape of the photomask 39 becomes flat as shown in FIG. 8B, for example.
  • a pellicle 63 is disposed below the photomask 39, for example. In this case, it arrange
  • the pellicle film 3 is attached to the second surface 12 of the pellicle frame 1.
  • the first surface 11 of the pellicle frame 61 is attached to the lower surface 39a of the photomask 39 with an adhesive.
  • the concave first surface 11 of the pellicle frame 61 is adhered so as to follow (that is, follow) the convex lower surface 39a due to the self-weight deflection of the photomask 39, and the shape of the photomask 39 is maintained.
  • transformation by the self-weight bending of the photomask 39 is hold
  • planar processing machine 41 First, the planar processing machine 41 will be described.
  • the planar processing machine 41 used in the second embodiment is basically the same as that of the first embodiment, but the inclination of the grindstone 49 is different from that of the first embodiment.
  • the second rotation shaft 53 of the grindstone 49 is set so that the tip side (the lower side in FIG. 9B) is away from the first rotation shaft 51.
  • the first rotation shaft 51 and the second rotation shaft 53 are arranged on the same vertical plane.
  • the first rotating shaft 51 and the second rotating shaft 53 are set (that is, the inclination is fixed) so as to intersect at a predetermined angle ⁇ (for example, 0.001 °) above the grindstone 49.
  • ⁇ for example, 0.001 °
  • the second rotation shaft 53 is set so that the lateral swing width (swing width) is 5 mm.
  • the surface processing method of the second embodiment is basically the same as that of the first embodiment, but the second rotating shaft 53 of the grindstone 49 is inclined, so that the sintered body (that is, the pellicle frame).
  • the state of grinding of one surface (ie, the first corresponding surface) 43a in the thickness direction of the sintered body 43) is different.
  • the surface plate 47 is rotated in the direction of the arrow K1, and the inclined grindstone 49 is rotated in the direction of the arrow K2, and the grindstone 49 is lowered to lower the first corresponding surface of the sintered body 43.
  • 43a was ground.
  • the first corresponding surface 43a of the sintered body 43 is processed so that the thickness on the center (center of gravity) side becomes thinner than the outside (outer periphery side) in plan view.
  • the pellicle frame 61 having the above-described shape was obtained. That is, with respect to all the side portions (that is, the first to fourth side portions 31 to 34), the maximum thickness of each side portion 31 to 34 is the respective corner portions 21 to 24 on both sides of each side portion 31 to 34. A pellicle frame 61 having a thickness smaller than (specifically, the maximum thickness) was obtained.
  • the photomask 39 can be corrected appropriately as in the first embodiment. .
  • FIGS. 10A, 10B, and 10C the pellicle frame is schematically shown as in FIGS. 3A, 3B, and 3C.
  • the same reference numerals are assigned to the same configurations as those in the first and second embodiments.
  • the pellicle frame 71 is curved upward in FIG. 10B as a whole.
  • the thickness of each side part is larger than the thickness of the corner
  • the pellicle frame 71 has a pellicle film 3 stretched on one surface in the thickness direction.
  • the stretched surface of the pellicle film 3 is curved so as to be recessed downward with respect to the left-right direction (virtual horizontal plane) in FIG. 10B.
  • the stretched surface of the pellicle film 3 is curved so as to protrude upward with reference to the horizontal direction (virtual horizontal plane) in FIG. 10B. .
  • the other surface (for example, the surface attached to the photomask 39) where the pellicle film 3 is not stretched is curved in the same direction as the one surface where the pellicle film 3 is stretched.
  • the curved surface curved in a convex shape of the first surface 11 can be formed by the same surface processing as in the first embodiment.
  • the curved surface (namely, 2nd curved surface) curved to the concave shape of the 2nd surface 12 can be formed by the surface processing similar to 2nd Embodiment.
  • the pellicle film 3 is stretched on one surface (the first surface 11 or the second surface 12) to form a pellicle 73 (see FIG. 11B).
  • the third embodiment has the same effects as the first embodiment.
  • the pellicle frame 71 as a whole is curved upward in FIG. 10C, and the thickness of each side may be smaller than the thickness of the corners on both sides. . That is, the thickness of each side portion may be set so as to gradually decrease from both sides toward the center side.
  • FIGS. 11A, 11B, and 11C a pellicle frame and a photomask are schematically shown as in FIGS. 3A, 3B, and 3C.
  • the same reference numerals are assigned to the same configurations as those in the first to third embodiments.
  • ⁇ First application example> As shown in FIG. 11A, in the first application example, the shape of the photomask 39 curved so as to be convex downward is corrected.
  • a pellicle 5 having a pellicle frame 1 similar to that of the first embodiment is disposed below the photomask 39. That is, the pellicle 5 is arranged so that the first surface 11 curved so as to protrude upward in the figure is on the lower surface 39a side of the photomask 39.
  • a pellicle 63 having a pellicle frame 61 similar to that of the second embodiment is disposed above the photomask 39. That is, the pellicle 63 is arranged so that the first surface 11 curved so as to protrude upward in the drawing is on the upper surface 39 b side of the photomask 39.
