WO2019169703A1 - 掩膜板、阵列基板及阵列基板的制备方法 - Google Patents
掩膜板、阵列基板及阵列基板的制备方法 Download PDFInfo
- Publication number
- WO2019169703A1 WO2019169703A1 PCT/CN2018/084031 CN2018084031W WO2019169703A1 WO 2019169703 A1 WO2019169703 A1 WO 2019169703A1 CN 2018084031 W CN2018084031 W CN 2018084031W WO 2019169703 A1 WO2019169703 A1 WO 2019169703A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- light
- transmitting region
- regions
- transmitting
- mask
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
Definitions
- the present application relates to the field of display technologies, and in particular, to a method for preparing a mask, an array substrate, and an array substrate.
- a part of the color block is formed by full exposure, and another part of the color block is formed by partial exposure.
- the thickness of the color block formed by full exposure is greater than the thickness of the color block formed by partial exposure.
- it is generally required that the difference in thickness between the color resist blocks formed by the two exposure modes is from 0.4 micrometers to 0.6 micrometers.
- the light-transmitting region and the light-shielding region on both sides of the mask are the same as the light-transmitting region and the light-shielding region in the intermediate portion of the mask, resulting in the edge of the color block formed by partial exposure. Thin and thick in the middle. The uneven color block having a thin intermediate edge is easy to fall off, which affects the display quality of the liquid crystal panel.
- the first technical solution adopted by the present application is to provide a mask plate, wherein the mask plate is provided with a first light transmissive region and at least two second light transmissive regions, and a second light transmission.
- the regions are located on both sides of the first light transmitting region, and on one side surface of the mask, the area of the second light transmitting region is larger than the area of the first light transmitting region.
- the second technical solution adopted in the present application is to provide an array substrate including a color block, and the angle between the inclined surface of the edge of the color block and the bottom surface of the color block is not less than 70 degrees. And less than 90 degrees.
- the third technical solution adopted by the present application is to provide a display including an array substrate, the array substrate includes a color blocking block, and the surface of the color block has an inclined surface and the ground of the color block The angle is not less than 70 degrees and less than 90 degrees.
- the fourth technical solution adopted in the present application is to provide a method for preparing an array substrate, the preparation method comprising: preparing an array substrate; coating a color resist layer on the array substrate; and mating a mask Performing exposure curing treatment on the color resist layer, wherein the spacer is provided with a first transparent region and at least two second transparent regions, and the second transparent region is located on both sides of the first transparent region And on one side surface of the mask, the area of the second light-transmitting region is larger than the area of the first light-transmitting region to obtain a color block having a uniform thickness.
- the utility model has the beneficial effects that the first light-transmissive region and the at least two second light-transmitting regions are disposed on the mask plate of the present application, and the second light-transmitting region is located at the first light-transmitting layer.
- the two sides of the region, and the area of the second light-transmitting region is larger than the area of the first light-transmitting region, and the exposure intensity of the edge portion of the color block is strengthened, thereby strengthening the thickness of the edge portion of the color block, and preventing the color block from falling off. Thereby improving the display quality of the liquid crystal panel.
- FIG. 1 is a schematic structural view of a first embodiment of a mask provided by the present application.
- FIG. 2 is a schematic structural view of a second embodiment of a mask provided by the present application.
- FIG. 3 is a schematic structural view of a third embodiment of a mask provided by the present application.
- 4A is a schematic diagram of illumination of forming a color block using a mask in the prior art
- 4B is a schematic diagram of illumination of forming a color block using the mask of the present application.
- FIG. 5 is a schematic structural diagram of an embodiment of an array substrate provided by the present application.
- FIG. 6 is a schematic flow chart of an embodiment of a method for preparing an array substrate provided by the present application.
- the mask on the present application is spaced apart from the first light-transmissive region and the at least two second light-transmitting regions, and the second light-transmitting region is located in the first light-transmitting region. On both sides, and on one side surface of the mask, the area of the second light transmitting region is larger than the area of the first light transmitting region.
- FIG. 1 is a schematic structural view of a first embodiment of a mask provided by the present application.
- three first light-transmissive regions 101 and four second light-transmissive regions 102 are disposed on the mask 10 through the light-shielding regions 103 .
- the second light transmitting regions 102 are located on both sides of the first light transmitting region 101.
- the first light transmitting region 101 and the second light transmitting region 102 are rectangular openings of the same length.
- the mask 10 includes upper and lower surfaces. On either side of the mask 10, the rectangular opening corresponding to the second transparent region 102 has a rectangular width larger than the rectangular opening corresponding to the first transparent region 101. width.
- the second light-transmissive region 102 has a rectangular width of 4 micrometers to 10 micrometers, and the first light-transmitting region 101 has a rectangular width of no more than 4 micrometers.
- the spacing between the adjacent two second transparent regions 102, the spacing between the second transparent regions 102 and the adjacent first transparent regions 101, and the adjacent two firsts are set.
- the spacing between the light transmissive regions 101 is the same.
- four second light-transmissive regions 102 are disposed on both sides of the first light-transmitting region 101. Two of the second light transmitting regions 102 are located on one side of the center line 104 of the mask 10, and the other two second light transmitting regions 102 are located on the other side of the center line 104 of the mask 10. Moreover, the two second light-transmissive regions 102 respectively located on both sides of the center line 104 are symmetrically distributed with respect to the center line, and thus can be used to form a uniform color block.
- second light-transmissive regions 102 are disposed on both sides of the first light-transmitting region 101.
- other numbers of second light transmissive regions 102 may also be provided, such as two, three, five or more second light transmissive regions 102.
- the number of the first light-transmitting regions 101 is set to three. In other embodiments, the number of the first light-transmissive regions 101 may be set to be different. The specific number is not limited herein.
- the mask 10 in this embodiment is a chrome metal mask. In other embodiments, the specific material of the mask 10 is determined according to actual conditions.
- the rectangular length corresponding to the first light-transmitting region 101 and the rectangular length corresponding to the second light-transmitting region 102 are the same. In the actual manufacturing process, the rectangular length of the first light-transmitting region 101 and the rectangular length of the second light-transmitting region 102 are allowed to have a deviation within a preset range.
- first light transmitting region 101 and the second light transmitting region 102 are both disposed in a rectangular shape.
- first light-transmitting region 101 and the second light-transmitting region 102 may be disposed in a circular shape, a rhombus shape, or a hexagonal shape, which is not specifically limited herein.
- FIG. 2 is a schematic structural diagram of a second embodiment of a mask provided by the present application.
- three first light-transmissive regions 201 and four second light-transmitting regions 202 are disposed on the mask 20 through the light-shielding regions 203.
- the width of the rectangle corresponding to the second light-transmitting region 202 is greater than the width of the rectangle corresponding to the first light-transmitting region 201.
- the two second light transmissive regions 202 on one side of the center line 204 of the mask 20 are symmetrical with the two second light transmissive regions 202 on the other side of the center line 204.
- the difference between the present embodiment and the previous embodiment is that the spacing between the adjacent two second light-transmitting regions 102, the second light-transmitting region 102 and the adjacent first light-transmitting layer in the previous embodiment
- the spacing between the regions 101 and the spacing between the adjacent two first light-transmitting regions 101 are set to be the same.
- the spacing between the adjacent two second light-transmitting regions 202, the spacing between the second light-transmitting regions 202 and the adjacent first light-transmitting regions 101 are set to be the same, and adjacent ones are disposed.
- the spacing between the two first light-transmitting regions 201 is smaller than the spacing between the second light-transmitting regions 202 and the adjacent second light-transmitting regions 202 or the first light-transmitting regions 201.
- two adjacent second light transmissive regions are to be adjacent.
- the spacing between the 202, the spacing between the second light-transmissive region 202 and the adjacent first light-transmitting region 201 is set to be 6 micrometers to 10 micrometers, and the spacing between the adjacent two first light-transmitting regions 201 is set. Not more than 6 microns.
- the spacing between the adjacent two second transparent regions 202, the spacing between the second transparent regions 202 and the adjacent first transparent regions 201 is set to 7 micrometers, and the adjacent two The spacing between the first light transmissive regions 201 is set to 6 microns.
- the rectangular width of the rectangular opening corresponding to the second light-transmitting region 202 is set to 6 ⁇ m, and the rectangular width of the rectangular opening corresponding to the first light-transmitting region 201 is set to 4 ⁇ m.
- FIG. 3 is a schematic structural diagram of a third embodiment of a mask provided by the present application.
- three first light-transmissive regions 301 and four second light-transmitting regions 302 are disposed on the mask plate 30 through the light-shielding regions 303.
- the width of the rectangle corresponding to the second light-transmitting region 302 is greater than the width of the rectangle corresponding to the first light-transmitting region 301.
- the two second light transmissive regions 302 on one side of the centerline 304 of the mask 30 are symmetrical with the two second light transmissive regions 302 on the other side of the centerline 304.
- the spacing between two adjacent second light-transmitting regions 302 is set to be larger than the second light-transmitting region 302 and the adjacent first
- the spacing between the light-transmitting regions 301 and the spacing between the second light-transmitting regions 302 and the adjacent first light-transmitting regions 301 is set to be larger than the spacing between the adjacent two first light-transmitting regions 301.
- the spacing between the adjacent two second light-transmitting regions 302, the spacing between the second light-transmitting regions 302 and the adjacent first light-transmitting regions 301 ranges from 6 micrometers to 10 micrometers.
- the spacing between the adjacent two second light-transmitting regions 302 is set to 8 micrometers to 10 micrometers, and the second light-transmitting region 302 and the adjacent first light-transmitting regions 301 are The spacing between the two is set to be 6 micrometers to 8 micrometers; or the spacing between the adjacent two second light-transmitting regions 302 is set to be 9 micrometers to 10 micrometers, and the second light-transmitting region 302 is adjacent to the first transparent region.
- the spacing between the light regions 301 is set to be 6 microns to 9 microns.
- the spacing between the adjacent two first light-transmitting regions 301 is not more than 6 micrometers. The specific settings are based on actual conditions and are not limited herein.
- the mask plate of the present application is provided with a first light-transmissive region and at least two second light-transmitting regions, and the second light-transmitting region is located at two sides of the first light-transmitting region, and The area of the two transparent regions is larger than the area of the first light-transmitting region, and the exposure intensity of the edge portion of the color block is strengthened, thereby strengthening the thickness of the edge portion of the color block, preventing the color block from falling off, thereby improving the display quality of the liquid crystal panel. .