  • the pellicle 5 is attached to the lower surface 39 a of the photomask 39 and the pellicle 63 is attached to the upper surface 39 b of the photomask 39.
  • the pellicles 5 and 63 are attached to both sides of the photomask 39 in the thickness direction, so that the photomask 39 can be corrected more preferably than in the first and second embodiments. It can be carried out.
  • ⁇ Second application example> As shown in FIG. 11B, in the second application example, the shape of the photomask 39 curved so as to be convex downward is corrected.
  • a pellicle 73 having a pellicle frame 71 similar to that of the third embodiment is disposed below the photomask 39. That is, the pellicle 73 is arranged so that the first surface 11 curved so as to protrude upward in the drawing is on the lower surface 39a side of the photomask 39.
  • a pellicle 73 having a pellicle frame 71 similar to that of the third embodiment is disposed above the photomask 39. That is, the pellicle 73 is arranged so that the second surface 12 curved so as to be convex upward (that is, concave) in the drawing is on the upper surface 39 b side of the photomask 39.
  • the pellicle 73 is attached to the lower surface 39a of the photomask 39, and the pellicle 73 is also attached to the upper surface 39b of the photomask 39.
  • the pellicle 73 to be attached to the lower surface 39a of the photomask 39 has the pellicle film 3 stretched on the second surface 12 of the pellicle frame 71, and the pellicle 73 to be attached to the upper surface 39b of the photomask 39 is the pellicle frame.
  • a pellicle film 3 is stretched on the first surface 11 of 71.
  • the photomask 39 is corrected more preferably than in the first and second embodiments by attaching the pellicles 73 to both sides of the photomask 39 in the thickness direction. Can do.
  • ⁇ Third application example> As shown in FIG. 11C, in the third application example, the shape of the photomask 39 curved so as to be convex downward is corrected.
  • a pellicle 5 having a pellicle frame 1 similar to that of the first embodiment is disposed below the photomask 39. That is, the pellicle 5 is arranged so that the first surface 11 curved so as to protrude upward in the figure is on the lower surface 39a side of the photomask 39.
  • a pellicle 83 having a flat pellicle frame 81 similar to the conventional one is arranged above the photomask 39.
  • the pellicle 5 is attached to the lower surface 39a of the photomask 39, and the pellicle 83 is attached to the upper surface 39b of the photomask 39.
  • the pellicles 5 and 83 are attached to both sides of the photomask 39 in the thickness direction (that is, both main surfaces), so that the photomask 39 is more preferably used than the first and second embodiments. Correction can be performed.
  • ⁇ Fourth application example> As shown in FIG. 11D, in the fourth application example, the shape of the photomask 39 curved so as to be convex downward is corrected.
  • a pellicle 83 having a flat pellicle frame 81 similar to the conventional one is arranged below the photomask 39.
  • a pellicle 63 having a pellicle frame 61 similar to that of the second embodiment is disposed above the photomask 39. That is, the pellicle 63 is arranged so that the first surface 11 curved so as to be convex upward (that is, a concave shape) in the figure is on the upper surface 39 b side of the photomask 39.
  • the pellicle 83 is attached to the lower surface 39 a of the photomask 39 and the pellicle 63 is attached to the upper surface 39 b of the photomask 39.
  • the photomask 39 can be corrected more preferably than in the first and second embodiments. .
  • ⁇ Fifth application example> As shown in FIG. 12A, in the fifth application example, the shape of the photomask 39 curved so as to protrude downward is maintained, and further deformation is suppressed.
  • a pellicle 5 having a pellicle frame 1 similar to that of the first embodiment is disposed above the photomask 39. That is, the pellicle 5 is arranged so that the first surface 11 curved so as to protrude downward in the figure is on the upper surface 39 b side of the photomask 39.
  • a pellicle 63 having a pellicle frame 61 similar to that of the second embodiment is arranged below the photomask 39. That is, the pellicle 63 is arranged so that the first surface 11 curved so as to be concave downward in the figure is on the lower surface 39a side of the photomask 39.
  • the pellicle 5 is attached to the upper surface 39b of the photomask 39, and the pellicle 63 is attached to the lower surface 39a of the photomask 39.
  • the deformation due to the self-weight deflection is more preferably performed than in the first and second embodiments. It can be held and further deformation can be suppressed.
  • ⁇ Sixth application example> As shown in FIG. 12B, in the sixth application example, the shape of the photomask 39 curved so as to protrude downward is maintained, and further deformation is suppressed.
  • a pellicle 83 having a flat pellicle frame 81 similar to the conventional one is arranged above the photomask 39.
  • a pellicle 63 having a pellicle frame 61 similar to that of the second embodiment is arranged below the photomask 39. That is, the pellicle 63 is arranged so that the first surface 11 curved so as to be convex downward (that is, concave) in the drawing is on the lower surface 39 a side of the photomask 39.
  • the pellicle 83 is attached to the upper surface 39 b of the photomask 39 and the pellicle 63 is attached to the lower surface 39 a of the photomask 39.