- FIG. 4A is a schematic diagram of illumination of forming a color block using a mask in the prior art.
- 4B is a schematic diagram of illumination for forming a color block using the mask of the present application.
- the adjacent two light-transmitting regions 411A of the mask 41A in the prior art are spaced apart by the light-shielding region 412A.
- the shape of each of the light-transmitting regions 411A is set to be the same rectangular opening, that is, the area of each of the light-transmitting regions 411A is the same.
- the spacing between adjacent two light-transmitting regions 411A is also the same.
- the ultraviolet light energy irradiated to both side edges of the color resisting block 42A is lower than the ultraviolet light energy of the intermediate portion, thereby forming a thin intermediate edge of the color resisting block 42A.
- the angle between the inclined surface of the color block 42A and the bottom surface is less than 70 degrees, which causes the color block 42A to easily fall off.
- the adjacent two light-transmitting regions of the mask 41B in the present application are spaced apart by the light-shielding region 412B.
- the second light transmitting region 413B is located on both sides of the mask 41B, and the first light transmitting region 411B is located at an intermediate portion of the mask 41B. Moreover, the rectangular area corresponding to the second light-transmitting area 413B is larger than the rectangular area corresponding to the first light-transmitting area 411B.
- the ultraviolet light energy irradiated to the both sides of the color block 42B is not lower than the ultraviolet light energy of the intermediate portion, so that the color block 42B having a uniform thickness can be formed.
- the angle between the inclined surface of the color block 42B and the bottom surface is not less than 70 degrees and less than 90 degrees, and the color block 42B is not easily peeled off.
- the color block in this embodiment is a blue color block. In other embodiments, the color block may also be a red color block or a green color block.
- FIG. 5 is a schematic structural diagram of an embodiment of an array substrate provided by the present application.
- the array substrate 50 of the present embodiment includes a substrate 501, a first thin film transistor 502 and a second thin film transistor 503 on the substrate 501, a first color resist block 504 on the first thin film transistor 502, A second color block 505 on the second thin film transistor 503.
- the first color block 504 on the first thin film transistor 502 is formed by full exposure.
- the second color resist block 505 located on the second thin film transistor 503 is formed by partial exposure using the mask in the present application.
- the thickness of the first color block 504 formed by full exposure is greater than the thickness of the second color block 505 formed by partial exposure.
- the difference between the thicknesses of the first color block 504 and the second color block 505 is 0.4 micrometers to 0.6 micrometers.
- the angle between the edge inclined surface of the second color resisting block 505 and the bottom surface of the second color resisting block 505 is not less than 70 degrees and less than 90 degrees.
- the substrate 501 in this embodiment is a glass substrate, and may be a substrate of another material in other embodiments.
- the color block in this embodiment is a blue color block, and may be a red color block or a green color block in other embodiments.
- the mask plate of the present application is provided with a first light-transmissive region and at least two second light-transmitting regions, and the second light-transmitting region is located at two sides of the first light-transmitting region, and The area of the two transparent regions is larger than the area of the first light-transmitting region, and the exposure intensity of the edge portion of the color block is strengthened, thereby strengthening the thickness of the edge portion of the color block, preventing the color block from falling off, thereby improving the display quality of the liquid crystal panel. .
- FIG. 6 is a schematic diagram of a specific process of an embodiment of a method for fabricating an array substrate provided by the present application.
- Step 601 Prepare the substrate.
- a glass substrate is selected, and the glass substrate is cut into a suitable size, cleaned with acetone, deionized water, alcohol, and dried under a nitrogen atmosphere.
- substrates of other materials may also be used.
- Step 602 coating a color resist layer on the substrate.
- a thin film transistor is coated on the glass substrate obtained in step 601, and a color resist layer is coated on the thin film transistor.
- the thin film transistor in this embodiment includes a gate layer, a gate insulating layer on the gate layer, an active layer on the gate insulating layer, a source and a drain on the active layer, and a passivation layer.
- the color resist layer coated on the thin film transistor in this embodiment is a blue color resist block. In other embodiments, a red color block or a green color block may also be applied.
- Step 603 performing an exposure curing process on the color resist layer in cooperation with the mask, wherein the first transparent region and the at least two second transparent regions are disposed on the mask, and the second transparent region is located in the first transparent region.
- the area of the second light-transmitting region is larger than the area of the first light-transmitting region to obtain a color block having a uniform thickness.
- the color block coated in step 602 is exposed, developed, and cured by using the mask in the present application to obtain a color block having a uniform thickness.
- the angle between the edge of the edge of the color block having a uniform thickness and the ground of the color block is not less than 70 degrees and less than 90 degrees.
- the spacing between the second light-transmissive region of the mask used in the present embodiment and the adjacent second light-transmitting region or the first light-transmitting region is greater than the spacing between the adjacent two first light-transmitting regions.
- the first light transmitting region and the second light transmitting region are rectangular openings of the same length.
- the width of the second light-transmitting region is 4 micrometers to 10 micrometers, and the distance between the second light-transmitting region and the adjacent second light-transmitting region or the first light-transmitting region is 6 micrometers to 10 micrometers.
- the present application further provides a display comprising an array substrate, the array substrate comprising a color block, the angle between the edge of the edge of the color block and the bottom surface of the color block is not less than 70 degrees and less than 90 degrees.
- the mask plate of the present application is provided with a first light-transmissive region and at least two second light-transmitting regions, and the second light-transmitting region is located at two sides of the first light-transmitting region, and The area of the two transparent regions is larger than the area of the first light-transmitting region, and the exposure intensity of the edge portion of the color block is strengthened, thereby strengthening the thickness of the edge portion of the color block, preventing the color block from falling off, thereby improving the display quality of the liquid crystal panel. .
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
一种掩膜板、阵列基板及阵列基板的制备方法，该掩膜板（10）上间隔设置有第一透光区域（101）以及至少两个第二透光区域（102），第二透光区域（102）位于第一透光区域（101）的两侧，且第二透光区域（102）的面积大于第一透光区域（101）的面积。
Description
【技术领域】
本申请涉及显示技术领域，特别是涉及一种掩膜板、阵列基板及阵列基板的制备方法。
【背景技术】
液晶显示面板中，部分色阻块通过全曝光形成，另一部分色阻块通过部分曝光形成。通过全曝光形成的色阻块的厚度大于通过部分曝光形成的色阻块的厚度。且，一般要求两种曝光方式形成的色阻块之间的厚度差值为0.4微米~0.6微米。
现有技术中使用的掩膜板，位于掩膜板两侧的透光区域和遮光区域与位于掩膜板中间部分的透光区域和遮光区域相同，导致通过部分曝光形成的色阻块的边缘薄中间厚。边缘薄中间厚的不均匀色阻块容易脱落，影响液晶面板的显示质量。
因此，有必要提出一种掩膜板、阵列基板及阵列基板的制备方法以解决上述技术问题。
【发明内容】
本申请主要解决的技术问题是提供一种掩膜板、阵列基板及阵列基板的制备方法，通过使用该掩膜板进行部分曝光能够得到厚度均匀的色阻块，能防止色阻块的脱落，进而提升液晶面板的显示质量。
为了解决上述技术问题，本申请采用的第一个技术方案是提供一种掩膜板，该掩膜板上间隔设置有第一透光区域以及至少两个第二透光区域，第二透光区域位于第一透光区域的两侧，并且在掩膜板的一侧表面上，第二透光区域的面积大于第一透光区域的面积。
为了解决上述技术问题，本申请采用的第二个技术方案是提供一种阵列基板，该阵列基板包括色阻块，色阻块边缘倾斜的表面与色阻块的底面的夹角不小于70度且小于90度。
为了解决上述技术问题，本申请采用的第三个技术方案是提供一种显示器，该显示器包括阵列基板，阵列基板上包括色阻块，色阻块边缘倾斜的表面与色阻块的地面的夹角不小于70度且小于90度。
为了解决上述技术问题，本申请采用的第四个技术方案是提供一种阵列基板的制备方法，该制备方法包括：准备阵列基板；在所述阵列基板上涂布色阻层；配合掩膜板对所述色阻层进行曝光固化处理，其中，掩膜板上的间隔设置有第一透光区域以及至少两个第二透光区域，第二透光区域位于第一透光区域的两侧，并且在掩膜板的一侧表面上，第二透光区域的面积大于第一透光区域的面积，以得到厚度均匀的色阻块。
本申请的有益效果是：区别于现有技术的情况，本申请的掩膜板上间隔设置有第一透光区域以及至少两个第二透光区域，第二透光区域位于第一透光区域的两侧，且第二透光区域的面积大于第一透光区域的面积，加强色阻块边缘部分的曝光强度，从而加强色阻块边缘部分的厚度，能防止色阻块的脱落，进而提升液晶面板的显示质量。
【附图说明】
图1是本申请提供的掩膜板第一实施方式的结构示意图；
图2是本申请提供的掩膜板第二实施方式的结构示意图；
图3是本申请提供的掩膜板第三实施方式的结构示意图；
图4A是使用现有技术中的掩膜板形成色阻块的光照示意图；
图4B是使用本申请中的掩膜板形成色阻块的光照示意图；
图5是本申请提供的阵列基板一实施方式的结构示意图；
图6是本申请提供的阵列基板的制备方法一实施方式的具体流程示意图。
【具体实施方式】
下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，均属于本申请保护的范围。
为了使通过部分曝光形成的色阻块的厚度均匀，本申请的掩膜板上间隔设置有第一透光区域以及至少两个第二透光区域，第二透光区域位于第一透光区域的两侧，并且在该掩膜板的一侧表面上，第二透光区域的面积大于第一透光区域的面积。