  • the deformation by the self-weight bending is more preferably performed than in the first and second embodiments. It can be held and further deformation can be suppressed.
  • the shape of the photomask 39 curved so as to protrude downward is maintained, and further deformation is suppressed.
  • a pellicle 5 having a pellicle frame 1 similar to that of the first embodiment is disposed above the photomask 39. That is, the pellicle 5 is arranged so that the first surface 11 curved so as to protrude downward in the figure is on the upper surface 39 b side of the photomask 39.
  • a pellicle 83 having a flat pellicle frame 81 similar to the conventional one is arranged.
  • the pellicle 5 is attached to the upper surface 39b of the photomask 39, and the pellicle 83 is attached to the lower surface 39a of the photomask 39.
  • the deformation by the self-weight bending is more preferably performed than in the first and second embodiments. It can be held and further deformation can be suppressed.
  • a material for the pellicle frame in addition to a material made of ceramic or a material containing ceramic as a main component, carbide, cermet, a single metal, or an alloy metal can be adopted.
  • the surface plate a single surface plate or a combination of a plurality of surface plates may be used.
  • the ceramic material forming the pellicle frame various materials such as silicon nitride, zirconia, composite ceramics of alumina and titanium carbide as disclosed in Japanese Patent Application Laid-Open No. 2016-1222091 are employed. it can.
  • the inner wall surface (inner circumferential surface) and the outer wall surface (outer circumferential surface) of the pellicle frame constituting the corner portion in plan view may have a curved surface shape. That is, as a whole pellicle frame, the corner may have an R shape in plan view.
  • the pellicle frame 1 has one surface in the thickness direction (that is, the second surface on which the pellicle film 3 is stretched: the lower surface in FIG. 1) 12. Is flat.
  • the other in the thickness direction in the pair of opposing sides, for example, the opposing first side 31 and third side 33, or the opposing second side 32 and fourth side 34, the other in the thickness direction.
  • the surface (that is, the first surface attached to the photomask 39) 11 may be curved in a convex shape so as to project outward (upward in the figure).
  • first surfaces 11 of the first and third side portions 31 and 33 when the first surfaces 11 of the first and third side portions 31 and 33 are curved in a convex shape, the first surfaces 11 of the second and fourth side portions 32 and 34 may be flat. . Conversely, when the first surface 11 of the second and fourth side portions 32 and 34 protrudes in a convex shape, the first surface 11 of the first and third side portions 31 and 33 may be flat.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)

Abstract

Un cadre de pellicule conforme à un aspect de la présente invention comprend une première surface et une seconde surface disposées des deux côtés du cadre le long de la direction de l'épaisseur, et une surface périphérique interne ainsi qu'une surface périphérique externe reliées à la première surface et à la seconde surface. Le cadre de pellicule est de forme rectangulaire et doté de quatre coins et de quatre côtés dans une vue en plan. Le cadre de pellicule est configuré de telle sorte que, dans au moins une paire de côtés mutuellement opposés parmi les côtés décrits ci-dessus, l'épaisseur maximale de chaque côté de la paire de côtés mutuellement opposés est supérieure à chaque épaisseur des coins des deux côtés de la paire de côtés mutuellement opposés, ou l'épaisseur minimale de chaque côté de la paire de côtés mutuellement opposés est inférieure à chaque épaisseur des coins des deux côtés de la paire de côtés mutuellement opposés.
PCT/JP2019/019732 2018-05-25 2019-05-17 Cadre de pellicule, photomasque et procédé de fabrication de cadre de pellicule WO2019225503A1 (fr)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06295056A (ja) * 1993-04-07 1994-10-21 Nippon Precision Circuits Kk マスク保護用ペリクル
JP2010262284A (ja) * 2009-04-28 2010-11-18 Nikon Corp 保護装置、マスク、マスク形成装置、マスク形成方法、露光装置、デバイス製造方法、及び異物検出装置
JP2011075662A (ja) * 2009-09-29 2011-04-14 Toppan Printing Co Ltd ペリクル、フォトマスク、および半導体デバイス
JP2013195852A (ja) * 2012-03-21 2013-09-30 Asahi Kasei E-Materials Corp ペリクルの製造方法及びペリクル
JP2017161749A (ja) * 2016-03-10 2017-09-14 日本特殊陶業株式会社 ペリクル枠およびペリクル枠の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06295056A (ja) * 1993-04-07 1994-10-21 Nippon Precision Circuits Kk マスク保護用ペリクル
JP2010262284A (ja) * 2009-04-28 2010-11-18 Nikon Corp 保護装置、マスク、マスク形成装置、マスク形成方法、露光装置、デバイス製造方法、及び異物検出装置
JP2011075662A (ja) * 2009-09-29 2011-04-14 Toppan Printing Co Ltd ペリクル、フォトマスク、および半導体デバイス
JP2013195852A (ja) * 2012-03-21 2013-09-30 Asahi Kasei E-Materials Corp ペリクルの製造方法及びペリクル
JP2017161749A (ja) * 2016-03-10 2017-09-14 日本特殊陶業株式会社 ペリクル枠およびペリクル枠の製造方法

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