为了详细说明形成厚度均匀的色阻块，下面以第一透光区域和第二透光区域为矩形开口，且通过设置第二透光区域和第一透光区域对应的矩形长度相同、第二透光区域对应的矩形宽度大于第一透光区域对应的矩形宽度使第二透光区域对应的矩形面积大于第一透光区域对应的矩形面积为例进行说明。
请参阅图1，图1是本申请提供的掩膜板第一实施方式的结构示意图。如图1所示，掩膜板10上通过遮光区域103间隔设置有三个第一透光区域101和四个第二透光区域102。第二透光区域102位于第一透光区域101的两侧。第一透光区域101和第二透光区域102为长度相同的矩形开口。掩膜板10包括上、下两个表面，在掩膜板10的任意一侧表面上，第二透光区域102对应的矩形开口的矩形宽度大于第一透光区域101对应的矩形开口的矩形宽度。优选的，第二透光区域102的矩形宽度为4微米~10微米，第一透光区域101的矩形宽度不大于4微米。
本实施例中，设置相邻的两个第二透光区域102之间的间距、第二透光区域102与相邻的第一透光区域101之间的间距以及相邻的两个第一透光区域101之间的间距相同。
本实施例中，在第一透光区域101的两侧共设置有四个第二透光区域102。其中的两个第二透光区域102位于掩膜板10的中心线104的一侧，另两个第二透光区域102位于掩膜板10的中心线104的另一侧。且，分别位于中心线104两侧的两个第二透光区域102关于中心线对称分布，进而能用于形成均匀的色阻块。
本实施例中，第一透光区域101的两侧设置有四个第二透光区域102。在其他实施例中，也可以设置其他数量的第二透光区域102，比如设置两个、三个、五个或更多数量的第二透光区域102。
本实施例中，设置第一透光区域101的数量为三个。在其他实施例中也可以设置为其他数量的第一透光区域101，具体数量在此不作限定。
本实施中的掩膜板10为铬金属掩膜板。在其他实施例中，掩膜板10的具体材质根据实际情况而定。
本实施例中，第一透光区域101对应的矩形长度和第二透光区域102对应的矩形长度相同。实际制作过程中，允许第一透光区域101的矩形长度和第二透光区域102的矩形长度存在预设范围内的偏差。
本实施例中，将第一透光区域101和第二透光区域102均设置为矩形。在其他实施例中，也可以设置第一透光区域101和第二透光区域102设置为圆形、菱形、六边形，在此不做具体限定。
请参阅图2，图2是本申请提供的掩膜板第二实施方式的结构示意图。如图2所示，掩膜板20上通过遮光区域203间隔设置有三个第一透光区域201和四个第二透光区域202。第二透光区域202对应的矩形宽度大于第一透光区域201对应的矩形宽度。位于掩膜板20的中心线204一侧的两个第二透光区域202与位于中心线204另一侧的两个第二透光区域202对称。本实施方式与上一实施方式的不同之处在于，上一实施方式中将相邻的两个第二透光区域102之间的间距、第二透光区域102与相邻的第一透光区域101之间的间距以及相邻的两个第一透光区域101之间的间距设置为相同。本实施方式中将相邻的两个第二透光区域202之间的间距、第二透光区域202与相邻的第一透光区域101之间的间距设置为相同，且设置相邻的两个第一透光区域201之间的间距小于第二透光区域202与相邻的第二透光区域202或第一透光区域201之间的间距。
具体地，本实施例中将相邻的两个第二透光区域
202之间的间距、第二透光区域202与相邻的第一透光区域201之间的间距设置为6微米~10微米，设置相邻的两个第一透光区域201之间的间距不大于6微米。
优选地，将相邻的两个第二透光区域202之间的间距、第二透光区域202与相邻的第一透光区域201之间的间距设置为7微米，将相邻的两个第一透光区域201之间的间距设置为6微米。将第二透光区域202对应的矩形开口的矩形宽度设置为6微米，将第一透光区域201对应的矩形开口的矩形宽度设置为4微米。
请参阅图3，图3是本申请提供的掩膜板第三实施方式的结构示意图。如图3所示，掩膜板30上通过遮光区域303间隔设置有三个第一透光区域301和四个第二透光区域302。第二透光区域302对应的矩形宽度大于第一透光区域301对应的矩形宽度。位于掩膜板30的中心线304一侧的两个第二透光区域302与位于中心线304另一侧的两个第二透光区域302对称。本实施方式与上述两个实施方式的不同之处在于，本实施方式中将相邻的两个第二透光区域302之间的间距设置为大于第二透光区域302与相邻的第一透光区域301之间的间距，且将第二透光区域302与相邻的第一透光区域301之间的间距设置为大于相邻的两个第一透光区域301之间的间距。且，相邻的两个第二透光区域302之间的间距、第二透光区域302与相邻的第一透光区域301之间的间距范围为6微米~10微米。
具体地，本实施例中，将相邻的两个第二透光区域302之间的间距设置为8微米~10微米，将第二透光区域302与相邻的第一透光区域301之间的间距设置为6微米~8微米；或者将相邻的两个第二透光区域302之间的间距设置为9微米~10微米，将第二透光区域302与相邻的第一透光区域301之间的间距设置为6微米~9微米。相邻的两个第一透光区域301之间的间距不大于6微米。具体的设置根据实际情况而定，在此不作限定。
区别于现有技术的情况，本申请的掩膜板上间隔设置有第一透光区域以及至少两个第二透光区域，第二透光区域位于第一透光区域的两侧，且第二透光区域的面积大于第一透光区域的面积，加强色阻块边缘部分的曝光强度，从而加强色阻块边缘部分的厚度，能防止色阻块的脱落，进而提升液晶面板的显示质量。
请参阅图4A-图4B，图4A是使用现有技术中的掩膜板形成色阻块的光照示意图。图4B是使用本申请中的掩膜板形成色阻块的光照示意图。如图4A所示，现有技术中掩膜板41A的相邻两个透光区域411A通过遮光区域412A间隔开。每一透光区域411A的形状大小设置为完全相同的矩形开口，即每一透光区域411A的面积相同。且，相邻两个透光区域411A之间的间距也都相同。通过掩膜板41A进行部分曝光形成色阻块42A的过程中，照射到色阻块42A两侧边缘的紫外光能量低于中间部位的紫外光能量，从而形成的色阻块42A中间厚边缘薄。该色阻块42A边缘倾斜的表面与底面的夹角小于70度，导致该色阻块42A容易脱落。如图4B所示，本申请中掩膜板41B的相邻两个透光区域通过遮光区域412B间隔开。第二透光区域413B位于掩膜板41B的两侧，第一透光区域411B位于掩膜板41B的中间部位。且，第二透光区域413B对应的矩形面积大于第一透光区域411B对应的矩形面积。通过掩膜板41B进行部分曝光形成色阻块42B的过程中，照射到色阻块42B两侧边缘的紫外光能量不低于中间部位的紫外光能量，从而能形成厚度均匀的色阻块42B。该色阻块42B边缘倾斜的表面与底面的夹角不小于70度且小于90度，进而该色阻块42B不易脱落。
本实施例中的色阻块为蓝色色阻块。在其他实施例中，色阻块也可以为红色色阻块、绿色色阻块。
请参阅图5，图5是本申请提供的阵列基板一实施方式的结构示意图。如图5所示，本实施中的阵列基板50上包括基板501、位于基板501上的第一薄膜晶体管502和第二薄膜晶体管503、位于第一薄膜晶体管502上的第一色阻块504、位于第二薄膜晶体管503上的第二色阻块505。其中，位于第一薄膜晶体管502上的第一色阻块504通过全曝光形成。位于第二薄膜晶体管503上的第二色阻块505通过使用本申请中的掩膜板进行部分曝光形成。通过全曝光形成的第一色阻块504的厚度大于通过部分曝光形成的第二色阻块505的厚度。且，第一色阻块504与第二色阻块505的厚度之差为0.4微米~0.6微米。第二色阻块505边缘倾斜的表面与第二色阻块505的底面的夹角不小于70度且小于90度。
本实施例中的基板501为玻璃基板，在其他实施例中也可以为其他材质的基板。
本实施例中的第一薄膜晶体管502和第二薄膜晶体管503均包括栅极层、栅极层上的栅极绝缘层、栅极绝缘层上的有源层、有源层上的源极和漏极以及钝化层。
本实施例中的色阻块为蓝色色阻块，在其他实施例中也可以为红色色阻块、绿色色阻块。
区别于现有技术的情况，本申请的掩膜板上间隔设置有第一透光区域以及至少两个第二透光区域，第二透光区域位于第一透光区域的两侧，且第二透光区域的面积大于第一透光区域的面积，加强色阻块边缘部分的曝光强度，从而加强色阻块边缘部分的厚度，能防止色阻块的脱落，进而提升液晶面板的显示质量。
请参阅图6，图6是本申请提供的阵列基板的制备方法一实施方式的具体流程示意图。
步骤601：准备基板。
本实施例中选用玻璃基板，将玻璃基板切割成合适的尺寸后用丙酮、去离子水、酒精清洗干净，再在氮气的氛围下进行干燥。在其他实施例中也可以选用其他材质的基板。
步骤602：在基板上涂布色阻层。
在步骤601中得到的玻璃基板上涂布薄膜晶体管，再在薄膜晶体管上涂布色阻层。
具体地，本实施例中的薄膜晶体管包括栅极层、栅极层上的栅极绝缘层、栅极绝缘层上的有源层、有源层上的源极和漏极以及钝化层。
本实施例中在薄膜晶体管上涂布的色阻层为蓝色色阻块。在其他实施例中也可以涂布红色色阻块、绿色色阻块。
步骤603：配合掩模板对色阻层进行曝光固化处理，其中，掩模板上间隔设置有第一透光区域以及至少两个第二透光区域，第二透光区域位于第一透光区域的两侧，并且在掩模板的一侧表面上，第二透光区域的面积大于第一透光区域的面积，以得到厚度均匀的色阻块。
具体地，通过使用本申请中的掩膜板对步骤602中涂布的色阻块进行曝光、显影、固化处理，以得到厚度均匀的色阻块。
更具体地，得到的厚度均匀的色阻块边缘倾斜的表面与该色阻块的地面的夹角不小于70度且小于90度。
本实施中使用的掩膜板的第二透光区域与相邻的第二透光区域或第一透光区域之间的间距大于相邻的两个第一透光区域之间的间距。第一透光区域与第二透光区域为长度相同的矩形开口。第二透光区域的宽度为4微米~10微米，第二透光区域与相邻的第二透光区域或第一透光区域之间的间距为6微米~10微米。
本申请还提供一种显示器，该显示器包括阵列基板，阵列基板上包括色阻块，色阻块边缘倾斜的表面与色阻块的底面的夹角不小于70度且小于90度。
区别于现有技术的情况，本申请的掩膜板上间隔设置有第一透光区域以及至少两个第二透光区域，第二透光区域位于第一透光区域的两侧，且第二透光区域的面积大于第一透光区域的面积，加强色阻块边缘部分的曝光强度，从而加强色阻块边缘部分的厚度，能防止色阻块的脱落，进而提升液晶面板的显示质量。
显然，本领域的技术人员可以对本申请进行各种改动和变型而不脱离本申请的精神和范围。这样，倘若本申请的这些修改和变型属于本申请权利要求及其等同技术的范围之内，则本申请也意图包含这些改动和变型在内。
Claims (17)
- 一种掩膜板，其中，所述掩膜板上间隔设置有第一透光区域以及至少两个第二透光区域，所述第二透光区域位于所述第一透光区域的两侧，并且在所述掩模板的一侧表面上，所述第二透光区域的面积大于所述第一透光区域的面积。
- 根据权利要求1所述的掩膜板，其中，所述第二透光区域与相邻的所述第二透光区域或所述第一透光区域之间的间距大于相邻的两个所述第一透光区域之间的间距。
- 根据权利要求2所述的掩膜板，其中，所述第一透光区域与所述第二透光区域为长度相同的矩形开口。
- 根据权利要求3所述的掩膜板，其中，所述第二透光区域的宽度为4微米~10微米，所述第二透光区域与相邻的所述第二透光区域或所述第一透光区域之间的间距为6微米~10微米。
- 根据权利要求1所述的掩膜板，其中，相邻两个所述第二透光区域之间的间距、相邻两个所述第一透光区域之间的间距、以及所述第二透光区域与相邻所述第一透光区域之间的间距相同。
- 根据权利要求1所述的掩膜板，其中，所述至少两个第二透光区域关于所述掩膜板的中心线对称分布。
- 根据权利要求1所述的掩膜板，其中，所述第一透光区域和第二透光区域均为圆形、菱形或六边形。
- 根据权利要求1所述的掩膜板，其中，所述掩膜板为铬金属掩膜板。
- 一种阵列基板，其中，所述阵列基板上包括色阻块，所述色阻块边缘倾斜的表面与所述色阻块的底面的夹角不小于70度且小于90度。
- 一种阵列基板的制备方法，其中，所述制备方法包括：准备基板；在所述基板上涂布色阻层；配合掩模板对所述色阻层进行曝光固化处理，其中，所述掩模板上间隔设置有第一透光区域以及至少两个第二透光区域，所述第二透光区域位于所述第一透光区域的两侧，并且在所述掩模板的一侧表面上，所述第二透光区域的面积大于所述第一透光区域的面积，以得到厚度均匀的色阻块。
- 根据权利要求10所述的制备方法，其中，所述第二透光区域与相邻的所述第二透光区域或所述第一透光区域之间的间距大于相邻的两个所述第一透光区域之间的间距。
- 根据权利要求10所述的制备方法，其中，所述第一透光区域与所述第二透光区域为长度相同的矩形开口。
- 根据权利要求12所述的制备方法，其中，所述第二透光区域的宽度为4微米~10微米，所述第二透光区域与相邻的所述第二透光区域或所述第一透光区域之间的间距为6微米~10微米。
- 根据权利要求10所述的制备方法，其中，相邻两个所述第二透光区域之间的间距、相邻两个所述第一透光区域之间的间距、以及所述第二透光区域与相邻所述第一透光区域之间的间距相同。
- 根据权利要求10所述的制备方法，其中，所述至少两个第二透光区域关于所述掩膜板的中心线对称分布。
- 根据权利要求10所述的制备方法，其中，所述第一透光区域和第二透光区域均为圆形、菱形或六边形。
- 根据权利要求10所述的制备方法，其中，所述色阻块边缘倾斜的表面与所述色阻块的底面的夹角不小于70度且小于90度。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16/100,194 US11099481B2 (en) | 2018-03-09 | 2018-08-09 | Mask plate, array substrate, and preparation method thereof |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810195921.6 | 2018-03-09 | ||
| CN201810195921.6A CN108508695B (zh) | 2018-03-09 | 2018-03-09 | 掩膜板、阵列基板、显示器及阵列基板的制备方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US16/100,194 Continuation US11099481B2 (en) | 2018-03-09 | 2018-08-09 | Mask plate, array substrate, and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2019169703A1 true WO2019169703A1 (zh) | 2019-09-12 |
Family
ID=63376337
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/CN2018/084031 WO2019169703A1 (zh) | 2018-03-09 | 2018-04-23 | 掩膜板、阵列基板及阵列基板的制备方法 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN108508695B (zh) |
| WO (1) | WO2019169703A1 (zh) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109062014B (zh) | 2018-09-12 | 2020-06-02 | 友达光电（昆山）有限公司 | 一种掩膜板组及显示面板 |
| CN109407459B (zh) * | 2018-12-14 | 2023-02-21 | 惠科股份有限公司 | 掩膜版及阵列基板的制备方法 |
| CN112310322B (zh) * | 2020-10-30 | 2022-11-08 | 湖北长江新型显示产业创新中心有限公司 | 一种显示面板和显示装置 |
| CN115394635A (zh) * | 2022-09-22 | 2022-11-25 | 闻泰通讯股份有限公司 | 晶圆及其制备方法、掩模版 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5402316B2 (ja) * | 2009-06-26 | 2014-01-29 | 富士ゼロックス株式会社 | フォトマスク、及び光学素子の製造方法 |
| CN104155845A (zh) * | 2014-07-30 | 2014-11-19 | 京东方科技集团股份有限公司 | 一种掩膜板检测装置和方法 |
| CN106444190A (zh) * | 2016-10-31 | 2017-02-22 | 深圳市华星光电技术有限公司 | 一种coa基板及其制造方法、液晶面板 |
| CN107167937A (zh) * | 2017-06-01 | 2017-09-15 | 深圳市华星光电技术有限公司 | 一种掩膜板、彩色滤光板及其显示面板 |
| CN107479286A (zh) * | 2017-09-04 | 2017-12-15 | 深圳市华星光电技术有限公司 | 一种改善灰阶斜纹的过孔结构 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109298591A (zh) * | 2012-02-15 | 2019-02-01 | 大日本印刷株式会社 | 相移掩模及使用该相移掩模的抗蚀图案形成方法 |
| CN102955378B (zh) * | 2012-11-12 | 2016-08-24 | 上海集成电路研发中心有限公司 | 光刻胶形貌表征方法 |
| CN105448699B (zh) * | 2014-09-02 | 2018-06-12 | 中芯国际集成电路制造(上海)有限公司 | 用于形成sram鳍部的掩膜版组件以及鳍部的制作方法 |
| CN104932138B (zh) * | 2015-07-07 | 2018-08-28 | 深圳市华星光电技术有限公司 | 一种光罩及彩膜基板的制备方法 |
-
2018
- 2018-03-09 CN CN201810195921.6A patent/CN108508695B/zh active Active
- 2018-04-23 WO PCT/CN2018/084031 patent/WO2019169703A1/zh active Application Filing
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5402316B2 (ja) * | 2009-06-26 | 2014-01-29 | 富士ゼロックス株式会社 | フォトマスク、及び光学素子の製造方法 |
| CN104155845A (zh) * | 2014-07-30 | 2014-11-19 | 京东方科技集团股份有限公司 | 一种掩膜板检测装置和方法 |
| CN106444190A (zh) * | 2016-10-31 | 2017-02-22 | 深圳市华星光电技术有限公司 | 一种coa基板及其制造方法、液晶面板 |
| CN107167937A (zh) * | 2017-06-01 | 2017-09-15 | 深圳市华星光电技术有限公司 | 一种掩膜板、彩色滤光板及其显示面板 |
| CN107479286A (zh) * | 2017-09-04 | 2017-12-15 | 深圳市华星光电技术有限公司 | 一种改善灰阶斜纹的过孔结构 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108508695B (zh) | 2020-10-02 |
| CN108508695A (zh) | 2018-09-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2019169703A1 (zh) | 掩膜板、阵列基板及阵列基板的制备方法 | |
| WO2014082326A1 (zh) | 液晶显示装置及其彩色滤光片基板 | |
| WO2019019316A1 (zh) | 一种显示面板、阵列基板及其制造方法 | |
| WO2019015020A1 (zh) | 一种液晶显示面板的制作方法 | |
| WO2017181460A1 (zh) | 一种液晶显示面板、显示装置 | |
| WO2017185438A1 (zh) | 一种掩膜版及彩色滤光片基板的制备方法 | |
| WO2014107890A1 (zh) | 彩色滤光片基板及其制造方法和液晶面板 | |
| WO2018068383A1 (zh) | 薄膜晶体管阵列基板及其制备方法及液晶显示面板 | |
| WO2017181463A1 (zh) | 阵列基板及其制造方法、液晶显示器 | |
| WO2019019427A1 (zh) | 金属网板及蒸镀掩膜装置 | |
| WO2019085065A1 (zh) | 柔性 oled 显示面板及其制备方法 | |
| WO2017067067A1 (zh) | 显示装置、coa基板及其制造方法 | |
| WO2019085072A1 (zh) | 柔性显示面板及其制造方法、柔性显示装置 | |
| WO2017031771A1 (zh) | 一种彩色滤光片及其制作方法 | |
| WO2019033542A1 (zh) | 一种oled显示装置及其制备方法 | |
| WO2019227647A1 (zh) | 背光模组、显示装置及背光模组的制作方法 | |
| WO2017008314A1 (zh) | 液晶显示装置及其导光板的制造方法 | |
| WO2017063295A1 (zh) | Oled显示面板及其制作方法 | |
| WO2019148661A1 (zh) | 一种液晶显示面板及其制作方法、液晶显示装置 | |
| WO2019128959A1 (zh) | 液晶显示面板及其制作方法 | |
| WO2018032566A1 (zh) | 曲面显示器及其曲面显示面板 | |
| WO2020118937A1 (zh) | 一种黑色矩阵的制备方法及显示装置 | |
| WO2019227699A1 (zh) | 一种量子点彩色滤光片基板及显示面板 | |
| WO2018161432A1 (zh) | 显示面板的制造方法、线栅偏光片及其制造方法 | |
| WO2018000483A1 (zh) | 彩膜基板及其制造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 18909252 Country of ref document: EP Kind code of ref document: A1 |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| 122 | Ep: pct application non-entry in european phase |
Ref document number: 18909252 Country of ref document: EP Kind code of ref document: A1 |